Etchants for Indium and Alloys

4 InO31 SnO2 specimens - Chemical etching - General microstructure
4In2O3-1SnO2 as thin film surface coatings - Chemical etching - General microstructure
6.6.1 etchant - For etch pits on InP, InPAs, GeInPAs
A/B etchant - InAs (111), (110) and (100) wafers - Chemical etching
A/B etchant - InP (TTT)B wafers - Chemical etching
AB etchant, modified - Indium phosphide (InP) - Chemical etching - General microstructure
Allen's etchant - InSb (111) wafers - Chemical polishing
BCK-111 etchant - InP (100) wafers - Chemical etching
BPK-221 etchant - InP (100) wafers - Chemical etching
BRM etchant - InP (100) n-type wafers - Chemical polishing
CP4 etchant - InSb (111) wafers - Chemical polishing
CP4 etchant, modified - InAs (111) wafers used in a polarity study - Chemical etching
CP4, variety CP4A etchant - InSb (111) wafers and other orientation - Chemical polishing
CP4A etchant - InSb (111) wafers - Chemical etching - General microstructure
Etchant No. 2 - InSb (100) and (110) wafers - Chemical etching
H100 etchant - InSb (111) wafers - Chemical etching
Huber and Linh's H etchant - For etch pits on InP
Hydal's etchant - For InBiSn
In (100) wafers - Chemical etching - General microstructure
In and lean alloys - Chemical etching
In as pellets - Chemical cleaning
In preform sheet alloyed on germanium (111) wafer - Chemical etching - General microstructure
In rich alloys - Chemical etching
In single crystal ingot - Chemical etching - General microstructure
In single crystal wires - Electrolytic etching - General microstructure
In specimens - Chemical etching - General microstructure
In, In-Sb and In-As alloys - Chemical etching
In-Bi alloys - Chemical etching
In-Bi alloys - Chemical etching - General microstructure
In-Bi eutectic alloy specimen - Chemical etching - General microstructure
In-Bi-Sn alloys - InBi-BiSn subsystem
In-Fe alloys - Chemical etching - General microstructure
In-Ga-As system - Preferential etch to delineate from Gallium arsenide
In-La system - Electrolytic polishing
In-Sb alloys - Chemical etching
In-Sb alloys - Chemical etching
In-Sb alloys - Chemical etching - General microstructure
In-Sb system - For revealing the segregation
In-Sb-Pb alloys - Chemical etching - General microstructure
In-Sn-Te alloy - In2Te3-SnTe section
In-Te-Bi alloys - In2Te3-Bi2Te3 section
In-Te-Bi alloys - InTe-InBi system
In-Ti alloys - Electrolytic etching
In-Zn alloys - Chemical etching
In-Zn alloys - Chemical etching - General microstructure
In203 specimens - Chemical etching - General microstructure
In2O3 (1010) deposited oriented thin film - Chemical etching - General microstructure
In2O3 (1010) grown as an oriented thin film - Chemical etching - General microstructure
In2O3 (1010) oriented thin films - Chemical etching - General microstructure
In2O3 as thin film - Chemical etching - General microstructure
In2O3 specimens - Chemical etching - General microstructure
In2O3 specimens - Chemical etching - General microstructure
In2Te3 specimens - Chemical polishing
In2Tl3 single crystal ingots - Chemical polishing
In5Bi3 single crystal specimens - Chemical polishing
InAs (100) n-type wafers - Chemical polishing
InAs (100), n-type wafers - Chemical etching - General microstructure
InAs (110), n-type wafers - Chemical polishing
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Dislocation etching
InAs (111) wafers and other orientations - Thermal processing
InAs (111) wafers used in X-ray studies - Chemical etching - General microstructure
InAs specimens - Chemical cleaning
InAs specimens - Chemical etching - General microstructure
InAs(x)P(x-1) polycrystalline ingot - Chemical polishing
InGaAs (001) thin film - Chemical etching - General microstructure
InGaAs (100) wafer - Chemical cleaning
InGaAsP as thin film layers - Chemical etching - General microstructure
InGaAsP epitaxy thin films - Chemical etching - General microstructure
InGaAsP thin film layer grown by LPE - Chemical etching - General microstructure
InGaSb deposited as a thin film on BaF2 substrate (111) - Chemical thinning
InGe used as a deposited Au/InGe alloy contact on (100) InP and GaAs wafers - Chemical etching
