Micro Etchants

(Al, Ti)C carbide - Chemical etching - General microstructure
(Al, Ti)N specimens - Chemical etching - General microstructure
(Al,Ti)C, VC - Chemical etching - General microstructure
(Al,Ti)N, AlN-Y2O3, TiN - Chemical etching - General microstructure
(Fe, Al)S samples - Chemical etching - General microstructure
(Fe, Si)C carbide - Chemical etching - General microstructure
(Ga,Al)As-Be p-type thin films - Chemical etching
(RE)N12 specimens - Chemical etching - General microstructure
(Th, U)C with a U/Th ratio of less than 3ThC2 - Chemical etching - General microstructure
(Th, U)C2 carbide - Chemical etching - General microstructure
(Th, U)C2 carbide - Chemical etching - General microstructure
(U,Pu)C - Chemical etching - General microstructure
(Y2O3)m(ZrO2)(1-m) (100) wafers - Chemical polishing
0.3P bearing stainless steel - Fe-18Cr-10Ni-0.3P
0.52C-15Cr steel - Chemical etching - General microstructure
100 etchant - Ge (100) wafers - Chemical etching
100Cr6 steel - Carbide contrasting
1045 forged steel - Chemical etching
1212 steels - Chemical etching
14CrMOV6-3 steel - Sample preparation
14MoV6-3 steel - Electrolytic-potentiostatic isolation of residues
15% Shibuichi - Sterling silver BiMetalb (Au-Ag) - One layer Shibuichi, one layer Sterling silver
17-4-PM stainless steel - 0.04C-16.5Cr-3.6Cu-4.25Ni-0.25Mn
18% Ni maraging steels - Chemical etching
18-8 type 304 stainless steel - Chemical etching - General microstructure
18/8 Stainless steels - Etching for delta ferrite
18/8 Stainless steels - Etching for delta ferrite
18/8 Stainless steels - Etching for delta ferrite
18/8 Stainless steels - Etching for delta ferrite
18/8 Stainless steels - Etching for delta ferrite
18/8 Stainless steels - Etching for delta ferrite
18/8 Stainless steels - Etching for delta ferrite
18/8 and 13-30% Cr steels - Revelas the grain boundaries of the matrix
18/8 stainless steels - Etching for delta ferrite
111 etchant - Ge (111) and Si (111) wafers - Chemical polishing/etching
20-20 and 25-20 Cr-Ni steels - For distinguishing carbides and sigma phase
22K/Sterling silver BiMetal (Au-Ag) - Alloy composition in the weight % 12.5% 22K gold, 87.5% sterling silver
22k gold-Au - Chemical etching
2XXX and 7XXX Al alloys - Chemical etching
3% Si-Fe specimen - Electrolytic polishing
3% Silicon iron - Electrolytic polishing
310 stainless steel - Fe-25Cr-21Ni-1.3Mn-0.7Si-0.3Mo-0.25Cu-0.04C
316 stainless steel - Fe-16/18Cr-10/14Ni-2/3Mo-max.2Mn-max.1Si (+ < 0.08 C)
316 stainless steels - Potentiostatic etching
347 stainless steel - Chemical etching
4 InO31 SnO2 specimens - Chemical etching - General microstructure
4FeO.2Fe2O3.2Si02.4H2O, (001) cleaved wafers - Dislocation etching
4In2O3-1SnO2 as thin film surface coatings - Chemical etching - General microstructure
5% Al and 2.5% Sn and Ti, 6% Al, and 3% Sn and Ti alloys - Chemical etching
51 etchant - GaAs (111) wafer - Chemical etching
6.6.1 etchant - For etch pits on InP, InPAs, GeInPAs
6061 aluminum - EBSD sample preparation
60Pb-40Sn #62 solder - Chemical cleaning
68Ni-31.9Fe-0.1Mg and 63Ni-35Fe-2Mo single crystals - Chemical etching
6XXX Al alloys - Chemical etching
718 alloy - Ni-0.03C-19Cr-3Mo-18Fe-0.6Al-1Ti-5Nb+Ta
72Fe-5.5Al-22Cr-0.5Co Kanthal - Chemical etching - General microstructure
79Ni-17Fe-44Mo (111) oriented Permalloy wafers - Electrolytic polishing
79Ni-17Fe-4Mo Permalloy single crystal specimens - Chemical polishing
7XXX Al alloys - Chemical etching
92.5.3 etchant - Steel for high temperatures
A etchant
A non electrolytic etchant for Kovar - Chemical etching - General microstructure
A/B etchant - Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks
A/B etchant - GaAs (111) wafers with zinc diffusion - Chemical etching
A/B etchant - GaSb (100) wafers Te-doped - Chemical etching
A/B etchant - InAs (111), (110) and (100) wafers - Chemical etching
A/B etchant - InP (TTT)B wafers - Chemical etching
AB etchant (RCA) - Glass-thin film deposition and growth - Chemical cleaning
AB etchant, diluted - Alminium gallium arsenide (Al(x) Ga(1-x) As) - Dislocation etching
AB etchant, modified - Gallium arsenide
AB etchant, modified - Indium phosphide (InP) - Chemical etching - General microstructure
ABS, HIPS and PPO - Chemical etching
AFC 77 martensitic stainless steel - Chemical etching
AG-21's etchant for superalloy - Chemical etching
AHA etchant - For GaAs
AISI 304 steel - Dislocation etching
AISI 316 stainless steel - Fe-0.06C-<2Mn-<1Si-10/14Ni-16/18Cr
AISI 316 stainless steel - Fe-17.5Cr-10Ni-2.5Mo-2Mn-0.5Si-0.1C
AISI 321 stainless steel - Fe-18Cr-8Ni-0.4Ti
AISI 347 stainless steel - Fe-18Cr-8Ni-0.4Nb
AISI 4140N steel - Chemical etching
AISI T410 martensitic stainless steel - Revealing the grain size
ASTM dislocation etchant - Dislocation etching
ASTM etchant No. 1 - For Al base alloys
ASTM etchant No. 10 - Beryllium - Chemical etching
ASTM etchant No. 10 - For Be
ASTM etchant No. 10 - Ni superalloys - Chemical etching
ASTM etchant No. 100 - Fe + 12-20 Cr + 4-10 Ni + <7% steels - Chemical etching
ASTM etchant No. 100 - Ferric chloride - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 100 - Non stainless maraging steels - Chemical etching
ASTM etchant No. 101 - Chrome regia - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 101 - Fe + 15-30 Cr + 6-40 Ni + <5% steels - Chemical etching
ASTM etchant No. 102 - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 102 - Fe + 15-30 Cr + 6-40 Ni + <5% steels - Electrolytic etching
ASTM etchant No. 103 - Fe + 16-25 Cr + 3-6 Ni + 5-1C
ASTM etchant No. 103 - Fe + 16-25 Cr + 3-6 Ni + 5-1C steels - Chemical etching
ASTM etchant No. 103 - Fe + 16-25 Cr + 3-6 Ni + 5-1C steels - Chemical etching
ASTM etchant No. 104 - Fe + 16-25 Cr + 3-6 Ni + 5-1C steels - Chemical etching
ASTM etchant No. 104 - Fe + 16-25 Cr + 3-6 Ni + 5-1C steels - Chemical etching
ASTM etchant No. 104 - Frank's etchant - Fe + 16-25 Cr + 3-6 Ni + 5-1C
ASTM etchant No. 105 - 92-5-3 etchant - Steel for high temperatures
ASTM etchant No. 105 - High temperature steels - Chemical etching
ASTM etchant No. 105 - Ni superalloys - Chemical etching
ASTM etchant No. 106 - High temperature steels - Chemical etching
ASTM etchant No. 106 - Steel for high temperatures
ASTM etchant No. 107 - E-etchant (EI-IR etchant) - Steel for high temperatures
ASTM etchant No. 107 - High temperature steels - Electrolytic etching
ASTM etchant No. 107 - Ni superalloys - Electrolytic etching
ASTM etchant No. 107 - Ni superalloys - Electrolytic etching
ASTM etchant No. 107 - Ni-Fe alloys - Electrolytic etching
ASTM etchant No. 108 - High temperature steels - Electrolytic etching
ASTM etchant No. 108 - Pure Ni and high Ni alloys - Electrolytic etching
ASTM etchant No. 108 - Steel for high temperatures
ASTM etchant No. 109 - HCl-HNO3-CuCl2 x H2O - Non stainless maraging steels
ASTM etchant No. 109 - Non stainless maraging steels - Chemical etching
ASTM etchant No. 11 - Beryllium - Chemical etching
ASTM etchant No. 11 - For Be allloys
ASTM etchant No. 11 - Ti alloys - Chemical etching
ASTM etchant No. 110 - Tool steels
ASTM etchant No. 110 - Tool steels - Chemical etching
ASTM etchant No. 111 - Fe superalloys - Electrolytic etching
ASTM etchant No. 111 - Iron
ASTM etchant No. 111 - Ni superalloys - Chemical etching
ASTM etchant No. 112 - Pb + Ca alloys - Chemical etching
ASTM etchant No. 112 - Pb+Ca alloys
ASTM etchant No. 113 - Pb + Ca alloys - Chemical etching
ASTM etchant No. 113 - Acetic/nitric - Pb + <2 Sb alloys
ASTM etchant No. 113 - Pb + >2 Sb alloys - Chemical etching
ASTM etchant No. 114 - Acetic/nitric - Pb + <2 Sb alloys
ASTM etchant No. 114 - Pb + >2 Sb alloys - Chemical etching
ASTM etchant No. 114Pb + <2 Sb alloys - Chemical etching
ASTM etchant No. 115 - Pb + <2 Sb alloys
ASTM etchant No. 115 - Pb + <2 Sb alloys - Chemical etching
ASTM etchant No. 116 - Pb alloys
ASTM etchant No. 116 - Pb alloys - Chemical etching
ASTM etchant No. 116 - Sn-Pb alloys - Chemical etching
ASTM etchant No. 117 - Sn-Fe
ASTM etchant No. 117a - Sn-Fe alloys - Chemical etching
ASTM etchant No. 117b - Pb alloys - Chemical etching
ASTM etchant No. 118 - Glycol - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 118 - Magnesium - Chemical etching
ASTM etchant No. 118 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 118 - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 118 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 119 - Acetic glycol - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 119 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 119 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 119 - Mg-Mn alloys - Chemical etching
ASTM etchant No. 119 - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 119 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 119 - Pure magnesium - Chemical etching
ASTM etchant No. 12 - Aqua regia - For chromium base alloys
ASTM etchant No. 12 - Chromium - Chemical etching
ASTM etchant No. 12 - Ni superalloys - Chemical etching
ASTM etchant No. 120 - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 120 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 120 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 120 - Mg-Rare Earth-Zr alloys - Chemical etching
ASTM etchant No. 120 - Mg-Zn-Th-Zr alloys - Chemical etching
ASTM etchant No. 120 - Pure magnesium - Chemical etching
ASTM etchant No. 121 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 121 - Mg-Rare Earth-Zr alloys - Chemical etching
ASTM etchant No. 121 - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 121 - Mg-Zn-Th-Zr alloys - Chemical etching
ASTM etchant No. 121 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 121 - Phospho picral - Mg-Al, Mg-Al-Zn (Al + Zn >5%
ASTM etchant No. 121 - Pure magnesium - Chemical etching
ASTM etchant No. 122 - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 122 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 122 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 122 - Mg-Mn alloys - Chemical etching
ASTM etchant No. 122 - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 122 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 122 - Pure magnesium - Chemical etching
ASTM etchant No. 123 - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 123 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Electrolytic etching
ASTM etchant No. 123 - Pure magnesium - Electrolytic etching
ASTM etchant No. 124 - Acetic-picral - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 124 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 124 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 124 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 124 - Mg-Mn alloys - Chemical etching
ASTM etchant No. 124 - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 124 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 125 - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 125 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 125 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 125 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 125 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 126 - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 126 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 126 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 126 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 126 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 127 - Acetic-picral - Mg-Al, Mg-Al-Zn (Al + Zn <5%
ASTM etchant No. 127 - Mg-Al, Mg-Al-Zn (Al + Zn <5% alloys - Chemical etching
ASTM etchant No. 127 - Mg-Al, Mg-Al-Zn (Al + Zn 5% alloys - Chemical etching
ASTM etchant No. 127 - Mg-Al, Mg-Al-Zn (Al + Zn >5% alloys - Chemical etching
ASTM etchant No. 127 - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 127 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 128 - Mg-Zn-Zr
ASTM etchant No. 128 - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 129 - Molybdenum
ASTM etchant No. 129 - Molybdenum - Chemical etching
ASTM etchant No. 129 - Molybdenum - Chemical etching
ASTM etchant No. 129 - Molybdenum - Chemical etching
ASTM etchant No. 129 - Niobium - Chemical etching
ASTM etchant No. 129 - Niobium - Chemical etching
ASTM etchant No. 13 - Oxalic acid - For Cr base alloys
ASTM etchant No. 130 - Molybdenum
ASTM etchant No. 130 - Molybdenum - Chemical etching
ASTM etchant No. 130 - Molybdenum - Electrolytic etching
ASTM etchant No. 131 - Molybdenum
ASTM etchant No. 131 - Molybdenum - Electrolytic etching
ASTM etchant No. 131 - Molybdenum - Electrolytic etching
ASTM etchant No. 131 - Tungsten - Electrolytic etching
ASTM etchant No. 131 - Tungsten - Electrolytic etching
ASTM etchant No. 132 - Molybdenum
ASTM etchant No. 132a - As cast molybdenum - Chemical etching
ASTM etchant No. 132a - As cast tungsten - Chemical etching
ASTM etchant No. 133 - Ni superalloys - Chemical etching
ASTM etchant No. 133 - Ni-Ti
ASTM etchant No. 133 - Ni-Ti alloys - Chemical etching
ASTM etchant No. 133 - Pure Ni and high Ni alloys - Chemical etching
ASTM etchant No. 134 - Ni-Cr
ASTM etchant No. 134 - Ni-Cr alloys - Electrolytic etching
ASTM etchant No. 134 - Ni-Fe alloys - Electrolytic etching
ASTM etchant No. 134 - Pure Ni and high Ni alloys - Electrolytic etching
ASTM etchant No. 135 - Pure Ni and high Ni alloys
ASTM etchant No. 135 - Pure Ni and high Ni alloys - Chemical etching
ASTM etchant No. 136 - Pure Ni and high Ni alloys
ASTM etchant No. 136 - Pure Ni and high Ni alloys - Chemical etching
ASTM etchant No. 137 - Pure Ni and high Ni alloys
ASTM etchant No. 137 - Pure Ni and high Ni alloys - Electrolytic etching
ASTM etchant No. 138 - Carapella's etchant - Ni-Ag
ASTM etchant No. 138 - Ni superalloys - Chemical etching
ASTM etchant No. 138 - Ni-Ag alloys - Chemical etching
ASTM etchant No. 139 - Ni-Ag
ASTM etchant No. 139 - Ni-Ag alloys - Chemical etching
ASTM etchant No. 13a - Fe + 15-30 Cr + 6-40 Ni + <5% - Electrolytic etching
ASTM etchant No. 13a - Ni superalloys - Electrolytic etching
ASTM etchant No. 13a - Ni-Cr alloys - Electrolytic etching
ASTM etchant No. 13b - Fe + 15-30 Cr + 6-40 Ni + <5% steels - Electrolytic etching
ASTM etchant No. 13b - Rhenium - Electrolytic etching
ASTM etchant No. 13c - Chromium - Electrolytic etching
ASTM etchant No. 14 - For Co
ASTM etchant No. 14 - Tool steels - Chemical etching
ASTM etchant No. 140 - Ni-Al
ASTM etchant No. 140 - Ni-Al alloys - Chemical etching
ASTM etchant No. 140 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 141 - Contrast etchant - Ni-Al
ASTM etchant No. 141 - Ni-Al alloys - Chemical etching
ASTM etchant No. 141 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 142 - Ni-Al
ASTM etchant No. 142 - Ni-Al alloys - Electrolytic etching
ASTM etchant No. 143 - Ni-Al
ASTM etchant No. 143 - Ni-Al alloys - Chemical etching
ASTM etchant No. 143 - Ni-Mo alloys - Chemical etching
ASTM etchant No. 143 - Ni-Ti alloys - Chemical etching
ASTM etchant No. 144 - Ni-Cr
ASTM etchant No. 144 - Ni-Cr alloys - Electrolytic etching
ASTM etchant No. 145 - Ni-Cr
ASTM etchant No. 145 - Ni-Cr alloys - Electrolytic etching
ASTM etchant No. 146 - Ni-Cr
ASTM etchant No. 146 - Ni-Cr alloys - Chemical etching
ASTM etchant No. 147 - Ni-Cr
ASTM etchant No. 147 - Ni-Cr alloys - Chemical etching
ASTM etchant No. 148 - Ni-Fe
ASTM etchant No. 148 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 149 - Ni-Fe
ASTM etchant No. 149 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 15 - For Co
ASTM etchant No. 150 - Ni-Fe
ASTM etchant No. 150 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 151 - Ni-Ti
ASTM etchant No. 151 - Ni-Ti alloys - Chemical etching
ASTM etchant No. 152 - Ni-Zn
ASTM etchant No. 152 - Ni-Zn alloys - Chemical etching
ASTM etchant No. 153 - Ni superalloys
ASTM etchant No. 153 - Ni superalloys - Chemical etching
ASTM etchant No. 154 - Ni superalloys
ASTM etchant No. 154 - Ni superalloys - Chemical etching
ASTM etchant No. 154 - Ni superalloys - Chemical etching
ASTM etchant No. 155 - Beraha's E etchant - Ni superalloys
ASTM etchant No. 155 - Ni superalloys - Chemical etching
ASTM etchant No. 156 - Ni superalloys
ASTM etchant No. 156 - Ni superalloys - Electrolytic etching
ASTM etchant No. 157 - Hastelloy-W - Chemical etching
ASTM etchant No. 157 - Ni Hastelloy-W
ASTM etchant No. 158 - Niobium
ASTM etchant No. 158 - Niobium - Chemical etching
ASTM etchant No. 158 - Niobium - Chemical etching
ASTM etchant No. 158 - Ta alloys - Chemical etching
ASTM etchant No. 158 - Tantalum - Chemical etching
ASTM etchant No. 158 - Ti alloys - Chemical etching
ASTM etchant No. 159 - Niobium
ASTM etchant No. 159 - Niobium - Chemical etching
ASTM etchant No. 159 - Niobium - Chemical etching
ASTM etchant No. 159 - Ta alloys - Chemical etching
ASTM etchant No. 159 - Tantalum - Chemical etching
ASTM etchant No. 16 - Co high temperature alloys - Electrolytic etching
ASTM etchant No. 16 - Fe as residual metal in vacuum systems - Chemical cleaning
ASTM etchant No. 16 - Hydrochloric acid - For Co, high temperature alloys
ASTM etchant No. 160 - Niobium
ASTM etchant No. 160 - Niobium - Chemical etching
ASTM etchant No. 160 - Niobium - Chemical etching
ASTM etchant No. 160 - Niobium - Chemical etching
ASTM etchant No. 161 - Niobium
ASTM etchant No. 161 - Niobium - Chemical etching
ASTM etchant No. 161 - Niobium - Chemical etching
ASTM etchant No. 161 - Ta alloys - Chemical etching
ASTM etchant No. 161 - TaN thin films - Chemical etching - General microstructure
ASTM etchant No. 161 - Tantalum - Chemical etching
ASTM etchant No. 162 - Niobium
ASTM etchant No. 162 - Niobium - Chemical etching
ASTM etchant No. 162B - Niobium - Chemical etching
ASTM etchant No. 163 - Niobium
ASTM etchant No. 163 - Niobium - Chemical etching
ASTM etchant No. 163 - Niobium - Chemical etching
ASTM etchant No. 163 - Ta alloys - Chemical etching
ASTM etchant No. 163 - Tantalum - Chemical etching
ASTM etchant No. 164 - Niobium
ASTM etchant No. 164 - Niobium - Chemical etching
ASTM etchant No. 164 - Niobium - Chemical etching
ASTM etchant No. 164 - Ta alloys - Chemical etching
ASTM etchant No. 164 - Tantalum - Chemical etching
ASTM etchant No. 164 - Tantalum - Chemical etching
ASTM etchant No. 165 - Vanadium
ASTM etchant No. 165a - Osmium - Electrolytic etching
ASTM etchant No. 165a - Osmium - Electrolytic etching
ASTM etchant No. 165a - Pd alloys - Electrolytic etching
ASTM etchant No. 165a - Pure palladium - Electrolytic etching
ASTM etchant No. 165b - Pure vanadium - Electrolytic etching
ASTM etchant No. 166 - Pd alloys
ASTM etchant No. 166 - Pd alloys - Chemical etching
ASTM etchant No. 166 - Pure palladium - Chemical etching
ASTM etchant No. 167 - Pt alloys
ASTM etchant No. 167 - Pt alloys - Chemical etching
ASTM etchant No. 167 - Pure platinum - Chemical etching
ASTM etchant No. 168 - Pt-10% Rh
ASTM etchant No. 168 - Pt-10% Rh alloy - Chemical etching
ASTM etchant No. 169 - Plutonium
ASTM etchant No. 169 - Plutonium - Electrolytic etching
ASTM etchant No. 17 - For Co
ASTM etchant No. 170 - Rhenium
ASTM etchant No. 170a - Rhenium - Chemical etching
ASTM etchant No. 170a - Ti alloys - Chemical etching
ASTM etchant No. 170a - U Beryllides - Chemical etching
ASTM etchant No. 170b - Pure vanadium - Chemical etching
ASTM etchant No. 171 - Hydrochloric acid - Rhodium
ASTM etchant No. 171 - Rhodium - Electrolytic etching
ASTM etchant No. 172 - Pure Ag
ASTM etchant No. 172 - Pure silver - Chemical etching
ASTM etchant No. 173 - Ag solders
ASTM etchant No. 173 - Ag solders - Chemical etching
ASTM etchant No. 173 - Ag-Pd alloys - Chemical etching
ASTM etchant No. 173 - Pure Ag - Chemical etching
ASTM etchant No. 174 - Ag alloys
ASTM etchant No. 174 - Ag alloys - Chemical etching
ASTM etchant No. 175 - Ag alloys
ASTM etchant No. 175 - Ag alloys - Chemical etching
ASTM etchant No. 176 - Ag solders
ASTM etchant No. 176 - Ag solders - Chemical etching
ASTM etchant No. 177 - Pure tantalum - Chemical etching
ASTM etchant No. 177 - Tantalum
ASTM etchant No. 177 - Tantalum - Chemical etching
ASTM etchant No. 177 - Zn-Co alloys - Chemical etching
ASTM etchant No. 178 - Ta alloys
ASTM etchant No. 178 - Ta alloys - Chemical etching
ASTM etchant No. 178 - Tantalum - Chemical etching
ASTM etchant No. 178 - Ti alloys - Chemical etching
ASTM etchant No. 179 - Ta alloys
ASTM etchant No. 179 - Ta alloys - Chemical etching
ASTM etchant No. 18 - Chromic acid - For Co alloys, high temperature alloys
ASTM etchant No. 18 - Hard-Facing and tool metals - Electrolytic etching
ASTM etchant No. 18 - High temperature alloys - Electrolytic etching
ASTM etchant No. 18 - Ni superalloys - Electrolytic etching
ASTM etchant No. 18 - Pure titanium - Electrolytic etching
ASTM etchant No. 180 - Pure tin - Chemical etching
ASTM etchant No. 180 - Tin
ASTM etchant No. 181 - Pure tin
ASTM etchant No. 181 - Pure tin - Chemical etching
ASTM etchant No. 182 - Sn-Pb
ASTM etchant No. 182 - Sn-Pb alloys - Chemical etching
ASTM etchant No. 183 - Sn coatings (on steel)
ASTM etchant No. 183 - Sn coatings (on steel) - Chemical etching
ASTM etchant No. 183 - Sn-Pb alloys - Chemical etching
ASTM etchant No. 184 - Babbitts
ASTM etchant No. 184 - Sn babbitts - Chemical etching
ASTM etchant No. 185
ASTM etchant No. 186 - Pure titanium
ASTM etchant No. 186 - Pure titanium - Chemical etching
ASTM etchant No. 186 - Ti alloys - Chemical etching
ASTM etchant No. 187 - Kroll's etchant - Ti alloys
ASTM etchant No. 187 - Ti alloys - Chemical etching
ASTM etchant No. 188 - Mg-Al, Mg-Al-Zn (Al + Zn <5 alloys - Chemical etching
ASTM etchant No. 188 - Pure titanium
ASTM etchant No. 188 - Pure titanium - Chemical etching
ASTM etchant No. 188 - Ti alloys - Chemical etching
ASTM etchant No. 189 - Ti-5 Al-2.5 Sn
ASTM etchant No. 189 - Ti-5 Al-2.5 Sn alloys - Chemical etching
ASTM etchant No. 19 - Co Hard-Facing and tool metals - Chemical etching
ASTM etchant No. 19 - Co high temperature alloys - Chemical etching
ASTM etchant No. 19 - Groesbeck's etchant - For Co alloys, high temperature alloys
ASTM etchant No. 190 - Ti-6 Al-6V-2 Sn
ASTM etchant No. 190 - Ti-6 Al-6V-2 Sn alloys - Chemical etching
ASTM etchant No. 191 - Ti-Al-Zr
ASTM etchant No. 191 - Ti-Al-Zr alloys - Chemical etching
ASTM etchant No. 192 - Kroll's etchant - Ti alloys
ASTM etchant No. 192 - Ti alloys - Chemical etching
ASTM etchant No. 192 - Ti alloys - Chemical etching
ASTM etchant No. 192 - Ti-13V-11Cr3 Al (aged) alloys - Chemical etching
ASTM etchant No. 192 - Ti-8Mn alloys - Chemical etching
ASTM etchant No. 193 - Ti-Si
ASTM etchant No. 193 - Ti-Si alloys - Chemical etching
ASTM etchant No. 194 - Ti alloys
ASTM etchant No. 194 - Ti alloys - Chemical etching
ASTM etchant No. 195 - Pure uranium
ASTM etchant No. 195 - Pure uranium - Electrolytic etching
ASTM etchant No. 195 - U alloys - Electrolytic etching
ASTM etchant No. 196 - Pure uranium
ASTM etchant No. 196 - Pure uranium - Chemical etching
ASTM etchant No. 196 - U alloys - Chemical etching
ASTM etchant No. 197 - Pure vanadium
ASTM etchant No. 197 - Pure vanadium - Electrolytic etching
ASTM etchant No. 198 - Pure vanadium
ASTM etchant No. 198 - Pure vanadium - Chemical etching
ASTM etchant No. 198 - V alloys - Chemical etching
ASTM etchant No. 199 - V alloys
ASTM etchant No. 199 - V alloys - Chemical etching
ASTM etchant No. 19b - Ni superalloys - Chemical etching
ASTM etchant No. 1a - Aluminum 1000 series - Chemical etching
ASTM etchant No. 1a - Aluminum 2000 series - Chemical etching
ASTM etchant No. 1a - Aluminum 3000 series - Chemical etching
ASTM etchant No. 1a - Aluminum 4000 series - Chemical etching
ASTM etchant No. 1a - Aluminum 5000 series - Chemical etching
ASTM etchant No. 1a - Aluminum 6000 series - Chemical etching
ASTM etchant No. 1a - Aluminum 7000 series - Chemical etching
ASTM etchant No. 1a - Pure aluminum - Chemical etching
ASTM etchant No. 1b - Pure aluminum - Chemical etching
ASTM etchant No. 1c - Ti alloys - Chemical etching
ASTM etchant No. 1c - Ti alloys - Chemical etching
ASTM etchant No. 1d - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 1d - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 2 - Aluminum 1000 series - Chemical etching
ASTM etchant No. 2 - Aluminum 2000 series - Chemical etching
ASTM etchant No. 2 - Aluminum 5000 series - Chemical etching
ASTM etchant No. 2 - Aluminum 6000 series - Chemical etching
ASTM etchant No. 2 - Aluminum 6000 series - Chemical etching
ASTM etchant No. 2 - Aluminum 7000 series - Chemical etching
ASTM etchant No. 2 - NaOH (Hatch's etchant) - Al alloys
ASTM etchant No. 2 - Pure aluminum - Chemical etching
ASTM etchant No. 20 - Co Hard-Facing and tool metals - Chemical etching
ASTM etchant No. 20 - Co high temperature alloys - Chemical etching
ASTM etchant No. 20 - For Co alloys, high temperature alloys
ASTM etchant No. 200 - Potassium etchant - Pure zinc
ASTM etchant No. 200 - Pure zinc - Chemical etching
ASTM etchant No. 201 - Zn-Cu
ASTM etchant No. 201 - Zn-Cu alloys - Chemical etching
ASTM etchant No. 202 - Zinc die castings
ASTM etchant No. 202 - Zn Die castings - Chemical etching
ASTM etchant No. 203 - Zn-Cu
ASTM etchant No. 203 - Zn-Cu alloys - Electrolytic etching
ASTM etchant No. 204 - Zirconium
ASTM etchant No. 204 - Zirconium - Chemical etching
ASTM etchant No. 205 - Zirconium
ASTM etchant No. 205 - Zirconium - Chemical etching
ASTM etchant No. 206 - Zirconium
ASTM etchant No. 206 - Zirconium - Chemical etching
ASTM etchant No. 207 - U alloys
ASTM etchant No. 207 - U alloys - Chemical etching
ASTM etchant No. 208
ASTM etchant No. 209 - Molybdenum - Chemical etching
ASTM etchant No. 209 - Tungsten - Chemical etching
ASTM etchant No. 209 - W-Th
ASTM etchant No. 209 - W-Th alloys - Chemical etching
ASTM etchant No. 21 - Co high temperature alloys - Chemical etching
ASTM etchant No. 21 - For high temperature alloys
ASTM etchant No. 22 - HCl+H2O2 - For high temperature alloys
ASTM etchant No. 220 - Stainless steels - Chemical etching
ASTM etchant No. 22a - Ni superalloys - Chemical etching
ASTM etchant No. 22b - Co high temperature alloys - Chemical etching
ASTM etchant No. 23 - HCl-methanol
ASTM etchant No. 24 - Co high temperature alloys - Chemical etching
ASTM etchant No. 24 - HCl-HNO3-FeCl3 - For high temperature alloys
ASTM etchant No. 25 - Co high temperature alloys - Chemical etching
ASTM etchant No. 25 - High temperature steels - Chemical etching
ASTM etchant No. 25 - Marble's etchant - For high temperature alloys
ASTM etchant No. 25 - Ni superalloys - Chemical etching
ASTM etchant No. 25 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 25 - Pure Ni and high Ni alloys - Chemical etching
ASTM etchant No. 26 - Cu alloys - Chemical etching
ASTM etchant No. 26 - For Cu and alloys
ASTM etchant No. 26 - Pure copper - Chemical etching
ASTM etchant No. 27 - Cu alloys - Chemical etching
ASTM etchant No. 27 - For Cu and alloys
ASTM etchant No. 27 - Pure copper - Chemical etching
ASTM etchant No. 28 - Cu alloys - Chemical etching
ASTM etchant No. 28 - Cu alloys - Chemical etching
ASTM etchant No. 28 - Ferric nitrate - For Cu and alloys
ASTM etchant No. 28 - Pure copper - Chemical etching
ASTM etchant No. 28 - Pure copper - Chemical etching
ASTM etchant No. 29 - Cu alloys - Chemical etching
ASTM etchant No. 29 - Potassium dichromate - For Cu and alloys
ASTM etchant No. 29 - Pure copper - Chemical etching
ASTM etchant No. 3 - Aluminum 000 series - Chemical etching
ASTM etchant No. 3 - Aluminum 1000 series - Chemical etching
ASTM etchant No. 3 - Aluminum 2000 series - Chemical etching
ASTM etchant No. 3 - Aluminum 4000 series - Chemical etching
ASTM etchant No. 3 - Aluminum 5000 series - Chemical etching
ASTM etchant No. 3 - Aluminum 6000 series - Chemical etching
ASTM etchant No. 3 - Aluminum 7000 series - Chemical etching
ASTM etchant No. 3 - Keller's etchant - For Al and alloys
ASTM etchant No. 3 - Pure aluminum - Chemical etching
ASTM etchant No. 30 - Ag-Cu alloys - Chemical etching
ASTM etchant No. 30 - Cu alloys - Chemical etching
ASTM etchant No. 30 - NH4OH+H2O - For Cu and alloys
ASTM etchant No. 30 - Pure copper - Chemical etching
ASTM etchant No. 31 - Amonium persulphate - For Cu, Cu-Al, Cu-Ni-Zr, Cu alloys
ASTM etchant No. 31a - Fe + C - Chemical etching
ASTM etchant No. 31b - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 31c - Fe + 12-20 Cr + 4-10 Ni + <7% - Electrolytic etching
ASTM etchant No. 31c - Fe + 12-20 Cr + 4-10 Ni + 7% - Electrolytic etching
ASTM etchant No. 31c - Pure Ni and high Ni alloys - Electrolytic etching
ASTM etchant No. 31d - Pure copper - Chemical etching
ASTM etchant No. 31d - Cu alloys - Chemical etching
ASTM etchant No. 31d - Cu-Al (aluminum bronze) - Chemical etching
ASTM etchant No. 31d - Nickel silver - Chemical etching
ASTM etchant No. 32 - Chromic acid - For Cu, Cu-Ni-Zn, Cu alloys
ASTM etchant No. 32 - Cu alloys - Chemical etching
ASTM etchant No. 32 - Nickel silver - Chemical etching
ASTM etchant No. 32 - Pure copper - Chemical etching
ASTM etchant No. 33 - Chromic/hydrochloric - For Cu, Cu-Al, Cu-Ni, Cu alloys
ASTM etchant No. 33 - Cu alloys - Chemical etching
ASTM etchant No. 33 - Nickel silver - Chemical etching
ASTM etchant No. 33 - Pure copper - Chemical etching
ASTM etchant No. 34 - Cu-Ni alloys - Chemical etching
ASTM etchant No. 34 - For Cu, Cu-Al, Cu-Ni, Cu alloys
ASTM etchant No. 34b - Cu alloys - Chemical etching
ASTM etchant No. 34b - Cu-Al (aluminum bronze) - Chemical etching
ASTM etchant No. 34b - Pure copper - Chemical etching
ASTM etchant No. 35 - Cu alloys - Chemical etching
ASTM etchant No. 35 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 35 - Grard's No.1 etch - For Cu, Cu-Al, Cu alloy
ASTM etchant No. 35 - Pure copper - Chemical etching
ASTM etchant No. 36 - Cu alloys - Chemical etching
ASTM etchant No. 36 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 36 - For Cu, Cu-Al, Cu alloys
ASTM etchant No. 36 - Pure copper - Chemical etching
ASTM etchant No. 37 - Cu alloys - Chemical etching
ASTM etchant No. 37 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 37 - For Cu, Cu-Al, Cu alloys
ASTM etchant No. 37 - Pure copper - Chemical etching
ASTM etchant No. 38 - Cu alloys - Chemical etching
ASTM etchant No. 38 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 38 - Ni-Ag alloys - Chemical etching
ASTM etchant No. 38 - Pure copper - Chemical etching
ASTM etchant No. 38- For Cu, Cu-Al, Cu alloys
ASTM etchant No. 39 - Cu alloys - Chemical etching
ASTM etchant No. 39 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 39 - For Cu, Cu-Al, Cu alloys
ASTM etchant No. 39 - Pure copper - Chemical etching
ASTM etchant No. 3a - Ti alloys - Chemical etching
ASTM etchant No. 3b - Aluminum 7000 series - Chemical etching
ASTM etchant No. 4 - For Al and Al base alloys
ASTM etchant No. 4 - Pure aluminium - Electrolytic etching
ASTM etchant No. 40 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 40 - Cu-Ni alloys - Chemical etching
ASTM etchant No. 40 - For Cu, Cu-Al, Cu alloys
ASTM etchant No. 40 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 40 - Pure copper - Chemical etching
ASTM etchant No. 41 - Cu alloys - Chemical etching
ASTM etchant No. 41 - Cu-Be alloys - Chemical etching
ASTM etchant No. 41 - Cu-Cr alloys - Chemical etching
ASTM etchant No. 41 - Cu-Mn alloys - Chemical etching
ASTM etchant No. 41 - Cu-Si alloys - Chemical etching
ASTM etchant No. 41 - For Cu, Cu-Be, Cu-Cr, Cu-Mn, Cu-Si, Cu-Ni-Zn, Cu alloys
ASTM etchant No. 41 - Nickel silver - Chemical etching
ASTM etchant No. 41 - Pure copper - Chemical etching
ASTM etchant No. 42 - Cu alloys - Chemical etching
ASTM etchant No. 42 - For Cu, Cu-Ni-Zn, beta-brass
ASTM etchant No. 42 - Nickel silver - Chemical etching
ASTM etchant No. 42 - Pure copper - Chemical etching
ASTM etchant No. 43 - Cu alloys - Chemical etching
ASTM etchant No. 43 - For Cu and alloys
ASTM etchant No. 43 - Pure copper - Chemical etching
ASTM etchant No. 44 - Ammonium/peroxide - For Cu-Al, Cu alloys
ASTM etchant No. 44 - Cu alloys - Chemical etching
ASTM etchant No. 44 - Cu-Al (Aluminum bronze) - Chemical etching
ASTM etchant No. 45 - Cu-Al (Aluminum bronze) - Electrolytic etching
ASTM etchant No. 45 - Cu-Be alloys - Electrolytic etching
ASTM etchant No. 45 - For Cu-Al, Cu-Be
ASTM etchant No. 46 - Cu-Be
ASTM etchant No. 46 - Cu-Be alloys - Chemical etching
ASTM etchant No. 47 - Cu-Ni alloys - Chemical etching
ASTM etchant No. 47 - Cyanide/persulphate - For Cu-Ni
ASTM etchant No. 47 - Pure Ni and high Ni alloys - Chemical etching
ASTM etchant No. 48 - Cu-Ni alloys - Chemical etching
ASTM etchant No. 48 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 48 - For Cu-Ni
ASTM etchant No. 49 - Cu alloys - Electrolytic etching
ASTM etchant No. 49 - Cu alloys - Electrolytic etching
ASTM etchant No. 49 - Cu-Ni alloys - Electrolytic etching
ASTM etchant No. 49 - For Cu-Ni, Cu-Ni-Zn, Cu alloys, beta-brass
ASTM etchant No. 49 - Nickel silver - Electrolytic etching
ASTM etchant No. 5 - Aluminum 1000 series - Electrolytic etching
ASTM etchant No. 5 - Aluminum 3000 series - Electrolytic etching
ASTM etchant No. 5 - Aluminum 5000 series - Electrolytic etching
ASTM etchant No. 5 - Aluminum 6000 series - Electrolytic etching
ASTM etchant No. 5 - Aluminum 7000 series - Electrolytic etching
ASTM etchant No. 5 - Barker's etchant - For Al base alloys and brass
ASTM etchant No. 5 - Pure aluminum - Electrolytic etching
ASTM etchant No. 50 - Cu-Ni alloys - Chemical etching
ASTM etchant No. 50 - Ni-Ag alloys - Chemical etching
ASTM etchant No. 50 - Ni-Al alloys - Chemical etching
ASTM etchant No. 50 - Ni-Cr alloys - Chemical etching
ASTM etchant No. 50 - Ni-Fe alloys - Chemical etching
ASTM etchant No. 50 - Ni-Ti alloys - Chemical etching
ASTM etchant No. 50 - Nitric/acetic - For Cu-Ni
ASTM etchant No. 51 - Cu-Sn (Tin bronze) - Chemical etching
ASTM etchant No. 51 - For Cu-Sn
ASTM etchant No. 51 - Pure tin - Chemical etching
ASTM etchant No. 52 - Cu-Sn (Tin bronze) - Chemical etching
ASTM etchant No. 52 - Cu-Sn (tin bronze)
ASTM etchant No. 53 - Cu alloys - Chemical etching
ASTM etchant No. 53 - For Cu alloys (polish)
ASTM etchant No. 54 - Cu alloys - Electrolytic etching
ASTM etchant No. 54 - For brass
ASTM etchant No. 55 - Dysprosium - Chemical etching
ASTM etchant No. 55 - Erbium - Chemical etching
ASTM etchant No. 55 - For Dy, Er, Gd, Ho
ASTM etchant No. 55 - Gadolinium - Chemical etching
ASTM etchant No. 55 - Holmium - Chemical etching
ASTM etchant No. 56 - Dysprosium - Chemical etching
ASTM etchant No. 56 - Erbium - Chemical etching
ASTM etchant No. 56 - For Dy, Er, Gd, Ho
ASTM etchant No. 56 - Gadolinium - Chemical etching
ASTM etchant No. 56 - Holmium - Chemical etching
ASTM etchant No. 57 - Acetic acid/peroxide - For Gd
ASTM etchant No. 57 - Gadolinium - Chemical etching
ASTM etchant No. 57 - Pb + <2 Sb - Chemical etching
ASTM etchant No. 57 - Pure lead - Chemical etching
ASTM etchant No. 58 - For Ge
ASTM etchant No. 58 - Germanium - Chemical etching
ASTM etchant No. 59 - For Ge
ASTM etchant No. 59 - Germanium - Chemical etching
ASTM etchant No. 6 - Aluminum 1000 series - Chemical etching
ASTM etchant No. 6 - Aluminum 2000 series - Chemical etching
ASTM etchant No. 6 - Aluminum 3000 series - Chemical etching
ASTM etchant No. 6 - Aluminum 5000 series - Chemical etching
ASTM etchant No. 6 - Aluminum 6000 series - Chemical etching
ASTM etchant No. 6 - Aluminum 6000 series - Chemical etching
ASTM etchant No. 6 - Aluminum 7000 series - Chemical etching
ASTM etchant No. 6 - For Al base alloys
ASTM etchant No. 60 - CP4 etchant - For Ge
ASTM etchant No. 60 - Germanium - Chemical etching
ASTM etchant No. 61 - >90% noble metals - Chemical etching
ASTM etchant No. 61 - >90% noble metals - Chemical etching
ASTM etchant No. 61 - >90% noble metals - Chemical etching
ASTM etchant No. 61 - Ag alloys - Chemical etching
ASTM etchant No. 61 - For Au and noble metals (> 90%)
ASTM etchant No. 61 - Pure gold - Chemical etching
ASTM etchant No. 61 - Pure palladium - Chemical etching
ASTM etchant No. 62 - Ag alloys - Chemical etching
ASTM etchant No. 62 - Au alloys - Chemical etching
ASTM etchant No. 62 - For Au and alloys
ASTM etchant No. 62 - Pd alloys - Chemical etching
ASTM etchant No. 62 - Pure Ag - Chemical etching
ASTM etchant No. 62 - Pure gold - Chemical etching
ASTM etchant No. 62 - Pure palladium - Chemical etching
ASTM etchant No. 63 - Au alloys - Chemical etching
ASTM etchant No. 63 - For Au (polish) and Au alloys
ASTM etchant No. 63 - Pure gold - Chemical etching
ASTM etchant No. 64 - For Au alloys
ASTM etchant No. 64a - Pd alloys - Chemical etching
ASTM etchant No. 64a - Pure platinum - Chemical etching
ASTM etchant No. 64b - Au alloys - Chemical etching
ASTM etchant No. 64b - Pt alloys - Chemical etching
ASTM etchant No. 65 - <90% noble metals - Chemical etching
ASTM etchant No. 65 - <90% noble metals - Chemical etching
ASTM etchant No. 65 - <90% noble metals - Chemical etching
ASTM etchant No. 65 - Ag alloys - Chemical etching
ASTM etchant No. 65 - For noble metals (< 90%)
ASTM etchant No. 66 - For Hf alloys
ASTM etchant No. 66 - Hafnium - Chemical etching
ASTM etchant No. 66 - Niobium - Chemical etching
ASTM etchant No. 66 - Niobium - Chemical etching
ASTM etchant No. 66 - Ta alloys - Chemical etching
ASTM etchant No. 66 - Tantalum - Chemical etching
ASTM etchant No. 66 - Zirconium - Chemical etching
ASTM etchant No. 67 - For Hf base alloys
ASTM etchant No. 67 - Hafnium - Chemical etching
ASTM etchant No. 67 - Pure titanium - Chemical etching
ASTM etchant No. 67 - Pure uranium - Chemical etching
ASTM etchant No. 67 - Ti alloys - Chemical etching
ASTM etchant No. 67 - U alloys - Chemical etching
ASTM etchant No. 67 - Zirconium - Chemical etching
ASTM etchant No. 68 - For Hf base alloys
ASTM etchant No. 68 - Hafnium - Electrolytic etching
ASTM etchant No. 68 - Pure titanium - Electrolytic etching
ASTM etchant No. 68 - Ti alloys - Electrolytic etching
ASTM etchant No. 68 - U + Zr alloys - Electrolytic etching
ASTM etchant No. 68 - Zirconium - Electrolytic etching
ASTM etchant No. 69 - For Hf base alloys
ASTM etchant No. 69 - For Hf base alloys
ASTM etchant No. 69 - Hafnium - Electrolytic etching
ASTM etchant No. 69 - Pure titanium - Electrolytic etching
ASTM etchant No. 69 - Pure uranium - Electrolytic etching
ASTM etchant No. 69 - Ti alloys - Electrolytic etching
ASTM etchant No. 69 - U alloys - Electrolytic etching
ASTM etchant No. 69 - Zirconium - Electrolytic etching
ASTM etchant No. 7 - Aluminum 1000 series - Chemical etching
ASTM etchant No. 7 - Aluminum 2000 series - Chemical etching
ASTM etchant No. 7 - Aluminum 3000 series - Chemical etching
ASTM etchant No. 7 - Aluminum 6000 series - Chemical etching
ASTM etchant No. 7 - For Al base alloys
ASTM etchant No. 70 - For Hf base alloys
ASTM etchant No. 70 - Hafnium - Chemical etching
ASTM etchant No. 71 - For Hf base alloys
ASTM etchant No. 71 - Hafnium - Chemical etching
ASTM etchant No. 71 - Zirconium - Chemical etching
ASTM etchant No. 72 - For Hf base alloys
ASTM etchant No. 73 - For Ir base alloys
ASTM etchant No. 73a - Pt alloys - Electrolytic etching
ASTM etchant No. 73a - Pure platinum - Electrolytic etching
ASTM etchant No. 73b - Ruthenium - Electrolytic etching
ASTM etchant No. 73b - Ruthenium - Electrolytic etching
ASTM etchant No. 73c - Iridium - Electrolytic etching
ASTM etchant No. 74 - Nital - For steels
ASTM etchant No. 74a - Fe + C - Chemical etching
ASTM etchant No. 74a - Fe + C - Chemical etching
ASTM etchant No. 74a - Mg-Al, Mg-Al-Zn (Al + Zn <5% - Chemical etching
ASTM etchant No. 74a - Mg-Al, Mg-Al-Zn (Al + Zn >5% - Chemical etching
ASTM etchant No. 74a - Mg-Mn alloys - Chemical etching
ASTM etchant No. 74a - Mg-Th-Zr alloys - Chemical etching
ASTM etchant No. 74a - Mg-Zn-Zr alloys - Chemical etching
ASTM etchant No. 74a - Pure iron - Chemical etching
ASTM etchant No. 74a - Pure magnesium - Chemical etching
ASTM etchant No. 74a - Tool steels - Chemical etching
ASTM etchant No. 74a - Zn-Fe alloys - Chemical etching
ASTM etchant No. 74b - Pb + <2 Sb - Chemical etching
ASTM etchant No. 74b - Pb + >2 Sb - Chemical etching
ASTM etchant No. 74b - Pb Babbitt - Chemical etching
ASTM etchant No. 74b - Sn-Pb alloys - Chemical etching
ASTM etchant No. 74d - Pure tin - Chemical etching
ASTM etchant No. 74d - Sn-Cd alloys - Chemical etching
ASTM etchant No. 74d - Sn-Fe alloys - Chemical etching
ASTM etchant No. 74e - Ni-Fe alloys - Chemical etching
ASTM etchant No. 74e - Ni-Mn alloys - Chemical etching
ASTM etchant No. 75 - Gorsuch's etchant - Iron
ASTM etchant No. 75 - Pure iron - Chemical etching
ASTM etchant No. 76 - Fe + C - Chemical etching
ASTM etchant No. 76 - Picral - Fe + C
ASTM etchant No. 77 - Fe + C - Chemical etching
ASTM etchant No. 77 - Fe + C - Chemical etching
ASTM etchant No. 77 - Super picral - Fe + C
ASTM etchant No. 78 - Fe + <1C + <4% additions
ASTM etchant No. 78 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 78 - Fe + 1C + <4% additions - Chemical etching
ASTM etchant No. 78 - Fe + C - Chemical etching
ASTM etchant No. 79 - Fe + C - Chemical etching
ASTM etchant No. 79 - Fry's etchant - Fe + C
ASTM etchant No. 8 - For Al-Cu, Al-Mg, Al-Si, Cu
ASTM etchant No. 80 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 80 - Fe + 12-20 Cr + 4-10 Ni + <7% - Chemical etching
ASTM etchant No. 80 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 80 - Tool steels - Chemical etching
ASTM etchant No. 80 - Vilella - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 81 - Fe + <1C + <4% additions
ASTM etchant No. 81 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 81 - Steels, carbon and alloy types - Chemical etching
ASTM etchant No. 82 - Acid ferric chloride - Fe + <1C + <4% additions
ASTM etchant No. 82 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 83 - Fe + <1C + <4% additions
ASTM etchant No. 83 - Fe + <1C + <4% additions - Electrolytic etching
ASTM etchant No. 83 - Ni-Cr alloys - Electrolytic etching
ASTM etchant No. 83 - Ni-Fe alloys - Electrolytic etching
ASTM etchant No. 83a - Fe + 15-30 Cr + 6-40 Ni + <5% - Electrolytic etching
ASTM etchant No. 83b - Non-stainless maraging steels - Electrolytic etching
ASTM etchant No. 84 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 84 - Howarth's etchant - Fe + <1C + <4% additions
ASTM etchant No. 85 - Alkaline sodium picrate - Fe + <1C + <4% additions
ASTM etchant No. 85 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 86 - Fe + <1C + <4% additions - Chemical etching
ASTM etchant No. 86 - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 86 - Fe + 12-20 Cr + 4-10 Ni + <7% - Chemical etching
ASTM etchant No. 86 - Fe + 16-25 Cr + 3-6 Ni + 5-1C - Chemical etching
ASTM etchant No. 86 - High temperature steel - Chemical etching
ASTM etchant No. 86 - Non-stainless maraging steels - Chemical etching
ASTM etchant No. 86 - Tool steels - Chemical etching
ASTM etchant No. 87 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 87 - Glyceregia - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 88 - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 88 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 89 - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 89 - Fe + 12-20 Cr + 4-10 Ni + <7% - Chemical etching
ASTM etchant No. 89 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 89 - High temperature steels - Chemical etching
ASTM etchant No. 89 - Ni-Al alloys - Chemical etching
ASTM etchant No. 89 - Non-stainless maraging steels - Chemical etching
ASTM etchant No. 8a - Aluminum 2000 series - Chemical etching
ASTM etchant No. 8a - Aluminum 3000 series - Chemical etching
ASTM etchant No. 8a - Aluminum 5000 series - Chemical etching
ASTM etchant No. 8a - Aluminum 6000 series - Chemical etching
ASTM etchant No. 8a - Aluminum 6000 series - Chemical etching
ASTM etchant No. 8b - Admiralty metal - Electrolytic etching
ASTM etchant No. 8b - Pure copper - Electrolytic etching
ASTM etchant No. 9 - Beryllium - Chemical etching
ASTM etchant No. 9 - For Be
ASTM etchant No. 9 - Pure cobalt - Chemical etching
ASTM etchant No. 90 - HNO3-HF in glycerol - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 91 - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 91 - Fe + 12-20 Cr + 4-10 Ni + <7% - Chemical etching
ASTM etchant No. 91 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 92
ASTM etchant No. 93
ASTM etchant No. 94 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 94 - Kalling's etchant No. 2 - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 94 - Ni superalloys - Chemical etching
ASTM etchant No. 95 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 95 - Kalling's etchant No. 1 - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 96 - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 96 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 97 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 97 - High temperature steels - Chemical etching
ASTM etchant No. 97 - Potassium hydroxide - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 98 - Fe + 15-30 Cr + 6-40 Ni + <5% - Chemical etching
ASTM etchant No. 98 - Murakami's etchant - Fe + 15-30 Cr + 6-40 Ni + <5%
ASTM etchant No. 98 - Ni-Cr alloys - Chemical etching
ASTM etchant No. 98c - Molybdenum - Chemical etching
ASTM etchant No. 98c - Pure tungsten - Chemical etching
ASTM etchant No. 98c - Rhenium - Chemical etching
ASTM etchant No. 99 - Beraha's etchant - Fe + 12-20 Cr + 4-10 Ni + <7%
ASTM etchant No. 99 - Fe + 12-20 Cr + 4-10 Ni + <7% - Chemical etching
ASTM etchant No. 99 - Fe + 16-25 Cr + 3-6 Ni + 5-1C - Chemical etching
ASTM etchant No. 99 - Non-stainless maraging steels - Chemical etching
ASTM etchant No.57 - Pb + >2 Sb - Chemical etching
AW-6061 aluminium matrix composite alloy - Dislocation etching
Abraham's AB etchant - - Gallium arsenide
Accary etchant - U-C alloys - Electrolytic etching
Accary etchant - Uranium - Chemical etching
Accary etchant - Uranium - For etching U carbide
Acetic glycol etchant - Magnesium - Chemical etching
Acetic glycol etchant - Rare earth - Chemical etching
Acetic-glycol etchant - Mg and alloys - Chemical etching
Acetic-picral etchant - Magnesium - Chemical etching
Acetic-picral etchant - Magnesium - Chemical etching
Acetic-picral etchant - Magnesium - Chemical etching
Acrylonitrile-butadiene-styrene - Chemical etching - General microstructure
Adcock etchant - Lead - Electrolytic etching
Adcock etchant - Pb-Sb alloys - Electrolytic etching
Adler's etchant - Stainless steel - Chemical etching
Adler's etchant - Co and Co-Al alloys - Chemical etching - General microstructure
Adler's etchant - For the investigation of the cast structure and the heat-affected zone in welds in steels
Adler's etchant - High-alloy, corrosion-resistant steels, Co and Ni alloys
Adler's etchant - Ni brazing alloys when brazed to steels - Galvanic Ni coatings - Chemical etching
Adler's etchant - Pd-Ga alloy (Pd5Ga2) - Chemical etching
Adler's etchant - Stainless steel
Adler's etchant - Stainless steel
Adler's etchant - Steel for turbine blades - Chemical etching
Ag (001) wafers - Chemical polishing
Ag (001) wafers - Dislocation etching
Ag (001) wafers - Electrolytic sawing
Ag (111) and (100) wafers - Chemical polishing
Ag (111) wafers, Ag natural crystals, Ag native single crystals
Ag 100 a thick thin film - Chemical etching - General microstructure
Ag alloys - Chemical etching
Ag alloys - Chemical etching
Ag alloys - Chemical etching
Ag alloys - Chemical etching
Ag alloys - Electrolytic etching
Ag as high purity pre-forms and silver alloy pre-forms - Chemical cleaning
Ag high purity pre-forms and plated parts
Ag pellets in an expoxy matrix - Chemical etching - General microstructure
Ag pellets in an expoxy matrix - Chemical etching - General microstructure
Ag single crystal specimens - Electrolytic polishing
Ag single crystal sphere - Gas etching
Ag single crystal sphere - Thermal forming
Ag single crystals - Chemical etching - General microstructure
Ag solders - Chemical etching
Ag specimen blanks - Chemical etching - General microstructure
Ag specimen blanks - Chemical etching - General microstructure
Ag specimens - Chemical polishing
Ag specimens - Electrolytic polishing
Ag specimens - Gas corrosion
Ag specimens - Gas oxidation
Ag specimens used in a thermal etching study - Electrolytic polishing
Ag specimens used in a thermal etching study - Gas etching
Ag thin film coatings on Si, Al2O3 and ZrO2 substrates - Chemical etching - General microstructure
Ag thin film deposits - Chemical cleaning/etching
Ag thin films - Chemical etching - General microstructure
Ag thin films - Chemical etching - General microstructure
Ag thin films - Chemical etching - General microstructure
Ag thin films electroplated on brass - Chemical etching - General microstructure
Ag, Ag solders and Pg-Pd alloys - Chemical etching
Ag-Al alloy - Alloy with < 20 wt.% Ag
Ag-Al alloy - Alloy with 15% Ag
Ag-Al alloy - Alloy with 20 wt.% Ag
Ag-Al alloy - Alloys with < 27 at.% Al
Ag-Al alloy - Chemical etching - General microstructure
Ag-Al alloy - Electrolytic thinning
Ag-Al alloy - Electrolytic thinning
Ag-Al alloy - Electrolytic thinning
Ag-Al alloys - Electrolytic polishing
Ag-Au evaporated thin films - Chemical etching - General microstructure
Ag-Au single crystal alloy ingots - Chemical etching - General microstructure
Ag-B system - General microstructure
Ag-Cd alloy - Alloy with 44% Cd
Ag-Cd alloy - Alloy with 45 at.% Cd
Ag-Cd alloy - Alloy with 45 at.% Cd
Ag-Cd alloy - Alloy with 45 at.% Cd
Ag-Cd alloy - Alloy with 70% Ag and 30% Cd
Ag-Cd alloy - Alloys with 1-7% Cd
Ag-Cd alloy - Beta Ag Cd-50 at.% Cd
Ag-Cd alloy - Electrolytic thinning
Ag-Cd single crystal - 0.8 at.% Cd - Chemical thinning
Ag-Cd-Zn alloys - Electrolytic polishing
Ag-Cu alloy - In heterogeneius alloys attacks Cu rich areas faster then Ag rich
Ag-Cu alloys - Chemical etching
Ag-Cu-Ge system - Chemical ecthing
Ag-Cu-Ge-Sb system - Chemical etching - General microstructure
Ag-Cu-Sb system - Chemical etching - General microstructure
Ag-Epoxy - Chemical etching - General microstructure
Ag-Epoxy - Gas cleaning
Ag-Ga-S allloy - Chemical etching - General microstructure
Ag-Ge alloy - Alloy with 21 at.% Ge
Ag-Ge eutectic - Chemical polishing
Ag-I alloy - Electrolytic thinning
Ag-I alloys - Chemical etching - General microstructure
Ag-I system - Beta-AgI single crystal
Ag-In selenide - Chemical ecthing
Ag-In telluride - Chemical etching - General microstructure
Ag-Mg alloy - Ag-0.1% MgO - General microstructure
Ag-Mg alloy - Electrolytic machinning
Ag-Mg single crystal - 0.8 at.% Mg
Ag-Mo and Ag-W alloys, Ag-WC - Chemical etching - General microstructure
Ag-Nd system - Chemical etching - General microstructure
Ag-Ni and Ag-Mg-Ni alloys - Chemical etching
Ag-Ni, Ag-Mg-Ni, Ag-Sn alloys - Chemical etching - General microstructure
Ag-Pb-Te system - No etching required
Ag-Pr system - Chemical etching - General microstructure
Ag-Sb alloys - Electrolytic polishing
Ag-Sn (1%) single crystal alloys - Electrolytic polishing
Ag-Sn alloy - Ag3Sn-Sn section
Ag-Sn alloy - Alloys with 1-8 at.% Sn
Ag-Sn alloys - Electrolytic polishing
Ag-Sn alloys - General microstructure
Ag-Sn and Ag-Pb-Sn alloys - Chemical etching
Ag-Sn-Hg alloys (hardened) - Chemical etching - General microstructure
Ag-Sn-Hg alloys - Attack polishing
Ag-Sn-Zn-Cu alloys - Chemical etching - General microstructure
Ag-Th alloys - Chemical etching
Ag-Th alloys - Chemical etching - General microstructure
Ag-Zn alloy - Alloy with 38 at.% Zn
Ag-Zn alloy - Alloy with 38% Zn
Ag-Zn alloy - Alloy with 50 wt.% Ag and 50 wt.% Zn
Ag-Zn alloy - Electrolytic thinning
Ag-Zn alloy - Electrolytic thinning
Ag-Zn alloy specimens - Chemical etching - General microstructure
Ag-Zn alloys - Chemical polishing
Ag2Al (0001) wafers - Dislocation etching
Ag2Al (0001) wafers - Dislocation etching
Ag2Al single crystal specimens - Electrolytic polishing
Ag2Al single crystal sphere - Chemical polishing
Ag2Hg (110) single crystal - Chemical polishing/etching
Ag2Se (100) wafers - Chemical polishing
Ag2Se (100) wafers and other orientations - Chemical polishing
Ag2Se (100) wafers and other orientations - Chemical polishing
Ag2Te (100) wafers - Chemical polishing
Ag3Ni specimens - Electrolytic polishing
Ag6Ge10P12 single crystal ingots - Chemical etching - General microstructure
AgB alloys - Chemical cleaning
AgBr (100) and (111) wafers - Dislocation etching
AgBr (110) wafers - Abrasive polishing
AgBr, AgCl - Dislocation etching
AgCd single crystal specimens - Chemical etching - General microstructure
AgCl (100) bars, AgCl single crystal specimens - Chemical etching - General microstructure
AgCl (100) wafers - Chemical cleaning
AgCl (100) wafers - Chemical cleaning
AgCl (100) wafers - Chemical polishing
AgCl single crystal oriented bars - Chemical cleaning
AgCl specimens - Pressure, thinning
AgFeTe2 single crystal specimens - Chemical polishing
AgGaS2 thin films
AgGaSe3 single crystals - Chemical etching - General microstructure
AgGaTe2 single crystals - Chemical etching - General microstructure
AgI powder
AgI single crystals - Chemical cleaning
AgInSe2 single crystals - Chemical etching - General microstructure
AgInTe2 single crystals - Chemical etching - General microstructure
AgMg single crystal specimens - Chemical cleaning
AgS single crystal whiskers - Chemical etching - General microstructure
AgS single crystal whiskers - Electrolytic polishing
AgSbTe2 single crystal specimens - Chemical etching - General microstructure
AgSbTe2 single crystal specimens - Chemical polishing
AgSbTe2 single crystal specimens - Dislocation etching
AgTiSe single crystal material - Chemical polishing
AgZn specimens - Chemical cleaning
Age-hardenable stainless steels - Electrolytic etching
Agua regia - Au thin films and specimens - Chemical etching
Agua regia - AuSn (20%) alloy as an evaporated thin film - Chemical etching
Agua regia - Cr and Cr alloys - Chemical etching
Agua regia - Ir crystalline specimens as wire, rod, sheet - Chemical etching
Agua regia - Ir thin films deposited on silicon (100), n-type - Chemical etching
Agua regia - IrPt as alloy mixtures - Chemical etching
Agua regia - IrV and Ir80V20 thin films - Chemical etching
Agua regia - Mo specimens - Chemical polishing
Agua regia - Ni superalloys, Ni-Cr alloys - Chemical etching
Agua regia - Ni-Cr thin films evaporated on (111) and (100) oriented Si - Chemical etching
Agua regia - Pd-H as powdered "Palladium Black" with absorbed hydrogen
Agua regia - PdAg alloy - Chemical etching
Agua regia - PdNiP, PtNiP, and PtCuP metallic glasses - Chemical etching
Agua regia - Pt and Au evaporated on silicon (111) - Chemical etching
Agua regia - PtRh (2-15%) as thermocouple wires - Chemical cleaning
Agua regia - Pure Au, Au-Pt and Au-Ag alloys with more than 80% Au - Chemical etching
Agua regia - Rare earth nickelides - Chemical etching
Agua regia - Si (111) and (100) wafers - Chemical cleaning
Agua regia - Si3N4, oxynitrides, SiO2 as thin films or glass and quartzware - Chemical cleaning
Agua regia - SiO2 as single crystal natural quartz, artificial quartz, and vitreous silica (fused glass)
Agua regia - Sn (100) single crystal - Chemical etching - General microstructure
Agua regia - SnGe (1%) thin films - Chemical etching - General microstructure
Agua regia - Te (10T0) cleaved wafers - Chemical polishing/etching
Agua regia - Th specimen - Chemical polishing
Agua regia - Ti0.3W0.7Si2 thin films - Chemical polishing
Agua regia - Ti3W7Si2 thin films on silicon wafers, (111), (110) and (100) - Chemical etching - General microstructure
Agua regia - TiO2 single crystal natural rutile crystals - Chemical cleaning
Agua regia - TiW (1% Ti) thin films - Chemical etching - General microstructure
Agua regia - TlBiTe2 single crystal n-type - Chemical polishing/etching
Agua regia - V specimens - Chemical ething
Agua regia - W specimens - Chemical etching - General microstructure
Agua regia - Zr specimens - Chemical etching - General microstructure
Agua regia - a-Zr2Pd thin films - Chemical polishing/etching
Agua regia - a-Zr3Rh amorphous thin films - Chemical polishing/etching
Agua regia, dilute - Pd thin films - Chemical cleaning
Agua regia, modified - Ni specimens - Chemical etching
Al (001) wafers - Al (001) wafers and other orientations
Al (001) wafers - Al, (001) wafers used in a study of lithium precipitation along dislocations
Al (001) wafers - Dislocation etching
Al (100) specimen - Al (100) and other orientations used in a study of thermal etching
Al (100) specimens - Electrolytic polishing
Al (100) wafer-Al, (100) wafer surfaces preferentially etched in this solution
Al (100) wafers - Thermal etching
Al (100) wafers used in an oxidation study - Electrolytic polishing
Al 5083 alloy - Al-4Mg-0.3Fe-0.75Mn-0.2Si
Al 5454 alloy - Al-2.6Mg-0.3Fe-0.8Mn-0.1Si
Al alloy #6061 - Tg sheet-Proton damage
Al alloy 1100-Al-0.5Fe-0.1Si - General microstructure
Al alloy 3003 - Al-1Mn-0.6Fe-0.2Si - Electrolytic polishing
Al alloy 7004 - Al-1.6Mg-4.5Zn-0.5Mn-0.2Fe-0.2Si
Al alloys as sheet, plate and rod - Electrolytic etching - General microstructure
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Chemical etching
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys - Electrolytic polishing
Al and Al alloys with less than 2% Si - Electrolytic polishing
Al and Al alloys, Al-Cu alloys, Al-Zn alloys - Chemical etching
Al and Al-Si and Al-Cu alloys - Chemical etching
Al and Ti nitride - Chemical etching
Al and alloy - Al, specimens and alloys with low aluminum content
Al and alloy - Polishing
Al and alloys - Chemical polishing
Al and aluminum alloy - Used as a general cleaning and polishing etch
Al bronze - Chemical etching
Al bronze - Chemical etching
Al bronze - Chemical etching
Al bronzes - Chemical etching - General microstructure
Al bronzes, Cu-Be alloys - Electrolytic etching - General microstructure
Al cast alloys - Chemical etching
Al cold-rolled specimens - Electrolytic polishing
Al evaporated on KCl - Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al foil - Al, foil used in a study of change with AC etching
Al foil with an Al2O3 thin Film
Al high purity slugs - Chemical cleaning
Al material in growing AlGaAsP single crystals - Chemical cleaning
Al polycrystalline sheet - Chemical cleaning
Al single crystal specimen - Physical etching - General microstructure
Al single crystal specimens - Electrolytic polishing
Al single crystal specimens - Electrolytic polishing
Al single crystal specimens - Electrolyticlytic polishing
Al single crystal sphere - Gas oxidation
Al single crystal wafers - Electrolytic thinning
Al specimens - Chem/mech machinning
Al specimens - Chemical etching - General microstructure
Al specimens - Chemical etching - General microstructure
Al specimens - Mechanical, deformation
Al specimens - Oxidation
Al specimens - Solution used as a preferential etch on aluminum
Al specimens - Solution will develop etch figures
Al specimens and alloy - Abrasive polishing
Al specimens as Al-Si (20%) - Electrolytic etching - General microstructure
Al specimens cutting - Acid, cutting
Al thin film - Ketone, lift-off
Al thin film on (100) silicon wafers - Chemical etching - General microstructure
Al thin film on quartz substrate - Gas, removal
Al thin films and crystalline aluminum sheet - Solution shown was used to etch channels in the aluminum
Al thin films deposited on GaAs - Physical etching - General microstructure
Al thin films deposited on silicon substrates - Physical etching - General microstructure
Al thin films evaporated on SiO2, Al2O3, and ZrO2 substrates - Alkali, removal
Al, Al-Si alloys - Electrolytic polishing
Al, and A12O3/A1N thin films - Gas etching
Al-Ag alloys - Chemical polishing
Al-Ag alloys - Electrolytic polishing
Al-Ag alloys - Electrolytic thining
Al-Ag polycrystalline and single crystal ingots - Chemical etching - General microstructure
Al-Ag polycrystalline and single crystal ingots - Chemical etching - General microstructure
Al-Au (2%) specimens - Electrolytic etching - General microstructure
Al-Au alloy - Al-Al2Au eutectic
Al-Au alloy - Chemical etching - General microstructure
Al-Au alloys - Electrolytic polishing
Al-Be (38%) alloy - Chemical cleaning
Al-Be (38%) polycrystaline wire - Chemical cleaning
Al-Be alloy - Alloys with < 0.1% Be
Al-Be alloy - Electrolytic thinning by Mirand-Saulnier technique
Al-Ca alloy - Al-7.6Ca eutectic alloy
Al-Ca alloy - Al4Ca - General microstructure
Al-Cd alloy - Alloys with 0.5-1.0% Al
Al-Co alloys - Electrolytic polishing and etching
Al-Cr alloy - Electrolytic thinning by Mirand-Saulnier technique
Al-Cr-Mo-Ni-Ti alloy - Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti-<6Mo (in at.%)
Al-Cr-Nb-Ni alloy - Ni-20Nb-6Cr-2.5Al
Al-Cu alloy (4% Cu) - Electrolytic polishing and thinning
Al-Cu alloy - Al-Al2Cu eutectic
Al-Cu alloy - Al-Cu alloy specimens
Al-Cu alloy - Al-Cu eutectic - General microstructure
Al-Cu alloy - Al-CuAl2 eutectic
Al-Cu alloy - Al-CuAl2 eutectic - Electrolytic polishing
Al-Cu alloy - Al-CuAl2 eutectic - General microstructure
Al-Cu alloy - Al-CuAl2 eutectic - General microstructure - Electrolytic thinning
Al-Cu alloy - Alloy with 0.34 wt.% Cu
Al-Cu alloy - Alloy with 11.8 wt.% Al
Al-Cu alloy - Alloy with 12% Al
Al-Cu alloy - Alloy with 2-5% Cu
Al-Cu alloy - Alloy with 3-5% Cu - Electrolytic polishing
Al-Cu alloy - Alloy with 36 wt.% Cu
Al-Cu alloy - Alloy with 4 wt.% Cu
Al-Cu alloy - Alloy with 4.5 wt.% Cu
Al-Cu alloy - Alloy with 9.5% Al
Al-Cu alloy - Alloys with 10-45% Cu
Al-Cu alloy - Electrolytic thinning
Al-Cu alloy - Electrolytic thinning
Al-Cu alloy - Electrolytic thinning
Al-Cu alloy - Electrolytic thinning
Al-Cu alloy - Electrolytic thinning
Al-Cu alloy - Electrolytic thinning by PFTE holder technique
Al-Cu alloy - Eletrolytic thinning
Al-Cu alloys - Chemical etching - General microstructure
Al-Cu alloys - Chemical polishing
Al-Cu alloys - Chemical polishing
Al-Cu alloys - Electrolytic polishing
Al-Cu single crystal - Chemical etching - General microstructure
Al-Cu single crystal - Chemical etching - General microstructure
Al-Cu single crystal - Chemical etching - General microstructure
Al-Cu-Mg alloy - Electrolytic thinning
Al-Cu-Mg alloys - Electrolytic polishing
Al-Cu-Mg eutectic alloy - Electrolytic thinning and chemical etching
Al-Cu-Mg-Ag alloy - Foil preparation for TEM
Al-Cu-Mg-Mn alloy - 3-4% Cu, 0.5-1% Mg, 0.5% Mn
Al-Cu-Mg-Mn-Fe-Si alloy - 2124 T4, Al-3.8Cr-1.3Mg-0.5Mn-0.1Fe-0.05Si
Al-Cu-Mn alloy - Cu(2+x) Mn(1-x) Al, x=0.6-0.8
Al-Cu-Mn alloy - Cu2MnAl - Chemical thinning and electrolytic thinning
Al-Cu-Mn system - Approx. Cu2MnAl
Al-Cu-Mn-Zn-Fe-Mg-Si alloy - 2024-T4 Al-4.5Cu-1.4Mg-0.6Mn-0.3Fe-0.2Zn-0.15Si
Al-Dy alloy - Al rich alloys
Al-Fe alloy - Alloys with 5-10% Al - Electrolytic thinning
Al-Fe alloy - Alloys with 65-90% Fe
Al-Fe-Cr alloy - Al-7Fe-0.5/1.5 Cr - Electrolytic thinning
Al-Fe-Cr-Ti-V-Zr alloy - Al-7Fe-1Cr-0.2Ti-0.2V-0.2Zr
Al-Fe-Ni system - Alloys with 32-53% Al, 8-14% Ni, 19-60% Fe
Al-Ge alloy - Alloy with 50 wt.% Ge
Al-Ge alloy - Eutectic composition
Al-Ge alloys - Chemical polishing
Al-Hf alloy - Alloy with 1.8 wt.% Hf - General microstructure
Al-Ho alloy - Anodising
Al-Ho alloy - For Al rich alloys
Al-In alloy - Selective etch for SEM
Al-In alloys - Chemical polishing
Al-Li alloy (0.4% Li) - Chemical etching - General microstructure
Al-Li alloy - Chemical polishing
Al-Li-Cu-Zr alloy - Al-3Li-2Cu-0.2Zr - General microstructure
Al-Li-Cu-Zr-Cd alloy - Al-3Li-2Cu-0.2Zr-0.2Cd
Al-Mg alloy - Al-5/10Mg
Al-Mg alloy - Al-8Mg alloy
Al-Mg alloy - Alloy with 1-8 at.% Mg
Al-Mg alloy - Alloy with 7% Mg
Al-Mg alloy - Alloy with 86% Mg
Al-Mg alloy - Alloys with 1-4.5% Mg
Al-Mg alloy - Chemical polishing
Al-Mg alloy - Electrolytic thinning
Al-Mg alloy - Electrolytic thinning
Al-Mg alloy - Electrolytic thinning by Mirand-Saulnier technique
Al-Mg alloys - Chemical etching
Al-Mg alloys - Chemical etching
Al-Mg alloys - Chemical etching
Al-Mg alloys - Chemical etching
Al-Mg alloys - Electrolytic polishing
Al-Mg, Al-Mg-Si, Al-Zn-Mg, Al-Cu-Mg alloys - Chemical polishing
Al-Mg-Mo-O system - Chemical etching - General microstructure
Al-Mg-Si alloy - Al-1-2% Mg2Si
Al-Mg-Si alloy - Alloy 6063 Al-0.7Mg-0.4Si
Al-Mg-Si alloy - Electrolytic thinning
Al-Mg-Zn alloy - Al-2.6Mg-6.3Zn
Al-Mg-Zn alloy - Electrolytic thinning by PTFE holder technique
Al-Mn alloy - Al-1 wt.% Mn - Electrolytic polishing
Al-Mn alloy - Al45Mn55 - Electrolytic polishing
Al-Mn alloy - Alloy with 1-4% Mn
Al-Mn alloy - Electrolytic thinning by Mirand-Saulnier technique
Al-Mn-C alloy - Al43 x Mn55 x C2
Al-Mo-O system - Al2O3-< 5% Mo - General microstructure
Al-Ni alloy - Al-Al3Ni eutectic
Al-Ni alloy - Ni3Al - Electrolytic thinning
Al-Ni alloy thin film - Chemical etching - General microstructure
Al-Ni alloy thin films - Flux etching and cleaning
Al-Ni system - Beta 2 alloys 45-55% Ni
Al-Ni, alloy thin film coatings - Etching
Al-Pt alloy - Al-Al2Pt5 eutectic - General microstructure
Al-Pt alloys - Grain size can be determined by polarised light
Al-Sb alloy - Al-AlSb eutectic - General microstructure
Al-Sb alloys - Chemical etching - General microstructure
Al-Si (12%) alloy - Chemical etching - General microstructure
Al-Si (5%) foil - Chemical cleaning
Al-Si alloy - Al, Al-Si alloys, Fe-Si alloys
Al-Si alloy - Chemical etching - General microstructure
Al-Si alloy - Chemical etching - General microstructure
Al-Si alloy - Particullary good for Al-Si alloys
Al-Si alloys - Electrolytic polishing
Al-Si alloys - For Al-Si alloys with Si bellow of 34 weight %
Al-Si and Al-Cu alloys, segregations, grain boundaries - Chemical etching - General microstructure
Al-Si specimens - Chemical polishing and etching
Al-Si-Cu foundary alloys, Color etchants - Chemical etching - General microstructure
Al-Si-Ni eutectic - Al-11Si-4.9Ni - General microstructure
Al-Sm alloys - Al rich alloys - General microstructure
Al-Ti alloy specimen - Al-Al3Ti section - General microstructure
Al-Ti-N system - (Al, Ti)N - General microstructure
Al-Ti-Zr-Sn-Mo alloy - Ti-6Al-2Sn-4Zr-2Mo
Al-Ti-Zr-Sn-Mo alloy - Ti-6Al-2Sn-4Zr-2Mo - Williams-Blackburn' electrolyte
Al-Tm alloys - Electrolytic polishing
Al-Tm alloys - Etchant for alloy with 0-40% Tm
Al-U alloys - Chemical etching - General microstructure
Al-U alloys - Electrolytic thinning
Al-Zn (10%) alloy sheet - Electrolytic polishing
Al-Zn alloy - Alloy with 22% Al - General microstructure
Al-Zn alloy - Electrolytic polishing
Al-Zn alloy - Electrolytic polishing
Al-Zn alloy - Electrolytic thinning
Al-Zn alloy - For alloy with 38 at.% Zn - General microstructure
Al-Zn alloy - For alloys with 20% Al - General microstructure
Al-Zn alloy - For alloys with 21.5% Zn - General microstructure
Al-Zn alloy - For alloys with 25 at.% Zn - General microstructure
Al-Zn alloy - For alloys with 29 at.% Zn - General microstructure
Al-Zn alloys - Alloys with more then 8% Zn
Al-Zn alloys - Chemical etching - General microstructure
Al-Zn alloys - Electrolytic thinning
Al-Zn alloys - Electrolytic thinning
Al-Zn alloys - For alloys with < 20% Zn - General microstructure
Al-Zn alloys - For alloys with 6.5 at.% Zn - General microstructure
Al-Zn, Cu alloy specimens - Physical etching - General microstructure
Al-Zn-Mg alloy - 7039 alloy 4% Zn, 2.8-3% Mg
Al-Zn-Mg alloy - Al, 53% Zn, 1.7% Mg (+0.04% Ti)
Al-Zn-Mg alloy - Alloy with 5.3% Zn, 2.5% Mg
Al-Zn-Mg alloy - Alloy with 6% Zn and 2% Mg
Al-Zn-Mg alloy - Alloy with 6.86% Zn, 2.30% Mg
Al-Zn-Mg alloy - Alloys with 4-6% Zn, 1-4% Mg
Al-Zn-Mg alloy - Electrolytic thinning
Al-Zn-Mg-Cu alloy - 7075 alloy - Electrolytic polishing
Al-Zn-Mg-Cu alloy - 7075 alloy 5.5-5.8% Zn, 2.1-2.6% Mg, 1.6-1.7% Cu
Al-Zn-Mg-Cu alloy - Al-5.5Zn-2.5Mg-1.5Cu
Al-Zn-Mg-Cu alloy - Al-5/7Zn-2/3Mg-1/3Cu
Al-Zn-Mg-Cu alloys - Chemical etching
Al-Zn-Mn alloy - Alloy with 5% Zn, 2% Mg
Al-Zr alloy - For alloy with 0.8% Zr - Al-Zr alloy
Al-killed drawing steel - Fe-0.07C-0.3Mn-0.03/0.05Al
Al/Ni specimen surface coatings - Electrolyticlytic removal
Al203 as (0001) or (01T2) sapphire blanks - Thermal cleaning
Al2NiO4 specimens - Chemical etching - General microstructure
Al2O3 (0001) wafers - Chemical cleaning
Al2O3 (0001) wafers - Chemical etching - General microstructure
Al2O3 (0001) wafers - Metal etching
Al2O3 (0O01) natural corundum - Etching
Al2O3 (ruby and sapphire) - Dislocation etching
Al2O3 - Chemical etching
Al2O3 - Chemical etching
Al2O3 - Chemical etching
Al2O3 - Chemical etching - General microstructure
Al2O3 - Chemical etching - General microstructure
Al2O3 - Dislocation etching
Al2O3 - Dislocation etching
Al2O3 and Al2PxOy thin films - Solvent, cleaning
Al2O3 anodized coating - Chemical cleaning
Al2O3 as fused sapphire parts in amorphous form - Chemical cleaning
Al2O3 as natural corundum - Molten flux removal
Al2O3 as natural single crystals - Chemical cleaning
Al2O3 as natural single crystals - Cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks - Chemical cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks - Solvent degreasing
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks - Surface treatment
Al2O3 pressed powder - Chemical cleaning
Al2O3 pressed powder - Gas cleaning
Al2O3 pressed powder substrates - Chemical etching - General microstructure
Al2O3 single crystal - Vacuum, cleaning
Al2O3 single crystal sapphire - Dislocation etching
Al2O3 single crystal spheres - Thin film coating
Al2O3 specimens - Chemical cleaning
Al2O3 substrate - Cleaning
Al2O3 substrate blanks - Cleaning
Al2O3 substrate blanks - Gas cleaning
Al2O3 thin film - Chemical etching - General microstructure
Al2O3 thin film - Electrolytic etching - General microstructure
Al2O3 thin film deposition on InGaAsP/InP - Oxide, passivation
Al2O3 thin films DC reactively sputtered on (111) silicon wafers - Chemical etching - General microstructure
Al2O3, CeO2 and Cr2O3 - Physical etching - General microstructure
Al2O3, mixture of Al2O3 and MgO, or SnO2 - Thermal etching
