Etchants for Carbides

(Al, Ti)C carbide-Chemical etching
(Al,Ti)C, VC-Chemical etching
(Fe, Si)C carbide-Chemical etching
(Th, U)C2 carbide-Chemical etching
(Th, U)C2 carbide-Chemical etching
(Th,U)C with a U/Th ratio of less than 3ThC2-Chemical etching
(U,Pu)C-Chemical etching
B4C
B4C-Electrolytic etching
B4C-Electrolytic etching
B-doped SiC
Beta SiC thin films grown on Si, (100) wafers-Chemical etching
Beta-SiC thin films grown on (100) silicon-Chemical cleaning
Boron carbide (B4C)-Chemical etching
Boron carbide (B4C)-Chemical etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Physical etching
Boron carbide (BC)-silicon carbide system (SiC)-Electrolytic etching
Boron carbide B4C-Etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Electrolytic etching
Cemented carbides, Kovar (Fe)-Chemical etching
Ceramics, carbides (B)-B4C
Ceramics, carbides (Cr, Hf, V, Al)-CrC, HfC, VC, (Al, Ti)C
Ceramics, carbides (Fe, Si)-(Fe, Si) C
Ceramics, carbides (Mo, Cr)-MoC2, CrC2
Ceramics, carbides (Nb)-NbC, NbC2
Ceramics, carbides (Pu)-PuC (dendritic), toxic
Ceramics, carbides (Pu)-PuC (toxic)
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Ta)-Ta(C, N, O)
Ceramics, carbides (Ta)-Tac
Ceramics, carbides (Th)-(Th, U)C (toxic) with U/Th ratio. ThC2 (toxic)
Ceramics, carbides (Th)-(Th, U)C2 (toxic)
Ceramics, carbides (Th)-ThC (toxic)
Ceramics, carbides (Th)-ThC2 (toxic)
Ceramics, carbides (Ti)-TiC
Ceramics, carbides (Ti, Ta)-TiC, TaC
Ceramics, carbides (U)-(U, Pu)C high in U. UC-PuN mixtures (toxic)
Ceramics, carbides (U)-(U, Pu)C. Toxic
Ceramics, carbides (U)-UC, U(C, O), UC-UC2, UC2-U2C3 mixtures, (U, Pu)C high in C. U(C, N) UC-ZrC
Ceramics, carbides (U)-UC-Cr23C6 mixtures (toxic)
Ceramics, carbides (U)-UC-Pu mixtures (toxic)
Ceramics, carbides (U, Pu)-(U, Ou)C high in Pu. Toxic
Ceramics, carbides (W)-WC
Ceramics, carbides-KC
Ceramics, carbides-ThC (toxic)
Ceramics, carbides-ThO2 (toxic)
Coated cutting insert-Chemical etching
Cobalt and alloys-Cemented carbides and other Co base alloys
Cobalt and alloys-Pure Co, Co-Fe alloys, WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys-WC-TiC-(Ta, Nb)C-Co tye cemented carbides
Cobalt and alloys-WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys-WC-TiC-TaC-Co and WC-NbC-Co type cemented carbides
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Kovar (17Co-29Ni, balance Fe) cemented carbides matrix
Cobalt specimens-Cemented carbides with Co binder phase
Co-Cr-Ni-Ta carbide alloy-Co-15Cr-25Ni-13Ta
Co-Cr-Ta carbide alloy-Co-15Cr-13Ta
Co-Ni-Cr carbide system-Co2Ni-Cr23C6
Co-Ti in carbide system-Co-2.3/5 mol.% TiC
Cr and CrNi steels. Carbide etch. Cast iron and alloy cast iron-Electrolytic etching
Cr and Hf carbides-Chemical etching
Cr and Mo carbides-Chemical etching
Cr carbide-Ni alloy-83% carbide-15% Ni
CrC and HfC
Cr-Hf carbide-0.5 mol % HfC
Cr-Nb carbide-0.5 mol % NbC
Cr-Ta carbide-0.5 mol % TaC
Cr-Ti carbide-0.5 mol % TiC
Cr-Ti carbide-Chemical etching
Cr-Zr carbide-0.5 mol % ZrC
