Si3N4-Chemical etching

Material: Si3N4
Type: Micro
Method: Chemical etching
Etchant (electrolyte): 95.4 g potassium carbonate, 12.0 g sodium fluoride, melt.
Procedure: 1-4 min at 900 C.
Note:  Nitride ceramics. Si3N4.
Source: G. Petzow, Metallographic Etching, 2nd Edition, ASM International, USA, 1999.
















Copyright © 2014 by Steel Data. All Rights Reserved.