Etchants for Al and Alloys

5052 Al alloy-Chemical etching
Ag-Al alloys-Alloys with < 27 at.% Al
Al (001) wafers-Al (001) wafers and other orientations
Al (001) wafers-Al, (001) wafers used in a study of lithium precipitation along dislocations
Al (001) wafers-Dislocation etching
Al (100) specimen-Al (100) and other orientations used in a study of thermal etching
Al (100) specimens-Electrolytic polishing
Al (100) wafer-Al, (100) wafer surfaces preferentially etched in this solution
Al (100) wafers used in an oxidation study-Electrolytic polishing
Al (100) wafers-Thermal etching
Al 5083 alloy-Al-4Mg-0.3Fe-0.75Mn-0.2Si
Al 5454 alloy-Al-2.6Mg-0.3Fe-0.8Mn-0.1Si
Al alloy #6061-Tg sheet-Proton damage
Al alloy 1100-Al-0.5Fe-0.1Si
Al alloy 3003-Al-1Mn-0.6Fe-0.2Si
Al alloy 7004-Al-1.6Mg-4.5Zn-0.5Mn-0.2Fe-0.2Si
Al alloy forgings
Al alloys - Anodizing solution of Cole and Brooks
Al alloys - Poulton's etch
Al alloys (except high Si-castings) - Dilute Tucker's etch
Al alloys as sheet, plate and rod-Electrolytic etching
Al alloys
Al alloys
Al alloys
Al alloys
Al alloys
Al and Al alloys - Barker's anodizing solution for grain structure
Al and Al alloys - Beraha's etch
Al and Al alloys - Beraha's tint etch
Al and Al alloys - Bossert's etch
Al and Al alloys - Boss's etch
Al and Al alloys - Caustic etch
Al and Al alloys - Concentrated Keller's etch
Al and Al alloys - Keller and Geisler's anodizing solution
Al and Al alloys - Keller's reagent
Al and Al alloys - Lacombe and Beaujard's anodizing solution
Al and Al alloys - Modified Keller's reagent
Al and Al alloys - Modified Keller's reagent
Al and Al alloys - Modified Keller's reagent
Al and Al alloys - Panseri's etch
Al and Al alloys - Tucker's etch
Al and Al alloys - Vilella's reagent
Al and Al alloys with less than 2% Si-Electrolytic polishing
Al and Al alloys, Al-Cu alloys, Al-Zn alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys-Electrolytic polishing
Al and Al alloys-Electrolytic polishing
Al and alloys-Al, specimens and alloys with low aluminum content
Al and alloys-Chemical polishing
Al and alloys-Polishing
Al and Al-Si and Al-Cu alloys
Al and aluminum alloys-Used as a general cleaning and polishing etch
Al and Ti nitride
Al bronze
Al bronze
Al bronze
Al bronzes, Cu-Be alloys-Electrolytic etching
Al cast alloys
Al cold-rolled specimens-Electrolytic polishing
Al evaporated on KCl-Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al Foil with an Al2O3 Thin Film
Al foil-Al, foil used in a study of change with AC etching
Al high purity slugs-Chemical cleaning
Al material in growing AlGaAsP single crystals-Chemical cleaning
Al polycrystalline sheet-Chemical cleaning
Al single crystal specimens-Electrolytic polihsing
Al single crystal specimens-Electrolytic polishing
Al single crystal specimens-Electrolytic polishing
Al single crystal specimens-Physical etching
Al single crystal sphere-Gas oxidation
Al single crystal wafers-Electrolytic thinning
Al specimens and alloys-Abrasive polishing
Al specimens as Al-Si (20%)-Electrolytic etching