Cr-Zr carbide-Chemical etching
Hafnium carbide (HfC)-Chemical polishing
HfC carbide-Chemical etching
Kovar, cemented carbides-Chemical etching
Mo2C specimens-Chemical etching
NbC and NbC2
NbC specimens-Chemical etching
NbC/NbC2-Electrolytic etching
Nickel specimens-WC-Mo2C-TiC-Ni cemented carbides
Niobium carbide (NbC)-Dislocation etching
Niobium carbide (NbC)-Thermal etching
Plutonium carbide (PuC)-Electrolytical etching
PuC-Electrolytic etching
PuC-Electrolytic etching
Pyrolytic SiC
Self-bonded SiC
SiC alloy with 1% B4C
SiC carbide-Chemical etching
SiC reaction bonded-Electrolytic etching
SiC with 1% B4C, B doped SiC-Chemical etching
SiC with 5-10% oxide additions-Physical etching
SiC
SiC
SiC
SiC
SiC-Electrolytic etching
SiC-Physical etching
SiC-Physical etching
Silicon carbide (SiC-(beta-form)-Chemical polishing
Silicon carbide (SiC-(beta-form)-Chemical polishing
Silicon carbide (SiC) single crystal-For revealing the growth spirals
Silicon carbide (SiC) single crystal-Shows differences between Si (smooth etch) and C (rough etch) faces on opposing (001) surfaces
Silicon carbide (SiC)-Beta SiC with B4C
Silicon carbide (SiC)-Chemical etching
Silicon carbide (SiC)-Chemical etching
Silicon carbide (SiC)-Electrolytic etching
Silicon carbide (SiC)-Electrolytic etching
Silicon carbide (SiC)-Electrolytic etching
Silicon carbide (SiC)-Etching of SiC for Transmission Electron Microscopy (TEM)
Silicon carbide (SiC)-For alpha SiC dosed with B
Silicon carbide (SiC)-For alpha-SiC. Reveals alpha/alpha and alpha/beta grain boundaries
Silicon carbide (SiC)-For beta SiC
Silicon carbide (SiC)-For beta-SiC. Reveals beta/beta grain boundaries
Silicon carbide (SiC)-For pyrolytically manufactured beta SiC
Silicon carbide (SiC)-For RSiC. Reveals alpha/beta grain boundaries
Silicon carbide (SiC)-For SiSiC
Silicon carbide (SiC)-HPSiC
Silicon carbide (SiC)-Polycrystalline-Chemical and elctrolytic etching
Silicon carbide (SiC)-Pressureless sintered SiC (alpha and alpha + beta)
Silicon carbide (SiC)-Pressureless sintered SiC dosed with B and Al (alpha and alpha + beta)
Silicon carbide (SiC)-Pyrolytic-Electrolytic etching
Silicon carbide (SiC)-SiC with B
Silicon carbide (SiC)-Si-SiC, infiltrated. All phases are etched equally
Silicon carbide (SiC)-Si-SiC, infiltrated. Si, alpha and beta are differentiated
Silicon carbide SiC-Etching
Silver-tungsten carbide (Ag-WC)-Electric contact material
Sintered carbides-Electropolishing
Sintered carbides-General etching of sintered carbides
Sintered carbides-Particularly for sintered carbides which-apart from WC-also contain TiC, TaC and NbC
Sintered carbides-Sintered carbides containing Ni-phase
Sintered carbides-Sintered carbides with high content of Ti and Ta carbides
Sintered carbides-To reveal boundaries of the carbide grains against the cobalt phase
SiSiC-Chemical etching
SiSiC-Electrolytic etching
SSiC Beta/Beta-Chemical etching
SSiC doped with Al-Chemical etching
SSiC doped with B-Chemical etching
SSiC-Chemical etching
