Etchants for Germanium and Alloys

100 etchant - Ge (100) wafers - Chemical etching
ASTM etchant No. 58 - For Ge
ASTM etchant No. 58 - Germanium - Chemical etching
ASTM etchant No. 59 - For Ge
ASTM etchant No. 59 - Germanium - Chemical etching
ASTM etchant No. 60 - CP4 etchant - For Ge
ASTM etchant No. 60 - Germanium - Chemical etching
BJ etchant - Ge (111) wafers - Chemical polishing
CP4 etchants, dilute CP4, modified - Ge (111), (100), (110), and (211) wafers - Chemical etching
Camp No. 2 (Superoxol, CP2) etchant - Ge (111) wafers - Chemical etching
Camp No. 3 (CP3) etchant - Ge (111) wafers - Chemical etching
Camp No. 4 (CP4) etchant - Ge (100) wafers and other orientations - Chemical polishing/etching
Ellis's No. 1 etchant - Ge spheres and hemispheres - Chemical etching
Ellis's No. 5 etchant - Ge spheres and hemispheres - Chemical etching
Ellis's No. 7 etchant - Ge spheres and hemispheres - Ge spheres and hemispheres
Ferric cyanide etchant - Ge hemispheres - Chemical etching
Gallium arsenide (GaAs) - Selective etch for dislocations on (111) plane
Ge (100) and (110) wafers - Chemical etching
Ge (100) and (111) wafers - Metal etching
Ge (100) specimens - Electrolytic machinning
Ge (100) very thin films grown by PECVD on NaCl, Ge wafers - Thermal cleaning
Ge (100) wafers - Vacuum cleaning
Ge (100) wafers cut within 1 of plane - Physical cleaning
Ge (111) 5-10 Ohm cm resistivity n-type wafers - Chemical etching
Ge (111) and (100) wafers - Chemical etching
Ge (111) and (100) wafers - Solution used as a preferential etch
Ge (111) and (100) wafers used as substrates - Chemical polishing
Ge (111) dendritic ribbon crystals - Dislocation etching
Ge (111) grown ingot with grown-in p-n junction - Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction - Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction - Electrolytic etching
Ge (111) ingots with grown-in p-n junction - Electrolytic etching
Ge (111) n-type wafers - Chemical etching
Ge (111) n-type wafers - Electrolytic etching
Ge (111) n-type, 0.004-40 Ohm cm resistivity wafers - Electrolytic polishing
Ge (111) rectangular bars with grown p-n junctions - Chemical etching
Ge (111) wafer and spherical shot - Chemical etching
Ge (111) wafer with p-n junctions - Electrolytic etching
Ge (111) wafers - Chemical cleaning
Ge (111) wafers - Chemical cleaning
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolyticlytic plating
Ge (111) wafers - Abrasive, damage
Ge (111) wafers - Acid, stress
Ge (111) wafers - Cleave
Ge (111) wafers - Junction testing
Ge (111) wafers - Metal, structure
Ge (111) wafers and cylinders - Metal diffusion
Ge (111) wafers and ingots - Chemical etching
Ge (111) wafers and other orientations - Chemical etching
Ge (111) wafers and other orientations - Chemical etching
Ge (111) wafers and other orientations - Chemical etching
Ge (111) wafers and other orientations - Electrolytic etching
Ge (111) wafers and other orientations - Gas oxidation
Ge (111) wafers angle lapped at 543' - Chemical etching
Ge (111) wafers fabricated as p-n junction diodes - Chemical etching
Ge (111) wafers fabricated with indium p-n junctions - Junction testing
Ge (111) wafers p-type - Chemical polishing
Ge (111) wafers used as substrates for Ge epitaxy growth - Chemical etching
Ge (111) wafers with epitaxy grown Ge layers - Gas ecthing
Ge (111) wafers with indium - Metal decoration
Ge (111) wafers with lithium diffused p-n junctions - Chemical etching
Ge (111) wafers, p-type, 4 Ohm cm resistivity - Chemical polishing
Ge (111), (100), (110) and (211) wafers - Chemical etching
Ge (111), (100), (110) and (211) wafers - Chemical etching
Ge (111), (100), (110) and (211) wafers - Chemical etching
Ge (111), (100), (110), and (211) wafers - Chemical etching
Ge (111), (100), (110), and (211) wafers - Chemical etching
Ge (111), (100), and (110) wafers - Chemical polishing
Ge (111), (110) and (100) wafers - Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres - Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres - Chemical etching
Ge (111), (110), and (211) wafers - Chemical etching
Ge (111), p- and n-type wafers - Electrolytic polishing
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Electrolytic etching
Ge and Ge alloys, grain-contrast etchant - Chemical etching
Ge and InP (100) and (111) wafers - Chemical thinning
Ge as alloy junction transistors - Molten flux polishing
Ge as alloyed p-n junctions devices - Chemical etching
Ge as cut cubes oriented (001)/(001)(110)/(110) - Chemical polishing
Ge as devices with evaporated metal contacts - Contact etching
Ge as polyerystalline spheres - Thermal forming
Ge as single crystal - Chemical polishing/etching
Ge as single crystal spheres - Chemical polishing
Ge as single crystal spheres - Molten flux etching
Ge as surface barrier diodes - Chemical etching
Ge both p- and n-type specimens - Electrolytic etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Ge hemispheres used in a preferential etching study
Ge ingot - Alkali, cutting
Ge n-p-n transistors - Electrolytic etching
Ge n-type wafers - Chemical polishing
Ge p-n diffused diode - Electrolytic etching
Ge p-n-p transistors - Acid passivation
Ge p-n-p transistors - Electrolytic passivation
Ge polycrystalline spheres - Gas cleaning
Ge samples - Irradiation
Ge single crystal - Acid, cover
Ge single crystal hemispheres - Chemical etching
Ge single crystal specimens