InP (100) Sn doped wafers - Chemical etching - General microstructure
InP (100) Zn doped p-type wafers - Chemical etching - General microstructure
InP (100) cleaved wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical cleaning
InP (100) n-type wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical native oxide removal
InP (100) n-type wafers - Chemical polishing
InP (100) p-type wafers - Chemical etching - General microstructure
InP (100) tin-doped, n-type wafer - Chemical etching - General microstructure
InP (100) wafer - Chemical etching - General microstructure
InP (100) wafer - Chemical etching - General microstructure
InP (100) wafer fabricated as Schottky diodes - Chemical polishing
InP (100) wafer substrates - Halogen, grooving
InP (100) wafer used as a substrate - Acid oxidation
InP (100) wafers - Chemical cleaning
InP (100) wafers - Chemical etching - A/B etchant, modified
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing/etching
InP (100) wafers - Chemical thinning
InP (100) wafers - Electrolytic etching - General microstructure
InP (100) wafers - Electrolytic etching - General microstructure
InP (100) wafers - Electrolyticlytic oxidizing
InP (100) wafers - Acid, stain
InP (100) wafers - Ionized gas
InP (100) wafers - Ionized gas, removal
InP (100) wafers - Physical etrching
InP (100) wafers - Thermal cleaning
InP (100) wafers Cut 3?-off toward (110) - Chemical polishing
InP (100) wafers cut within 1? of plane - Chemical polishing
InP (100) wafers fabricated as Schottky diodes - Junction stain
InP (100) wafers used as substrates - Chemical etching - General microstructure
InP (100) wafers used as substrates for InP epitaxy - Chemical etching - General microstructure
InP (100) wafers used as substrates for LPE deposition of InGaAsP - Chemical etching - General microstructure
InP (100) wafers used as substrates for LPE of InGaAsP - Chemical etching - General microstructure
InP (100) wafers used for epitaxy growth of InGaAs/InGaAsP - Metal, etch-back
InP (100) wafers used for zinc deposition and anneal - Chemical thinning
InP (100) wafers used in a dislocation study - Dislocation etching
InP (100) wafers with channels in (011) and (011) directions - Chemical etching - General microstructure
InP (100) wafers with or without thin film InGaAsP epitaxy - Chemical etching - General microstructure
InP (100) wafers, S doped n-type - Ionized gas cleaning
InP (100) wafers, Zn doped p-type - Chemical etching - General microstructure
InP (100), n-type, 0.3-0.4 Ohm cm resistivity, and p-type, 7-8 Ohm cm wafers - Chemical cleaning
InP (110) wafer cleaved under UHV - Chemical polishing
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical polishing
InP (111) wafers grown by LEC - Chemical etching - General microstructure
InP (111) wafers grown by LEC - Chemical polishing
InP (111)A and (100) wafers - Chemical etching - General microstructure
InP - Dislocation etching
InP ingot cut longitudinally on the (112) axis - Dislocation etching
InP ingot grown by LEC doped with both Ga and Sb - Dislocation etching
InP p-type single crystal wafers - Chemical polishing
InP-Fe (100) (SI) wafers - Chemical polishing
InP-Fe (100) wafers - Chemical cleaning
InPFe (100) (SI) wafers - Chemical etching - General microstructure
InPFe (100) (SI) wafers - Chemical etching - General microstructure
InPFe (100) (SI) wafers - Chemical etching - General microstructure
InPFe (100) (SI) wafers - Chemical polishing
InPFe (100) n-type wafers - InPFe (100) n-type wafers
InPFe (100) wafers - Chemical cleaning
InPFe (100) wafers used as substrates for MISFETT and EMISFET device fabrication - Chemical etching
InPFe (100) wafers within 5? of plane - Chemical etching - General microstructure
InPZn epitaxy film grown by LPE - Chemical etching - General microstructure
InS (100) and (110) wafers - Chemical polishing
InSb (001) wafers - Alcohol cleaning
InSb (100) and (110) wafers - Chemical etching - Etchant No. 1
InSb (100) n-type wafers - Chemical etching - General microstructure
InSb (100) n-type wafers used in a study of adsorption coefficients