Al2O3, native oxide films on AlAu alloys - Chemical etching - (cleaning)
Al2O3, thin film deposited on silicon - Photochemical, forming
Al2O3-TiC sintered cermets - Chemical etching
Al2O3-Zr (1%) doped single crystal - Physical etching - General microstructure
Al2SiO5 specimens - Chemical etching - General microstructure
Al2TiO5, grain boundary etchant - Chemical etching - General microstructure
AlAs (110) wafers - Gas, oxidation
AlAs thin films - Chemical polishing
AlFe alloy - Thermal etching
AlGaAs (100) wafer - Chemical cleaning
AlN on Si and GaAs substrates - Chemical etching - General microstructure
AlN specimens - Chemical etching - General microstructure
AlN thin film on (100) gallium arsenide - Chemical etching - General microstructure
AlN thin film on (111) silicon wafer - Chemical etching - General microstructure
AlN thin films (100) and (111)-Acid, float-off
AlN thin films - Thermal etching
AlN thin films deposited on GaAs-Zn doped - Chemical etching - General microstructure
AlN-La2O3 - Chemical ecthing
AlNi2 single crystal - Chemical etching - General microstructure
AlP single crystal wafer - Chemical polishing
AlPO4 single crystal - Chemical etching - General microstructure
AlSb (111) wafers - Chemical etching - General microstructure
AlSb - Dislocation etching
AlSb ingot material preparation - Chemical cleaning
AlSb wafers - Chemical etching - General microstructure
AlSb wafers - Chemical polishing
AlSb wafers - Chemical polishing
AlSb wafers - Chemical polishing
AlSb/GaSb wafers - Chemical etching - General microstructure
AlSi (5%) spheres - Gas, cleaning
AlSi thin film layers - Physical etching - General microstructure
AlSi-671, S-816 alloys - Chemical etching - General microstructure
AlSi0671, S-816 alloys - Chemical etching - General microstructure
AlSiCuSn cast alloys - Color etchant - General microstructure
Aldridge's etchant - Chemical etching
Alexander's etchant - Chemical etching
Alkaline sodium picrate etchant - Chemical etching
Alkaline sodium picrate etchant - High carbon steels - Electrolytic etching
Alkaline sodium picrate etchant - Tool steels - Chemical etching
Alkaline sodium picrate etchant - Tool steels - Electrolytic etching
Alkaline sodium picrate etchant - Tool steels - Electrolytic etching
Alkaline sodium picrate etchant - Tool steels - Electrolytic etching
Alkaline sodium picrate etchant - W-Co eutectic alloys - Chemical etching
All Mg alloys in the as cast or heat treated condition, grain-boundary etchant - Chemical etching
All materials - EBSD sample preparation
All materials - EBSD sample preparation
All materials - EBSD sample preparation
All materials - EBSD sample preparation
All materials - EBSD sample preparation
All materials - EBSD sample preparation
Allen's etchant - InSb (111) wafers - Chemical polishing
Alloy 800 - 0.04/0.05C-0.2/0.5Si-0.5/0.6Mn-33/34.5Ni-21.5/22.5Cr-0.2/0.55Ti-0.1/0.2Al-0/0.1Cu
Alloy Al69Nb20Ni11 - Twin jet polishing mehod
Alloy C73 - Chemical etching
Alloy Co67Ta33 - Twin jet micro mehod
Alloy Fe47Ni44Al9 - Twin jet polishing mehod
Alloy Fe67Al24C6 - Twin jet polishing mehod
Alloy K42B - Chemical etching - General microstructure
Alloy MA 6000 - Twin jet polishing mehod
Alloy Ni33Al33Cr34 - Twin jet polishing mehod
Alloy Ni50Al50 - Twin jet polishing mehod
Alloy Ni50Co18Al32 - Twin jet polishing mehod
Alloy Ni74Al25C1 - Twin jet polishing mehod
Alloy Ni76Al17Ti6 - Twin jet polishing mehod
Alloy Ni89Al11 - Twin jet polishing mehod
Alloy NiAl - Electrolytic polishing
Alloy No. 152 - Chemical etching - General microstructure
Alloy No. 25 - Chemical etching - General microstructure
Alloy SRR99 - Twin jet polishing mehod
Alloy Ti42Si38 - Twin jet polishing mehod
Alloy Ti52Al48 - Twin jet polishing mehod
Alloy Ti52Al48 - Twin jet polishing mehod
Alloy Ti52Al48V1 - Twin jet polishing mehod
Alloy Ti83Co12Al5 - Twin jet polishing mehod
Alloy and high speed steels - Universal electrolyte
Alloy steel specimens - Color etching - Colors pearlite and hardened structures of unlloyed steel specimens
Alloy steels - Color etchant - General microstructure
Alloy steels - Color etching - For carbon, alloy and Fe-Mn (5-18% Mn) steels
Alloy steels - Color etching - For carbon, alloy and manganese steels - Colors ferrite grains, carbides and phosphides remain white
Alloy steels - Color etching - For carbon, alloy and tool steels
Alloy steels - Color etching - Colors ferrite grains - Reveals banded structures
Alloy steels - Color etching - Colors the martensite in Fe-C alloys
Alloy steels - Color etching - For Mn, Mn-C, Mn-Cr steels
Alloy steels - Electrolytic polishing
Alloy steels - Electrolytic polishing
Alloy steels - Electrolytic polishing
Alloy steels - Revealing prior austenite grain in alloy steels
Alloy steels with Ni, Co - Chemical etching - General microstructure
Alloy steels with Ni, Co - Chemical etching - General microstructure
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 100Cr6 steel
Alloyed ferrite steels - Electrolytic polishing - 10CrMo9-10 steel
Alloyed ferrite steels - Electrolytic polishing - 20CrMoV4-10 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 8CrMoNiNb9-10 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X12CrMoS-17 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X17CrMoVNb-12-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X20CrMoWV12-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X22CrMoV12-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X40Cr6 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X40Cr6 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X40CrMoV5-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X7CrNiAl17-7 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X8CrMoTi-17 steel
Alloys of WC and Co - Electrolytic etching
Alloys with < 40 at.% Ni - General microstructure
Alminium gallium arsenide (Al(x) Ga(1-x) As) - Chemical etching - General microstructure
Alminium gallium arsenide (Al(x) Ga(1-x) As) - Chemical etching - General microstructure
Alminium gallium arsenide (Al(x) Ga(1-x) As) - Chemical polishing
Alnico V, iron alloy - Chemical etching - General microstructure
Alpha Ti - Chemical etching - General microstructure
Alpha brass (Cu-Zn) - Electrolytic etching - General microstructure
Alpha brass (Cu-Zn) - Electrolytic polishing
Alpha brass (Cu-Zn) - Physical etching - General microstructure
Alpha brass (Cu-Zn) - Physical etching - General microstructure
Alpha brass (Cu-Zn) single crystal - Electrolytic polishing, electro etching
Alpha brass - Chemical polishing
Alpha brass - Electrolytic etching
Alpha or alpha plus beta brass - Electrolytic polishing
Alpha or beta brass - Electrolytic polishing
Alpha phase in Pb-Bi and Pb-Sb alloys - Chemical etching - General microstructure
Alpha sulphur - Chemical etching
Alpha-Al2O3 (0001) wafers - Chemical etching - General microstructure
Alpha-Al2O3 powder material - Molten, flux, removal
Alpha-Beta brass - Electrolytic etching
Alpha-Beta brass - Potentiostatic etching
Alpha-HgI2 single crystal specimens - Chemical polishing
Alpha-HgI2 single crystal specimens - Chemical polishing
Alpha-Np - Electrolytic etching
Alpha-Pu - Electrolytic etching
Alpha-Pu and alloys - Electrolytic etching
Alpha-SiC (0001) wafers - Dislocation etching
Alpha-SiC (0001) wafers - Gas polishing
Alpha-U specimens - Electrolytic polishing
Alpha-U specimens - Electrolyticlytic cleaning
Alpha-brass [(Cu-Zn) with 29.38% Cu)] - Chemical cleaning
Alpha-brass single crystals - Cutting
Alum, KAl(SO4)2 x 12H2O (111) wafers - Chemical etching
Alum, KAl(SO4)2 x 12H2O single crystals - Dislocation etching
Alumel alloy - 95Ni-1.6Al-1.5Si-1.3Mn-0.3Co
Alumina (Al2O3) - Chemical etching - General microstructure
Alumina (Al2O3) - Chemical etching - General microstructure
Alumina (Al2O3) - Chemical etching - General microstructure
Alumina (Al2O3) - Chemical thinning
Alumina (Al2O3) - Dislocation etch pits
Alumina (Al2O3) - Irregular grain boundary attack
Alumina (Al2O3) - Physical etching
Alumina (Al2O3) - Physical etching - General microstructure
Alumina (Al2O3) - Physical etching - General microstructure
Alumina (Al2O3) - Physical etching and chemical etching
Alumina (Al2O3) - Pure aluminia - General microstructure
Alumina (Al2O3) single crystal - Chemical etching - General microstructure
Alumina (Al2O3) single crystal - Chemical etching - General microstructure
Alumina (Al2O3)-titania (TiO) system - 89% Al2O3, 11% TiO
Alumina (Beta-Al2O3) - Chemical etching - General microstructure
Alumina (Beta-Al2O3) - Physical etching
Alumina Al2O3 - Etching
Alumina dispersed Nichrome - Ni-20% Cr-0.6/1.5% Al2O3 - Electrolytic thinning
Alumina rich spinel single crystal (MgAl2O4) - Chemical etching - General microstructure
Alumina-Al2O3 - Chemical polishing
Alumina-Al2O3 - Chemical polishing
Alumina-Al2O3 with 0.04% Cr - Chemical polishing
Alumina-silica system - 60% Al2O3, 40% SiO2
Alumina-silical-lime-nitride glasses - 20.2-25.3% Si, 8.3-14.3% Al, 3.4-4.3% Cu, 43.5-60.6% O, 2.2-16.8% N
Alumina-silicon-phosphorous trioxide-Yttria glass - 49.2 mol.% Al2O3-38.8% SiO2-9.0% P2O3-9.0% Y2O3
Aluminia-lanthanum oxide dispersed Nichrome - Ni-20Cr-0.04Al2O3-0.04La2O3
Aluminium (99.99%) - Dislocation etching
Aluminium (CP or dilute alloy) - Dislocation etching
Aluminium (CP, SP) - Dislocation etching
Aluminium (CP, SP) - Dislocation etching
Aluminium (CP, UP) - Dislocation etching
Aluminium (UP) - Dislocation etching
Aluminium - A general electrolytic polishing for aluminum
Aluminium - Alumina (Al2O3) alloy - Electrolytic thinning
Aluminium - Alumina (Al2O3) alloy - Electrolytic thinning
Aluminium - Alumina (Al2O3) alloy - Low oxide alloys - Jet electrolytic polishing
Aluminium - Alumina (Al2O3) alloys - Chemical etching - General microstructure
Aluminium - Anodising
Aluminium - Attack polishing
Aluminium - Cathodic etching
Aluminium - Chemical cleaning
Aluminium - Chemical etching - General microstructure
Aluminium - Chemical etching - General microstructure
Aluminium - Chemical etching - General microstructure
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing - Only suitable for very thin specimen
Aluminium - Differentiation of intermediate phases in Al with high contents of Cu, Mn, Mg, Fe, Be, Ti, Fe3Al
Aluminium - Distinct grain boundaries in corrosion sensitive alloys
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing, chemical polishing
Aluminium - Electrolytic thinning
Aluminium - Electrolytic thinning
Aluminium - Electrolytic thinning
Aluminium - Electrolytic thinning
Aluminium - Electrolytic thinning
Aluminium - Especially for Cu-Al alloys (also useful in macroetching)
Aluminium - Etching for dislocations
Aluminium - Etching for etch pits
Aluminium - Etching for etch pits
Aluminium - Etching for etch pits on glide dislocation
Aluminium - Etching for grain size
Aluminium - Etching for grain size
Aluminium - For most of Al and Al alloys, especially those containing Cu
Aluminium - For most types of Al and Al alloys - General microstructure
Aluminium - For most types of Al and Al alloys - General microstructure
Aluminium - Grain boundaries, slip lines in high purity Al
Aluminium - Ion etching
Aluminium - Physical etching - General microstructure
Aluminium - Precipitates of beta Al8Mg5 or Mg2
Aluminium - Precipitates, grain boundaries, Al-Si and Al-Cu alloys
Aluminium - Pure Al, Al-Cu, Al-Mn, Al-Mg, Al-Mg-Si alloys - General microstructure
Aluminium - Pure Al, Al-Mg and Al-Mg-Si alloy - Etch figures
Aluminium - Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg, Al-Mn-Mg alloys - General microstructure
Aluminium - Pure Al, alloys of Cy-Al, Mg-Si-Al, Mg-Al, and Zn-Al - General microstructure
Aluminium - Universal electrolyte
Aluminium - magnesium oxide (Al2O3 + MgO) - Chemical etching - General microstructure
Aluminium 7075 alloy - Al-5.5Zn-2.5Mg-1.5Cu-0.3Cr
Aluminium alloy 6061 - Al-1Mg-0.6Si-03Cu-03.Fe
Aluminium alloy and cast aluminum - Solution used as a general micro-etch in the study of surface structure
Aluminium alloys - 1xxx series alloys
Aluminium alloys - 1xxx series alloys, all wrought alloys and casting alloys
Aluminium alloys - 2xxx series alloys, Al-Cu or Al-Zn casting alloys
Aluminium alloys - 2xxx, 3xxx series; Al-Cu and Al-Mn casting alloys
Aluminium alloys - 2xxx, 7xxx series; Al-Cu or Al-Zn alloys, hot worked and heat treated alloys
Aluminium alloys - 3xxx, 5xxx series; Al-Mg casting alloys
Aluminium alloys - 7xxx series alloys, Al-Zn casting alloys
Aluminium alloys - Al alloys as sheet material and as an evaporated thin film on other materials
Aluminium alloys - Alloy 6061, 6xxx series alloys, hot worked and heat treated alloys
Aluminium alloys - Alloys 2017, 2024 and artificially aged tempers
Aluminium alloys - Brazing sheet. Examination for cladding thickness
Aluminium alloys - Chemical etching
Aluminium alloys - Colors etching
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - For examination of grain size and shape, cold working incomplete recrystallization
Aluminium alloys - Grain boundary eutectic formations
Aluminium alloys - Hot worked and heat treated alloys
Aluminium alloys - One of the best electrolyte for universal use
Aluminium and alloys - Chemical polishing
Aluminium and alloys - Cleaning etch
Aluminium and alloys - Electrolytic polishing
Aluminium and alloys - Electrolytic polishing
Aluminium and alloys - Electrolytic thinning
Aluminium and alloys - Electrolytic thinning
Aluminium and alloyss - Chemical etching - General microstructure
Aluminium and aluminium alloys - Al alloys - Forgings and castings
Aluminium and aluminium alloys - Al alloys of all types - Forgings and castings
Aluminium and aluminium alloys - Al-Cu-Mg alloys - Al Alloys of all types
Aluminium and aluminium alloys - Electrolytic polishing
Aluminium and aluminium alloys - Electrolytic polishing
Aluminium and aluminium alloys - Electrolytic polishing
Aluminium and aluminium alloys - Electrolytic polishing
Aluminium and aluminium alloys - Electrolytic polishing
Aluminium and aluminium alloys - Grain size determination and determination orientation
Aluminium and aluminium alloys - Pure aluminium and Al alloys - To reveal grain structure and slip lines
Aluminium bronze - Chemical etching - General microstructure
Aluminium nitride (AlN) - AlN with La2O3 - General microstructure
Aluminium nitride (AlN) - AlN with Y2O3 - General microstructure
Aluminium nitride (AlN) - Chemical etching - General microstructure
Aluminium nitride (AlN) - Chemical etching - General microstructure
Aluminium nitride (AlN) - General microstructure
Aluminium nitride AlN - Etching
Aluminium oxide (Al2O3) - Chemical etching - General microstructure
Aluminium oxide (Al2O3) - Chemical etching - General microstructure
Aluminium oxide (Al2O3) - Chemical etching - General microstructure
Aluminium oxide (Al2O3) - Chemical etching - General microstructure
Aluminium oxide (Al2O3) - Chemical etching - General microstructure
Aluminium oxide (Al2O3) - Physical etching - General microstructure
Aluminium oxide (Al2O3) - Physical etching - General microstructure
Aluminium oxide - Chemical etching - General microstructure
Aluminium polycrystalline sheet - Chemical cleaning
Aluminium silicate (Al2SiO5) - Physical etching - General microstructure
Aluminium single crystal
Aluminium single crystal - Electrolytic polishing
Aluminium single crystal - Electrolytic polishing
Aluminium single crystal specimens - Chemical polishing
Aluminium single crystal specimens - Chemical polishing
Aluminium thin film - Chemical etching - General microstructure
Aluminium thin film - Cleaning etch
Aluminium thin film - Cleaning etch
Aluminium thin film - Cleaning etch
Aluminium thin film - Reactive ion etching
Aluminium thin films - Chemical cleaning
Aluminium thin films deposited on GaAs and Si (100) wafers - Cleaning etch
Aluminium thin films evaporated on GaAs - Al thin films evaporated on GaAs, (100) substrates used in fabricating GaAs FETs
Aluminium thin films evaporated on silicon and Gallium arsenide - Chemical etching
Aluminium thin films on semiconductor wafers - Cleaning etch
Aluminium-magnesium oxide (Al2O3 + MgO) - Chemical etching - General microstructure
Aluminum alloys - Color etching - Coloring of the matrix grains
Aluminum alloys - Color etching - Colors CuAl2 and Mg2Si phases
Aluminum alloys - Color etching - Colors phases
Aluminum alloys - Color etching - General microstructure
Aluminum alloys - Color etching - General microstructure
Aluminum alloys - Color etching - General microstructure
Aluminum alloys - Color etching - Intergranular corrosion
Aluminum antimonide (AlSb) - Chemical polishing
Aluminum antimonide (AlSb) - Chemical polishing
Aluminum etchant type A - VLSI - Chemical etching
Aluminum, brass - EBSD sample preparation
Am2O3 - Chemical etching - General microstructure
AmO(2-x), AmO(2-x) with Am2O3 - Chemical etching - General microstructure
Amberg's etchant - High speed steels - Chemical etching
Amberg's etchant - Martensitic stainless steels - Chemical etching
Ambler and Slattery's etchant - UO2 - Chemical etching
Ambler and Slattery's etchant - Uranium - Electrolytic etching
Ambler's etchant - Zr3Al alloys - Chemical etching
Ambler's etchant - Zr3Al-based alloys - Chemical etching
Amine Gallate etching of silicon wafers I - Chemical etching
Ammonium persulphate etchant - Steels - Chemical etching
Amyl nital - Iron and steels - Chemical etching
Amyl nital etchant - Steels - etching
Anderson's etchant - For etching pure Mn and lean alloys - Chemical etching
Anderson's etchant - Manganese - Chemical etching
Antimonium - Dislocation etching
Antimonium - Dislocation etching
Antimony - Electrolytic polishing
Antimony - For pure and technically pure types of Sb - General microstructure
Antimony - Sb and Sb alloys - General microstructure
Antimony - Sb and Sb alloys - General microstructure
Antimony - Sb and Sb alloys, Pb-Sb, Bi-Sn and Bi-Cd alloys
Antimony - Sb, Bi and their alloys
Antimony - Sb-Pb alloys - General microstructure
Antimony etchant - Ge and Si wafers - Chemical etching
Antimony selenide - Arsenic selenide system
Antimony specimens - Electrolytic mechanical polishing
Antimony specimens - Electrolytic polishing
Antimony specimens - Electrolytic polishing
Antimony specimens - Etch pits etching
Antimony specimens - Etch pits etching
Antimony specimens - For pure and technically pure types of Sb - Low alloy Sb
Aqua regia - Aluminium - Chemical etching - Electrolytic polishing
Aqua regia - Au-Al alloys - Chemical etching - General microstructure
Aqua regia - Austenitic stainless steels
Aqua regia - Austenitic stainless steels - Chemical etching
Aqua regia - Austenitic stainless steels - Chemical etching
Aqua regia - Chromium - Chemical etching
Aqua regia - Fe-Ni-Cr heat resistant casting alloys - Etchant for delineating general structure
Aqua regia - Gold - Chemical etching
Aqua regia - Heat resistant alloys - Chemical etching
Aqua regia - Lead sulphide (PbS) - Chemical polishing
Aqua regia - Lead sulphide-selenide (PbS(1-x) x Se(x)) - Chemical etching
Aqua regia - Molybdenum - Chemical etching
Aqua regia - Ni-Cr-Fe alloys (Inconel) - Chemical etching - General microstructure
Aqua regia - Pd thin film - Chemical cleaning
Aqua regia - PdAu deposited as a 11 mixture on glass, quartz, and aapphire substrates - Chemical etching
Aqua regia - Platinum - Chemical etching
Aqua regia - Pt and alloys - Chemical etching
Aqua regia - Pt-Tb alloys (20-35 at.% Tb) - Etch for TbPt3
Aqua regia - Pure Au and alloys
Aqua regia - Pure gold - Chemical etching
Aqua regia - Refactaly steel - Chemical etching - General microstructure
Aqua regia - Rh alloys - Chemical etching
Aqua regia - Rh specimens as wire, rods, sheets, and plated coatings - Chemical etching
Aqua regia - Rhodium - Chemical etching
Aqua regia - Ru specimens - Chemical etching - General microstructure
Aqua regia - Se Chemical etching
Aqua regia - Selenium - Chemical etching
Aqua regia - Stainless steel - Chemical etching
Aqua regia - Stainless steel - Chemical etching
Aqua regia - Wrought heat-resistant steels - Chemical etching
Aqua regia - ZnTe thin film deposits - Chemical etching - General microstructure
Aqua regia 5% - 73 J (Co-20Cr-6Mo) alloy - Chemical etching - General microstructure
Aqua regia 6% - Cemented carbides (Co) - Electrolytic etching - General microstructure
Aqua regia plus acetic acid etchant - Ferritic stainless steels - Chemical etching
Aqua regia, dilute - Austenitic stainless steels - Chemical etching
Aqua regia, dilute - Pb-Te-Co system - Lead telluride-Cobalt section
Aqua regia, modified - GaP (111) wafers - Chemical etching
Armco Fe - Dislocation etching
Arsenic single crystal - Polishing and etching
As (0001) cleaved specimens - Chemical polishing
As (0001) wafers - Solution used as a general removal etch
As (111) specimens - Chemical polishing
As (111) specimens - Dislocation etching
As-Cd-Ge-Se system - For CdSe-Ge1.5-As0.5-Se3 section - General microstructure
As-Pb-Ge-Se system - PbSe-Ge1.5As0.5Se3 section
As-Sb system (single crystal) - Etching for pit etch
Astraloy - Ni-16/18Co-15/16Cr-4.5/5.5Mo-3.85/4.15Al-3.35/3.65Ti-0.03/0.09C (+B)
Au (100) single crystal thin films - Specimen preparation
Au (111) and (100) single crystal blanks - Chemical etching - General microstructure
Au (111) wafers and other orientations - Chemical etching - General microstructure
Au alloys - Chemical etching
Au alloys - Chemical etching
Au alloys - Chemical etching
Au alloys - Chemical etching
Au and Au alloys - Chemical etching
Au and Au alloys - Electrolytic etching - General microstructure
Au and alloys - Chemical etching
Au and alloys - Electrolytic etching
Au and alloys - Electrolytic etching
Au as hard gold coatings on copper substrates - Metal plating
Au as single crystal blanks - Abrasive polishing
Au diffused into silicon - Chemical etching - General microstructure
Au diffused into silicon wafers - Chemical etching - General microstructure
Au foil - Eletrolytic polishing
Au polycrystalline specimens - Acid, float-off
Au single crystal spheres - Thermal forming
Au slugs or wire - Chemical cleaning
Au specimens - Chemical etching - General microstructure
Au specimens - Electrolytic polishing
Au specimens - Electrolytic polishing
Au specimens - Oxide removal
Au specimens and thin films - Chemical etching - General microstructure
Au spherulitic particles - Chemical etching - General microstructure
Au thin film deposited by CVD - Metal diffusion
Au thin film deposited on glass - Chemical etching - General microstructure
Au thin film deposits on silicon wafers - Chemical etching - General microstructure
Au thin films - Chemical ecthing
Au thin films - Electrolytic polishing
Au thin films - Gas, diffusion
Au thin films - Thermal etching
Au thin films deposited on (0001) muscovite mica substrates - Acid, float-off
Au thin films deposited on (100) NaCl substrates - Acid, float-off
Au thin films deposited on glass - Chemical etching - General microstructure
Au thin films deposited on soda-lime glass - Thermal, structure
Au thin films evaporated on alumina substrates - Gas, drying
Au thin films pulse plated on alumina blanks - Gold plating
Au-20Sn & Sn-36Pb-2Ag alloys - Chemical etching - General microstructure
Au-Ag-Cu alloys - Chemical etching - General microstructure
Au-Ag-Cu alloys - Chemical etching - General microstructure
Au-B alloys - Chemical etching - General microstructure
Au-Cd alloy - Electrolytic polishing
Au-Cd alloy specimens - Chemical polishing
Au-Cd alloys - Also etches dislocation, grain boundaries
Au-Cd alloys - Chemical etching - General microstructure
Au-Co alloys - Electrolytic thinning
Au-Co alloys - For alloys with bellow 22 at.% Co
Au-Cr alloys - Cast alloys with < 41.5 at % Cr and > 95 at.% Cr
Au-Cr alloys - Electrolytic thinning
Au-Cr alloys - Jet electrolytic polishing
Au-Cu alloy - Cu3Au - Electrolytic thinning
Au-Cu alloy - Cu3Au - Electrolytic thinning
Au-Cu alloy - Cu3Au - Electrolytic thinning
Au-Cu alloy - Cu3Au- Electrolytic thinning
Au-Cu alloy - Electrolytic polishing
Au-Cu alloy - Electrolytic polishing and etching
Au-Cu alloy - For alloys with 25 at.% Au
Au-Cu alloys - For cast alloys - General microstructure
Au-Cu-Ag alloy - Au-36 at.% Cu-11 at.% Ag
Au-Cu-Ag alloys - Chemical etching
Au-Cu-Ag alloys - For Au-Cu-Ag alloys - General microstructure
Au-Cu-Co alloys - Chemical etching - General microstructure
Au-Fe alloys - For cast alloys with bellow 24 at.% Fe - General microstructure
Au-Ga alloys - For cast alloys with less then 12.7 at.% Ga
Au-Ga system - Chemical etching - General microstructure
Au-Ga thin films EB evaporated on NaCl (100) substrates - Gas, aging defects
Au-Ge alloys - For cast alloys with < 2.5 at.% Ge
Au-In alloy specimens - Chemical polishing
Au-In-Pb system - Alloys with 40-95 wt.% Pb, 30-5% AuIn2 may be examined unetched
Au-In-Te - Chemical etching - General microstructure
Au-Mn alloy - Electrolytic thinning
Au-Mn alloys - Electrolytic polishing
Au-Ni alloys - Electrolytic polishing
Au-Ni-Fe system - Fe-4Au-2Ni - General microstructure
Au-Ni-Fe system - Used on gold plated Ni-Fe alloys for intermediate layer diffusion
Au-Pb-Sn alloys - Chemical etching
Au-Sn-Pb alloys - AuSn-Pb section of diagram Au-Sn-Pb
Au-Sn-Pb alloys - Chemical etching - General microstructure
Au-Ti alloys - For cast alloys <12.3 at.% Ti - General microstructure
Au-V alloy (Au4V) - Electrolytic thinning
Au-V alloys - For cast alloys with < 60 at.% V and > 41.5 at.% V
Au-V system - Chemical etching - General microstructure
Au-Zn alloys - For cast alloys with < 30 at.% Zn
Au-Zn as an evaporated metal contact on InGaAsP/InP(100) - Chemical ecthing
Au/TiW thin - Films on Al film deposited on (111) silicon wafers-xgas, blister forming
Au2Bi specimens - Chemical etching
Au2Bi specimens as Bi-Au2Bi - Chemical etching
Au2Cs specimens - Chemical etching - Aqua regia, dilute
Au2Ga thin films - Ionized gas thinning
AuAg(x) single crystal ingots - Chemical etching - General microstructure
AuGa2 (100) oriented thin films on NaCl - Chemical etching - General microstructure
AuGe (13%) alloy as Au/AuGe/Ni evaporated multilayered films - Chemical etching - General microstructure
AuGe (13%) alloy as pellets, sheets - Chemical etching - General microstructure
AuHg alloy specimens - Chemical polishing
AuSn (20%) alloy as evaporated thin films - Chemical etching - General microstructure
AuSn (20%) alloy ribbon - Chemical etching - General microstructure
AuSn (20%) alloy ribbon - Chemical etching - Tri-iodine etchant, modified
AuTi thin films - Chemical thinning
Austenite grain boundaries in case-hardened steels - Chemical etching
Austenite grain boundaries in case-hardened steels and steels for hardening and tempering - Chemical etching
Austenite grain boundaries in cold-worked steels - Chemical etching
Austenite grain boundaries in cold-worked steels - Chemical etching
Austenite grain boundaries in valve steels. Hardening and tempering steels, case-hardening steels - Chemical etching
Austenitic 18/8 stainless steels - Potentiostatic etching
Austenitic Mn steels - Chemical etching
Austenitic Mn steels - Chemical etching
Austenitic heat resistant materials - 80% Ni-20% Cr, 35% Ni-20%-45% Fe
Austenitic heat resistant materials - Austenitic heat resistant materials; 80% Ni-20% Cr, 35% Ni-20% Cr-45% Fe
Austenitic nickel steels - Chemical etching - General microstructure
Austenitic stainless steel - Chemical polishing
Austenitic stainless steel - Chemical polishing
Austenitic stainless steel - Fe-0.02/0.13C-0.2/1.6Si-0.4/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mn-0/01.9N
Austenitic stainless steel - Fe-0.02/0.13C-0.3/1.6Si-0.4/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mo-0/0.8Nb
Austenitic stainless steel - Fe-0.02/0.13C-0.3/1.6Si-0.7/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mo
Austenitic stainless steel - Fe-0.02/0.13C-0.3/1.6Si-0.7/8.0Mn-16/27Cr-5/21Ni-4.0/5.0Mo-0/0.6Ti
Austenitic stainless steel - General microstructure
Austenitic stainless steels - Attacks carbides and sigma phase
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Chemical etching
Austenitic stainless steels - Color etching - General microstructure
Austenitic stainless steels - Electrolytic etching
Austenitic stainless steels - Electrolytic etching
Austenitic stainless steels - Electrolytic etching
Austenitic stainless steels - Potentiostatic etching
Austenitic stainless steels and high alloy nickel steels - Electrolytic etching
Austenitic stainless steels and high alloy nickel steels - Electrolytic etching
Austenitic stainless steels and welds - Color etching - Reveals delta ferrite in welds
Austenitic steels, CrNi steels - Electrolytic polishing
Austenitic steels, CrNi steels, N-alloyed - Electrolytic polishing
Austenitic steels, CrNiMo steels - Electrolytic polishing - 17Cr, 17Ni, 4.5 Mo steels
Austenitic steels, CrNiMo steels - Electrolytic polishing - X120Mn12 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X2CrNiMoN18-4 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X2CrNiMoN20-15 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X2NiCoMo18-8-5 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X35Mn18 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X45CrMnN23-8 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X5CrNiMo18-10 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X6CrNi1-11 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X6CrNiMo17-13 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X6CrNiMoN17-13 steel
B as boron nitride test blanks - Metal, removal/preferential
B etchant - For Ti
B etchant - Silicon - Chemical etching
B grown as thin films - Growth
B single crystal ingot - Chemical etching - General microstructure
B-C alloys - Chemical etching - General microstructure
B-C alloys - Electrolytic etching
B-Ge system - General microstructure
B-Pt alloys - Chemical etching - General microstructure
B-Si alloys - Chemical etching - General microstructure
B-doped SiC - Thermal etching
B1900 alloy - Ni-8Cr-6Mo-1Ti-6Al-10Co-4Ta-0.1C (+B, Zr)
B2 high temperature steel - Fe-9.3Cr-1.55Mo - High temperature ferritic-martensite steel
B2Te3 single crystal - Chemical etching - General microstructure
B4C - Electrolytic etching
B4C - Electrolytic etching - General microstructure
B4C - Electrolytic etching - General microstructure
B4C ceramic with SiC - Electrolyticlytical etching
B4Ge3Ol2 single crystal - Chemical cleaning
B4Si specimens - Chemical etching - General microstructure
BCK-111 etchant - InP (100) wafers - Chemical etching
BF (100) oriented thin film - Chemical etching - General microstructure
BF3 etchant - Si single crystal spheres - Chemical ecthing
BHF etchant - NxSiO2 thin films - Chemical etching - General microstructure
BHF etchant - Si (100), p-type, 2 Ohm cm resistivity wafers - Chemical etching
BHF etchant - Si thin film epitaxy grown on (100) silicon wafer substrates
BHF etchant - Si3N4 thin film amorphous deposits - Chemical etching
BHF etchant - Si3N4 thin films RF plasma grown on silicon - Chemical etching
BHF etchant - Si3N4 thin films deposited on (100) silicon wafers - Chemical cleaning
BHF etchant - SiO2 thin films thermally evaporated - Chemical etching
BHF etchant - Ta (111) and (100) wafers - Chemical etching
BHF etchant - TiN thin films - Chemical etching - General microstructure
BHF etchant - TiN thin films deposited on poly-Si epitaxy layers - Chemical etching - General microstructure
BHF etchant - Zr specimens used for electroplating
BHF etchant, modified - Si3N4 and Si3NxOy thin films - Chemical etching
BHF etchant, modified - Si3N4 thin films - Chemical etching
BJ etchant - Ge (111) wafers - Chemical polishing
BN (100) cubic boron nitride - Metal, removal
BN amorphous thin films - Chemical etching - General microstructure
BN as pressed powder test blanks
BN as pressed powder test blanks - Chemical etching - General microstructure
BN as pressed powder test blanks - Chemical etching - General microstructure
BN as pressed powder test blanks - Chemical etching - General microstructure
BN single crystal films-Gas, crystallization
BP (100) and (111) single crystals - Molten flux
BP single crystal wafers - Electrolytic etching - General microstructure
BPK-221 etchant - InP (100) wafers - Chemical etching
BRM etchant - InP (100) n-type wafers - Chemical polishing
BRM etchant - WS2 single crystal specimens - Chemical polishing
BRM etchant - WSe2 single crystal specimens - Chemical polishing
BRM etchant - p-GaSb (111) wafers - Chemical etching
BSG as borosilicate glass on silicon - Metal diffusion
BSG etchant - SiO22 as a BSG glassy layer on silicon - Chemical etching
Ba specimen - A general removal and polish etch for barium
Ba specimen - This and other single acids can be used as general etchants for barium
Ba-Zr-S system (BaZrS3) - Chemical etching - General microstructure
Ba2Si2TiO2 single crystal - Chemical etching - General microstructure
Ba2TiO3 polycrystalline hemispheres - Cut, forming
Ba2TiO3 single crystal - Thermal processing
Ba2TiO3 specimens - Chemical polishing
BaF2 (111) specimen - Gas cleaning
BaF2 (111) wafers - Acid, float-off
BaF2 (111) wafers - Chemical polishing
BaF2 (111) wafers - Chemical polishing
BaF2 specimens - Chemical etching - General microstructure
BaF3 (111) wafers - Chemical etching - General microstructure
BaO in BaTi3O7, grain boundary etchant - Physical etching - General microstructure
BaSO4 - Chemical etching - General microstructure
BaTiO3 - Chemical etching - General microstructure
BaTiO3 - Dislocation etching
BaTiO3 and BaSrTiO3 - Chemical etching - General microstructure
BaTiO3 and BaTi3O7 - Chemical etching
BaTiO3 specimens - Chemical etching - General microstructure
BaWO4 single crystal - Chemical polishing
Bain-Vilella's etchant - Steel specimens - To reveal the prexisting austenite grain boundaries and tempered steels
Baker's etchant - Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg and Al-Mn-Mg alloys - Electrolytic etching
Barber's etchant - NaCl (100) wafers - Chemical etching
Barium chloride (fluoride) - Chemical etching - General microstructure
Barium sulphate - Chemical polishing
Barium - Electrolytic polishing
Barium Magnesium titanate - Bax-Ti(8-x)-Mgx-O16, 1.14>x>0.6
Barium Sodium Niobate - This gives square etch pits with sides parallel to [110]T
Barium fluoride (BaF2) - Chemical etching - General microstructure
Barium fluoride (BaF2) - Chemical polishing
Barium fluoride (BaF2) - Physical etching - General microstructure
Barium fluoride single crystal (BaF2) - Chemical etching - General microstructure
Barium oxide (BaO) - Chemical etching - General microstructure
Barium oxide (BaO) - Chemical etching - General microstructure
Barium silicate (3BaO x 5SiO2) - Chemical etching - General microstructure
Barium titanate (Samarium doped) - Chemical etching - General microstructure
Barium titanate - Also used for La, Ne and Sc doped material
Barium titanate - BaTiO3, BaTi3O7 - General microstructure
Barium titanate - Chemical etching
Barium titanate - Chemical etching - General microstructure
Barium titanate - Chemical polishing
Barium-lead-titanate-zirconate - (Pb0.7Ba0.3) x (Zr0.7TiO.3)3
Barker's anodizing solution for grain structure - Al and Al alloys - Chemical etching
Barker's etchant - 1000 series aluminium
Barker's etchant - Aluminium alloys - 1xxx, 3xxx, 5xxx, 6xxx series alloys, most casting alloy
Basic rules for obtaining damage-free mechanically polished specimens - EBSD sample preparation Be (001), (100), and (110) wafers - Electrolytic polishing
Be alloys, precipitates - Chemical etching - General microstructure
Be dispersed Ni - Ni-1 vol.% BeO - General microstructure
Be dispersed Ni-Co-Mo alloys - Ni-4.5Mo-30Co-2 vol.% BeO
Be polycrystaline spheres - Thermal processing
Be single crystal - Electrolytic polishing
Be specimens - Chemical etching - General microstructure
Be specimens - Chemical etching - General microstructure
Be thin film - Acid, removal
Be thin film - Electrolytic thinning
Be thin film - Freeze etchant
Be-3% Fe alloy - Electrolytic thinning
Be-Ag alloy - Alloys with < 10% Ag
Be-Ag alloys - Chemical etching
Be-Al alloy - Alloys with < 1% Al
Be-B alloys - For alloys with up to 10% B
Be-Bi alloys - Alloy with 0.5% Bi - General microstructure
Be-Bi alloys - Alloy with 0.5% Bi - General microstructure
Be-C alloys - Chemical etching - General microstructure
Be-Ca alloys - For alloys with up to 1% Ca
Be-Ca alloys - For alloys with up to 1% Ca
Be-Ce alloy - Chemical cleaning
Be-Co alloys - Chemical etching - General microstructure
Be-Co alloys - For alloys with up to 10% Co
Be-Cr alloys - Chemical etching - General microstructure
Be-Cu alloys - For alloys with up to 15% Cu
Be-Cu alloys with high Cu content, Be-Ag and Be-Al-Ti alloys - Chemical etching - General microstructure
Be-Cu specimens - Chemical etching - General microstructure
Be-Fe alloys - Chemical etching - General microstructure
Be-Fe alloys - Electrolytic polishing and chemical thinning
Be-Fe alloys - For alloys with up to 6% Fe
Be-Fe alloys - Jet etching
Be-Ge alloys - Chemical etching - General microstructure
Be-Mg alloys - Chemical etching - General microstructure
Be-Mn alloys - Chemical etching - General microstructure
Be-Mo alloys - For alloys with < 1% Mo
Be-N alloys - Chemical etching - General microstructure
Be-Nb alloys - For alloys with up to 10% Nb
Be-Ni alloys - For alloys with up to 10% Ni
Be-O alloys - Chemical etching - General microstructure
Be-Os alloys - For alloys with up to 10% Os
Be-Pd alloys - For alloys with up to 10% Pd
Be-Pt alloys - For alloys with up to 20% Pt
Be-Rh alloys - For alloys with up to 10% Rh
Be-Ru alloys - For alloys with up to 10% Ru
Be-S alloys - Chemical etching - General microstructure
Be-Se alloys - Chemical etching - General microstructure
Be-Si alloys - Chemical etching - General microstructure
Be-Sn alloys - Chemical etching - General microstructure
Be-Sn alloys - Chemical etching - General microstructure
Be-Ta alloys - For alloys with < 1% Ta
Be-Th alloys - For alloys with up to 10% Th
Be-Ti alloys - For alloys with < 10% Ti
Be-U alloys - For alloys with up to 5% U
Be-U alloys!!!, Be-Nb, Be-Y, and Be-Zr alloys - Chemical etching - General microstructure
Be-U-Y system - Chemical etching - General microstructure
Be-W alloys - For alloys with < 1% W
Be-Zn alloys - For alloys with < 0.6% Zn
Be-Zr alloys - For alloys with up to 5% Zr
BeO (0001) single crystal wafers - Chemical ecthing
BeO (0001) single crystals - Mechanical, defect
BeO (0001) wafer - Chemical etching - General microstructure
BeO (0001) wafer - Chemical etching - General microstructure
BeO (0001) wafer - Chemical etching - General microstructure
BeO (0001) wafer - Chemical etching - General microstructure
BeO (0001) wafers and pressed powder substrates - Chemical etching - General microstructure
BeO - Chemical etching
BeO - Chemical etching - General microstructure
BeO - Chemical etching - General microstructure
BeO - Dislocation etching
BeO - Dislocation etching
BeO - Dislocation etching
BeO specimens - Chemical etching - General microstructure
BeO+UO2+Y2O3 - Chemical etching - General microstructure
BeO, BaO, MgO, ZrO2 and Zr2O3 - Chemical etching
Beaujard and Tordeux's tint etchant - Tint etchant for steels
Beaujard and Tordeux`s tint etchant - Reveals grain boundaries and ferrite orientations
Beaujard's tint etchant - Tint etchant for steels
Beaujard's tint etchant - Tint etchant for steels
Bechet and Beaujard's etchant - Martensitic and bainitic steels - Chemical etching
Beck's solution - Aluminium
Beck's solution - Aluminium - Dislocation etching
Beraha's E etchant - Ni superalloys
Beraha's I etchant - Unalloyed and low alloy steels
Beraha's II etchant - Austenitic CrNi steels - Chemical etching - General microstructure
Beraha's II etchant - High-alloy steels
Beraha's III I etchant - Ni-base alloys, Hastelloy X, Hastelloy
Beraha's III etchant - Ni base casting alloys - Chemical etching
Beraha's III etchant - Ni-base alloys with more than 9Mo, Hastelloy X, Hastelloy C - Chemical etching
Beraha's III etchant - Ni-base and Co-base alloys
Beraha's cadmium sulfide tint etchant - For Fe, steel, and ferritic and martensitic stainless steel - Chemical etching
Beraha's etchant - Al and Al alloys - Chemical etching
Beraha's etchant - Cu alloys, cast irons, ferritic and martensitic stainless steels
Beraha's etchant - Iron, steels, cast irons - Tint etchant for pure iron and carbon steels, cast iron, and alloyed steels
Beraha's etchant - Martensitic chromium steels - Tint etching
Beraha's etchant - Martensitic chromium steels - Tint etching
Beraha's etchant - Steels specimen - Sulfides are colored yelow and matrix dark
Beraha's lead sulfide tint etchant - Iron and steels - Chemical etching
Beraha's martensite etchant - Color etching for ADI iron
Beraha's selenic acid etchant for copper - General microstructure
Beraha's selenic acid etchant for steels and superalloys - General microstructure
Beraha's sodium molybdate etchant - For steels - General microstructure
Beraha's tint etchant - For Al alloys - Chemical etching - General microstructure
Beraha's tint etchant - Al and Al alloys - Tint etching
Beraha's tint etchant - Austenitic stainless steels, maraging steels, PH gredes
Beraha's tint etchant - Brass and Cu-Be alloys - Tint etching
Beraha's tint etchant - Cast Ti alloys - Tint etching
Beraha's tint etchant - Co-based alloys - Tint etching
Beraha's tint etchant - Cu and Cu alloys - Tint etching
Beraha's tint etchant - Cu, brass, bronze alloys - Tint etching
Beraha's tint etchant - Ferritic and martensitic stainless steels, Mn steels, tool steels
Beraha's tint etchant - For cast irons, steels, tool steels, Mn steels, and ferritic and martensitic stainless steels - Chemical etching
Beraha's tint etchant - For ferrite - Chemical etching
Beraha's tint etchant - For irons, steels, tool steels - General microstructure
Beraha's tint etchant - For pearlitic steels and and cast irons - Chemical etching
Beraha's tint etchant - For stainless steels
Beraha's tint etchant - For stainless steels
Beraha's tint etchant - Ni superalloys - Tint etching
Beraha's tint etchant - Ni-base alloys
Beraha`s tint etchant - For iron and steels - General microstructure
Beraha`s tint etchant - For stainless steels - General microstructure
Beraha`s tint etchant - For Fe, Ni, or Co base heat resistant alloys
Beraha`s tint etchant - For cast iron and steels - General microstructure
Beraha`s tint etchant - For stainless steels - General microstructure
Beryllia (BeO) - Thermal and chemical etching
Beryllia single crystals (BeO) - Dislocation etching
Beryllia-Tellurium system - Chemical etching - General microstructure
Beryllium - Attack polishing
Beryllium - Attack polishing
Beryllium - Attack polishing
Beryllium - Attack polishing
Beryllium - Attack polishing
Beryllium - Attack polishing
Beryllium - Be and Be alloys - General microstructure
Beryllium - Be and Be alloys - General microstructure
Beryllium - Be, grain boundary etch
Beryllium - Be-Ag and Be-Al-Ti alloys - General microstructure
Beryllium - Be-U, Be-Nb, Be-Y and Be-Zr alloys - General microstructure
Beryllium - Beryllia alloys (BeO) - Electrolytic thinning by Mirand-Saulnier technique
Beryllium - Chemical etching
Beryllium - Chemical etching
Beryllium - Chemical etching
Beryllium - Chemical etching
Beryllium - Chemical etching
Beryllium - Chemical etching
Beryllium - Chemical etching - For Be and Be alloys
Beryllium - Chemical etching - General microstructure
Beryllium - Chemical etching - General microstructure
Beryllium - Chemical etching - General microstructure
Beryllium - Chemical etching - General microstructure
Beryllium - Chemical etching - General microstructure
Beryllium - Chemical polishing
Beryllium - Chemical polishing, chemical thinning, electrochemical thinning
Beryllium - Chemical thinning
Beryllium - Chemical thinning
Beryllium - Dislocation etching
Beryllium - Electrolytic etching
Beryllium - Electrolytic etching
Beryllium - Electrolytic etching
Beryllium - Electrolytic etching
Beryllium - Electrolytic lapping
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing
Beryllium - Electrolytic polishing and etching
Beryllium - Electrolytic polishing and etching
Beryllium - Electrolytic thinning
Beryllium - Electrolytic thinning by Mirand-Saulnier technique
Beryllium - Electrolytic thinning by window technique
Beryllium - Electrolytic thinning by window technique and electrolytic polishing
Beryllium - Electrolytic thinning of large specimens
Beryllium - Electrolytical etching - General microstructure
Beryllium - For most types of Be and Be alloys - General microstructure
Beryllium - Grinding and polishing
Beryllium - Grinding and polishing
Beryllium - Heat tint etching
Beryllium - Jet electrolytic polishing
Beryllium - Jet electrolytic polishing
Beryllium - One of the best electrolyte for universal use
Beryllium - Polishing and chemical etching
Beryllium - Precipitates
Beryllium - Precipitates, grain boundary
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical etching - General microstructure
Beryllium oxide (BeO) - Chemical polishing
Beryllium oxide (BeO)-single crystal - Chemical etching - General microstructure
Berzelius etchant - For dissolving the Fe matrix in the steel samples
Beta SiC thin films grown on Si, (100) wafers - Chemical etching - General microstructure
Beta alumina - 418 90.5% Al2O3, 9.25% Na2O, 0.25% Li2O. A 90.2% Al2O3, 9.0% Na2O, 0.8% Li2O
Beta alumina - 90.4% Al2O3, 8.9% Na2O, 0.7% Li2O
Beta alumina - 90.6% Al2O3, 8.7% Na2O, 0.7% Li2O
Beta alumina - Physical etching - General microstructure
Beta brass (45% Zn) - Chemical and electrolytic polishing
Beta brass (Cu-Zn) - Alloys with 45-48% Zn - General microstructure
Beta brass (Cu-Zn) - Chemical polishing and electrolytic thinning
Beta brass - Chemical etching
Beta-Al2O3Na doped substrate - Chemical cleaning
Beta-Al2O3Na doped substrate - Cleaning
Beta-III titanium alloy - Ti-11.5Mo-5-6Zr-4.5Sn
Beta-III titanium alloy - Ti-11.5Mo-6Zr-4.5Sn
Beta-III titanium alloy - Ti-11.5Mo-6Zr-4.5Sn
Beta-III titanium alloys - Chemical polishing
Beta-Si3N4 - Chemical etching
Beta-SiC (0001) wafers - Molten flux etching
Beta-SiC (001) single crystal blanks - Ionized gas ecthing
Beta-SiC (001) single crystal blanks - Thermal cleaning
Beta-SiC thin films grown on (100) silicon - Chemical cleaning
Beta-alumina-silica system - Al2O3-up to 7.5% SiO2
Beta-phase Zircaloy - Chemical etching
Beta-tin (Sn) - Chemical etching - General microstructure
Bi (0001) wafers - Chemical etching - General microstructure
Bi (0001) wafers - Chemical polishing
Bi and Sb alloys - Chemical etching - General microstructure
Bi sellenide - Chemical etching
Bi single crystal - Chemical etching - General microstructure
Bi telluride - Chemical etching
Bi(2-y)Sb(y)Te(x)Se(3-x)-BiSbTeSe alloys - General microstructure
Bi(2-y)Sb(y)Te(x)Se(3-x)-BiSbTeSe alloys - General microstructure
Bi-Cd alloy and single crystal specimens - Chemical etching - General microstructure
Bi-Cd alloys - Chemical etching
Bi-In alloys - Chemical etching
Bi-In alloys - Chemical etching
Bi-In alloys - Chemical etching - General microstructure
Bi-Mn system - Bi-MnBi eutectic
Bi-Sb-Te system - Bi0.5 x Sb1.5 x Te3+x
Bi-Sb-Te-Se system - Bi0.52 x Sb1.48 x Se0.13 x Te3.09
Bi-Sb-Te-Se system - Chemical etching - General microstructure
Bi-Se system - Bi2Se3+x alloys
Bi-Sn alloy (50 at.% Sn) - Chemical etching - General microstructure
Bi-Sn alloys (5-25% Sn) - Chemical etching
Bi-Sn and Bi-Cd alloys - Chemical etching
Bi-Sn, Bi-Cd and Bi-Pb eutectic alloys - Chemical etching
Bi-Te system - Chemical etching - General microstructure
Bi-Te-Tl alloys - Chemical etching - General microstructure
Bi12-GeO20 specimens - Chemical polishing
Bi12GeO20 single crystal - Chemical etching - General microstructure
Bi12SiO20 single crystal - Chemical etching - General microstructure
Bi2O3 deposited as a thin film - Chemical etching - General microstructure
Bi2Se3 (0001) cleaved wafers - Electrolyticlytic, oxidizing
Bi2Se3 (0001) wafers - Chemical cleaning
Bi2Se3 (0001) wafers - Chemical polishing
Bi2Se3 single crystal ingot - Chemical polishing
Bi2Te3 (0001) wafers - Chemical ecthing
Bi2Te3 (0001) wafers - Chemical etching - General microstructure
Bi2Te3 (0001) wafers - Chemical etching - General microstructure
Bi2Te3 (0001) wafers - Chemical etching - General microstructure
Bi2Te3 specimens - Etchant for revealing dislocations in Bi2Te3
Bi2Te3 specimens - Thermal etching for etch pits
BiSb alloys - Chemical polishing
BiSb single crystals Te doped - Dislocation etching
BiSe - Dislocation etching
BiSn alloy and single crystal specimens - Chemical etching - General microstructure
BiTe - Dislocation etching
BiTe and BiSe - Electrolytic etching - General microstructure
BiTe and GaP - Chemical etching - General microstructure
Bichromate finish dip etchant - Brass (70Cu-30Zn), bronze, and copper parts - Chemical etching
Billig's etchant - For Ge, Si
Bismuth - Attack polishing
Bismuth - Attack polishing
Bismuth - Bi-Sn eutectic, Bi-Cd alloys - General microstructure
Bismuth - Chemical etching
Bismuth - Chemical etching - General microstructure
Bismuth - Chemical etching - General microstructure
Bismuth - Chemical polishing and etching
Bismuth - Dislocation etching
Bismuth - Dislocation etching
Bismuth - Dislocation etching
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing
Bismuth - Electrolytic polishing and etching
Bismuth - Physical etching - General microstructure
Bismuth - Physical etching - General microstructure
Bismuth - Sb, Bi and their alloys - General microstructure
Bismuth selenide and bismuth telluride - Electrolytic etching
Bismuth telluride - Electrolytic jet polishing
Bismuth-single crystal - Electrolytic polishing
Bismuth-single crystal - Etching for etch pits
Bitter-technique - Magnetic materials
Blackburn and William's solution - A286 stainless steel - Standard and modified
Blackburn and William's solution - Ti-Mo alloy - Alloy with 11.6% Mo
Blackburn and William's solution - Ti-Mo-Al-Sn-Zr alloy - Titanium 6246-6Al-2Sn-4Zr-6 Mo
Blackburn and Williams's solution - Ti-Mo alloys
Blackburn-William's electrolyte - Ti-Al-Nb alloy - Ti3Al-Nb
Borides of Hf, Nb, Ti, V or Zr - Attack polishing
Boron carbide (B4C) - Chemical etching - For revealing dislocations
Boron carbide (B4C) - Chemical etching - General microstructure
Boron carbide (B4C) - Electrolytic etching
Boron carbide (B4C) - Electrolytic etching
Boron carbide (B4C) - Electrolytic etching - For revealing dislocations
Boron carbide (B4C) - For revealing dislocations
Boron carbide (B4C) - Physical etching - For revealing dislocations
Boron carbide (BC)-Silicon carbide system (SiC) - Electrolytic etching
Boron carbide B4C - Etching
Boron nitride (BN) - Chemical etching - General microstructure
Boron nitride (BN) - Chemical etching - General microstructure
Boron specimens - Chemical etching - General microstructure
Boss's etchant - Al and Al alloys - Chemical etching
Bossert's etchant - Al and Al alloys - Chemical etching
Brass (70Cu-30Zn) - Chemical etching - General microstructure
Brass (70Cu-30Zn) - Scale dip or fire-off dip
Brass (70Cu-30Zn) and bronze parts - Chemical etching - General microstructure
Brass (70Cu-30Zn), bronze, and copper alloys - Chemical etching - General microstructure
Brass - Potentiostatic etching
Brass specimens (70Cu-30Zn) - Chemical etching - General microstructure
Brass specimens (Cu-Zn) - Electrolytic etching - General microstructure
Brass specimens - Acid, cutting
Brass specimens - Electrolytic etching - General microstructure
Brass specimens - Electrolytic polishing
Brass specimens - Electrolytic polishing
Brass specimens - Electrolytic polishing
Brass specimens - Electrolytic polishing
Brass specimens and parts (70Cu-30Zn) - Chemical etching - General microstructure
Brass, as single crystal alpha-brass - Electrolytic polishing
Brass, bronze, and copper alloy parts - Chemical etching - General microstructure
Brasses (Cu-Zn) specimens - Electrolytic polishing
Brasses, alpha bronze, Alpaca, Cu-Be, Cu-Cr, Cu-Mn, Cu-Ni, and Cu-Si alloys - Chemical etching - General microstructure
Bright dip etchant - Brass, bronze, and copper alloy
Bright-field etchant for U - Electrolytic etching
Brilliant's etchant - Cu and Cu alloys
Brilliant's etchant - Cu and Cu alloys - Chemical etching
Brite dip etchant - Aluminium and alloys
Bromine etchant - As (111) specimens - Dislocation etching
Bronze (up to 6% Sn) - Electrolytic polishing
Bronze (up to 9% Sn) - Electrolytic polishing
Bronze - Electrolytic polishing
Bronze and brass cryogenic trailer piping - Chemical cleaning
Bronze and brass cryogenic trailer piping - Chemical cleaning
Bronze specimen - Chemical etching - General microstructure
Bronze specimens - Electrolytic polishing
Bulk polypropylene - Chemical etching
C (0001) cleaved pyrolytic graphite - Physical etching - General microstructure
C (0001) specimens - Molten flux etching
C (diamond) - Dislocation etching
C (diamond) - Dislocation etching
C (synthetic diamond) - Dislocation etching
C as both carbon and graphite parts - Chemical etching - General microstructure
C as bulk graphite or thin film deposit - Acid reduction
C as bulk graphite or thin film deposit - Chemical etching - General microstructure
C as graphite single crystal material - Stress, defect
C as natural graphite - Chemical etching - General microstructure
C as natural graphite specimens - Chemical etching - General microstructure
C as single crystal graphite - Cleave
C as single crystal graphite specimens - Gas oxidation
C as single crystal graphite specimens - Metal decoration
C as thin films - Cleaning
C doped Nb-Al alloy - Nb3Al + up to 0.4 at.% C
C specimens - Chemical cleaning
C4F8 (octofluorocyclobutane)
CMSX-6 alloy - Electrolytic polishing
CO2 as solid "Dry Ice" - Alcohol, chilling
CO2 single crystal - Cryogenic gas, forming
CP4 etchant - LiF - Dislocation etching
CP4 etchant - Antimonium - Dislocation etching
CP4 etchant - For Si, Ge, Sb, TiC, InSb, InAs
CP4 etchant - InSb (111) wafers - Chemical polishing
CP4 etchant - LiF (10O) cleaved wafers - Dislocation etching
CP4 etchant - Si wafers - Chemical etching - General microstructure
CP4 etchant - Si-Ge single crystal ingots - Chemical etching
CP4 etchant - Silicon - Chemical polishing
CP4 etchant - Te (0001) cleaved wafers - Chemical etching - General microstructure
CP4 etchant - ZnO thin film deposit - ZnO thin film deposit formed by oxidation of ZnSe
CP4 etchant, modified - InAs (111) wafers used in a polarity study - Chemical etching
CP4 etchant, modified - Silicon specimens - Chemical etching
CP4 etchants, dilute CP4, modified - Ge (111), (100), (110), and (211) wafers - Chemical etching
CP4, variety CP4A etchant - InSb (111) wafers and other orientation - Chemical polishing
CP4A etchant - FeGe2 (100) and (110) wafers - Chemical etching
CP4A etchant - InSb (111) wafers - Chemical etching - General microstructure
CP4A etchant - Si (111) wafers and other orientations - Chemical polishing
CP4A or CP8 etchants - Silicon - Final chemical polishing
Ca metal - Acid, reactive
Ca metal - Metal, reactive
Ca pure metal specimens - Oxidation
Ca specimens - Chemical removal
Ca(x)Zr(10-x)O(y) - Chemical etching - General microstructure
Ca-Cu alloy - Approx. Cu5Ca
Ca-In alloys - Chemical etching - General microstructure
Ca-Yb system - Electrolytic polishing
Ca2B6O11 x 5H2O (010) cleaved wafers- Chemical etching - General microstructure
Ca2N3 thin films - Chemical etching - General microstructure
Ca3Al2Ge3O12 single crystal ingot - Chemical cleaning
Ca5(PO4)1F-Nd single crystals - Chemical etching - General microstructure
Ca5(PO4)3F - Physical polishing
CaCO3 (1011) cleaved substrates - Chemical polishing
CaCO3 (1011) cleaved wafers - Dislocation etching
CaCO3 (10l1) cleaved wafers - Dislocation etching
CaCO3 - Chemical polishing
CaCO3 - Dislocation etching
CaCO3 r(1011) cleaved wafers - Acid cleaning
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaCO3 r(1011) cleaved wafers - Dislocation etching
CaF2 (100) cleaved wafers - Cleaning
CaF2 (100) thin films deposited on GaAs, (100) substrates - Chemical etching - General microstructure
CaF2 (111) cleaved wafers - Chemical etching - General microstructure
CaF2 (111) cleaved wafers - Dislocation etching
CaF2 (111) wafers - Chemical etching - General microstructure
CaF2 - Dislocation etching
CaF2 - Dislocation etching
CaF2 - Dislocation etching
CaF2 natural fluorite crystals - Chemical polishing and cleaning
CaF2 specimen - Chemical etching - General microstructure
CaF2 specimen - Chemical etching - General microstructure
CaF2 specimen - Chemical etching - General microstructure
CaF2 specimens - Cleaning
CaMoO4 single crystals
CaO - Chemical etching
CaO - Chemical etching - General microstructure
CaO and MgO - Chemical etching
CaO, MgO - Chemical etching - General microstructure
CaSiF2 single crystals - Chemical etching - General microstructure
CaSnF2 thin film - Chemical etching - General microstructure
CaTiO3 - Chemical etching - General microstructure
CaW04 (100) wafers - Chemical etching - General microstructure
CaW04 single crystal specimens - Chemical polishing
CaW04 single crystal specimens - Dislocation etching
CaWO4 (001) wafers - Chemical etching - General microstructure
CaWO4 (001) wafers - Chemical etching - General microstructure
CaWO4 (001) wafers - Chemical etching - General microstructure
CaWO4 single crystal specimens - Chemical polishing
CaWO4 single crystals - Pressure processing
Cadmium - Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cadmium - Cathodic etching
Cadmium - Cd and Cd alloys - General microstructure
Cadmium - Cd and solder alloys containing Cd - General microstructure
Cadmium - Cd, In, Tl, In-Sb and In-As alloys - General microstructure
Cadmium - Cd-Sn and Cd-Zn eutectics - General microstructure
Cadmium - Chemical etching
Cadmium - Chemical etching
Cadmium - Chemical etching
Cadmium - Chemical etching
Cadmium - Chemical polishing
Cadmium - Chemical polishing
Cadmium - Chemical polishing
Cadmium - Chemical polishing
Cadmium - Chemical thinning
Cadmium - Dislocation etching
Cadmium - Dislocation etching
Cadmium - Dislocation etching
Cadmium - Electrolytic etching - General microstructure
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic polishing
Cadmium - Electrolytic-mechanical polishing
Cadmium selenide (CdSe) - Chemical etching
Cadmium selenide (CdSe) hexagonal single crystal - Chemical etching - General microstructure
Cadmium selenide (CdSe) single crystal - Etch for (0001) facet
Cadmium single crystal - Chemical etching - General microstructure
Cadmium single crystal - Chemical polishing
Cadmium single crystal - Chemical polishing
Cadmium single crystal - Chemical-mechanical polishing
Cadmium specimens - Chemical etching - General microstructure
Cadmium sulphide (CdS) - Chemical etching - General microstructure
Cadmium sulphide (CdS) - Chemical etching - General microstructure
Cadmium sulphide (CdS) - Chemical polishing
Cadmium sulphide (CdS) - Chemical polishing and etching
Cadmium sulphide (CdS) - Electrolytic-mechanical polishing and etching
Cadmium sulphide (CdS) - Removal of surface damage
Cadmium sulphide (CdS) single crystal - Chemical etching - General microstructure
Cadmium sulphide (CdS) single crystals - Chemical polishing and etching
Cadmium sulphide (CdS) single crystals - Chemical polishing and etching
Cadmium telluride (CdTe) - Chemical polishing
Cadmium telluride (CdTe) - Chemical polishing
Cadmium telluride (CdTe) - Chemical polishing
Cadmium telluride (CdTe) - Chemical polishing and etching
Cadmium telluride (CdTe) - Chemical polishing and etching
Cadmium telluride (CdTe) - Dislocation etching
Cadmium telluride (CdTe) - This will remove work hardened layer
Cadmium telluride (CdTe) - To distinguish from Cd(x)Hg(1-x)Te, CdTe may be stained with above etchant
Cadmium telluride (CdTe) single crystal - Chemical polishing
Cadmium-Copper (Cd-Cu) - Electric contact material
Cain's B etchant - For Hf
Cain's etchant - Hf, Zr and allloys - Chemical etching
Cain's etchant - Hf-W eutectoid alloys - Chemical etching
Calcium fluoride (CaF2) - Chemical etching - General microstructure
Calcium fluoride (CaF2) - Chemical etching - General microstructure
Calcium fluoride (CaF2) - Etch pit etch
Calcium fluoride (CaF2) - Etching for etch pits
Calcium fluoride (CaF2) - Final chemical polishing
Calcium fluoride (CaF2) - Jet chemical thinning
Calcium fluoride (CaF2) - Thermal etching
Calcium fluoride (CaF2) - This etchant produce etch pits parallel to <111> cleavage planes
Calcium fluoride (CaF2) - This will produce etch pits
Calcium oxide (CaO) - Chemical etching - General microstructure
Calcium oxide (CaO) - Chemical etching - General microstructure
Calcium oxide (CaO) - Chemical etching - General microstructure
Calcium oxide (CaO) - Chemical etching - General microstructure
Calcium phosphate - Ca3(PO4)2
Calcium specimen - Electrolytic polishing
Calcium tartrate crystals - CaC4H4O6 x 3H2O
Calcium zirconate (Ca0.16 xZr0.34 x O1.84) - Chemical etching - General microstructure
Californium - Chemical etching - General microstructure
Camp No. 2 (Superoxol) etchant - Si (111) n-type wafers and p-doped with 60Co - Chemical etching
Camp No. 2 (Superoxol, CP2) etchant - Ge (111) wafers - Chemical etching
Camp No. 3 (CP3) etchant - Ge (111) wafers - Chemical etching
Camp No. 4 (CP4) etchant - Ge (100) wafers and other orientations - Chemical polishing/etching Camp No. 8 (CP8) etchant - Si (111) wafers - Chemical etching
Canada's etchant - Nickel superalloy 718 - Chemical etching - General microstructure
Carapella's etchant - Fe-Ni, Ni-Cu, and Ag alloys, Ni-base superalloys, Monel metal
Carapella's etchant - Ni and Ni-Cu (Monel) alloys - Chemical etching
Carbides in steels - Chemical ecthing
Carbon (diamond) - Chemical etching - General microstructure
Carbon (graphite carbon fibre composite) - Chemical etching - General microstructure
Carbon - Chemical etching - General microstructure
Carbon alloys - Electrolytic polishing
Carbon and alloy steels - Etches some alloy steels
Carbon and alloy steels - For grading inclusions
Carbon and alloy steels - For resolution of hardened structures
Carbon and alloy steels - Good general-purpose electrolyte
Carbon and alloy steels - Produces good contrast in as-quenched martensitic structures
Carbon and alloy steels - Reveals integranular oxidation
Carbon and alloy steels - Reveals lead inclusions
Carbon and alloy steels - Reveals lead inclusions by coloring them red
Carbon and alloy steels - Reveals maximum detail in pearlite, untempered and tempered martensite
Carbon and alloy steels - Reveals pearlite colonies
Carbon and alloy steels with medium carbon content - Examination of inclusions
Carbon and alloy steels with medium carbon content - For resolution of hardened structures
Carbon and alloy steels with medium carbon content - Reveals intergranular oxidation
Carbon and alloy steels with medium carbon content - Reveals lead inclusions
Carbon dioxide (CO2)-Gas oxidation
Carbon specimens - Cemical cleaning
Carbon specimens - Chemical etching - General microstructure
Carbon specimens - Gas cleaning
Carbon specimens - Thermal, forming
Carbon steel - Chemical polishing
Carbon steels - Chemical polishing
Carbon steels - Color etching - Banded structures
Carbon steels - Color etching - Colors the martensite
Carbon steels - Color etching - General microstructure
Carbon steels - Electrolytic polishing
Carbon steels - Electrolytic polishing
Carbon steels - Electrolytic polishing
Carbon steels - Electrolytic polishing
Carbon steels - Electrolytic polishing
Carbon steels, alloy steels, tool steels - Color etching - For sulfides and other phases
Carbon steels, alloy steels, tool steels - Color etching - General microstructure
Carbon steels, alloy steels, tool steels - Color etching - General microstructure
Carbon steels, slloy steels, tool steels - Color etching - For sulfides and other phases
Carbon steels, tool steels - Color etching - General microstructure
Carbon, alloy and Fe-Mn (5-18% Mn) steels - Color etching - General microstructure
Carbon, alloy and manganese steels - Color etching - General microstructure
Carbon, alloy and tool steels - Color etching - General microstructure
Carbon-Carbon composites - Chemical etching - General microstructure
Carburized steels - Electrolytic etching
Caro's etch, modified - Si (111) p-type wafers used for diffusion of antimony from glass
Caro's etchant - GaAs (100) n-type wafers grown by LEC as ingots - Chemical etching
Caro's etchant - Si (111) wafers and other orientations - Chemical cleaning
Caro's etchant, modified - Si (111) wafers used in a study of ion bombardment cleaning - Chemical polishing
Carpella's etchant - Ni-B alloys - Chemical etching - General microstructure
Carpenter special #4 etchant - AerMet 310/340, AerMet 100 steels - Chemical etching
Carpenter special #5 etchant - Co-Ni alloys - Chemical etching
Cast alloy steels - Chemical etching
Cast alloy steels - Chemical etching
Cast alloy steels - Chemical etching
Cast and carburized NiCr 8020 steel - Chemical etching - General microstructure
Cast iron - Chemical etching - General microstructure
Cast iron specimens - Electrolytic polishing
Cast iron specimens - One of the best electrolyte for universal use
Cast iron, low-alloy steels - Chemical polishing
Cast irons (gray, white, or nodular) - Electromechanical polishing
Cast irons - Austenite cast irons
Cast irons - Blackens cementite
Cast irons - Blacknens cementite
Cast irons - Chemical etching
Cast irons - Chemical etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Color etching - General microstructure
Cast irons - Electrolytic polishing - Cast irons with spher. graphite
Cast irons - General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons - General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons - Good general-purpose electrolyte
Cast irons - High chromium irons
Cast irons - High-silicon irons (14 to 16% Si)
Cd (111) and (100) single crystal wafers - Chemical polishing
Cd as single crystals and alloy specimens - Chemical etching - General microstructure
Cd dislocation free single crystals - Mechnical, defect
Cd powder used for epitaxy growth of CdSe and (Cd,Se)(1-x)Zn(x) - Chemical cleaning
Cd pre-forms and alloy wire - Chemical cleaning
Cd single crystal specimens - Chemical thinning
Cd single crystal specimens - Physical etching - General microstructure
Cd single crystal wafer-Mechanical, orientation
Cd single crystals - Dislocation etching
Cd specimens - Chemical polishing
Cd specimens and alloys - Chemical cleaning
Cd spheres - Plastic, forming
Cd tellerude - CdTe2O5
Cd, Cd-Ag alloys (up to 3% Ag) - Chemical polishing
Cd-1.5% Zn alloy - Chemical polishing
Cd-Ag alloys - Chemical etching - General microstructure
Cd-Cu alloy - Cd-CuCd3 eutectic
Cd-Ga alloy - Selective etchant for Cd to allow SEM examination
Cd-Ga-S-Se system - CdGa2S(1-x)Se(4x)
Cd-Ge alloy - Alloy with eutectic composition
Cd-Hg-Te system - Cd(0.15)Hg(0.85)Te
Cd-Hg-Te system - Chemical etching - General microstructure
Cd-Hg-tellerude - Dislocation etching
Cd-Hg-tellerude - Etching for etch pits
Cd-Hg-tellerude - Hg(1-x)Cd(x)Te
Cd-Mg alloy (low Mg) - Chemical polishing and etching
Cd-Mg alloy - Mg3Cd - Thinning for TEM
Cd-Pb eutectic - Chemical etching - General microstructure
Cd-Pb eutectic - Physical etching - General microstructure
Cd-Zn eutectic alloys - Chemical polishing
Cd-Zn eutectic alloys - Electrolytic polishing
Cd-Zn alloys - Chemical etching - General microstructure
Cd-Zn eutectic alloy - Chemical etching - General microstructure
Cd-Zn eutectic alloy - Electrolytic polishing
Cd-Zn eutectic alloy - Electrolytic polishing
Cd3As2 single crystal specimen - Chemical polishing
CdF2 single crystal ingots - Thermal, annealing
CdF2 specimen - Chemical polishing
CdF2 specimen - Chemical polishing-etching
CdI2 (0001) wafers - Chemical polishing
CdIn2Se4 single crystal specimens - Chemical etching - General microstructure
CdIn2Se4 single crystal specimens - Chemical polishing
CdIn2Te4 wafers - Chemical polishing
CdO as a surface oxide - Chemical cleaning
CdO native oxide - Chemical etching - General microstructure
CdP2 deposited as a thin film on InP - Chemical etching - General microstructure
CdS (0001) and (1010) wafers - Chemical etching - General microstructure
CdS (0001) and (1013) wafers - Chemical etching - General microstructure
CdS (0001) wafer - Chemical etching - General microstructure
CdS (0001) wafer - Chemical etching - General microstructure
CdS (0001) wafer - Chemical ething
CdS (0001) wafer - Chemical/mechanical polishing
CdS (0001) wafers - Chemical cleaning
CdS (0001) wafers - Chemical cleaning
CdS (0001) wafers - Chemical etching - General microstructure
CdS (0001) wafers - Chemical etching - General microstructure
CdS (0001) wafers - Chemical etching - General microstructure
CdS (0001) wafers and CdSe (1010) cleaved wafer-Light, reactive
CdS (100) wafer - Chemical polishing
CdS (100) wafers - Chemical etching - General microstructure
CdS (1010) wafers - Chemical etching - General microstructure
CdS (1010) wafers - Chemical etching - General microstructure
CdS (111) wafer - Chemical etching - General microstructure
CdS (111) wafers - Chemical polishing
CdS (111) wafers - Chemical polishing
CdS - Chemical etching - General microstructure
CdS - Dislocation etching
CdS - Dislocation etching
CdS single crystal specimen - Chemical and thermal etching
CdS speciman - Chemical etching - General microstructure
CdS wafers copper plated - Chemical etching - General microstructure
CdSb (100) wafer - Chemical polishing
CdSe (0001) - Chemical cleaning
CdSe (0001) - Chemical cleaning
CdSe (0001) - Chemical cleaning