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal wire filaments - Electrolytic shaping
Ge single cyrstal spheres - Chemical etching
Ge specimens
Ge specimens - Acid oxidation
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical oxidation
Ge specimens - Chemical polishing
Ge specimens - Electrolytic etching
Ge specimens - Electrolytic etching
Ge specimens - Electrolyticlytic removing
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Metal, optics
Ge specimens - Power, plasticity
Ge sphere - Chemical etching
Ge spheres of single crystal germanium and silicon - Chemical polishing
Ge thin films - Dislocation etching
Ge thin films evaporated on GaAsCr (SI) substrates - Chemical cleaning
Ge thin films evaporated on GaAsCr (SI) substrates - Chemical etching
Ge thin films evaporated on Si, Al, Al2O3, GaAs, C substrate - Physical etching
Ge wafers - Chemical etching
Ge wafers - Chemical etching
Ge wafers - Chemical etching
Ge wafers - Chemical etching
Ge wafers - Chemical polishing
Ge wafers - Chemical polishing/etching
Ge wafers - Chemical thinning
Ge wafers - Metal, contamination
Ge wafers doped with copper - Chemical polishing
Ge wafers of different orientations - Chemical cleaning
Ge wafers of different orientations - Dislocation etching
Ge wafers studied for neutron irradiation effects
Ge wafers used as substrates - Chemical polishing
Ge(x)Se(1-x) thin films - Chemical etching - General microstructure
Ge(x)Se(x-1) thin films - Chemical etching - General microstructure
Ge-In alloys - Chemical etching
Ge-In alloys with Ag, Au, Bi, and Cu additions, grain boundary etchant - Chemical etchant
Ge-Si alloys - Chemical etching - General microstructure
Ge-Zn eutectic - Chemical etching - General microstructure
Ge2O3, DC sputtered thin films - Chemical etching - General microstructure
Ge3N4 and Ge3O(1-x)N(x) - Chemical etching - General microstructure
Ge3N4 and Ge3OxNy thin films - Chemical etching - General microstructure
Ge3N4 thin films-Gas densification
GeAs (111) wafer - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeO glass - Alcohol cleaning
GeO2 as glass blanks - Chemical cleaning
GeO2 thin films-Gas forming
GeS single crystal platelets - Chemical cleaning
GeTe single crystal specimens - Chemical etching - General microstructure
Germanium - Chemical etching
Germanium - Chemical etching
Germanium - Chemical etching
Germanium - Chemical etching
Germanium - Chemical etching - General microstructure
Germanium - Chemical etching - General microstructure
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing and etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Electrolytic etching - General microstructure
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Etch pits etching
Germanium - Etch pits on (111) face
Germanium - Etch pits on n-type (111) face
Germanium - Etchant for revealing twin planes
Germanium - Final chemical polishing
Germanium - For removal of surface damage
Germanium - Ge and its alloys - Grain boundaries
Germanium - Ge and its alloys - Grain contrast
Germanium - Ge and its alloys, GaAs, InAs, Al As - Grain boundaries, dislocations on (111) planes
Germanium - Ge, Te, Se, telurides, selenides and Zr silicide - General microstructure
Germanium - Ge-In alloys with Ag, Au, Bi, Cu additions - General microstructure
Germanium - Jet polishing, chemical polishing
Germanium - Jet thinning by chemical polishing
Germanium - Removal of work damage by ethching
Germanium - Se, Ge, and their alloys, InAs, InSb, GaSb, GaAs, AlSb, ZnTe, CdTe, InP
Germanium - Si, Ge, and their alloys
Germanium - Si, Ge, and their alloys
Germanium - Si, Ge, and their alloys, GaSb, InSb
Germanium telluride (GeTe) - Chemical etching - General microstructure
Peroxide etchant (on germanium) - Ge (100) wafers - Chemical etching
Pure Ge and Ge alloys - Chemical etching - General macrostructure
Pure Ge and Ge alloys - Electrolytic etching - General microstructure
SR4 etchant - Ge (111) wafers - Chemical polishing/etching
Sirtl's etchant - For Ge
Superoxal etchant - Germanium - Etch pits etching
Superoxol No. 2 etchant - Ge hemispheres - Chemical etching
Superoxol No. 2 etchant, dilute - Ge hemispheres - Chemical etching
Superoxol etchant - For Ge - Chemical etching
Superoxol etchant - Ge (111) wafers - Chemical etching
Superoxol etchant - Ge (111) wafers lithium diffused - Chemical etching
Superoxol etchant - Ge specimens - Chemical etching
Superoxol etchant - Germanium - Dislocation etching
Superoxol etchant, modified - Germanium - Chemical etching - General microstructure
Superoxol etchant, varity - Ge hemispheres - Chemical etching
WAg etchant - Ge (111) wafers - Chemical etching
WAg etchant - Ge hemispheres - Chemical etching
Westinghouse W Ag etchant - Ge and Ge alloys - Chemical etching
Westinghouse silver etchant - Germanium - Dislocation etching
Westinghouse silver etchant WAG - Ge
Westinghouse's silver etchant WAG - Germanium - Etch pits etching
White's etchant - Ge (111) wafers - Chemical etching
X-l114 etchant - Ge (111) wafers - Chemical polishing
a-Ge as thin film material deposited on NaCl (100) substrates - Float-off
a-Ge evaporated on fused quartz blanks
a-Ge thin film grown on NaCl-Acid, float-off
a-Ge thin films deposited on NaCl - Acid, float-off
a-Ge-H and a-Si-H hydrogenated thin films - Chemical cleaning/etching

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