Al specimens cutting-Acid, cutting
Al specimens-Chem/mech machinning
Al specimens-Chemical etching
Al specimens-Chemical etching
Al specimens-Mechanical, deformation
Al specimens-Oxidation
Al specimens-Solution used as a preferential etch on aluminum
Al specimens-Solution will develop etch figures
Al thin film on (100) silicon wafers-Chemical etching
Al thin film on quartz substrate-Gas, removal
Al thin film-Ketone, lift-off
Al thin films and crystalline aluminum sheet-Solution shown was used to etch channels in the aluminum
Al thin films deposited on GaAs-Physical etching
Al thin films deposited on silicon substrates-Physical etching
Al thin films evaporated on SiO2, Al2O3, and ZrO2 substrates-Alkali, removal
Al, Al-Cu alloys, Al-Si alloys
Al, Al-Si alloys-Electrolytic polishing
Al, and A12O3/A1N thin films-Gas etching
Al/Ni specimen surface coatings-Electrolytic removal
Al2O3 (0001) wafers-Chemical cleaning
Al2O3 (ruby and sapphire)
Al2O3 thin film-Chemical etching
Al2O3 thin films DC reactively sputtered on (111) silicon wafers-Chemical etching
Al2O3, mixture of Al2O3 and MgO, or SnO2
Al2O3, native oxide films on Al:Au alloys-Chemical etching (cleaning)
Al2O3
Al2O3
Al2O3
Al2O3
Al2O3
Al2O3-TiC sintered cermets
Al-3% Ag alloy, Al alloys - Modified Tucker's etch
Al-Ag alloys-Electropolishing
Al-Cd alloys-Alloys with 0.5-1.0% Al
Al-Cu alloy-Al-Cu alloy specimens. Used as a polish etch on Al-Cu, Al-Si, and Al
Al-Cu alloy-Al-Cu eutectic
Al-Cu alloy-Alloy with 11.8 wt.% Al
Al-Cu alloy-Alloy with 12% Al
Al-Cu alloy-Alloy with 7.5 at.% Al
Al-Cu alloy-Alloy with 9.5% Al
Al-Cu alloys
Al-Cu alloys
Al-Cu-Ag-Mg-Ti alloy-4.7% Cu, 0.6% Ag, 0.3% Mg, 0.3% Al, 0.2% Ti
Al-Cu-Mg castings
Al-Cu-Mg-Ni alloys - Zeerleder's etch
Al-Cu-Mn alloys-Cu(2+x) Mn(1-x) Al, x=0.6-0.8
Al-Cu-Si alloys - Conc. Keller's etch
Al-Fe alloys
Al-Fe-Ni system-Alloys with 32-53% Al, 8-14% Ni, 19-60% Fe
Al-Ho alloys-Anodising
Al-Ho alloys-For Al rich alloys
Al-In alloys-Selective etch for SEM
Al-Mg alloys
Al-Mg alloys
Al-Mg alloys
Al-Mg alloys
Al-Mg, Al-Cu-Mg alloys
Al-Mg, Al-Mg-Si, Al-Zn-Mg, Al-Cu-Mg alloys
Al-Mn alloys
AlSb wafers-Chemical etching
AlSb
Al-Si alloys - Hume-Rothery etch
Al-Si alloys
Al-Si alloys-Al, Al-Si alloys, Fe-Si alloys
Al-Si aloys - Modified Murakami's etch (Klemm)
Al-Si-Cu-Ni cast alloys - Franchini color etch
Al-Tm alloys-Electro polishing
Alumina-Al2O3 with 0.04% Cr
Alumina-Al2O3
Alumina-Al2O3
Alumina-silical-lime-nitride glasses-20.2-25.3% Si, 8.3-14.3% Al, 3.4-4.3% Cu, 43.5-60.6% O, 2.2-16.8% N
Aluminium alloys-1xxx, 3xxx, 5xxx, 6xxx series alloys, most casting alloys
Aluminium alloys-High purity Al, commercial purity Al, Al-Mn alloys, Al-Si alloys, Al-Mg alloys, Al-Mg-Si alloys
Aluminium and alloys-Chemical etching
Aluminium and aluminium alloys-Al alloys of all types. Forgings and castings
Aluminium and aluminium alloys-Al alloys. Forgings and castings
Aluminium and aluminium alloys-Al-Cu-Mg alloys. Al Alloys of all types
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Pure aluminium and Al alloys. To reveal grain structure and slip lines