CdSe (0001) - Chemical etching - General microstructure
CdSe (0001) or (1120) wafers - Chemical etching - General microstructure
CdSe (0001) wafers - Chemical etching - General microstructure
CdSe (0001) wafers - Chemical etching - General microstructure
CdSe (0001) wafers - Chemical etching - General microstructure
CdSe (0001) wafers - Chemical etching - General microstructure
CdSe (0001), (1010) and (1120) wafers - Chemical etching - General microstructure
CdSe (0001), (lOlO) and (1120) - Chemical etching - General microstructure
CdSe (1010) cleaved wafers - Light, reactive
CdSe - Dislocation etching
CdSe - Dislocation etching
CdSe and (Cd,Se)xZn(1-x) single crystal thin films - Chemical etching - General microstructure
CdSe as a deposited polycrystalline thin film - Chemical etching - General microstructure
CdSe polycrystalline thin film - Chemical polishing
CdSe thin film - Chemical etching - General microstructure
CdSe thin film - Chemical etching - General microstructure
CdSe(120) n-type wafers - Chemical etching - General microstructure
CdSiAs2 (001) and (111) wafers - Chemical etching - General microstructure
CdTe (100) wafers - Chemical polishing
CdTe (100), (111), and (110) wafers - Chemical etching - General microstructure
CdTe (111) - Electrolyticlytic oxidation
CdTe (111) n-type wafers - Chemical polishing
CdTe (111) wafers - Acid, burn
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical etching - General microstructure
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Dislocation etching
CdTe (111) wafers and ingots - Chemical etching - General microstructure
CdTe (111), (100) and (110) wafers - Chemical etching - General microstructure
CdTe (111), (100), and (110) wafers - Thermal etching
CdTe single cystal ingot - Chemical cleaning
CdTe thin film - Chemical float-off
CdTe-HgTe specimens - Chemical polishing-etching
Ce and alloys - Chemical etching
Ce-Ag alloys - Chemical etching - General microstructure
Ce-Ag alloys - Chemical etching - General microstructure
Ce-Al alloy - Anodising
Ce-Au alloys - Chemical etching - General microstructure
Ce-Bi system - Chemical etching - General microstructure
Ce-Co alloys (CeCo5) - Electrolytic polishing
Ce-Co alloys - Chemical etching - General microstructure
Ce-Mg alloy - Alloys with 0-10 wt.% Mg
Ce-Mn alloy - Alloys with 0-20 at.% Mn
Ce-Ni alloy (Laves phase CeNi2) - Chemical etching - General microstructure
CeAl3 single crystal - Chemical etching - General microstructure
CeB6 ingots - Thermal annealing
CeBr (001) specimens - Metal decoration
CeBr (100) specimens - Chemical polishing
CeC2 - Chemical etching - General microstructure
CeCu6 single crystal - Chemical etching - General microstructure
CeO2 - Chemical etching
CeO2 - Chemical etching
CeO2 - Chemical etching - General microstructure
CeO2 - Chemical etching - General microstructure
CeO2 or Ce2O3 specimens - Chemical etching - General microstructure
CeO2, SrTiO3, Al2O3, and ZrO-ZrC - Chemical etching
CePt specimens - Chemical etching - General microstructure
CeSi2 specimens - Chemical etching - General microstructure
Cellulose nitrate - Chemical etching
Cemented carbides (Co) - Chemical etching - General microstructure
Cemented carbides (Co) - Chemical etching - General microstructure
Cemented carbides (Co) - Chemical etching - General microstructure
Cemented carbides (Co) - Chemical etching - General microstructure
Cemented carbides - Can be used for all compositions - Chemical etching
Cemented carbides, Kovar (Fe) - Chemical etching - General microstructure
Ceramic - EBSD sample preparation
Ceramic Cr-SiO2 (30%) - Chemical etching - General microstructure
Ceramic Cr-SiO2 (30%) - Chemical etching - General microstructure
Ceramic specimens - Metal, contacts
Ceramics, borides - CrB2, MoB2 - General microstructure
Ceramics, borides - HfB2-NbB2 mixtures - General microstructure
Ceramics, borides - TaB2, LaB4 - General microstructure
Ceramics, borides - TiB2 - General microstructure
Ceramics, borides - TiB2 - General microstructure
Ceramics, borides - ZrB2 - General microstructure
Ceramics, borides - ZrB2, TiB2 - General microstructure
Ceramics, carbides - (U, Pu)C high in U. UC-PuN mixtures
Ceramics, carbides (Fe, Si)-(Fe,Si)C - General microstructure
Ceramics, carbides - (Th, U)C with U/Th ratio, ThC2
Ceramics, carbides - (Th, U)C2 - General microstructure
Ceramics, carbides - (U, Ou)C high in Pu - General microstructure
Ceramics, carbides - (U, Pu)C - General microstructure
Ceramics, carbides - B4C - General microstructure
Ceramics, carbides - CrC, HfC, VC, (Al, Ti)C - General microstructure
Ceramics, carbides - KC - General microstructure
Ceramics, carbides - MoC2, CrC2 - General microstructure
Ceramics, carbides - NbC, NbC2 - General microstructure
Ceramics, carbides - PuC (dendritic) - General microstructure
Ceramics, carbides - PuC - General microstructure
Ceramics, carbides - SiC - General microstructure
Ceramics, carbides - SiC - General microstructure
Ceramics, carbides - SiC - General microstructure
Ceramics, carbides - SiC - General microstructure
Ceramics, carbides - Ta(C, N, O) - General microstructure
Ceramics, carbides - TaC - General microstructure
Ceramics, carbides - ThC - General microstructure
Ceramics, carbides - ThC2 - General microstructure
Ceramics, carbides - ThO2 - General microstructure
Ceramics, carbides - TiC - General microstructure
Ceramics, carbides - TiC, TaC - General microstructure
Ceramics, carbides - UC, U(C, O), UC-UC2, UC2-U2C3 mixtures, (U, Pu)C high in C, U(C, N) UC-ZrC
Ceramics, carbides - UC-Cr23C6 mixtures
Ceramics, carbides - UC-Pu mixtures - General microstructure
Ceramics, carbides - WC - General microstructure
Ceramics, carbides-ThC - General microstructure
Ceramics, nitrides - (Al, Ti)N - General microstructure
Ceramics, nitrides - NbN (yelow), Nb2N (light red) - General microstructure
Ceramics, nitrides - Si3N4 - General microstructure
Ceramics, nitrides - Si3N4 - General microstructure
Ceramics, nitrides - Si3N4 - General microstructure
Ceramics, nitrides - Si3N4, UN - General microstructure
Ceramics, nitrides - UN - General microstructure
Ceramics, nitrides - UN - General microstructure
Ceramics, nitrides - UN - General microstructure
Ceramics, nitrides - UN - General microstructure
Ceramics, nitrides - UN, UN-U2N mixtures - General microstructure
Ceramics, nitrides - UN-U(N2O)-U2N3 mixtures - General microstructure
Ceramics, nitrides - UN-U2N3 mixtures - General microstructure
Cerium - Chemical etching
Cerium - Chemical polishing
Cerium dicarbide - Chemical etching
Cerium oxide (CeO2) - Chemical etching - General microstructure
Cerium oxide - Chemical etching - General microstructure
Cerium oxide-silicon nitride system - (1Si3N41CeO2)
Cerium specimens - Chemical etching - General microstructure
Cerium specimens - Chemical etching - General microstructure
Cerium specimens - Chemical etching - General microstructure
Cerium specimens - Chemical solution
Cerium specimens - Electrolytic polishing
Cerium specimens - Electrolytic polishing
Cermets - (Y3Al)C-Y3C-Y - General microstructure
Cermets - Cr23C6-UF2, US-U, UC2-UNi5
Cermets - NbCz-NbFe-Nb - General microstructure
Cermets - PuC-Pu - General microstructure
Cermets - TiC-Ni - General microstructure
Cermets - TiCN-Co, TiN-Fe, TiN-Mo, TiN-W
Cermets - UN-U, UN-W - General microstructure
Cermets - UO2-Al - General microstructure
Cermets - UO2-Cr - General microstructure
Cermets - UO2-Mo - General microstructure
Cermets - UO2-Nb - General microstructure
Cermets - US-Co, UC22-Fe, (UZr)C-Nb, (UZr)C-Ta, (UZr)C-W
Cermets - ZrO2-W, ThO2-W, W2C-W, UC-Cr, UC-Fe, UC-Ni, UC-UFe2
Cermets, sintered carbides - Attack polishing
Chase's etchant - Ag-30% Zn alloy - Chemical polishing
Chemical and electrolytic polishing of cobalt and cobalt alloys
Chemical polishing of 6061 aluminum - EBSD sample preparation
Chen-Hendrickson's etchant - For Ag
Chi phase (M18C or Fe36Cr12Mo10) in steels - Chemical etching - General microstructure
Chlorine - Electrolyticlytic, gas jet
Chlorine - Gas etching
Chlorine water - Acid, disinfectant
Chrome dislocation etchant - Si (100) and (110) wafers - Dislocation etching
Chrome etchant - Au thin films and specimens - Chemical etching
Chrome etchant - Au-Cr thin films - Chemical etching
Chrome etchant - Cr thin films - Chemical etching
Chrome etchant - Cr2O3 amorphous thin films - Chemical etching
Chrome etchant - For Cr thin films
Chrome etchants, modified - Cr thin film deposits on glass substrates
Chrome regia etchant - Fe + 15-30 Cr + 6-40 Ni + <5%
Chrome regia etchant - Si wafers both float zone ingot material and epitaxy thin film deposit
Chrome regia etchant - Si3N4 oxynitrides and SiO2 thin films - Chemical cleaning
Chrome regia etchant - Stainless steels - Chemical etching
Chromium - Chemical-Mechanical polishing
Chromium - Cr and Cr alloys - General microstructure
Chromium - Cr and Cr base alloys, Fe-Cr alloys and V
Chromium - Cr, Mo, Mo-Cr alloys (up to 80% Cr) - General microstructure
Chromium - Cr, Nb, and alloys
Chromium - Electrolytic etching
Chromium - Electrolytic etching
Chromium - Electrolytic and chemical etching - General microstructure
Chromium - Electrolytic etching - General microstructure
Chromium - Electrolytic etching - General microstructure
Chromium - Electrolytic etching and electrolytic thinning
Chromium - Electrolytic mechanical polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic thinning for electron microscopy
Chromium - Physical etching - General microstructure
Chromium - Physical etching - General microstructure
Chromium - Produces etch pits on surface near to (111)
Chromium - Ta, Nb, and their alloys, Cr and Cr silicide. Re silicide, W-Th alloys
Chromium - Attack polishing
Chromium - Attack polishing
Chromium - Chemical etching - General microstructure
Chromium - Cr and Cr base alloys - General microstructure
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Good general-purpose elctrolyte
Chromium and chromium alloys - Electrolytic polishing
Chromium and chromium alloys - Electrolytic polishing
Chromium and chromium alloys - Electrolytic polishing
Chromium and its alloys - Electrolytic polishing
Chromium boride (CrB2) - Chemical etching - General microstructure
Chromium films - Chemical etching - General microstructure
Chromium films - Physical etching - General microstructure
Chromium oxide (Cr2O3) - Chemical etching - General microstructure
Chromium plating
Chromium silicide - Chemical etching
Chromium-Copper (Cr-Cu) - Electric contact material
Chromosulfuric acid - For polypropylene
Cl2 single crystal - Pressure
Co (0001) wafers- Co (0001) wafers and other orientations used in a structure study
Co (0001) wafers- Electrolytic polishing
Co (0001) wafers- Electrolytic polishing
Co alloys - Chemical etching
Co alloys - Chemical etching
Co alloys - Chemical etching - General microstructure
Co alloys - For cobalt oxides and sulphides
Co alloys - For grain boundaries - Co-97.2 Cu alloy
Co alloys - Revels oxide in sulphides
Co and Co alloys - Chemical etching
Co and Co alloys - Chemical etching
Co and Co alloys - Electrolytic polishing
Co and Co alloys - Electrolytic polishing
Co and Co alloys - Electrolytic polishing
Co and Co alloys - Electrolytic polishing
Co and Co alloys - Electrolytic polishing
Co and Co high-temperature alloys - Electrolytic etching
Co and Co-Al alloys - Chemical etching
Co and Co-Al alloys - Electrolytic etching
Co and Co-Fe alloys - Chemical etching
Co binder phase - Chemical etching
Co boride - Chemical etching
Co borides - Chemical etching - General microstructure
Co hard-facing alloys - Chemical etching
Co hard-facing alloys - Electrolytic etching
Co hard-facing alloys and Co high-temperature alloys - Electrolytic etching
Co high-temeprature alloys - Chemical etching
Co high-temperature alloys - Electrolytic etching
Co high-temperature alloys - Electrolytic etching
Co oxide (CoO) - Chemical etching - General microstructure
Co oxide (CoO) - Electrolytic thinning
Co oxide (CoO) - Physical etching
Co oxide (CoO) single crystal - Chemical etching
Co oxide single crystal - Chemical etching - General microstructure
Co oxide single crystal - Chemical etching and electrolytic thinning
Co silicide - Chemical etching
Co silicides - Chemical etching - General microstructure
Co sintered carbides - Chemical etching
Co specimens - Physical etching - General microstructure
Co spheres - Electrolytic polishing
Co superalloys - Chemical etching - General microstructure
Co-Al alloys - Chemical etching - General microstructure
Co-Al alloys - Electrolytic etching - General microstructure
Co-B alloys - Chemical etching - General microstructure
Co-B compounds - Chemical etching - General microstructure
Co-C-Si-W-Fe-Cr alloy - 64Co-1.2C-1.1Si-4.8W-0.25Fe-28.6Cr, Stellite 6
Co-Ce alloys (Co5Ce) - Chemical etching - General microstructure
Co-Ce-Al alloy - Co5CeAl0.2 - General microstructure
Co-Ce-Cu-Fe alloy - Approx. Co(3.5)Fe(0.5)CuCe
Co-Ce-Ni alloy - Laves phase, Ce(Co(1-x)Ni(x))2 0<=x<=0.17
Co-Cr (40%)-Ni-Fe alloys - Electrolytic etching - General microstructure
Co-Cr alloys - Electrolytic etching - General microstructure
Co-Cr-C alloys - Chemical etching -
Co-Cr-C alloys - Co-25.3Cr-0.25C - General microstructure
Co-Cr-C alloys - Co-25/33 Cr-0.2/0.3 C - General microstructure
Co-Cr-C alloys - Co-41Cr-2.4C - General microstructure
Co-Cr-C alloys - Preferential etch for non-carbides
Co-Cr-Mo alloy - Electrolytic thinning by Bollmann technique
Co-Cr-Mo alloys - Chemical etching - General microstructure
Co-Cr-Mo alloys - Chemical etching - General microstructure
Co-Cr-Mo-(Nb) dental alloys - Electrolytic etching - General microstructure
Co-Cr-Mo-C alloy - Co-2>Cr-5.5Mo-0.15C
Co-Cr-Mo-C alloy - Hynes Stellite 21
Co-Cr-Mo-C alloy - Vitallium or H.S.21, Co-27/30Cr-5.5Mo-0.15/0.3C
Co-Cr-Mo-C-Mn-Fe-Ni alloy - Co-28.3Cr-5.4Mo-0.26C-0.66Mn-0.39Fe-0.12Ni
Co-Cr-Mo-Ni alloys - Chemical etching - General microstructure
Co-Cr-Mo-Ni alloys - Chemical etching - General microstructure
Co-Cr-Mo-Ni-C-Fe-Si-Mn alloy - Co-28.5Cr-6Mo-2.2Ni-0.3C-0.4Fe-0.4Si-0.5Mn, HS21 alloy
Co-Cr-Ni-Ta alloy - 35% Cr, 15% Ni, 6% Ta
Co-Cr-Ni-Ta carbide alloy - Co-15Cr-25Ni-13Ta
Co-Cr-Ni-W-Si-C alloy - Stellugine 778, Co-25/29Cr-1.3/22.5Ni-1.6/1.7C-8.5/11.5W-0.9/2.7Si
Co-Cr-Ta carbide alloy - Co-15Cr-13Ta
Co-Cr-W alloys - Chemical etching - General microstructure
Co-Cu-Ce alloys ((Co, Cu)5Ce) - Chemical etching - General microstructure
Co-Cu-Ce alloys ((Co, Cu)5Ce) - Electrolytic micro and chemical etching
Co-Cu-Fe-Sm alloy - Modified Co5Sm - Etch for sintered alloy
Co-Cu-Pr alloy - (Co, Cu)5Pr
Co-Dy-Ag alloy - Co5DyAg0.2 - General microstructure
Co-Dy-Al alloy - Co5DyAl0.2 - General microstructure
Co-Dy-Au alloy - Chemical etching - General microstructure
Co-Dy-C alloy - Co5DyC0.7
Co-Dy-Cr alloy - Co5DyCr0.2
Co-Dy-Cu alloy - Co5DyCu0.2
Co-Dy-Fe alloy - Co5DyFe0.2
Co-Dy-Ga alloy - Co5DyGa0.2
Co-Dy-Ge alloy - Co5DyGe0.2
Co-Er-Al alloy - Co5ErAl0.2 - General microstructure
Co-Fe alloy - Alloys with up to 11.2 at.% Fe
Co-Fe alloy - Electrolytic thinning
Co-Fe alloy - Fe-24-28% C - General microstructure
Co-Fe alloys - Chemical etching - General microstructure
Co-Fe alloys - Chemical etching - General microstructure
Co-Fe single crystal - Co-8 wt.% Fe
Co-Fe-Au alloys - Chemical etching - General microstructure
Co-Fe-C system - FeCo-0.5/2C
Co-Fe-Nb alloy - 85Co-12Fe-3Nb
Co-Fe-Nb alloy - 85Co-12Fe-3Nb
Co-Fe-Ni-V alloy - ((Fe,Co,Ni)3) - 30 at.% Fe, 37.5 at.% Co, 7.5 at.% Ni
Co-Fe-V alloy - ((Fe,Co)3V - 11/25% Fe - 64/50% Co - 25% V
Co-Fe-V alloy - 49 Co-47 Fe-3 V
Co-Fe-V alloy - FeCo-V
Co-Fe-V, Co-Ni-V, Co-Fe-Zn alloys - Chemical etching - General microstructure
Co-Fe-Zn alloys - Chemical etching - General microstructure
Co-Ga alloy - 48.5 at.% Ga - General microstructure
Co-Ga, Co-Fe-V, and Co-Ni-V alloys - Chemical etching - General microstructure
Co-Gd alloy - Laves phase GdCo2
Co-Gd alloys (Approx. GdCo) - Chemical etching - General microstructure
Co-Gd alloys - Chemical etching - General microstructure
Co-Gd-Al alloy - Co5GdAl0.2 - General microstructure
Co-Ge-Si system - Chemical etching - General microstructure
Co-Hf alloys (HfCo2) - Chemical etching - General microstructure
Co-Ho-Al alloy - Co5HoAl0.2 - General microstructure
Co-La-Al alloy - Co5LaAl0.2 - General microstructure
Co-Mo alloys - Chemical etching - General microstructure
Co-Mo alloys - Electrolytic etching
Co-Nd-Al alloy - Co5NdAl0.2 - General microstructure
Co-Ni-Al-Fe alloys - Chemical etching - General microstructure
Co-Ni-Cr alloy - Cu-29Ni-3Cr - Electrolytic thinning
Co-Ni-Cr carbide system - Co2Ni-Cr23C6
Co-Ni-Cr-Mo-C alloy (Vitallium) - >20%Co-26% Cr-6% Mo-0.4 or 1.0% C-Ni
Co-Ni-Cr-Nb-Al superalloy - 40Co-38Ni-17Cr-2.0Nb-1.5Al by weight
Co-Ni-Cr-Nb-Fe alloys - Electrolytic polishing
Co-Ni-Cr-Ta alloy - 29-31 wt.% Ni, 28-32% Co, 31-34% Cr, 3-11% Ta
Co-Ni-Cr-W-Fe alloy - Haynes No.25 Co-10Ni-20Cr-14W-3Fe (+C)
Co-Ni-Cr-W-Fe alloy - Stellite X40, Haynes 31 55Co-25Cr-10Ni-8W-1Fe (+C,Mn,Si)
Co-Ni-O system - Approx. (Co0.81Ni0.2)O
Co-Ni-V alloy - ((Co,Ni)3V - 32 at.% Co - 43Ni-25V)
Co-Pr alloy - Co5Pr - General microstructure
Co-Pr alloys - Chemical etching - General microstructure
Co-Pr-Al alloy - Co5PrAl0.2 - General microstructure
Co-Pt alloys - Chemical etching
Co-Sb-Zr alloy - ZrSbCo - Aqua regia
Co-Si alloy - Alloy with 11.8 at.% Si - General microstructure
Co-Si alloys - Chemical etching - General microstructure
Co-Si-Al alloys - Chemical etching - General microstructure
Co-Si-Ta alloy - Co-25at.% Si-5 at.% Ta - General microstructure
Co-Si-W alloy - Co - 25at.% Si - 5 at.% W - General microstructure
Co-Sm alloy - Co5Sm - General microstructure
Co-Sm alloy - Sintered Co5Sm - General microstructure
Co-Sm alloys - Chemical etching
Co-Sm alloys - Chemical etching - General microstructure
Co-Sm alloys - Chemical etching - General microstructure
Co-Sm alloys - Chemical etching - General microstructure
Co-Sm alloys, grain boundary etchant - Chemical etching - General microstructure
Co-Ta alloy - Co-Co2Ta eutectic - General microstructure
Co-Ti alloys - Chemical etching
Co-Ti in carbide system - Co-2.3/5 mol.% TiC
Co-V alloy - Co3V - General microstructure
Co-W alloys - Electrolytic etching
Co-Zr alloy - ZrCo - General microstructure
Co-Zr alloy - ZrCo2 - General microstructure
Co-base casting material and rolling stock, stellite, color etchant - Chemical etching - General microstructure
Co-base superalloys, color etchant - Chemical etching - General microstructure
Co3S4 single crystal sphere - Chemical etching - General microstructure
CoFeO (100) wafers - Chemical etching - General microstructure
CoO (100) wafers- Chemical etching - General microstructure
CoO (100) wafers- Gas oxidation
CoO (100) wafers- Thermal processing
CoO - Chemical etching
CoO - Chemical etching - General microstructure
CoSi2 (100) wafers - Dislocation etching
CoSi2 thin film grown on substrates of Si, (111) and (100) - Chemical etching - General microstructure
CoSi2 thin films grown on Si substrates-Ionized gas, removal
Coated Hastelloy-X - Chemical etching - General microstructure
Coated cutting insert - Chemical etching - General microstructure
Coated steel sheet - Steel sheeet coated with Zn for automotive industry
Coates's etchant - Pb-Sn-Te alloys
Coates's etchant - Pb-Sn-Te alloys (Pb(1-x)Sn(x)Te, x <= 0.03) - Chemical polishing and etching
Cobalt - Cemented carbides with Co binder phase - General microstructure
Cobalt - Chemical polishing
Cobalt - Chemical polishing
Cobalt - Electrolytic etching
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt Stellite - Chemical etching - General microstructure
Cobalt Stellite - Chemical etching - General microstructure
Cobalt Stellite - Electrolytic etching - General microstructure
Cobalt Stellite - Show grain size, general structure
Cobalt alloy - Co + dispersed oxides, TiO2, etc - General microstructure
Cobalt alloy - Co-Cr + dispersoids alloys - General microstructure
Cobalt alloys - Chemical etching - General microstructure
Cobalt alloys - Co silicide - General microstructure
Cobalt alloys - Co silicide - General microstructure
Cobalt alloys - Co-In + other alloys - General microstructure
Cobalt alloys - Co-In rich alloys - General microstructure
Cobalt alloys - Electrolytic polishing
Cobalt aluminate (CoAl2O4) - Chemical etching - General microstructure
Cobalt and alloys - Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cobalt and alloys - Cemented carbides and other Co base alloys
Cobalt and alloys - Chemical ecthing
Cobalt and alloys - Chemical etching - General microstructure
Cobalt and alloys - Co base wear resistant alloys and materials used for cutting tools - General microstructure
Cobalt and alloys - Co-Fe alloys - General microstructure
Cobalt and alloys - Co-Ga alloys - General microstructure
Cobalt and alloys - Co-Sm alloys - General microstructure
Cobalt and alloys - Electrolytic polishing
Cobalt and alloys - Electrolytic polishing
Cobalt and alloys - Electrolytic polishing
Cobalt and alloys - Electrolytic polishing
Cobalt and alloys - Electrolytic thinning by window technique
Cobalt and alloys - Grain boundary etchant
Cobalt and alloys - Hexagonal Co - For optical and electron microscopy
Cobalt and alloys - Physical etching - General microstructure
Cobalt and alloys - Pure Co, Co base superalloys - General microstructure
Cobalt and alloys - Pure Co, Co-Al alloys - General microstructure
Cobalt and alloys - Pure Co, Co-Fe alloys, WC-TiC-NbC-Co type cemented carbides - General microstructure
Cobalt and alloys - Stellite up to 70% Co, Co base superalloys, Co silicides - General microstructure
Cobalt and alloys - WC-TiC-(Ta, Nb)C-Co tye cemented carbides - General microstructure
Cobalt and alloys - WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys - WC-TiC-TaC-Co and WC-NbC-Co type cemented carbides
Cobalt and alloys - Worked + recrystallized Co - General microstructure
Cobalt and alloys - Worked + recrystallized Co - General microstructure
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt and cobalt alloys - Electrolytic polishing
Cobalt base alloys - Cobalt wrought alloys - General microstructure
Cobalt base alloys - General microstructure
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys - Heat resistant high temperature (superalloys) (Co-Cr-X type), Hayness No, 1, 2, 3,4, 6 alloys
Cobalt base superalloy L605 - Chemical etching - General microstructure
Cobalt hard facings alloys - Chemical etching - General microstructure
Cobalt oxide (CoO) - Chemical etching - General microstructure
Cobalt single crystal - Chemical polishing
Cobalt wrought alloys - Chemical etching - General microstructure
Cobalt wrought alloys - Chemical etching - General microstructure
Cobalt wrought alloys - Chemical etching - General microstructure
Cobalt wrought alloys - Chemical etching - General microstructure
Cobalt wrought alloys - Electrolytic etching - General microstructure
Cobalt wrought alloys - Electrolytic etching - General microstructure
Cold-worked brass - Electrolytic etching
Cole and Brook's anodizing solution - Al alloys - Chemical etching
Color etch for U3Si - Chemical etching
Color etching Ni-Cr alloys - Chemical etching - General microstructure
Color tint etch for Mo - Chemical etching
Commercial Zn alloys - Chemical etching
Complex Mg alloys containing Al, Bi, Cd, Zn - Electrolytic etching - General microstructure
Contrast etchant - Ni-Al alloys
Cook's etchant - NaCl (100) wafers - Chemical etching
Coon's electrolytic etchant - Bi alloy and 5% Sb
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper (impure) - Dislocation etching
Copper (pure) - Dislocation etching
Copper - All types of Cu, cartridge brass, Tombac, Muntz metal, easily machinable brasses
Copper - Al bronzes which are difficult to etch otherwise
Copper - Al bronzes, Cu-Be alloys - General microstructure
Copper - All types of Cu, Cu-Be alloys - General microstructure
Copper - Alpha-beta brass, special brass, Al brass, red cast bronze, German silver, Cu-Sn alloys
Copper - An extremely useful electrolyte for certain applications, but dangerous
Copper - Attack polishing
Copper - Attack polishing
Copper - Attack polishing
Copper - Beta brasses, German silver, Monel and Cu-Ni alloys
Copper - Brasses, alpha bronze - General microstructure
Copper - Brasses, especially brasses containing Co - General microstructure
Copper - Cathodic etching
Copper - Cathodic etching
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing and etching
Copper - Chemical thinning
Copper - Color and grain contrast etchant for Cu
Copper - Color etchant and grain size contrast of bronzes
Copper - Cu, brasses, bronzes, Al bronzes, Cu-Ni and Cu-Ag alloys, German silver
Copper - Dislocation etching
Copper - Dislocation etching
Copper - Electrolytic etching - General microstructure
Copper - Electrolytic lapping
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing
Copper - Electrolytic polishing and thinning
Copper - Electrolytic thinning
Copper - Electrolytic thinning
Copper - Electrolytic thinning
Copper - Electrolytic thinning by window technique
Copper - Electrolytic thinning by Bollman technique
Copper - Electrolytic thinning by Mirand-Saulnier technique
Copper - Electrolytic thinning by modified voltage technique
Copper - Electrolytic thinning by window or Bollman technique
Copper - Electrolytic thinning by window technique
Copper - Electrolytic thinning by window technique
Copper - Electrolytic thinning by window technique
Copper - Electrolytic thinning in P.T.F.E. holder
Copper - Fast, good polish and etch for Cu and Cu with oxide and sulfide inclusions
Copper - For revealing the grain boundaries
Copper - Grain surface etching
Copper - Ion beam etching
Copper - Most types of Cu and Cu Alloys, Cu-Ag solder layers, Mn, P, Be, Al-Si bronzes
Copper - Multiple constituent Sn bronzes - Delta phase
Copper - Physical etching - General microstructure
Copper - Physical etching - General microstructure
Copper - Physical etching - General microstructure
Copper - Thinning of Cu wire for electron microscopy
Copper - This etchant reveals segregation structure and grain boundaries in 99.999% Cu
Copper alloys - Color etching - Enhances chemical contrast
Copper alloys - Color etching - General microstructure
Copper alloys - Color etching - General microstructure
Copper alloys - Electrolytic polishing
Copper alloys - Electrolytic polishing
Copper and copper alloys - Aluminium bronze, free-cutting brass
Copper and copper alloys - Aluminium bronze, free-cutting brass
Copper and copper alloys - Attack polishing of Copper and some copper alloys
Copper and copper alloys - Attack polishing of brasses and bronzes
Copper and copper alloys - Beryllium copper and aluminium bronze
Copper and copper alloys - Cartridge brass, free-cutting brass, admirality, gilding metal
Copper and copper alloys - Chemical etching - General microstructure
Copper and copper alloys - Chemical etching - General microstructure
Copper and copper alloys - Cold worked brasses
Copper and copper alloys - Copper alloys of Be, Mn, and Si; nickel silver; bronzes, chromium copper
Copper and copper alloys - Copper, brasses, bronzes, aluminium bronzes
Copper and copper alloys - Copper, brasses, bronzes, nickel silver
Copper and copper alloys - Copper, brasses, bronzes, nickel silver
Copper and copper alloys - Copper, brasses, bronzes, nickel silver, Al bronze
Copper and copper alloys - Copper, brasses, nickel silver; darkening large areas of beta in alpha-beta brass
Copper and copper alloys - Copper-nickel alloys
Copper and copper alloys - Electrolytic etching
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Electrolytic polishing
Copper and copper alloys - Especially for copper and brass - For revealing the microstructure
Copper and copper alloys - Etching and attack polishing of Copper and Cu alloys
Copper and copper alloys - For Cu-Sn Alloys
Copper and copper alloys - For copper an alpha brass
Copper and copper alloys - For copper and alpha brass
Copper and copper alloys - For nickel silver and bronzes
Copper and copper alloys - Good contrast between tha alpha phase and beta phase in brass
Copper and copper alloys - Jet electrolytic polishing (0.1 cm jet)
Copper and copper alloys - Jet electrolytic polishing (0.15 cm jet) of discs
Copper and copper alloys - Jet machinning
Copper and copper alloys - To reveal the (100) texture in copper
Copper and copper alloys - To reveal the (100) texture in copper
Copper and copper alloys except Tin-bronze - Electrolytic polishing
Copper and copper base alloys - Electrolytic polishing
Copper base alloys - Color etchant - General microstructure
Copper britte dip etchant - Cu specimens and parts - Chemical polishing
Copper chloride (CuCl) - Chemical etching - General microstructure
Copper dislocation etchant - Si single crystal wafers of different orientations - Chemical etching
Copper etchant - Si (111) wafers and other orientations - Chemical etching
Copper polyerystalline parts - Chemical cleaning
Copper single crystal - Chemical etching - General microstructure
Copper single crystal - Chemical polishing, electrolytic etching, etch pit etching
Copper single crystal - Electrolytic etching for etch pits
Copper single crystal - Electrolytic polishing
Copper single crystal - Etching for etch pits
Copper single crystals - Electrolytic polishing
Copper specimens - Chemical etching - General microstructure
Copper specimens - Chemical etching - General microstructure
Copper thin films - Chemical etching - General microstructure
Copper, brasss, bronzes - Electrolytic polishing
Copper, brasss, bronzes - Electrolytic polishing
Copper-Cobalt-Beryllium (Cu-Co-Be) - Electric contact material
Copper-Cobalt-Beryllium (Cu-Co-Be) - Electric contact material
Copper-Cobalt-Silicon (Cu-Co-Si) - Electric contact material
Copper-Cobalt-Silicon (Cu-Co-Si) - Electric contact material
Copper-Graphite (Cu-C) - Electric contact material
Copper-Tungsten (Cu-W) - Electric contact material
Corke and Amelincky's electropolish solution - Cu-Pt alloy - Electrolytic etch
Corning glass #7059 - Acid, float-off
Corning glass #7059 used as substrates for a-ZnGeAs2 epitaxy - Solvent cleaning
Corning glass 7720 - Chemical cleaning
Corning glass 7720 - Chemical cleaning
Corning glass 7740 (borosilicate) - Chemical cleaning
Coronze CDA 638 alloy - Electrolytic thinning
Corrosion resistant cast steel HU - The composition is 37-41% Ni, 17-21% Cr, 2.5% max. Si, 0.35-0.75% C
Cr and Cr alloys - Chemical etching
Cr and Cr alloys - Chemical etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys, C-Fe alloys, Mo (grain-contrast etchant), Re and Re-base alloys, V and V-base alloys - Electrolytic etching - General microstructure
Cr and CrNi steels - Electrolytic etching - General microstructure
Cr and Hf carbides - Chemical etching - General microstructure
Cr and Mo carbides - Chemical etching - General microstructure
Cr as evaporated deposits in vacuum systems - Chemical cleaning
Cr as evaporated deposits in vacuum systems - Chemical cleaning
Cr carbide-Ni alloy - 83% carbide-15% Ni - General microstructure
Cr evaporated thin films - Chemical etching - General microstructure
Cr evaporation deposits - Chemical etching - General microstructure
Cr specimens - Chemical etching - General microstructure
Cr steel - Fe-0.9/1.5C-1/8Cr
Cr steel specimens - 0.4.1.0 C-3.6 Cr-Fe
Cr steels - Electrolytic etching - General microstructure
Cr steels - Fe-4Cr-0.25/0.35C
Cr steels specimen - Fe-4Cr-0.3C
Cr thin films - Chemical etching - General microstructure
Cr thin films - Gas oxidation
Cr thin films - Physical etching - General microstructure
Cr thin films deposits - Chemical etching - General microstructure
Cr, Mo, Nb, Ta, V, W and their alloys - Chemical-Mechanical polishing
Cr-Alumina alloy (Al2O3) - 70% Cr-30% Al2O3
Cr-Fe alloy - Electrolytic thinning
Cr-Fe alloy - Fe-24/25Cr - Electrolytic thinning
Cr-Hf carbide - 0.5 mol % HfC
Cr-Ir alloys - Chemical etching - General microstructure
Cr-Mo alloys (Mo-rich) - Chemical etching - General microstructure
Cr-Mo steel - Electrolytic etching
Cr-Mo steel - Fe-0.05C-10Cr-2Mo-0.5Mo-0.5Mn-0.4/0.6Si
Cr-Mo steel - Fe-0.1C-2.2Cr-0/1.5Mo
Cr-Mo steel - Fe-0.1C-2.3Cr-1Mo
Cr-Mo-Nb-V steel - Fe-0.05C-10Cr-2Mo-0.2V-up.to 0.1Nb-0.5Mn-0.4/0.6Si
Cr-N system (Cr-rich) - Chemical etching - General microstructure
Cr-Nb alloys - Chemical etching - General microstructure
Cr-Nb carbide - 0.5 mol % NbC
Cr-Nb-Zr-C alloy - 0.7% Zr, 1.0% Nb, 0.04% C
Cr-Ni stainless steels - Chemical etching - General microstructure
Cr-Ni-Si steel - Fe-0.3C-1.7Cr-3.5Ni-0.6Si
Cr-Re alloy - Thinning for electron microscopy
Cr-Rh system - Electrolytic etching - General microstructure
Cr-Ru alloys - Electrolytic etching - General microstructure
Cr-Sc alloy - May be examined unetched
Cr-Si alloys (2-76 wt.% Si) - Attack polishing
Cr-Si system - For alloys with up to 40 at.% S and over - General microstructure
Cr-Ta boride - Chemical etching - General microstructure
Cr-Ta carbide - 0.5 mol % TaC
Cr-Ti carbide - 0.5 mol % TiC
Cr-Ti carbide - Chemical etching - General microstructure
Cr-Ti steel - Fe-4Cr-0.25/0.35C-0/0.2Ti
Cr-W - Attack polishing
Cr-W alloy - Alloys with 29-40 at.% W - General microstructure
Cr-Y alloy - May be examined unetched
Cr-Zr carbide - Chemical etching - General microstructure
Cr-Zr carbide -0.5 mol % ZrC
Cr-Zr-C alloys - Electrolytic etching
Cr2O3 (0001) and (1011) wafers- Chemical etching - General microstructure
Cr2O3 (0001) wafers- Chemical etching - General microstructure
Cr2O3 (111) single crystal - Material growth
Cr2O3 and Al2O3 - Chemical etching
Cr2O3 thin film - Chemical etching - General microstructure
Cr3B2 specimens - Chemical etching - General microstructure
Cr3B2 specimens - Chemical etching - General microstructure
Cr3B2 specimens - Chemical etching - General microstructure
CrB2 specimens - Chemical etching - General microstructure
CrB2, MoB2 - Chemical etching - General microstructure
CrC and HfC - Chemical etching
CrSi2 thin films deposited on silicon substrates - Gas oxidation
Crowell's etchant - Ag-Sn-Zn-Cu alloys, Cu-Sn-Ag dental alloys
Crowell's etchant - Ag-Sn-Zn-Cu dental amalgam alloys - Chemical etching
Crowell's etchant - Cu-Sn-Ag dental alloys - Chemical etching
Crowell's etchant - Cu-Sn-Ag dental alloys - Chemical etching - General microstructure
Cs metal specimens - Chemical etching - General microstructure
Cs2O (111) wafers - Chemical cleaning
CsBr (001) wafers - Alcohol polishing
CsCl single crystal - Chemical etching - General microstructure
CsI (100) oriented single crystal wafers - Chemical polishing/etching
Cu (100) wafers - Chemical polishing
Cu (111) single crystal - Chemical cleaning
Cu (111) single crystal wafers - Dislocation etching
Cu (111) wafers - Electrolytic polishing
Cu (111) wafers - Gas cleaning
Cu (111) wafers- Chemical etching - General microstructure
Cu (111) within 2-3? orientation - Dislocation etching
Cu (1O0) single crystal wafers - Gas removal
Cu (OFHC), Cu-30% Zn alloy - Dislocation etching
Cu OFHC copper specimens - Chemical etching - General microstructure
Cu alloys, Cu-Si alloys - Chemical etching - General microstructure
Cu alloys, brasses, Cu-Be alloys, Al bronzes without eutectoid, Alpaca - Chemical etching - General microstructure
Cu and Cu alloy parts - Chemical etching - General microstructure
Cu and Cu alloy specimens - Chemical etching - General etchant
Cu and Cu alloys - Chemical cleaning
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching
Cu and Cu alloys - Chemical etching - General microstructure
Cu and Cu alloys - Chemical etching - General microstructure
Cu and Cu alloys - Chemical polishing
Cu and Cu alloys - Chemical polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys - Electrolytic polishing
Cu and Cu alloys as sheet or foil - Chemical cleaning
Cu and Cu alloys except Sn bronze - Electrolytic polishing
Cu and Cu alloys, Be bronzes - Chemical etching - General microstructure
Cu and Cu-Zn and Cu-Sn alloys - Chemical etching
Cu and Cu-base alloys - Electrolytic polishing
Cu and alloy - For copper, brass and nickel silver - General microstructure
Cu and alloy parts - Chemical etching - General microstructure
Cu and alloys - Chemical etching
Cu and alloys - Chemical etching
Cu and alloys - Chemical etching
Cu and alloys - Chemical etching
Cu and alloys - Chemical etching
Cu and alloys - Chemical etching
Cu and alloys - Chemical etching
Cu bicrystals - Chemical etching - General microstructure
Cu brases, bronzes - Chemical etching - General microstructure
Cu cryogenic trailer piping - Chemical cleaning
Cu ferrite - CuO 0.33/2.5 Fe2O3 - General microstructure
Cu oxide (Cu2O) - Chemical polishing, thinning
Cu oxide - Chemical polishing, thinning
Cu oxides - Chemical ecthing - General microstructure
Cu oxides - Chemical etching - General microstructure
Cu oxides-single crystals - Chemical polishing - General microstructure
Cu parts as sheet, pans and piping - Mineral cleaning
Cu piping - Chemical cleaning
Cu piping on cryogenic transport tailers - Chemical cleaning
Cu single crystal ingots - Chemical etching - General microstructure
Cu single crystal specimens - Acid cleaning
Cu single crystal specimens - Chemical etching - General microstructure
Cu single crystal specimens - Chemical etching - General microstructure
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Electrolytic polishing
Cu single crystal specimens - Electrolytic polishing
Cu single crystal specimens - Electrolytic polishing
Cu single crystal specimens - Physical etching - General microstructure
Cu single crystal sphere - Acid oxidation
Cu single crystal sphere - Chemical etching - General microstructure
Cu single crystal sphere - Gas, preferential
Cu single crystal spheres - Electrolytic polishing
Cu single crystal spheres - Electrolytic polishing
Cu single crystal spheres - Electrolytic polishing
Cu single crystal spheres - Electrolyticlytic oxide removal
Cu single crystal spheres - Salt, removal/preferential
Cu single crystal spheres - Acid oxidation
Cu single crystal spheres - Gas, preferential
Cu single crystal spheres - Thermal forming
Cu single crystal spheres - Thermal forming
Cu single crystal wafers - Chemical etching - General microstructure
Cu single crystal wafers - Chemical etching - General microstructure
Cu single crystal wafers - Dislocation etching
Cu single crystal wafers of various orientations - Dislocation etching
Cu single crystals - Chemical cleaning
Cu single crystals - Deformation
Cu specimens - Acid cutting
Cu specimens - Chemical etching - General microstructure
Cu specimens - Chemical etching - General microstructure
Cu specimens - Chemical etching - General microstructure
Cu specimens - Chemical polishing
Cu specimens - Electrolytic polishing
Cu specimens - Electrolytic polishing
Cu specimens - Gas corrosion
Cu thin films evaporated on NaCl - Acid, float-off
Cu wire and OFHC copper parts - Chemical polishing/cleaning
Cu wire and coupons - Chemical cleaning
Cu, 25% Pb, 0.75% Ag alloy - Chemical etching
Cu, alpha brass - Chemical polishing
Cu, brass (high Zn content) - Attack polishing
Cu-30% Zn alloy - Attack polishing
Cu-30% Zn alloy - Dislocation etching
Cu-30% Zn alloy - Dislocation etching
Cu-35% Zn alloy - Dislocation etching
Cu-4.85% Si alloy - Chemical polishing
Cu-48.9% alloy (atomic %) - Dislocation etching
Cu-8% Al alloy, Cu-0.5% Be alloy, Cu-5% Al-2% Si alloy - Chemical polishing
Cu-Ag alloy - Alloy with 20 wt % Ag
Cu-Ag alloy - Electrolytic thinning
Cu-Ag alloys - Grain boundary etching (primary and deformed)
Cu-Ag-Al alloy - Electrolytic polishing
Cu-Ag-Ni alloy - 23Cu-75Ag-2Ni
Cu-Al alloy - Alloys with 5.5-7.5% Al - General microstructure
Cu-Al alloy single crystal - Alloy with 0.3-0.7 at.% Al
Cu-Al alloys (to 50%) - Dislocation etching
Cu-Al and Cu-Be alloys - Electrolytic etching
Cu-Al system - Electrolytic thinning by Bollmann technique
Cu-Al-Fe alloy - Alloy with 9% Al and up to 4% Fe
Cu-Al-Fe alloy - Ampco 8 6.3% Al, 2-5% Fe
Cu-Al-Mn system - Electrolytic thinning
Cu-Al-Ni alloy - 82-83% Cu, 14-15% Al, 3% Ni
Cu-Al-Ni alloy - Chemical polishing
Cu-Al-Ni alloys - Chemical etching - General microstructure
Cu-Al-Ni-Fe alloy - Cu-10Al-5Ni-5Fe - General microstructure
Cu-Al-Si-Co alloy - Coronze CDA 638 95Cu-2.8Al-1.8Si-0.4Co
Cu-Al-Ti alloy - Cu-2% Ti-2.3-5% Al
Cu-Al-Ti alloy - Cu-9.5Al-0.75/2.5Ti
Cu-As alloys - Chemical etching - General microstructure
Cu-Au alloys - Chemical etching
Cu-Au alloys - Electrolytic polishing
Cu-Au alloys - Electrolytic polishing and micro etching
Cu-Au alloys - Electrolytic polishing and micro etching
Cu-Au alloys - Electrolytic thinning
Cu-Au alloys - Electrolytic thinning
Cu-Au alloys - Electrolytic thinning
Cu-Au alloys - Primary etching (cast structures, segregation)
Cu-Au alloys - Secondary etching
Cu-Au and Cu-Au-Zn alloys - Electrolytic polishing
Cu-Au single crystal (Cu3Au) - Electrolytic polishing
Cu-B alloys - Chemical etching - General microstructure
Cu-Be alloys - Chemical etching
Cu-Be alloys - Chemical etching
Cu-Be alloys - Electrolytic thinning
Cu-Be alloys - Electrolytic thinning
Cu-Be alloys - Electrolytic thinning
Cu-Be alloys - Electrolytic thinning by Bolmann technique
Cu-Be alloys - Electrolytic thinning by Mirand-Saulnier technique
Cu-Be spring shim stock - Chemical cleaning
Cu-Be-Co alloys - Cu-2% Be-0.3% Co
Cu-Be-Ni alloy specimens - Chemical etching - General microstructure
Cu-Bi alloys - Electrolytic etching
Cu-Ce alloy - Electrolytic and chemical etching
Cu-Co alloy - Alloy with 2 at.% Co
Cu-Co alloy - Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cu-Co alloy - Cast alloys <= 7 at.% Co
Cu-Co alloy - Cu-2/3% Co
Cu-Co alloy - Electrolytic thinning
Cu-Cr alloy - Alloys with < at.% Cr - General microstructure
Cu-Cr eutectic alloy - Chemical etching - General microstructure
Cu-Cr-Zr alloy - Chemical etching - General microstructure
Cu-Fe alloy - Alloy with < 5.5 at.% Fe
Cu-Fe alloy - Alloy with 2.5% Fe - Physical etching
Cu-Fe alloy - Alloy with 50% Cu - General microstructure
Cu-Fe alloy - Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cu-Fe single crystal - Up to 1.58 wt.% Fe
Cu-Fe, Cu-Co alloys - Electrolytic polishing
Cu-Fe-Ni alloy - 19Cu-61Fe-20Ni
Cu-Fe-Ni alloy - Electrolytic thinning by window technique
Cu-Ga - In selenide-CuGa(x)In(1-x)Se2 - General microstructure
Cu-Ga alloy - Alloys with < 14.5 at.% Cu - Chemical polishing
Cu-Ga alloy - Beta phase quenched alloys
Cu-Ga alloy specimens - Chemical etching - General microstructure
Cu-Ga alloy specimens - Chemical etching - General microstructure
Cu-Ga alloys - Chemical polishing
Cu-Ga sulphide (CuGeS2 single crystal) - Chemical etching - General microstructure
Cu-Ga-Zn alloy - Cu-20.4 at.% Zn-12.5 at.% Ga
Cu-Ge alloy - Alloy with 6 at.% Ge - Electrolytic polishing
Cu-Ge alloy - Alloy with 8.5 at.% Ge - Chemical thinning
Cu-Ge alloy - Alloys with < 9.5 at.% Ge - Chemical polishing
Cu-Ge alloy - Electrolytic polishing
Cu-Ge alloy - Electrolytic thinning
Cu-Ge alloy - Electrolytic thinning by window technique
Cu-Ge alloys - Electrolytic polishing
Cu-Ge alloys - Electrolytic polishing
Cu-Ge alloys - Electrolytic polishing
Cu-Ge oxide system - Cu-GeO2 - Electrolytic polishing
Cu-Ge-Sn alloys - Chemical etching - General microstructure
Cu-In alloy - Alloy with 9% In - Chemical etching and electrolytic thinning
Cu-In alloy - Electrolytic thinning by window technique
Cu-In eutectoid-31.4% In - General microstructure
Cu-In-Se (CuInSe2) - Chemical polishing
Cu-In-Se (CuInSe2) - Chemical polishing
Cu-In-Se single crystals (CuInSe2) - Chemical etching - Aqua regia
Cu-In-Te - Chemical etching - General microstructure
Cu-Mg alloy - Electrolytic thinning
Cu-Mg-Ca alloys - Chemical etching - General microstructure
Cu-Mn alloy - Alloys with < 50 at.% Mn - General microstructure
Cu-Nb alloy - Cu-15-20Nb - General microstructure
Cu-Nb-Sn system - Cu-0.3/1.0Nb-0.2/0.5Sn - General microstructure
Cu-Ni alloy - Electrolytic thinning
Cu-Ni alloy - Electrolytic thinning by window technique
Cu-Ni alloys - Electrolytic etching
Cu-Ni alloys - Physical etching - General microstructure
Cu-Ni-Al alloys - Chemical etching
Cu-Ni-Co alloys - Chemical thinning
Cu-Ni-Cr alloy - Cu-32Ni-2Cr - Electrolytic thinning
Cu-Ni-Fe alloy - Cathodic etching - General microstructure
Cu-Ni-Fe alloy - Chemical and electrolytic polishing
Cu-Ni-Fe system - 32-64% Cu, 27-46% Ni, 9-23% Fe
Cu-Ni-Fe system - 50/70 at.% Cu - 33/19 at.% Ni - 15/11 at.% Fe
Cu-Ni-Mn alloy - Cu-20Ni-20Mn - General microstructure
Cu-Ni-Nb alloy - Cu-30Ni-1Nb - General microstructure
Cu-Ni-Sn alloy - Cu-15Ni-8Sn
Cu-Ni-Ti alloy - 27/47Ni-7/29Cu-44/46Ti - TiNixCu(1-x)
Cu-Ni-Ti alloy - Cu-5Ni-2.5Ti - General microstructure
Cu-Ni-Ti alloy - Jet electrolytic thinning - Cu-5-16Ni-4-4.5Ti
Cu-Ni-Zn alloys - Chemical etching - General microstructure
Cu-Ni-Zr alloy - Ni-30Cu+0.2Zr - alloy Monel
Cu-P alloy - Cu-5-10% P - General microstructure
Cu-Pb alloy - Selective etchant to allow SEM examination
Cu-Pb alloys - Attack polishing
Cu-Pb alloys - Good up to 30% Pb
Cu-Pd thin film - Chemical etching - General microstructure
Cu-Pt alloy - Chemical etching - General microstructure
Cu-Pt alloy - Electrolytic thinning as Corke
Cu-Pt alloy - Electrolytic thinning by window technique
Cu-Si alloy - Cu-0.24% SiO2 - General microstructure
Cu-Si alloy - Electrolytic thinning
Cu-Si alloys - Chemical etching
Cu-Si alloys - Electrolytic polishing
Cu-Si system - Electrolytic thinning by Bollman technique
Cu-Si system - For alloys with 1% Si - Dislocation etch
Cu-Si system - For alloys with 17-25 at.% Si - General microstructure
Cu-Si-Zn alloy - Copper rich alloys - General microstructure
Cu-Si-Zn alloys - Chemical etching
Cu-Sn (30%) standard bronze - Chemical etching - General microstructure
Cu-Sn alloy - Electrolytic thinning by modified Mirand-Saulnier technique
Cu-Sn alloy - Electrolytic thinning by window technique
Cu-Sn alloys - For alloys with 5 at.% Sn - Electrolytic polishing
Cu-Sn-As alloys - Chemical etching - General microstructure
Cu-Sn-Zn alloy - Cu-34 wt.% Zn-4% Si - General microstructure
Cu-Te alloy - Electrolytic thinning
Cu-Ti alloy - Cu-1% Ti - Electrolytic polishing
Cu-Ti alloys - Electrolytic polishing
Cu-Ti alloys - For alloys with < 5 wt.% Ti
Cu-Ti alloys - For alloys with < 9.5 at.% Ti
Cu-Ti alloys - For alloys with 1-4% Ti
Cu-V alloy - For alloys with < 14.7 at.% V and > 94 at.% V
Cu-W composite - Electrolytic polishing
Cu-Zn alloy - 52.55 at.% Cu - 48.45 at.% Zn - General microstructure
Cu-Zn alloy - 58 at % Cu - 42 at.% Zn - General microstructure
Cu-Zn alloy - Alloys with low Zn content - General microstructure
Cu-Zn alloy - Alloys with up to 35% Zn - General microstructure
Cu-Zn alloy - Copper and Cu-Zn alloys
Cu-Zn alloy - Electrolytic polishing
Cu-Zn alloy - Electrolytic thinning
Cu-Zn alloy - Electrolytic thinning by Bollmann technique
Cu-Zn alloy - Electrolytic thinning by window technique
Cu-Zn alloy - Electrolytic thinning by window technique
Cu-Zn alloy - Zn rich alloys - General microstructure
Cu-Zn alloy specimens - Chemical etching - General microstructure
Cu-Zn alloys (90-10 brass) - Chemical etching - General microstructure
Cu-Zn alloys (alpha-brass) - Chemical etching
Cu-Zn alloys (alpha-brass) - Electrolytic polishing
Cu-Zn alloys (gamma brass) - Electrolytic thinning
Cu-Zn alloys - Electrolytic etching - General microstructure
Cu-Zn alloys - Electrolytic polishing
Cu-Zn alloys - For alloys with < 30 at.% Zn
Cu-Zn alloys - For alloys with 38% Zn - General microstructure
Cu-Zn-Al alloy - 47Cu-21Zn-2Al
Cu-Zn-Al alloy - Chemical etching - General microstructure
Cu-Zn-Al alloy - Cu68Zn15Al17
Cu-Zn-Al alloy - Electrolytic thinning and polishing
Cu-Zn-Be alloys - Cu-20/30% Zn-0.11% Be - Chemical thinning and electrolytic polishing
Cu-Zn-Ga alloys - Electrolytic polishing
Cu-Zn-Mn alloy - 44-48% Zn, 1-4% Mn - General microstructure
Cu-Zn-Ni alloy - 45-48% Zn, 2-5% Ni
Cu-Zn-Ni alloy - IN 836 48Cu-37Zn-15Ni
Cu-Zn-Ni-Mn alloy - Alloy IN 629 Cu-28Ni-15Ni-13Mn. alloy IN 836 Cu-38Zn-16Ni-0.1Mn
Cu-Zn-Ni-Mn alloy - Alloy IN 829 44Cu-28Zn-15Ni-13Mn - General microstructure
Cu-Zn-Sn alloy - 64 at.% Cu-33.5 at.% Zn-2.5 at.% Sn
Cu-Zn-Sn alloy - No etching
Cu-Zr alloy (CuZr) - Chemical etching - General microstructure
Cu-Zr alloys - Chemical etching - General microstructure
Cu-Zr alloys - For alloys with 40 wt.% Zr
Cu20 thin films - Acid oxidation
Cu2O native oxide-Oxide removal
Cu2O as a native oxide - Chemical etching - General microstructure
Cu2O as a native oxide on copper surfaces - Acid removal
Cu2O as a native oxide thin film on surfaces - Oxide removal
Cu2O material - Chemical polishing
Cu2O specimens - Chemical etching - General microstructure
Cu2O thin films - Chemical cleaning
Cu2Sb and SbAu2Sb specimens - Chemical etching - General microstructure
Cu3Au single crystal specimens - Electrolytic polishing
Cu3Au single crystal specimens - Electrolytic polishing
Cu4Te3 specimens - Chemical etching - General microstructure
Cu6PS3-halogens - Chemical etching - General microstructure
Cu6PS5-I single crystal - Chemical etching - General microstructure
CuBr single crystals - Chemical polishing
CuCl single crystals - Chemical polishing
CuGaS2 single crystals - Chemical cleaning
CuGaSe3 single crystal - Chemical etching - General microstructure
CuGaTe2 single crystals - Chemical etching - General microstructure
CuGe2P3 single crystal ingots - Chemical etching - General microstructure
CuI single crystals - Chemical polishing
CuInS2 (112) wafers - Dislocation etching
CuInS2 (112) wafers - Dislocation etching
CuInS2 (112) wafers - Dislocation etching
CuInS2 n-type wafers - Chemical polishing
CuInS2 n-type wafers - Photo etch-polishing
CuInS2 wafer - Chemical polishing
CuInS2 wafers - Chemical etching - General microstructure
CuInSe2 p-type wafers - Chemical cleaning
CuInSe2 single crystal - Chemical polishing/staining
CuInSe2 wafers - Chemical etching - General microstructure
CuInTe2 single crystals - Chemical etching - General microstructure
CuInTe2 thin films - Acid, float-off
CuInTe2 thin films - Chemical thinning
CuNi single crystal specimens - Chemical etching - General microstructure
CuS specimens - Chemical etching - General microstructure
CuZn (30%) specimens - Chemical etching - General microstructure
CuZn (30%) specimens - Chemical etching - General microstructure
Curan's etchant - Stainless steels - Chemical etching
Czochralski's - Antimony specimens - Grain contrast etch
Czochralski's etchant - Antimony - Chemical etching
Czochralski's etchant - Sb alloys
D (100), (111), and (110) oriented wafers - Physical etching - General microstructure
D (111) oriented small parts - Detergent cleaning
D (111) platelets - Physical etching - General microstructure
D (111) single crystal specimens - Thermal processing
D (111) specimens - Sample preparation
D (111) wafers - Chemical cleaning
D (111) wafers - Ionized gas
D (111) wafers - Metal, implatantion
D, fabricated as artificial diamond
D43 alloy - Nb-10W-12V-0.1C
DE-100 etchant - SiO2 thin films deposited by Silox system method on (100) silicon and GaAs-Cr (SI) wafers - Ionized gas etching
Dash etchant - Sb (0001) specimen
Dash etchant - Sb (0001) specimen cleaved in LN2
Dash etchant - Sb (0001) specimen cleaved in LN2
Dash etchant - Sb (OOO1) specimen
Dash etchant, modified - Sb (0001) specimen cleaved in LN2
Dash etchant, modified - Sb (0001) specimen cleaved in LN2
Dash's copper decoration etchant - Si (111) wafers - Metal difusion
Dash's etchant - Si (111) wafers and other orientations, both n- and p-type of different resistivity levels
Dash's etchant, modified - Si (100), (111), (110) and (112) wafers
Dash's etchant, modified - Si (111) wafers - Chemical etching
Delta Pu and alloys - Electrolytic etching
Delta ferrite phase in 316LS austenite stainless steel - Electrolytic etching
Deutron - Particle, transmutation
Diamond
Dickenson's etchant - Fe-As alloys - For alloys with 0.6 - 4.6 at.% As - General microstructure
Dickenson's etchant - For cast steels
Different steels - Chemical etching - General microstructure
Disapol A2 electrolyte
Disapol D2 electrolyte
Disapol D2 solution
Dispersion strengthened ceramics - Thermal etching
Dix-Keller's etchant - Foamed Al, Al alloys, Al-Zr-Ti alloys
Dix-Keller's etchant - For most Al types and alloys except for Al alloys with high Si content, Al foils - Chemical etching
Dix-Keller's etchant - Pure Al and Al alloys
Doped ZnO-ZnO-0.5 mole % each of Bi2O3, CaO, MnO, SnO2
Dow's etchant
DuPont Nb etchant - Nb-Hf and Nb alloys - Chemical etching
Dual phase steel etchants - Chemical etching - General microstructure
Duaraluminium and Al cast alloys - Chemical etching - General microstructure
Dunn's method for revealing crystal orientation in Ta - Electrolytic etching
Duplex stainless steel - Selective etching
Duplex stainless steel - Selective etching
Duraluminium - Cathodic etching
Duraluminium - Chemical etching - General microstructure
Dy as single crystal spheres - Chemical etching - General microstructure
Dy-, Er-, Ho-, La-base alloys, RE-Co alloys - Chemical etching - General microstructure
Dy-Ag alloys - Chemical etching - General microstructure
Dy-Al alloy - Anodising
Dy-Au alloys - Chemical etching - General microstructure
Dy-Bi system - Chemical etching - General microstructure
Dy-Er alloy - Electolytic polishing and etching - General microstructure
Dy-Ho alloys - Electrolytic polishing and etching - General microstructure
Dy-Pb system - Electrolytic polishing
Dy-Pd alloys - Chemical etching - General microstructure
Dysprosium - Chemical etching - General microstructure
Dysprosium - Dy, Er, Gd, Ho base allyos, Rare Earths - Co alloys
Dysprosium - Electrolytic polishing
Dysprosium - Polishing and chemical etching - General microstructure
Dysprosium oxide-zirconia system (Dy2O3 x ZrO2) - Chemical etching - General microstructure
E etchant - Ni superalloys
E etchant - Zn (0001) wafers - Chemical etching
EAg1 etchant - CdTe (100), (111) and (110) wafers - Chemical etching
EAg2 etchant - CdTe (100), (111), and (110) wafers - Chemical etching
EBSD sample preparation - All materials - Dislocation etching
EDP etchant for single crystal silicon - Chemical etching
EDP etching of silicon wafers I - Chemical etching
EDP etching of silicon wafers II - Chemical etching
EDTA etchant - CaCO3 r(1011) cleaved wafers - Acid cleaning
EDTA etchant - Li-alumina-silica glass - Li2O x Al2O3 x SiO2
EI-IR etchant - Steels for high temperatures
EPW etchant - Si (111) and (100), p-type 1 - 10 Ohm cm and n-type wafers - Chemical etching
Electroless Ni - For revealing the grain structure
Electrolyte A2
Electrolyte V2A 'Micro'
Electrolytes for TEM preparation od intermetallics
Electrolytic etching in chlorhydric acid - Martensitic chromium steels - Electrolytic etching
Electrolytic polishing NiTi alloys
Electrolytic polishing of pure titanium - EBSD sample preparation
Ellis's No. 1 etchant - Ge spheres and hemispheres - Chemical etching
Ellis's No. 5 etchant - Ge spheres and hemispheres - Chemical etching
Ellis's No. 7 etchant - Ge spheres and hemispheres - Ge spheres and hemispheres
Emanuel's etchant - Cast steels - Chemical etching
Emanuel's etchant - Fe-Ni-Cr heat resistant casting alloy - Attacks sigma phase with little or no effect on carbide particles
Ence and Margolin's etching solution (H-etch) - Ti alloys - Electrolytic etching
Epsilon phase in Pb-Sb-Sn alloys - Chemical etching
Er as an evaporated thin film - Chemical etching - General microstructure
Er single crystal specimens - Thermal processing
Er-Ag alloys - Chemical etching - General microstructure
Er-Al alloys - Anodise
Er-Au alloys - Chemical etching - General microstructure
Er-Bi system - Chemical etching - General microstructure
Er-Fe system - Chemical polishing
Er-Ho alloys - Electrolytic polishing and chemical etching
Er-Tb alloys - Electrolytic polishing and chemical etching
Er-Y alloys - Electrolytic polishing and chemical etching
ErH2 and ErH3 - Acid, float-off
ErSi2 thin films grown on Si (100) - Thermal forming
Erbium alloy - Dy, Er, Gd, Ho base allyos, rare earths-Co alloys
Erbium alloy - Polishing, chemical etching - General microstructure
Erbium alloys - Electrolytic polishing
Erbium hydride (ErH2) - Chemical etching - General microstructure
Erhard's etchant - Si (111) wafers - Dislocation etching
Etch pits etchant - Nickel oxide (NiO)
Etch pits etchant - Selenium
Etch-polish of 304 stainless steel - Dislocation etching
Etchant No. 2 - InSb (100) and (110) wafers - Chemical etching
Etchant for 316 SS Coreloy - This etchant should reveal the general microstructure
Etchant for ZnO varistor materials - For etching commercial ZnO varistors
Etchant for copper wire - Chemical etching - General microstructure
Etchant for delta ferrite in stainless steels - Chemical etching
Etchant for neodymium - Chemical etching - General microstructure
Etchant for titanium aluminide - Chemical etching - General microstructure
Etchant of del Corral and de Castro y Mosquera - Temper embrittlement in steels - Chemical etching
Etchants for Inconel-X alloy - General microstructure
Etchants for ZK60 Mg alloy - Chemical etching - General microstructure
Etchants for revealing prior austenite grain in alloy steels
Etches the (100) texture of Cu - Chemical etching - General microstructure
Etching 14k Gold - For alloy with 70% Cu, 20% Ag, 10% Zn and also some amount of Si
Etching Rene 80 alloy - Electrolytic etching
Etching agent for 80Ni-20Fe - Chemical etching - General microstructure
Etching for grain boundaries in microalloyed steel
Etching of Zr-10% Ag - Chemical etching - General microstructure
Etching of gold - Chemical and electrolytic etching
Etching on a 90% Pb-Sn - Grain bondaries etching
Eu-Ag alloys - Chemical etching - General microstructure
Eu-Pb system - Electrolytic polishing
Eu-Zr system - Chemical etching - General microstructure
Eu2O3 - Chemical etching - General microstructure
Eu2O3 specimens - Chemical etching - General microstructure
Eu3Sc2Fe3OI2 single crystal
Europium - Electrolytic polishing
Europium - General microstructure
Europium - The method of Roman can be used for polishing and etching
Europium oxide (Eu2O3) - Chemical etching - General microstructure
Eutectoid steel - Fe-0.8C-0.5Mn-0.2Si
Evans etchant - Inconel 617 - Chemical etching
Evidence of susceptibility for intercrystalline corrosion in Al-Mg alloys - Chemical etching
Exhaust valve steel - Fe-19Cr-8Ni-0.4C - General microstructure
Extraction replica etchant for Cu alloys - Chemical etching
Extraction replica etchant for high chromium and alloy steels - Chemical etching
Extraction replica etchant for high speed steels - Chemical etching
Extraction replica etchant for mild and low alloy steels - Chemical etching
Extraction replica etchant for nickel alloys - Chemical etching
Extraction replica etchant for stainless steels - Chemical etching
Extraction replica etchant for titanium alloys - Chemical etching
F (Fast) etchant - Silicon - Chemical etching
F etchant - LiF - Dislocation etching
Fe (100) wafers - Chemical etching - General microstructure
Fe (100) wafers - Dislocation etching
Fe (100) wafers and other orientations - Chemical etching - General microstructure
Fe (100) wafers used in a magnetics study - Chemical etching - General microstructure
Fe 3% Si steel - Electrolytic polishing
Fe and Fe-C alloys - Electromechanical polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe and steel - Electrolytic polishing
Fe as SST 305 - Gas cleaning
Fe as SST 401 wire 0.020 diameter - Electrolytic forming
Fe as flat soft iron lap platens - Chemical cleaning
Fe as flat soft iron lap platens - Chemical cleaning
Fe as grey iron flame hardened - Chemical etching - General microstructure
Fe as grey iron specimens - Chemical etching - General microstructure
Fe as iron alloy specimens - Ionized gas cutting
Fe as stainless steel tubing - Chemical cleaning
Fe cast alloy - Will develop concentrations of Steatite
Fe colloidal spheres - Electrolyticlytic forming
Fe polycrystalline discs - Electrolytic polishing
Fe polycrystalline specimens - Chemical cleaning
Fe polycrystalline specimens - Chemical etching - General microstructure
Fe polycrystalline specimens - Electrolytic polishing
Fe polycrystalline whiskers - Electrolytic polishing
Fe single crystal and polycrystalline spheres - Thermal forming
Fe single crystal spheres - Chemical etching - General microstructure
Fe single crystal whiskers - Chemical etching - General microstructure
Fe single crystal whiskers - Thermal etching
Fe single crystal whiskers etched in this solution to observe dislocations
Fe single crystals - Chemical etching
Fe specimen - Cleaning and removal solution with some preferential attack
Fe specimens - Chemical etching - General microstructure
Fe specimens - Chemical etching - General microstructure
Fe specimens - Chemical etching - General microstructure
Fe specimens - Heat cleaning
Fe specimens - Solution used as a general removal and surface cleaning etch
Fe specimens - Solution used as a polishing etch
Fe specimens of alpha-iron - Electrolytic thinning
Fe thin films deposited by MBE on GaAs, (110) wafer substrates - Chemical etching
Fe(3-x)Ti(x)O4 single crystal - Chemical etching
Fe, Fe-C alloys, low-iron alloys - Electromechanical polishing
Fe, Fe-Si alloys - Chemical polishing
Fe, low-carbon steels - Chemical polishing
Fe, low-carbon steels - Chemical polishing
Fe, low-carbon steels, Fe-20% Ni-5% Mn alloy - Chemical polishing
Fe, low-carbon steels, low-alloy steels - Chemical polishing
Fe, single crystal iron spheres - Chemical etching - General microstructure
Fe-26Cr-1Mn alloy (oxidised) - Electrolytic polishing and electrolytic etching - General microstructure
Fe-3% Si alloy - Chemical polishing
Fe-3% Si alloy - Dislocation etching
Fe-Ag alloys - Chemical etching - General microstructure
Fe-Al alloy - Al-Al9Fe eutectic
Fe-Al alloy - Alloy with 35.5 at.% Al
Fe-Al alloy - Alloy with 8 wt.% Fe
Fe-Al alloy - Alloys with 2-6% Fe
Fe-Al alloy - Alloys with 49-54% Fe
Fe-Al alloy - Electrolytic thinning
Fe-Al alloys - Chemical etching
Fe-Al alloys - Chemical etching
Fe-Al alloys - Chemical etching - General microstructure
Fe-Al alloys - Electrolytic polishing
Fe-Al alloys - Electrolytic polishing with double jet
Fe-Al-C alloy - Alloys with 7% Al and 1-2% C
Fe-Al-C alloy - Fe-0.3C-0.5-10Al
Fe-As alloys - For alloys with 0.2 - 1.4% As - General microstructure
Fe-Au alloys - Electrolytic polishing
Fe-Au alloys - For alloys with 4% Au - General microstructure
Fe-B alloy - Fe80-B20 - Electrolytic thinning
Fe-B alloy - Fe80-B20 - Electrolytic thinning
Fe-B alloy - Fe80-B20 - General microstructure
Fe-B alloy - Fe83-B17 - Electrolytic thinning
Fe-B-Si alloy - Electrolytic thinning for TEM
Fe-Be (20%) polycrystalline wire - Electrolyticlytic cleaning
Fe-C (1.5%)-Ni (5%) alloy specimens - Chemical polishing
Fe-C-Cr alloy - Fe-0.1C-3Cr
Fe-C-Mn alloy - Fe-0.1C-3.1Mn
Fe-C-Ni alloy - Fe-0.1/0.4C-3.3/7.5Ni
Fe-C-Ni alloy - Fe-0.6C-20Ni
Fe-C-Si alloy - Fe-0.4C-1.7Si
Fe-Co alloys - Electrolytic polishing
Fe-Co magnetic alloys - Chemical etching
Fe-Co-Al alloy - Alloy with 15% Co and 11% Al
Fe-Co-Ni alloys - Chemical etching - General microstructure
Fe-Co-Ni-C-Cr-Mo alloy - HY-180M steel, Fe-0.16C-14Co-10Ni-2Cr-1Mo
Fe-Co-Si alloys - Electrolytic polishing
Fe-Co-Ti alloy - 10-20% Co, 2-6% Ti
Fe-Co-Ti alloy - 82% Co-12% Fe-6% Ti
Fe-Co-V alloy - Chemical etching - ASTM etchant No. 74
Fe-Cr alloy - 14-18% Chromium ferrite stainless steel - General microstructure
Fe-Cr alloy - Alloys with 15-20% Cr - General microstructure
Fe-Cr alloy - Electrolytic polishing, electrolytic etching, chemical etching
Fe-Cr alloy - Electrolytic thinning
Fe-Cr alloy - Fe-10/50 at.% Cr - Electrolytic thinning
Fe-Cr alloy - Fe-10Cr - Electrolytic thinning
Fe-Cr alloy - Fe-26Cr - General microstructure
Fe-Cr alloy - Thinning for electron microscopy
Fe-Cr, Fe-Cr-Ni and Fe-Cr-Mn alloys - Chemical etching - General microstructure
Fe-Cr, Fe-Cr-Ni and Fe-Cr-Mn steels - Chemical etching - General microstructure
Fe-Cr-Al system - Chemical etching and thinning
Fe-Cr-Al system - Fe-10/50 at.% Cr-5/40 at.% Fe
Fe-Cr-C alloy - Chemical etching - General microstructure
Fe-Cr-C alloy - Chemical etching - General microstructure
Fe-Cr-C alloy - Electrolytic thinning
Fe-Cr-C alloy - Fe-0.2C-5/10Cr
Fe-Cr-C alloy - Fe-0.8/1.2C-5/6Cr
Fe-Cr-C alloys - Fe-4.9% Cr-1.1% C
Fe-Cr-Co alloy - Fe-28Cr-10.5Co
Fe-Cr-Mn-C alloys - Chemical etching - General microstructure
Fe-Cr-Mn-Mo-C alloy - Chemical etching - General microstructure
Fe-Cr-Mn-Ti alloy - 10Cr-4/5Si-12/16Mn-0.5/2Ti - Electrolytic thinning
Fe-Cr-Mo alloy - 14-18 Cr - 2 Mo (+ 0.05% Ti), ferritic stainless steel
Fe-Cr-Mo alloy - Fe-24Cr-3Mo - Electrolytic thinning
Fe-Cr-Mo-C alloy - Chemical etching - General microstructure
Fe-Cr-Mo-Ni alloy - Fe-29Cr-4Mo-2Ni, stainless steel
Fe-Cr-Mo-Ti alloy - Fe-13Cr-1.5Mo-2.5Ti - Electrolytic polishing
Fe-Cr-Nb alloy - Pseudo-binary eutectic at 13.3% Nb and 23% Cr
Fe-Cr-Ni alloy - Alloy 800, Fe-30/35Ni-19/23Cr - Electrolytic polishing
Fe-Cr-Ni alloy - Fe-16/18Cr-10/14Ni - Electrolytic polishing
Fe-Cr-Ni alloy - Fe-28Cr-5Ni - Electrolytic thinning
Fe-Cr-Ni-C alloy - Chemical etching - General microstructure
Fe-Cr-Ni-C-Mo-Mn-Si alloy - Fe-9Cr-8Ni-3Mn-3Si-4Mo-026C
Fe-Cr-Ni-Mn-C alloy - Chemical etching - General microstructure
Fe-Cr-Ni-Mn-Mo-Si alloy - Fe-24.5Cr-5.5Ni-3.1Mo-0.6Mo-0.4Si - Electrolytic thinning
Fe-Cr-Ni-Mo alloy - Fe-24Cr-3Mo-5Ni - Electrolytic thinning
Fe-Cr-Ni-Mo-Cu-Mn-Si alloy - U50 alloy Fe-21Cr-7.4Ni-2.4Mo-1.8Cu-0.6Mn-0.5Si
Fe-Cr-Ni-Nb stainless steel - Fe-20Cr-25Ni-0.5Nb (+ C) - Electrolytic polishing
Fe-Cr-Si-Ti alloy - Fe-10/16Cr-4.5/6Si-2Ti - Electrolytic thinning
Fe-Cr-Ta alloy - Fe-1 at.% Ta-7 at.% Cr - Electrolytic polishing
Fe-Cr-Ti-Mo alloy - Fe-12Cr-2Mo-2.5Ti - Electrolytic polishing
Fe-Cr-Ti-Mo-Nb alloy - Fe-13Cr-2Mo-2.5Ti-1Nb - Electrolytic polishing
Fe-Cu-Ni alloy - Fe-2Cu-2Ni - Electrolytic polishing
Fe-Mn (1%) single crystal specimens - Chemical etching - General microstructure
Fe-Mn alloy - Alloys with 5-20% Mn - General microstructure
Fe-Mn alloy - Electrolytic thinning
Fe-Mn alloy - Electrolytic thinning
Fe-Mn alloy - Electrolytic thinning by Bollman technique
Fe-Mn alloy - Fe-1 at.% Mn - General microstructure
Fe-Mn alloy - Fe-12% Mn - General microstructure
Fe-Mn alloys - Chemical thinning
Fe-Mn alloys - Chemical thinning
Fe-Mn system - Electrolytic polishing
Fe-Mn system - Electrolytic thinning
Fe-Mn-Al-C alloy - Electrolytic thinning
Fe-Mn-Al-C-Co alloy - Electrolytic thinning
Fe-Mn-Al-C-Cr alloy - Electrolytic thinning
Fe-Mn-Al-C-Cu alloy - Electrolytic thinning
Fe-Mn-Al-C-Mo alloy - Electrolytic thinning
Fe-Mn-Al-C-Nb alloy - Electrolytic thinning
Fe-Mn-Al-C-Si alloy - Electrolytic thinning
Fe-Mn-Al-C-Ti alloy - Electrolytic thinning
Fe-Mn-Al-C-V alloy - Electrolytic thinning
Fe-Mn-C alloy - Fe-14% Mn-0.4% C, plus Cr, V, Mo - General microstructure
Fe-Mn-Si-Ti alloy - Fe-9Mn-4.7Si-2.5Ti - General microstructure
Fe-Mn-Zn pressed powder blanks - Chemical cleaning
Fe-Mo alloy - Alloys with 1.94% Mo - General microstructure
Fe-Mo alloy - Alloys with 11 at.% Mo - General microstructure
Fe-Mo alloy - Alloys with 12-20 at.% Mo
Fe-Mo alloy - Alloys with 8% Mo
Fe-Mo alloys - Electrolytic polishing
Fe-Mo solid solution alloys - Chemical polishing
Fe-Mo-Al alloys - Electrolytic polishing
Fe-Mo-C alloy - Fe-0.5/5Mo-1C with impurities
Fe-Mo-Mn-C alloys - Chemical etching - General microstructure
Fe-Mo-N alloy - Alloys with 3 at.% Mo, 2-3 at.% N
Fe-Mo-Ni-C alloys - Chemical etching - General microstructure
Fe-N alloy - Alloys with 1.5% N2
Fe-Ni (65%) alloy specimens - Chemical etching - General microstructure
Fe-Ni alloy - Alloys with 3-9% Ni
Fe-Ni alloy - Electrolytic thinning
Fe-Ni alloy - Electrolytic thinning by Bollman technique
Fe-Ni alloy - Electrolytic thinning by Bollmann technique
Fe-Ni alloy - Electrolytic thinning by Bollmann technique
Fe-Ni alloy - Fe-10-40% Ni - Chemical and electrolytic polishing
Fe-Ni alloy - Fe-12 at.% Ni - Chemical polishing and electrolytic thinning
Fe-Ni alloy - Fe-12Ni - Chemical and electrolytic polishing
Fe-Ni alloy - Fe-40/80Ni - General microstructure
Fe-Ni alloy - Jet electrolytic polishing
Fe-Ni alloy - Low voltage electrolytic thinning
Fe-Ni alloys - Chemical and electrolytic thinning
Fe-Ni alloys - Chemical etching
Fe-Ni alloys - Chemical etching
Fe-Ni alloys - Chemical etching
Fe-Ni alloys - Chemical thinning
Fe-Ni alloys - Electrolytic polishing
Fe-Ni alloys - Electrolytic polishing
Fe-Ni alloys from 5-25% Ni - Color etching - Colors martensite
Fe-Ni and Fe-Co magnetic alloy - Recommended for electron microscopy - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Fe-Co magnetic alloys - Grain size, structure
Fe-Ni and Ni-Al alloys - Chemical etching - General microstructure
Fe-Ni or Fe-Co alloys - Electrolytic polishing
Fe-Ni oxide couple - Chemical etching - General microstructure
Fe-Ni thin film - Chemical cleaning
Fe-Ni-Al alloy - Alloys with 10-60% Fe, 30-80% Ni, 4-30% Al
Fe-Ni-Al-C alloy - Electrolytic thinning
Fe-Ni-Al-C-Co alloy - Electrolytic thinning
Fe-Ni-Al-C-Cr alloy - Electrolytic thinning
Fe-Ni-Al-C-Cu alloy - Electrolytic thinning
Fe-Ni-Al-C-Mo alloy - Electrolytic thinning
Fe-Ni-Al-C-Nb alloy - Electrolytic thinning
Fe-Ni-Al-C-Si alloy - Electrolytic thinning
Fe-Ni-Al-C-Ti alloy - Electrolytic thinning
Fe-Ni-Al-C-V alloy - Electrolytic thinning
Fe-Ni-Al-Ti alloy - Fe-3.4Ni-1.9/2.3Al-0.7/2.1Ti
Fe-Ni-As system - Chemical etching - General microstructure
Fe-Ni-B alloy - Fe40-Ni40-B20 - Electrolytic polishing
Fe-Ni-B alloy - Fe50-Ni30-B20 - Electrolytic thinning
Fe-Ni-C alloy - 10-40% Ni, 0.1% C
Fe-Ni-C alloy - 21-33 wt.% Ni, < 0.6 wt.% C
