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Etchants for Carbon
C (0001) cleaved pyrolytic graphite - Physical etching
C (0001) specimens - Molten flux etching
C (diamond) - Dislocation etching
C (diamond) - Dislocation etching
C (synthetic diamond) - Dislocation etching
C as both carbon and graphite parts - Chemical etching
C as bulk graphite or thin film deposit - Acid reduction
C as bulk graphite or thin film deposit - Chemical etching
C as graphite single crystal material - Stress, defect
C as natural graphite - Chemical etching
C as natural graphite specimens - Chemical etching
C as single crystal graphite - Cleave
C as single crystal graphite specimens - Gas oxidation
C as single crystal graphite specimens - Metal decoration
C as thin films - Cleaning
C specimens - Chemical cleaning
CO2 as solid "Dry Ice" - Alcohol, chilling
CO2 single crystal - Cryogenic gas, forming
Carbon (diamond) - Chemical etching
Carbon (graphite carbon fibre composite) - Chemical etching
Carbon - Chemical etching
Carbon dioxide (CO2)-Gas oxidation
Carbon specimens - Cemical cleaning
Carbon specimens - Chemical etching
Carbon specimens - Gas cleaning
Carbon specimens - Thermal, forming
Carbon-Carbon composites - Chemical etching
Cellulose nitrate - Chemical etching
Cl2 single crystal - Pressure
Cr thin films deposits - Chemical etching
D (100), (111), and (110) oriented wafers - Physical etching
D (111) oriented small parts - Detergent cleaning
D (111) platelets - Physical etching
D (111) single crystal specimens - Thermal processing
D (111) specimens - Sample preparation
D (111) wafers - Chemical cleaning
D (111) wafers - Ionized gas
D (111) wafers - Metal, implatantion
D, fabricated as artificial diamond
Diamond
Graphite porous - Physical etching
Polycarbonate - Chemical etching
Polytetramethylene terephthalate PTMI, Polybutylene terephthalate PBT
Pyrolytic graphite - Attack polishing
Pyrolytic graphite - Attack polishing
i-C-Gas, growth