Aluminium and its alloys-For 2xxx Al alloys, high Cu aloys
Aluminium and its alloys-For 3xxx, 4xxx, 5xxx, 6xxx Al alloys and high Si castings
Aluminium and its alloys-For Al alloys except high Si castings
Aluminium and its alloys-For high purity Al, 1xxx, 3xxx, 4xxx, 5xxx, 6 xxx Al alloys
Aluminium single crystal-Electrolytic polishing
Aluminium single crystal-Electrolytic polishing
Aluminium specimens-Al alloys containing Cu, Mn, Si and Ti. Al cast alloys with high Si content
Aluminium specimens-Al base matrials in general
Aluminium specimens-Chemical etching
Aluminium specimens-Electrolytic polishing
Aluminium specimens-Electrolytic polishing
Aluminium specimens-High purity Al, Mn-Al, Si-Al, Mg-Al and Mg-Si-Al alloys
Aluminium specimens-Pure Al, Cu-Al alloys
Aluminium specimens-Surface imperfections of pure Al
Aluminium thin film-Cleaning etch
Aluminium thin film-Reactive ion etching
Aluminium thin films deposited on GaAs and Si (100) wafers-Cleaning etch
Aluminium thin films evaporated on GaAs-Al thin films evaporated on GaAs, (100) substrates used in fabricating GaAs FETs
Aluminium thin films-Chemical cleaning
Aluminium-Al - Beck's solution
Aluminium-Al (99.945%)
Aluminium-Al (99.99%)
Aluminium-Al (CP or dilute alloy)
Aluminium-Al (CP, SP)
Aluminium-Al (CP, SP)
Aluminium-Al (CP, SP)
Aluminium-Al (CP, SP)
Aluminium-Al (CP, UP)
Aluminium-Al (HP)
Aluminium-Al (UP)
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Alumina (Al2O3) alloys-Chemical etching
Aluminium-Chemical etching
Aluminium-Chemical polishing
Aluminium-Differentiantion of intermediate phases in Al with high contents of Cu, Mn, Mg, Fe, Be, Ti, Fe3Al
Aluminium-Electro polishing
Aluminium-Electrolytic polishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Etching for grain size
Aluminium-For most of AL and Al alloys, especially those containing Cu
Aluminium-For most types of Al and Al alloys
Aluminium-For most types of Al and Al alloys
Aluminium-Grain boundaries, slip lines in high purity Al
Aluminium-Pure Al, Al-Cu, Al-Mn, Al-Mg, Al-Mg-Si alloys
Aluminium-Pure Al, Allloys of Cy-Al, Mg-Si-Al, Mg-Al, and Zn-Al
Aluminium-Pure Al, Al-Mg and Al-Mg-Si alloys. Etch figures
Aluminium-Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg, Al-Mn-Mg alloys
Aluminum sputtering target
Al-Zn alloy-Alloy with 22% Al
Al-Zn alloy-For alloys with 20% Al
Al-Zn-Mg-Cu alloys
a-Si-H thin films grown on SiO2, Al2O3, and ZrO2 substrates-Chemical etching
ASTM etchant #2-NaOH (Hatch's reagent)
ASTM etchant #3-Keller's reagent
ASTM etchant #4
ASTM etchant #5-Barker's reagent
ASTM etchant #6
ASTM etchant #7
Au/TiW thin Films on Al film deposited on (111) silicon wafers-xgas, blister forming
Be-Al alloys-Alloys with < 1% Al
Beraha's tint etch for Al alloys-Chemical etching
C as thin films-Cleaning
Cd single crystal specimens-Physical etching
CdSe (1010) cleaved wafers-Light, reactive
Ce-Al alloy-Anodising
Co-Ce-Al alloy-Ce(1-x) Al (x) Co5, 0< x < 0.6
Complex Mg alloys containing Al, Bi, Cd, Zn-Electrolytic etching