Fe-Ni-C alloy - Alloy with 31% Ni and 0.3% C
Fe-Ni-C alloy - Alloys with 20-30% Ni and < 0.6% C
Fe-Ni-C alloy - Electrolytic polishing
Fe-Ni-C alloy - Fe-24Ni-0.5C
Fe-Ni-C alloy - Fe-31Ni-0.3C
Fe-Ni-C system - Fe-27Ni-0.03C
Fe-Ni-Co alloy - Fe, 29 wt.% Ni, 18 wt.% Co
Fe-Ni-Co alloy - Ni, 68% Fe, up to 15% Co
Fe-Ni-Co-Ta alloy - Fe, 18/29 Ni, 8/20 Co, 2/3 Ta
Fe-Ni-Co-W system - Fe-17/18.5 Ni-8/9 Co-5/10 W
Fe-Ni-Cr alloy - Fe-15Ni-15Cr-single crystal - Electrolytic polishing
Fe-Ni-Cr alloy - Very low C stainless steel
Fe-Ni-Cr heat resistant casting alloy - Stains austenite, then sigma phase, then carbide particles
Fe-Ni-Cr heat resistant casting alloys - Blackens sigma phase without oylining other phases
Fe-Ni-Cr heat resistant casting alloys - Electrolytic etching
Fe-Ni-Cr heat resistant casting alloys - Electrolytic etching
Fe-Ni-Cr heat resistant casting alloys - Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys - Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys - Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys - Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys - Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys - Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys - Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys - Intermediate etch between Vilella's and ammonium hydroxide (electrolytic)
Fe-Ni-Cr heat resistant casting alloys - Outlines carbide and sigma
Fe-Ni-Cr heat resistant casting alloys - Used after Glyceregia; outlines carbides particles, stains sigma phase
Fe-Ni-Cr-Al-Y alloy - Austenite alloy, FeNi45Cr20Al5Y0.02
Fe-Ni-Cr-Mo-Nb-Ti-Al alloy - Inconel 718, Fe-22Ni-19Cr-5Mo-5Nb-1Ti-0.5Al
Fe-Ni-Cr-Nb-Ti-Al alloy - Fe-40% Ni-15.8% Cr-2.5% Nb-1.6% Ti-0.20% Al+C, Mn, B, superalloy 706
Fe-Ni-Cr-Ti-Al alloy - Fe-35Ni-15Cr-3(Ti+Al), Fe-35Ni-20Cr-3(Ti+Al)
Fe-Ni-Mn alloy - Fe-19-24% Ni-3-5% Mn - General microstructure
Fe-Ni-Mn alloy - Fe-6-8% Ni- 2-4% Mn - General microstructure
Fe-Ni-O alloys - Chemical etching - General microstructure
Fe-Ni-P alloys - Chemical and electrolytic thinning
Fe-Ni-Pt alloy - Etch for Pt rich, high Fe alloys
Fe-Ni-Ta alloy - Fe-32 at.% Ni-3 at.% Ta - General microstructure
Fe-Ni-Ti alloy - Fe-30Ni-6Ti
Fe-Ni-Ti alloy - Fe-33Ni-3Ti
Fe-Ni-Ti alloys - Chemical polishing and eletro thinning
Fe-Ni-Ti-Al alloy - Fe-34Ni-3Ti-0.5Al
Fe-Pd alloy - For Pd rich alloys
Fe-Pt alloy - Alloys with 20.5% Pt
Fe-Pt alloys (approx. Fe3Pt) - Electrolytic polishing
Fe-Pt system - Chemical etching - General microstructure
Fe-Rh alloy - Alloy with approx. 50 at.% Rh
Fe-Sb alloys - For alloys with < 5% Sb
Fe-Si (3%) single crystal specimens - Electrolytic polishing
Fe-Si (4%) polycrystalline rods - Chemical etching - General microstructure
Fe-Si alloy - Al, Al-Si alloys, Fe-Si alloys
Fe-Si alloy - Electrolytic thinning
Fe-Si alloy - Electrolytic thinning
Fe-Si alloy - Electrolytic thinning
Fe-Si alloy - Electrolytic thinning by Bollman technique
Fe-Si alloy - Particullary good for Al-Si alloys
Fe-Si alloy - Universal electrolyte
Fe-Si alloy sheet steel - Chemical etching
Fe-Si alloys (1.75% Si) - Electrolytic polishing and etching
Fe-Si alloys (3% Si) - Dislocation etch pit etch
Fe-Si alloys (3% Si) - Electrolytic polishing
Fe-Si alloys (approx. FeSi2) - Chemical etching - General microstructure
Fe-Si alloys - Dislocation etching
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si single crystals - Chemical and elctrolytic etching
Fe-Si specimens - Electrolytic etching
Fe-Sn alloy (1.3% Sn) - Electrolytic thinning
Fe-Sn alloy (Alpha-Fe alloys) - Chemical etching - General microstructure
Fe-Sn alloy (Alpha-Fe alloys) - Chemical polishing
Fe-Ta alloy - Alloys with low Ta
Fe-Ta alloy - Alloys with low Ta
Fe-Ti alloy (FeTi) - Chemical etching - General microstructure
Fe-Ti alloy - Electrolytic thinning
Fe-Ti system (< 1.4% Ti) - Chemical polishing
Fe-Ti-Al alloy - Fe-0/24 at.% Al -
Fe-TiC sintered carbides - Chemical etching
Fe-V alloys (0.1 wt.% V) - Electrolytic polishing
Fe-V alloys (0.49% V) - Electrolytic thinning
Fe-V alloys - Chemical etching - General microstructure
Fe-W alloys (0.31% W) - Electrolytic thinning
Fe-W alloys - Electrolytic polishing
Fe-W-C alloy - Fe-0.21/0.75C-6.3/23W
Fe-W-Cr-V alloy - Fe-0.75C-18W-1.1V-4Cr
Fe-W-Mo-Cr-V-C alloy - M2 alloy, Fe-3.5W-3Mo-3.5Cr-1V-0.5C
Fe-W-Mo-Cr-V-Cr alloy - Etchants for carbides
Fe-Zn system - Actually used for distunguishing layer in galvanised plate
Fe/Ni specimen - Chemical polishing
Fe/Ni specimen - Electrolytic polishing
Fe2Al3Si3O12 as natural single crystal almandite - Chemical cleaning
Fe2Mo3O8 single crystals - Chemical etching
Fe2O3 natural single crystals - Chemical etching - General microstructure
Fe2O3 specimens and powder - Molten flux, removal
Fe2O3 thin film - Chemical etching - General microstructure
Fe3C in cast iron - Dislocation etching
Fe3C-Fe specimens - Chemical etching - General microstructure
Fe3Ge2 as a crystalline deposit - Chemical etching - General microstructure
Fe3Ge3 thin films - Chemical etching - General microstructure
Fe3O4 artificial single crystal magnetite - Cutting
Fe3O4 as fine natural single crystal - Chemical cleaning
Fe3O4 grown as a single crystal ingot - Chemical cleaning
Fe3O4 single crystal - Chemical etching - General microstructure
Fe3O4 single crystals - Chemical etching
Fe3O4 specimen - Chemical polishing
Fe3O4 specimens - Chemical etching - General microstructure
FeAl intermetalics - Chemical etching - General microstructure
FeAl single crystal specimens - Chemical etching - General microstructure
FeC single crystal alloys - Chemical thinning
FeGe2 (100) and (110) wafers - Chemical etching - General microstructure
FeO x nH2O the natural mineral limonite - Chemical cleaning
FeO(x) as thin film - Chemical cleaning
FeO(x) thin films - Chemical etching
FeP2 as precipitate - Chemical etching
FePd (100) and crystalline thin films - Gas corrosion
FeS2 as artificial and natural single crystals - Pressure
FeS2 single crystal ingot - Chemical polishing
FeSi (7.7%) single crystal (100) - Thermal de-stress
FeSi specimens - Gas etching
FeWSi thin films deposited on silicon, (100) wafers - Chemical etching - General microstructure
Ferric cyanide etchant - Ge hemispheres - Chemical etching
Ferrite specimens - Thermal etching
Ferritic and austenitic stainless steels - Chemical etching
Ferritic and martensitic stainless steels - Color etching - General microstructure
Ferritic chromium steels-Ferritic chromium steels, min. 12% Cr
Ferritic stainless steel with 17% Cr - Electrolytic polishing
Ferritic stainless steels - Chemical etching
Ferritic stainless steels - Chemical etching
Ferromanganese, manganese silicate and Mn-Si-Cr alloys - Chemical etching
Fine-grained, heavily deformed steels - Chemical etching
Finlay's A etchant (Remington's A etchant) - For Ti and Ti/Zr
Finlays B etchant - For Ti
Fisher-Marcinkowski's electropolish solution
Flat's etchant - Ni-Ti alloys
Flick's etchant - Pure Al and Al alloys
Flint glass - Etching for revealing recrystallization effects
Fluor regia - Silicon - Chemical etching
Fluor regia etchant - Cr and Cr alloy - Chemical etching
Fluor regia etchant - Nb and alloys - Chemical etching
Fluor regia, modified - Beryllium - Chemical etching
Fluorapatite-Cu5FP3O12 - Chemical polishing
Fluorine specimen
For Co and Co alloys - Chemical etching
For most Al materials and Al alloys - Chemical etching - General microstructure
For most Al type alloys, Al-Be alloys - Chemical etching - General microstructure
For most Al types an alloys, especially Cu-containing alloys - Chemical etching - General microstructure
For most Ti materials and Ti alloys, Ti-Mn and Ti-V-Cr-Al alloys - Chemical etching - General microstructure
For most alloys of RE metals, CeMM alloys - Chemical etching - General microstructure
Franchini's color etchant - Al-Si-Cu-Ni cast alloys - Chemical etching
Frank's etchant - Fe + 16-25 Cr + 3-6 Ni + 5-1C
Frey's etchant - Flow lines in low carbon N2 steels, convertor steels - Chemical etching - General microstructure
Fry's etchant (2)
Fry's etchant - Fe pure metal samples - Chemical etching
Fry's etchant - Fe-Si specimens and other iron alloys - Chemical etching
Fry's etchant - Iron - Dislocation etching
Fry's etchant - Iron and steels - Chemical etching
Fry's etchant - Iron, steels, cast irons - Normalized steels
Fry's etchant - Ni-Ge alloys - Chemical etching - General microstructure
Fry's etchant - Ni-Pd-Ga alloys - Chemical etching - General microstructure
Fry's etchant - Ni-Pt-Ga alloys - Chemical etching
Fry's etchant - Nimonic alloys - Nimonic alloys PE7, PE11, and PE16, Nimonic Pk 31
Fry's etchant - Stainless steels - Chemical etching
Fry's etchant - Wrought stainless steels - General structure
Fry's etchant, modified - Fe, mild steel - Dislocation etching
Fuss's etchant - Wrought aluminium alloy - Chemical etching
G etchant - For Fe/Ni
G etchant - Steels for high temperatures
GE Turbo-chrome etchant - Martensitic stainless steel and high-alloy steels - Chemical etching
GE Turbo-chrome etchant - P91 (X10CrMoV91) steel - Chemical etching
GE Turbo-chrome etchant - Stainless steels - Chemical etching
GTD-111 alloy etching - General microstructure
GX6CrNi13-4 steel - Electrolytic-potentiostatic isolation of residues
GX6CrNi13-4 steel - Sample preparation
Ga (100) wafers - Chemical cleaning
Ga arsenide - Chemical polishing
Ga as a constituent in single crystal GaAs p-type wafers - Chemical etching - General microstructure
Ga as solid material - Chemical cleaning
Ga as solid material - Chemical cleaning
Ga as solid material - Chemical etching - General microstructure
Ga phosphide - Chemical polishing
Ga-As-P alloy (GaAsP) - Chemical polishing and etching
Ga-As-P specimens - (111) faces etched as cleaved - Dislocation etch in Abraham's AB etch
Ga-As-P specimens - GaAs(1-y)P(x), 0.6 >x<1
Ga-As-P system - Dislocation etching for (111)A -(111)B faces
Ga-As-P-Sb specimens - GaAs(x)Sb(y)P(1-x-y)
Ga-Au alloys - Chemical etching - General microstructure
Ga-Gd garnet - Gd3Ge4O12 - Dislocation etch
Ga-In-As phosphide - Chemical etching
Ga-In-As phosphide - Chemical polishing
Ga-In-As phosphide - Chemical polishing
Ga-In-As phosphide - Chemical polishing
Ga-In-As phosphide - Etching for pit etch
Ga-In-As phosphide - In a study of etching characteristics of InGaAsP/InP wafers
Ga-In-As phosphide - Selective etching for GaInAsP against InP
Ga-In-Sb specimens - In(x)Ga(1-x)Sb - General microstructure
Ga-Nd garnet - Nd3Ga5O12
Ga2O3 and Ga(OH)3 on GaAs, (100), p-type wafers - Chemical etching
Ga2O3 as a native oxide on gallium arsenide wafers - Chemical cleaning
Ga2O3 as native oxide on GaAs (100) wafers - Physical etching
Ga2O3 as native oxide on GaAs - Physical etching
Ga2O3 doped with iron and grown as single crystal ferrites - Chemical etching
Ga2O3 thin film growth of GaAs, (100), p-type wafers - Chemical oxidizing
GaAs (100) Si-doped wafers - Chemical cleaning
GaAs (100) Si-doped wafers - Chemical etching
GaAs (100) Te-doped wafer - Chemical cleaning
GaAs (100) Te-doped wafers - Chemical etching - General microstructure
GaAs (100) Zn-doped wafer - Chemical cleaning
GaAs (100) Zn-doped, p-type wafers - Chemical etching - General microstructure
GaAs (100) and (111) wafers - Chemical cleaning
GaAs (100) and (111) wafers - Chemical cleaning
GaAs (100) and (111) wafers - Chemical etching - General microstructure
GaAs (100) and (111) wafers - Acid oxide removal
GaAs (100) and (111) wafers doped with Se, Te, Zn, and Pd - Dislocation etching
GaAs (100) and GaAs (111) wafers - Electrolyticlytic oxidation
GaAs (100) and InSb (100) wafers - Etch cleaning
GaAs (100) ingot and wafers - Dislocation etching
GaAs (100) n+ wafers - Chemical etching - General microstructure
GaAs (100) n-type wafers - Chemical cleaning
GaAs (100) n-type wafers - Chemical etching - /polishing/cleaning
GaAs (100) n-type wafers - Chemical etching - General microstructure
GaAs (100) n-type wafers - Chemical etching - General microstructure
GaAs (100) n-type wafers - Chemical etching - General microstructure
GaAs (100) n-type wafers - Chemical polishing
GaAs (100) n-type, 0.001-0.04 Ohm cm resistivity wafers - Chemical thinning
GaAs (100) n/n +, Si-doped wafers - Chemical cleaning
GaAs (100) p-type wafers - Chemical cleaning
GaAs (100) p-type wafers - Chemical etching - General microstructure
GaAs (100) substrates - Chemical etching - General microstructure
GaAs (100) undoped wafers - GaAs (100) undoped wafers
GaAs (100) wafer Zn-doped - Chemical etching - General microstructure
GaAs (100) wafer substrates - Chemical thinning
GaAs (100) wafers - Chemical cleaning
GaAs (100) wafers - Chemical cleaning
GaAs (100) wafers - Chemical cleaning
GaAs (100) wafers - Chemical cleaning
GaAs (100) wafers - Chemical cleaning
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing/cleaning
GaAs (100) wafers - Chemical thinning
GaAs (100) wafers - Dislocation etching
GaAs (100) wafers - Dislocation etching
GaAs (100) wafers - Electrolyticlytic, oxidation
GaAs (100) wafers - Cemical thinning
GaAs (100) wafers - Chemical etching - General microstructure
GaAs (100) wafers - Ionized gas
GaAs (100) wafers - Lift-off
GaAs (100) wafers - Metal, replication
GaAs (100) wafers - Physical thinning
GaAs (100) wafers Be diffused - Chemical etching - General microstructure
GaAs (100) wafers Cut 2?-off plane toward (110) - Chemical cleaning
GaAs (100) wafers and other low index planes - Chemical thinning
GaAs (100) wafers and other orientations - Chemical etching - General microstructure
GaAs (100) wafers and other orientations - Chemical etching - General microstructure
GaAs (100) wafers and other orientations - Dislocation etching
GaAs (100) wafers as substrates - Chemical etching - General microstructure
GaAs (100) wafers cut within 2-3? of plane - Chemical polishing
GaAs (100) wafers cut within ?/2? of plane, Te-doped - Chemical etching - General microstructure
GaAs (100) wafers doped with germanium - Chemical etching - General microstructure
GaAs (100) wafers fabricated as Schottky barrier diodes - Chemical thinning
GaAs (100) wafers fabricated as diodes - Electrolytic polishing
GaAs (100) wafers ion implanted with Si, Zn, and Be - Chemical thinning
GaAs (100) wafers ion implanted with zinc - Chemical etching - General microstructure
GaAs (100) wafers used as substrates for Gunn diode - Chemical etching - General microstructure
GaAs (100) wafers used as substrates for LPE growth of GaAlAs - Chemical etching
GaAs (100) wafers used as substrates for MBE deposition of AlGaAs - Chemical cleaning
GaAs (100) wafers used as substrates for OMVPE growth of GaInAs and GaInP layers - Dislocation etching
GaAs (100) wafers used as substrates for deposition of AlN - Chemical cleaning
GaAs (100) wafers used for epitaxy growth of InGaAs - Chemical cleaning
GaAs (100) wafers used for zinc diffusion at 85O?C - Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion - Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion at 850?C - Chemical polishing
GaAs (100) wafers used to fabricate Schottky barrier diodes - Chemical polishing
GaAs (100) wafers with epitaxy grown heterostructure - Chemical etching - General microstructure
GaAs (100) wafers zinc diffused - Chemical etching
GaAs (100) wafers zinc diffused - Chemical etching - General microstructure
GaAs (100) wafers, Zn diffused - Chemical etching - General microstructure
GaAs (100), (111) and (110) wafers - Chemical etching - General microstructure
GaAs (100), (111) and (110) wafers - Chemical etching - General microstructure
GaAs (100), (111) and (110) wafers - Chemical etching - General microstructure
GaAs (100), (111), (110), (211) wafers - Chemical etching - General microstructure
GaAs (100), Te-doped, n-type wafers - Chemical cleaning
GaAs (100), and InP, (100) wafers - Chemical thinning
GaAs (100), n-type wafers - Chemical cleaning
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), n-type wafers - Chemical etching - General microstructure
GaAs (100), wafers, Si or Be doped wafers - Chemical cleaning
GaAs (110) wafers were cleaved under UHV - Vacuum cleaning
GaAs (110), (111), (100) wafers - Chemical polishing
GaAs (110), (111), and (211) wafers - Chemical etching - General microstructure
GaAs (111) and (100) wafers - Chemical etching
GaAs (111) and (100) wafers - Chemical etching - General microstructure
GaAs (111) and (100) wafers - Chemical polishing
GaAs (111) and (100) wafers - Chemical polishing
GaAs (111) as single crystal wafers and spheres - Chemical etching
GaAs (111) n-type and undoped material - Chemical polishing
GaAs (111) wafers - Chemical cleaning
GaAs (111) wafers - Chemical etching
GaAs (111) wafers - Chemical etching
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical etching - General microstructure
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers Cr, Te, and Zn doped - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical etching - General microstructure
GaAs (111) wafers and spheres - Chemical polishing
GaAs (111) wafers fabricated as Esaki diodes - Chemical polishing
GaAs (111) wafers used as substrates for epitaxy growth of Ge and ZnSe - Chemical etching
GaAs (111) wafers used in a polarity etching study - Chemical etching
GaAs (111) wafers used in a polarity study - Chemical etching - General microstructure
GaAs (111) wafers used in a polarity study - Chemical etching - General microstructure
GaAs (111) wafers used in a polarity study - Chemical etching - General microstructure
GaAs (111) wafers used in a polarity study of III-V compound semiconductors - Chemical etching - General microstructure
GaAs (111) wafers used in an etch development study - Chemical etching - General microstructure
GaAs (111) wafers used in an etch development study - Chemical etching - General microstructure
GaAs (111) wafers used in an etch development study - Chemical etching - General microstructure
GaAs (111) wafers with (111) Ga surface polished - Chemical polishing
GaAs (111), (100) and (110) wafers - Dislocation etching
GaAs (111), (100), and (110) wafers - Chemical etching - General microstructure
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers - Chemical etching - General microstructure
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers - Chemical polishing
GaAs (111)A and (TTT)B wafers - Chemical polishing
GaAs (111)A wafer - Chemical etching - General microstructure
GaAs (111)A wafer surfaces - Chemical etching - General microstructure
GaAs (111)As, (100) and (110) oriented wafers - Chemical cleaning
GaAs (111)B and (100) both n-type and undoped wafers - Chemical etching - General microstructure
GaAs (1OO), n-type wafers - Chemical etching - General microstructure
GaAs - Dislocation etching
GaAs - Etchant for revealing twin lamellae by staining (211) and etching the (211)
GaAs - Etchant for revealing twin planes
GaAs - Etchant for revealing twin planes
GaAs and GaP (100) and (111)B high n-type wafers - Chemical polishing
GaAs and GaP, etches A and B planes in GaAs - Chemical etching - General microstructure
GaAs and Si (100) wafers - Chemical etching - General microstructure
GaAs as thin film epitaxy grown on germanium substrate - Chemical etching
GaAs grown as a (111) ingot - Chemical etching - General microstructure
GaAs single crystal sphere - Chemical etching - General microstructure
GaAs single crystal spheres - Chemical etching
GaAs single crystal spheres - Chemical etching - General microstructure
GaAs specimens cut as cylinders and hemispheres - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical etching - General microstructure
GaAs wafers - Chemical polishing
GaAs wafers - Chemical polishing
GaAs wafers grown by orizontal Bridgman (HB) technique - Chemical etching
GaAs wafers of various orientations - Chemical polishing
GaAs, (100) wafers - Chemical cleaning
GaAsB (111) n-type wafers and (100) undoped wafers - Chemical etching
GaAsBe (100) p-type wafers - Metal passivation
GaAsBe (110) p-type wafers - Chemical cleaning
GaAsCR (100)(SI) wafers - Chemical polishing/cleaning
GaAsCr (100) (SI) or n+ diffused wafers - Chemical etching - General microstructure
GaAsCr (100) (SI) wafers - Chemical cleaning
GaAsCr (100) (SI) wafers - Chemical cleaning
GaAsCr (100) (SI) wafers - Chemical cleaning
GaAsCr (100) (SI) wafers - Chemical cleaning
GaAsCr (100) (SI) wafers - Chemical cleaning/etching
GaAsCr (100) (SI) wafers - Chemical etching
GaAsCr (100) (SI) wafers - Chemical etching - /polishing
GaAsCr (100) (SI) wafers - Chemical etching - General microstructure
GaAsCr (100) (SI) wafers - Chemical etching - General microstructure
GaAsCr (100) (SI) wafers - Chemical etching - General microstructure
GaAsCr (100) (SI) wafers - Chemical polishing
GaAsCr (100) (SI) wafers - Chemical polishing
GaAsCr (100) (SI) wafers - Chemical polishing
GaAsCr (100) (SI) wafers - Chemical polishing/etching
GaAsCr (100) (SI) wafers - Etch cleaning
GaAsCr (100) (SI) wafers - Oxidation/cleaning
GaAsCr (100) (SI) wafers used as substrates for GaAs growth by MBE - Chemical cleaning
GaAsCr (100) (SI) wafers used as substrates-Oxide removal
GaAsCr (100) (SI) wafers used in a study of surface cleaning - Chemical polishing/cleaning
GaAsCr (100) wafers - Chemical cleaning
GaAsCr (100) wafers within 1/2 degrees of plane - Chemical etching - General microstructure
GaAsCr (100), (111) (SI) and n-type Si doped wafers - Molten flux
GaAsCr, (100) (SI) and InPFe (100) (SI) wafers - Molten flux
GaAsCr, (100) (SI) wafers - Halogen, polish
GaAsTe (100) n-type wafer substrates - Chemical cleaning
GaAs; Zn, (100) wafers cut 2-3?-off plane toward (110) - Chemical polishing
GaAsP wafers as highly p-type doped with Mn - Dislocation etching
GaFeO3 single crystal ingot - Acid, removal
GaN (0001) single crystal thin films - Chemical etching
GaN (0001) single crystal thin films - Electrolytic etching
GaN thin films - Chemical etching
GaN thin films grown by MBE on (0001), and (01.12) single crystals sapphire substrates to 1000 A thickness - Thermal cleaning
GaOxNy surface contamination of gallium arsenide wafers - Chemical etching
GaP (100) and (111) wafers - Chemical polishing
GaP (100) and (111) wafers - Gas polishing
GaP (100) and (111)B, p-type, 0.2 Ohm cm resistivity wafers - Chemical polishing
GaP (100) n-type wafers - Chemical polishing
GaP (100) wafers - Chemical etching
GaP (100), (111)A and (111)B wafers - Chemical polishing
GaP (110) undoped wafers - Chemical polishing
GaP (111) and (100) wafers - Chemical polishing
GaP (111) and GaAs (111) wafers - Chemical polishing
GaP (111) and GaAs (111) wafers - Chemical polishing
GaP (111) and GaAs (111)A wafers - Chemical polishing
GaP (111) wafer - Chemical polishing
GaP (111) wafers - Chemical etching
GaP (111) wafers - Chemical etching
GaP (111) wafers - Chemical etching
GaP (111) wafers - Chemical etching
GaP (111) wafers - Metal decoration
GaP (111) wafers zinc diffused - Chemical etching
GaP (111), (100), (110) wafers - Chemical polishing
GaP (111)B wafers - Chemical etching
GaP (doped with S) - Dislocation etching
GaP - Dislocation etching
GaP material used for growth of AlGaAsP single crystal ingots - Chemical cleaning
GaP polycrystalline material - Chemical cleaning
GaPO4 single crystals - Chemical ecthing
GaS (100), n-type wafers - Chemical polishing
GaS - Dislocation etching
GaSb (100) both undoped and Te-doped wafers - Acid passivating
GaSb (100) both undoped and Te-doped wafers - Acid passivation
GaSb (100) undoped and Te-doped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) wafers - Chemical etching - General microstructure
GaSb (100) wafers - Chemical polishing
GaSb (100) wafers - Chemical, oxide removal
GaSb (100), p-type wafers - Chemical etching - General microstructure
GaSb (111) and (100) wafers - Chemical etching - General microstructure
GaSb (111) and (100) wafers - Chemical etching - General microstructure
GaSb (111) and (100) wafers - Chemical etching - General microstructure
GaSb (111) and (100) wafers - Chemical etching - General microstructure
GaSb (111) and (100) wafers - Chemical etching - General microstructure
GaSb (111) and (100) wafers - Chemical polishing
GaSb (111) wafers - Chemical etching - General microstructure
GaSb (111) wafers - Chemical etching - General microstructure
GaSb (111) wafers - Chemical etching - General microstructure
GaSb (111) wafers - Chemical etching - General microstructure
GaSb (111) wafers - Chemical etching - General microstructure
GaSb (111) wafers - Chemical etching - General microstructure
GaSb (211) wafer - Chemical etching - General microstructure
GaSe (0001) wafers - Mechanical, dislocation
GaSe - Dislocation etching
GaTe specimens - Thermal etching for etch pits
Gadolinium - Chemical etching - General microstructure
Gadolinium - Chemical polishing and etching
Gadolinium - Electrolytic polishing
Gadolinium - Pure Gd, Rare Earths - Co alloys - Grain boundary etch
Gadolinium molybdate (Beta-Gd2(MoO4)3) - Chemical etching - General microstructure
Gadolinium molybdate (Gd-Mo-O) - Etch pits etching
Gadolinium molybdate (Gd2(MoO4)3) - For revealing the antiphase boundaries
Gadolinium telluride (GdTe) - Chemical etching - General microstructure
Gallium antimonide (GaSb) - Chemical etching - General microstructure
Gallium antimonide (GaSb) - Chemical etching - General microstructure
Gallium antimonide (GaSb) - Chemical etching - General microstructure
Gallium antimonide (GaSb) - Growth striations are revealed by this etchant
Gallium arsenide (GaAs polycrystalline) - Chemical etching
Gallium arsenide (GaAs) - Germanium junction - Chemical etching
Gallium arsenide (GaAs) - A study of the etching characteristics
Gallium arsenide (GaAs) - Chemical and electrolytic polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical thinning
Gallium arsenide (GaAs) - Etch for selective removal
Gallium arsenide (GaAs) - Etch pits on (111) face
Gallium arsenide (GaAs) - Etching for etch pitch
Gallium arsenide (GaAs) - Etching for etch pitch
Gallium arsenide (GaAs) - For (001) face
Gallium arsenide (GaAs) - For (001) face - Anodic etch for dislocations
Gallium arsenide (GaAs) - For differentiation from InAs stain in sodium hypochloridesoln
Gallium arsenide (GaAs) - For etch pits etching
Gallium arsenide (GaAs) - For pitch etching
Gallium arsenide (GaAs) - Polishing and chemical etching
Gallium arsenide (GaAs) - Removing the surface damage
Gallium arsenide (GaAs) - Selective etch for dislocations on (111) plane
Gallium arsenide (GaAs) - The p-n junction
Gallium arsenide (GaAs) - To distingish p-n junction
Gallium arsenide (GaAs) - To distinguish between (111) Ga - (111)
Gallium arsenide (GaAs) - Chemical etching
Gallium arsenide (GaAs) - Chemical etching
Gallium arsenide (GaAs) - Chemical etching - General microstructure
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Electrolytic etching
Gallium nitride (GaN) - Electrolytic etching
Gallium phosphide (GaP) - Chemical etching - Etching for etch pits
Gallium phosphide (GaP) - Chemical etching - General microstructure
Gallium phosphide (GaP) - Chemical etching - General microstructure
Gallium phosphide (GaP) - Chemical etching - General microstructure
Gallium phosphide (GaP) - Chemical etching - General microstructure
Gallium phosphide (GaP) - Chemical etching - General microstructure
Gallium phosphide (GaP) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing and etching
Gallium phosphide (GaP) - Chemical polishing and etching
Gallium phosphide (GaP) - Chemical polishing, chemical etching
Gallium phosphide (GaP) - Chemical thinning
Gallium phosphide (GaP) - Chemical thinning - Aqua regia
Gallium phosphide (GaP) - Etching (chemical polishing)
Gallium phosphide (GaP) single crystals - Chemical etching - General microstructure
Gallium phosphide (GaP)-Etch pits on (111)A, (111)B(100)
Gallium phosphide (GaP)-S doped n-type, Zn doped p-type
Gallium specimens - Chemical etching - General microstructure
Gallium specimens - Electrolytic polishing
Gallium sulphide (GaS) - Dislocation etching
Gallium-selenium system (Ga-Se) - Chemical etching - General microstructure
Gallium-selenium system (Ga-Se) - Etch pits etching
Gallium-selenium system (Ga-Se) - Etch pits etching
Galvanized steel or Cd coatings - Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - Chemical etching - General microstructure
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - Chemical etching - General microstructure
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - Chemical etching - General microstructure
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn) - For tight and extra tight galvanized coatings
Galvannel and hot-diped galvanized coatings on steels
Gamma phases in U-Mo alloys - Electrolytic etching
Gamma-TiAl and alpha 2-Ti3Al - Chemical etching
Gamma-prime-age hardening, Ni-base alloys, grain-boundaries etch - Chemical etching
Garnets as natural single crystals - Chemical etching
Gd single crystal specimens - Thermal etching
Gd-Ag alloys - Chemical etching - General microstructure
Gd-Al alloy - GdAl, Gd3Al, Gd2Al - General microstructure
Gd-Bi system - Chemical etching - General microstructure
Gd-Cd alloys - Chemical etching - General microstructure
Gd-Ce alloys - Chemical polishing
Gd-Fe alloy - Laves phase GdFe2
Gd-Ga garnet - Gd3Ga5O12
Gd-Ga garnet - Gd3Ga5O12
Gd-Ga garnets - Chemical polishing
Gd-Yb alloys - Electrolytic polishing
Gd3Ga5O12 (0001) wafers 3" in diameter - Ketone cleaning
Gd3Ga5O12 (110) wafers - Abrasive polishing
Gd3Ga5O12 (111) cut wafers - Chemical cleaning
Gd3Ga5O12 (111) wafers - Abrasive polishing
Gd3Ga5O12 garnet - Chemical etching
Gd3Ga5O12 garnets - Chemical etching
Gd3Se1.8Ga3.2O12 (0001) wafers - Chemical cleaning
GdN12 specimens - Chemical etching - General microstructure
GdTbFe thin films - Chemical etching - General microstructure
Ge (100) and (110) wafers - Chemical etching
Ge (100) and (111) wafers - Metal etching
Ge (100) specimens - Electrolytic machinning
Ge (100) very thin films grown by PECVD on NaCl, Ge wafers - Thermal cleaning
Ge (100) wafers - Vacuum cleaning
Ge (100) wafers cut within 1? of plane - Physical cleaning
Ge (111) 5-10 Ohm cm resistivity n-type wafers - Chemical etching
Ge (111) and (100) wafers - Chemical etching
Ge (111) and (100) wafers - Solution used as a preferential etch
Ge (111) and (100) wafers used as substrates - Chemical polishing
Ge (111) dendritic ribbon crystals - Dislocation etching
Ge (111) grown ingot with grown-in p-n junction - Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction - Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction - Electrolytic etching
Ge (111) ingots with grown-in p-n junction - Electrolytic etching
Ge (111) n-type wafers - Chemical etching
Ge (111) n-type wafers - Electrolytic etching
Ge (111) n-type, 0.004-40 Ohm cm resistivity wafers - Electrolytic polishing
Ge (111) rectangular bars with grown p-n junctions - Chemical etching
Ge (111) wafer with p-n junctions - Electrolytic etching
Ge (111) wafers - Chemical cleaning
Ge (111) wafers - Chemical cleaning
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical etching
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic etching
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolytic polishing
Ge (111) wafers - Electrolyticlytic plating
Ge (111) wafers - Abrasive, damage
Ge (111) wafers - Acid, stress
Ge (111) wafers - Cleave
Ge (111) wafers - Junction testing
Ge (111) wafers - Metal, structure
Ge (111) wafers and cylinders - Metal diffusion
Ge (111) wafers and ingots - Chemical etching
Ge (111) wafers and other orientations - Chemical etching
Ge (111) wafers and other orientations - Chemical etching
Ge (111) wafers and other orientations - Chemical etching
Ge (111) wafers and other orientations - Electrolytic etching
Ge (111) wafers and other orientations - Gas oxidation
Ge (111) wafers angle lapped at 5?43' - Chemical etching
Ge (111) wafers fabricated as p-n junction diodes - Chemical etching
Ge (111) wafers fabricated with indium p-n junctions - Junction testing
Ge (111) wafers p-type - Chemical polishing
Ge (111) wafers used as substrates for Ge epitaxy growth - Chemical etching
Ge (111) wafers with epitaxy grown Ge layers - Gas ecthing
Ge (111) wafers with indium - Metal decoration
Ge (111) wafers with lithium diffused p-n junctions - Chemical etching
Ge (111) wafers, p-type, 4 Ohm cm resistivity - Chemical polishing
Ge (111), (100), (110) and (211) wafers - Chemical etching
Ge (111), (100), (110) and (211) wafers - Chemical etching
Ge (111), (100), (110) and (211) wafers - Chemical etching
Ge (111), (100), (110), and (211) wafers - Chemical etching
Ge (111), (100), (110), and (211) wafers - Chemical etching
Ge (111), (100), and (110) wafers - Chemical polishing
Ge (111), (110) and (100) wafers - Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres - Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres - Chemical etching
Ge (111), (110), and (211) wafers - Chemical etching
Ge (111), p- and n-type wafers - Electrolytic polishing
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Chemical etching
Ge and Ge alloys - Electrolytic etching
Ge and Ge alloys, GaAs, InAs, and AlAs, dislocations on the (111) planes, grain boundary etchant - Chemical etching
Ge and Ge alloys, grain-contrast etchant - Chemical etching
Ge and InP (100) and (111) wafers - Chemical thinning
Ge and Si discs
Ge and Si specimens - Halogen, laser
Ge and Si specimens - Metal, laser
Ge and Si wafers - Chemical polishing
Ge and Si wafers - Electrolytic oxidation
Ge and Si wafers - Ionized gas cleaning
Ge as alloy junction transistors - Molten flux polishing
Ge as alloyed p-n junctions devices - Chemical etching
Ge as cut cubes oriented (001)/(001)(110)/(110) - Chemical polishing
Ge as devices with evaporated metal contacts - Contact etching
Ge as polyerystalline spheres - Thermal forming
Ge as single crystal - Chemical polishing/etching
Ge as single crystal spheres - Chemical polishing
Ge as single crystal spheres - Molten flux etching
Ge as surface barrier diodes - Chemical etching
Ge both p- and n-type specimens - Electrolytic etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Chemical etching
Ge hemispheres - Ge hemispheres used in a preferential etching study
Ge ingot - Alkali, cutting
Ge n-p-n transistors - Electrolytic etching
Ge n-type wafers - Chemical polishing
Ge p-n diffused diode - Electrolytic etching
Ge p-n-p transistors - Acid passivation
Ge p-n-p transistors - Electrolytic passivation
Ge polycrystalline spheres - Gas cleaning
Ge samples - Irradiation
Ge single crystal - Acid, cover
Ge single crystal hemispheres - Chemical etching
Ge single crystal specimens
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal spheres - Chemical etching
Ge single crystal wire filaments - Electrolytic shaping
Ge single cyrstal spheres - Chemical etching
Ge specimens
Ge specimens - Acid oxidation
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical cleaning
Ge specimens - Chemical oxidation
Ge specimens - Chemical polishing
Ge specimens - Electrolytic etching
Ge specimens - Electrolytic etching
Ge specimens - Electrolyticlytic removing
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Electrolyticlytic shaping
Ge specimens - Metal, optics
Ge specimens - Power, plasticity
Ge sphere - Chemical etching
Ge spheres of single crystal germanium and silicon - Chemical polishing
Ge thin films - Dislocation etching
Ge thin films evaporated on GaAsCr (SI) substrates - Chemical cleaning
Ge thin films evaporated on GaAsCr (SI) substrates - Chemical etching
Ge thin films evaporated on Si, Al, Al2O3, GaAs, C substrate - Physical etching
Ge wafers - Chemical etching
Ge wafers - Chemical etching
Ge wafers - Chemical etching
Ge wafers - Chemical etching
Ge wafers - Chemical polishing
Ge wafers - Chemical polishing/etching
Ge wafers - Chemical thinning
Ge wafers - Metal, contamination
Ge wafers doped with copper - Chemical polishing
Ge wafers of different orientations - Chemical cleaning
Ge wafers of different orientations - Dislocation etching
Ge wafers studied for neutron irradiation effects
Ge wafers used as substrates - Chemical polishing
Ge(x)Se(1-x) thin films - Chemical etching - General microstructure
Ge(x)Se(x-1) thin films - Chemical etching - General microstructure
Ge-In alloys - Chemical etching
Ge-In alloys with Ag, Au, Bi, and Cu additions, grain boundary etchant - Chemical etchant
Ge-Si alloys - Chemical etching - General microstructure
Ge-Zn eutectic - Chemical etching - General microstructure
Ge2O3, DC sputtered thin films - Chemical etching - General microstructure
Ge3N4 and Ge3O(1-x)N(x) - Chemical etching - General microstructure
Ge3N4 and Ge3OxNy thin films - Chemical etching - General microstructure
Ge3N4 thin films-Gas densification
GeAs (111) wafer - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeAs (111) wafers - Chemical etching - General microstructure
GeO glass - Alcohol cleaning
GeO2 as glass blanks - Chemical cleaning
GeO2 thin films-Gas forming
GeS single crystal platelets - Chemical cleaning
GeTe single crystal specimens - Chemical etching - General microstructure
General-purpose solution - Electrolytic polishing - Dislocation etching
General-purpose solution - Electrolytic polishing - Dislocation etching
General-purpose solution - Electrolytic polishing - Dislocation etching
General-purpose solution - Electrolytic polishing - Dislocation etching
General-purpose solution - Electrolytic polishing - Dislocation etching
Germanium - Chemical etching
Germanium - Chemical etching
Germanium - Chemical etching
Germanium - Chemical etching
Germanium - Chemical etching - General microstructure
Germanium - Chemical etching - General microstructure
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing and etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Dislocation etching
Germanium - Electrolytic etching - General microstructure
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Electrolytic polishing
Germanium - Etch pits etching
Germanium - Etch pits on (111) face
Germanium - Etch pits on n-type (111) face
Germanium - Etchant for revealing twin planes
Germanium - Final chemical polishing
Germanium - For removal of surface damage
Germanium - Ge and its alloys - Grain boundaries
Germanium - Ge and its alloys - Grain contrast
Germanium - Ge and its alloys, GaAs, InAs, Al As - Grain boundaries, dislocations on (111) planes
Germanium - Ge, Te, Se, telurides, selenides and Zr silicide - General microstructure
Germanium - Ge-In alloys with Ag, Au, Bi, Cu additions - General microstructure
Germanium - Jet polishing, chemical polishing
Germanium - Jet thinning by chemical polishing
Germanium - Removal of work damage by ethching
Germanium - Se, Ge, and their alloys, InAs, InSb, GaSb, GaAs, AlSb, ZnTe, CdTe, InP
Germanium - Si, Ge, and their alloys
Germanium - Si, Ge, and their alloys
Germanium - Si, Ge, and their alloys, GaSb, InSb
Germanium telluride (GeTe) - Chemical etching - General microstructure
Gilman's etchant - Zinc - Chemical polishing and etching
Gilman's etchant I - For Cd
Gilman's etchant II - For Zn
Giometto and Capella's etchant - Martensitic chromium steels - Chemical etching
Glass - Microscope slides - Chemical etching - General microstructure
Glass as microscope slides - Chemical cleaning
Glass fiber reinforced epoxy resins - Chemical etching - General microstructure
Glass fiber reinforced epoxy resins - Chemical etching - General microstructure
Glass fiber reinforced polyester resins - Chemical etching - General microstructure
Glass reinforced polymeric materials - Chemical etching - General microstructure
Glass, soda-lime blanks - Chemical cleaning
Glass-borosilicate and soda-lime - Chemical cleaning
Glass-lead, soda-lime, borosilicate - Thermal processing
Glass-soda-lime - Chemical cleaning
Glass-soda-lime - Chemical lapping/etching
Glass-various types - Chemical cleaning
Glass-various types - Chemical cleaning
Glass-various types - Chemical cleaning
Glass-various types - Chemical cleaning
Glass-various types - Chemical etching - General microstructure
Glass-various types - Chemical etching - General microstructure
Glass-various types, as both sheet and rods - Chemical cleaning
Glyceregia (1) - Austenitic stainless steels
Glyceregia (2) - Fe + 15-30 Cr + 6-40 Ni + <5%
Glyceregia - Austenitic stainless steels - Chemical etching
Glyceregia - Cr and Cr alloys - Chemical etching
Glyceregia - Fe-Ni-Cr heat resistant casting alloys - Etchant for delineating general structure
Glyceregia - High alloy steels, austenitic Mn steels, stainless steels - Chemical etching
Glyceregia - Ni superalloys and Ni-Cr alloys - Chemical etching
Glyceregia - Steel and SST vacuum system parts - Chemical cleaning
Glyceregia - Wrought stainless steels - General structure
Glyceregia etchant - Stainless steel castings - General structure
Glycol - Mg and alloys - Chemical etching
Goeren's amyl picral - Iron and steels - Chemical etching
Gold - - Electrolytic polishing
Gold - - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Attack polishing
Gold - Attack polishing
Gold - Au alloys with less than 90% content of precious metals
Gold - Chemical etching - General microstructure
Gold - Chemical etching - General microstructure
Gold - Electrolytic lapping
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic polishing
Gold - Electrolytic thinning
Gold - Etching for etch pits
Gold - For Au alloys with high content of precious metals
Gold - Pt and Pt alloys, Au and Au alloys
Gold - Pure Au and Au-rich alloys, Pd and Pd alloys - General microstructure
Gold - Pure Au and Pd - General microstructure
Gold alloy - Electrolytic etching - General microstructure
Gold alloys - Chemical etching - General microstructure
Gold and gold alloys - Electrolytic polishing
Gold and high-noble metal alloys - Chemical etching
Gold and precious metals - Chemical etching - General microstructure
Gold etchant for silicon - Si wafers containing alloyed or diffused junctions - Chemical etching
Gold single crystal - Electrolytic polishing
Gold-Silver clad Palladium (Au-Ag, Pd) - Electric contact material
Gold-Silver-platinum (Au-Ag-Pt) - Electric contact material
Gorsuch's etchant - Pure iron
Graff and Sargent's etchant - 2XXX, 3XXX, 6XXX, 7XXX Al alloys - Chemical etching
Grain boundaries in heat treated Cr alloy steels - Chemical etching - General microstructure
Grain boundaries in martensitic microstructures - Chemical etching - General microstructure
Grain boundaries in zinc layer of electrogalvanized steel sheet
Graphite porous - Physical etching
Grard's No. 1 etchant - Cu alloys
Gray cast irons - Color etchant - General microstructure
Green's contrast etchant - Fe + 15-30 Cr + 6-40 Ni + <5%
Groesbeck etchant - Alloys with Cr and or Co
Groesbeck's etchant - High alloy steels and castings - Chemical etching - General microstructure
Groesbeck's etchant - High-alloy steels, cast steels
Groesbeck's etchant - Iron and steels - Chemical etching
Groesbeck's etchant - Stainless steels - Chemical etching
Groesbeck's etchant - Stainless steels - Color etchant - General microstructure
Gypsum single crystal - CaSo4 x 2H2O
H etchant - Ti alloys
H100 etchant - InSb (111) wafers - Chemical etching
H13 tool steel - Electrolytic polishing
HAFNIC 10 alloy - Ni-10Cr-5Al-5Co-8.3Hf-1.1Zr-0.7C
HSLA steels - Chemical etching
HT 12 steel - Fe-0.08C-1.5Mn-0.3Si-0.05Nb - Etch to differentiate old and recently formed ferrite by annealing
Hadfield Mn steel - Fe-1.13C-11 - General microstructure
Hafnia - Chemical etching - General microstructure
Hafnia-scandia system - Chemical etching - General microstructure
Hafnium - Attack polishing
Hafnium - Chemical etching
Hafnium - Chemical etching
Hafnium - Chemical polishing
Hafnium - Chemical polishing
Hafnium - Electrolytic polishing
Hafnium - Electrolytic polishing
Hafnium - Electrolytic polishing
Hafnium - Electrolytic polishing
Hafnium - Electrolytic polishing
Hafnium - Hf base alloys - General microstructure
Hafnium - Thinning for transmission electron microscopy (TEM)
Hafnium - Used to polish Hf wires
Hafnium - Zr and Hf base alloys, Zr-Nb alloys - General microstructure
Hafnium - pure and low alloy Hf and Zr for observation in polarized light
Hafnium carbide (HfC) - Chemical polishing
Hafnium diboride (HfB2) - Chemical etching - General microstructure
Hafnium diboride (HfB2) - Chemical etching - General microstructure
Hafnium single crystal - Chemical polishing
Hard Au-Soft Au electroplate - Chemical etching
Hard facing alloys - Phsyical etching
Hard metals - Chemical etching - General microstructure
Hardmetals - Electrolytic polishing
Hasson's etchant - For Mo - General microstructure
Hasson's etchant - Molybdenum, color etchant - Chemical etching - General microstructure
Hasson's etchant - Pure Mo
Hastelloy B, B2, B3, N, and W alloys - Chemical etching
Hastelloy W - Chemical etching
Hastelloy X - Chemical etching
Hastelloy X - Chemical etching - General microstructure
Hastelloy X - Electrolytic etching
Hastelloy X - Ni-22Cr-18.5Fe-9Mo-0.6W
Hastelloy X etching - Electrolytic etching
Hastelloy and Haynes alloys - Electrolytic etching
Hasteloy B - Ni-28Mo-1Fe-0.7Cr+C
Hatch's etchant - For Al and Al alloys
Hayness No. 21 alloy - Electrolytic etching - General microstructure
Hayness No. 21 alloy - Electrolytical etching - General microstructure
Hayness No. 25 alloy - Shows magnetic domain
Hayness No. 30, X40 alloys - Electrolytic etching - General microstructure
Hayness No. 36 alloy - Electrolytic etching - General microstructure
He-Au alloys - Chemical etching - General microstructure
Healy's junction etchant - Si (111) n-type wafers - Acid, junction etcthing
Heat resistant steels - Chemical etching - General microstructure
Heat resisting alloy - One of the best electrolyte for universal use
Heat resisting alloys - Electrolytic polishing
Heat treated 18/8 steels - Chemical etching - General microstructure
Heat treated Ti alloys - Chemical etching
Heat treated steels - Chemical etching
Heat-resisting steels and alloys - Color etching - Colors carbides and phases
Heat-resisting steels and alloys - Color etching - General microstructure
Heat-resisting steels and alloys - Color etching - General microstructure
Heat-resisting steels and alloys - Color etching - General microstructure
Heppenstall's etchant - Inconel 625 alloy - Chemical etching - General microstructure
Heyn's etchant - Low-carbon steels
Hf and Zr alloys, Zr-Nb alloys - Chemical polishing
Hf single crystal wafers and HfN thin films - Chemical cleaning
Hf specimens - Chemical etching - General microstructure
Hf thin films deposited on silicon wafers - Chemical etching - General microstructure
Hf, Zr, and alloys - Electrolytic etching
Hf, Zr, and alloys - Electrolytic etching
Hf, Zr, and alloys - Electrolytic etching
Hf-Al-Pa system - HfAl1.67Pd0.23 - General microstructure
Hf-C alloy - Etch for detecting free Hafnium
Hf-C alloys - Chemical etching
Hf-Cr alloy - Electrolytic etching
Hf-Cr alloys - Chemical etching - General microstructure
Hf-Cr and Hf-V alloys - Electrolytic etching
Hf-Er system - Chemical etching - General microstructure
Hf-Er-Sc system - Chemical etching - General microstructure
Hf-Ir system - Chemical and electrolytic etching
Hf-Nb alloys (Hf rich) - Electrolytic polishing and jet electrolytic thinning
Hf-Nb alloys - Chemical etching - General microstructure
Hf-Nb alloys - Chemical polishing and electrolytic polishing
Hf-Nb-B system - Chemical etching - General microstructure
Hf-Nb-Si system - Hf(85-x)Nb(x)Si(15); x< 45
Hf-O system - Chemical etching - General microstructure
Hf-O system - Hf-HfO2 section
Hf-Si system (Hf85Si15) - Electrolytic thinning
Hf-Ta alloys - Chemical polishing
Hf-V alloys - Electrolytic etching - General microstructure
Hf-V, Hf-Cr alloys - Attack polishing
Hf-V-Si system - Hf(85-x)V(x)Si(15); x < 37
Hf-W alloys - Chemical etching
Hf-W alloys - Chemical etching - General microstructure
Hf-Y-O system (HfO2-Y2O3) - Physical etching - General microstructure
Hf3Sn2 single crystal specimens - Chemical etching - General microstructure
HfB-TaB2 - Chemical etching - General microstructure
HfB2 and ZrB2 - Chemical etching
HfB2 with TaB2, ZrB2 - Chemical etching - General microstructure
HfB2-NbB2 - Chemical etching - General microstructure
HfB2-TaB2 - Chemical etching - General microstructure
HfC carbide - Chemical etching - General microstructure
HfN thin film - Chemical cleaning
HfO2 - Chemical etching
HfO2 - Thermal etching
Hg applied as a thin film - Chemical etching
Hg as a smeared surface contact - Ketone, freezing
Hg liquid frozen - Air etching
Hg liquid frozen by submersion in LN2 - Gas etching
Hg liquid frozen into solid form - Gas etching
Hg(1-x)Cd(x)Te (111) wafers - Chemical etching
Hg(1-x)Cd(x)Te single crystal - Chemical polishing
HgAg natural single crystal - Acid, removal
HgCdTe (111) thin films - Chemical etching
HgCdTe (111) wafers - Chemical polishing
HgCdTe (111) wafers and other orientations - Chemical polishing
HgCdTe single crystal ingots and wafers - Chemical etching
HgCdTe single crystal material - Chemical polishing/etching
HgCdTe single crystal wafers - Chemical polishing
HgCdTe specimens - Chemical polishing
HgCdTe thin films - Chemical etching
HgCdTe wafers - Chemical etching
HgI2 single crystals - Ketone, growth
HgO as a native oxide on mercury - Chemical etching
HgSe (111) wafers - Chemical etching
HgSe (111) wafers - Chemical etching
HgSe (111) wafers - Chemical polishing
HgSe - Dislocation etching
HgSe single crystal specimens - Chemical polishing
HgTe (111) wafers - Chemical etching
HgTe (111) wafers - Dislocation etching
HgTe - Dislocation etching
HgTe single crystal wafers - Chemical polishing
High Cr containing alloys, Cr silicide, galvanic Cr layers, Mo-Cr-Fe alloys, U-Nb alloys, V and V-base alloys, ferrovanadium - Electrolytic etching - General microstructure
High alloy content steels - Revelas different structural constituents in high alloy steels
High alloy steels - Electrolytic polishing
High carbon silicon steel - Fe-0.75/1C-2/2.4Si, 0.4/0.8Cr-0.5Mn
High carbon steel - Steel with 1.2% C - General microstructure
High carbon steels - Color etchant - General microstructure
High purity Al, most Al alloys, grain boundaries are preferentially attacked - Chemical etching - General microstructure
High purity alloy of Cu and 10% Zn - Chemical etching
High speed steels - Chemical etching
High speed steels - Chemical etching
High speed steels - Chemical etching - General microstructure
High speed steels - Chemical etching - General microstructure
High speed steels - Electrolytic etching
High speed steels - Electrolytic polishing
High speed steels - Electrolytic polishing
High speed steels - To reveal grain size in quenched and tempered high speed steels
High speed steels, martensitic and stainless steels - Chemical etching
High stregth steels - Extraction of the precipitates
High temperature CrMoN steels - Electrolytic polishing
High temperature CrMoN steels - Electrolytic polishing
High temperature nickel alloys - Chemical and Electrolytic etching - General microstructure
High temperature supercondictors (YBa2Cu3O7) - For revealing grain boundaries, twin boundaries and cracks
High-Cr cast irons - Chemical etching
High-Si irons - Chemical etching
High-Si irons and steels - Chemical etching
High-alloy steels - Electrolytic etching - General microstructure
High-alloy, corrosion-reistant steels - Chemical etching - General microstructure
High-purity U - Electrolytic etching
High-purity martensitic Fe-C alloys - Chemical etching
High-temperature alloys - Electrolytic polishing
Ho single crystal specimens - Thermal etching
Ho-Ag alloys - Chemical etching - General microstructure
Ho-Bi system - Chemical etching - General microstructure
Ho-Co alloy sputter deposited on Glass and NaCl, (100) substrates - Ionized gas cleaning
Ho-Fe alloys - Chemical etching - General microstructure
Ho-Fe alloys - Chemical etching - General microstructure
Ho-Tb alloys - Electrolytic polishing
Ho2Co14Fe3 specimens - Chemical polishing
Ho2O17 specimens - Chemical polishing
HoCu2Ge2 single crystal specimens - Chemical etching - General microstructure
Holmium specimens - Chemical etching - General microstructure
Holmium specimens - Electrolytic polishing
Holmium specimens - Sample preparation procedure
Hone and Pearson's anodizing solution - Pure Al - Chemical etching
Hone and Pearson's anodizing solution - Pure Al - Chemical etching
Hordon's etchant - Al-Cu alloy - Alloy with 7.5 at.% Al
Hot-dipped galvanized steels - Chemical etching
Howarth's etchant - Carbon and alloy steels - For detection of overheating and burning
Howarth's etchant - Carbon and alloy steels with medium carbon content - Detection of overheating and burning
Howarth's etchant - Fe + <1C + <4% additions
Huber and Linh's H etchant - For etch pits on InP
Hydal's etchant - For InBiSn
Hydrated tricalcium silicate - Chemical etching - General microstructure
Hydrated tricalcium silicate - Chemical etching - General microstructure
Hydrated tricalcium silicate iron oxide system - Chemical etching - General microstructure
Hydride in Zr-Nb alloys - Chemical etching - General microstructure
Hydrides in Ti, alpha-beta alloys - Chemical etching - General microstructure
Hydrochloric acid (HCl) - Gas cleaning
Hydroxyapatite - Ca5(PO4)3 x OH
Hypo etchant - AgCl (100) oriented material - Chemical etching
Hypoeutectoid and hypereutectoid alloy steels - Chemical etching
I.M.I. 685 alloy - Ti-6Al-6Zr-0.5Mo-0.25Si
IF steel - EBSD sample preparation - Dislocation etching
IN 100 alloy - 56.1Ni-5.0Al-4.5Ti-12Cr-3.2Mo-18.4Co-0.8V-0.09C (+B) by weight
IN 738 alloy - Electrolytic-potentiostatic isolation of residues
IN 738 alloy - Sample preparation
Identification of intermetallic phases in Al alloys - Chemical etching
In (100) wafers - Chemical etching - General microstructure
In and lean alloys - Chemical etching
In as pellets - Chemical cleaning
In preform sheet alloyed on germanium (111) wafer - Chemical etching - General microstructure
In rich alloys - Chemical etching
In single crystal ingot - Chemical etching - General microstructure
In single crystal wires - Electrolytic etching - General microstructure
In specimens - Chemical etching - General microstructure
In, In-Sb and In-As alloys - Chemical etching
In-738 superalloy - Ni-0.2C-3.5Al-3.6Ti-8.4Co-15.75Cr-1.7Mo-0.9Nb-1.8Ta-2.8W
In-Bi alloys - Chemical etching
In-Bi alloys - Chemical etching - General microstructure
In-Bi eutectic alloy specimen - Chemical etching - General microstructure
In-Bi-Sn alloys - InBi-BiSn subsystem
In-Fe alloys - Chemical etching - General microstructure
In-Ga-As system - Preferential etch to delineate from Gallium arsenide
In-Ga-As system - Preferential etch to delineate from indium phosphide
In-La system - Electrolytic polishing
In-Sb alloys - Chemical etching
In-Sb alloys - Chemical etching
In-Sb alloys - Chemical etching - General microstructure
In-Sb system - For revealing the segregation
In-Sb-Pb alloys - Chemical etching - General microstructure
In-Sn-Te alloy - In2Te3-SnTe section
In-Te-Bi alloys - In2Te3-Bi2Te3 section
In-Te-Bi alloys - InTe-InBi system
In-Ti alloys - Electrolytic etching
In-Zn alloys - Chemical etching
In-Zn alloys - Chemical etching - General microstructure
In203 specimens - Chemical etching - General microstructure
In2O3 (1010) deposited oriented thin film - Chemical etching - General microstructure
In2O3 (1010) grown as an oriented thin film - Chemical etching - General microstructure
In2O3 (1010) oriented thin films - Chemical etching - General microstructure
In2O3 as thin film - Chemical etching - General microstructure
In2O3 specimens - Chemical etching - General microstructure
In2O3 specimens - Chemical etching - General microstructure
In2Te3 specimens - Chemical polishing
In2Tl3 single crystal ingots - Chemical polishing
In5Bi3 single crystal specimens - Chemical polishing
InAs (100) n-type wafers - Chemical polishing
InAs (100), n-type wafers - Chemical etching - General microstructure
InAs (110), n-type wafers - Chemical polishing
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Chemical etching - General microstructure
InAs (111) wafers - Dislocation etching
InAs (111) wafers and other orientations - Thermal processing
InAs (111) wafers used in X-ray studies - Chemical etching - General microstructure
InAs specimens - Chemical cleaning
InAs specimens - Chemical etching - General microstructure
InAs(x)P(x-1) polycrystalline ingot - Chemical polishing
InGaAs (001) thin film - Chemical etching - General microstructure
InGaAs (100) wafer - Chemical cleaning
InGaAsP as thin film layers - Chemical etching - General microstructure
InGaAsP epitaxy thin films - Chemical etching - General microstructure
InGaAsP thin film layer grown by LPE - Chemical etching - General microstructure
InGaSb deposited as a thin film on BaF2 substrate (111) - Chemical thinning
InGe used as a deposited Au/InGe alloy contact on (100) InP and GaAs wafers - Chemical etching
InP (100) Sn doped wafers - Chemical etching - General microstructure
InP (100) Zn doped p-type wafers - Chemical etching - General microstructure
InP (100) cleaved wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical cleaning
InP (100) n-type wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical etching - General microstructure
InP (100) n-type wafers - Chemical native oxide removal
InP (100) n-type wafers - Chemical polishing
InP (100) p-type wafers - Chemical etching - General microstructure
InP (100) tin-doped, n-type wafer - Chemical etching - General microstructure
InP (100) wafer - Chemical etching - General microstructure
InP (100) wafer - Chemical etching - General microstructure
InP (100) wafer fabricated as Schottky diodes - Chemical polishing
InP (100) wafer substrates - Halogen, grooving
InP (100) wafer used as a substrate - Acid oxidation
InP (100) wafers - Chemical cleaning
InP (100) wafers - Chemical etching - A/B etchant, modified
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical etching - General microstructure
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing/etching
InP (100) wafers - Chemical thinning
InP (100) wafers - Electrolytic etching - General microstructure
InP (100) wafers - Electrolytic etching - General microstructure
InP (100) wafers - Electrolyticlytic oxidizing
InP (100) wafers - Acid, stain
InP (100) wafers - Ionized gas
InP (100) wafers - Ionized gas, removal
InP (100) wafers - Physical etrching
InP (100) wafers - Thermal cleaning
InP (100) wafers Cut 3?-off toward (110) - Chemical polishing
InP (100) wafers cut within 1? of plane - Chemical polishing
InP (100) wafers fabricated as Schottky diodes - Junction stain
InP (100) wafers used as substrates - Chemical etching - General microstructure
InP (100) wafers used as substrates for InP epitaxy - Chemical etching - General microstructure
InP (100) wafers used as substrates for LPE deposition of InGaAsP - Chemical etching - General microstructure
InP (100) wafers used as substrates for LPE of InGaAsP - Chemical etching - General microstructure
InP (100) wafers used for epitaxy growth of InGaAs/InGaAsP - Metal, etch-back
InP (100) wafers used for zinc deposition and anneal - Chemical thinning
InP (100) wafers used in a dislocation study - Dislocation etching
InP (100) wafers with channels in (011) and (011) directions - Chemical etching - General microstructure
InP (100) wafers with or without thin film InGaAsP epitaxy - Chemical etching - General microstructure
InP (100) wafers, S doped n-type - Ionized gas cleaning
InP (100) wafers, Zn doped p-type - Chemical etching - General microstructure
InP (100), n-type, 0.3-0.4 Ohm cm resistivity, and p-type, 7-8 Ohm cm wafers - Chemical cleaning
InP (110) wafer cleaved under UHV - Chemical polishing
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical etching - General microstructure
InP (111) wafers - Chemical polishing
InP (111) wafers grown by LEC - Chemical etching - General microstructure
InP (111) wafers grown by LEC - Chemical polishing
InP (111)A and (100) wafers - Chemical etching - General microstructure
InP - Dislocation etching
InP ingot cut longitudinally on the (112) axis - Dislocation etching
InP ingot grown by LEC doped with both Ga and Sb - Dislocation etching
InP p-type single crystal wafers - Chemical polishing
InP-Fe (100) (SI) wafers - Chemical polishing
InP-Fe (100) wafers - Chemical cleaning
InPFe (100) (SI) wafers - Chemical etching - General microstructure
InPFe (100) (SI) wafers - Chemical etching - General microstructure
InPFe (100) (SI) wafers - Chemical etching - General microstructure
InPFe (100) (SI) wafers - Chemical polishing
InPFe (100) n-type wafers - InPFe (100) n-type wafers
InPFe (100) wafers - Chemical cleaning
InPFe (100) wafers used as substrates for MISFETT and EMISFET device fabrication - Chemical etching
InPFe (100) wafers within 5? of plane - Chemical etching - General microstructure
InPZn epitaxy film grown by LPE - Chemical etching - General microstructure
InS (100) and (110) wafers - Chemical polishing
InSb (001) wafers - Alcohol cleaning
InSb (100) and (110) wafers - Chemical etching - Etchant No. 1
InSb (100) n-type wafers - Chemical etching - General microstructure
InSb (100) n-type wafers used in a study of adsorption coefficients
InSb (100) n-type wafers zinc diffused - Chemical cleaning
InSb (100) wafers - Chemical etching - General microstructure
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Ionized gas cleaning
InSb (100) wafers - Oxide removal
InSb (100) wafers and other orientations - Chemical polishing
InSb (100), (111)A and (111)B oriented wafers - Chemical etching - General microstructure
InSb (110) n-type and (100) p-type wafers - Chemical polishing
InSb (111) p-type wafers - Chemical polishing
InSb (111) specimens - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - /polishing
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical etching - General microstructure
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Electrolytic anodization
InSb (111) wafers - Electrolyticlytic anodizing
InSb (111) wafers - Thermal etching
InSb (111) wafers - Ketone cleaning
InSb (111), (112) and other bulk orientations - Chemical polishing
InSb (111)A, (TTT)B and (100) wafers - Chemical cleaning
InSb (311) and (110) wafers - Electrolytic polishing
InSb (311) wafers - Chemical etching - General microstructure
InSb (311) wafers - Chemical polishing
InSb - Dislocation etching
InSb - Dislocation etching
InSb - Etchant for revealing twin planes
InSb cylinder - Chemical etching - General microstructure
InSb specimen - Chemical etching - General microstructure
InSb specimens - Etchant for revealing twin lamellae by staining (211) and etching the (211)
InSb thin films - Chemical polishing
InSb-Te (111) n-type wafers - Chemical cleaning
InSe (0001) as hand cleaved wafers - Chemical etching - General microstructure
InSn alloy specimen - Electrolytic etching - General microstructure
InSnO2 single crystal - Acid, flux, removal
Incaloy 800 - 19Cr-30Ni-45Fe+ C, Mn, P, S, Cu, Si, Al, Ti
Incaloy 800 - 44Fe-31Ni-21.6Cr-1Mn-0.5Cu-0.4Ti-0.4Al-0.3Si
Inco 713LC superalloy - Electrolytic etching - General microstructure
Inconel - Electrolytic polishing
Inconel 600 - Chemical etching
Inconel 617 - 54Ni-22Cr-12.5Co-9Mo-1Al-0.07C
Inconel 686 - Chemical etching - General microstructure
Inconel 690 - Chemical etching
Inconel 718 - For SEM examination to view gamma double prime in alloy 718 (no gamma prime)
Inconel 718 - Ni-0.5Al-0.05C-5Nb-0.2/0.4Co-18Cr-18/20Fe-3Mo
Inconel 718 - Ni-17Cr-22Fe-1Co-5Nb-0.8Ti-0.6Al-0.05C
Inconel 718 alloy - Chemical etching - General microstructure
Inconel X550, Inco 700, Waspaloy, M252 - Chemical etching - General microstructure
Inconel X550, Inco 700, Waspaloy, and M252 - Chemical etching
Indium - Dislocation etching
Indium - Electrolytic mechanical polishing
Indium - Electrolytic polishing
Indium - Electrolytic polishing
Indium - Electrolytic polishing
Indium - Electrolytic polishing
Indium - Electrolytic thinning
Indium - For etch pits etching
Indium - In and In rich alloys - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical etching - General microstructure
Indium antimonide (InSb) - Chemical polishing
Indium antimonide (InSb) - Chemical polishing
Indium antimonide (InSb) - Chemical polishing and etching
Indium antimonide (InSb) - Chemical polishing and etching
Indium antimonide (InSb) - Electrolytic polishing
Indium antimonide (InSb) - Etch pit etching
Indium antimonide (InSb) - For etch pits
Indium antimonide (InSb) - Shallow etch pits are produced on (111) face
Indium arsenide (InAs) - Chemical etching
Indium arsenide (InAs) - For etch pits
Indium arsenide (InAs) - For revealing the defect density
Indium oxide (In2O3) - Etch pits etching
Indium phosphide (InP) - Chemical etching - General microstructure
Indium phosphide (InP) - Chemical etching - General microstructure
Indium phosphide (InP) - Chemical etching - General microstructure
Indium phosphide (InP) - Chemical polishing
Indium phosphide (InP) - Chemical polishing
Indium phosphide (InP) - Chemical polishing and etching
Indium phosphide (InP) - Chemical thinning
Indium phosphide (InP) - Dislocation etching
Indium phosphide (InP) - Dislocation etching
Indium phosphide (InP) - Etch for dislocations on (111)P, (100) and (110) faces
Indium phosphide (InP) - Etch pit etch for (111) face
Indium phosphide (InP) - Etch pits etch for (111) faces
Indium phosphide (InP, (001) face) - Chemical polishing
Indium phosphide arsenide (InP(x)As(1-x)) - Etching for etch pits
Indium single crystal - Chemical etching and polishing
Indium specimens - Chemical etching - General microstructure
Insb (111) wafers - Chemical etching - General microstructure
Intergranular oxidation in AISI 4150 steel - Chemical etching
Intermetallic compounds - Chemical ecthing
Invar-Tin alloy (Fe-Ni-Sn)-62Fe-35Ni-3 at.% Sn
Iodate etchant- PbTe (100) wafers - Chemical etching
Iodide Ti - Electrolytic etching
Iodide titanium - Chemical polishing
Iodine A etchant - Ba2TiO3 (111) and (100) wafers, single crystals - Chemical etching
Iodine etchant - Si (111) wafers, boron doped - Chemical etching
Iodine-doped bismuth telluride - Stain etching
Ir alloys - Electrolytic etching
Ir, Rh - Electrolytic etching - General microstructure
Ir-Mo system - Chemical etching - General microstructure
Ir-W alloy - Ir-0.3% W
Iridium - Chemical etching
Iridium - Electrolytic etching
Iridium - Electrolytic etching
Iridium - Electrolytic etching
Iridium - Electrolytic etching
Iridium - Electrolytic etching - General microstructure
Iridium specimen - Electrolytic etching - General microstructure
Iridium specimen - Electrolytic etching - General microstructure
Iridium specimen - Electrolytic thinning
Iridium specimen - Electrolytic thinning
Iridium specimen - Electrolytic thinning by window technique
Iridium specimen - Pt alloys, Rh, Ir
Iridium specimen - Rh base alloys, Pt-10% Rh alloys, Ir alloys, pure Pt and Pt alloys, Ru base alloys
Iron - Dislocation etching
Iron - Dislocation etching
Iron - Dislocation etching
Iron - Dislocation etching
Iron - Dislocation etching
Iron - Dislocation etching
Iron - Dislocation etching
Iron and iron alloys - Electrolytic polishing
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Chemical etching
Iron and steels - Electrolytic polishing
Iron and steels - Electrolytic polishing
Iron and steels - Etchant for determination of chemical and physical hetrogenity
Iron and steels - Potentiostatic etching
Iron and steels - Potentiostatic etching
Iron and steels - Potentiostatic etching
Iron and steels - Potentiostatic etching
Iron and steels - Thermal etching
Iron disilicide (FeSi2) - Chemical thinning
Iron oxide layers on iron - Chemical etching - General microstructure
Iron oxide layers on iron - Chemical etching - General microstructure
Iron oxide layers on iron - Chemical etching - General microstructure
Iron oxide layers on iron - Chemical etching - General microstructure
Iron oxide layers on iron - Electrolytic etching - General microstructure
Iron oxide scale - Chemical etching
Iron oxide scale - Chemical etching
Iron oxide scale - Fe2O3 - Chemical etching
Iron oxide scale - Fe2O3 - Chemical etching
Iron oxide scale - Fe3O4 - Chemical etching
Iron oxide scale - Fe3O4 - Chemical etching
Iron oxide scale - Fe3O4 - Chemical etching
Iron oxide scale - Fe3O4 - Electrolytic etching
Iron oxide scale - Fe3O4 - Electrolytic etching
Iron oxide scale - Fe3O4 - Electrolytic etching
Iron oxide scale - Fe3O4 - Electrolytic etching
Iron oxide scale - FeO - Chemical etching
Iron oxide scale - FeO - Electrolytic etching
Iron specimen - Chemical polishing
Iron specimen - Chemical polishing
Iron specimen - Chemical polishing
Iron specimen - Chemical polishing and etching
Iron specimen - Chemical polishing in hot etchant
Iron specimen - Chemical thinning
Iron specimen - Chemical thinning
Iron specimen - Chemical thinning
Iron specimen - Chemical thinning
Iron specimen - Dislocations in alpha-Fe whiskers
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic polishing
Iron specimen - Electrolytic thinning
Iron specimen - Electrolytic thinning
Iron specimen - Electrolytic thinning
Iron specimen - Electrolytic thinning
Iron specimen - Electrolytic thinning
Iron specimen - Electrolytic thinning by Bollman technique
Iron specimen - Electrolytic thinning by Mirand-Saulnier technique
Iron specimen - Electrolytic thinning by low voltage technique
Iron specimen - Electrolytic thinning by modified Mirand-Saulnier technique
Iron specimen - Electrolytic thinning by modified voltage technique
Iron specimen - Electrolytic thinning by window technique
Iron specimen - Electrolytic thinning in PTFE holder
Iron specimen - Electrolytic thinning using A.C.