InSb (100) n-type wafers zinc diffused - Chemical cleaning
InSb (100) wafers - Chemical etching - General microstructure
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Ionized gas cleaning
InSb (100) wafers - Oxide removal
InSb (100) wafers and other orientations - Chemical polishing
InSb (100), (111)A and (111)B oriented wafers - Chemical etching - General microstructure
InSb (110) n-type and (100) p-type wafers - Chemical polishing
InSb (111) p-type wafers - Chemical polishing
InSb (111) specimens - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - /polishing
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Electrolytic anodization
InSb (111) wafers - Electrolyticlytic anodizing
InSb (111) wafers - Thermal etching
InSb (111) wafers - Ketone cleaning
InSb (111), (112) and other bulk orientations - Chemical polishing
InSb (111)A, (TTT)B and (100) wafers - Chemical cleaning
InSb (311) and (110) wafers - Electrolytic polishing
InSb (311) wafers - Chemical etching - General microstructure
InSb (311) wafers - Chemical polishing
InSb - Dislocation etching
InSb - Dislocation etching
InSb - Etchant for revealing twin planes
InSb cylinder - Chemical etching - General microstructure
InSb specimen - Chemical etching - General microstructure
InSb specimens - Etchant for revealing twin lamellae by staining (211) and etching the (211)
InSb thin films - Chemical polishing
InSb-Te (111) n-type wafers - Chemical cleaning
InSe (0001) as hand cleaved wafers - Chemical etching - General microstructure
InSn alloy specimen - Electrolytic etching - General microstructure
InSnO2 single crystal - Acid, flux, removal
Indium - Dislocation etching
Indium - Electrolytic mechanical polishing
Indium - Electrolytic polishing
Indium - Electrolytic polishing
Indium - Electrolytic polishing
Indium - Electrolytic polishing
Indium - Electrolytic thinning
Indium - For etch pits etching
Indium - In and In rich alloys - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical polishing
Indium antimonide (InSb) - Chemical polishing
Indium antimonide (InSb) - Chemical polishing and etching
Indium antimonide (InSb) - Chemical polishing and etching
Indium antimonide (InSb) - Electrolytic polishing
Indium antimonide (InSb) - Etch pit etching
Indium antimonide (InSb) - For etch pits
Indium antimonide (InSb) - Shallow etch pits are produced on (111) face
Indium arsenide (InAs) - Chemical etching
Indium arsenide (InAs) - For etch pits
Indium arsenide (InAs) - For revealing the defect density
Indium oxide (In2O3) - Etch pits etching
Indium phosphide (InP) - Chemical etching - General microstructure
Indium phosphide (InP) - Chemical etching - General microstructure
Indium phosphide (InP) - Chemical etching - General microstructure
Indium phosphide (InP) - Chemical polishing
Indium phosphide (InP) - Chemical polishing
Indium phosphide (InP) - Chemical polishing and etching
Indium phosphide (InP) - Chemical thinning
Indium phosphide (InP) - Dislocation etching
Indium phosphide (InP) - Dislocation etching
Indium phosphide (InP) - Etch for dislocations on (111)P, (100) and (110) faces
Indium phosphide (InP) - Etch pit etch for (111) face
Indium phosphide (InP) - Etch pits etch for (111) faces
Indium phosphide (InP, (001) face) - Chemical polishing
Indium phosphide arsenide (InP(x)As(1-x)) - Etching for etch pits
Indium single crystal - Chemical etching and polishing
Indium specimens - Chemical etching - General microstructure
Insb (111) wafers - Chemical etching - General microstructure
KKI etchant - InP (100) wafers - Chemical etching
Marble's etchant - In-Ni eutectoid (30% Ni) - Chemical ecthing
Pure In - Electrolytic etching
R5In2 grown as single crystals - Chemical etching - General microstructure
Superoxol - InP (100) Zn doped p-type wafers - Chemical polishing
Superoxol etchant - InAs (111) wafers - Chemical etching
Superoxol etchant - InSb (111) wafers - Chemical etching
Vilella's etchant - In and lean alloys - Chemical etching
Vilella's etchant - In-Cd alloys - Chemical ecthing
Vilella's etchant - Indium specimens - Chemical etching - General microstructure

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