Copper and copper alloys-Beryllium copper and aluminium bronze
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver, Al bronze
Copper and copper alloys-Electropolishing
Copper specimens-Al bronzes which are difficult to etch otherwise
Copper specimens-Al bronzes, Cu-Be alloys
Copper specimens-Alpha-beta brass. Special brass. Al brass. Red cast bronze. German silver. Cu-Sn alloys
Copper specimens-Cu, brasses, bronzes, Al bronzes, Cu-Ni and Cu-Ag alloys, German silver
Cu alloys, brasses, Cu-Be alloys, Al bronzes without eutectoid, Alpaca-Chemical etching
Cu single crystal specimens-Physical etching
Cu single crystal spheres-Gas, preferential
Cu-Al alloy single crystal-Alloy with 0.3-0.7 at.% Al
Cu-Al alloys-Alloys with 5.5-7.5% Al
Cu-Al-Fe alloy-Alloy with 9% Al and up to 4% Fe
Cu-Al-Fe alloy-Ampco 8: 6.3% Al, 2-5% Fe
Cu-Al-Ni alloy-82-83% Cu, 14-15% Al, 3% Ni
Cu-Al-Ti alloys-Cu-2% Ti-2.3-5% Al
Dix-Keller's etchant
Dix-Keller's reagent
Duaraluminium and Al cast alloys-Chemical etching
Duraluminium-Chemical etching
Dy-Al alloys-Anodising
Er-Al alloys
Etchant for titanium aluminide-Chemical etching
Fe-Al alloy-Alloy with 35.5 at.% Al
Fe-Al-C alloys-Alloys with 7% Al and 1-2% C
Fe-Co-Al alloy-Alloy with 15% Co and 11% Al
Fe-Ni-Al alloys-Alloys with 10-60% Fe, 30-80% Ni, 4-30% Al
Fe-Ni-Cr-Nb-Ti-Al alloy-Fe-40% Ni-15.8% Cr-2.5% Nb-1.6% Ti-0.20% Al+C, Mn, B, superalloy 706
Fe-Si alloys-Al, Al-Si alloys, Fe-Si alloys
Fe-Ti-Al alloys-Fe-0/24 at.% Al
Flick's etchant
For most Al materials and Al alloys-Chemical etching
For most Al type alloys, Al-Be alloys-Chemical etching
For most Al types an alloys, especially Cu-containing alloys-Chemical etching
For most Al types and alloys except for Al alloys with high Si content, Al foils-Chemical etching
Gd-Al alloys-GdAl, Gd3Al, Gd2Al
Ge thin films evaporated on Si, Al, Al2O3, GaAs, C substrate-Physical etching
Germanium-Ge and its alloys. GaAs, InAs, Al, As. Grain boundaries. Dislocations on (111) planes
Hatch's reagent
High purity Al, most Al alloys, grain boundaries are preferentially attacked-Chemical etching
Identification of intermetallic phases in Al alloys-Chemical etching
Incaloy 800-19Cr-30Ni-45Fe+ C,Mn,P,S,Cu,Si,Al,Ti
Intermetallic compounds-Chemical ecthing
Jacquet's solution
Keller's etchant (2)
Keller's etchant
Kroll's etchant (2)
Lenoir's solution
Livingstone's etchant
Low Mn-V steel-Fe-0.14C-1.3Mn-0.35Si-0.1V (plus Al, N)
Magnesium alloys-AZ31 (Mg + 3 wt.% Al + 1 wt.% Zn)
Magnesium-Complex Mg alloys containing Al, Zn, Cd, Bi
Magnesium-Mg-Al alloys. Grain contrast in heat treated castings. Flow lines in forgings
Mg and Mg alloys-Mg alloys with low Al content, sheet metal
Mg and Mg alloys-Reveals grain structure in heat treated castings and flow lines in forgings
Mg-Al alloy (Magnox 12)-Alloy with 0.85% Al
Nd-Al alloy
Ni-Al alloy-Alloy with 0.1-0.5 at.% Al
Ni-Al alloy-Alloy with 4-8% Al
Ni-Cr-Al alloys-NiAl0Cr eytectic: 33 at.% Ni, 33 at.% Al, 34 at.% Cr
Ni-Cr-Al-Ti-C alloys-10-12% Cr, 5-6% Al, 1% Ti, 0.1% C
Ni-Cr-Al-Ti-Ta alloys-10-12 Cr, 5-6 Al, 1 Ti, 0.15 Ta