Iron specimen - Good general-purpose electrolyte
Iron specimen - Physical etching - General microstructure
Iron specimen - Universal electrolyte
Iron, steels, cast irons - Austenite grain boundaries
Iron, steels, cast irons - Austenite grain boundaries in case hardened steels
Iron, steels, cast irons - Austenite grain boundaries in cold work steel
Iron, steels, cast irons - Austenite grain size boundaries in cold work steels
Iron, steels, cast irons - Austenite grain size boundaries in tempered steels and case hardened steels
Iron, steels, cast irons - Carbides and phosphides in low alloy steels
Iron, steels, cast irons - Carbides, nitrides, phosphides, and sulfides are not attacked
Iron, steels, cast irons - Cementite (Fe3C) with up to 10% Cr is stained dark
Iron, steels, cast irons - Cr and Cr-Ni steels - General microstructure
Iron, steels, cast irons - Differntiation of cubic and tetragonal martensite
Iron, steels, cast irons - Fe-Cr-Ni cast alloy - General microstructure
Iron, steels, cast irons - Fe3C with more thn 10% Cr is stained more rapidly than Fe3C with less than Cr
Iron, steels, cast irons - Grain boundaries in heat treated tool steel
Iron, steels, cast irons - Grain boundaries in martensitic microstructures
Iron, steels, cast irons - Grain contrast of ferrite in low carbon steels
Iron, steels, cast irons - High alloy Cr-Ni steels - General microstructure
Iron, steels, cast irons - High alloy steels - General microstructure
Iron, steels, cast irons - Increases attack of Fe in alloyed steels
Iron, steels, cast irons - Mn alloyed Cr-Ni steels- Sigma phase and ferrite
Iron, steels, cast irons - Most common etchant - General microstructure
Iron, steels, cast irons - Sigma phase etching
Iron, steels, cast irons - Stainless steels with high Cr content, Cr-Ni cast steels
Iron, steels, cast irons - Steels with high Si content
Iron, steels, cast irons - Verification of sigma phase
Iron-manganese alloys - Electrolytic polishing
Iron-oxide layers on iron - Physical etching - General microstructure
Iron-oxide layers on iron - Physical etching - General microstructure
Iron-oxide layers on iron-Fe2O3 - Chemical etching - General microstructure
Iron-oxide layers on iron-Fe3O4 - Chemical etching - General microstructure
Iron-oxide layers on iron-Fe3O4 - Chemical etching - General microstructure
Iron-oxide layers on iron-FeO - Chemical etching - General microstructure
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3 - Chemical etching - General microstructure
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3 - Chemical etching - General microstructure
Iron-technetium system (Fe-Tc) - Fe-0.1 wt.% Tc
Iron-thorium (Fe-Th) - Th-2% Fe
Isotropic silicon etches of wafers - Chemical etching
Jacquet's etchant - Al, single crystal
Jacquet's etchant - Aluminium - Etching for etch pits
Jacquet's solution - For Al - Electrolytic polishing
Jewitt-Wise's etchant - Ni specimens - Chemical etching
Jong's color etchant - OFHC copper - Tint etching
K specimens - Alcohol polishing
K specimens - Alcohol polishing
K specimens - Chemical polishing
K specimens - Ketone polishing
K42B alloy - Chemical etching - General microstructure
KBr (001) wafers - Chemical etching
KBr (100) cleaved wafers - Chemical etching
KBr (100) wafers and single crystals - Water polishing
KBr - Dislocation etching
KBr and KI single crystal specimens - Solvent polishing
KBr specimens - Chemical etching
KBr, KCl - Dislocation etching
KCl (001) cleaved wafers - Chemical etching
KCl (100) cleaved wafers - Chemical etching
KCl (100) cleaved wafers - Chemical polishing
KCl (100) cleaved wafers - Gas etching
KCl (100) specimens - Chemical cleaning
KCl (100) wafers - Chemical etching
KCl (100) wafers - Alcohol cleaning
KCl (111) and (100) cleaved wafers - Chemical cleaning
KCl - Dislocation etching
KCl - Dislocation etching
KCl formed as dendritic structure - Acid, defect
KCl single crystal specimens - Acid forming
KCl single crystal specimens - Acid forming
KI (100) cleaved wafers - Chemical etching
KI (100) cleaved wafers - Chemical etching
KI (100) wafers - Chemical etching
KI (100) wafers - Alcohol polishing
KI - Dislocation etching
KI and KBr single crystal specimens - Polishing
KKI etchant - InP (100) wafers - Chemical etching
KMnFe3 single crystal sphere
KOH etching of silicon wafers I - Chemical etching
KOH etching of silicon wafers II - Chemical etching
KTaO3 iron doped single crystal wafer - Abrasive polishing
Kalling's 1 etchant - Martensitic stainless steels
Kalling's 1 etchant - Martensitic, stainless steels - Chemical etching - General microstructure
Kalling's 2 etchant - Ni-Cu alloys and Ni-base superalloys - Chemical etching
Kalling's 2 etchant - Stainless steel castings - General structure
Kalling's 2 etchant - Stainless steels - Chemical etching
Kalling's 2 etchant - Stainless steels - Chemical etching - General microstructure
Kalling's 2 etchant - Stainless steels, Ni-Cu alloys, Ni-base superalloys
Kalling's I etchant - Stainless steels - Chemical etching
Kalling's etchant - Cr stainless steels - Chemical etching
Kalling's etchant - Ho2Fe17 and Ho2Co14Fe3 specimens - Chemical etching
Kalling's etchant - Nickel specimens T.D. grade - Chemical etching
Kalling's etchant - SST 400 series - Chemical etching
Kalling's etchant - UCe2 specimen - Chemical polishing
Kalling's etchant - UCo2 specimen - Chemical polishing
Kalling's etchant - UNi2 specimen - Chemical polishing
Kalling's etchant - UPt3 specimen - Chemical polishing
Kalling's etchant - Wrought Fe-Ni-Cr heat resisting alloy - U-700 (AISI 687) - General structure
Kalling's etchant - Wrought heat-resistant steels
Kalling's etchant - Y2(CoM)17 single crystal ingots - Chemical polishing
Kallings 2 etchant - Ni-Cu alloys and superalloys - Chemical etching
Kallings's etchant - Wrought stainless steels - General structure
Kallings's etchant - Wrought stainless steels - General structure
Keller and Geisler's anodizing solution - Al and Al alloys - Chemical etching
Keller' etchant, modified - Ni-Cr-Th alloy - Ni-20Cr-2ThO2
Keller's etchant - Al and Al alloys - Chemical etching
Keller's etchant - Al-Cu-Ag-Mg-Ti alloy - 4.7% Cu, 0.6% Ag, 0.3% Mg, 0.3% Al, 0.2% Ti
Keller's etchant - Al-Cu-Ti alloy - Alloy with 4% Cu, and 0.1% Ti
Keller's etchant - Al-Ni system - Al-Al3Ni eutectic
Keller's etchant - Al-Zn-Mg alloy
Keller's etchant - Al-Zn-Mg alloy - Chemical etching - General microstructure
Keller's etchant - Al-Zn-Mg-Cu alloy - 7075 alloy 5-3% Zn, 2-7% Mg, 1.6 Cu
Keller's etchant - Al-Zn-Mg-Cu alloys (+Cr, Ti) - Chemical etching
Keller's etchant - Aluminium (99.945%) - Dislocation etching
Keller's etchant - Aluminium - General microstructure
Keller's etchant - Deep-etching of Al-Si - For most aluminum and aluminum alloys
Keller's etchant - RE-Al alloys - Chemical etching - General microstructure
Keller's etchant - Sleeve bearing materials (Pb, Al)-Pb-Sn-Cu overlay on Al-Cd alloy
Keller's etchant - Ti alloys - Chemical etching
Keller's etchant - Ti alloys - Chemical etching - General microstructure
Keller's etchant - Ti, Ti-Al alloys - Dislocation etching
Keller's etchant 1 - Pure Al and Al alloys, Ti alloys, RE-Al alloys
Keller's etchant 2 - For Al and Al alloys
Keller's etchant, diluted - Aluminium 7075, 7475 alloy - Al-5.1/5.7 Zn-2.1/2.3 Mg-1.5 Cu-0.2 Cr
Keller's etchant, modified - Al and Al alloys - Chemical etching
Keller's etchant, modified - Al and Al alloys - Chemical etching
Keller's etchant, modified - Al and Al alloys - Chemical etching
Keller's etchant, modified - Aluminium alloys - Alloy 7075, recrystalliyed
Klemm's I etchant - Alpha and beta brass - Tint etching
Klemm's I etchant - Iron and steels - Chemical etching
Klemm's I etchant - Iron and steels - Chemical etching
Klemm's I etchant - Pure Zn and low-alloy Zn - Chemical etching
Klemm's I etchant - Tint etchant for steels
Klemm's I etchant - Zn and lean alloys - Chemical etching
Klemm's I tint etchant - Brass, bronze
Klemm's II etchant - Alpha brass - Tint etching
Klemm's II etchant - Tin - Chemical etching
Klemm's II etchant - Tint etchant for steels
Klemm's II tint etchant - Steels, alpha brass, tin alloys
Klemm's III etchant - Bronze alloys - Tint etching
Klemm's III etchant - Ni alloys - Tint etching
Klemm's III tint etchant - General microstructure
Klemm's etchant
Klemm's etchant - Temper embrittlement in steels - Chemical etching
Klemm's etchant I - Etches segregations in unalloyed and low alloy steels - Chemical etching - General microstructure
Klemm's etchant I - Unalloyed and low-alloy steels, cast irons, Mn steels, pure Zn and low-alloy Zn
Klemm's etchant II - Cu and Cu alloys and soft solders
Klemm's etchant II - Cu and Cu alloys with soft solders - Chemical etching - General microstructure
Klemm's etchant III - Pure Cu and Cu alloys
Klemm's etchant III - Pure Cu, leaded bronze, bronzes, alpha/beta brasses, Al bronze, Be bronze - Chemical etching - General microstructure
Kodak's EB-5 etchant - Cr thin films - Chemical etching
Kovar alloy - Electrolytic etching - General microstructure
Kovar specimens - Chemical etching
Kovar specimens - Chemical polishing
Kovar specimens - Chemical polishing
Kovar, cemented carbides - Chemical etching - General microstructure
Kr (100) solid single crystal ingots - Pressure
Kr used as a gas ambient component in the RF magnetron sputter deposition of NbN thin films
Kroll's etchant - For most Ti materials, especially for Ti-Al-V-(Sn) alloys - Chemical etching
Kroll's etchant - Suited especially for Al-Cu alloys - Chemical etching
Kroll's etchant - Ti alloys - Chemical etching
Kroll's etchant - Ti and alloy - Ti-6Al-2Sn-1.5Zr-1Mo-0.35Bi-0.1Si
Kroll's etchant - Ti-Al-Mo alloy - 5.8-9.7% Al, 0.5-8.2% Mo
Kroll's etchant - Ti-Al-O alloy - Ti-6-10% Al-0.04-0.12% O
Kroll's etchant - Ti-Al-V alloy (6Al-4V) - Chemical etching - General microstructure
Kroll's etchant - Ti-Mo alloy - Ti-26Mo
Kroll's etchant - Ti-Mo-V-Al-Fe alloy - Ti-8Mn-8V-3Al-2Fe - General microstructure
Kroll's etchant - Ti-Mo-Zr-Sn alloy - Ti-11Mo-6.6Zr-4.6Sn
Kroll's etchant - Ti-Ni alloys - Chemical etching
Kroll's etchant - Ti-V-Cr-Zr-Mo-Al alloy - Ti-8V-6Cr-4Zr-4Mo-3Al
Kroll's etchant - Titanium - For many Ti raw materials, especially for Ti-Al-V alloys
Kroll's etchant - Titanium and titanium alloy
Kroll's etchant - Titanium and titanium alloys - General purpose etch - For most titanium alloys
Kroll's etchant 1 - Al-Cu alloys, Ti alloys, mainly Ti-Al-V (Sn) alloys
Kroll's etchant 2 - For Ti/Al
Krumm's etchant - Al thin films evaporated on GaAs, (100) wafer substrates
LBH etchant, modified - Steels - Chemical etching
La and Ce - Chemical etching
La specimens - Arc forming
La specimens - Chemical polishing
La, U and Th used as pressed powders - Pressure
La-Ag alloys - Chemical etching - General microstructure
La-Au alloys - Chemical etching - General microstructure
La-Bi system - Chemical etching - General microstructure
La-Co alloys (Approx. LaCo5) - Chemical etching - General microstructure
La-Co system - Chemical etching - General microstructure
La-Co-Cu alloy - (Co,Cu)5La
La-Pd alloy - Approx. La3Pd4
La-Rh system - Chemical ecthing
LaB single crystal filaments - Electrolytic polishing
LaB6 single crystal specimens - Acid, forming
LaB6 specimen - Ceramic compunds - General microstructure
LaB6, TaB2 - Electrolytic etching - General microstructure
LaBr3 (100) wafers - Chemical polishing
LaCu6 single crystal - Chemical etching - General microstructure
LaPera's etchant - For steels
LaPera's etchant - Low alloy dual-phase and TRIP steels - Chemical etching
LaPera's etchant - TRIP steel - Chemical etching
LaSrCoO3 single crystals - Chemical etching
LaSrCoO3 single crystals cleaved (001) - Salt polishing
LaSrFeO3 single crystals - Chemical etching
Laced picric acid etchant - Martensitic chromium steels - Chemical etching
Lacombe and Beaujard's etchant - Al and Al alloys - Chemical etching
Landyren's etchant - Si (111) wafers and other orientations - Chemical etching
Lanthanides (Rare Earths) - For most Rare Earths metals and their alloys
Lanthanides (Rare Earths) - For most Rare Earths metals and their alloys
Lanthanum - Chemical polishing and etching
Lanthanum - Electrolytic polishing
Lanthanum - Electrolytic polishing
Lanthanum - Electrolytic thinning
Lanthanum boride (LaB4) - Electrolytic etching
Lanthanum doped barium titanate - Thermal etching
Lead - All Pb alloys - Hard lead - High Pb white metals and type metals
Lead - Chemical and electrolytic etching - General microstructure
Lead - Chemical etching
Lead - Chemical polishing
Lead - Dislocation etching
Lead - Electrolytic etching
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Electrolytic polishing
Lead - Grain contrast
Lead - Lead solder - Pb-Sb alloys and high Pb white metals and type metals
Lead - Lead solders - Pb-Sn alloys
Lead - Pb and Pb alloys - Hard lead and high Pb white metals and type metals
Lead - Pb, Pb-Sb and Pb-Sn alloys - General microstructure
Lead - Pb, Pb-Sn, Pb-Cd, Pb-Ca alloys - Pb containing Cu and bronzes
Lead - Pure Pb, Pb-Sb, Pb-Ca alloys - Grain boundaries
Lead - Universal electrolyte
Lead alloys - Electrolytic polishing
Lead and lead alloys - Chemical etching - General microstructure
Lead and lead alloys - Chemical etching - General microstructure
Lead and lead alloys - Chemical etching - General microstructure
Lead and lead alloys - Chemical etching - General microstructure
Lead and lead alloys - Electrolytic etching
Lead and lead alloys - Electrolytic etching
Lead and lead alloys - Electrolytic polishing
Lead arsenic alloys (Pb-As) - For lead rich alloys
Lead free solder - Chemical etching
Lead glass (PbO-SiO2) - 25/35 mol.% PbO-75/65 mol.% SiO2
Lead niobate (modified) - Grain boundary etching
Lead oxide-boric oxide glass - Chemical etching - General microstructure
Lead oxide-vanadium oxide-germanium oxide glass (Ge-O-Pb-V) - 4/55 V2O5-1/36 PbO-65/9 GeO2
Lead single crystal - Chemical polishing
Lead specimen - Chemical etching - General microstructure
Lead specimen - Chemical etching - General microstructure
Lead sulphide (PbS) - Chemical polishing
Lead sulphide (PbS) - Chemical polishing and etching
Lead sulphide (PbS) - Sample preparation
Lead sulphide (PbS) - To delineate p-n junction
Lead sulphide-selenide (PbS(0.6)Se(0.4)) - To delineate p-n junction
Lead telluride (Pb-Te) - Chemical polishing
Lead telluride (Pb-Te) - Chemical polishing and etching
Lead telluride (Pb-Te) - Electrolytic polishing
Lead telluride (Pb-Te) - Etching for etch pits
Lead telluride (Pb-Te) - Ething for etch pits
Lead telluride (Pb-Te) - Polishing procedure
Lead telluride (Pb-Te) system - Electrolytic polishing
Lead-lanthanum zirconate titanate - (Pb-La) (Zr-Ti)O3
Lead-strontium-titanate zirconate - (Pb0.94Sr0.06) x (Zr0.53Ti0.43)O3
Lead-strontium-titanate zirconate - Thermal etching
Lenoir's etchant - Al-Zn-Mg alloy
Lenoir's etchant, modified - Cu-Al-Mn alloy - Alloys with 3-4% Cu, 0.5 Mn
Lenoir's solution - Ag-Al alloy - Alloy with 5% Ag
Lenoir's solution - Al-Zn-Mg alloy - Alloy with 6.86 wt.% Zn, 2.5 wt.% Mg
Lenoir's solution - For Al and U
Lenoir's solution - Nimonic PE16 alloy
Lenoir's solution, modified - Ag-Al-Cd alloy - 4.8 at.% Ag, 0.15 at.% Cd
Lenoir's solution, modified - Ag-Al-Cu alloy - 4.8 at.% Ag, 0.2 at.% Cu
Lenoir's solution, modified - Al-Cu alloy - Alloys with 1-5% Cu
Lenoir's solution, modified - Al-Cu-Mg alloy - Alloys with 1-5% Cu, 0.5-1.5% Mg
Lepito's etchant
Lepito's etchant - General microstructure
Lepito's etchant - Stainless steel
Levenstein-Robinson's etchant (and (Hen-Hen) Rickson's modification) - For Ag
Levenstein-Robinson's etchant - Silver single crystal - Chemical polishing and etching
Levinstein and Robinson's etchant - Silver - Chemical polishing
Li applied as molten LiOH on rutile - Salt removal
Li fluoride - Chemical polishing
Li powder in oil - Diffision
Li samples - Chemical etching
Li single crystal spheres - Thermal forming
Li specimens - Chemical etching
Li specimens - Chemical polishing
Li tantalate-silicon-alumina system - Chemical etching - General microstructure
Li(x)WO3 (blue) and Li(x)WO3 - Oxide, growth
Li-Al orthosilicate - Li2O x Al2O3 x 3,4 as 8 SiO2
Li-Ba-Ti-Zr glass - 73% SiO2, 14% Al2O3, 8.7% Li2O, 1.75% BaO, 1.5% TiO2, 1% ZrO2 (+ NdO2)
Li-Se alloys - General microstructure
Li-Se-Rb-Br system - Li2Se-Se-(LiBr/RbBr eutectic)
Li-Zn ferrite - Li0.44 x Zn6.09 x Fe2.47 x O4
Li3Bi single crystal ingots - Chemical polishing
LiBr (100) cleaved wafers - Chemical etching
LiCl cleaved wafers - Chemical etching
LiCl wafers - Dislocation etching
LiF (100) and (111) wafers - Chemical etching
LiF (100) cleaved wafers - Dislocation etching
LiF (100) single crystal specimens - Chemical etching
LiF (100) wafers - Chemical etching
LiF (100) wafers - Chemical etching
LiF (100) wafers - Chemical etching
LiF (111) cleaved wafers - Ulrasonic vibration
LiF - Dislocation etching
LiF - Dislocation etching
LiF - Dislocation etching
LiF specimen - Chemical etching - General microstructure
LiF-MgF2 system - LiF-MgF2 eutectic - General microstructure
LiInS2 (001) oriented thin films - Chemical etching
LiInS2 thin films on (111) silicon wafer substrates - Chemical etching - General microstructure
LiN thin films - Chemical etching
LiNbO3 - Dislocation etching
LiNbO3 single crystal specimens - Chemical etching
LiNbO3 single crystal specimens - Metal decoration
LiTaO3 single crystal specimens - Chemical etching
LiTaO3 single crystal wafers - Metal decoration
Lichtenegger's + Bloch's etchant - Austenitic CrNi steels - Chemical etching
Lichtenegger's + Bloch's etchant, modified - Ferritic Cr steels - Chemical etching - General microstructure
Lichtenegger-Bloech's etchant (L-B) - Austenitic CrNi steels
Lime-silica system - Chemical etching - General microstructure
Lithia dispersed Nichrome (Cr-Li-Ni-O)-Ni-20Cr-1.3Li2O
Lithia-zinc oxide-silica system - Chemical etching - General microstructure
Lithium carbonate single crystal - Chemical etching - General microstructure
Lithium ferrite (Li05 Fe25 O4) - Chemical polishing and etching
Lithium ferrite (Li05 Fe25 O4) - Thermal etching
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - For etch pits etching
Lithium fluoride (LiF) - For etch pits etching
Lithium fluoride (LiF) single crystal - Chemical etching - General microstructure
Lithium fluoride (LiF) single crystal - Chemical etching - General microstructure
Lithium fluoride (LiF) single crystal - Chemical etching - General microstructure
Lithium glass - 30.5 mol.% LiO2, 1.5 mol.% K2O, 1 mol.% Al2O3, 1 mol.% P2O5, 5 mol.% B2O5, 61 mol.% SiO2
Lithium glass - 70% SiO2, 6/12% Li2O, 5/9% Al2O3, 5/8% K2O, 3/5% B2O5
Lithium glass - 70% SiO2, 6/12% Li2O, 5/9% Al2O3, 5/8% K2O, 3/5% B2O5, bellow 2.5% P2O5
Lithium niobate (LiNbO3) - For etching patterns on (0001) and (10T0)
Lithium nitride-Li3N - Chemical thinning
Lithium oxide-potash-zinc oxide-silicate glass - Chemical thinning
Lithium silicate glass (Li2O?2SiO2) - Chemical thinning
Lithium specimens - Chemical etching - General microstructure
Lithium specimens - Chemical polishing and etching
Lithium tantalate (LiTa03) - For domain structure in single crystals
Livingstone's etchant - Al-Cu alloys - Electrolytic polishing and chemical etching
Livingstone's etchant - Chemical etching - General microstructure
Livingstone's etchant - For Al/Cu
Livingstone's etchant, Young's etchant - Copper single crystal - Etching for etch pits
Livingstone's solution - For Ni - Electrolytic polishing
Low Mn steel - Fe-0.6/1.5C-1.1Mn - General microstructure
Low Mn-V steel - Fe-0.14C-1.3Mn-0.35Si-0.1V (plus Al, N) - General microstructure
Low Mn-V steel - Fe-0.1C-1.4Mn-0.5Si-0.1V - General microstructure
Low Mn-V steel - Fe-0.1C-1.5Mn-0.5Si-0.1V - General microstructure
Low Nb steel - Fe-0.1/0.2C-1.2/1.4Nb-0/0.2Nb
Low V alloy steel - Steel with 0.2% C and 1% V
Low V alloy steel - Steel with 0.2% C and 1% V
Low alloy steel - Chemical thinning
Low alloy steel - Chemical thinning
Low alloy steels - Chemical thinning, electrolytic polishing
Low and high alloy steels - Carbon steels, low and high alloy steels, stainless steels
Low and high alloy steels - Electrolytic polishing
Low and high alloy steels - Electrolytic polishing
Low carbon and pearlitic steels - Physical etching - General microstructure
Low carbon steel - Chemical etching - General microstructure
Low carbon steel - Physical etching - General microstructure
Low carbon steels - Chemical etching
Low carbon steels - Chemical etching - General microstructure
Low carbon steels - Color etchant- General microstructure
Low-carbon steels - Chemical polishing
Low-carbon steels - Chemical polishing
Low-carbon steels, Mg - Chemical polishing
Low-density polyethylene - Chemical etching
Lu-Ag alloys - Chemical etching - General microstructure
Lu-Au alloys - Chemical etching - General microstructure
Lu-Pd alloy - Approx. Lu3Pd4
Lu-Yb alloys - Electrolytic polishing and chemical etching
Lucas's etchant - Ni3Al based alloys with 21-29 at. per cent Al - Chemical etching
Lucas's etchant - NiChrome 80-20 - Grain structure and matrix phases
Lucite sheet and parts - Alcohol, dissolve
Lucite sheet and parts - Chemical cleaning
Lucite sheet and parts - Chemical cleaning
Lutetium - Electrolytic polishing
M" (Medium) etchant - Silicon - Chemical etching
MA 956E alloy - Fe-19Cr-4.4Al-0.5Ti-0.4Ni-0.5Y2O3
MAR-M 509 alloy - Chemical etching - General microstructure
MCrAlY-coatings (NiCoCrAlY coating) - Chemical etching - General microstructure
MERL 76 alloy - 55Ni-5.1Al-4.2Ti-12Cr-3.3Mo-0.02C-18.4Co-1.3Nb-0.7Hf (+B)
MFeM2 material - Chemical cleaning
MP35N alloy - Chemical etching
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical etching - General microstructure
Magnesia (MgO) - Chemical polishing
Magnesia (MgO) - Chemical polishing, chemical etching, jet thinning
Magnesia (MgO) - Chemical thinning
Magnesia (MgO) - Chemical thinning
Magnesia (MgO) - This etch produces pits on single crystal MgO on (100) and (110) faces
Magnesia (MgO) - Well defined square pyramidal pits form on (100) faces in after few minutes
Magnesia (MgO) single crystal - Chemical etching - General microstructure
Magnesia (MgO) single crystal - Chemical etching - General microstructure
Magnesia (MgO) single crystal - Chemical etching - General microstructure
Magnesia (MgO) single crystal - Chemical etrching
Magnesia (MgO) single crystal - Chemical polishing
Magnesia (MgO) single crystal - Chemical polishing and etching
Magnesia (MgO)-alumina (Al2O3) mixtures - Chemical etching - General microstructure
Magnesia (MgO)-alumina (Al2O3) system - MgO-MgAl2O4 section
Magnesium - All types of Mg alloys in cast or heat treated state - Grain boundaries etch
Magnesium - Attack polishing
Magnesium - Cathodic etching
Magnesium - Chemical etching
Magnesium - Chemical etching - General microstructure
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical thinning
Magnesium - Complex Mg alloys containing Al, Zn, Cd, Bi
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic polishing
Magnesium - Electrolytic thinning
Magnesium - Electrolytic thinning by window technique
Magnesium - Electrolytic thinning by window technique
Magnesium - Mg and Mg base alloys - General microstructure
Magnesium - Mg and Mg-Cu alloys, Mg die-casting alloys
Magnesium - Mg-Al alloys - Grain contrast in heat treated castings - Flow lines in forgings
Magnesium - Most types of Mg and its alloys, also casting and forgings
Magnesium - Pure Mg and most Mg alloys, also in cast and forged state
Magnesium - Pure Mg, Mg-Mn, Mg-Al, Mg-Al-Zr, Mg-Th-Zr, Mg-Zn-Zr alloys
Magnesium alloys - A universal etchant
Magnesium alloys - AZ31 (Mg + 3 wt.% Al + 1 wt.% Zn)
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - General microstructure
Magnesium alloys - Chemical etching - Nital
Magnesium alloys - Darkens Mg17Al12 phase and leaves Mg32(Al, Zn)40 phase unetched and white
Magnesium alloys - Electrolytic polishing
Magnesium alloys - For estimating the amount of massive phase
Magnesium alloys - Grain structure and coring in Mg-Zn-Zr alloys
Magnesium alloys - Reveals grain boundaries more readily
Magnesium alloys - Sample preparation
Magnesium alloys - Shows general structure - Nital
Magnesium and magnesium alloys - Electrolytic polishing
Magnesium bronze - Chemical etching - General microstructure
Magnesium fluoride MgF2 - Chemical polishing
Magnesium fluoride MgF2 - For etching grains in hot pressed magnesium fluoride
Magnesium oxide (MgO) - Chemical etching - General microstructure
Magnesium oxide (MgO) - Chemical etching - General microstructure
Magnesium oxide (MgO) - Chemical etching - General microstructure
Magnesium oxide (MgO) - Chemical etching - General microstructure
Magnesium oxide (MgO) - Chemical etching - General microstructure
Magnesium single crystal - Chemical etching - General microstructure
Magnetite (Fe3O4) - Chemical etching - General microstructure
Magnetite (Fe3O4) - Chemical etching - General microstructure
Malette's etchant - Iron and steels - Chemical etching
Manganese (II) oxide - Chemical thinning
Manganese - Electrolytic polishing
Manganese - Electrolytic polishing
Manganese - Electrolytic polishing
Manganese - Electrolytic polishing
Manganese - Mn-Fe, Mn-Ni, Mn-Cu, Mn-Co alloys - General microstructure
Manganese - Mn-Ge, Mn-Si, Mn-Sn-Ge, Mn-Sn-Si alloys
Manganese - Mn-Si-Ca alloys - Ferromanganese
Manganese - Pure Mn, low alloy Mn containing Ni, Co, Fe, Ge, and Cu
Manganese zinc ferrite-Low calcium oxide body - Mn0.51 x Zn0.43 x Fe2.06 x O4 + CaO
Mar M247 - Electrolytic polishing
Maraging steel - Fe-0.02C-12/16Cr-8Ni-0.15Be
Marble's etchant - Austenitic and high-temperature-resistant steels, Co superalloys
Marble's etchant - Co high-temeprature alloys - Chemical etching
Marble's etchant - Co superalloys - Chemical etching - General microstructure
Marble's etchant - Co-Cr-Mo-Si alloy - Tribaloy 400, Tribaloy 800
Marble's etchant - Co-Mo-Si alloy - 55Co-35Mo-10Si
Marble's etchant - Etchant of M-type ferrites - Chemical etching
Marble's etchant - Fe-Ni and Fe-Co magnetic alloys - Grain size
Marble's etchant - For iron-nickel and cobalt-base superalloys
Marble's etchant - Hard facing alloys - Chemical etching - General microstructure
Marble's etchant - In-Ni eutectoid (30% Ni) - Chemical ecthing
Marble's etchant - Ni, Ni-Cu and Ni-Fe alloys and superalloys - Chemical etching
Marble's etchant - Ni-Cr alloys - Chemical etching - General microstructure
Marble's etchant - Ni-Cr-Th alloy - Etch for TD Ni-Cr
Marble's etchant - Ni-Mo-Cr-Si alloy - 50Ni-31Mo-15Cr-3Si
Marble's etchant - Nickel - Attack polishing
Marble's etchant - Nickel superalloy 718 - Chemical etching - General microstructure
Marble's etchant - Nickel superalloys - Production of thin foils for electron microscopy
Marble's etchant - Stainless steels - Chemical etching
Marble's etchant - Stainless steels - General etchant - General microstructure
Marble's etchant - Wrought Fe-Ni-Cr heat resisting alloy - U-700 (AISI 687) - Good for contrast
Marble's etchant, modified - For Ni-Nb alloys
Marble's etchant, modified - Stainless steels - Chemical etching
Marshall's etchant - 99.999% pure iron - For etching of all grain boundaries
Marshall's etchant - Galvannealed sample - Chemical etching
Marshall's etchant - Iron and steels - Chemical etching
Marshall's solution - Fe specimens - Chemical polishing
Martensitic and ferritic stainless steels - Chemical etching
Martensitic stainless steels - Chemical etching
Martensitic stainless steels - Chemical etching
Martensitic stainless steels - Color etching - General microstructure
Martensitic stainless steels - Electrolytic etching
Matte's dip etchant - Cu and Cu alloy parts
Medium and high carbon steel - Chemical etching - General microstructure
Medium and high carbon steels - Chemical etching - General microstructure
Medium carbon steel - Physical etching - General microstructure
Medium carbon steels - Chemical etching
Medium-carbon steels - Chemical polishing
Mercury - Electrolytic polishing
Mercury alloys - Ag-Sn-Hg alloys - General microstructure
Mercury alloys - For most amalgamates - General microstructure
Mercury alloys - Hg-Sn and Hg-Sn-Cu alloys - General microstructure
Mercury selenide (HgSe) - Chemical polishing and etching
Mercury telluride (HgTe) - Chemical polishing and etching
Mercury telluride (HgTe) - Dislocation etch
Meruric iodidie (HgI2) - Chemical polishing and etching
Meruric iodidie (HgI2) - Chemical polishing and etching
Meruric iodidie (HgI2) - Etch pits etching
Metal samples - EBSD sample preparation
Metallic glass - Electrolytic thinning
Methanolic aqua regia - Austenitic stainless steels - Chemical etching
Meyer and Eichholz's No. 2 etchant - For etching nitrided layer in steel
Mg (0001) wafers - Electrolytic polishing/etching
Mg alloys - Chemical etching - General microstructure
Mg alloys - Electrolytic etching
Mg alloys, 1% Zn, 0.6% Zr - Chemical etching
Mg and Mg alloys - Chemical etching - General microstructure
Mg and Mg alloys - Electrolytic polishing
Mg and Mg alloys - For differentiation of Mg4Al3 and Mg3Al2Zn3
Mg and Mg alloys - Mg alloys with low Al content, sheet metal
Mg and Mg alloys - Mg-Al alloys, castings and forgings
Mg and Mg alloys - Mg-Al alloys, catings, Mg-Zr alloys, castings and forgings
Mg and Mg alloys - Mg-Al alloys, homogenised castings and forgings
Mg and Mg alloys - Mg-Al alloys, in the homogenised state
Mg and Mg alloys - Mg-Zr alloys, forgings
Mg and alloys - Chemical etching
Mg and alloys - Chemical etching
Mg and alloys - Chemical etching
Mg and alloys - Chemical etching
Mg and alloys - Chemical etching
Mg and alloys - Chemical etching
Mg and alloys - Electrolytic etching
Mg and high Mg alloys - Electrolytic polishing
Mg and many alloys - Electrolytic etching
Mg and wrought alloys - Chemical etching
Mg doped beta-Alumina - 90Al2O3 - 8Na2O - 2MgO
Mg pieces - Chemical cleaning
Mg sialon - Mg3 Si2.455 Al0.545 O6.245 Ni.455
Mg single crystal specimens - Physical etching
Mg single crystal wafers - Chemical etching
Mg single crystal wafers - Electrolytic polishing
Mg soldered joints AZ31, AZ91, Zm50/ZnMg3Al, Mg48Zn43Al9 - Chemical etching - General microstructure
Mg specimens - Chemical etching
Mg specimens - Chemical etching
Mg specimens - Chemical polishing
Mg specimens - Electrolytic polishing
Mg specimens - Electrolytic polishing
Mg specimens - Electrolytic polishing
Mg specimens - Electrolytic polishing
Mg specimens and alloy - Acid cutting
Mg, Mg-Cu and Mg die-casting alloys - Chemical etching
Mg, Mg-MgO alloys (0-5% MgO) - Chemical polishing
Mg-Al (to 6% Al), Mg-Mn and Mg-Mn-Al-Zn alloys - Chemical etching
Mg-Al alloy (Magnox 12) - Alloy with 0.85% Al
Mg-Al alloy - Alloy with 0.9% Mg
Mg-Al alloy - Alloy with 3% Mg
Mg-Al alloy - Alloys with < 10% Mg
Mg-Al alloy - Electrolytic thinning by window technique
Mg-Al alloy - Mg-gama MgAl eutectic
Mg-Al alloys - Chemical etching
Mg-Al alloys - Chemical thinning
Mg-Al alloys up to 6% Al - Chemical etching
Mg-Al and Mg-Al-Zn alloys - Chemical etching
Mg-Al, Mg-Al-Zn and Mg-Zn-Zr alloys - Chemical etching
Mg-Al-Zn alloy - Al, 3-5% Mg, 4-5% Zn (+ Cu, Fe, Si, Ni, Cr)
Mg-Al-Zn alloys - Chemical etching - General microstructure
Mg-Al-Zn-Mn alloy - Mg-9Al-1Zn-0.3Mn
Mg-Ca alloy - Mg rich alloys
Mg-Ce alloy - Electrolytic etching - General microstructure
Mg-Cu alloy - Mg-Mg2Cu section - General microstructure
Mg-H system - Electrolytic polishing
Mg-Li alloy - Alloy with 10.5 at.% Li
Mg-Li-Al alloy - Mg rich alloys - General microstructure
Mg-Mn ferrite (Fe-Mg-Mn-O) - Chemical etching - General microstructure
Mg-Mn ferrite (Fe-Mg-Mn-O) - Rapid attack on grain boundaries
Mg-Mn wrought alloys - Chemical etching
Mg-Nd system - Alloys with low Nd (0.5 at.%)
Mg-Nd-Y-Zn-Zr alloy - Mg-1.5Y-2/4Nd-2/4Zn-0.6Zr
Mg-Ni alloy - Mg-Mg2Ni
Mg-Ni alloy - Mg-Mg2Ni eutectic
Mg-Pb alloy - Dendritic structure of cast alloys for SEM examination
Mg-Sb alloy - Mg-Mg3Sb2 section
Mg-Si alloy - Mg-Mg2Si section
Mg-Si alloys - Chemical etching
Mg-Si alloys - Chemical etching - General microstructure
Mg-Sn alloy - Mg-Mg2Sn section
Mg-Th alloys - Electrolytic polishing
Mg-Th-Zr alloy - Alloy with 3.9% Th and 0.4% Zr
Mg-U alloys - Chemical etching
Mg-Y alloy - Alloy with 10.8 wt.% Y
Mg-Y alloy - Alloy with 8.7% Y
Mg-Y-Zn-Zr alloy - Mg-1.5Y-2/4Zn-0.6Zr
Mg-Y-Zr alloy - Mg-1.5Y-0.6Zr
Mg-Zn alloy - Cathodic etching
Mg-Zn alloy - Electrolytic polishing
Mg-Zn alloy - Electrolytic thinning by window technique
Mg-Zn alloy - Initial chemical thinning
Mg-Zn alloys - Chemical etching
Mg-Zn alloys - Chemical etching
Mg-Zn alloys - Chemical etching - General microstructure
Mg-Zn alloys - Electrolytic polishing
Mg-Zn alloys - Electrolytic polishing and chemical thinning
Mg-Zn-Zr alloy - Mg-6Zn-0.5Zr
Mg-Zr alloy - Alloys with 0.5 wt.% Zr
Mg-Zr alloy - Alloys with low Zr content
Mg-Zr alloy - Electrolytic polishing and electrolytic thinning
Mg-Zr alloy - Electrolytic thinning
Mg-Zr alloy - Initial chemical thinning
Mg-Zr system - ZrO2-9/14 mol.% MgO
Mg-Zr-Mn alloy - Mg-0.5Zr-0.1Mn
Mg2G3 (111) wafers - Chemical polishing
Mg2Ge (111) cleaved wafers - Chemical etching - General microstructure
Mg2Ge (111) cleaved wafers - Cleave, cleaning
Mg2Ge (111) wafers - Chemical cleaning
Mg2Ge (111) wafers - Chemical cleaning
Mg2Ge (111) wafers - Chemical polishing
Mg2Si (111) cleaved wafers - Chemical etching
Mg2Si single crystals - Chemical etching - General microstructure
Mg2Sn (100) cleaved wafers
Mg2Sn single crystal specimens
Mg3N4 thin films deposited on Mg specimen blanks - Chemical etching
MgAl2O4 (spinel) (100) and (111) wafers - Chemical polishing
MgAl2O4 (spinel) (111) wafers - Chemical cleaning
MgAl2O4 (spinel) natural crystals - Molten flux decomposition
MgAl2O4 (spinel) natural crystals - Molten flux etching
MgF2 (100) specimens - Chemical etching
MgF2 (100) wafers - Chemical polishing/etching
MgF2 - Dislocation etching
MgO (100) cleaved wafers - Chemical etching
MgO (100) cleaved wafers - Chemical etching
MgO (100) specimens cleaved as rectangles - Chemical etching
MgO (100) substrates - Acid, float-off
MgO (100) wafers - Chemical cleaning
MgO (100) wafers - Chemical cleaning
MgO (100) wafers - Chemical etching
MgO (100) wafers - Chemical polishing
MgO (100) wafers - Chemical thinning
MgO (100) wafers - Dislocation etching
MgO (100) wafers - Metal decoration
MgO (111) cleaved substrates - Ionized gas, cleaning
MgO - Chemical etching
MgO - Dislocation etching
MgO - Dislocation etching
MgO - Dislocation etching
MgO - Dislocation etching
MgO - Dislocation etching
MgO - Dislocation etching
MgO and UO2 - Chemical etching
MgO sample prepration
MgO single crystal specimens - Electrolytic damage
MgO specimens - Chemical etching
MgO x Al2O3 (111) blanks - Gas etching
MgO, ThO2, Al3NiO4, and Y2O3 - ZrO2 - Chemical etching
MgO, UO2 (!!!) - Chemical etching - General microstructure
MgS single crystals - Chemical etching
MgSe single crystal - Chemical polishing
MgTe single crystals - Chemical etching
Mica and natural rock salt - Gas cleaning
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microstructure of Zr alloys - Chemical etching - General microstructure
Microstructures of Cr and CrNi steels - Electrolytic etching - General microstructure
Mild steel (0.2% C) - Electrolytic thinning
Mild steel - Chemical polishing
Mild steel - Electrolytic thinning by window technique
Mild steel - Electrolytic thinning in PTFE holder
Mild steel - Fe-0.15% C - General microstructure
Miller and Day's etchant - Ffor low-carbon steels - Chemical etching
Minerals - Attack polishing
Mixed sintered carbides - Electrolytic etching
Mixtures of acrylonitrile-butadiene-styrene - Chemical etching - General microstructure
Mn dual phase steel - 0.07C-1.26Mn-0.30Si-0.08V-0.08Mo-0.07Cr - General microstructure
Mn dual phase steel - 0.11C-1.47Mn-0.34Si-0.05Nb - General microstructure
Mn steel - Fe-0.16C-13Mn-0.24Si-0.22Cu-0.48Cr-0.03/0.13Nb
Mn steel - Fe-0.6/2.1C-0/0.5Mn
Mn steels-14% Mn steel (Hadfield steel) - General microstructure
Mn thin film deposits on ruthenium substrates - Chemical cleaning
Mn thin films - Chemical polishing/etching
Mn(x)Zn(1-x)Y(z)O12 single crystal specimens - Abrasive polishing
Mn, Mn-C, Mn-Cr steels - Color etching - General microstructure
Mn, Mn-Cu alloys - Electrolytic polishing
Mn-Cr dual phase steel - Fe-0.07C-1.4Mn-0.6Si-0.2Ce
Mn-Cr steel - Fe-20Mn-4Cr-0.5C
Mn-Cr-V-W steel - 0.9C-1.1Mn-0.5Cr-0.5W-0.2V
Mn-Cu alloy - Manganese and Mn-Cu alloys
Mn-Cu alloys - Electrolytic etching
Mn-Fe, Mn-Ni, Mn-Cu and Mn-Co alloys - Chemical etching
Mn-Ge system - Chemical etching - General microstructure
Mn-Ge, Mn-Si, Mn-Sn-Ge and Mn-Sn-Si alloys - Chemical etching
Mn-Sb alloy - Mn2Sb
Mn-Sb system - MnSb-Sb eutectic
Mn-Sb-V alloy - Mn1.8V0.2Sb
Mn-Se system (MnSe) - Chemical etching - General microstructure
Mn-Se-S system - MnSe-MnS solid solution - To remove disurbed layers
Mn-Se-Te system - MnSe-MnTe section
Mn-Si alloy - Alloys with 2-24 at.% Si
Mn-Sn system - Mn rich alloys
Mn-Sn system - Quoted for non-stoichometric Mn-Sn alloys
Mn-Te system (MnTe) - Chemical etching - General microstructure
Mn-Ti alloys (0-30% at.% Ti) - Chemical etching
Mn-Ti alloys (up to 30 Ti) - Chemical polishing
Mn-Ti-Co system - Chemical etching - General microstructure
Mn-Ti-Fe system - Chemical etching - General microstructure
Mn-Ti-Fe system - FeTi-0.25-1% Mn section - General microstructure
Mn-V alloys - Chemical etching - General microstructure
Mn-Zn ferrite (Fe-Mn-O-Zn) - Chemical etching - General microstructure
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nb oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nb2O5
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nd2O3
Mn-Zn ferrite (Fe-Mn-O-Zn)-Mn0.564 x Zn0.374 x Fe2.06 x 04
Mn-Zn ferrite (Fe-Mn-O-Zn)-Mn8.51 x Zn0.43 x Fe2.06 x O4
Mn-Zn ferrite - Low Pb oxide body (Fe-Mn-O-Pb-Zn)-Mn0.5 x Zn0.43 x Fe2.03 x O4 + PbO
Mn-Zn ferrite - Low Sb oxide body (Fe-Mn-O-Sb-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Sb2O3
Mn-Zn ferrite - Low Si oxide body (Fe-Mn-O-Si-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SiO2
Mn-Zn ferrite - Low Sn oxide body (Fe-Mn-O-Sn-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SnO2
Mn-Zn ferrite - Low Sr oxide body (Fe-Mn-O-Sr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SrO
Mn-Zn ferrite - Low Ti oxide body (Fe-Mn-O-Ti-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + TiO2
Mn-Zn ferrite - Low V oxide body (Fe-Mn-O-V-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + V2O5
Mn-Zn ferrite - Low Y oxide body (Fe-Mn-O-Y-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Y2O3
Mn-Zn ferrite - Low Zr oxide body (Fe-Mn-O-Zr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + ZrO2
Mn-Zn ferrite - Low copper oxide body-Mn0.51 Zn0.43 Fe2.06O4 + CuO
Mn-Zn ferrite-low Cd oxide body - Mn0.51 x Zn0.43 x Fe2.06 x O4 + CdO
Mn-Zn ferrite-low Ge oxide body - Mn0.5 x Zn0.43 xFe2.06 x O4 + GeO2
Mn-Zn ferrite-low alumina body - Mn0.51 Zn0.43 Fe2.00 O4 - Al2O3
MnFe2 single crystal sphere - Abrasive, forming
MnO single crystals doped with iron as ferrites - Chemical etching
MnO2 natural crystal specimens - Chemical etching
MnO2 single crystal specimens - Physical etching
MnTe2 single crystal specimens - Chemical polishing
Mo (100) specimens - Chemical polishing
Mo (111) wafers - Chemical cleaning
Mo (111) wafers - Chemical cleaning
Mo (111) wafers - Electrolytic polishing/thinning
Mo alloys - Chemical etching
Mo alloys - Chemical etching
Mo alloys - Electrolytic etching
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo alloys - Electrolytic polishing
Mo and Mo-Ni alloys - EBSD sample preparation
Mo and Mo-Ti alloys - Chemical etching
Mo and alloys - Chemical etching
Mo and alloys - Chemical etching
Mo and alloys - Electrolytic etching
Mo and alloys - Electrolytic etching
Mo and alloys - Electrolytic etching
Mo and alloys - Electrolytic etching
Mo and its alloys, Ta and its alloys, W and W-base alloys - Electrolytic etching - General microstructure
Mo and some alloys - Chemical etching
Mo and some alloys - Chemical etching
Mo crystalline specimens - Chemical etching - /thinning
Mo foil - Chemical cleaning/polishing
Mo poly sheet - Chemical cleaning
Mo pressed powder discs - Chemical etching
Mo sheet - Electrolytic polishing
Mo single crystal specimens - Electrolytic thinning
Mo specimens - Chemical cleaning
Mo specimens - Chemical cleaning
Mo specimens - Chemical cleaning
Mo specimens - Chemical cleaning
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching
Mo specimens - Chemical etching - polishing
Mo specimens - Chemical polishing
Mo specimens - Chemical polishing
Mo specimens - Chemical polishing
Mo specimens - Electrolytic etching
Mo specimens - Electrolytic etching
Mo specimens - Electrolytic polishing
Mo specimens subjected to Kr+ ion bombardment - Chemical etching
Mo specimens used for electroplating - Chemical polishing
Mo thin films - Chemical etching
Mo thin films and crystalline specimens - Chemical etching
Mo thin films and crystalline specimens - Chemical etching
Mo thin films and crystalline specimens - Metal alloying
Mo, Nb - Chemical-Mechanical polishing
Mo, Nb, Ta, W - Attack polishing
Mo, W - Chemical-Mechanical polishing
Mo, W - Electrolytic etching - General microstructure
Mo-Al and Mo-Co alloys - Chemical etching - General microstructure
Mo-C alloys - Attack polishing
Mo-Co alloy - Pre-etch for alpha Co alloys in 50% nitric acid
Mo-Fe alloys - Chemical etching - General microstructure
Mo-Ga alloy - Chemical etching - General microstructure
Mo-Hf alloy (1 at.% Hf) - Electrolytic thinning
Mo-Hf alloys - Electrolytic etching - General microstructure
Mo-Mn-Co system - Chemical etching, electrolytic etching
Mo-Nb alloy single crystal - Alloy with 5 at.% Nb
Mo-Ni alloy - Alloy with 33 at.% Mo
Mo-Ni alloy - Electrolytic thinning
Mo-Ni alloys - Chemical etching - General microstructure
Mo-Ni-C system - Chemical etching - General microstructure
Mo-Os alloys - Chemical and electrolytic etching - General microstructure
Mo-Pt alloy - Alloys with up to 55 at.% Pt
Mo-Re alloy (34% Re) - Alloy with 34 at.% Re
Mo-Re alloy (35% Re) - Electrolytic polishing
Mo-Re alloy - Alloy with 5 at.% Re
Mo-Re alloy - Electrolytic thinning
Mo-Re alloys - Chemical etching
Mo-Re alloys - Electrolytic polishing and etching
Mo-Re-C alloy - Mo-3.5Re-0.2C
Mo-Re-Hf-C system - Mo-1.6/2.3Re-0.2/1.0Hf-0.1/1.9C
Mo-Sc alloys - Chemical etching - General microstructure
Mo-Y alloys - Chemical etching - General microstructure
Mo-Zr alloy - Electrolytic thinning
Mo2B3 specimens - Chemical etching - General microstructure
Mo2B3 specimens - Chemical etching - General microstructure
Mo2B5 specimens - Chemical etching - General microstructure
Mo2C specimens - Chemical etching
Mo3Ge specimens - Chemical etching - General microstructure
Mo3Ge specimens and Mo3Ge2 - Chemical etching
MoB surface penetration film - Chemical etching - General microstructure
MoB2 specimen - Chemical etching - General microstructure
MoN and Mo2N thin films grown on (100) silicon wafers - Chemical etching
MoO2 as amorphous platelets on steel - Chemical etching
MoO3 thin film - Chemical etching
MoS2 as powdered lubricant - Chemical cleaning
MoS2 natural single crystal specimens - Ester, removal
MoS2 single crystal platelets - Tape, cleaning
MoS2 single crystal specimens - Chemical polishing
MoSe2 single crystal specimens - Chemical polishing
MoSeS2 single crystal platelets - Tape, cleaning
MoSi2 the films deposited on silicon substrates - Ionized gas etching
MoSi2 thin films - Gas forming
MoSi2 thin films deposited on silicon substrates - Ionized gas etching
MoTe2 single crystal specimens - Chemical polishing
Modification of Lacombe and Beaujard's etchant - Aluminium (HP) - Dislocation etching
Moly's etchant - Mo discs - Chemical cleaning
Molybdenium - Electromechanical polishing
Molybdenium - Electromechanical polishing
Molybdenium - Nb, Ta, Mo and their alloys
Molybdenum - Attack polishing
Molybdenum - Cathodic etching
Molybdenum - Chemical etching
Molybdenum - Chemical etching - General microstructure
Molybdenum - Chemical etching - General microstructure
Molybdenum - Chemical etching - General microstructure
Molybdenum - Chemical polishing
Molybdenum - Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Molybdenum - Dislocation etching
Molybdenum - Dislocation etching
Molybdenum - Dislocation etching
Molybdenum - Electrolytic etching
Molybdenum - Electrolytic and chemical polishing
Molybdenum - Electrolytic etching
Molybdenum - Electrolytic etching
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing
Molybdenum - Electrolytic polishing - Mo thin foil preparation
Molybdenum - Electrolytic polishing and etching
Molybdenum - Electrolytic polishing and thinning
Molybdenum - Electrolytic polishing for sheets
Molybdenum - Electrolytic polishing, thinning and chemical etching
Molybdenum - Electrolytic thinning
Molybdenum - Electrolytic thinning
Molybdenum - Electrolytic thinning
Molybdenum - Electrolytic thinning
Molybdenum - Electrolytic thinning
Molybdenum - Electrolytic thinning by window technique
Molybdenum - Jet thinning
Molybdenum - Mo (grain contrast)
Molybdenum - Mo and Mo alloys - General microstructure
Molybdenum - Mo and Mo alloys - General microstructure
Molybdenum - Mo and Mo base alloys
Molybdenum - Mo and Mo-Ni alloys - General microstructure
Molybdenum - Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys - General microstructure
Molybdenum - Mo, W and their alloys
Molybdenum - Mo, W and their alloys
Molybdenum - Mo, W and their alloys
Molybdenum - Particulary good for sintered Mo-32 to 80 F
Molybdenum - Pure Mo - General microstructure
Molybdenum - Pure Nb, Mo
Molybdenum - Ta and Ta base alloys, Nb and Nb base alloys
Molybdenum - W and W base alloys, Mo and Mo base alloys
Molybdenum boride (MoB2) - Chemical etching - General microstructure
Molybdenum disilicide (MoSi2) - Chemical etching - General microstructure
Molybdenum selenide (MoSe2) - MoSe2 single crystal
Molybdenum silicide (MoSi2 and Mo5Si3) - Electrolytic etching - General microstructure
Molybdenum single crystal - Electrolytic polishing
Molybdenum sulphide (MoS2) - Produces hexagonal etch pits on (0001) face
Molybdenum, Re alloys, Re-Mo alloys - Electrolytic polishing
Molybdenum, Tungsten - Attack polishing
Molybdenum, etch figures - Chemical etching - General microstructure
Molybdenum, sintered and cast - Electrolytic polishing
Molybdenum, sintered and cast - Electrolytic polishing
Molybdenum, tantalum, niobium - Electrolytic polishing
Molybenum - Attack polishing
Monel - Electrolytic polishing
Monel - Electrolytic polishing
Monel 400 - For the grain boundaries
Monel, Ni-Al and Ni-Fe alloys - Chemical etching
Moran's etchant - NaCl (100) wafers, NaCl single crystal whiskers - Chemical etching
Morris's electrolytic polishing solution - Dislocation etching
Morris's electrolytic polishing solution - Fe-3% Si alloy - Dislocation etching
Mullite (Al2O3 x SiO2), BeO, MgO, Ca(2)Zr(1-1x)O(y) - Chemical etching - General microstructure
Mullite (Al4OSi2 x Al2O12) - Chemical etching - General microstructure
Murakami's etchant - W and W alloys - Chemical etching
Murakami's etchant - Alumina (Al2O3) - Aluminia with additives
Murakami's etchant - Cast irons - 30% chromium irons
Murakami's etchant - Cast irons - High phosphorus irons
Murakami's etchant - Co-Cr-Mo-Ni-Fe-Si-C-Mn-Al-Ti alloy
Murakami's etchant - Co-Cr-Ni alloys - For identification of sigma phase
Murakami's etchant - Co-Sn0Sb alloys - For carbides
Murakami's etchant - Copper-Tungsten (Cu-W) - Electric contact material
Murakami's etchant - Cr and Cr alloys - Chemical etching
Murakami's etchant - Fe-Ni-Cr heat resistant casting alloys - Etchant for staining or film forming
Murakami's etchant - Gold-Plated Nickel-Iron (Au-Ni-Fe) - Electric contact material
Murakami's etchant - Iron - Selective carbides
Murakami's etchant - Iron and steels - Chemical etching
Murakami's etchant - Martensitic chromium steels - Chemical etching
Murakami's etchant - Mo and alloys - Chemical etching
Murakami's etchant - Mo specimens - Chemical etching
Murakami's etchant - Mo-C alloys - Chemical etching
Murakami's etchant - Mo-C alloys - Chemical etching
Murakami's etchant - Molybdenum - Chemical etching
Murakami's etchant - Molybdenum - Electric contact material
Murakami's etchant - Molybdenum-Silver (Mo-Ag) - Electric contact material
Murakami's etchant - Ni-Cu alloys and superalloys - Chemical etching
Murakami's etchant - Rhenium - Chemical etching
Murakami's etchant - Rhenium - Chemical etching
Murakami's etchant - Sb telluride - Chemical etching
Murakami's etchant - SiC alloy with 1% B4C - Chemical etching
Murakami's etchant - Silicon carbide (SiC) - For SiSiC
Murakami's etchant - Silver - Molybdenum (Ag-Mo) - Electric contact material
Murakami's etchant - Silver-Tungsten (Ag-W) - Electric contact material
Murakami's etchant - Silver-Tungsten carbide (Ag-WC) - Electric contact material
Murakami's etchant - Sn-Cd-Sb alloys - Chemical etching
Murakami's etchant - Stainless steel castings - General structure
Murakami's etchant - Stainless steel castings - General structure
Murakami's etchant - Stainless steels - Chemical etching
Murakami's etchant - Stainless steels - Color etchant - General microstructure
Murakami's etchant - Steels and other alloys
Murakami's etchant - Ta-Mo alloys - Chemical etching
Murakami's etchant - TiC coated steel - Chemical etching
Murakami's etchant - Tungsten - Electric contact material
Murakami's etchant - Tungsten - Mo, W and their alloys
Murakami's etchant - Tungsten-Copper (W-Cu) - Electric contact material
Murakami's etchant - Tungsten-Nickel (W-Ni) - Electric contact material
Murakami's etchant - Tungsten-rhenium-thoria system (O-Re-Th-W)-W - 3% Re-2% ThO2
Murakami's etchant - U-Zr alloys - Chemical etching
Murakami's etchant - U-Zr alloys, U-Fe-Co alloys, U-Al2-U3Si3 alloys - Chemical etching
Murakami's etchant - V and V-O alloys - Chemical etching
Murakami's etchant - Vanadium specimens - Chemical etching
Murakami's etchant - Vanadium-nitrogen system (V-N) - Electrolyticlytic and chemical polishing
Murakami's etchant - W-Hf alloys (< 3% Hf) - Chemical etching
Murakami's etchant - W-Hf-N alloys alloy - < 3% Hf, nitrided
Murakami's etchant - W-Hf-Re alloys - Chemical etching
Murakami's etchant - W-Hf-Re-N alloys alloy - < 2% Hf, < 25% Re, nitrided
Murakami's etchant - W-Mo-Hf-Re alloy - < 20% Mo, < 2% Hf, < 30% Re
Murakami's etchant - W-Mo-Hf-Re-N alloy - < 20% Mo, < 2% Hf, < 30% Re, nitrided
Murakami's etchant - WC specimens - Chemical cleaning
Murakami's etchant - WC-Co, Eta phase appears multicolored; Co is white, WC-TiC-TaC-Co, WC-NbC-Co
Murakami's etchant - Wrought Fe-Ni-Cr heat resisting alloys - Inconel 706 and alloy 718, carbide particles
Murakami's etchant - Wrought stainless steels - General structure, sigma phase
Murakami's etchant, boiling - Aluminium nitride (AlN) - Chemical etching - General microstructure
Murakami's etchant, boiling - SiC-AlN specimens - SiC-10/80% AlN
Murakami's etchant, modified (Klemm) - Al-Si aloys - Chemical etching
Murakami's etchant, modified - AlN-Al2O3 - Chemical etching - General microstructure
Murakami's etchant, modified - Aluminium nitride (AlN) - AlN with Al2O3 - General microstructure
Murakami's etchant, modified - Iron and steels - Chemical etching
Murakami's etchant, modified - Molybdenum - Mo, W and their alloys
Murakami's etchant, modified - Silicon carbide (SiC) - For RSiC - Reveals alpha/beta grain boundaries
Murakami's etchant, modified - Silicon carbide (SiC) - For alpha-SiC - Reveals alpha/alpha and alpha/beta grain boundaries
Murakami's etchant, modified - Stainless steels - Chemical etching
Murakami's etchant, modified - Stainless steels - Chemical etching
Murakami's etchant, modified - Stainless steels - Chemical etching
Murakami's etchant, modified - Stainless steels - Chemical etching
Murakami's etchant, modified - Ti-V-Mo alloys - Chemical etching
Murakami's etchant, modified - Tungsten - Mo, W and their alloys
Murakami's etchant, modified - W and lean alloys - Chemical etching
Murakmi's etchant - Austenitic and ferritic-Austenitic stainless steels - Chemical etching
Murkami's etchant - Steel specimens - Carbide etching
Murkami's etchant - TiC specimens - Chemical cleaning
Muscovite mica (0H)2KAl2(AlSi3O10) - Acid, float-off
Muscovite mica (0H)2KAl2(AlSi3O10) - Chemical cleaning
N-155 alloy - Chemical etching - General microstructure
N2, grown as a single crystal - Pressure, defect
NASA 11B7 alloy - 56.6Ni-3.4Al-0.7Ti-8.9Cr-2.0Mo-0.1C-9.1Co-7.5W-0.5V-10.2Ta-1.1Hf (+ 0.02 B) by weight
Na beta Al2O3 - Chemical etching - General microstructure
Na beta Al2O3 - Physical etching - General microstructure
NaBr single crystal specimens - Alcohol, cutting
NaBr specimens - Chemical etching - General microstructure
NaCl (100) blanks - Gas cleaning
NaCl (100) cleaved wafers - Chemical etching - General microstructure
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) cleaved wafers - Dislocation etching
NaCl (100) cleaved wafers - Dislocation etching
NaCl (100) cleaved wafers - Dislocation etching
NaCl (100) cleaved wafers - Thermal etching
NaCl (100) cleaved wafers - Thermal, float-off
NaCl (100) crystals
NaCl (100) wafers
NaCl (100) wafers - Chemical cleaning
NaCl (100) wafers - Chemical cleaning
NaCl (100) wafers - Chemical etching - General microstructure
NaCl (100) wafers - Chemical etching - General microstructure
NaCl (100) wafers - Chemical etching - General microstructure
NaCl (100) wafers - Chemical etching - General microstructure
NaCl (100) wafers - Chemical polishing
NaCl (100) wafers - Chemical polishing
NaCl (100) wafers - Dislocation etching
NaCl (100) wafers - Acid, float-off
NaCl (100) wafers - Gas cleaning
NaCl (100) wafers - Metal decoration
NaCl (100) wafers and single crystals - Chemical polishing
NaCl - Dislocation etching
NaCl - Dislocation etching
NaCl - Dislocation etching
NaCl - Dislocation etching
NaCl dendritic sample
NaCl single crystal specimens - Chemical etching - General microstructure
NaCl, NaF - Dislocation etching
NaKC4H4O6 x 4H2O (0001) wafers - Chemical cleaning
NaKC4H4O6 x 4H2O (0001) wafers - Chemical etching - General microstructure
NaNO3 single crystals - Base, removal
Nb (100) oriented single crystal cylinders - Thermal etching
Nb (100) oriented single crystal rods - Chemical polishing
Nb and 1% Zr alloys - Chemical etching
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys - Electrolytic polishing
Nb and Nb alloys, Ta and Ta-O alloys (industrial alloys), etch figures - Chemical etching - General microstructure
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Chemical etching
Nb and alloys - Electrolytic etching
Nb oxide, NbO (blue), NbO2 (blue green), Nb2O5 (red brown) - Electrolytic etching
Nb oxides - Chemical etching
Nb polycrystalline samples - Chemical polishing
Nb specimens - Chemical cleaning
Nb specimens - Chemical cleaning
Nb specimens - Chemical etching
Nb specimens - Chemical etching
Nb specimens - Chemical etching
Nb specimens - Chemical polishing
Nb specimens - Chemical polishing
Nb specimens - Electrolytic oxidation
Nb specimens - Electrolytic polishing
Nb specimens - Hydrocarbon cleaning
Nb specimens used for electroplating - Electrolytic polishing
Nb thin films evaporated on glass - Gas oxidation
Nb, Mo, W - Electrolyticlytic lapping
Nb, NbGa, Nb3Si-Anodizing
Nb, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb-Al alloy - Nb3Al - General microstructure
Nb-Al alloy - Nb3Al - General microstructure
Nb-Al alloys - Chemical etching - General microstructure
Nb-Al-Ga system - Nb3Al-Nb3Ga section - General microstructure
Nb-Al-Ga-Ge system - Nb3Al.Nb3Ga-Nb3Ge section - General microstructure
Nb-Al-Ge system - Nb3Al-Nb3Ge section - General microstructure
Nb-Al-Si system - Chemical etching - General microstructure
Nb-C alloys - Chemical ecthing
Nb-Co system - Chemical etching - General microstructure
Nb-Co-Si alloys - Chemical etching - General microstructure
Nb-Cr alloys - Chemical etching - General microstructure
Nb-Ga system - Electro etching - General microstructure
Nb-Ga system - Nb3Ga - General microstructure
Nb-Ga-Ge system - Nb3Ga-Nb3Ge section
Nb-Gd alloys - Chemical etching - General microstructure
Nb-Ge alloy (Nb3Ge) - Chemical etching - General microstructure
Nb-Ge alloy (Nb3Ge) - Chemical etching - General microstructure
Nb-Ge alloy - Anodic etching
Nb-H allooys - Chemical polishing and etching
Nb-Hf alloys - Attack polishing
Nb-Hf alloys - Attack polishing
Nb-Hf-C alloy - Nb rich alloys
Nb-Ir alloys - Chemical and electrolytic etching - General microstructure
Nb-Mo alloy - Alloys with 1-8 at.% Mo
Nb-Mo alloy - Single crystal alloys
Nb-Mo-C alloys - Attack polishing
Nb-Mo-C alloys - Chemical etching - General microstructure
Nb-N alloys - Chemical etching
Nb-N system - Chemical etching - General microstructure
Nb-N system - Chemical etching - General microstructure
Nb-N system - Electrolytic etching - General microstructure
Nb-N system - Electrolytic polishing
Nb-Ni alloy (Ni60Nb40) - Electrolytic thinning
Nb-Ni alloy - Ni-Ni3Nb eutectic
Nb-O alloys - Chemical etching
Nb-Re alloys - Chemical etching
Nb-Rh alloys (<25 at.% Rh) alloys - Chemical etching
Nb-Rh alloys - Chemical and electrolytic etching - General microstructure
Nb-Rh alloys single crystal - Chemical polishing
Nb-Ru alloys - Electrolytic etching - General microstructure
Nb-Sc alloys - Chemical etching - General microstructure
Nb-Si alloy - Anodising
Nb-Sn alloy (Nb3Sn) - Chemical etching - General microstructure
Nb-Sn alloy (Nb3Sn) - Chemical etching - General microstructure
Nb-Sn alloy (Nb3Sn) - Electrolytic thinning and polishing
Nb-Sn alloy - Anodic etching, chemical etching
Nb-Sn alloy - Chemical etching - General microstructure
Nb-Sn alloy - Chemical etching - General microstructure
Nb-Sn alloys (single crystal Nb3Sn) - Chemical etching - General microstructure
Nb-Sn alloys - Chemical ecthing
Nb-Sn alloys - Chemical etching
Nb-Sn alloys - Chemical etching
Nb-Sn alloys - Electrolytic etching
Nb-Ta alloys - Chemical polishing
Nb-Tb and Nb noble metal alloys - Chemical etching
Nb-Ti alloy (20 at.% Nb) - Chemical polishing
Nb-Ti alloy (54.3 at.% Ti) - Chemical etching - General microstructure
Nb-Ti alloy - Electrolytic thinning
Nb-Ti alloys (18-40 at.% Nb) - Chemical thinning
Nb-Ti alloys - Chemical etching
Nb-V alloys - Chemical etching - General microstructure
Nb-V and Nb alloys - Chemical etching
Nb-W-Mo-Hf alloy - SU16 alloy 11% W, 3% Mo, 3% Hf, 0.08% C
Nb-W-Zr alloy (NB7-19% W, 2% Zr) - Chemical etching - General microstructure
Nb-Zn alloys - Chemical etching - General microstructure
Nb-Zr alloy (1% Zr) - Chemical etching - General microstructure
Nb-Zr alloy (15% Nb) - Electrolytic thinning
Nb-Zr alloy (16-40% Zr) - Electrolytic polishing
Nb-Zr alloy (2.5% Nb) - Chemical thinning for electron microscopy
Nb-Zr alloy (2.7% Nb) - Chemical etching - General microstructure
Nb-Zr alloy (25 at.% Zr) - Electrolytic polishing
Nb-Zr alloy (25% Zr) - Chemical etching - General microstructure
Nb-Zr alloy (up to 20% Nb) - Chemical etching - General microstructure
Nb-Zr alloy - Micro jet machinning
Nb-Zr alloy - Sample prepation
Nb-Zr alloys (Omega phase) - Chemical polishing
Nb-Zr alloys - Chemical etching
Nb-Zr alloys - Chemical etching - General microstructure
Nb-Zr alloys - Chemical etching - General microstructure
Nb-Zr alloys - Chemical etching - General microstructure
Nb-Zr alloys - Chemical polishing and etching
Nb-Zr alloys - Electrolytic etching
Nb-Zr alloys - Electrolytic etching - General microstructure
Nb-Zr and Nb-Zr-Re alloys - Chemical etching
Nb-Zr-O system (Nb rich) - Electrolytic etching - General microstructure
Nb-low carbon alloys - Chemical polishing
Nb/Nb2O3, E-Ni-Fe - Chemical-Mechanical polishing
Nb2O5 - Chemical etching
Nb2O5 as the natural mineral iron niobate FeNb2O6 - Chemical etching
Nb3B3 specimens - Chemical etching - General microstructure
Nb3B3 specimens - Chemical etching - General microstructure
Nb3B3 specimens - Chemical etching - General microstructure
Nb3Ge single crystal compound - Physical etching
Nb3Ge thin films - Chemical etching - General microstructure
Nb3Ge thin films on (100) Ge substrates - Chemical etching
Nb3Se (100) hexagonal platelets - Chemical cleaning
Nb3Si - Electrolytic etching
Nb3Sn - Anodizing
Nb3Sn - Chemical etching
Nb3Sn amorphous thin films - Heat, removal
Nb3Sn as single crystals - Chemical polishing
Nb3Te4 single crystal - Chemical cleaning
NbAl(y) as alloy specimens - Chemnical etching
NbC and NbC2 - Electrolytic etching
NbC specimens - Chemical etching
NbC specimens - Chemical etching
NbC thin films - Chemical etching
NbC/NbC2 - Electrolytic etching - General microstructure
NbH as powder - Chemical etching
NbH deposited on silicon wafers - Chemical etching - General microstructure
NbN (100) thin films deposited on NaCl - Ionized gas cleaning
NbN (yellow), Nb2N (pink) - Electrolytic etching - General microstructure
Nd specimens - Arc, forming
Nd-Ag alloys - Chemical etching - General microstructure
Nd-Al alloy - General microstructure
Nd-Co alloys - Chemical etching - General microstructure
Nd-Co alloys - Chemical etching - General microstructure
Nd-Co-Cu alloy - (Co,Cu)5Nd
Nd-Fe-B alloys, phase identification - Chemical etching - General microstructure
Nd-H system - Chemical etching - General microstructure
Nd2O3, U3O8 - Chemical etching - General microstructure
NdFeB alloy - Rare-Earth magnetic alloy
Ne grown as a single crystal - Pressure
Ne-Au alloys - Chemical etching - General microstructure
Ne-Bi system - Chemical etching - General microstructure
Neodymium doped barium titanate - Thermal and chemical etching
Neodymium oxide (Nd2O3) - Chemical etching - General microstructure
Neodymium oxide-Zirconia system - ZrO2-Nd2O3 eutectic
Neodymium specimens - Electrolytic polishing
Neodymium specimens - Electrolytic polishing
Neodymium-palladium alloys (Nd-Pd)-Approx. Nd3Pd4
Neodymium-zinc alloys (Nd-Zn) - Chemical etching - General microstructure
Neptunium - Electrolytic polishing
Neptunium - Electrolytic polishing
New etching procedure for Ni alloy 690
Ni (100) wafers - Chemical etching
Ni (100) wafers - Ionized gas cleaning
Ni alloys - Chemical etching
Ni alloys, some alloy steels - Attack polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni alloys - Electrolytic polishing
Ni and Ni-Cu alloys - Electrolytic etching
Ni and alloys - Chemical etching
Ni crystalline electrode rod - Alcohol cleaning
Ni evaporated as an AuNi coating on resistors - Chemical etching
Ni evaporated thin films - Chemical etching
Ni passive superalloys - Chemical etching
Ni polycrystalline specimens - Electrolytic etching
Ni silicide - Chemical etching - General microstructure
Ni single crystal sphere - Thermal forming
Ni single crystals - Electrolytic thinning
Ni specimens - Chemical cleaning
Ni specimens - Chemical cleaning
Ni specimens - Chemical etching
Ni specimens - Chemical etching
Ni specimens - Chemical etching
Ni specimens - Chemical polishing
Ni specimens - Chemical polishing
Ni specimens - Electrolytic etching
Ni specimens - Electrolytic polishing
Ni specimens - Electrolytic polishing
Ni specimens - Electrolytic polishing
Ni specimens - Electrolytic polishing
Ni specimens - Electrolytic polishing
Ni steel - Fe-0.4/1.3C-8/25Ni
Ni superalloys - Chemical etching
Ni superalloys - Chemical etching
Ni superalloys - Chemical etching
Ni superalloys - Chemical etching
Ni superalloys - Chemical etching
Ni superalloys - Chemical etching - General microstructure
Ni superalloys - Electrolytic etching
Ni superalloys - Electrolytic etching
Ni superalloys - Electrolytic etching
Ni superalloys - Electrolytic etching
Ni superalloys - Electrolytic etching - General microstructure
Ni superalloys, Hastelloy - Chemical etching - General microstructure
Ni thin film evaporation on glass - Chemical etching
Ni thin films - Chemical etching
Ni, 20% Cr and 2% ThO2 alloy - Electrolytic etching
Ni, Ni-Cr and Ni-Fe alloys - Electrolytic etching