Steatite (Mg3 Si4 O10 x (OH)2))-Sample preparation
Ta(C,N,O)-Chemical etching
Ta-C alloys
TaC specimens-Chemical cleaning
TaC specimens-Chemical etching
TaC, (Fe,Si)C-Chemical etching
TaC, TiC, SiC-Electrolytic etching
TaC
TaC
TaC-Chemical etching
Tantalum carbide (TaC)-Thermal etching
ThC carbide-Chemical etching
ThC carbide-Chemical etching
ThC carbide-Chemical etching
ThC2 carbide-Chemical etching
ThC2 carbide-Chemical etching
ThC-Chemical etching
Thorium carbide (ThC)-Cathodic etching
Thorium carbide (ThC)-Chemical and electrolytic etching
Thorium carbide (ThC)-Chemical ecthing
Thorium carbide (ThC)-Electrolytic polishing
Thorium dicarbide (ThC2)-uranium dicarbide (UC2)-Electrolytic polishing
Ti3SiC2 (titanium silicon carbide)-Chemical etching
TiC and TaC
TiC coated steel-Structure of titanium carbide layer
TiC coated steel-This solution revealed a good grain boundry pattern in titanium carbide layer
TiC specimens-Chemical cleaning
TiC-C alloys
Titanium carbide (TiC) single crystal-Electrolytic polishing
Titanium carbide (TiC)-Electro thinning
Titanium carbide (TiC)-Electrolytic polishing and chemical etching
Titanium carbide (TiC)-Single crystal-Chemical and electrolytic etching
Titanium carbide (TiC)-TiC(0.97)
UC, U(C,O) x U(C,N), UC-ZrC mixtures, UC-UC2, UC2-U2C3 mixtures,(U,Pu)C C-rich-Chemical etching
Uranium carbide (UC)-Chemical etching
Uranium carbide (UC)-Electro polishing
Uranium carbide (UC)-Electro thinning
Uranium carbide (UC)-Electrolytic polishing and etching
Uranium carbide (UC)-Physical etching
Uranium carbide (UC)-zirconium carbide (ZrC) system-Chemical etching
Uranium carbide (UC)-zirconium carbide (ZrC) system-Chemical etching
Uranium carbide-lanthanum alloys
Uranium carbide-neodymium alloys (C-Nd-U)
Uranium carbides (UC, U2C3, UC2)-Chemical etching
Uranium dioxide-thoria system (10% UO4)-Chemical etching
Vanadium carbide (VC)-Dislocation etching
Vanadium carbide (VC0.84)-Chemical etching
Vanadium oxide-lanthanum oxide system-V2O3-La2O3 system
Vapour deposited silicon carbide (SiC)-Thermal etching
VC
WC specimens-Chemical cleaning
WC-Chemical etching
WC-Chemical etching
WC-Chemical etching
WC-Co or Ni matrix with Mo2C, TiC, WC2, TaC-Chemical etching
WC-Co, Eta phase appears multicolored; Co is white, WC-TiC-TaC-Co, WC-NbC-Co-Chemical etching
WC-Co, reveals Co-Electrolytic etching
WC-Co, WC-TiC-TaC-Co-Chemical etching
WC-Co. Good etchant for WC crystals-Electrolytic etching
WC-Co. Suited for SEM examination-Electrolytic etching
WC-Co-Chemical etching
WC-Co-Chemical etching
WC-Co-Chemical etching
WC-Mo2C-TiC-Ni-Chemical etching
WC-TiC-NbC-Co-Chemical etching
WC-Ti-Ta, NbC-Co-Physical etching
X41CrMoV5-1 steel-Chemical etching
X41CrMoV5-1 steel-Chemical etching
Yb-Ni system-Chemical etching
Zicronium carbide (ZrC)-Etch pits on (100) planes
ZrC-Chemical etching
ZrC-Chemical etching
Zr-Mn alloys-Alloys with 0.5-2.0 at. % Mn
Zr-Th alloys-Chemical polishing

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