Ni-Cr-Fe-Al alloys-Up to 40% Fe and 2% Al
Ni-Ti alloys, superalloys-Chemical etching
Ni-Ti-Al alloys-TiNi + 0.05/3.4 at.% Al
Oxide ceramics (Ce, Sr, Al, Zr)-CeO, SrTiO3, Al2O3, ZrO-ZrC mixtures
Oxide ceramics-MgO, ThO2 (toxic), Al2NiO4, PuO3 (gamma, sintered)-toxic, Y2O3-ZrO2 and Sm2O3-ZrO2 mixtures
Poulton's reagent
Pure Al, Al-Cu, Al-Mg amd Al-Mg-Si alloys-Chemical etching
Pure Al, Al-Cu, Al-Mg, and Al-Mg-Si alloys-Electrolytic etching
Pure Al, Al-Mg and Al-Mg-Si alloys-Chemical etching
Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg and Al-Mn-Mg alloys-Electrolytic etching
Pure Al, Cu-Al, Mg-Al, Mg-Si-Al, and Zn-Al alloys-Chemical etching
Pure Cu, brasses, Al bronzes, Cu-Ni and Cu-Ag alloys, Alpaca-Chemical etching
Pure Cu, leaded bronze, bronzes, alpha/beta brasses, Al bronze, Be bronze-Chemical etching
> Recipe for Au on C and Al/W dendrites
Si (111) p-type wafers, 7-21 Ohm cm resistivity-Chemical cleaning
Si (111) wafer and other orientations-Chemical etching
Si (111) wafers-Chemical etching
SiC n-type wafers doped with aluminum-Metal doping
Silicon carbide (SiC)-Pressureless sintered SiC dosed with B and Al (alpha and alpha + beta)
Sintered Al materials, grain boundaries, removes smeared layers-Chemical etching
SiO2 as thermal oxidation on silicon wafers-Chemical etching
SiO2 deposition on aluminum and quartz blanks or silicon wafers-Chemical etching
Sleeve bearing materials (Al, Sn, Pb, Cu)-Al alloy clad to steel, Al-Si alloy clad to steel
SSiC doped with Al-Chemical etching
Ti-Al alloy-Alloy with 5% Al
Ti-Al alloys-Alloys with up to 40% Al
Ti-Al system-Alloys with up to 5 at.% Al
Ti-Al-Mo alloy-Alloy with 6% Al and 2% Mo
Ti-Al-Mo alloys-5.8-9.7% Al, 0.5-8.2% Mo
Ti-Al-Mo-V alloy-4-8% Al, 1-3% Mo, 1% V
Ti-Al-Nb-Ta alloy-Electro thinning
Ti-Al-Si alloy (< 10% Al, 1% Si)-Chemical etching
Ti-Al-Sn alloy-Alloy with 2.5-5% Sn, 7-14.5% Al
Ti-Al-Sn alloy-Alloy with 5% Al and 2.5% Sn
Ti-Al-Sn alloy-Alloy with 5% Al and 2.5% Sn
Ti-Al-Sn alloy-Alloys with 5% Al and 2.5% Sn
Ti-Al-V alloy (5.9-9.7% Al, 2-6% V)-Chemical etching
Ti-Al-V alloy (6% Al, 4% V)-Chemical etching
Ti-Al-V alloy (6% Al, 4% V)-Electro thinning
Ti-Al-V alloy-Alloy with 6% Al and 4% V
Ti-Al-V-Sn alloy-Alloy with 6% Al, 6% V and 2% Sn
Ti-Al-V-Sn alloy-Alloy with 6% Al, 6% V and 2% Sn
Ti-Al-Zr alloys-Alloys with 4.6-4.9% Al and 2-4% Zr
Ti-Cr-V-Al alloy-13% Cr, 11% V, 8% Al
Tucker's etchant 1
Tucker's etchant 2
Type 300 maraging steel-Fe, 18.5% Ni, 8.75% Co, 4.9% Mo, 0.65% Ti, max. 0.03% C, 0.1% Al
U-Al alloys-Chemical etching and electrolytic etching
VAl3 deposited on silicon, (001) substrates-Chemical cleaning/etching
Y-Al alloys-Electro polishing
Young's etchant
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zirconium specimens-Electro polishing
Zirconium specimens-Zr-Th, Zr-Sn, Zr-Nb, Zr-Cu, Zr-Si, Zr-Ni alloys
Zn-Al alloys-For alloy with 22% Al
Zn-Al alloys-For alloy with 22% Al
ZnS (111) cleaved wafers-Chemical etching
Zr-Al alloy-For alloy with 1% Al

Copyright © 2014 by Steel Data. All Rights Reserved.