Ni, Ni-Cu, Ni-Ti alloys - Chemical etching
Ni-20Cr and Ni-20Cr-45Fe - Chemical etching - General microstructure
Ni-Ag alloys - Chemical etching
Ni-Ag alloys and superalloys - Chemical etching
Ni-Ag, Ni-Al, Ni-Cr, Ni-Cu, Ni-Fe and Ni-Ti alloys - Electrolytic etching
Ni-Al alloy - 70Ni-30Al
Ni-Al alloy - Al-Al3Ni eutectic
Ni-Al alloy - Al-Al3Ni eutectic
Ni-Al alloy - Al-Al3Ni eutectic
Ni-Al alloy - Al-Al3Ni eutectic
Ni-Al alloy - Al-Al3Ni eutectic
Ni-Al alloy - Al-NiAl3 eutectic
Ni-Al alloy - Alloy with 0.1-0.5 at.% Al
Ni-Al alloy - Alloy with 4-8% Al
Ni-Al alloy - Beta type alloys
Ni-Al alloy - Electrolytic thinning
Ni-Al alloy - Electrolytic thinning
Ni-Al alloy - Electrolytic thinning
Ni-Al alloy - Electrolytic thinning
Ni-Al alloy - Electrolytic thinning
Ni-Al alloy - Ni rich NiAl - Electrolytic polishing
Ni-Al alloy - Ni-6/8Al - Electrolytic polishing
Ni-Al alloy - Ni3Al - General microstructure
Ni-Al alloys (3-25% Al) - Chemical etching
Ni-Al alloys - Chemical etching
Ni-Al alloys - Chemical etching - General microstructure
Ni-Al alloys - Chemical etching - General microstructure
Ni-Al alloys - Electrolytic polishing
Ni-Al system - Al-Al3Ni eutectic - Electrolytic polishing
Ni-Al system - Chemical etching - General microstructure
Ni-Al, Ni-Cr-Al and Ni-Cr-Ti alloys - Electrolytic etching
Ni-Al-Cu steel - Fe-0.3C-4Ni-1Al-1Cu
Ni-Al-Hf alloy - Ni-20/23Al-5/7.5Hf - General microstructure
Ni-Al-Mo alloy - 65Ni-8Al-27Mo
Ni-Al-Mo alloy - Ni-8Al-26.4Mo, Ni-6.3Al-31.2Mo
Ni-Al-Mo alloy - NiAl/Mo eutectic - Selective etch for Mo
Ni-Al-Mo alloy - Ternary eutectic of gama prime-Ni3Al, gamma-nickel rich f.c.c and alpha-Mo
Ni-Al-Nb alloy - Ni rich alloys
Ni-Al-Nb alloy - Ni3Al-Ni3Nb eutectic
Ni-Al-Ta alloy - Ni-20/29Al-2.5/7.5Ta - General microstructure
Ni-Al-Ti alloy - Ni3(Al,Ti) - Electrolytic thinning
Ni-Al-Ti alloy - Ni3AlTi - Electrolytic polishing
Ni-Al-Ti alloy - Ni3AlTi, etch pits
Ni-Al-Ti alloys - Electrolytic etching
Ni-B-P glass - Ni80-P10-B10 splat cooled alloy
Ni-B-Si-C alloy - Electrolytic polishing
Ni-Be-Cr alloys - Electrolytic thinning
Ni-C alloys - Chemical etching - General microstructure
Ni-Chrome - Electrolytic polishing
Ni-Chrome - Electrolytic polishing
Ni-Co (15%) specimens - Electrolytic thinning
Ni-Co alloy - Alloy with 32 at.% Ni
Ni-Co alloy - Electrolytic thinning
Ni-Co alloy - Electrolytic thinning by window technique
Ni-Co-Al alloys - Electrolytic polishing and etching
Ni-Co-Cr alloy - 29-34 wt.% Ni, 30-34 wt.% Co, 32-41 wt.% Cr
Ni-Co-Cr alloy - 29-34 wt.% Ni, 30-34 wt.% Co, 32-41 wt.% Cr
Ni-Co-Cr alloy - Electrolytic thinning
Ni-Co-Cr-Mo alloy - 30-32 wt.% Ni, 30-32 wt.% Co, 34 wt.% Cr, 2-7 wt.% Mo
Ni-Co-Cr-Mo alloy - 30/32 wt.% Ni-30/32 wt.% Co-34/30 wt.% Cr-1/7 wt.% Mo
Ni-Co-Cr-W alloy - 28-32 wt.% Ni, 28-32 wt.% Co, 32-34 wt.% Cr, 2-11 wt.% W
Ni-Co-Cr-W alloy - 28-32 wt.% Ni-28-32 wt.% Co-32-34 wt.% Cr-2-11 wt.% W
Ni-Co-Ti alloy - Ti4Co3Ni - General microstructure
Ni-Cr specimens - Electrolytic polishing
Ni-Cr alloy - Alloys with < 20% Cr - General microstructure
Ni-Cr alloy - Alloys with 10-12% Cr - General microstructure
Ni-Cr alloy - Electrolytic polish and etching
Ni-Cr alloy - Electrolytic thinning by window technique
Ni-Cr alloy - Ni2Cr - Electrolytic polishing
Ni-Cr alloy - Preferential electrolytic polishing for chromium rich phases
Ni-Cr alloys - Chemical etching
Ni-Cr alloys - Chemical etching
Ni-Cr alloys - Electrolytic etching
Ni-Cr alloys - Electrolytic etching
Ni-Cr alloys - Electrolytic etching
Ni-Cr alloys - Electrolytic etching - General microstructure
Ni-Cr alloys - Electrolytic etching - General microstructure
Ni-Cr alloys - Electrolytic etching - General microstructure
Ni-Cr alloys - Etching for carbides
Ni-Cr as an evaporated thin film on (100) oriented Si wafers - Chemical etching
Ni-Cr evaporated thin films on (100) Si wafers - Chemical etching
Ni-Cr matrix - TaC wire composite-Shows up fibre shape and facets (111) planes in FCC matrix
Ni-Cr residual metals - Chemical cleaning
Ni-Cr specimens - Chemical etching
Ni-Cr specimens - Electrolytic cutting
Ni-Cr specimens - Electrolytic thinning
Ni-Cr stainless steel - Fe-20Cr-25Ni-0.4Mn-0.5Nb-0.01C
Ni-Cr steel - Fe-3.5Ni-1.4Cr-0.3C - General microstructure
Ni-Cr steel - Fe-3.5Ni-1.7Cr-0.3C - General microstructure
Ni-Cr thin film deposition as a bimetallic layer of Au/Ni-Cr - Chemical etching
Ni-Cr-Al alloy - 82Ni-12Cr-6Al - Electrolytic polishing
Ni-Cr-Al alloy - Electrolytic thinning by window technique
Ni-Cr-Al alloy - Ni-Al/Cr eutectic
Ni-Cr-Al alloy - NiAl/Cr eutectic
Ni-Cr-Al alloy - NiAl0Cr eytectic 33 at.% Ni, 33 at.% Al, 34 at.% Cr
Ni-Cr-Al alloys - Chemical etching - General microstructure
Ni-Cr-Al-C alloy - Ni-15Cr-3/10Al-0.05/0.3C
Ni-Cr-Al-Mo alloy - (NiAl-Cr(Mo)) eutectic
Ni-Cr-Al-Mo-Nb-Ti-Zr alloy - Inco 713LC Ni-12Cr-6Al-0.8Ti-4.6Mo-1.5/2.5Nb-0.1Zr-(+C,B)
Ni-Cr-Al-Ta alloy - Ni-16Cr-5Al-4Ta - Reveals gama prime precipitates
Ni-Cr-Al-Ti alloy - 10-12 Cr, 5-6 Ni, 1 Ti - General microstructure
Ni-Cr-Al-Ti alloy - In 853 or Inconel MA 753, Ni-19Cr-1.2Al-2.4Ti (+Zr, B, Y2O3)
Ni-Cr-Al-Ti alloy - Ni-15Cr-3(Ti+Al), Ni-20Cr-3(Ti+Al), Ni-20Cr-4(Ti+Al)
Ni-Cr-Al-Ti alloy - Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti (at.%) - General microstructure
Ni-Cr-Al-Ti-C alloy - 10-12% Cr, 5-6% Al, 1% Ti, 0.1% C
Ni-Cr-Al-Ti-C alloy - Ni-15Cr-1/4.5Al-2.5/6Ti-0.15/0.25C
Ni-Cr-Al-Ti-Ta alloy - 10-12 Cr, 5-6 Al, 1 Ti, 0.15 Ta
Ni-Cr-Al-Ti-Ta-C alloy - 10/12Cr-5/6Al-1Ti-0/15Ta-0/1C
Ni-Cr-Al-Ti-W alloy - Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti-<4W (at.%)
Ni-Cr-Al-Ti-Y alloy - Inconel MA753 Ni-22Cr-1.6Al-2.7Ti-1.3Y2O3
Ni-Cr-Al-yttria alloy - 48Ni-16Cr-5Al-1Y2O3
Ni-Cr-C alloy - Fe-25Cr-0.25C - General microstructure
Ni-Cr-C alloys - Electrolytic etching - General microstructure
Ni-Cr-Co-C alloys - 25Cr-30Co-0.15C-Ni, Co-25Cr-10Ni-0.15/0.25 C
Ni-Cr-Co-Mo-Ti-Al-Fe-C alloy - Waspaloy Ni-0.06C-19Cr-4Mo-14Co-0.5Fe-1.4Al-3Ti
Ni-Cr-Fe alloy - Alloys with up to 40% Fe - Reveals chromium rich alpha and sigma phases
Ni-Cr-Fe alloy - Electrolytic thinning by Bollmann technique
Ni-Cr-Fe alloys (Inconel) - Electrolytic thinning
Ni-Cr-Fe aloys - Chemical etching - General microstructure
Ni-Cr-Fe aloys - Chemical etching - General microstructure
Ni-Cr-Fe-Al alloy - Up to 40% Fe and 2% Al - Electrolytic polishing
Ni-Cr-Fe-Mo alloys - Hastelloy X Ni-21Cr-18Fe-9Mo (+C)
Ni-Cr-Fe-Mo-Co-Mn-W-C alloy - Ni-21Cr-19Fe-8.6Mo-2Co-0.6Mn-0.5W-0.1C, Hastelloy X
Ni-Cr-Fe-Mo-Nb alloys - Inconel 718, Ni-19Cr-19Fe-3Mo-5Nb+Al,Ti,C
Ni-Cr-Fe-Nb alloy - Up to 40% Fe and 1% Nb - Electrolytic polishing
Ni-Cr-Fe-Si alloy - Alloys with up to 40% Fe, 1% Si - Electrolytic polishing
Ni-Cr-Mn steel - Fe-0.3C-8/21Ni-9Cr-2Mn
Ni-Cr-Mo-Al-C alloy - Ni-15Cr-3/5Mo-7Al-0.2C
Ni-Cr-Mo-C alloy - Ni-15Cr-5Mo-0.2C
Ni-Cr-Mo-Ti-Al-C alloy - Ni-15Cr-0.1/5Mo-2.5/3.5Al-4.5/5.5Ti
Ni-Cr-Mo-W-Al-Ta-C alloy - Ni-6Cr-3Mo-5W-6Al-8Ta-0.1C
Ni-Cr-Ta alloy - 10-12% Cr, 0-15% Ta - General microstructure
Ni-Cr-Ta alloy - 25 wt.% Ta, 10 wt.% Cr - General microstructure
Ni-Cr-Ta-C alloy - 10-12 Cr, 0-15 Ta, 0-1 C
Ni-Cr-Th alloy - 20% Cr, 2% ThO2 - Electrolytic polishing and etching
Ni-Cr-Th alloy - Electrolytic and chemical etching
Ni-Cr-Th alloy - Ni-20Cr-1.35/2.50 ThO2 - Electrolytic thinning and chemical etching
Ni-Cr-Ti alloy - Electrolytic thinning by window technique
Ni-Cu alloy (Monel) - Chemical etching - General microstructure
Ni-Cu alloy - Electrolytic thinning by window technique
Ni-Cu alloys (Monel) - Electrolytic polishing, chemical etching
Ni-Cu alloys - For revealing grain structure
Ni-Fe alloy - 33Ni-67Fe - General microstructure
Ni-Fe alloy - 50Ni-50Fe, 75Ni-25Fe - Shows secondary twins in drawn and rolled material
Ni-Fe alloy - Differences of orientation of martensite plates within prior austenite grains
Ni-Fe alloys (Ni3Fe) - Chemical etching - General microstructure
Ni-Fe alloys - Chemical etching
Ni-Fe alloys - Chemical etching
Ni-Fe alloys - Chemical etching
Ni-Fe alloys - Chemical etching - General microstructure
Ni-Fe alloys, reveals grain boundaries - Chemical ecthing
Ni-Fe, Ni-Mn and Ni-Mo alloys - Chemical etching
Ni-Fe-Cr-Mo alloy - Electrolytic thinning by Bollmann technique
Ni-Fe-Cr-Mo alloys - Hastelloy X.280 Ni-20Fe-22Cr-9Mo-low C
Ni-Fe-Cr-Mo-Ti-Al-C alloy - 901 alloy Ni-0.05C-13Cr-5.6Mo-36.5Fe-0.25Al-2.9Ti
Ni-Fe-Cr-P-B alloy - Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
Ni-Fe-Cr-P-B alloy - Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
Ni-Fe-Cr-Ti alloy - IN 744X, Fe-26.5Cr-6.6Ni, 0.20Ti (+ 0.06 C)
Ni-Fe-Cr-Ti alloys - Chemical etching - General microstructure
Ni-Fe-Cr-Ti alloys - For alloys with Ni-26Fe-35Cr-0.6Ti
Ni-Fe-Mo-Zr alloy - Ni-12.7Fe-6.7Mo-0.4Zr
Ni-Fe-P-B alloy - Ni40-Fe40-B14-B6 - Electrolytic polishing
Ni-Fe-Ti alloy - Fe-12Ni-0.25Ti
Ni-Fe-Ti alloy - Fe-12Ni-0.25Ti
Ni-Fe-Ti alloy - Fe-6Ti-10-25Ni
Ni-Fe-Ti alloy - Ti4Ni3Fe - General microstructure
Ni-Ga alloy - Alloy with approx. 50 at.% Ga
Ni-Ga alloy - Ni3Ga - General microstructure
Ni-Ge alloys (Ni3Ge single crystal) - Electrolytic polishing
Ni-Mn alloy - Approx. Ni3Mn
Ni-Mn alloy - Electrolytic thinning
Ni-Mn alloys - Dislocation etching
Ni-Mn alloys - Electrolytic polishing
Ni-Mn steel - 0.3% C-28% Ni-0.5% Mn
Ni-Mo alloy - Alloy with 16.7 at.% Mo
Ni-Mo alloy - Ni-12/33Mo
Ni-Mo alloy - Ni4Mo
Ni-Mo alloy - Ni4Mo - Electrolytic polishing
Ni-Mo alloy - Ni4Mo - Electrolytic thinning
Ni-Mo alloy - Ni4Mo and Ni3Mo
Ni-Mo alloys - Chemical etching - General microstructure
Ni-Mo steel - Fe-24Ni-4Mo-0.25C
Ni-Mo-Cr-Ti-C alloy - Hastelloy-N, Ni-13Mo-4Cr-2Ti-0.06C
Ni-Mo-Fe alloy - Hastelloy B 65Ni-27Mo-5Fe (+0.3Co, 0.3Si, 0.5Mn, 0.4Cr, 0.3V)
Ni-Nb alloy - Electrolytic thinning for foils
Ni-Nb alloys (Ni-Ni3Nb eutectic) - Electrolytic thinning
Ni-Nb alloys (Ni-Ni3Nb eutectic) - Sample preparation
Ni-Nb alloys - Chemical etching - General microstructure
Ni-Nb-Al alloys - Electrolytic polishing and chemical ecthing
Ni-Si-B glass - Splat cooled alloys
Ni-Si-B system - Chemical etching - General microstructure
Ni-Ta alloy (25 wt.% Ta) - Electrolytic and chemical etching
Ni-Ta alloy (Ni3Ta) - Chemical etching - General microstructure
Ni-Ta alloy - Electrolytic thinning for films
Ni-Ta alloys (low Ta) - Chemical polishing and etching, electrolytic thinning
Ni-Ta alloys - Chemical etching - General microstructure
Ni-Ta-Cr-Al-C eutectic alloy - 69Ni-10Cr-5Al-15Ta-1C
Ni-Ta-Cr-Mn alloy - 57Ni-21Ta-15Cr-7Mn - General microstructure
Ni-Th system - Alloys with 50-70% Ni
Ni-Ti alloy (10 at.% Ti) - Chemical etching - General microstructure
Ni-Ti alloy (NiTi) - Chemical etching - General microstructure
Ni-Ti alloy (NiTi) - Chemical polishing
Ni-Ti alloy (NiTi) - Electrolytic polishing and thinning
Ni-Ti alloy (NiTi) - Electrolytic thinning
Ni-Ti alloys - Chemical etching
Ni-Ti alloys, superalloys - Chemical etching - General microstructure
Ni-Ti-Al alloy - TiNi + 0.05/3.4 at.% Al
Ni-Ti-Al-Si alloys - Chemical etching - General microstructure
Ni-Ti-C alloy - Alloys with 2 wt.% Ti and 0.4 wt.% C
Ni-Ti-Cr-Al alloy - NiTi-2.5 at.% Al-1.5/5 at.% Cr - General microstructure
Ni-V alloy (Ni3V) - Electrolytic thinning and polishing
Ni-V system (Ni3V) - Electrolytic thinning
Ni-W alloy (45% W) - Electrolytic polishing
Ni-W alloys (Ni-26/38% W) - Electrolytic polishing
Ni-W alloys - Electrolytic etching - General microstructure
Ni-Zn alloys (56 wt.% Zn) - Chemical etching - General microstructure
Ni-Zn alloys - Chemical etching
Ni-Zn alloys - Chemical etching - General microstructure
Ni-Zn ferrite (Fe-Ni-O-Zn) - Chemical etching - General microstructure
Ni-Zn ferrite (Fe-Ni-O-Zn) - Ni0.36 x Zn0.64 x Fe2O3
Ni-Zr alloys - Electrolytic etching - General microstructure
Ni-base superalloy - Electrolytic polishing
Ni-base superalloys - Electrolytic polishing
Ni22Cr9Mo steel - Chemical etching
Ni2B thin film - Metal forming
Ni50Al46Nb4 or Ni40Al39Nb21 alloys - Twin jet polishing mehod
NiAl single crystal specimens - Electrolytic polishing
NiAl specimens and alloys - Electrolytic polishing
NiB thin films - Ketone, cleaning
NiChrome 80-20 etchant - Chemical etching
NiChrome 80-20 etchant - Chemical etching
NiChrome 80-20 etchant - Electrolytic etching
NiCu (30%) single crystal - Thermal forming
NiCu (5%) to NiCu (80%) single crystal wafers - Chemical etching
NiI single crystal - Alcohol removal
NiMn single crystal specimens - Electrolytic etching
NiO (100) cleaved wafers - Thermal etching
NiO - Chemical etching - General microstructure
NiO - Dislocation etching
NiO - Electrolytic etching - General microstructure
NiO single crystal specimens - Physical thinning
NiO specimens - Chemical etching
NiO thin film platelets - Chemical etching
NiS as the natural mineral Millerite - Chemical etching
NiSi thin films deposited on silicon substrates - Ionized gas etching
NiSi2 thin films deposited on silicon wafers - Chemical cleaning
NiSi2 thin films grown on silicon substrates - Chemical etching - General microstructure
NiTi shape memory alloys - General etchant - General microstructure
NiTi shape memory and superelastic alloys - Chemical etching - General microstructure
NiTi single crystal specimens - Chemical etching
NiZn ferrite and Ni ferrite - Chemical etching
Nichrome (20% Cr) - Chemical etching - General microstructure
Nichrome-lanthanum oxide system - Ni-20Cr-1.2/1.6La2O3
Nickel aluminate spinel - Chemical etching - General microstructure
Nickel - Ni-Ag, Ni-Al, Ni-Cr, Ni-Cu, Ni-Fe, and Ni-Ti alloys
Nickel - 80Ni-20Cr and 35Ni-20Cr-45Fe alloys - General microstructure
Nickel - Carbides in Ni-Cr alloys
Nickel - Chemical etching
Nickel - Chemical polishing
Nickel - Chemical polishing
Nickel - Contrast etching
Nickel - Electrolytic etching
Nickel - Electrolytic etching
Nickel - Electrolytic etching
Nickel - Electrolytic etching - General microstructure
Nickel - Electrolytic etching - General microstructure
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing
Nickel - Electrolytic polishing and etching
Nickel - Electrolytic polishing and etching
Nickel - Electrolytic polishing, chemical etching
Nickel - Electrolytic thinning
Nickel - Electrolytic thinning
Nickel - Electrolytic thinning
Nickel - Electrolytic thinning
Nickel - Electrolytic thinning by Bollmann technique
Nickel - Electrolytic thinning by window technique
Nickel - Electrolytic thinning by window technique
Nickel - Ni and Ni base alloys, Ni-Cr alloys - General microstructure
Nickel - Ni and Ni base alloys, Ni-Cr and Ni-Cr alloys
Nickel - Ni and Ni base alloys, Ni-Cr and Ni-Fe alloys, cast alloys
Nickel - Ni and Ni base alloys, Ni-Cr, Ni-Fe alloys, superalloys of the Nimonic type
Nickel - Ni base superalloys - Gamma precipitates - Ti and Nb microsegregations
Nickel - Ni base superalloys - General microstructure
Nickel - Ni silicides - General microstructure
Nickel - Ni-Al alloys - General microstructure
Nickel - Ni-Al, Mo-Ni, Ni-Ti alloys - General microstructure
Nickel - Ni-Au, Ni-Mo, and Ni-Cr alloys - Micro inhomogenities in superalloys
Nickel - Ni-Cu alloys, Ni base superalloys - General microstructure
Nickel - Ni-Fe and Ni-Al alloys - General microstructure
Nickel - Ni-Fe, Ni-Cu, and Ni-Ag alloys, Ni base superalloys
Nickel - Ni-Zn alloys - General microstructure
Nickel - Ni-Zn-Ag, Ni-Ag-Ni-Cu, and Ni-Al-Mo alloys
Nickel - One of the best electrolyte for universal use
Nickel - Pure types of Ni and alloys with high Ni content, Ni-Ti and Ni-Cu alloys
Nickel - Pysical etching
Nickel alloy - Jet machinning
Nickel alloys - Electrolytic polishing
Nickel alloys - Electrolytic polishing
Nickel and Ni-Co alloys - Electrolytic polishing
Nickel and Ni-Cu alloys - Chemical etching - General microstructure
Nickel and nickel alloys - Electrolytic polishing
Nickel and nickel alloys - Electrolytic polishing
Nickel and nickel alloys - Electrolytic polishing
Nickel and nickel alloys - Electrolytic polishing
Nickel and nickel alloys - Electrolytic polishing
Nickel and nickel alloys - Electrolytic polishing
Nickel and nickel-copper alloys (Ni-Cu) - For Monel K-500 alloy
Nickel and nickel-copper alloys (Ni-Cu) - For revealing grain boundaries
Nickel and nickel-copper alloys (Ni-Cu) - Microscopic examination of grain boundaries and general structure
Nickel base alloy - Electrolytic thinning by PTFE holder
Nickel base superalloy - Selective phase contrasting
Nickel base superalloy GMR 235 - Chemical etching - General microstructure
Nickel deposits on steel - Chemical etching
Nickel ferrite (Ni-Fe-O) - Chemical etching - General microstructure
Nickel oxide (NiO) - Chemical etching
Nickel oxide (NiO) - Chemical thinning
Nickel phosphorus alloys (Ni-P) - Electrolyticlytic and chemical polishing
Nickel phosphorus glass (Ni-P) - Ni80P20
Nickel plating
Nickel single crystal - Electrolytic polishing
Nickel specimens - Chemical etching - General microstructure
Nickel specimens - Chemical etching - General microstructure
Nickel specimens - Chemical etching - General microstructure
Nickel specimens - Chemical etching - General microstructure
Nickel specimens - Electrolytic polishing
Nickel specimens TD - Thorium deposited nickel - Etch for grain boundary
Nickel specimens and nickel alloys - Electrolytic polishing
Nickel superalloy 718 - Chemical etching - General microstructure
Nickel superalloy 718 - Chemical etching - General microstructure
Nickel superalloy 718 - Chemical etching - General microstructure
Nickel superalloy 718 - Electrolytic etching - General microstructure
Nickel superalloy 718 - Electrolytic etching - General microstructure
Nickel superalloy 718 - Electrolytic etching - General microstructure
Nickel superalloy 718 - Electrolytic etching - General microstructure
Nickel superalloys - Etching for gamma prime in superalloys
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel superalloys - Production of thin foils for electron microscopy
Nickel(CP, HP) - Dislocation etching
Nickel-Ni base superalloys - Especially suitable for Hastelloy types
Nicrofer alloy - Electrolytic polishing
Nimonic 105 - Ni-0.14C-0.3Fe-14.4Cr-1.3Ti-4.7Al-20Co-5Mo
Nimonic 115 alloy - Ni-15Cr-15Co-4Ti-3.5Mo-5Al
Nimonic 80 alloy - Ni-21Cr-2.7Ti-1.6Al-1.5Fe-2Co-0.8Si-0.4Mn-0.2Cu-0.1C
Nimonic 80A - Electrolytic thinning, electrolytic polishing
Nimonic 80A - Ni-20Cr-1.3Al-2.3Ti
Nimonic PE 16 - Fe-43.5Ni-16.5Cr-1.2Ti-3.2Mo-1.2Al
Nimonic alloys - Nimonic 108, 109, 115, 120, EPK 55, Nimonic PK 33 and PK 50
Nimonic alloys - Nimonic 263 - General microstructure
Nimonic alloys - Nimonic 75, 80A, 90, 93, 105, 108, 109, 115, 120, EPK 55, and EPK 57. Nimocast alloys
Nimonic alloys - Nimonic 901 - General microstructure
Nimonic alloys - Nimonic PE 7, PE 11, PE 16, Nimonic 901
Nimonic alloys - Nimonic PK 31 - General microstructure
Nimonic alloys - Nimonic PK 31, Nimonic EPK 57
Nimonic alloys - Nimonic PK 31, Nimonic EPK 57 - General microstructure
Nimonic alloys - Nimonic PK 33, PK 50, Nimonic 901
Nimonic alloys - Nimonic alloys 75, 80A, 90, 93, 105
Niobium (high purity) - Etch pit etching
Niobium - Attack polishing
Niobium - Cathodic etching
Niobium - Chemical etching
Niobium - Chemical etching
Niobium - Chemical etching
Niobium - Chemical etching
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Cr, Nb, and alloys - General microstructure
Niobium - Dislocation etching
Niobium - Dislocation etching
Niobium - Dislocation etching
Niobium - Dislocation etching
Niobium - Dislocation etching
Niobium - Dislocation etching
Niobium - EBSD sample preparation - Dislocation etching
Niobium - Electrolytic etching
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic polishing
Niobium - Electrolytic thinning
Niobium - Electrolytic thinning
Niobium - Electrolytic thinning
Niobium - Electrolytic thinning
Niobium - Electrolytic thinning (wire)
Niobium - Electrolytic thinning by window technique
Niobium - Electrolytic thinning by window technique
Niobium - Electromechanical polishing
Niobium - Etch pits etching
Niobium - Final electrolytic polishing
Niobium - For dislocation etch pits
Niobium - Mo, Ta, Nb, Mo-Ti alloys, Ta-Nb alloys, Pure V and V base alloys
Niobium - Nb, Ta, Mo and their alloys
Niobium - Ta and Ta base alloys, Nb and Nb base alloys
Niobium - Ta base alloys, Nb base alloys
Niobium - Ta base and Nb base alloys
Niobium - Ta, Nb, and their alloys, Cr and Cr silicide, Re silicide, W-Th alloys
Niobium - Twin jet electrolytic polishing
Niobium carbide (NbC) - Dislocation etching
Niobium carbide (NbC) - Thermal etching
Niobium oxide (NbO, Nb2O3, Nb2O5) - Chemical etching - General microstructure
Niobium single crystal - Chemical polishing
Niobium single crystal - Electrolytic polishing
Niobium single crystal - Electrolytic polishing
Niobium single crystal - Produces triangular etch pits on (111) planes
Niobium specimens - Chemical etching - General microstructure
Niobium specimens - Chemical etching - General microstructure
Niobium specimens - Chemical etching - General microstructure
Niobium specimens - Chemical etching - General microstructure
Niobium specimens - Chemical etching - General microstructure
Niobium specimens - Chemical etching - General microstructure
Niobium, Tantalum - Attack polishing
Niobium, Tantalum - Attack polishing
Niobium-Tin (Nb-Sn) - Nb3Sn - General microstructure
Niobium-tin (Nb-Sn) - Chemical thinning
Nital (0.5-10%) - Yb-Zn system - Chemical etching
Nital (1%) - Co-Ce-Fe alloy - Co5CeFe02
Nital (1%) - Co-Dy-Mn alloy - Co5DyMn0.2 - General microstructure
Nital (1%) - Co-Dy-Ni alloy - Co5DyNi0.2 - General microstructure
Nital (1%) - Co-Dy-Pb alloy - Co5DyPb0.2 - General microstructure
Nital (1%) - Co-Dy-Pd alloy - Co5DyPd0.2 - General microstructure
Nital (1%) - Co-Dy-Pt alloy - Co5DyPt0.2- General microstructure
Nital (1%) - Co-Dy-Si alloy - Co5DySi0.2- General microstructure
Nital (1%) - Co-Er alloys - Chemical etching - General microstructure
Nital (1%) - Co-Er-Fe alloy - Co5ErFe0.2- General microstructure
Nital (1%) - Co-Fe-Y alloy - Y-Co(1-x)-Fe(x)- General microstructure
Nital (1%) - Co-Gd-Fe alloy - Co5GdFe0.2 - General microstructure
Nital (1%) - Co-Ho system - Approx. HoCo5
Nital (1%) - Co-Ho-Fe alloy - Co5HoFe0.2 - General microstructure
Nital (1%) - Co-La-Fe alloy - Co5LaFe0.2 - General microstructure
Nital (1%) - Co-Lu alloy - Approx. LuCo5
Nital (1%) - Co-Nd-Fe alloy - Co5NdFe0.2 - General microstructure
Nital (1%) - Co-Pr-Fe alloy - Co5PrFe0.2 - General microstructure
Nital (1%) - Co-Sm-Al alloy - Co5SmAl0.2 - General microstructure
Nital (1%) - Co-Sm-Fe alloy - Co5SmFe0.2 - General microstructure
Nital (1%) - Co-Tb alloy - Approx. TbCo5
Nital (1%) - Co-Tb-Al alloy - Co5TbAl0.2 - General microstructure
Nital (1%) - Co-Tb-Fe alloy - Co5TbFe0.2 - General microstructure
Nital (1%) - Co-Tm alloy - Approx. Co5Tm
Nital (1%) - Co-Yb alloy - Aprox. YbCo5
Nital (1%) - Fe-Ni-Co alloy - Iron rich alloys
Nital (1%) - La-Cd alloys - Chemical etching
Nital (1%) - La-Ni alloys - Chemical etching
Nital (1%) - Mn-C alloys - Chemical etching
Nital (10%) - Magnesium - Chemical polishing
Nital (10%) - Nickel superalloy 718 - Electrolytic etching - General microstructure
Nital (2%) - Ce-Zn alloys - Chemical etching
Nital (2%) - Fe-Mo-Co alloy - Chemical etching
Nital (2%) - Mg-Li alloys - Chemical etching
Nital (2-10%) - Pr-Zn alloys - Chemical etching
Nital (3/4%) - Y-Mn alloys - Chemical etching
Nital - AISI 4340 annealed steel - Chemical etching - General microstructure
Nital - Carbon and alloy steels - Develops ferrite grain boundaries in low carbon steels
Nital - Carbon and alloy steels with medium carbon content - General structure (most used etchant for routine work)
Nital - Cd-Sc alloy - Alloy with 3% Sc
Nital - Co-Ce-Al alloy - Ce(1-x) Al (x) Co5, 0< x < 0.6
Nital - Co-Pr-Al alloy - Co5Pr(x)Al(1-x) - General microstructure
Nital - Dual-phase steel
Nital - Fe pure metal samples - Chemical etching
Nital - Fe-Ni (5%)-O (15%) specimens - Chemical etching
Nital - Iron and steels - Chemical etching
Nital - Iron, steels, cast irons - Most common etchant - General microstructure
Nital - Mg and alloys - Chemical etching
Nital - Permanent magnet materials - Rare earth (Co3Cu1.6Fe0.5Ce)
Nital - Pure Gd, RE-Co alloys, grain bounday etchant - Chemical ecthing
Nital - Pure iron, carbon steels, low-alloy steels, and gray cast irons and other alloys
Nital - Steel, carbon type - Chemical etching - General microstructure
Nital - Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 800, general structure; grain boundaries
Nital - Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 825, general structure; grain boundaries
Nital - Zn-Cd alloys - Chemical etching - General microstructure
Nital - Zn-Sn alloy - Zn-Sn alloys processed in a study of solidification in lamellar eutectic systems
Nital 1% - CaCO3 - Dislocation etching
Nital 1% - Co-Dy alloy - DyCo5 alloy
Nital 2% - Cast irons - Observation of ferrite grains boundaries at higher magnification
Nitinol - NiTi alloys
Nitronic 50 (XM-19) stainless steel wire - Chemical etching - General microstructure
Nitrosulfuric (Wesley Austin's) etchant - Iron and steels - Chemical etching
Nivco alloy - Chemical etching - General microstructure
No. 25 alloy - Shows twinned structure
No. 36 alloy - Chemical etching - General microstructure
No.176 alloy - Electrolytic etching
Non-oxide ceramics - Thermal etching
Noren's etchant - Steel weld - Chemical etching
Np specimens - Chemical polishing/etching
O.R.F. formulation - For Mo
OFHC copper, Cu-Zn alloys (10-15% Zn), Cu-7.5% Al alloy - Chemical polishing
ORNL color etchant - For molybdenum - General microstructure
OSD alloy MA956 - Fe-20Cr-4.5Al-0.5Ti-0.5Y2O3
Oberhoffer's etchant - Unalloyed and low-alloy steels
Os - Electrolytic etching - General microstructure
Os alloys - Chemical etching
Os and Os-W alloys - Chemical etching
Os specimens - Chemical etching
Os-Ir alloys - Chemical etching
OsS2 single crystal specimens - Chemical polishing
OsTe2 single crystal specimens - Chemical polishing
Osmium - Electrolytic polishing
Osmium - Os and Os-W alloys - General microstructure
Osmium - Os base alloys, pure Pd and Pd alloys, Pt-Au alloys, Ir - General microstructure
Oxide Ceramics (Be, Zr, Mg, Ca) - BeO, Zr2O3, BaO, MgO, Ca8Zr1-xOy
Oxide ceramics (Al, Si, Be) - Al2O3, SiO2, BeO-UO2-Y2O3 mixtures (toxic)
Oxide ceramics (Al, U, Th) - Al2O3, UO2,ThO2, Al2O3-MgO mixtures
Oxide ceramics (Ca, Mg) - CaO, MgO - General microstructure
Oxide ceramics (Ce, Sr, Al, Zr)-CeO, SrTiO3, Al2O3, ZrO-ZrC mixtures
Oxide ceramics (Mg, U) - MgO, UO2
Oxide ceramics (Th, Y) - ThO2-Y2O3 mixtures (toxic) - General microstructure
Oxide ceramics (U, Th, Pu)-UO2, ThxUyO2 (toxic), PuO2, cast (toxic), PuO2 (gamma, sintered)-toxic
Oxide ceramics (Zr, U, Nd) - ZrO2, U3O8 (toxic)
Oxide ceramics - Al2O3 - Relief formation
Oxide ceramics - Al2O3, Al2O3 x MgO, SnO2 - Physical etching
Oxide ceramics - Al2O3, Al2SiO5 - General microstructure
Oxide ceramics - Al2O3, BeO, UO2
Oxide ceramics - BaTiO3, BaTi3O7 - General microstructure
Oxide ceramics - BeO - General microstructure
Oxide ceramics - BeO - General microstructure
Oxide ceramics - CaO - General microstructure
Oxide ceramics - Cr2O3, CeO2, Al2O3 - General microstructure
Oxide ceramics - Eu2O3 - General microstructure
Oxide ceramics - MgO, ThO2, Al2NiO4, PuO3 (gamma, sintered), Y2O3-ZrO2 and Sm2O3-ZrO2 mixtures
Oxide ceramics - MgO-Al2O3-SiO2-ZrO2 mixtures - General microstructure
Oxide ceramics - Nb oxides, NbO (blue), NbO2 (cyan), Nb3O3 (red-dish-brown)
Oxide ceramics - NiO - General microstructure
Oxide ceramics - U4O9 (toxic) - General microstructure
Oxide ceramics - UO2 - General microstructure
Oxide ceramics - UO2 - General microstructure
Oxide ceramics - UO2 - General microstructure
Oxide ceramics - UO2 - Grain size
Oxide ceramics - UO2, UO2-PuP2, UO2-U4O9 and UO2-CeO2 mixtures
Oxide ceramics - UO2-PuO2 mixtures - General microstructure
Oxide ceramics - ZnO - General microstructure
Oxide ceramics combinations - Thermal and chemical etching
Oxide ceramics combinations - Thermal and chemical etching
Oxide dispersion hardened MA6000L alloy - Ni-14Cr-4.6Al-4W-2.3Ti-2.1Ta-2Mo-0.75Y-0.6O2-0.2Fe-0.2N-0.07C-0.07Zr (+B)
Oxide scale - NiO - Potentiostatic etching
Oxygen enriched Zircaloy 2 - Zr-1.2/1.3Sn-< 0.12O2 - 0.13Cr
Oxygen sensing etchant for steels - This etchants is claimed as good for detection of oxygen penetration into steels
Oxyhychroxyapatite - Ca10(PO4)6 x (OH2)2
P etchant - SiO2 thin films deposited on (100) silicon wafers - Chemical etching
P-1 etchant - Zn (0001) wafers - Chemical etching
P-2 etchant - Zn (0001) wafers and cylinders - Chemical etching
P-3 etchant - Zn (0001) wafers and cylinders - Chemical etching
P-ED (EPW) etchant - Si (100) wafers within +/-1? of the plane - Chemical etching
P-Etchant - Chemical etching
P2Cr5 thin film - Chemical etching - General microstructure
P2O5 and other phosphorus compounds - Chemical etching
P2O5 powder - Chemical etching
PBr etchant - CdTe (111), (100), and (110) wafers - Chemical etching
PH13-8 Mo steel - Chemical etching
PLZT [(Pb,La)(Zr,Ti)O3] - Chemical etching
PLZT [(Pb,La)(Zr,Ti)O3] - Chemical etching
PZT (PbZrTiO) - Chemical etching - General microstructure
PZT materials (O-Pb-Ti-Zr) - Chemical ecthing
PZT materials (O-Pb-Ti-Zr) - Chemical etching - General microstructure
PZT materials (O-Pb-Ti-Zr) - Chemical etching - General microstructure
PZT materials (O-Pb-Ti-Zr) - Chemical etching - General microstructure
Palladium - Au alloys with less thn 90% content of precious metals - General microstructure
Palladium - Cathodic etching
Palladium - Chemical etching
Palladium - Chemical etching - General microstructure
Palladium - Electrolytic polishing
Palladium - Electrolytic polishing
Palladium - For Au alloys with high content of precious metals - General microstructure
Palladium - Os base alloys, pure Pd and Pd alloys, Pt-Au alloys, Ir
Palladium - Pure Au and Au-rich alloys, Pd and Pd alloys
Palladium - Pure Au and Pd, Au-Pd, Pd alloys with more than 90% concentration of precious metals
Palladium - Pure Pt and Pd, Au alloys
Palladium alloys - Chemical etching - General microstructure
Palladium and palladium alloys - Electrolytic etching
Palladium welded to Nickel-Silver (Pd, Ni-Ag) - Electric contact material
Palladium-Copper (Pd-Cu) - Electric contact material
Palladium-Platinum-Gold-Silver-Copper-Zinc (Pd-Pt-Au-Ag-Cu-Zn) - Electric contact material
Palladium-Ruthenium (Pd-Ru) - Electric contact material
Palladium-Silver (Pd-Ag) - Electric contact material
Palmerton's etchant - Pure Zn and alloys - Chemical etching
Palmerton's etchant - Zinc specimens - Chemical etching
Palmerton's etchant 2 - Pure Zn and Zn alloys
Palmerton's etchant, modified - All Zn alloys, for pressure die-casting, Zn coatings - Chemical etching
Palmerton's etchant, modified - Zn die-casting alloys - Chemical etching
Palmerton's etchant, modified - Zn-Cu alloys - Chemical etching
Panseri's etchant - Al and Al alloys - Chemical etching
Parameters for the ion beam etching of different layer composites on steel
Pb (100) wafers - Chemical cleaning
Pb (100) wafers - Chemical etching
Pb (100) wafers - Chemical polishing
Pb (100) wafers - Electrolytic polishing
Pb alloys and solders - Chemical etching
Pb and Pb alloys - Chemical etching - General microstructure
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - Electrolytic polishing
Pb and Pb alloys - For etching high Pb content alloys a 5% solution is recommended
Pb and Pb alloys - Pb, Pb-Sb, Pb-Ca and Pb-Sn alloys
Pb and Pb alloys - Pb, Pb-Sb, Pb-Ca and Pb-Sn alloys with low tin content
Pb and Pb-Sn alloys (up to 2% Sb) - Electrolytic etching
Pb and Pb-Sn alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb and alloys - Chemical etching
Pb containing less than 2 Sb - Chemical etching - General microstructure
Pb samples - Chemical etching
Pb single crystal ingots - Chemical etching
Pb single crystal specimens - Chemical polishing
Pb solders and Pb-type alloys - Chemical etching
Pb specimens - Chemical cleaning
Pb specimens - Chemical etching
Pb specimens - Chemical polishing
Pb specimens - Oxide removal
Pb specimens and lead alloys - Chemical etching
Pb specimens and single crystal ingots - Chemical etching
Pb telluride - Attack polishing
Pb telluride - Chemical etching
Pb(NO3)2 grown as single crystals - Chemical polishing
Pb, Pb-Sn alloys (up to 25% Sn) - Chemical etching
Pb, Pb-Sn alloys (up to 3% Sn), and Pb solders - Chemical etching
Pb, Pb-Sn, Pb-Sn-Cd, Pb-Sn-Sb - Electrolytic polishing
Pb-Ag alloys (Pb-rich) - Chemical etching - General microstructure
Pb-Ag eutectic alloy specimens - Chemical etching
Pb-Ag specimen alloys - Electrolytic polishing/etching
Pb-Ag-Sb alloys (Pb-rich) - Chemical etching - General microstructure
Pb-As-Sb alloys - For lead rich alloys
Pb-Au alloys - For Pb rich alloys - General microstructure
Pb-Bi alloys - Chemical and physical etching
Pb-Bi alloys - Chemical etching
Pb-Ca alloys (Pb rich) - Chemical etching - General microstructure
Pb-Ca alloys - Chemical etching - General microstructure
Pb-Ca alloys, inclusions, grain-boundary etchant - Chemical etching
Pb-Cd alloys (Pb rich) - Chemical etching - General microstructure
Pb-Cd and Pb-Sn alloys - Chemical etching - General microstructure
Pb-Cd telleride-Pb(1-x) Cd(x) Te, x <= 0.03
Pb-Cd, Pb-Sn, and Pb-Sb alloys - Chemical etching - General microstructure
Pb-Cd-Sb alloys (Pb rich) - Chemical etching - General microstructure
Pb-Li alloys (Pb rich) - Chemical etching - General microstructure
Pb-Sb alloys - Chemical etching
Pb-Sb alloys - Chemical etching - General microstructure
Pb-Sb alloys - Electrolytic polishing
Pb-Sb alloys, hard lead - White metal and type metal with high Pb content - Chemical etching
Pb-Se-Te system (PbSe(1-x)Te(x)) - Polishing-etching
Pb-Sn + 2% Ag, solder - Chemical etching - General microstructure
Pb-Sn + Ag as various other alloys with or without silver - Chemical etching - General microstructure
Pb-Sn alloy - Chemical cleaning
Pb-Sn alloy contacts on silicon diodes - Chemical cleaning
Pb-Sn alloys (Pb rich) - Sample preparation
Pb-Sn alloys (low Pb) - Chemical etching - General microstructure
Pb-Sn alloys - Chemical etching
Pb-Sn alloys - Chemical etching
Pb-Sn alloys - Chemical etching
Pb-Sn alloys - Electrolytic polishing
Pb-Sn eutectic - Chemical etching - General microstructure
Pb-Sn eutectic - Electrolytic polishing
Pb-Sn eutectic alloy specimens - Chemical etching
Pb-Sn eutectics, solders - Chemical etching
Pb-Sn selenide (Pb(1-x)Sn(x)Se) - Electrolytic polishing and etching
Pb-Sn-Ag (2%), alloy #63 - Chemical cleaning
Pb-Sn-Te system (Pb(1-x)Sn(x))(1-y) Te(y) - Electrolytic polishing and etching
Pb-Sn-Te system - Chemical polishing
Pb-Sn-Te system - Electrolytic etching - General microstructure
Pb-Te-Au system - PbTe-Au section of the diagram
Pb-Te-Fe system - Lead telluride - Iron section
Pb-Ti eutectic alloy specimens - Chemical etching
Pb-rich alloys - Chemical etching
PbAg specimens of alloys - Electrolytic etching
PbGeTe single crystal ingots - Chemical etching
PbI2 as thin crystal platelets - Chemical etching
PbMoO4 single crystals - Pressure
PbO native oxide - Chemical etching
PbO single crystal plates - Cutting
PbS (100) cleaved wafers - Chemical cleaning
PbS (100) wafers - Chemical polishing
PbS (100) wafers - Chemical polishing/etching
PbS (100) wafers - Dislocation etching
PbS (100) wafers - Electrolytic polishing
PbS - Chemical etching - General microstructure
PbS specimen - Chemical etching - General microstructure
PbS, PbSe - Dislocation etching
PbSe (100) cleaved wafers - Chemical cleaning
PbSe (100) wafers - Eelectrolytic polishing/thinning
PbSe (100) wafers and other orientations - Chemical etching
PbSe (100) wafers and other orientations - Chemical polishing
PbSe (100) wafers and other orientations - Electrolytic polishing
PbSe - Dislocation etching
PbSnSe (100) wafers - Electrolytic polishing
PbSnTe (100) wafers - Chemical etching
PbSnTe (100) wafers - Chemical polishing
PbSnTe (100) wafers - Chemical polishing/etching
PbSnTe (100) wafers - Electrolytic polishing
PbTe (100) and PbSnTe (100) wafers - Electrolytic polishing
PbTe (100) cleaved wafers - Chemical etching
PbTe (100) p-type wafers - Oxide removal
PbTe (100) wafers - Chemical etching
PbTe (100) wafers - Chemical etching
PbTe (100) wafers - Chemical polishing
PbTe (100) wafers - Chemical polishing
PbTe (100) wafers - Dislocation etching
PbTe (100) wafers - Electrolytic polishing/etching
PbTe - Dislocation etching
PbTe - Dislocation etching
PbTe specimen - Thermal etching for etch pits
PbTe thin film - Acid float-off
PbZrO3 single crystal specimens - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
Pd 99.95% pure single crystal specimens - Electrolytic polishing
Pd and alloys - Chemical etching
Pd and alloys - Chemical etching
Pd and alloys - Chemical etching
Pd and alloys - Electrolytic etching
Pd single crystals and thin films - Chemical etching
Pd-Ag-Cu alloy - 35 at.% Ag-25 at.% Cu
Pd-Ce alloy - Alloys with 0-50% Ce
Pd-Ce alloy - Approx. Ce3Pd4
Pd-Ce alloy - Pd rich alloys
Pd-Ce alloy - Pd3Ce
Pd-Dy alloys - Electrolytic etching, chemical etching
Pd-Er alloy - Electrolytic and chemical etching
Pd-Er alloy - Er3Pd4 - General microstructure
Pd-Eu alloy - Approx. PdEu - General microstructure
Pd-Ga alloy - Sample preparation with different etching techniques
Pd-Gd alloys (Approx. Gd3Pd4) - Chemical etching - General microstructure
Pd-Gd alloys - Chemical and Electrolytic etching - General microstructure
Pd-Ge system - Pd(x)Ge(1-x), 0.75 <= x =<0.85
Pd-Hf alloys (Approx. 55 at.% Pd) - Chemical etching - General microstructure
Pd-Ho alloys (Approx. Ho3Pd4) - Chemical etching - General microstructure
Pd-Ho alloys - Chemical and electrolytic etching - General microstructure
Pd-Ni alloys - Chemical etching - General microstructure
Pd-Sm alloys - Chemical and electrolytic etching - General microstructure
Pd-U alloys (Up to 25 at.% U) - Chemical etching - General microstructure
Pd-Y alloys - Chemical and electrolytic etching - General microstructure
Pd-Zn system (Pd-45 at.% Zn) - Phsical thinning
Pd-Zn-Ga alloy - PdZn-PdGa pseudo-binary alloys
PdSi and PdSi2 thin films grown on silicon substrates - Chemical etching - General microstructure
Pelleg's electrolytic polishing solution - Niobium - Dislocation etching
Permanent magnet materials - 82Co-6Au-12Fe
Permanent magnet materials - CuNiFe, grain size and structure of the solid-solution alloy
Permanent magnet materials - Vicalloy, general structure
Peroxide etchant (on germanium) - Ge (100) wafers - Chemical etching
Phillip's anodizing solution - Pure Al and Al-Mg alloys - Chemical etching
Phlogophite mica H2KMg3Al(SiO4)3 - Gas drying
Phoschromic etchant - Fe superalloys - Electrolytic etching
Phosphides, sulfides - CdS - General microstructure
Phosphides, sulfides - PbS - General microstructure
Phosphides, sulfides - PuP, PuS - General microstructure
Phosphides, sulfides - UO - General microstructure
Phosphides, sulfides - US - General microstructure
Phospho-picral etchant - Mg and alloys - Chemical etching
Phosphor bronze alloys - Chemical etching - General microstructure
Phosphorus - Chemical etching - General microstructure
Picklesimer's anodizing solution - Nb and alloys - Electrolytic etching
Picklesimer's anodizing solution - Ta and alloys - Electrolytic etching
Picklesimer's anodizing solution - U alloys - Electrolytic etching
Picklesimer's anodizing solution - Zr and alloys - Electrolytic etching
Picklesimer's solution - For Zr, Nb/Sn, Nb/Ti
Picklesimer's solution - Nb-Ti alloy - Anodising
Picklesimer's solution - Nb-Ti alloys
Pickling's anodizing solution - Brass, bronze, and copper alloys - Chemical cleaning
Picral etchant - Carbon and alloy steels - For general structure
Picral etchant - Carbon and alloy steels with medium carbon content - General structure
Picral etchant - Cast iron - General microstructure
Picral etchant - Cast irons - General purpose etching of all pearlitic gray, melleable and ductile cast irons
Picral etchant - Fe, single crystal iron whiskers - Dislocation etching
Picral etchant - Fe-Cr alloys - Chemical etching - General microstructure
Picral etchant - Iron and steels - Chemical etching
Picral etchant - Iron, steels, cast irons - Generally used for iron and heat treated steels
Picral etchant - Pure iron, carbon steels, low-alloy steels, and cast iron
Picral etchant - Steels - Chemical etching - General microstructure
Picral etchant - Steels, high carbon and high alloy types - Chemical etching - General microstructure
Picral etchant - Tin and tin alloys - For etching tin-coated steel and tin-coated cast iron
Picric acid + HCl - Steels - Chemical etching
Piranha - Chemical etching
Plain carbon steel - Chemical etching - General microstructure
Plain carbon steel - Electrolytic polishing
Platinum (Pt) - Pure Pt and Pd, Au alloys
Platinum - Au alloys with less than 90% content of precious metals
Platinum - Chemical polishing
Platinum - Electrolytic lapping
Platinum - Electrolytic polishing
Platinum - Electrolytic polishing
Platinum - Electrolytic polishing
Platinum - Electrolytic polishing
Platinum - Electrolytic thinning
Platinum - Electrolytic thinning by window technique
Platinum - For Au alloys with high content of precious metals
Platinum - Physical etching - General microstructure
Platinum - Pt alloys, Rh, Ir - General microstructure
Platinum - Pt and Pt alloys, Au and Au alloys - General microstructure
Platinum - Pure Au and Au-rich alloys. Pd and Pd alloys
Platinum - Rh base alloys, Pt-10% Rh alloys, Ir alloys, pure Pt and Pt alloys, Ru base alloys
Platinum alloys - Electrolytic etching
Platinum alloys 1 - Electrolytic etching
Platinum alloys 2 - Electrolytic etching
Platinum alloys 3 - Chemical etching
Platinum and platinum alloys - Electrolytic etching
Platinum and related materials - Electrolytic etching
Platinum, Palladium - Attack polishing
Platinum-Iridium (Pt-Ir) - Electric contact material
Platinum-Ruthenium (Pt-Ru) - Electric contact material
Pliskin's etchant - SiO2 thin films deposited on (100) silicon wafers - Chemical etching
Plutonium - Electrolytic etching - General microstructure
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Electrolytic polishing
Plutonium - Pu nad Pu base alloys - General microstructure
Plutonium carbide (PuC) - Electrolytical etching
Plutonium oxide (PuO) - Sample preparation
Plutonium oxide (PuO2) - Chemical etching - General microstructure
Plutonium phosphide - General microstructure
Polisar's etchant - For etch pits on CdTe, CdHgTe, HgTe
Polish - Fairchild's "Magic Polish" - Chemical etching
Polishing aluminum sputtering target - Sample preparation
Poly-Si deposited as silicon-on-insulator structure - Chemical etching - General microstructure
Poly-Si grown on (100) silicon substrates - Chemical etching - General microstructure
Poly-Si material - Chemical etching - General microstructure
Poly-Si material - Chemical polishing
Poly-Si rectangular blocks of silicon - Chemical polishing
Poly-Si wafers - Defects
Poly-Ta rod, sheet, wire - Chemical cleaning
Polyamid (PA) and polyethylene (PE) - Chemical etching
Polycarbonate - Chemical etching
Polycarbonate of styrene, acrylonitrate copolymer - Chemical ecthing
Polycrystalline silicon - Chemical etching - General microstructure
Polyethylene - Reveals lamellar structure - Chemical etching - General microstructure
Polyoxymethylene (POM) - Chemical etching
Polyoxymethylene - Chemical etching - General microstructure
Polyoxymethylene, reveals spherolite cores and growth direction, ploypropylene
Polypropylene (PP) - Chemical etching
Polypropylene (PP) - Chemical etching
Polypropylene - Chemical etching - General microstructure
Polypropylene - Chemical etching - General microstructure
Polypropylene - Spherolites in polyethylene - Chemical etching - General microstructure
Polytetramethylene terephthalate PTMI, Polybutylene terephthalate PBT
Pondo's etchant - Copper
Pondo's etchant - Cu and Cu alloys - Chemical etching
Pondo's etchant - Cu-Sn alloys - Chemical etching - General microstructure
Pondo's etchant - For Cu alloys
Porcelain - Chemical etching
Potash-silica system - Chemical etching - General microstructure
Potash-strontia-niobium oxide system - K2O-SrO-Nb2O5 single crystal
Potassium - Chemical polishing
Potassium - Chemical polishing
Potassium - Chemical polishing
Potassium bromide (KBr) - Dislocation etching
Potassium bromide (KBr)-Potassium chloride mixed crystals - Dislocation etching
Potassium chloride (KCl) - Chemical polishing
Potassium chloride (KCl) - Dislocation etching
Potassium chloride (KCl) - Dislocation etching
Potassium chloride (KCl) - Etch pit etching
Potassium doped lithium carbonate single crystal - Li2O3-1% K2CO3
Poulton's etchant - 6005, 6063 and 6061 Al-Mg-Si alloys - Chemical and electrolytic etching
Pr (0001) wafers - Chemical polishing
Pr specimens - Arc, forming
Pr-Ag alloys - Chemical etching - General microstructure
Pr-Au alloy - Chemical etching - General microstructure
Pr-Pd alloys (Approx. Pr3Pd4) - Chemical etching - General microstructure
PrCo2Si2 single crystals - Chemical etching - General microstructure
Praseodymium - Electrolytic polishing
Praseodymium - Electrolytic polishing
Precipitation hardenable stainless steels - Chemical etching
Precision No. 1 etchant - Ni alloys - Chemical etching
Precision No. 2 etchant - Ni alloys - Chemical etching
Presence of Fe3P in steels - Chemical etching - General microstructure
Presence of SiO2 in Si - Chemical etching - General microstructure
Presence of sigma phase in steel - Electrolytic etching - General microstructure
Primary austenite grain boundaries in low and medium-alloy steels, martensitic and bainitic microstructures - Chemical etching
Pt and Pt alloys with noble metal content bellow 90 - Chemical etching - General microstructure
Pt and Pt alloys, Rh and Rh alloys, Pd-Ag alloys, Ir - Electrolytic etching - General microstructure
Pt and alloys - Chemical etching
Pt and alloys - Electrolytic etching
Pt and alloys - Electrolytic etching
Pt and alloys - Electrolytic etching
Pt and alloys - Electrolytic etching
Pt and alloys - Electrolytic etching
Pt and alloys - Electrolytic etching
Pt as thermocouple wires-paired - Pt and PtRh-Metal, removal
Pt single crystal ingot - Halogen, pasivation
Pt thin film - Acid, float-off
Pt thin films - Chemical etching
Pt-Co alloy - Electrolytic thinning
Pt-Cr alloys - Electrolytic etching - General microstructure
Pt-Pd thin films - Chemical etching
Pt-Sb alloy (PtSb2) - Chemical etching - General microstructure
Pt-Te alloy - No need to etch
Pt-Yb alloys - Chemical etching - General microstructure
Pt2Si thin films formed on silicon, (111) and (100) n-type wafers - Metal deposition
PtAs2 single crystal specimens - Chemical polishing
PtH powder - Chemical cleaning
PtO crystalline thin films - Chemical etching
PtP2 single crystal specimens - Chemical polishing
PtSb2 (100) wafers - Chemical etching
PtSb2 (100), (110) and (111) wafers - Chemical etching
PtSb2 (100), (110) and (111) wafers - Chemical etching
PtSb2 (100), (110) and (111) wafers - Chemical etching
PtSb2 (100), (110) and (111) wafers - Chemical etching
PtSb2 (100), (110) and (111) wafers - Chemical etching
PtSb2 (100), (111) and (110) wafers - Chemical etching
PtSb2 - Dislocation etching
PtSb2 single crystal specimens - Chemical polishing
PtSi specimens - Chemical etching - General microstructure
PtSi thin films deposited on silicon-Ionized gas etching
PtSi thin films grown on silicon substrates - Chemical etching - General microstructure
Pu alloys - Electrolytic etching
Pu specimens - Electrolytic polishing
Pu-Al alloys - Electrolytic polishing
Pu-Al and Pu-Ga alloys - Electrolytic etching
Pu-C alloys - Chemical etching - General microstructure
Pu-Cd alloy - May be examined in the polished unetched state
Pu-Ce alloys - Chemical and electrolytical etching
Pu-Ce-Co alloys - Electrolytic etching
Pu-Ce-Co system - Electrolytic etching - General microstructure
Pu-Fe-C alloy - Final electrolytic polishing
Pu-Ga alloy (1 wt.% Ga) - Chemical etching - General microstructure
Pu-Ga alloy (1 wt.% Ga) - Electrolytic etching - General microstructure
Pu-Ga alloys - Electrolytic etching - General microstructure
Pu-In alloys - Electrolytic etching - General microstructure
Pu-La system - Chemical etching - General microstructure
Pu-Pd alloys (Approx. Pu3Pd4) - Chemical etching - General microstructure
Pu-Zn alloy - Electrolytic and chemical etching
Pu-Zn alloys (Zn rich) - Chemical etching - General microstructure
PuC - Electrolytic etching - General microstructure
PuC - Electrolytic etching - General microstructure
PuO2 - Chemical etching
PuO2 - Chemical etching
PuO2 - Chemical etching - General microstructure
PuP, PuS - Chemical etching - General microstructure
Pure Ag - Electrolytic etching - General microstructure
Pure Ag and Ag alloys - Chemical etching
Pure Ag and Ag alloys - Chemical etching
Pure Ag and some alloys - Chemical etching
Pure Ag, Ag-Cu and Ag alloys - Electrolytic etching - General microstructure
Pure Ag, Ag-Ni alloys, Ag-Pd alloys - General microstructure
Pure Al - Chemical etching
Pure Al, Al-1% Si-1% Fe-0.1% Cu alloy - Chemical polishing
Pure Al, Al-Cu, Al-Mg amd Al-Mg-Si alloys - Chemical etching - General microstructure
Pure Al, Al-Cu, Al-Mg, and Al-Mg-Si alloys - Electrolytic etching - General microstructure
Pure Al, Al-Mg and Al-Mg-Si alloys - Chemical etching - General microstructure
Pure Al, Cu-Al, Mg-Al, Mg-Si-Al, and Zn-Al alloys - Chemical etching - General microstructure
Pure Al2O3, Al2O3 with MgO, Al2O3 with additives CaO, MgO, SiO2, Na2O - Physical etching
Pure Au - Electrolytic etching - General microstructure
Pure Au and Au-rich alloys - Chemical etching - General microstructure
Pure Au and alloys - Chemical etching
Pure Au and alloys - Chemical etching
Pure Be, etch pits - Chemical etching - General microstructure
Pure Be, grain boundaries, impurities, single crystals - Chemical etching - General microstructure
Pure Bi - Electrolytic etching
Pure Co, color etchant - Chemical etching - General microstructure
Pure Copper - Electrolytic polishing
Pure Cu - Electrolytic etching
Pure Cu and Cu-5% Be, Cu-1% Zr, Cu-0.3% Be-2% Ni alloys - Potentiostatic etching
Pure Cu with/without oxide and sulfide inclusions - Chemical etching - General microstructure
Pure Cu, Cu-0.5% Be, Cu-1% Zr, Cu-0.3% Be-2% Ni alloys - Potentiostatic etching
Pure Cu, brasses, Al bronzes, Cu-Ni and Cu-Ag alloys, Alpaca - Chemical etching - General microstructure
Pure Cu, brasses, Alpaca, bronzes, grain boundary etchant - Chemical etching - General microstructure
Pure Fe - Chemical polishing
Pure Gd, for most RE metals and their alloys, Sm-Co alloys - Chemical ecthing
Pure Ge and Ge alloys - Electrolytic etching - General microstructure
Pure Ge, Te, and Se, tellurides, selenides, and Zr silicides - Chemical etching - General microstructure
Pure In - Electrolytic etching
Pure Mg and Mg-rich alloys - Electrolytic etching - General microstructure
Pure Mg and alloys - Chemical etching
Pure Mg and alloys - Chemical etching
Pure Mn and lean alloys - Chemical etching
Pure Molybdenum - EBSD sample preparation
Pure Nb - Electrolytic etching
Pure Ni - Chemical etching
Pure Ni - Chemical polishing
Pure Ni, Ni-Co alloys - Chemical polishing
Pure Ni, Ni-Zn-Ag, Ni-Ag, Ni-Cu and Ni-Al-Mo alloys - Chemical etching - General microstructure
Pure Ni, superalloys, Ni-Cr and Ni-Fe alloys - Chemical etching - General microstructure
Pure Pb - Chemical etching - General microstructure
Pure Pb - Chemical polishing
Pure Pb, Pb alloys - Chemical polishing
Pure Pb, Pb-Ca alloys, Pb with less than 2% Sb - Chemical etching - General microstructure
Pure Pb, Pb-Ca and Pb-Cu alloys - Chemical etching - General microstructure
Pure Pb, Pb-Na alloys - Chemical etching - General microstructure
Pure Pb, Pb-Sn and Pb-Ca alloys - Chemical etching
Pure Pd - Chemical etching
Pure Pt - Chemical etching
Pure Pt - Chemical etching
Pure Pt and Pd, Au alloys - General microstructure
Pure Pt and Pt alloys, Rh-base alloys, Pt-10Rh alloys, Pt-Ir alloys, Ru-base alloys - Electrolytic etching
Pure Pt and Pt with alloy content Rh, Ru, Ir, and Os - Chemical etching - General microstructure
Pure Pu and Pu alloys - Electrolytic etching - General microstructure
Pure Ru - Electrolytic etching - General microstructure
Pure Si and Ge and their alloys, InSb, etch figures of the (111) plane, etches p-n transitions - Chemical etching
Pure Si in Ge and their alloys - Chemical etching - General microstructure
Pure Si, pure Te, pure Se - Chemical etching - General microstructure
Pure Sn - Electrolytic etching
Pure Sn and alloys - Chemical etching
Pure Sn and alloys - Chemical etching
Pure Sn and alloys of Sn and 1% Pb - Chemical etching
Pure Sn, Sn with 1% Pb - Chemical etching - General microstructure
Pure Sn, Sn-Bi alloys - Chemical etching - General microstructure
Pure Te - Chemical etching
Pure Te - Chemical etching
Pure Th and Th alloys - Chemical etching - General microstructure
Pure Ti - Electrolytic etching
Pure Ti - Electrolytic etching - General microstructure
Pure Ti and Ti alloys - Physical etching - General microstructure
Pure Ti and Ti alloys, grain-boundary etchant - Chemical etching
Pure Ti and alloys - Electrolytic etching
Pure Ti and alloys - Electrolytic etching
Pure Ti and alloys - Electrolytic etching
Pure Ti, Ti-base alloys - Electrolytic etching - General microstructure
Pure Ti, alpha Ti, Ti-Al-V-Sn alloys, ferro titanium - Chemical etching - General microstructure
Pure U and U alloys - Chemical etching - General microstructure
Pure U, pure Th - Electrolytic etching - General microstructure
Pure V, V-Al, V-Ga, V-In, V-Si alloy - Anodizing
Pure W (tungsten) - Chemical etching - General microstructure
Pure Zinc - Electrolytic polishing
Pure Zn and Zn-Co and Zn-Cu alloys - Chemical etching
Pure Zn and lean alloys - Electrolytic etching
Pure Zn, Zn-Cu alloys - Chemical etching - General microstructure
Pure Zr - Electrolytic polishing
Pure Zr - Electrolytic polishing
Pure Zr, Zr-U alloys - Chemical etching - General microstructure
Pure Zr, pure Hf, grain constrast - Anodizing
Pure alumina (Al2O3) - Chemical etching - General microstructure
Pure alumina (Al2O3) - Physical etching
Pure cobalt - Electrolytic etching - General microstructure
Pure cobalt - For electron microscopy
Pure copper - Electrolytic polishing
Pure iron - Electrolytic polishing
Pure iron, nitrided with less than 0.015% C - Electrolytic polishing
Pure iron, nitrided with less than 0.015% C - Electrolytic polishing
Pure iron, nitrided with less than 0.015% C - Electrolytic polishing
Pure platinum - Electrolytic etching - General microstructure
Pure tantalum - Polishing
Pure vanadium - Chemical etching
Pure vanadium - Chemical etching
Pure vanadium - Electrolytic etching
Pure vanadium - Electrolytic etching
Pure zinc specimens - Electrolytic polishing
Pyrex blanks - Acid float-off
Pyrex glass beaker - Chemical etching - General microstructure
Pyrolytic SiC - Electrolytic etching
Pyrolytic graphite - Attack polishing
Pyrolytic graphite - Attack polishing
Pyromet 860 alloy - Fe-43Ni-12.6Cr-6Mo-4Co-3Ti-1.25Al (+B)
Pyrophyllite (Al2Si4O10 x (OH)2) - General microstructure
Quenched and tempered steels - Chemical etching
R etchant - For Ti/Al, Ti/Zr
R or A etchant - Ti-Zr alloys - Chemical etching
R-etchant - Ti-Al and Ti-Al-Zr alloys - Chemical etching
R.C. etchant
R.R.E. etchant - For InP, InPAs, GeInPAs
R5In2 grown as single crystals - Chemical etching - General microstructure
RC-1 etchant - GaAs (111) wafers - Dislocation etching
RCA etchant (AB) - SiO2 alpha-quartz frequency crystals - Chemical cleaning
RCA etchant - Si wafers of all major plane orientations - Chemical cleaning
RE metals - Chemical etching
RE metals - Chemical etching
RE metals - Chemical etching
RE metals - Chemical etching
RE metals and alloys - Chemical etching
RE metals, Gd, Er, Ho and Dy - Chemical etching
RE-Co alloys - Chemical etching
RE-Mg alloys - Chemical etching - General microstructure
RIE etchant - TiW thin films - Ionized gas etching
RJFe2 as rare earth ferrites - Chemical etching - General microstructure
RNi6B2 specimens - Chemical etching - General microstructure
Ralph?s etchant - Stainless steel - Chemical etching
Rare earth (RHE) metals and alloys - Chemical etching
Rare earth (RHE) metals and alloys - Chemical etching
Rare earth - Chemical-mechanical polishing
Rare earth - Chemical-mechanical polishing
Rare earth - Chemical-mechanical polishing
Rare earth - Electrolytic polishing and anodozing
Rare earth - Electrolytic polishing and anodozing
Rare earths (Ce, Dy, Er, Eu, Gd, Ho, La, Lu, Nd, Pr, Sm, Sc, Tb, Tm, Yb, Y) - Sample preparation procedure
Rare earths - Electrolytic polishing and etching
Rb metal - Chemical etching - General microstructure
Rb-Fe-F system (RbFeF3 single crystal) - Chemical etching - General microstructure
RbBr (001) wafers - Chemical polishing
RbFeF3 - Dislocation etching
RbI (001) wafers - Chemical polishing
Re (0001) wafers - Chemical etching - General microstructure
Re (0001) wafers - Electrolytic polishing
Re (0001) wafers - Electrolytic thinning
Re - Electrolyticlytic lapping
Re silicides - Chemical etching
Re specimens
Re specimens - Acid oxidation
Re specimens - Chemical etching - General microstructure
Re specimens - Gas oxidation
Re specimens - Molten flux etching
Re, Mo, W alloy - Electrolytic lapping
Re-Hf (<10% Hf) alloys - Chemical etching
Re-Hf alloy - Sample preparation procedure
Re-Hf alloys - Attack polishing
Re-Si system - Chemical etching - General microstructure
Re-W alloys - Electromechanical polishing
Recipe for Au on C and Al/W dendrites
Red brass specimens - Electrolytic etching - General microstructure
Refactaly 26 - Chemical etching - General microstructure
Refractaloy steel - Chemical etching - General microstructure
Refractaloy steel - Chemical etching - General microstructure
Refractaloy steels 80, 90, 100 - Chemical etching - General microstructure
Refractaly - Chemical etching - General microstructure
Rehenium - Electromechanical polishing
Remington A etchant - Ti alloys - Chemical etching
Remington B etchant - Titanium - Chemical etching
Remington's A etchant (Finlay's A etchant) - For Ti alloys
Rene 125 alloy - Ni-10Co-8.9Cr-7.0W-4.75AL-3.8Ta-2.5Ti-2.0Mo-1.5Hf-0.11C (+ 0.05Zr, 0.01B)
Rene 80 alloy - Chemical etching - General microstructure
Rene 80 alloy - Ni-14Cr-4Mo-5Ti-3Al-9Co-4W-0.2C (+ Zr, B)
Rene 95 alloy - 62.2Ni-12.8Cr-8.0Co-3.6Al-3.7Mo-3.5Nb-3.5W-2.6Ti-0.8C by weight
Rene 95 alloy - Ni-01.6C-14Cr-8Co-3.5Mo-2.5W-2.5Ti-3.4Al-3.6Nb
Rene 95 alloy powder - Chemical etching - General microstructure
Rene 95 nickel alloy - Chemical etching
Retained austenite etchant I - Steels - Chemical etching
Retained austenite etchant II - Steels - Chemical etching
Retained austenite etchant III - Steels - Chemical etching
Retained austenite etchant IV - Steels - Chemical etching
Retained austenite in the steels V
Reveals coring in foundry alloys, welds, color etchant - Chemical etching - General microstructure
Rh - Electrolytic etching - General microstructure
Rh alloys - Electrolytic etching
Rh and alloys - Electrolytic etching
Rh-W alloys - Electrolytic etching
Rhenium - Attack polishing
Rhenium - Chemical etching
Rhenium - Chemical etching
Rhenium - Chemical etching
Rhenium - Chemical etching - General microstructure
Rhenium - Cr, Mo, Mo-Cr alloys (up to 80% Cr), Mo-Fe alloys
Rhenium - Electrolytic etching
Rhenium - Electrolytic etching
Rhenium - Electrolytic polishing
Rhenium - Electrolytic polishing
Rhenium - Electrolytic polishing
Rhenium - Electrolytic polishing
Rhenium - Electrolytic polishing
Rhenium - Electrolytic thinning by jet etch
Rhenium - Electrolyticlytic etching
Rhodium - Electrolytic etching
Rhodium - Rh base alloys, Pt-10% Rh alloys - General microstructure
Rhodium and Gold Plated Nickel-Iron (Rh, Au, Ni-Fe) - Electric contact material
Rhodium and Gold plated Nickel-Iron (Rh, Au, Ni-Fe) - Electric contact material
Rhodium specimens - Electrolytic etching - General microstructure
Rhodium specimens - Electrolytic polishing
Rhodium specimens - Pt alloys, Rh, Ir
Rhodium specimens - Pure Au and Pd. Au-Pd, Pd alloys with more than 90% concentration of precious metals
Richard-Crocker's RC etchant - Gallium phosphide (GaP) - Chemical polishing
Richard-Crocker's etchant
Rolls Royce's etchant - Stainless steel - Chemical etching
Roman's etchant - Er, Dy, Gd, Ho, La - Chemical polishing
Roman's etchant - For R.E. alloys
Roman's etchant - Pr-Au alloy - Chemical etching - General microstructure
Roman's etchant - Pr-Ba alloys - Chemical etching - General microstructure
Roman's etchant - Pr-Bi alloys - Chemical etching - General microstructure
Roman's etchant - Pr-Cs alloys - Chemical etching - General microstructure
Roman's etchant - Pr-Hf alloys - Chemical etching - General microstructure
Roman's etchant - Pr-Hg alloys - Chemical etching - General microstructure
Roman's etchant - Pr-Ir alloy
Roman's etchant - Pr-Ir alloy - Chemical etching
Roman's etchant - Pr-Pt alloys - Chemical etching
Roman's etchant - Pr-Re alloys - Chemical etching
Roman's etchant - Pr-Ta alloys - Chemical etching
Roman's etchant - Pr-Tl alloys - Chemical etching
Roman's etchant - Pr-W alloys - Chemical etching
Romans's etchant - Praseodymium-lead alloys (Pr-Pb) - Chemical etching
Romans's etchant - Praseodymium-osmium alloys (Pr-Os) - Chemical etching
Rosenhain's etchant - Co-Sn alloys - Chemical etching
Rowland's etchant - Etchants for galvannealed steels
Ru (100) wafers - Ionized gas cleaning
Ru alloys - Electrolytic etching
Ru, Rh, Ir, Os - Attack polishing
Ru-Mo alloys - Electrolytic etching
RuS2 single crystal specimens - Chemical polishing
RuSe2 single crystal specimens - Chemical polishing
RuTe2 single crystal specimens - Chemical polishing
Rubber-reinforced plastics - Chemical etching
Ruthenium - Electrolytic etching
Ruthenium - Electromechanical polishing
Ruthenium - Ru rich alloys and Ru-Mo alloys - General microstructure
Ruthenium specimens - Electrolytic polishing
Ruthenium specimens - Electrolytic thinning
Ruthenium specimens - Sample preparation procedure
Rutile single crystal (TiO2) - Chemical polishing
S (001) wafers - Chemical etching - General microstructure
S (100) wafers - Chemical etching - General microstructure
S (Slow) etchant - Silicon - Chemical etching
S specimens - Sovent etching
S-816 Modified with B - Chemical etching - General microstructure
SAE 4340 steel - Fe-0.4C-0.7Mn-0.26Si-0.75Cr-0.25Mo-1.8Ni
SM-200 nickel alloy - Chemical etching
SR4 etchant - Ge (111) wafers - Chemical polishing/etching
SR4 etchant - Si (111) wafers used in a study of the variations in surface conductivity of silicon and Germanium
SSA etchant - GaAs wafers - Electrolytic etching
SST 300 series - Electrolytic etching - General microstructure
SST 304 steel - Electrolytic etching - General microstructure
SST 316 steel - Chemical etching - General microstructure
SST substrates used for deposition of WC - Chemical cleaning
SST tubing - Chemical cleaning
SSiC - Chemical etching - General microstructure
SSiC Beta/Beta - Chemical etching - General microstructure
SSiC doped with Al - Chemical etching - General microstructure
SSiC doped with B - Chemical etching - General microstructure
Samarium doped barium titanate - Chemical etching - General microstructure
Samarium oxide-zirconia system (Sm2O3-ZrO2 eutectic) - Chemical etching
Samarium specimens - Electrolytic polishing
Samarium specimens - Electrolytic polishing
Samarium-terbium orthoferrite (Sm0.35 x Tb0.43 x FeO3) - Chemical polishing
Samarium-zinc system (Sm-Zn) - Electrolytic polishing and chemical etching
Sandwich-type composite steel - Foamed aluminium-steel
Sb (0001) wafers - Chemical etching - General microstructure
Sb (0001) wafers cleaved under LN2 - Chemical polishing
Sb (0001) wafers cleaved under LN2 - Chemical polishing
Sb (0001) wafers cleaved under LN2 - Cleave
Sb and Bi alloys - Chemical etching
Sb and Sb alloys - Chemical etching
Sb and Sb alloys - Chemical etching
Sb and Sb alloys, Pb-Sb, Bi-Sn and Bi-Cd alloys - Chemical etching - General microstructure
Sb single crystal wafers - Chemical polishing
Sb, Bi and alloys - Chemical etching
Sb-Ge eutectic - Chemical etching - General microstructure
Sb-Pb alloys - Chemical etching
Sb-Pb, Bi-Sn and Bi-Cd alloys - Chemical etching
Sb-Pb-Te alloys (PbTe-Sb2Te3 section) - Chemical etching - General microstructure
Sb-Pb-Te alloys (Sb and Pb rich) - Chemical etching - General microstructure
Sb-Te system (Sb2Te(3-x)) - Chemical etching - General microstructure
Sb-Tl-Te alloys (Te rich section) - Chemical etching - General microstructure
SbTe and BiTe, detection of Te, InP - Chemical etching - General microstructure
Sc (0001) wafers - Chemical polishing
Sc (0001) wafers - Chemical polishing
Sc polycrystallinc rod - Chemical etching - General microstructure
Sc powder - Chemical etching - General microstructure
Sc-Ag alloys - Chemical etching - General microstructure
Sc-Ag alloys - General microstructure
Sc-Mg system - Alloys with 0-60 at.% Sc - 2% Nital
Sc-Ti alloys - Chemical etching
Sc-Ti alloys - Chemical etching - General microstructure
ScD as thin films - Chemical etching - General microstructure
Scale dip etchant - Cu and Cu alloys - Chemical cleaning
Scandium - Chemical etching
Scandium - Chemical etching
Scandium - Chemical polishing
Scandium - Electrolytic polishing
Scandium doped barium titanate - Thermal and chemical etching
Schell's etchant
Schell's etchant - GaAs (111) wafers - Chemical etching
Schimmel's etch technique - Chemical etching
Schimmel's etchant
Schimmel's etchant - Si (111) and (100) wafers used as substrates for silicon epitaxy growth - Chemical etching
Schimmel's etchant - Silicon - Chemical etching
Schrader's modification of Vilella's etchant - High alloy steels - Chemical etching
Schramm's etchant - Zn-Cu, Zn-Fe, Zn-Mg, Zn-Ni, and Zn-Pb alloys
Schumann's etchant
Schumann's etchant - Fe-Mn alloys - Chemical etching - General microstructure
Schumann's etchant - Mn-Ti-Fe system - Fe-19-27% Mn - up to 1.45% Ti - General microstructure
Scimmel's etchant - Silicon - Defects in epi layers on <100> silicon
Se and Te - Chemical etching
Se and ZnTe - Chemical etching
Se deposits remaining on the (TTT)B surface of HgSe wafers - Chemical etching - General microstructure
Se residual film left on CdSe polycrystalline thin films - Chemical etching - General microstructure
Se single crystal specimens - Chemical etching - General microstructure
Se single crystal specimens - Chemical etching - General microstructure
Se single crystal specimens - Chemical etching - General microstructure
Se single crystal wafers - Chemical etching - General microstructure
Se single crystal wafers - Chemical etching - General microstructure
Se thin films - Acid, float-off
Se, Ge and their alloys, GaSb and InSb, dislocations on the (100) and (111) crystal planes of Si, InAs - Chemical etching
Se, Ge, and their alloys, InAs, InSb, InP, AlSb, GaAs, GaSb, ZnTe, and CdTe - Chemical etching - General microstructure
Se, Te, selenides, tellurides - Chemical etching
Se-bismuth selenide - Chemical etching
Secco's etchant - Dislocation etching
Secco's etchant - For etch pits on Si (100)
Secco's etchant - Si (111) and (100), p-type, 1-10,000 Ohm cm resistivity wafers - Chemical etching
Seeco's etchant - SiO2 thin films grown on silicon, (100), n-type substrates - Chemical etching
Segregation in speralloys - Chemical and elctrolytic etching
Selective etching of delta-ferrite in 18-8 austenitic stainless steels
Selenium - Electrolytic polishing
Selenium - Ge, Te, Se, telurides, selenides and Zr silicide
Selenium - Si, Te, Se
Self-bonded SiC - Electrolytic etching
Shakudo-Sterling silver bimetal-10% Shakudo (4% gold, 96% copper), 90% Sterling silver
Shape memory alloys - Chemical etching - General microstructure
Si (100) and (110) wafers - Chemical etching - General microstructure
Si (100) and (111) wafers - Acid passivation
Si (100) and (111) wafers - Acid, float-off
Si (100) and (111) wafers both n- and p-type - Chemical thinning
Si (100) and (111) wafers used in a study of carbon and oxygen contamination - Chemical etching - General microstructure
Si (100) and (111) wafers, n-type, 10-30 Ohm cm resistivity - Chemical etching - General microstructure
Si (100) and GaAs (100) wafers - Chemical cleaning
Si (100) as-doped, 10 Ohm cm resistivity wafers - Chemical cleaning
Si (100) n-type 3-6 Ohm cm resistivity wafers - Ionized gas etching
Si (100) n-type wafer - Chemical etching - General microstructure
Si (100) n-type wafer used as substrate - Chemical etching - General microstructure
Si (100) n-type wafers - Colloid replication
Si (100) n-type wafers with a p+ Si epitaxy buffer layer - Chemical conditioning
Si (100) n-type wafers, 10 Ohm cm resistivity - Chemical etching - General microstructure
Si (100) n-type, 2-5 Ohm cm resistivity wafers - Chemical etching - General microstructure
Si (100) p- and n-type substrates - Chemical etching - General microstructure
Si (100) p-type wafers - Dislocation etching - Secco's etchant, modified
Si (100) p-type wafers with SiO2 films - Ionized gas etching
Si (100) p-type wafers, 1.2-1.8 Ohm cm resistivity - Chemical cleaning
Si (100) p-type, 4-6 Ohm cm resistivity wafers - Chemical etching - General microstructure
Si (100) wafers - Chemical cleaning
Si (100) wafers - Chemical cleaning
Si (100) wafers - Chemical cleaning
Si (100) wafers - Chemical etching - General microstructure
Si (100) wafers - Chemical etching - General microstructure
Si (100) wafers - Chemical etching - General microstructure
Si (100) wafers - Chemical jet thinning
Si (100) wafers - Chemical thinning
Si (100) wafers - Chemical thinning
Si (100) wafers - Physical etching - General microstructure
Si (100) wafers - Ionized gas etching
Si (100) wafers - Ionized gas etching
Si (100) wafers - Thermal oxidation
Si (100) wafers 100 mm thick - Chemical etching - General microstructure
Si (100) wafers and other orientations - Abrasive polishing
Si (100) wafers and other orientations - Abrasive polishing
Si (100) wafers unpassivated surfaces or with SiO2 or TaSi2 thin films - Chemical cleaning
Si (100) wafers used as substrates - Chemical etching - General microstructure
Si (100) wafers used as substrates for RF sputter of SeGe thin films - Chemical etching
Si (100) wafers used as substrates for epitaxy growth - Chemical etching - General microstructure
Si (100) wafers used as substrates for epitaxy growth - Gas cleaning
Si (100) wafers used as substrates in a study of oxide and nitride - Chemical etching - General microstructure
Si (100) wafers used as substrates with an SiO2 thin film - Physical etching - General microstructure
Si (100) wafers used as substrates with p-doped and undoped poly - Si and SiO2 thin films - Ionized gas etching
Si (100) wafers used for MOCVD growth of SiO2 thin films - Chemical cleaning
Si (100) wafers used in an anisotropic etch study - Chemical etching - General microstructure
Si (100) wafers used in developing the Secco's etchant - Chemical polishing
Si (100) wafers with SiO2 thin films - Ionized gas etching
Si (100) wafers with thermal SiO2 thin films - Ionized gas etching
Si (100) wafers, n-type - Chemical polishing/etching
Si (100) wafers, n-type, 10-30 Ohm cm resistivity - Chemical etching - General microstructure
Si (100) wafers, p-type, 2 Ohm cm resistivity - Chemical thinning
Si (100), n- and p-type wafers, 20 and 25 Ohm cm resistivity - Chemical cleaning
Si (100), n-type, 3-6 Ohm cm resistivity wafers - Chemical etching - General microstructure
Si (100), n-type, 4-7 Ohm cm resistivity wafers - Chemical cleaning
Si (100), n-type, 5-9 Ohm cm resistivity wafers - Chemical cleaning
Si (100), n-type, 5-9 Ohm cm resistivity wafers - Chemical cleaning
Si (100), p- and n-type wafers, 1-10 Ohm cm resistivity - Chemical etching - General microstructure
Si (100), p-type, 2 Ohm cm resistivity wafers - Chemical cleaning
Si (110) wafers with a thermally grown SiO2 thin film - Chemical etching - General microstructure
Si (110), (112), and (113) wafers for p-p+ epitaxy - Chemical cleaning
Si (111) 10-20 Ohm cm resistivity, n-type wafers - Chemical etching - General microstructure
Si (111) and (100) n- and p-type wafers - Chemical jet polishing
Si (111) and (100) wafers - Chemical cleaning
Si (111) and (100) wafers - Chemical etching - General microstructure
Si (111) and (100) wafers - Electrolytic oxidation
Si (111) and (100) wafers and ingots - Alkali, orientation
Si (111) and (100) wafers and spheres - Chemical etching - General microstructure
Si (111) and (100) wafers used as substrates for silicon MBE thin film epitaxy growth - Chemical etching - General microstructure
Si (111) and (100) wafers used in a study of defects - Powder, defect ehnancement
Si (111) and (100) wafers, both n- and p-type - Electrolytic etching - General microstructure
Si (111) and (100) wafers, n-type 10-30 Ohm cm resistivity - Chemical etching - General microstructure
Si (111) and (100) wafers, n-type, 10-30 Ohm cm resistivity - Chemical etching - General microstructure
Si (111) and (100) wafers, p- and n-type of varied resistivity - Electrolytic oxidation
Si (111) and (100) wafers, p- and n-type, 0.2-20 Ohm cm resistivity - Chemical cleaning
Si (111) and (110) wafers - Chemical etching - General microstructure
Si (111) and (110) wafers cut from CZ grown ingots - Chemical etching - General microstructure
Si (111) dendritic-web ribbon crystal - Chemical thinning
Si (111) n- and p-type - Chemical etching - General microstructure
Si (111) n- and p-type wafers - Chemical cleaning
Si (111) n-type 3-5 Ohm cm resistivily wafers - Chemical etching - General microstructure
Si (111) n-type wafers - Chemical polishing
Si (111) n-type wafers - Electrolytic jet polishing
Si (111) n-type wafers - Electrolytic jet polishing
Si (111) n-type wafers - Electrolytic jet polishing
Si (111) n-type wafers 5 Ohm cm resistivity - Thermal cleaning
Si (111) n-type wafers with boron diffused p-n junctions - Chemical etching - General microstructure
Si (111) n-type wafers with diffused p-type layers - Chemical etching - General microstructure
Si (111) n-type wafers with p-n junctions - Chemical junction etching
Si (111) n-type wafers, 1.63 Ohm cm resistivity - Chemical cleaning
Si (111) n-type wafers, 130 Ohm cm resistivity - Chemical polishing
Si (111) n-type wafers, 15-20 Ohm cm resistivity - Chemical etching - General microstructure
Si (111) n-type wafers, 5-120 Ohm cm resistivity - Acid forming
Si (111) n-type wafers, 5-120 Ohm cm resistivity - Dislocation etching
Si (111) n-type wafers, 5-50 Ohm cm resistivity - Acid forming
Si (111) n-type wafers, 50-500 Ohm cm resistivity - Chemical polishing
Si (111) n-type, 1.5-2.5 Ohm cm resistivity wafers - Chemical etching - General microstructure
Si (111) p- and n-type wafers, 8 Ohm cm resistivity - Chemical etching - General microstructure
Si (111) p- and n-type, 20 and 25 Ohm cm resistivity wafers - Chemical cleaning
Si (111) p-type 2-10 Ohm cm resistivity wafers - Gas oxidation
Si (111) p-type wafers - Chemical cleaning
Si (111) p-type wafers, 7-21 Ohm cm resistivity - Chemical cleaning
Si (111) pre-cut bars of material - Chemical polishing
Si (111) wafer and other orientations - Chemical etching - General microstructure
Si (111) wafer substrates used for epitaxy growth of GaP - Chemical cleaning
Si (111) wafers
Si (111) wafers - Chemical cleaning
Si (111) wafers - Chemical cleaning
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - General microstructure
Si (111) wafers - Chemical etching - Sirtl's etchant modified
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing/thinning
Si (111) wafers - Dislocation etching
Si (111) wafers - Abrasive polishing
Si (111) wafers - Acid, pinhole, jet
Si (111) wafers - Gas etching
Si (111) wafers - Metal decoration
Si (111) wafers - Metal, dislocation
Si (111) wafers - Physical etching - General microstructure
Si (111) wafers and other orientations - Abrasive polishing
Si (111) wafers and other orientations - Chemical ecthing
Si (111) wafers and other orientations - Chemical etching - General microstructure
Si (111) wafers and other orientations - Chemical etching - General microstructure
Si (111) wafers and other orientations - Chemical etching - General microstructure
Si (111) wafers and other orientations - Chemical polishing
Si (111) wafers and other orientations - Chemical polishing
Si (111) wafers and other orientations - Chemical polishing/etching
Si (111) wafers and other orientations - Chemical polishing/thinning
Si (111) wafers and other orientations - Si (111) wafers and other orientations
Si (111) wafers and other orientations with n- and p-type resistivity - Chemical polishing
Si (111) wafers and whiskers - Gas etching
Si (111) wafers both p- and n-type - Electrolytic polishing
Si (111) wafers fabricated as barrier diodes - Chemical etching - General microstructure
Si (111) wafers used as substrate for deposition of a-C - Chemical cleaning
Si (111) wafers used as substrates for epitaxy growth of silicon - Chemical polishing
Si (111) wafers used as substrates for epitaxy growth of silicon - Chemical thinning
Si (111) wafers used in a defect study - Chemical etching - General microstructure
Si (111) wafers used in a defect study - Chemical etching - General microstructure
Si (111) wafers used in a defect study - Electrolytic etching/polishing
Si (111) wafers used in a study of Ag and Fe ion contamination - Chemical polishing
Si (111) wafers used in a study of electrolytic polishing with HF - Electrolytic polishing
Si (111) wafers used in a study of light induced plasticity - Chemical etching - General microstructure
Si (111) wafers used in a study of selenium adsorption - Chemical cleaning
Si (111) wafers used in a study of stacking fault energy - Chemical thinning
Si (111) wafers with diffused n-p-n junctions - Electrolytic junction etching
Si (111) wafers with high boron doping - Chemical cleaning
Si (111) wafers with n+/n diffusion - Chemical etching - General microstructure
Si (111) wafers with p-n junctions - Chemical junction etching
Si (111) wafers, 5-50 Ohm cm resistivity, n-type - Chemical polishing
Si (111) wafers, boron diffused p-type - Chemical etching
Si (111) wafers, n-type, 5-10 Ohm cm resistivity - Chemical polishing
Si (111) wafers, n-type, used to fabricate diffused p-n-p transistors - Chemical polishing
Si (111) wafers, p- and n-type - Chemical etching - General microstructure
Si (111) wafers, p-type - Chemical etching - General microstructure
Si (111) wafers, p-type, 7-21 Ohm cm resistivity - Chemical jet thinning
Si (111) web-dendritic ribbon crystal silicon - Chemical thinning
Si (111), (100) and (110) wafers - Chemical polishing
Si (111), (100) and (110) wafers - Thermal etching
Si (111), (100) and (110) wafers and a 1 cm diameter sphere - Chemical etching - General microstructure
Si (111), (100) and (110) wafers, n-type 0.1-0.7 Ohm cm and p-type 0.4-3 Ohm cm resistivity - Ionized gas thinning
Si (111), (100) wafers - Chemical polishing/thinning
Si (111), (100) wafers as substrates for deposition of Si3N4 - Chemical etching - General microstructure
Si (111), (100) wafers n-type 10-30 Ohm cm resistivity - Chemical etching - General microstructure
Si (111), (100), (112) and (110) oriented wafers - Chemical polishing
Si (111), (100), and (110) wafers and ingots - Chemical etching - General microstructure
Si (111), (100), n- and p-type wafers - Chemical polishing
Si (111), n-type and (110), p-type wafers - Chemical etching - General microstructure
Si (111), n-type, 1-10 Ohm cm resistivity wafers - Chemical etching - General microstructure
Si (111), n-type, 10-15 Ohm cm resistivity wafers - Chemical polishing
Si (111), n-type, 3-5 Ohm cm resistivity wafers - Chemical cleaning
Si (111), p- and n-type wafers - Chemical etching - General microstructure
Si (111), p-type (intrinsic) and doped (extrinsic) wafers - Chemical cleaning
Si (111), p-type wafers used as substrates for tungsten deposition - Chemical cleaning
Si (111), p-type wafers, 0.1-200 Ohm cm resistivity - Chemical polishing
Si and Ge (111) wafers and other orientations - Chemical polishing
Si and Ge wafers - Chemical polishing
Si and Ge wafers - Electrolyticlytic cleaning
Si and SiO(x)N(y) DC sputtered thin films on (111) silicon wafers - Chemical etching - General microstructure
Si and alloys - Chemical etching
Si and alloys - Chemical etching
Si as 15 mm square cut and oriented cubes (100) - Neutron damage
Si as a pre-cut single cystal octahedron, (111) form - Chemical etching - General microstructure
Si as p+-n solar cells - Chemical cleaning
Si as poly-Si films on Si (100) substrates - Electrolytic decoration
Si as poly-Si specimens - Ionized gas etching
Si as poly-Si thin film on silicon wafers - Ionizde gas structuring
Si as poly-Si thin films - Chemical etching - General microstructure
Si as various cut shaped specimens - Chemical etching - General microstructure
Si ingot FZ grown, n-type, 200 Ohm cm resistivity - Dislocation etching
Si ingot etched for defects - Chemical etching - General microstructure
Si n- and p-type wafers - Electrolytic polishing
Si p-n junction wafers - Chemical etching - General microstructure
Si p-n-p transistors - Acid junction cleaning
Si p-n-p transistors - Acid junction cleaning
Si p-type wafers - Chemical etching - General microstructure
Si p-type wafers - Electrolytic polishing
Si poly-Si epitaxy deposited thin films - Chemical cleaning
Si polycrystalline material - Chemical etching - General microstructure
Si polycrystalline spheres - Drop forming
Si single crystal hemispheres - Chemical etching - General microstructure
Si single crystal spheres - Chemical ecthing
Si single crystal spheres - Chemical etching - General microstructure
Si single crystal spheres - Chemical etching - General microstructure
Si single crystal spheres - Chemical etching - General microstructure
Si single crystal spheres - Chemical polishing
Si single crystal spheres - Sample preparation
Si single crystal spheres - Si single crystal spheres
Si single crystal spheres 1/2" diameter - Chemical polishing
Si single crystal spheres From 1/8 to 1/2" in diameter - Sample preparation
Si single crystal spheres, p- and n-type - Sample preparation
Si single crystal wafers - Chemical etching - General microstructure
Si single-crystal or poly-crystalline wafer - Chemical etching
Si specimens - Chemical polishing
Si steel - Fe-0.6C-2.0Si
Si steel - Jet electrolytic polishing
Si steels - Silicon steel with high silicon content
Si substrates used for deposition of a-SiH - Chemical etching - General microstructure
Si thin film deposition on germanium substrates - Chemical etching - General microstructure
Si wafers - Chemical cleaning
Si wafers - Chemical cleaning
Si wafers - Chemical etching - General microstructure
Si wafers - Chemical etching - General microstructure
Si wafers - Chemical etching - General microstructure
Si wafers - Chemical polishing
Si wafers - Electrolytic polishing
Si wafers - Electrolytic polishing
Si wafers - Gas etching
Si wafers - Ionized gas, structure
Si wafers - Surface treatment
Si wafers - Surface treatment
Si wafers - Surface treatment
Si wafers and other orientations - Chemical polishing
Si wafers of different orientations - Chemical etching - General microstructure
Si wafers of different orientations - Electrolytic polishing
Si wafers of various orientations - Chemical etching - General microstructure
Si wafers of various orientations - Ionized gas etching
Si wafers used as substrates for growth of silicides - Ionized gas etching
Si wafers used as substrates for silicon epitaxy as Si/Si - Gas contamination
Si wafers with p-n junctions - Chemical etching - General microstructure
Si wafers with p-n junctions - Chemical junction etching
Si(100) wafers - Ionized gas etching
Si-Al-Mg-Ti glass - 65SiO2-19Al2O3-9MgO-6.5TiO2
Si-as system (SiAs) - Etching for defects
Si3N4 - Chemical etching
Si3N4 - Chemical etching
Si3N4 - Chemical etching
Si3N4 - Chemical etching - General microstructure
Si3N4 - Chemical etching - General microstructure
Si3N4 - Chemical etching - General microstructure
Si3N4 - Chemical etching - General microstructure
Si3N4 - Chemical etching - General microstructure
Si3N4 - Physical etching - General microstructure
Si3N4 - Thermal etching
Si3N4 amorphous thin films - Chemical ecthing
Si3N4 and oxynitride thin films - Chemical cleaning
Si3N4 and oxynitride thin films on silicon - Chemical etching - General microstructure
Si3N4 and oxynitride thin films on silicon - Chemical etching - General microstructure
Si3N4 and oxynitrides as DC sputtered thin film deposits on (111) silicon, n-type, 5-10 Ohm cm resistivity wafers - Chemical etching
Si3N4 and oxynitrides deposits on (111) silicon - Chemical etching - General microstructure
Si3N4 and oxynitrides grown as thin films by DC sputtering on (111) silicon wafers - Chemical etching
Si3N4 ceramic with TiN - Plasma etching
Si3N4 deposited as pyrolytic thin films - Chemical etching - General microstructure
Si3N4 oxynitrides and SiO2 DC/RF sputtered thin films - Chemical cleaning
Si3N4 pressed powder blanks - Polishing
Si3N4 thin film amorphous deposits on silicon wafer substrates - Chemical etching - General microstructure
Si3N4 thin films - Chemical cleaning
Si3N4 thin films - Chemical etching - General microstructure
Si3N4 thin films deposited by CVD on (100) silicon substrates - Chemical etching - General microstructure
Si3N4 thin films deposited by PECVD - Chemical etching - General microstructure
Si3N4 thin films deposited on silicon substrates - Chemical etching - General microstructure
Si3N4, SiO2 and glass - Chemical cleaning - Glass cleaner etchant
Si3N4, UN - Physical etching - General microstructure
Si3N4, oxynitrides and SiO2 thin films - Chemical cleaning
SiB6 specimens - Cleaning
SiC (0001) blanks - Metal decoration
SiC (0001) grown as alpha-II SiC - Abrasive polishing
SiC (0001) thin films grown on (100) silicon substrates - Chemical cleaning
SiC (0001) wafers - Dislocation etching
SiC (0001) wafers - Gas polishing
SiC (0001) wafers - Molten flux etching
SiC (111) wafers - Molten flux etching
SiC - Chemical etching
SiC - Chemical etching
SiC - Dislocation etching
SiC - Dislocation etching
SiC - Electrolytic etching
SiC - Electrolytic etching - General microstructure
SiC - Physical etching - General microstructure
SiC - Physical etching - General microstructure
SiC - Thermal etching
SiC blanks - Chemical cleaning
SiC carbide - Chemical etching - General microstructure
SiC ceramic with ZrB2 - Chemical and plasma etching
SiC epitaxy thin films - Molten flux, dislocation
SiC n-type wafers doped with aluminum - Metal doping
SiC platelets - Molten flux polishing
SiC reaction bonded - Electrolytic etching - General microstructure
SiC single crystal specimens - Electrolytic polishing
SiC thin films - Electrolytic etching - General microstructure
SiC thin films grown on Si (100) wafers - Gas doping
SiC thin films vapor deposited on silicon wafers - Moletn flux etching
SiC with 1% B4C, B doped SiC - Chemical etching - General microstructure
SiC with 5-10% oxide additions - Physical etching - General microstructure
SiN(x) and SiO2 thin films - Chemical ecthing
SiN(x) and SiO2 thin films - Ionized gas etching
SiO(x)N-H and Si-H thin films - Solvent cleaning
SiO2 (0001), (1010), natural single crystal and artificial fused quartz wafers and blank - Chemical etching - General microstructure
SiO2 (10T0) artificial alpha-quartz blanks - Chemical etching - General microstructure
SiO2 - Chemical polishing
SiO2 - Dislocation etching
SiO2 AT-cut quartz blanks - Acid tuning
SiO2 and Si3N4 thin films deposited on silicon - Chemical etching - General microstructure
SiO2 as a residual PSG surface film - Chemical etching - General microstructure
SiO2 as alpha-cristobalite - Thermal conversion
SiO2 as fused quartz ampoules - Chemical cleaning
SiO2 as natural single crystal - Chemical etching - General microstructure
SiO2 as quartzware - Chemical cleaning
SiO2 as single crystal quartz blanks - Chemical cleaning
SiO2 as the natural mineral coesite - Chemical etching - General microstructure
SiO2 as the natural mineral tridymite - Chemical etching - General microstructure
SiO2 as thermal oxidation on silicon wafers - Chemical etching - General microstructure
SiO2 as thin film deposits - Chemical etching - General microstructure
SiO2 deposited as CVD thin films on (100) silicon substrates - Chemical etching - General microstructure
SiO2 deposited on silicon wafer substrates
SiO2 deposition on aluminum and quartz blanks or silicon wafers - Chemical etching - General microstructure
SiO2 drawn for fiber optics and laser applications - Organic coating
SiO2 fused quartz epitaxy tubes - Chemical cleaning
SiO2 fused quartz tubes - Chemical cleaning
SiO2 fused quartz tubes - Chemical cleaning
SiO2 fused quartz tubes - Solvent cleaning
SiO2 glass specimens
SiO2 grown as a hydrated oxide on silicon wafers - Electrolytic oxidizing
SiO2 grown as a hydrated oxide on silicon wafers - Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers - Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers - Acid oxidation
SiO2 grown on IC devices - Chemical etching - General microstructure
SiO2 native oxide - Chemical etching - General microstructure
SiO2 single crystal artificial alpha-quartz blanks - Chemical thinning
SiO2 single crystal artificial specimens - Chemical cleaning
SiO2 single crystal blanks - Chemical cleaning
SiO2 single crystal blanks - Chemical cleaning
SiO2 single crystal blanks - Chemical etching - General microstructure
SiO2 thermally oxidized thin films on p-type (100) silicon wafers - Metal decoration
SiO2 thin film - Chemical etching - General microstructure
SiO2 thin film RF sputtered
SiO2 thin film coatings - Oxide, growth
SiO2 thin film deposited on InP (100) wafer substrates - Chemical etching - General microstructure
SiO2 thin film deposits - Chemical etching - General microstructure
SiO2 thin film deposits - Chemical etching - General microstructure
SiO2 thin film deposits - Ionized gas etching
SiO2 thin film deposits on silicon wafer - Chemical etching - General microstructure
SiO2 thin film layers grown on silicon - Chemical etching - General microstructure
SiO2 thin film oxidation of silicon at 1200?C - Chemical etching - General microstructure
SiO2 thin film oxidation of silicon, (111) n-type wafers - Chemical etching - General microstructure
SiO2 thin films 160 nm thick - Chemical etching - General microstructure
SiO2 thin films RF sputter deposited in argon on (100) oriented silicon wafers - Chemical etching - General microstructure
SiO2 thin films RF sputtered 200-700 nm thick on (100) silicon wafers - Chemical etching - General microstructure
SiO2 thin films and native oxides - Chemical etching - General microstructure
SiO2 thin films deposited by a special technique - Chemical etching - General microstructure
SiO2 thin films deposited in etched grooves of (100) silicon wafers - Chemical etching - General microstructure
SiO2 thin films deposited on (100) silicon substrates - Dislocation etching
SiO2 thin films deposited on (100) silicon wafers - Chemical etching - General microstructure
SiO2 thin films deposited on (100) silicon wafers - Ionized gas etching
SiO2 thin films deposited on (100) silicon wafers - Metal decoration
SiO2 thin films deposited on (111), p-type, 1-3 Ohm cm resistivity wafers - Chemical ecthing
SiO2 thin films deposited on (1OO) silicon wafers - Chemical etching - General microstructure
SiO2 thin films deposited on a variety of substrates/surfaces - Oxide, adhesive coat
SiO2 thin films deposited on silicon (100) - Chemical etching - General microstructure
SiO2 thin films deposited on silicon substrates - Chemical etching - General microstructure
SiO2 thin films deposited on silicon substrates - Chemical etching - General microstructure
SiO2 thin films deposited on silicon wafers
SiO2 thin films deposited on silicon wafers - Chemical etching - General microstructure
SiO2 thin films deposited on silicon wafers - Chemical etching - General microstructure
SiO2 thin films deposition on (100) silicon wafers - Oxide, growth
SiO2 thin films grown on (100) silicon wafers - Ionized gas etching
SiO2 thin films on Si (100) wafers - Chemical etching - General microstructure
SiO2 thin films on Si (100) wafers - Chemical etching - General microstructure
SiO2 thin films on silicon wafers as doped BPSG
SiO2 thin films on various substrates - Chemical cleaning
SiO2 x nH2O as the natural mineral opal - Acid coloring
SiO2-Al2O3-MgO-TiO2-CeO2 glass - 63SiO2-19Al2O3-9MgO-6TiO2-4.5CeO2
SiO2-Al2O3-MgO-ZrO2-CaF2 glass - 65SiO2-19Al2O3-9MgO-6.5ZrO2-1CaF2
SiO2-Al2O3-MgO-ZrO2-CeO2 glass - 65SiO2-19Al2O3-9MgO-6ZrO2-4.5CeO2
SiO2-MgO-Al2O3-TiO2-CaF2 glass - 65SiO2-19Al2O3-9MgO-6.5TiO2-1CaF2
SiO2/SiO4 as the natural mineral stisovite - Chemical etching - General microstructure
SiOi2 AT-cut quartz crystal blanks - Polishing
SiSiC - Chemical etching - General microstructure
SiSiC - Electrolytic etching - General microstructure
SiSn thin films deposited on (100) silicon wafers - Chemical etching - General microstructure
SiV2 thin films - Chemical etching/polishing
Sigma phase in austenitic stainless steel weld
Sigma phase in duplex steels - Electrolytic etching
Sigma phase in duplex steels - Electrolytic etching
Silica (SiO2) - Chemical thinning
Silica-alumina -magnesia-zirconia glass - 65SiO2 x 10Al2O3 x 9MgO x 6.5 ZrO2
Silica-alumina-magnesia-zirconia mixtures - Chemical etching - General microstructure
Silicon (Si) p-n junction - To stain p-n junctions in polycrystalline silicon
Silicon - Attack polishing
Silicon - Cathodic etching
Silicon - Chemical etching
Silicon - Chemical etching
Silicon - Chemical etching
Silicon - Chemical etching
Silicon - Chemical polishing
Silicon - Chemical polishing
Silicon - Chemical polishing and etching
Silicon - Chemical polishing and etching
Silicon - Chemical polishing and etching
Silicon - Chemical polishing and etching
Silicon - Chemical thinning
Silicon - Chemical thinning
Silicon - Chemical thinning
Silicon - Chemical thinning
Silicon - Copper depostion on dislocations
Silicon - Dislocation etching
Silicon - Dislocation etching
Silicon - Dislocation etching
Silicon - Dislocation etching
Silicon - Dislocation etching
Silicon - Dislocation etching
Silicon - Dislocation etching
Silicon - Electrolytic etching - General microstructure
Silicon - Electrolytic etching - General microstructure
Silicon - Electrolytic polishing
Silicon - Electrolytic polishing
Silicon - Etch for stacking faults and dislocations
Silicon - Etch for structure due to micro-segregation
Silicon - Etch pits etching
Silicon - Etchant for revealing twin planes
Silicon - For etch pits etching
Silicon - For stainning - Distinguishes between n and p type silicon
Silicon - Sample preparation procedure
Silicon - Se, Ge, and their alloys - General microstructure
Silicon - Si, Ge, and their alloys - General microstructure
Silicon - Si, Ge, and their alloys, GaSb, InSb - Dislocations on (100) and (111) planes of Si
Silicon - Si, Ge, and their alloys, InSb - Etch pitch on (111) planes, p-n junctions
Silicon - Si, Te, Se - General microstructure
Silicon carbide (SiC) - Beta SiC with B4C - General microstructure
Silicon carbide (SiC) - Chemical etching - General microstructure
Silicon carbide (SiC) - Chemical etching - General microstructure
Silicon carbide (SiC) - Electrolytic etching - General microstructure
Silicon carbide (SiC) - Electrolytic etching - General microstructure
Silicon carbide (SiC) - Electrolytic etching - General microstructure
Silicon carbide (SiC) - Etching of SiC for Transmission Electron Microscopy (TEM)
Silicon carbide (SiC) - For alpha SiC dosed with B - General microstructure
Silicon carbide (SiC) - For beta SiC - General microstructure
Silicon carbide (SiC) - For beta-SiC - Reveals beta/beta grain boundaries
Silicon carbide (SiC) - For pyrolytically manufactured beta SiC - General microstructure
Silicon carbide (SiC) - HPSiC - General microstructure
Silicon carbide (SiC) - Polycrystalline - Chemical and elctrolytic etching
Silicon carbide (SiC) - Pressureless sintered SiC (alpha and alpha + beta)
Silicon carbide (SiC) - Pressureless sintered SiC dosed with B and Al (alpha and alpha + beta)
Silicon carbide (SiC) - Pyrolytic - Electrolytic etching - General microstructure
Silicon carbide (SiC) - Si-SiC, infiltrated - Si, alpha and beta are differentiated
Silicon carbide (SiC) - SiC with B - General microstructure
Silicon carbide (SiC) - SiC, infiltrated - All phases are etched equally
Silicon carbide (SiC) single crystal - For revealing the growth spirals
Silicon carbide (SiC) single crystal - Shows differences between Si (smooth etch) and C (rough etch) faces on opposing (001) surfaces
Silicon carbide (SiC-(beta-form) - Chemical polishing
Silicon carbide (SiC-(beta-form) - Chemical polishing
Silicon carbide - Attack polishing
Silicon carbide SiC - Etching
Silicon defect delineation etches - Chemical etching
Silicon etchant - Polycrystalline silicon (Bell Labs) - Chemical etching
Silicon nitride (Si3N4) - Chemical etching - General microstructure
Silicon nitride (Si3N4) - Chemical etching - General microstructure
Silicon nitride (Si3N4) - Chemical etching - General microstructure
Silicon nitride (Si3N4) - Chemical etching - General microstructure
Silicon nitride (Si3N4) - Chemical etching - General microstructure
Silicon nitride (Si3N4) - Physical etching - General microstructure
Silicon nitride (Si3N4) - Physical etching - General microstructure
Silicon nitride (SiN) - Chemical and physical etching - General microstructure
Silicon nitride (SiN) - Chemical etching - General microstructure
Silicon nitride (SiN) - Chemical etching - General microstructure
Silicon nitride (SiN) - Chemical etching - General microstructure
Silicon nitride (SiN) - Ion beam machinning
Silicon nitride Si3N4 - Etching
Silicon nitride-alumina-silica system - (Si12Al18N8(2Si3N4 x 9Al2O3 x 6SiO2))
Silicon oxide wafer etch process
Silicon single crystals - Etching of the p-n transition
Silicon single crystals - For TEM sample preparation
Silicon single crystals - For TEM sample preparation
Silicon single crystals - For revealing dislocations
Silicon specimens - Chemical etching - General microstructure
Silicon specimens - Chemical etching - General microstructure
Silicon specimens - Chemical etching - General microstructure
Silicon specimens - Chemical etching - General microstructure
Silicon specimens - Chemical etching - General microstructure
Silicon specimens - Chemical etching - General microstructure
Silicon steels - Determination of grain orientaion
Silicon steels - Determination of grain orientaion
Silicon steels - Determination of grain orientaion
Silicon steels - Determination of grain orientaion
Silicon steels - Determination of grain orientaion
Silicon steels - Determination of grain orientaion
Silver - Ag alloys - General microstructure
Silver - Ag rich Ag-Cd alloys, Ag solders, Ag-Cu alloys - General microstructure
Silver - Ag solders - General microstructure
Silver - Ag-Cd, Ag-Cu, silver solders (Ag-Cu-Cd-Zn)
Silver - Ag-Mo alloys, Ag-W alloys, Ag-W carbides - General microstructure
Silver - Cemical polishing and etching
Silver - Chemical etching
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical etching - General microstructure
Silver - Chemical polishing
Silver - Chemical polishing
Silver - Chemical polishing
Silver - Chemical polishing
Silver - Chemical thinning
Silver - Dislocation etching
Silver - Dislocation etching - Dislocation etching
Silver - Electric contact material, Silver (99.9% Ag)
Silver - Electric contact material, Silver (99.9% Ag)
Silver - Electric contact material, Silver (99.9% Ag)
Silver - Electrolytic etching
Silver - Electrolytic lapping
Silver - Electrolytic mechanical polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing
Silver - Electrolytic polishing - Dislocation etching
Silver - Electrolytic thinning
Silver - Electrolytic thinning
Silver - Electrolytic thinning
Silver - Etch pit etching
Silver - For silver and silver rich alloys
Silver - One of the best electrolyte for universal use
Silver - Pure Ag and Ag alloys, Ag solders - General microstructure
Silver - Pure Ag and Ag composites with other metals - General microstructure
Silver - Thermal etching
Silver - pure Ag, Ag-Ni and Ag-Pd alloys
Silver alloys - Chemical etching - General microstructure
Silver and alloys - Chemical thinning
Silver chromate etchant - Ag and Ag-Cu alloys - Chemical etching
Silver etchant - Si (111) wafers - Dislocation etching
Silver glycol etchant - Si (111) wafers and other orientation - Chemical etching
Silver single crystal - Chemical polishing
Silver single crystal - Chemical polishing
Silver single crystal - Chemical polishing and etching
Silver solders (Ag-Cu-Cd-Zn) - Chemical etching - General microstructure
Silver-Copper (Ag-Cu) - Electric contact material
Silver-Magnesium-Nickel (Ag-Mg-Ni) - Electric contact material
Silver-Nickel (Ag-Ni) - Electric contact material
Silver-Nickel (Ag-Ni) - Electric contact materials
Silver-Tungsten (Ag-W) - Electric contact material
Sintered Al materials, grain boundaries, removes smeared layers - Chemical etching
Sintered carbides - Chemical etching
Sintered carbides - Electrolytic polishing
Sintered carbides - General etching of sintered carbides
Sintered carbides - Particularly for sintered carbides which-apart from WC-also contain TiC, TaC and NbC
Sintered carbides - Sintered carbides containing Ni-phase
Sintered carbides - Sintered carbides with high content of Ti and Ta carbides
Sintered carbides - To reveal boundaries of the carbide grains against the cobalt phase
Sirtl's etchant - Dislocation etching
Sirtl's etchant - For Ge
Sirtl's etchant - Si (111) wafers and other orientations - Chemical etching
Sirtl's etchant - SiC (0001) wafers - Chemical polishing
Sirtl's etchant - Silicon
Sirtl's etchant - Silicon specimens - Chemical etching - General microstructure
Sirtl's etchant, modified - Si (111), (110) and (211) wafers, ingots - Chemical etching
Sleeve bearing materials (Al, Sn, Pb, Cu)-Al alloy clad to steel, Al-Si alloy clad to steel
Sleeve bearing materials (Cu, Pb, Ni, Ag) - Commercial bronze liner, Cu-Pb alloy liner, Cu-Pb-Sn alloy liner
Sleeve bearing materials (Sn, Cu, Pb)-Sn base babbitt overlay on Cu-Pb-Sn alloy liner
Sleeve bearing materials (Sn, Pb, Sn) - High Sn-Al alloy clad to nickel plated steel
Sleeve bearing materials - Cd alloy liner
Sm specimens - Thermal forming
Sm-Ag alloys - Chemical etching - General microstructure
Sm-Au alloys - Chemical etching - General microstructure
Sm-B system - Chemical etching - General microstructure
Sm-Bi system - Chemical etching - General microstructure
Sm-Co alloy - Approx. SmCo5 - General microstructure
Sm-Co alloy - Domain structure
Sm-Co alloy - SmCo5 - Electrolytic polishing
Sm-Co alloys - Chemical etching - General microstructure
Sm-Co alloys - Chemical etching - General microstructure
Sm-Co alloys - Chemical etching - General microstructure
Sm-Co alloys, grain boundary etchant - Chemical etching - General microstructure
Sm-Co and Sm-Fe-Co-Cu alloys - Chemical etching - General microstructure
Sm-Co and Sm-Fe-Co-Cu alloys - Chemical etching - General microstructure
Sm-Co-Cu alloy - Sm(Co0.65 x Cu0.35)5.6 x Sm(Co0.84 x Cu0.16)6.4
Sm-Co-Cu alloy - SmCo(5-x)Cu(x)
Sm-Pd alloys (Approx. single Sm3Pd4) - Chemical etching - General microstructure
Sm2O3 + ZrO2 - Chemical etching - General microstructure
SmBr3 (0001) wafers - Alcohol polishing
SmCo3 specimens - Chemical cleaning
SmCo5 permanent magnetic alloys - Grain boundary and phase etching of SmCo5
SmCo5 permanent magnetic alloys - Phase etching of SmCo5
SmCo5 permanent magnetic alloys - Phase etching of SmCo5 (blue Sm2Co7, brown SmCo5)
Sn (001) and (111) wafers - Electrolytic polishing
Sn (001) and (111)-tetragonal alpha-tin single crystals - Electrolytic polishing
Sn (010) wafers - Chemical etching - General microstructure
Sn alloys - Chemical etching
Sn alloys - Chemical etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and Sn alloys - Electrolytic polishing - Dislocation etching
Sn and alloys - Electrolytic etching
Sn coatings on steel and Sn-bearing alloys - Chemical etching
Sn electroplated thin film - Chemical etching - General microstructure
Sn electroplated thin film - Chemical etching - General microstructure
Sn plated steel - Chemical etching
Sn shot - Chemical cleaning
Sn single crystal ingots - Electrolyticlytic sawing
Sn single crystal specimens - Physical etching - General microstructure
Sn single crystal sphere - Chemical etching - General microstructure
Sn single crystal wires - Electrolytic polishing
Sn specimen, 1/4" wafer in diameter - Acid, cutting
Sn specimens - Electrolytic polishing
Sn white-tin single crystal - Chemical polishing
Sn-As system - Chemical etching - General microstructure
Sn-Bi alloy (5% Bi) - Chemical etching - General microstructure
Sn-Bi alloys - Chemical etching - General microstructure
Sn-Bi system - Electrolytic polishing
Sn-Bi-As alloys - For Sn and Bi rich alloys - General microstructure
Sn-Bi-As system - Sn4As3-Bi-SnAs section - General microstructure
Sn-Bi-Te alloys - Chemical etching - General microstructure
Sn-Cd alloys - Chemical etching
Sn-Cd alloys - Chemical etching
Sn-Co-Hf system (HfCo2Sn) - Chemical etching - General microstructure
Sn-Co-Nb system - Chemical etching - General microstructure
Sn-Co-Ti system - TiCo2Sn - General microstructure
Sn-Co-Zr system - ZrCo2Sn - General microstructure
Sn-Fe-Ti system (TiFe2Sn) - Chemical etching - General microstructure
Sn-Ni-Hf system - HfNiSn and HfNi2Sn
Sn-Ni-Nb system (NbNi2Sn) - Chemical etching - General microstructure
Sn-Ni-Ti system - TiNiSn and TiNi2Sn
Sn-Ni-Ti system - VNi2Sn
Sn-Ni-Ti system - ZrNiSn and ZrNi2Sn
Sn-Pa-Zr alloys (ZrPdSn) - Chemical etching - General microstructure
Sn-Pb alloys (Sn rich) - Electrolytic polishing
Sn-Pb alloys - Electrolytic polishing and chemical etching
Sn-Pb alloys and Sn coatings on steel - Chemical etching
Sn-Pb alloys, Sn solders - Chemical etching - General microstructure
Sn-Pb alloys, Sn-Containing bearing materials, Sn coatings - Chemical etching - General microstructure
Sn-Pb, Sn-Sb and Sn-Cd alloys - Chemical etching
Sn-Pb-As system - Chemical etching - General microstructure
Sn-Pb-As system - Chemical polishing
Sn-Pb-As system - SnPb-Sn4As3 region
Sn-Pb-Cd alloy - Eutectic alloy
Sn-Pb-Cd-Zn alloy - 28.6 wt.% Pb, 52.45 wt.% Sn, 16.7 wt.% Cd, 2.25 wt.% Zn
Sn-Rh-Nb system (NbRhSn) - Chemical etching - General microstructure
Sn-Sb alloys - Chemical etching - General microstructure
Sn-Sb-Cd alloys - Chemical etching - General microstructure
Sn-Sb-Cu alloys - Chemical etching
Sn-Sb-Se system (SnSe-Sb2Se3 section) - Chemical etching - General microstructure
Sn-Se system (SnSe-SnSe3 eutectic) - Pysical etching
Sn-Te system - Chemical polishing
Sn-Te-As system - Chemical etching - General microstructure
Sn-Te-As system - Chemical etching - General microstructure
Sn-Te-As system - Chemical etching - General microstructure
Sn-Te-As system - Chemical etching - General microstructure
Sn-Y alloys - Electrolytic polishing and etching
Sn-Zn system - Electrolytic thinning
Sn-based babbitt metal - Chemical etching
Sn-based babbitt metal - Chemical etching
Sn-coated steels - Chemical etching
Sn-containing Ti alloys - Chemical etching - General microstructure
Sn-plated steels - Chemical etching
Sn-rich alloys - Chemical etching
SnAgCu lead-free solder - Chemical etching
SnAgCu solder joints - EBSD sample preparation
SnO2 specimens - Chemical etching - General microstructure
SnO2 thin films - Chemical etching - General microstructure
SnO2 thin films deposited by CVD
SnO2 thin films deposited on 1 mm glass slides - Chemical etching - General microstructure
SnO2 thin films deposited on SiO2 coated silicon wafer - Electrolytic etching - General microstructure
SnTe (100) wafers - Chemical polishing
SnTe (111) ingot - Electrolytic polishing
SnTe - Chemical polishing
SnTe amorphous thin films - Chemical etching - General microstructure
SnTe specimens - Thermal etching for etch pits
SnTe thin films grown on muscovite mica (0001) substrates - Acid, float-off
Soda glass - Etch for recrystallization effects
Soda-boric oxide-niobium oxide - Chemical etching - General microstructure
Sodium - Chemical polishing
Sodium chloride (NaCl) - Chemical polishing and etching
Sodium chloride (NaCl) - Chemical polishing and etching
Sodium chloride (NaCl) - Chemical polishing of single crystal
Sodium chloride (NaCl) - Chemical thinning
Sodium chloride (NaCl) - Etch pits etching
Sodium chloride (NaCl) - Etch pits etching
Sodium chloride (NaCl) - Etch pits on (001) surfaces
Sodium chloride (NaCl) - For final polishing (110) and (111) faces
Sodium chloride (NaCl) rock salt - Chemical etching - General microstructure
Sodium chloride (NaCl) rock salt - Chemical etching - General microstructure
Sodium chloride (NaCl) rock salt - Etch pits on single crystals
Sodium chloride-Barium chloride - NaCl-1% BaCl2 - General microstructure
Sodium chloride-Calcium chloride - Up to 0.1% CaCl2
Sodium fluoride (NaF) - Chemical etching - General microstructure
Sodium fluoride (NaF) - Chemical etching - General microstructure
Sodium specimens - Alcohol polishing
Sodium specimens - Chemical etching - General microstructure
Sodium specimens - Chemical etching - General microstructure
Sodium specimens - Chemical polishing
Soft magnetic glasses - Chemical etching - General microstructure
Solder paste alloys - NiTi alloys
Sopori's etchant - Si (111) wafers and other orientations - Chemical etching
Specimen preparation for EBSD - Ceramics
Spinel (MgAl2O4) - Chemical etching - General microstructure
Spinel (MgAl2O4) - Chemical etching - General microstructure
Spinel (MgAl2O4) - Chemical thinning
Spinel phase - Chemical etching - General microstructure
Spinel single crystal (MgAl2O4) - For etching (100) face
Sr (100) wafers and other orientations - Chemical polishing/etching
Sr material as the carbonate strontianite, SrCO3 and sulfate celestite, SrSO4 - Chemical etching - General microstructure
Sr-Hg system - Mechanical polishing
SrCl2 (100) wafers - Vacuum cleaning
SrF2 (100) thin film deposited on GaAs substrates - Chemical etching - General microstructure
SrF2 and Ba(x)Sr(1-x)F2 thin films and SrF2 (100) wafers - Chemical etching - General microstructure
SrF2 specimens - Chemical etching - General microstructure
SrGa12O19 (0001) cleaved wafers - Chemical etching - General microstructure
SrGa12O19 single crystals - Chemical etching
SrTiO3 single crystal specimens - Abrasive polishing
SrTiO3 single crystal specimens - Abrasive polishing
SrTiO3 specimens - Chemical etching - General microstructure
SrTiO3, MgTiO3 - Chemical etching - General microstructure
SrWO4 single crystal specimens - Chemical polishing
Stainless and alloy steels - Electrolytic polishing
Stainless and alloy steels - Electrolytic polishing
Stainless steel - Chemical polishing
Stainless steel - Chemical thinning
Stainless steel - Chemical thinning
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic polishing
Stainless steel - Electrolytic thinning
Stainless steel - Electrolytic thinning
Stainless steel - Electrolytic thinning
Stainless steel - Electrolytic thinning - Bollmann technique
Stainless steel - Electrolytic thinning by Bollmann technique
Stainless steel - Electrolytic thinning by Bollmann technique
Stainless steel - Electrolytic thinning by Mirand-Saulnier technique
Stainless steel - Electrolytic thinning by modified Mirand-Saulnier technique
Stainless steel - Electrolytic thinning in PTFE holders
Stainless steel - Fe-0.1C-1.5Mn-0.5Si-17/17.5Cr-12.5Ni-0.73Nb
Stainless steel - Fe-0.1C-1.5Mn-0.5Si-17Cr-12.5Ni-0.5Ti
Stainless steel - Fe-20Cr-25Ni-0.05C - Jet electrolytic polishing
Stainless steel - Good for all austenitic heat resistant alloys, 100F plus
Stainless steel - Jet electrolytic polishing
Stainless steel - Physical etching - General microstructure
Stainless steel - Type 304 or 316 stainless steel - General microstructure
Stainless steel - Type 304 Fe-18Cr-8.5Ni-0.06C-0.7Si-1.75Mn-0.36Mo. Type 309 Fe-23.6Cr-14Ni-0.04C-0.6Si-2Mn-0.3Mo
Stainless steel and alloy steel - Electrolytic polishing
Stainless steel and alloy steel - Electrolytic polishing
Stainless steel castings - General structure
Stainless steel castings - General structure
Stainless steel castings - General structure
Stainless steel castings - General structure
Stainless steel castings - General structure
Stainless steel castings - General structure
Stainless steel types 301, 307 - Fe-0.1C-6/8Mn-16/17Cr-4/6Ni-0.1N
Stainless steels - All types of stainless steels - General microstructure
Stainless steels - Carbon steels, low and high alloy steels, stainless steels
Stainless steels - Chemical etching
Stainless steels - Chemical etching
Stainless steels - Chemical etching
Stainless steels - Chemical etching
Stainless steels - Color etchant - General microstructure
Stainless steels - Color etchant - General microstructure
Stainless steels - Color etching - Colors carbides and gamma- prime phase
Stainless steels - Color etching - General microstructure
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic etching
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - Electrolytic polishing
Stainless steels - General etchant - General microstructure
Stainless steels - General etchant - Heavy attack on austenite, sigma phase and carbides
Stainless steels - Good general-purpose electrolyte
Stainless steels - Potentiostatic etching
Stainless steels - Potentiostatic etching
Stainless steels - Stainless steels different types
Stainless steels - Stainless steels with 0.08-0.20% C
Stainless steels - Tint etching
Stainless steels - To reveal surface carburisation in stainless steels
Stainless steels and high speed steels - Chemical etching
Stainless steels with sigma - Chemical etching
Stainlesss steels - Electrolytic polishing
Stead's No. I etchant - For P in steel
Stead's No. II etchant - For P in steel
Steatite (Mg3 Si4 O10 x (OH)2)) - Sample preparation
Steatite - Chemical etching - General microstructure
Steel - Carbon and alloy - Electrolytic polishing
Steel - Carbon, alloy, stainless - Electrolytic polishing
Steel - Martensite etching
Steel - Martensite etching
Steel - Tint etch for lath or plate martensite
Steel 304 type - Solvent cleaning
Steel 304 type blanks - Chemical cleaning
Steel all type - Chemical etching - General microstructure
Steel alloys containing carbides - Contrast etching
Steel blanks - Chemical etching - General microstructure
Steel blanks - Chemical thinning
Steel blanks - Electrolytic etching - General microstructure
Steel blanks - Electrolytic jet thinning
Steel carbon and alloy - Electrolytic polishing
Steel carbon and alloy - Electrolytic polishing
Steel castings - Particularly suitable for castings
Steel specimens - Carbide etching
Steel specimens - Carbide etching
Steel specimens - Carbon steel and Cr-Mo steel
Steel specimens - Electrolytic polishing
Steel specimens - Electrolytic polishing
Steel specimens - Electrolytic polishing
Steel specimens - Electrolytic polishing
Steel specimens - Electrolytic polishing
Steel specimens - Fe-Cr Alloys, Ni-Cr Alloys, high speed steels and austenitic manganese steels
Steel specimens - For untempered martensite in low alloy Cr-Ni steels
Steel specimens - General etching of carbon steel, cast iron, and also of certain alloyed steels
Steel specimens - TEM sample preparation
Steel specimens - To reveal ferrite grains in annealed carbon steel
Steel specimens - To reveal ferrite structure in low carbon content steels
Steel specimens - To reveal sigma phase
Steel, (100) single crystal specimens - Chemical cleaning for plating
Steel, 300 series - Electrolytic etching - General microstructure
Steel, alloys with untempered martensite - Chemical etching - General microstructure
Steel, carbon - Chemical cleaning/etching
Steel, hard - Chemical cleaning/etching
Steel, high-speed blanks - Chemical etching - General microstructure
Steel, low carbon blanks - Chemical etching - General microstructure
Steels (0.1-0.8% C, up to 3% alloys) - Chemical polishing
Steels (all types) - Chemical etching - General microstructure
Steels - Chemical polishing
Steels - Electrolytic polishing
Steels - Electrolytic polishing
Steels - Electrolytic polishing
Steels - Electrolytic polishing
Steels - Electrolytic polishing
Steels specimen - Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimen - Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimen - Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimen - Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimen - Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Steels specimen - General etching of carbon steel and cast irons, and of certain alloyed steels
Steels treated by oxidation method - Chemical etching
Steels with high Si content - Chemical etching - General microstructure
Stellite 8, Haynes 21-62Co, Co-27Cr-5.5Mo-3Ni-1Fe+C
Stellite specimens - Solution will selectively attack iron and cobalt in steel alloys
Stellite-6 alloy - Electrolytic etching
Stellites up to 70% Co, Co-base superalloys - Electrolytic etching - General microstructure
Stoke's etchant - MgO (100) wafers - Dislocation etching
Strontium fluoride single crystal (SrF2) - Etch pits on (111) faces are revealed by etching
Strontium oxide-boric oxide silicon system - Chemical etching - General microstructure
Strontium specimens - Electrolytic polishing
Strontium tetrahydrate - SrC4H4O6 x 4H2O single crystal
Strontium tetrahydrate - SrC4H4O6 x 4H2O single crystal
Strontium titanate (O-Sr-Ti) - Dislocation etch in single crystals
Struer's D-2 etchant - Copper and copper alloys - Electrolytic etching
Struers A2 electrolyte - Al and Al alloys - Electrolytic polishing
Struers electrolyte A2 - For Al, Fe, Ni, Ag, stainless steel, steel, Sn, Ti - Dislocation etching
Struers electrolyte A2-I - For Al, Fe, Ni, Ag, stainless steel, steel, Sn, Ti - Dislocation etching
Struers electrolyte A2-II - For Al, Fe, Ni, Ag, stainless steel, steel, Sn, Ti - Dislocation etching
Struers electrolyte A3-I - Martensitic steel, Mo, stainless steel, Ti, V, Zr - Dislocation etching
Struers electrolyte A3-II - Martensitic steel, Mo, stainless steel, Ti, V, Zr - Dislocation etching
Struers electrolyte A8-I - Cr, Hf, Ni, Ti - Dislocation etching
Struers electrolyte A8-II - Cr, Hf, Ni, Ti - Dislocation etching
Struers electrolyte AC2-I - Cast iron, Mg, Ni, stainless steel, steels - Dislocation etching
Struers electrolyte AC2-II - Cast iron, Mg, Ni, stainless steel, steels - Dislocation etching
Struers electrolyte AC2-III - Cast iron, Mg, Ni, stainless steel, steels - Dislocation etching
Struers electrolyte D2 - Brass, Cu, Au - Dislocation etching
Struers electrolyte E5-I - Brass, bronze, carbon steel, cast iron - Dislocation etching
Struers electrolyte E5-II - Brass, bronze, carbon steel, cast iron - Dislocation etching
Struers electrolyte E5-III - Brass, bronze, carbon steel, cast iron - Dislocation etching
Sulfide etchant of Kunkele - Iron and steels - Chemical etching
Sulfides in stainless steels - Chemical etching
Super picral - Carbon and alloy steels with medium carbon content - General structure
Super picral - Iron and steels - Chemical etching
Super picral - Steels - Chemical etching
Superalloy 713LC - Ni-11.7Cr-4.5Mo-6Al-0.75Ti-2Nb(+Ta) (+0.06C)
Superalloy B-1900 - 65Ni-10Co-8Cr-6Mo-6Al-4Ta-1Ti-0.1C-0.1Zr-0.015B
Superalloy In 100 - 60Ni-15Co-10Cr-3Mo-5.5Al-5Ti-1V-0.18C-0.06Zr-0.014B
Superalloy MAR200 - 60Ni-10Co-9Cr-12.5W-5Al-2Ti-1Nb-0.15C-0.05Zr-0.015C
Superalloy MAR200 - Chemical etching
Superalloy MAR200 - Plastic deformation can be revealed by polish-etch-electro polish technique
Superalloy Udimet 700 - 56Ni-17Co-15Cr-5Mo-4Al-3Ti-0.07C
Superalloys - Electrolytic polishing
Superalloys - Electrolytic polishing
Superalloys - Etches gamma phase, carbides, and grain boundaries
Superalloys - Etches gamma phase, carbides, grain-contrast etchant
Superalloys, Hastelloy A type - Chemical etching - General microstructure
Superoxal etchant - Germanium - Etch pits etching
Superoxol - InP (100) Zn doped p-type wafers - Chemical polishing
Superoxol No. 2 etchant - Ge hemispheres - Chemical etching
Superoxol No. 2 etchant, dilute - Ge hemispheres - Chemical etching
Superoxol etchant - Antimonium - Dislocation etching
Superoxol etchant - For Ge - Chemical etching
Superoxol etchant - Ge (111) wafers - Chemical etching
Superoxol etchant - Ge (111) wafers lithium diffused - Chemical etching
Superoxol etchant - Ge specimens - Chemical etching
Superoxol etchant - Germanium - Dislocation etching
Superoxol etchant - InAs (111) wafers - Chemical etching
Superoxol etchant - InSb (111) wafers - Chemical etching
Superoxol etchant, modified - Germanium - Chemical etching - General microstructure
Superoxol etchant, varity - Ge hemispheres - Chemical etching
Surface layers on Ni-base alloys, plasma coatings - Chemical etching - General microstructure
T.D. Ni-Cr alloy - 20% Cr-2% ThO2 - Electrolytic polishing and etching
T.Z.M. Molybdenum - Mo-0.5 wt.% Ti-0.08 wt.% Zr-0.02 wt.% C
TD-Ni, DS-NiCr, Inconel MA-754, TD-NiCrAl and DST-NiCrAl - Chemical etching
TD-NiCr alloy - Heat tint etching
TD-Nickel - Electrolytic etching
TMAH etching of silicon II - Chemical etching
TMAH etching of silicon wafers I - Chemical etching
TRW-NASA VIA alloy - Ni-6Cr-2Mo-1Ti-5.5Al-9Ta-6W-7.5Co-0.5Hf-0.4Re-0.15C (+B, Zr)
Ta (100) wafers - Chemical etching - General microstructure
Ta (111) specimen - Chemical etching - General microstructure
Ta - Chemical-Mechanical polishing
Ta alloy specimens containing a Ta silicide surface coating - Chemical etching - General microstructure
Ta alloys - Chemical etching
Ta alloys - Chemical etching
Ta alloys - Chemical etching
Ta alloys - Chemical etching
Ta alloys - Chemical etching
Ta alloys - Chemical etching
Ta alloys - Chemical etching
Ta and Ta alloy - Anodizing
Ta and Ta alloys - Electrolytic polishing - Dislocation etching
Ta and Ta alloys - Electrolytic polishing - Dislocation etching
Ta and Ta alloys - Electrolytic polishing - Dislocation etching
Ta and Ta alloys - Electrolytic polishing - Dislocation etching
Ta and Ta alloys - Electrolytic polishing - Dislocation etching
Ta and Ta alloys, color etchant - Anodizing
Ta and Ta-base alloys, Nb-Re alloys - Chemical etching - General microstructure
Ta and alloys - Electrolytic etching
Ta and alloys - Electrolytic etching
Ta and alloys - Electrolytic etching
Ta and high-Ta alloys - Chemical etching
Ta as high purity slugs - Chemical cleaning
Ta material - Chemical etching - General microstructure
Ta material - Chemical polishing
Ta material - Electrolytic polishing
Ta or TaN etchant - For Ta and Ta alloys
Ta oxides, nitrides and carbides - Chemical etching
Ta poly sheet blanks - Chemical etching - General microstructure
Ta poly sheet blanks - Chemical etching - General microstructure
Ta poly sheet blanks - Chemical etching - General microstructure
Ta specimens - Chemical cleaning
Ta specimens - Chemical cleaning
Ta specimens - Chemical etching - General microstructure
Ta specimens - Chemical polishing
Ta specimens - Chemical polishing
Ta specimens - Chemical polishing
Ta specimens - Electrolytic polishing
Ta specimens - Electrolytic polishing
Ta specimens - Electrolytic polishing
Ta thin films - Chemical etching - General microstructure
Ta thin films converted to Ta2O5 and TaN - Chemical etching - General microstructure
Ta(C, N, O) specimen - Chemical etching - General microstructure
Ta(C,N,O) - Chemical etching - General microstructure
Ta, Ta-Ir and Ta-Rh alloys - Chemical etching
Ta, W-Anodizing
Ta-C alloys - Chemical etching
Ta-C alloys - Chemical etching - General microstructure
Ta-C alloys - Chemical etching - General microstructure
Ta-C system - < 1.5 at.% C - Chemical polishing
Ta-Mo and Ta noble metal alloys - Chemical etching
Ta-Mo-C alloys - Chemical etching - General microstructure
Ta-Pd system - Chemical etching - General microstructure
Ta-Pt alloys (50-100 at.% Pt) - Electrolytic etching - General microstructure
Ta-Re alloys - Chemical etching
Ta-Ru alloys (Approx. TaRu) - Eletrolytic polishing and etching
Ta-Sc alloys - Chemical etching - General microstructure
Ta-Ti alloys - Chemical etching
Ta-W-Hf alloy T-111-8% W, 2% Hf
Ta-W-Hf alloy T-111-8% W, 2% Hf - Electrolytic polishing by twin jet
Ta-W-Re alloys - Chemical etching
Ta-Zr alloys - Chemical etching
Ta-Zr alloys - Electrolytic polishing and etching
Ta2O3 thin films - Chemical etching - General microstructure
Ta2O5 specimen - Chemical etching - General microstructure
Ta2O5 specimens - Thermal ecthing
Ta2O5 thin films - Gas, stabilizing
TaB2 and other specimens - Chemical etching - General microstructure
TaB2 and other specimens - Chemical etching - General microstructure
TaB2, TaB, and Ta3B4 specimens - Chemical etching - General microstructure
TaC - Chemical etching
TaC - Chemical etching
TaC - Chemical etching - General microstructure
TaC specimens - Chemical cleaning
TaC specimens - Chemical etching - General microstructure
TaC, (Fe,Si)C - Chemical etching - General microstructure
TaC, TiC, SiC - Electrolytic etching - General microstructure
TaC, electrolytic alloy deposited thin films on different substrates - Chemical etching - General microstructure
TaC, electrolytic alloy deposited thin films on different substrates - Chemical etching - General microstructure
TaH powder - Chemical etching - General microstructure
TaH thin films grown on (100) - Electrolytic etching - General microstructure
TaMo single crystal alloy - Electrolytic polishing
TaN - Chemical etching - General microstructure
TaN thin film deposits - Chemical polishing
TaN thin films - Chemical etching - General microstructure
TaN thin films - Chemical etching - General microstructure
TaN thin films - Chemical etching - General microstructure
TaS2 single crystals - Chemical etching - General microstructure
TaSe2 single crystal specimens - Chemical etching - General microstructure
TaSi2 as thin films - Ionized gas etching
TaSi2 thin films - Chemical etching - General microstructure
TaSi2 thin films - Chemical etching - General microstructure
TaSi2 thin films 2500-2800 A - Chemical etching - General microstructure
TaSi2 thin films deposited on silicon (100) - Chemical cleaning
TaSi2 thin films deposited on silicon - Ionized gas etching
TaSi2 thin films deposited on silicon substrates - Ionized gas etching
TaW thin films-Solvent removal
Taff's etchant - For Sn-Bi
Taff's etchant - Pure Sn and Sn-Bi alloys - Chemical etching
Taff's etchant - Sn-Bi alloy (12% Bi) - Chemical etching - General microstructure
Talc, H2O x 3MgO x 4SiO2
Tantalum - Attack polishing
Tantalum - Attack polishing
Tantalum - Attack polishing
Tantalum - Attack polishing
Tantalum - Attack-polishing
Tantalum - Chemical etching
Tantalum - Chemical etching
Tantalum - Chemical etching
Tantalum - Chemical etching
Tantalum - Chemical etching
Tantalum - Chemical etching
Tantalum - Chemical etching
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing and etching
Tantalum - Dislocation etching
Tantalum - Electrolytic etching
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing
Tantalum - Electrolytic polishing and chemical etching
Tantalum - Electrolytic polishing and etch pits etching
Tantalum - Electrolytic thinning
Tantalum - Electrolytic thinning and polishing
Tantalum - Electrolytic thinning by window technique
Tantalum - Electrolytic thinning by window technique
Tantalum - Jet etching
Tantalum - Mo, Ta, Nb, Mo-Ti alloys
Tantalum - Nb, Ta, Mo and their alloys - General microstructure
Tantalum - Physical etching - General microstructure
Tantalum - Pure Ta - General microstructure
Tantalum - Ta and Ta alloys - General microstructure
Tantalum - Ta and Ta alloys - General microstructure
Tantalum - Ta and Ta alloys - General microstructure
Tantalum - Ta and Ta base alloys - General microstructure
Tantalum - Ta and Ta base alloys - General microstructure
Tantalum - Ta and Ta base alloys, Nb and Nb base alloys, Nb-Cr alloys, Mo and Mo alloys
Tantalum - Ta base alloys, Nb base alloys - General microstructure
Tantalum - Ta base and Nb base alloys - General microstructure
Tantalum - Ta, Nb, and their alloys - General microstructure
Tantalum - W and W base alloys, Ta na Ta base alloys
Tantalum boride (TaB2) - Electrolytic etching
Tantalum carbide (TaC) - Thermal etching
Tantalum nitrides (Ta8N, Ta38N5) - Electrolytic thinning
Tantalum specimens - Chemical etching - General microstructure
Tantalum-nitrogen system - 0.6-6.5 at.% N
Tantalum-nitrogen system - 10.6 at.% N2
Tb single crystal specimens - Thermal etching
Tb-Ag alloys - Chemical etching - General microstructure
Tb-Au alloys - Chemical etching - General microstructure
Tb-Bi system - Chemical etching - General microstructure
Tb-Pd alloys (Approx. Tb3Pd4) - Chemical etching - General microstructure
TbCo2Si specimens - Chemical etching - General microstructure
TbCu2Ge2 specimens - Chemical etching - General microstructure
Te (0001) and (1010) wafers - Chemical polishing
Te (0001) and (1010) wafers - Oxide removal
Te (0001) and (1010) wafers - Te (0001) and (1010) wafers
Te (0001) and (12T0) wafers - Chemical cleaning
Te (0001) and other wafer orientations - Chemical etching - General microstructure
Te (0001) specimens - Abrasive polishing
Te (0001) wafers - Chemical polishing
Te (0001) wafers - Chemical polishing
Te (0001) wafers - Sawing
Te (1010) wafers - Chemical polishing
Te (1010) wafers - Dislocation etching
Te (10T0) wafers - Chemical etching - General microstructure
Te material used for epitaxy growth - Salt, removal
Te-As alloys - Chemical etching - General microstructure
Te-bismuth telluride - Chemical etching
TeO2 as natural single crystals - Chemical polishing/etching
TeO2 crystalline native oxide or TeO, amorphous native oxide - Salt, removal
TeO2 grown as a stable native oxide on CdTe (110) wafers - Chemical etching - General microstructure
Tellurium - Dislocation etching
Tellurium oxide (TeO2)-phosphoric pentoxide system (P2O5) - Chemical etching - General microstructure
Tellurium oxide-boric oxide system - Chemical etching - General microstructure
Tellurium oxide-boric oxide-cadmium oxide glass-TeO2 - B2O3 - CdO system
Tellurium oxide-boric oxide-cobalt oxide glass - TeO2-B2O3-CaO glass
Tellurium oxide-boric oxide-germanium oxide glass - TeO2-B2O3-GeO2 system
Tellurium oxide-boric oxide-iron oxide glass - TeO2-B2O3-Fe2O3-system
Tellurium oxide-boric oxide-manganese oxide glass
Tellurium oxide-boric oxide-nickel oxide glass - TeO2-B2O3-NiO system
Tellurium single crystal - Chemical etching - General microstructure
Tellurium specimens - Chemical etching - General microstructure
Tellurium specimens - Electrolytic polishing
Tellurium specimens - Electrolytic-mechanical polishing
Tellurium specimens - Ge, Te, Se, telurides, selenides and Zr silicide
Tellurium specimens - Si, Te, Se
Temper embrittlement in steel - Chemical etching - General microstructure
Temper embrittlement in steel - Chemical etching - General microstructure
Temper embrittlement in steels - Chemical etching
Terbium specimens - Electrolytic polishing
Textured alpha-alumina - EBSD sample preparation
Th and Th alloys - Electrolytic polishing - Dislocation etching
Th and Th alloys - Electrolytic polishing - Dislocation etching
Th and Th alloys - Electrolytic polishing - Dislocation etching
Th and Th alloys - Electrolytic polishing - Dislocation etching
Th and aloys - Chemical etching
Th specimens - Chemical cleaning
Th specimens - Chemical etching - General microstructure
Th specimens - Electrolytic polishing/etching
Th(x)U(y)U2 specimens - Chemical etching - General microstructure
Th(x)U(y)U2 specimens - Chemical etching - General microstructure
Th, U, and alloys - Electrolytic etching
Th-C alloys - Chemical and electrolytical etching
Th-Cu alloys - Electrolytic polishing, air etching
Th-Ge alloys - Chemical etching - General microstructure
Th-Mo alloy - Sample preparation
Th-Pd alloys (Approx. Th3Pd4) - Chemical etching - General microstructure
Th-Zr alloy - Physical ething
ThC - Chemical etching - General microstructure
ThC carbide - Chemical etching - General microstructure
ThC carbide - Chemical etching - General microstructure
ThC carbide - Chemical etching - General microstructure
ThC2 and (Th,U)C2 - Chemical etching
ThC2 carbide - Chemical etching - General microstructure
ThC2 carbide - Chemical etching - General microstructure
ThO2 (111) wafers - Chemical etching - General microstructure
ThO2 + Y2O3 specimens - Chemical etching - General microstructure
ThO2 specimens - Chemical etching - General microstructure
ThO2-W - Electromechanical polishing
ThO2-Y2O3 mixtures - Chemical ecthing
Thallium - Chemical etching
Thallium - Chemical etching
Thallium - Chemical etching
Thallium - Chemical etching
Thallium - Chemical etching
Thallium - Chemical etching
Thallium specimens - Chemical etching - General microstructure
Thallium specimens - Chemical etching - General microstructure
Thallium specimens - Chemical etching - General microstructure
Thallium specimens - Electrolytic etching - General microstructure
Thallium specimens - Electrolytic polishing
Thallium specimens - Electrolytic-mechanical polishing
Thin section for EBSD - EBSD sample preparation
Thorium - Attack polishing
Thorium - Electrolytic and chemical etching
Thorium - Electrolytic etching
Thorium - Electrolytic etching
Thorium - Electrolytic etching - General microstructure
Thorium - Electrolytic polishing
Thorium - Electrolytic polishing
Thorium - Electrolytic polishing
Thorium - Electrolytic polishing
Thorium - Electrolytic polishing
Thorium - Electrolytic polishing
Thorium - Physical etching - General microstructure
Thorium - Th and Th alloys - General microstructure
Thorium carbide (ThC) - Cathodic etching
Thorium carbide (ThC) - Chemical and electrolytic etching - General microstructure
Thorium carbide (ThC) - Chemical ecthing
Thorium carbide (ThC) - Electrolytic polishing
Thorium dicarbide (ThC2)-uranium dicarbide (UC2) - Electrolytic polishing
Thorium oxide (ThO2) - Chemical etching - General microstructure
Thorium oxide (ThO2) - Chemical etching - General microstructure
Thorium oxide (ThO2) - Chemical etching - General microstructure
Thorium oxide (ThO2) - Chemical etching - General microstructure
Thorium oxide (ThO2) - Chemical etching - General microstructure
Thorium oxide (ThO2)-yttrium oxide (Y2O3) - Chemical etching - General microstructure
Thorium oxide (ThO2)-yttrium oxide (Y2O3)-10 mol.% ThO2 - Chemical etching - General microstructure
Thulium orthoferrite (TmFeO3) - Chemical polishing
Thulium specimens - Electrolytic polishing
Ti alloyed steels - To reveal Ti containing grain boundary phases in Ti alloyed steels
Ti alloys - Chemical etching
Ti alloys - Chemical etching
Ti alloys - Chemical etching
Ti alloys - Chemical etching
Ti alloys - Chemical etching
Ti alloys - Electrolytic etching
Ti alloys and Ti-Pd alloys (up to 42% Pd) - Chemical etching
Ti alloys, etches segregation - Chemical ecthing
Ti alloys, removal of Cu deposits on the surface - Chemical etching - General microstructure
Ti alloys, removal of Sn deposits on the surface - Chemical etching
Ti and Ti alloy - Modified window technique
Ti and Ti alloys (single crystals) - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing - Dislocation etching
Ti and Ti alloys - Electrolytic polishing and chemical etching
Ti and Ti-base alloys, segregations, color etchant - Electrolytic etching
Ti and alloy - Sample preparation procedure
Ti and alloys (Battelle) - Chemical etching
Ti and alloys - Chemical etching
Ti and alloys - Chemical etching
Ti and alloys - Chemical etching
Ti and alloys - Chemical etching
Ti and alloys - Chemical etching
Ti and alloys - Electrolytic etching
Ti and alloys - Heat etching
Ti borides - Electrolytic etching
Ti evaporated as thin films - Chemical etching - General microstructure
Ti rod (electrode) - Chemical cleaning
Ti sheet and alloys - Chemical cleaning
Ti sheet and alloys - Chemical etching - General microstructure
Ti sheet and alloys - Chemical etching - General microstructure
Ti sheet and alloys - Chemical etching - General microstructure
Ti sheet and alloys - Chemical etching - General microstructure
Ti sheet and alloys - Chemical etching - General microstructure
Ti sheet specimens - Chemical etching - General microstructure
Ti specimens - Chemical etching - General microstructure
Ti specimens - Chemical etching - General microstructure
Ti specimens - Chemical etching - General microstructure
Ti specimens - Chemical etching - General microstructure
Ti specimens - Chemical etching - General microstructure
Ti specimens - Chemical polishing
Ti specimens - Chemical polishing/etching
Ti specimens - Chemical polishing/etching
Ti specimens - Electrolytic polishing
Ti specimens - Electrolytic polishing
Ti specimens - Electrolytic polishing
Ti specimens - Electrolytic polishing
Ti specimens - Electrolytic polishing
Ti specimens - Electrolytic polishing
Ti specimens - Salt polishing
Ti specimens - Thermal etching
Ti specimens and thin films - Chemical etching - General microstructure
Ti specimens and thin films - Chemical etching - General microstructure
Ti specimens and thin films - Chemical etching - General microstructure
Ti specimens used for electroplating - Electrolytic polishing
Ti thin film deposit - Chemical etching - General microstructure
Ti thin film deposit - Chemical etching - General microstructure
Ti thin film evaporation in vacuum systems - Chemical etching - General microstructure
Ti thin films - Chemical etching - General microstructure
Ti thin films - Chemical etching - General microstructure
Ti thin films - Electrolytic oxidation
Ti, 5% Al and 2.5% Sn alloy - Chemical etching
Ti-12.6% V specimen - Chemical thinning
Ti-6Al-4V alloy - Chemical etching
Ti-Ag alloy - Alloys with 10-26 at.% Ag
Ti-Al alloy ( <25% Al) - Chemical etching - General microstructure
Ti-Al alloy (< 25% Al) - Precipitate etching
Ti-Al alloy (30% Al) - Electrolytic polishing
Ti-Al alloy (Ti-4Al) - Chemical polishing
Ti-Al alloy (Ti-8.6-10Al) - Electrolytic polishing
Ti-Al alloy - Alloy with 5% Al - General microstructure
Ti-Al alloys (3-46% Al) - Electrolytic polishing
Ti-Al alloys (5% Al) - Electrolytic thinning
Ti-Al alloys (Ti rich) - Electrolytic polishing and micro etching
Ti-Al alloys - Alloys with up to 40% Al
Ti-Al alloys - Chemical etching - General microstructure
Ti-Al alloys - Chemical etching - General microstructure
Ti-Al alloys - Chemical etching - General microstructure
Ti-Al alloys - Electrolytic thinning
Ti-Al alloys - Ti rich alloys - General microstructure
Ti-Al system - Alloys with up to 5 at.% Al - General microstructure
Ti-Al-B alloy - Alloy with 5% Ti and 1% B
Ti-Al-B alloys - Chemical etching - General microstructure
Ti-Al-Mn alloy - Electrolytic thinning
Ti-Al-Mn alloy - Electrolytic thinning in PTFE holder
Ti-Al-Mo alloy - 8Al-1Mo-1V - General microstructure
Ti-Al-Mo alloy - Alloy with 6% Al and 2% Mo
Ti-Al-Mo-V alloy - 4-8% Al, 1-3% Mo, 1% V
Ti-Al-Mo-V alloy - 8Al-1Mo-1V - General microstructure
Ti-Al-Mo-V alloy - Chemical etching - General microstructure
Ti-Al-Mo-V alloy - Ti-811 (Ti-8Al-1Mo-1V)
Ti-Al-Mo-V alloy - Ti-8Al-1Mo-1V
Ti-Al-Nb-Ta alloy - Electrolytic thinning
Ti-Al-Nb-Ta-Mo alloy - Ti-6Al-2Nb-1Ta-0.8Mo - General microstructure
Ti-Al-Ni, Ti-Al-Sn, and Ti-Si alloys, hydrides - Chemical etching - General microstructure
Ti-Al-Si alloy (< 10% Al, 1% Si) - Chemical etching - General microstructure
Ti-Al-Sn alloy - Alloy with 2.5-5% Sn, 7-14.5% Al
Ti-Al-Sn alloy - Alloy with 5% Al and 2.5% Sn
Ti-Al-Sn alloy - Alloy with 5% Al and 2.5% Sn
Ti-Al-Sn alloy - Alloys with 5% Al and 2.5% Sn
Ti-Al-Sn alloy - Chemical etching - General microstructure
Ti-Al-Sn-Zr-Mo alloy - Ti-6Al-2Sn-4Zr-2Mo
Ti-Al-V alloy (5.9-9.7% Al, 2-6% V) - Chemical etching - General microstructure
Ti-Al-V alloy (6% Al, 4% V) - Chemical etching - General microstructure
Ti-Al-V alloy (6% Al, 4% V) - Electrolytic thinning
Ti-Al-V alloy (6Al-4V) - Chemical etching - General microstructure
Ti-Al-V alloy (6Al-4V) - Chemical etching - General microstructure
Ti-Al-V alloy (6Al-4V) - Chemical etching - General microstructure
Ti-Al-V alloy (6Al-4V) - Chemical polishing
Ti-Al-V alloy (6Al-4V) - Chemical polishing
Ti-Al-V alloy (6Al-4V) - Electrolytic polishing
Ti-Al-V alloy (6Al-4V) - Electrolytic thinning
Ti-Al-V alloy (6Al-4V) - General microstructure
Ti-Al-V alloy - Alloy with 6% Al and 4% V - General microstructure
Ti-Al-V alloy - Electrolytic thinning
Ti-Al-V alloys - Chemical etching - General microstructure
Ti-Al-V-Sn alloy - Alloy with 6% Al, 6% V and 2% Sn
Ti-Al-V-Sn alloy - Alloy with 6% Al, 6% V and 2% Sn
Ti-Al-V-Sn alloy - Ti-6Al-6V-2Sn alloy
Ti-Al-V-Sn alloy - Ti-6Al-6V-2Sn alloy
Ti-Al-Zr alloys - Alloys with 4.6-4.9% Al and 2-4% Zr
Ti-Al-Zr-Mo-Si alloy - Ti-6Al-6Zr-0.5Mo-0.25Si
Ti-Al-Zr-W-Si alloys - Electrolytic polishing and chemical etching
Ti-Au alloys - For alloys with 4 - 20 at.% Au - General microstructure
Ti-B system - Ti-TiB eutectic - General microstructure
Ti-Be alloys - For alloys with < 10% Be
Ti-Bi alloy (Ti-3.1 at.% Bi) - Chemical etching - General microstructure
Ti-C alloy - Potentiometric etching
Ti-C system - Ti-TiC section
Ti-C system - TiC(x), 0.5 < x < 1.0 - Single crystal
Ti-Co alloy - Alloy with 5% Co - General microstructure
Ti-Co alloy - F.c.c low Ti alloys - General microstructure
Ti-Co alloy - Ti - 3/8 at.% Co - General microstructure
Ti-Cr alloy - Ti - 10-20 at.% Cr - Electrolytic thinning
Ti-Cr alloy - Ti-6% Cr - General microstructure
Ti-Cr alloys - Chemical etching - General microstructure
Ti-Cr-V-Al alloy - 13% Cr, 11% V, 8% Al
Ti-Cr-V-Al alloy - 13Cr-11V-3Al - Electrolytic polishing
Ti-Cr-V-Al alloy - 13V-11Cr-3Al - Chemical polishing
Ti-Cu alloy - Electrolytic thinning by Mirand-Saulnier technique
Ti-Cu alloy - For alloys with 5% Cu
Ti-Cu alloys (approx. Ti2Cu) - Chemical etching - General microstructure
Ti-Cu alloys - Chemical etching
Ti-Cu alloys - Chemical etching - General microstructure
Ti-Cu alloys - Chemical etching - General microstructure
Ti-Fe alloy - Ti-4.5-13 at.% Fe
Ti-Mn alloy (10% Mn) - Electrolytic polishing
Ti-Mn alloy (8% Mn) - Electrolytic polishing and chemical etching
Ti-Mn alloy - Alpha-Beta alloys
Ti-Mn alloy - Ti-8.6 at.% Mn
Ti-Mn alloys - Chemical etching - General microstructure
Ti-Mo alloy (11% Mo) - Chemical etching - General microstructure
Ti-Mo alloy (11-17 at.% Mo) - Electrolytic thinning
Ti-Mo alloy (15% Mo) - Electrolytic polishing
Ti-Mo alloy (15.2 at.% Mo) - Chemical polishing
Ti-Mo alloy (7 at.% Mo) - Chemical etching - General microstructure
Ti-Mo alloy - Electrolytic thinning
Ti-Mo alloys (2-10% Mo) - Chemical etching - General microstructure
Ti-Mo-Zr-V-Al alloy - Electrolytic thinning
Ti-Nb diffusion couple - Electrolytic etching
Ti-Ni alloys (8-14 at.% Ti) - Jet electrolytic polishing
Ti-Ni alloys (Ni-12% Ti) - Electrolytic polishing
Ti-Ni alloys (Ti-3/5 at.% Ni) - Chemical etching - General microstructure
Ti-Ni-Cr alloy - TiNi-2/8% Cr - General microstructure
Ti-Ni-Si alloy - TiNi-1.3/5% Si
Ti-O-H alloy - Attack polishing
Ti-O-H alloys - Chemical etching - General microstructure
Ti-P alloys - General microstructure
Ti-Pb alloy (Ti-5.3 at.% Pb) - Chemical etching - General microstructure
Ti-Pd alloys (Ti rich) - Chemical etching - General microstructure
Ti-Pd alloys (Ti-8 at.% Pd) - Chemical etching - General microstructure
Ti-Si alloy - Ti-0.5/1.5 at.% Si
Ti-Si alloys - Chemical etching
Ti-Si system (Ti-Ti5Si3 eutectic) - Chemical etching - General microstructure
Ti-Sn alloys (10-40% Sn) - Electrolytic thinning
Ti-Sn alloys (up to 25% Sn) - Chemical etching
Ti-Ta alloy - Chemical etching and thinning
Ti-TiAg-Ag thin films - Chemical etching - General microstructure
Ti-V alloy (20% V) - Electrolytic thinning
Ti-V alloy - Electrolytic thinning
Ti-V alloy - Electrolytic thinning
Ti-V alloy - Electrolytic thinning and jet etching
Ti-V alloys (>20% V) - Dislocation etching
Ti-V alloys (15.5% V) - Chemical etching - General microstructure
Ti-V alloys (5-20% V) - Chemical etching and electrolytic thinning
Ti-V alloys (Beta alloys, 20-40 wt.% V) - Chemical polishing and elecytrolytic etching
Ti-V alloys - Chemical polishing
Ti-V-Cr-Al-Mo-Zr alloy - Beta C Ti-3Al-8V-6Cr-4Mo-4Zr
Ti-V-Cr-Al-Mo-Zr alloy - RMI (38-6-44) alloy Ti-3.5Al-8V-6Cr-4Mo-4Zr
Ti-V-Cr-Zr-Mo-Al alloy - Ti-3Al-8V-6Cr-4Zr-4Mo
Ti-V-Fe-Al alloy - Electrolytic polishing, chemical etching, electrolytic thinning
Ti-V-Si alloy - Ti-40V-1Si - Electrolytic polishing
Ti-Zr alloy (2% Ti) - Electrolytic thinning
Ti-Zr alloy (25 at.% Ti) - Chemical thinning and polishing
Ti2O3 specimens and thin films - Chemical etching - General microstructure
Ti3SiC2 (titanium silicon carbide) - Chemical etching - General microstructure
Ti6Al4V alloy - Chemical etching - General microstructure
TiB2 - Chemical etching
TiB2 - Chemical etching
TiB2 - Chemical etching
TiB2 - Chemical etching - General microstructure
TiB2 - Chemical etching - General microstructure
TiB2 - Chemical etching - General microstructure
TiB2 - Chemical etching - General microstructure
TiB2 - Electrolytic etching - General microstructure
TiB2 and TiC single crystal wafers - Cleaning
TiB2, ZrB2 - Chemical etching - General microstructure
TiC (001) cleaved wafers - Electrolytic etching - General microstructure
TiC (001) cleaved wafers - Polishing
TiC (100) thin films - Electrolytic polishing
TiC (100) wafers - Gas cleaning
TiC and TaC - Electrolytic etching
TiC coated steel - Structure of titanium carbide layer
TiC coated steel - This solution revealed a good grain boundry pattern in titanium carbide layer
TiC single crystal ingot - Electrolytic polishing
TiC-C alloys - Electrolytic etching
TiD2 as thin films - Chemical etching - General microstructure
TiN thin films deposited on (100) silicon wafers - Chemical etching - General microstructure
TiN thin films deposited on Ti (0001) substrates - Chemical etching - General microstructure
TiN thin films deposited on poly - Si-Ionized gas etching
TiN thin films deposited on poly-Si - Chemical etching - General microstructure
TiN thin films deposited on silicon wafers - Chemical etching - General microstructure
TiO2 (001) basal oriented wafers - Chemical cleaning
TiO2 (110) natural single crystal rutile specimens - Salt flux decoration
TiO2 - Chemical etching - General microstructure
TiO2 - Chemical polishing
TiO2 - Dislocation etching
TiO2 - Physical etching - General microstructure
TiO2 as a native oxide on titanium substrates - Chemical ecthing
TiO2 as natural minerals - Chemical etching - General microstructure
TiO2 as natural single crystal rutile - Chemical cleaning
TiO2 as natural single crystal rutile - Gas cleaning
TiO2 natural rutile specimens - Chemical cleaning
TiO2 thin film deposited on GaAs (100) substrates - Chemical etching - General microstructure
TiO2 thin film deposits - Chemical etching - General microstructure
TiO2 thin films deposited on (111), n-type silicon substrates - Chemical etching - General microstructure
TiO2 thin films deposited on GaAs (100) substrates - Ionized gas cleaning
TiSi thin films grown on (100) silicon wafers - Chemical etching - General microstructure
TiSi2 arc melted - Chemical polishing
TiSi2 thin film formed on silicon (100) substrates - Chemical etching - General microstructure
TiSi2 thin film grown on Si substrates - Chemical etching - General microstructure
TiSi2 thin films deposited on silicon wafers - Ionized gas etching
TiSi2 thin films grown on silicon substrates - Acid oxidation
TiW thin films - Chemical etching - General microstructure
Tin (Sn) single crystal - Electrolytic polishing, chemical etching
Tin - Chemical etching
Tin - Chemical polishing
Tin - Dislocation etching
Tin - Electrolytic etching
Tin - Electrolytic etching - General microstructure
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing
Tin - Electrolytic polishing and etching
Tin - Electromechanical polishing
Tin - Grain contrast (color) in pure Sn and most Sn alloys
Tin - One of the best electrolyte for universal use
Tin - Pure Sn - General microstructure
Tin - Pure Sn, Sn rich slloys with Cd, Fe, Sb, Cu
Tin - Pure Sn, Sn-Cd, Sn-Fe, Sn-Pb, and Sn-Pb-Cu alloys
Tin - Sn layers on steel and cast irons
Tin - Sn layers on steel, Sn-Pb alloys
Tin - Sn layers, Sn bearing metals
Tin - Sn rich bearing metals and white metals, Sn-Cu alloys and Bi-Sn eutectic
Tin and tin alloys - Chemical etching - General microstructure
Tin and tin alloys - Chemical etching - General microstructure
Tin and tin alloys - Darkens primary and eutectic lead in lead rich Pb-Sn alloys
Tin and tin alloys - For etching tin-coated copper and copper alloys
Tin and tin alloys - For etching tin-coated steel
Tin and tin alloys - General use for Sn and Sn alloys
Tin and tin alloys - Grain boundary etch for pure Sn
Tin and tin alloys - High tin bearing metals
Tin and tin alloys - Pure Sn, Sn-Pb, Sn-Cd and Sn-Fe alloys
Tin and tin alloys - Pure tin and Sn-Pb alloys
Tin and tin alloys - Recommended for etching Sn-Sb alloys
Tin and tin alloys - Soldered joints
Tin oxide (SnO2) - Physical etching - General microstructure
Tin oxide (SnO2) - Physical etching - General microstructure
Tin specimens - Chemical etching - General microstructure
Tint etch for Fe-Ni massive martensite - Chemical etching
Tint etch for Mo alloys (Oak Ridge National Laboratory) - Chemical etching - General microstructure
Tint etch for W - Pre-etch with grain boundary etch
Tint etch for lath or plate martensite - Chemical etching
Tint etch for steels - Chemical etching
Tint etch for steels - Chemical etching
Tint etch for steels - Chemical etching
Tint etch of Lienard and Pacque's - For Cu-Al alloys
Titanium - Attack polishing
Titanium - Attack polishing
Titanium - Attack polishing
Titanium - Attack polishing
Titanium - Attack polishing
Titanium - Attack polishing
Titanium - Cathodic etching
Titanium - Chemical etching
Titanium - Chemical etching - General microstructure
Titanium - Chemical etching - General microstructure
Titanium - Chemical etching - General microstructure
Titanium - Chemical etching - General microstructure
Titanium - Chemical etching - General microstructure
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical thinning
Titanium - Dislocation etching
Titanium - Electrolytic etching - General microstructure
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing and chemical etching
Titanium - Electrolytic thinning
Titanium - Electrolytic thinning
Titanium - Electrolytic thinning by Mirand-Saulnier technique
Titanium - Electrolytic thinning by window technique
Titanium - Electrolytic thinning in RTFE holder
Titanium - Good general-purpose electrolyte
Titanium - Most types of Ti and Ti alloys, Ti-Mn, Ti-V-Cr-Al alloys
Titanium - One of the best electrolyte for universal use
Titanium - Physical etching - General microstructure
Titanium - Physical etching - General microstructure
Titanium - Pure Ti and Ti base alloys - General microstructure
Titanium - Sample preparation procedure
Titanium - Thermal etching
Titanium - Ti alloys - General microstructure
Titanium - Ti and Ti alloys, Grain boundary etchant
Titanium - Ti and Ti base alloys - Tint etching - Precipitates
Titanium - Ti, Ferro Ti, Ti-Al-V-Sn alloys
Titanium - Ti-Al-Sn and Ti-Al-Ni alloys
Titanium - Zr, Ti, U, steels, superalloys
Titanium 500 alloy - Chemical etching - General microstructure
Titanium 600 alloy - Chemical etching - General microstructure
Titanium alloys - Color etching - Alpha titanium grains
Titanium alloys - Color etching - General microstructure
Titanium alloys - Color etching - General microstructure
Titanium alloys - Electrolytic polishing
Titanium alloys - Electrolytic polishing
Titanium alloys - Thermal etching - General microstructure
Titanium alpha-Ti single crystal - Chemical polishing
Titanium and titanium alloys - Chemical etching - General microstructure
Titanium and titanium alloys - Chemical etching - General microstructure
Titanium and titanium alloys - Chemical etching - General microstructure
Titanium and titanium alloys - Chemical polish and etch - For most titanium alloys
Titanium and titanium alloys - Electrolytic polishing
Titanium and titanium alloys - Electrolytic polishing
Titanium and titanium alloys - For Ti-Si alloys
Titanium and titanium alloys - General purpose etch
Titanium and titanium alloys - General purpose etch - For Ti-3Al-8V-6Cr-4Mo-4Zr alloy
Titanium and titanium alloys - General purpose etch - For Ti-8Mn; aged Ti-13V-11Cr-3Al
Titanium and titanium alloys - General purpose etch - For Ti-Al-Zr and Ti-Si alloys
Titanium and titanium alloys - General purpose etch - For most titanium alloys
Titanium and titanium alloys - Nonstaining etch - For most titanium alloys
Titanium and titanium alloys - Removes stain - For most titanium alloys
Titanium and titanium alloys - Reveals alpha case - For most titanium alloys
Titanium and titanium alloys - Reveals hydrides - For unalloyed titanium
Titanium and titanium alloys - Reveals hydrides - For unalloyed titanium
Titanium and titanium alloys - Stains alpha, transformed beta - For alpha-beta Titanium alloys
Titanium boride (TiB2) - For revealing structure of TiB2
Titanium boride TiB2 - Chemical etching - General microstructure
Titanium carbide (TiC) - Chemical and electrolytic etching - General microstructure
Titanium carbide (TiC) - Electrolytic polishing and chemical etching
Titanium carbide (TiC) - Electrolytic thinning
Titanium carbide (TiC) - TiC(0.97)
Titanium carbide (TiC) single crystal - Electrolytic polishing
Titanium diboride (B-Ti(2)) - Chemical etching - General microstructure
Titanium diboride (B-Ti(2)) - Chemical etching - General microstructure
Titanium diboride (B-Ti(2)) - General microstructure
Titanium diboride single crystals (B-Ti(2)) - Chemical etching - General microstructure
Titanium dioxide (TiO2) - Chemical etching - General microstructure
Titanium nitride (TiN)-Molybdenum cermets (MoO3) - Chemical etching
Titanium oxide (Rutile-TiO2) - Chemical etching - General microstructure
Titanium silicide (TiSi2) - Chemical etching - General microstructure
Titanium-gallium alloys (Ti-Ti3Ga) - Chemical etching - General microstructure
Tl (0001) wafers - Chemical cleaning
Tl poly crystalline specimens - Chemical etching - General microstructure
Tl specimens - Chemical etching - General microstructure
Tl specimens - Chemical etching - General microstructure
Tl2Se3 and TlSe single crystal - Chemical polishing
Tm single crystal specimens - Thermal etching
Tm-Ag alloys - Chemical etching - General microstructure
Tm-Au alloy - Chemical etching - General microstructure
Tm-Bi system - Chemical etching - General microstructure
Tm-Pd alloys (Approx. Tm3Pd4) - Chemical etching - General microstructure
To detect oxidation in steel - Chemical etching
To detect oxidation in steel - Chemical etching
Tool steels - Chemical etching
Tool steels - Color etching - Colors ferrite grains - Reveals banded structures
Tool steels - Color etching - For Mn, Mn-C, Mn-Cr steels
Tool steels - Color etching - For carbon, alloy and tool steels
Tool steels - Color etching - Colors pearlite and hardened structures of unlloyed steels
Tool steels - Color etching - Colors the martensite in Fe-C alloys
Tool steels - Color etching - For carbon, alloy and Fe-Mn (5-18% Mn) steels
Tool steels - Color etching - For carbon, alloy and manganese steels
Topaz-Al2(SiO4)(OH,F)2 - Etching for defects (etch pits, etc.)
Tri-iodide etchant - Au specimens and thin films - Chemical etching
Tri-iodine etchant - Au thin film deposits as a multilayer Au/Ni/Au/TiW/Si(100) substrate - Chemical etching
Tri-iodine etchant - AuGe (13%) alloy ribbon - Chemical etching
Tucker's etchant - 5052 Al alloy - Chemical etching - General microstructure
Tucker's etchant I - Pure Al, Mn-Al, Si-Al, Mg-Al, Mg-Si-Al alloys
Tucker's etchant II - For Al alloys
Tungsetn boride - Attack polishing
Tungsten - Attack polishing
Tungsten - Attack polishing
Tungsten - Attack polishing
Tungsten - Cathodic etching
Tungsten - Chemical etching
Tungsten - Chemical etching
Tungsten - Chemical etching
Tungsten - Chemo-mechanical polishing
Tungsten - Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Tungsten - Dislocation etching
Tungsten - Dislocation etching
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing
Tungsten - Electrolytic polishing and etching
Tungsten - Electrolytic thinning
Tungsten - Electrolytic thinning
Tungsten - Electrolytic thinning by window technique
Tungsten - Electromechanical polishing
Tungsten - Eutectic W-Co alloys - General microstructure
Tungsten - For removing slip lines and twins
Tungsten - For sub grain boundaries and slip lines
Tungsten - Mo and Mo-Ni alloys, W and W alloys
Tungsten - Mo, W and their alloys - General microstructure
Tungsten - Mo, W and their alloys - General microstructure
Tungsten - Mo, W and their alloys - General microstructure
Tungsten - Tint etching
Tungsten - W and W base alloys - General microstructure
Tungsten - W and W base alloys - General microstructure
Tungsten - W and W base alloys. Mo and Mo base alloys - General microstructure
Tungsten - W and W base alloys. Ta na Ta base alloys - General microstructure
Tungsten - W-Co alloys containing 10-70% W - General microstructure
Tungsten alloys - Electrolytic polishing
Tungsten alloys - Electrolytic polishing
Tungsten and tungsten alloys - Chemical etching - General microstructure
Tungsten and tungsten alloys - Chemical etching - General microstructure
Tungsten and tungsten alloys - Chemical etching - General microstructure
Tungsten and tungsten alloys - W-Co alloys with 10-70% W
Tungsten and tungsten alloys - W-Co alloys with 10-70% W
Tungsten and tungsten alloys - W-Co alloys with eutectic compostion (cca 46% W)
Tungsten single crystal - Electrolytic polishing
Tungsten single crystal - Electrolytic polishing, chemical polishing
Tungsten specimens - Chemical etching - General microstructure
Tungsten specimens - Chemical etching - General microstructure
Tungsten specimens - Chemical etching - General microstructure
Tungsten, color etchant - Chemical etching - General microstructure
Tungsten-2.8 vol.% ThO2 alloy - Electrolytic thinning
Tungsten-Silicon alloys (WSi2) - Chemical etching - General microstructure
Tungsten-Wire - Electrolytic polishing
Type 300 maraging steel - Fe, 18.5% Ni, 8.75% Co, 4.9% Mo, 0.65% Ti, max. 0.03% C, 0.1% Al
Type 304 L stainless steel - Fe-0.03C-19Cr-10Ni-0/2Mn-0/1Si
Type 304 and 304L stainless steels - Fe-0.03/0.06C-18Cr-9/10Ni-1/1.2Mn
Type 304 stainless heat resisting steel - Fe-0.1C-18Cr-8.5Ni-1.4Mn-0.5Si
Type 304 stainless steel - Chemical etching - General microstructure
Type 304 stainless steel - Electrolytic etching
Type 304 stainless steel - Electrolytic thinning
Type 304 stainless steel - Fe-0.07C-18.8Cr-9.4Ni-0.8Mn-0.65Si
Type 304 stainless steel - Fe-18.6Cr-9.5Ni-1.3Mn-0.35Mo-0.44Si-0.25Cu-0.04C
Type 304 stainless steel - Fe-18Cr-8.6Ni-1.2Mn-0.2Co-0.1Cu-0.1Mo-0.1W0-0.04C
Type 304 stainless steel - Jet electrolytic polishing
Type 304 stainless steel - Jet thinning
Type 304 stainless steel - Twin jet electrolytic thinning
Type 310 stainless steel - Fe-25.5Cr-20Ni-0.04C-0.7Si-0.4Mn
Type 316 stainless steel - Chemical etching - General microstructure
Type 316 stainless steel - Chemical etching - General microstructure
Type 316 stainless steel - Fe-0.02/0.04C-1.8/2.5Mn-17/18Cr-12/12.5Ni-2.25Mo-0.4/0.8Si
Type 316 stainless steel - Fe-16/17Cr-10/12Ni-2.2/2.5Mo-0.45/1.7Mn-0.2/0.4Si-0.04/0.07C
Type 4140 steel - 0.4C-0.8Mn-1Cr-0.3Mo
Type 430 stainless steel - Fe-16Cr-0.06C-0.4Si-0.4Mn
Type 800 stainless steel - Fe-21.4Cr-33.2Ni-0.5Ti-0.5Si-0.6Mn-0.3Al-0.015C
Type AISI 316 stainless steel - Fe-18Cr-8Ni-2.5Mo
Type AISI 316 stainless steel - Twin jet electrolytic polishing
Type I glass-70% SiO2 - 23% B2O3 - 7% Na2O
Type II glass - 81% SiO2, 12.6% B2O3, 3.9% Na2O, 2.4% Al2O3
U alloy and 2% Zr - Electrolytic etching
U alloys (U-N-Mo alloys) - Physical etching - General microstructure
U alloys - Chemical etching
U alloys - Chemical etching - General microstructure
U alloys - Electrolytic etching
U alloys and 10% Nb alloys - Chemical etching
U alloys and 5% fission products - Electrolytic etching
U and 5% fission products - Chemical etching
U and U alloy - Anodising etching solution
U and U alloys - Electrolytic etching - General microstructure
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and U alloys - Electrolytic polishing - Dislocation etching
U and alloys - Chemical etching
U and alloys - Electrolytic etching
U and alloys - Electrolytic etching
U and alloys - Electrolytic etching
U beryllides and U-Zr and U-Nb alloys - Chemical etching
U carbide - Chemical etching
U silicides, U-Zr, U-Ti, U-Zr-Mo alloys - Chemical etching
U specimens - Chemical cleaning
U specimens - Chemical cleaning
U specimens - Chemical polishing
U specimens - Chemical polishing
U specimens - Chemical polishing
U specimens - Electrolytic polishing
U specimens - Electrolytic polishing
U(C, N) specimens - Ceramic compunds - General microstructure
U(C, O) specimens - Ceramic compunds - General microstructure
U, Pu - Chemical etching - General microstructure
U, Pu, Am - Chemical etching - General microstructure
U-10Nb alloys - Chemical etching - General microstructure
U-2% Zr alloy - Sample preparation procedure
U-Al alloys - Chemical etching
U-Al alloys - Chemical etching - General microstructure
U-Al alloys - Chemical etching and electrolytic etching
U-Al-Ni system - UAl2-NiAl section - General microstructure
U-Be alloys, U-Zr and U-Nb alloys - Chemical etching - General microstructure
U-C alloys - Electrolytic etching
U-C alloys - Electrolytic etching - General microstructure
U-Co alloys - Physical etching - General microstructure
U-Co-Al alloy - UCo2-UAl3 section
U-Cu system - Electrolytic polishing
U-Fe alloys - Chemical and electrolytic etching
U-Fe-C alloys - Electrolytic polishing
U-Mn system - Electrolytic polishing
U-Mo alloy (16 wt.% Mo) - Electrolytic etching - General microstructure
U-Mo alloy (5 at.% Mo) - Sample preparation
U-Mo alloy - Electrolytic thinning by Mirand-Saulnier technique
U-Mo alloys - Electrolytic etching and polishing
U-Mo alloys - Physical etching - General microstructure
U-Mo and U-Zr alloys - Chemical etching
U-Mo and U-Zr alloys with stabilized gamma phase - Chemical etching - General microstructure
U-Mo-Ti alloys - Attack polishing
U-N-P alloy - UN-UP pseudobinary
U-Nb alloy - Cathodic etching
U-Nb alloy - Sample preparation
U-Nb alloys - Potentiostatic etching
U-Nb-H alloys - Chemical etching - General microstructure
U-Nb-Mo alloy - Cathodic etching
U-Nb-Zr alloy - Alloy with 7.5 Nb-2.5Zr
U-Ni-Zr alloy (7.5% U, 2.5% Zr) - Electrolytic polishing and etching
U-Pd alloys (Approx. 55 at.% Pd) - Chemical etching - General microstructure
U-Pu alloys - Electrolytic polishing
U-Re alloys - Chemical and Electrolytic etching - General microstructure
U-Si alloy - Cathodic etching
U-Si alloys - Electrolytic etching
U-Ti alloys - Chemical etching
U-Zr alloy - Electrolytic polishing
U-Zr alloys (Zr rich) - Electrolytic polishing
U-Zr alloys - Chemical etching - General microstructure
U-Zr alloys - Electrolytic etching
U-Zr alloys - Electrolytic polishing
U2C3+UC2 specimens - Ceramic compunds - General microstructure
U3N4 specimens - Chemical etching - General microstructure
U3Si alloys - Chemical etching - General microstructure
U4O9 - Chemical etching - General microstructure
UB4, UB2 and UB12 specimens - Chemical etching - General microstructure
UB4, UB2, and UB specimens - Chemical etching - General microstructure
UC (001) wafers - Electrolyticlytic jet thinning
UC - Dislocation etching
UC single crystal wafers - Chemical etching - General microstructure
UC specimens - Chemical etching - General microstructure
UC+PuN specimens - Ceramic compunds - General microstructure
UC+PuN specimens - Ceramic compunds - General microstructure
UC+ZrC - Ceramic compunds - General microstructure
UC+ZrC - Ceramic compunds - General microstructure
UC, U(C,O) x U(C,N), UC-ZrC mixtures, UC-UC2, UC2-U2C3 mixtures,(U,Pu)C C-rich
UC2+UC - Ceramic compunds - General microstructure
UN (001) wafers - Electrolyticlytic jet thinning
UN+U(N, O)+U2N3 - Ceramic compunds - General microstructure
UN+U2N3 - Ceramic compunds - General microstructure
UN-PuN, UO2-PuO2 and irradiated UO2-PuO2 alloys - Chemical etching
UO2 + ZrO2 - Chemical etching - General microstructure
UO2 - Chemical etching
UO2 - Dislocation etching
UO2 - Electrolytic etching - General microstructure
UO2 - Thermal etching
UO2 and UO2CeO2 - Chemical etching
UO2 specimens - Chemical etching - General microstructure
UO2 specimens - Chemical etching - General microstructure
UO2 specimens - Electrolytic polishing
UO2 x Th(x)U(y)O2, PuO2 cast, PuO2 (gamma, sintered) - Chemical ecthing
UO2, U3Si - Attack polishing
UO2, UO2-CeO2, UO2-U4O9, and UO2-PuO2 mixtures - Chemical ecthing
UO2, UO2CeO2 - Attack polishing
UO2, carbide-coated graphite, pyrolitic graphite - Attack polishing
UO2-PuO2 mixtures - Chemical ecthing
UP - Chemical etching - General microstructure
US (001) wafers - Electrolyticlytic jet thinning
US - Chemical etching - General microstructure
US specimens - Chemical etching - General microstructure
UTi single crystal specimens - Electrolytic polishing
Udimet 500 alloy - Ni-15/20Cr-13/20Co-3/5Mo-2.5/3.25Al-0/4Fe
Udimet 700 - Chemical etching - General microstructure
Udimet 700 - Chemical etching - General microstructure
Udimet 700 - Electrolytic polishing, chemical etching
Udimet 700 - Stain etch for inclusions
Udimet 700 alloy - Ni-18.5Co-13Cr-3.5Ti-4.3Al-5.3Mo-0.08C-0.03B
Udimet 700 and Rene 41 - Chemical etching
Unalloyed and low-alloy steels, martensitic and bainitic microstructures, ferritic Cr steels, manganese steels, soldered joints with brass solder - Chemical etching - General microstructure
Unalloyed steels - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Untempered high-Si steels - Electrolytic etching
Uranium - Attack polishing
Uranium - Attack polishing
Uranium - Attack polishing
Uranium - Cathodic etching
Uranium - Cathodic etching
Uranium - Cathodic etching
Uranium - Chemical etching
Uranium - Chemical etching
Uranium - Chemical thinning and electrolytic polishing
Uranium - Electrolytic etching
Uranium - Electrolytic etching
Uranium - Electrolytic etching - General microstructure
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing
Uranium - Electrolytic polishing and etching
Uranium - Electrolytic thinning
Uranium - Electrolytic thinning
Uranium - Electrolytic thinning
Uranium - Electrolytic thinning
Uranium - Electrolytic thinning
Uranium - Electrolytic thinning by Bollmann technique
Uranium - Electrolytic thinning by Mirand-Saulnier technique
Uranium - Electrolytic thinning in PTFE holder
Uranium - Gamma phase stablized U-Mo and U-Zr alloys
Uranium - Good general-purpose electrolyte
Uranium - One of the best electrolyte for universal use
Uranium - Pure U and Th - General microstructure
Uranium - U alloys - General microstructure
Uranium - U and most U alloys - General microstructure
Uranium - U silicides - General microstructure
Uranium - U-Al alloys - General microstructure
Uranium - U-Be alloys, U-beryllides, U-Zr, and U-Nb alloys
Uranium - Zr, Ti, U, steels, superalloys
Uranium alloys - Color etching - Electrolytic etching
Uranium alloys - Color etching - Physical etching
Uranium alloys - Electrolytic polishing
Uranium and uranium alloys - Electrolytic etching
Uranium carbide (UC) - Chemical etching - General microstructure
Uranium carbide (UC) - Electrolytic polishing
Uranium carbide (UC) - Electrolytic polishing and etching
Uranium carbide (UC) - Electrolytic thinning
Uranium carbide (UC) - Physical etching - General microstructure
Uranium carbide (UC)-zirconium carbide (ZrC) system - Chemical etching - General microstructure
Uranium carbide (UC)-zirconium carbide (ZrC) system - Chemical etching - General microstructure
Uranium carbide-Lanthanum alloys
Uranium carbide-neodymium alloys (C-Nd-U)
Uranium carbides (UC, U2C3, UC2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - A suitable etching method for determining grain size
Uranium dioxide (UO2) - Cathodic etching
Uranium dioxide (UO2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - Chemical etching - General microstructure
Uranium dioxide (UO2) - Chemical thinning
Uranium dioxide (UO2) - Electrolytic thinning
Uranium dioxide (UO2) and higher oxides - Chemical etching - General microstructure
Uranium dioxide (UO2) single crystals - Used mainly for (111) faces but can be used for (100) faces
Uranium dioxide (UO2, irradiated) - Chemical etching - General microstructure
Uranium dioxide (UO2, irradiated) - Chemical etching - General microstructure
Uranium dioxide (UO2, irradiated) - Chemical etching - General microstructure
Uranium dioxide-carbon-nitrogen system - Chemical etching - General microstructure
Uranium dioxide-thoria system (10% UO4) - Chemical etching - General microstructure
Uranium nitride (UN) - Chemical etching
Uranium nitride (UN) - Chemical etching - General microstructure
Uranium nitride (UN) - Electrolytic polishing
Uranium oxide (U3O8) - Chemical etching - General microstructure
Uranium oxide (U4O9) - Chemical etching - General microstructure
Uranium oxide (UO2) - Chemical etching - General microstructure
Uranium oxide (UO2) - Chemical etching - General microstructure
Uranium oxide (UO2) - Electrolytic etching - General microstructure
Uranium oxide (UO2) - Electrolytic polishing
Uranium oxide (UO2) - Physical etching - General microstructure
Uranium oxide (UO2) - Physical etching - General microstructure
Uranium oxide (UO2) - Physical etching - General microstructure
Uranium phosphide - Chemical etching - General microstructure
Uranium phosphide - Chemical etching - General microstructure
Uranium silicon alloys - Chemical etching - General microstructure
Uranium silicon alloys - Distinguishes U3Si2, U3Si, alpha U and UC
Uranium silicon alloys - Distinguishes U3Si2, U3Si, alpha U and UC
Uranium silicon alloys - For U2Si2, U3Si, alpha U and UC
Uranium sulphide (US) - Chemical etching - General microstructure
Uranium-gallium alloys (U-Ga) - Chemical etching - General microstructure
Uranium-molybdenum alloys - Chemical etching - General microstructure
Uranium-osmium alloys (U-Os) - Chemical and electrolytic etching
V alloys - Chemical etching
V alloys - Chemical etching
V and V alloys - Electrolytic polishing - Dislocation etching
V and V alloys - Electrolytic polishing - Dislocation etching
V and V alloys - Electrolytic polishing - Dislocation etching
V and V alloys - Electrolytic polishing - Dislocation etching
V and alloys - Chemical etching
V and alloys - Electrolytic etching
V modified AISI 4330 steel - Fe-0.32C-0.28Si-0.61Mn-2.24Ni-0.43Cr-0.6Mn-0.1V
V poly-wire - Chemical etching - General microstructure
V single crystal and polycrystalline spheres - Thermal forming
V specimens - Chemical etching - General microstructure
V specimens - Chemical etching - General microstructure
V specimens - Chemical polishing/etching
V specimens - Electrolytic polishing
V specimens - Electrolytic polishing/thinning
V thin films evaporated on silicon substrates - Chemical etching - General microstructure
V-C alloys - Electrolytic polishing and etching
V-C system - Electrolytic thinning
V-C system - Etching for etch pits
V-C system - VC(0.76) single crystals
V-Ga, V-Si, V-Al alloys - Electrolytic etching
V-H system - Chemical polishing
V-H system - Chemical thinning
V-Ni alloys - Chemical etching - General microstructure
V-O alloys (< 10 at.% O) - Electrolytic polishing
V-O alloys - Attack polishing
V-O system (V to VO section) - Chemical etching - General microstructure
V-O system - Electrolytic and chemical polishing, chemical etching
V-Pt alloys - Electrolytic etching - General microstructure
V-Zr alloys - Chemical etching - General microstructure
V2A etchant
V3Ge and V3Si - Chemical etching - General microstructure
V3Si (111) and (100) wafers - Chemical polishing
V3Si (111) wafers - Electrolytic polishing
V3Si (111), (100) wafers - Dislocation etching
V3Si and V3Ge - Chemical polishing
V3Si specimens - Chemical cleaning
VAl3 deposited on silicon, (001) substrates - Chemical cleaning/etching
VB2 and VB specimens - Chemical etching - General microstructure
VB2 and VB specimens - Chemical etching - General microstructure
VB2 and VB specimens - Chemical etching - General microstructure
VBr2 single crystals - Chemical polishing/etching
VC (1OO) single crystal and polyerystalline specimens - Chemical etching - General microstructure
VC (1OO) single crystal ingots - Electrolytic etching - General microstructure
VC - Chemical etching
VC specimens - Molten flux etching
VC-Co system - Chemical etching - General microstructure
VGa single crystal filaments - Chemical etching - General microstructure
VSi2 thin films
Vanadium - Attack polishing
Vanadium - Attack polishing
Vanadium - Chemical polishing
Vanadium - Chemical polishing
Vanadium - Chemical polishing
Vanadium - Cr and Cr base alloys. Fe-Cr alloys and V - General microstructure
Vanadium - Electrolytic etching
Vanadium - Electrolytic etching
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic polishing
Vanadium - Electrolytic thinning
Vanadium - Electrolytic thinning and jet etching
Vanadium - Electrolytic-mechanical polishing
Vanadium - Mo, Ta, Nb, Mo-Ti alloys, Ta-Nb alloys, Pure V and V base alloys
Vanadium - V and V base alloys
Vanadium - V and V base alloys - General microstructure
Vanadium alloys - For etching V-Ti3, V-Ti15, V-Ti 20--Nb10 alloys
Vanadium carbide (VC) - Dislocation etching
Vanadium carbide (VC0.84) - Chemical etching - General microstructure
Vanadium oxide-lanthanum oxide system - V2O3-La2O3 system
Vanadium oxide-phosphoric oxide glass (VO2-V2O5-P2O5) - Chemical etching - General microstructure
Vanadium oxide-phosphoric oxide-boric oxide glass - VO2 10-14 mol.%/V2O5 69-73%, P2O5 12-16%, B2O3 up to 9%
Vanadium silicide (V3Si) - Electrolytic polishing
Vanadium single crystal - Electrolytic polishing and etching
Vanadium specimens - Chemical etching - General microstructure
Vanadium-gallium alloys (Approx.V3Ga) - Etches V6Ga5 and V solid solution, but leaves V3Ga
Vanadium-gallium alloys (Approx.V3Ga) - General microstructure
Vanadium-gallium alloys (V3Ga) - Electrolytic thinning
Vanadium-nitrogen system (V-N) - Chemical etching - General microstructure
Vanadium-nitrogen system (V-N) - Electrolytic polishing
Vanadium-technetium alloys (V-Tc) - Electrolytic polishing and etching
Vapour deposited Silicon Carbide (SiC) - Thermal etching
Vegesack's etchant - Steel specimens - To reveal lead inclusions
Velguth's etchant - X40 or No. 31 alloys - Chemical etching - General microstructure
Vermilyea's anodizing solution for Ta - Electrolytic etching
Vilella etchant - Stainless steel castings - General structure
Vilella's etchant - Al and Al alloys - Chemical etching
Vilella's etchant - Carbon and alloy steels - For contrast etching
Vilella's etchant - Carbon and alloy steels with medium carbon content - For austenite grain boundaries
Vilella's etchant - Cast irons - High chromium irons
Vilella's etchant - Cu-Pb alloys - Chemical etching
Vilella's etchant - Duplex stainless steel - Sigma phase
Vilella's etchant - Ferritic Cr steels, austenitic CrNi steels, austenitic cast alloys, Pd and its alloys
Vilella's etchant - High alloy steels
Vilella's etchant - In and lean alloys - Chemical etching
Vilella's etchant - In-Cd alloys - Chemical ecthing
Vilella's etchant - Indium specimens - Chemical etching - General microstructure
Vilella's etchant - Iron and steels - Chemical etching
Vilella's etchant - Iron and steels - Chemical etching
Vilella's etchant - Nickel superalloys - Production of thin foils for electron microscopy
Vilella's etchant - Pd dental alloys, Pd alloys with Al, Os, In, Sn, Fe, and Cu - Chemical etching
Vilella's etchant - Stainless steels - Chemical etching
Vilella's etchant - Stainless steels - General microstructure
Vilella's etchant - Steels, high carbon and alloys types - Chemical etching
Vilella's etchant - Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 825, general structure
Vilella's etchant - Wrought stainless steels - General structure
Vilella's etchant - Zirconium specimens - Chemical etching
Vilella's etchant, modified - N-155 alloy - Chemical etching - General microstructure
Vitallium alloys - Electrolytic etching - General microstructure
Vogel's etchant - Si (111) and other oriented wafers - Dislocation etching
Vycor 7913 glass - Chemical etching - General microstructure
Vycor 7913 glass - Chemical etching - General microstructure
Vycor 7913 glass - Chemical etching - General microstructure
W (001) wafers - Chemical etching - General microstructure
W (001) wafers and other orientations - Acid thinning
W (001) wafers and single crystals - Electrolytic polishing
W (111) wafers as deposited thin film - Ionized gas etching
W - Chemical-Mechanical polishing
W - Electrolyticlytic lapping
W and W alloys - Electrolytic polishing - Dislocation etching
W and W alloys - Electrolytic polishing - Dislocation etching
W and W alloys - Electrolytic polishing - Dislocation etching
W and W alloys - Electrolytic polishing - Dislocation etching
W and alloys - Chemical etching
W and alloys - Chemical etching
W and alloys - Chemical etching
W and alloys - Chemical etching
W and alloys - Electrolytic etching
W and alloys - Electrolytic etching
W and alloys - Electrolytic etching
W discs of pressed powder - Chemical cleaning
W etchant - LiF (100) wafers - Chemical etching
W single crystal wafers - Chemical etching - General microstructure
W specimens - Alcohol cleaning
W specimens - Chemical cleaning
W specimens - Chemical cleaning
W specimens - Chemical etching - General microstructure
W specimens - Chemical etching - General microstructure
W specimens - Chemical etching - General microstructure
W specimens - Chemical etching - General microstructure
W specimens - Chemical etching - General microstructure
W specimens - Chemical etching - General microstructure
W specimens - Chemical polishing
W specimens - Chmical cleaning or electrolytic polishing
W specimens - Electrolytic polishing
W specimens - Keytone cleaning
W specimens and W thin film deposits - Chemical etching - General microstructure
W specimens and parts - Chemical cleaning
W specimens as wire, W single crystal wafers - Gas, forming
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W thin film evaporated on silicon (100) substrates - Ionized gas etching
W thin film evaporation in vacuum systems - Chemical etching - General microstructure
W thin films - Chemical etching - General microstructure
W thin films - Chemical etching - General microstructure
W thin films - Chemical etching - General microstructure
W thin films - Ionized gas etching
W thin films deposited by sputtering - Ionized gas entrapment
W wire 0.015-0.025 diameter - Chemical cleaning
W wires and whiskers - Electrolytic polishing
W-10% Co specimen - For electron and optical microscopy
W-3% Re alloy - Chemical etching
W-C system - Chemical etching - General microstructure
W-Co alloys - Chemical etching
W-Co alloys ith 10-70% W - Chemical etching - General microstructure
W-Hf alloys - Chemical etching
W-Mo-Os alloys - Chemical etching - General microstructure
W-Ni-Fe alloys - Electrolytic polishing
W-Re alloy (23.4% Re + 0.3% HfC) - Electrolytic thinning
W-Re alloy (25% Re) - Electrolytic polishing and chemical etching
W-Re alloy (3% Re) - Chemical etching - General microstructure
W-Re alloys (5, 25% Re) - Electrolytic polishing
W-Re alloys (9, 24% Re) - Electrolytic thinning
W-Re-Hf-C alloy - 4 at.% Re, 0.2-0.8 at.% Hf, up to 1.35 at.% C
W-Sc alloys - Chemical etching - General microstructure
W-Ta alloy (3% Ta) - Electrolytic thinning
W-Th alloys - Chemical etching
W-Th alloys - Chemical etching
W-Ti-B alloys - Chemical etching - General microstructure
W-Y alloys - Chemical etching - General microstructure
W2O3(PO4)2 as an amorphous glassy thin film - Chemical etching - General microstructure
WAg etchant - Ge (111) wafers - Chemical etching
WAg etchant - Ge hemispheres - Chemical etching
WB2 and other tungsten borides - Chemical etching - General microstructure
WB2 and other tungsten borides - Chemical etching - General microstructure
WB2, W2B2, W2B5 - Chemical etching - General microstructure
WC - Chemical etching - General microstructure
WC - Chemical etching - General microstructure
WC - Chemical etching - General microstructure
WC single crystal specimens - Thermal etching
WC, Mo2C, TiC, or Ni in sintered carbides - Chemical etching
WC, TiC, TaC, and Co in sintered carbides - Chemical etching
WC-6% Co alloy - For revealing the microstructure of the WC-Co material
WC-Co - Chemical etching - General microstructure
WC-Co - Chemical etching - General microstructure
WC-Co - Chemical etching - General microstructure
WC-Co - Good etchant for WC crystals - Electrolytic etching
WC-Co - Suited for SEM examination - Electrolytic etching - General microstructure
WC-Co and complex sintered carbides - Chemical etching
WC-Co or Ni matrix with Mo2C, TiC, WC2, TaC - Chemical etching - General microstructure
WC-Co sintered carbides - Chemical etching
WC-Co system - Electrolytic thinning
WC-Co, WC-TiC-TaC-Co - Chemical etching - General microstructure
WC-Co, reveals Co - Electrolytic etching - General microstructure
WC-Mo2C-TiC-Ni - Chemical etching - General microstructure
WC-Mo2C-TiC-Ni cemented carbides - General microstructure
WC-Ti-Ta, NbC-Co - Physical etching - General microstructure
WC-TiC-NbC-Co - Chemical etching - General microstructure
WII etchant - Cr-Ni steels - Chemical etching
WO(x) (x=3) thin film
WO2 oxide specimens - Chemical etching - General microstructure
WO3 oxide specimens - Chemical etching - General microstructure
WO3 thin film deposited on 2100 A SnO2 on a glass substrate - Chemical etching - General microstructure
WRh (2%) and (6%), (100) wafers - Electrolytic polishing
WSe2 single crystal specimens - Solvent cleaning
WSi2 thin films
WSi2 thin films - Chemical etching - General microstructure
WSi2 thin films grown on silicon substrates - Ionized gas etching
Wafer cleaning - All wafers
Walker's etchant
Walker's etchant - Ni alloys
Walker's etchant - Rene 95 alloy
Walker's etchant - Rene 95 alloy - Chemical ecthing
Walker's etchant - Rene 95 alloy - Chemical etching
Wallner's etchant - Corrosion-resistant CrNi steels
Warekois etchant - ZnTe (111) wafers - Chemical etching
Waspaloy - 59.2Ni-13.2Co-18.8Cr-4.1Mo-1.2Al-3.0Ti-0.04C by weight
Waspaloy - Twin jet polishing mehod
Wassermann's etchant - For Mg-Al
Wassermann's etchant - Mg-7.5% Al-2.5% Zn alloy - Chemical etching
Wassermann's etchant - Mg-Al alloys
Waterbury's etchant
Waterbury's etchant - Silver-Cadmium (Ag-Cd) - Electric contact material
Waterbury's etchant - Silver-Cadmium (Ag-Cd) brazed to brass - Electric contact material
Waterbury's etchant - Silver-Copper (Ag-Cu) - Electric contact material
Waterbury's etchant - Silver-Graphite (Ag-C) - Electric contact material
Waterless Kallings's etchant - Nickel superalloy 718 - Chemical etching - General microstructure
Weck's color etchant - Etchant/procedure to examine for overheated titanium - Chemical etching
Weck's etchant - Pure Ti and Ti alloys
Weck's etchant - Pure Ti and Ti alloys - Chemical etching
Weck's tint etch for alpha Ti - Chemical etching - General microstructure
Weck's tint etch for alpha Ti alloys - Chemical etching - General microstructure
Weck's tint etchant - Ti and alloys - Tint etching
Weck's tint etchant - Ti and alloys - Tint etching
Weld etch inspection of AISI 4130 steel - Chemical etching - General microstructure
Westinghouse W Ag etchant - Ge and Ge alloys - Chemical etching
Westinghouse silver etchant - Germanium - Dislocation etching
Westinghouse silver etchant WAG - Ge
Westinghouse's silver etchant WAG - Germanium - Etch pits etching
White cast irons - Color etchant - General microstructure
White's etchant - Ge (111) wafers - Chemical etching
White's etchant - Si (100) cleaved wafers - Chemical polishing
White's etchant - Si (111) wafers, n- and p-type - Chemical thinning
White's etchant - Si (111) wafers, n-type, 130 Ohm cm resistivity - Chemical sphere polishing
Whiteley's etchant - Method for coloring sulfides - Iron and steels - Chemical etching
Wiliams-Blackburn's etchant - Ti-Mo-Al-Cr alloy - Ti-4.5Al-5Mo-1.5Cr
Williams's solution - For Ti and alloys - Electrolytic polishing
Worner and Worner's etchant - Th
Worner and Worner's etchant - Thallium specimens - Chemical polishing
Wright's etchant - For Si stacking faults dislocations
Wright's etchant - Si (100), (111), p- and n-type, 0.2-20 Ohm cm resistivity wafers - Dislocation etching
Wright-Jenkins etchant - Dislocation etching
Wrought Fe-Ni-Cr heat resisting alloy - AISI 660, general structure
Wrought Fe-Ni-Cr heat resisting alloy - AISI 660, general structure; may stain or pit
Wrought Fe-Ni-Cr heat resisting alloy - U-700 (AISI 687) - General structure; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys - AISI 660 steel , general structure
Wrought Fe-Ni-Cr heat resisting alloys - Hastelloy C, general structure
Wrought Fe-Ni-Cr heat resisting alloys - Hastelloy W, general structure
Wrought Fe-Ni-Cr heat resisting alloys - Hastelloy X (AISI 680), general structure
Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 800, carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 800, general structure; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 800, grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 800, preferential attack at grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 825, grain boundaries; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Incoloy 825, grain boundaries; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 600 and 601 - General structure
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 600 and 601 - General structure; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 600 and 601 - General structure; grain boundaries; carbide
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 600 and 601, excellent for revealing carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 600 and 601- Grain boundary contrast
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 625 - General microstructure
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 625 - Grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 625 - Grain boundary films
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 625, general structure
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 625, general structure; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 706 and alloy 718
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 706 and alloy 718 - General structure; microsegregation
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 706 and alloy 718 - General structure; precipitate phases
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 706 and alloy 718 - Good for general structure and phase outline; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys - Inconel 706 and alloy 718 - Grain boundary films
Wrought Fe-Ni-Cr heat resisting alloys - Inconel X-750 (AISI 688) - Excellent for showing details of overaged gamma prime
Wrought Fe-Ni-Cr heat resisting alloys - Inconel X-750 (AISI 688) - Good for revealing grain boundaries and carbide particles
Wrought Fe-Ni-Cr heat resisting alloys - Inconel X-750 (AISI 688), general structure
Wrought Fe-Ni-Cr heat resisting alloys - Inconel X-750 (AISI 688), grain boundaries; carbide
Wrought Fe-Ni-Cr heat resisting alloys - Inconel X-750 (AISI 688)- General structure; microsegregation
Wrought Fe-Ni-Cr heat resisting alloys - RA 330, for etch pitting
Wrought Fe-Ni-Cr heat resisting alloys - RA 330, general structure; precipitates
Wrought Fe-Ni-Cr heat resisting alloys - Waspaloy (AISI 685) - General structure
Wrought Fe-Ni-Cr heat resisting alloys - Waspaloy (AISI 685) - General structure
Wrought Fe-Ni-Cr heat resisting alloys - Waspaloy (AISI 685) - General structure
Wrought Mg alloys - Chemical etching
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure
Wrought stainless steels - General structure, carbides
Wrought stainless steels - General structure, sigma phase
Wrought stainless steels - General structure, sigma phase
X-l114 etchant - Ge (111) wafers - Chemical polishing
X22CrMoV12.1 steel - Chemical etching
X40 or No. 31 alloys - Chemical etching - General microstructure
X41CrMoV5-1 steel - Chemical etching - General microstructure
X41CrMoV5-1 steel - Chemical etching - General microstructure
X5CrNiTi26.6 steel - Chemical and Electrolytic etching - General microstructure
Y specimens - Chemical etching - General microstructure
Y-Ag alloys - Chemical etching - General microstructure
Y-Al alloys - Electrolytic polishing
Y-Al-C alloys - Chemical etching
Y-Bi system - Chemical etching - General microstructure
Y-C system - Electrolytic polishing
Y-Cd system - Chemical etching - General microstructure
Y-Cd-Zn alloy - Chemcial etching
Y-Fe-Al garnet (Y4Fe4AlO12) - Chemical etching - General microstructure
Y-Gd-Tm-Ga-Fe garnet - Chemical etching for etch pits
Y-Ge system - Chemical ecthing
Y-Hf alloy - Chemical etching - General microstructure
Y-N system - Up to 5 at.% N
Y-O system (up to 15. at.% O2) - Chemical ecthing
Y-Pb system - Chemical etching - General microstructure
Y-Pd alloys (approx. Y3Pd4) - Chemical etching - General microstructure
Y-Sb alloy - Pysical etching
Y-Ta alloys - Chemical etching - General microstructure
Y-Ta alloys - Chemical etching - General microstructure
Y-Ti alloy - Chemical etching - General microstructure
Y-Ti, Y-Zr and Y-Hf alloys - M-etch - Chemical etching
Y-V alloys - Chemical etching - General microstructure
Y-Zr alloy - Chemical etching - General microstructure
Y2Ga7O12 single crystals - Chemical cleaning
Y2O3 + ZrO2 specimens - Chemical etching - General microstructure
Y2O3 x ThO2 - Chemical etching
Y2O5 - Dislocation etching
Y3Al5O12 (YAG) (110) wafers - Chemical etching
Y3Fe5O12 (110) wafers - Chemical etching
Y3Fe5O12 (111) wafers - Chemical etching
Y3Fe5O12 (YIG) single crystal - Chemical cleaning
Y3Fe5O12 (YIG) single crystal spheres - Abrasive polishing
Y3Fe5O12 - Dislocation etching
Y3Fe5O12 and Y3Fe4AlO12 - Chemical etching
Y5Fe5O12 (YIG) (0001) wafer
YBCO superconducting material - Sample preparation
YBa2Cu3O7 - For observation of grain boundaries, twain boundaries and cracks
Yb single crystal specimens - Chemical etching - General microstructure
Yb-Ag alloys - Chemical etching - General microstructure
Yb-Ag alloys - Chemical etching - General microstructure
Yb-Al alloys - Polishing
Yb-Au alloys - Chemical etching - General microstructure
Yb-Bi system - Chemical etching - General microstructure
Yb-In alloys - Chemical and eltrolytical etching
Yb-Mg system - Chemical etching - General microstructure
Yb-Ni system - Chemical etching - General microstructure
Yb-Pb system - Chemical etching - General microstructure
Yb-Pd alloys (Approx. Yb3Pd4) - Chemical etching - General microstructure
Yittria dispersed Nichrome - (Cr-Ni-O-Y)-Ni-20Cr-0.2/1.1Y2O3
Young's etchant - For etch pits on Al
Ytterbium - Electrolytic polishing
Ytterbium - Electrolytic thinning
Yttrium - Chemical etching
Yttrium - Electrolytic polishing
Yttrium - Electrolytic polishing
Yttrium iron garnet (Y3Fe5O12) - Chemical etching
Yttrium iron garnet (Y3Fe5O12) - Chemical etching - General microstructure
Yttrium oxide (Y2O3) - Chemical etching - General microstructure
Yttrium oxide (Y2O3) - Dislocation etching
Yttrium silicate (Y5Si3Ox) - Chemical etching - General microstructure
Yttrium-aluminium garnets (Nd doped) - Chemical polishing
Yttrium-aluminium garnets - Chemical etching - General microstructure
Yttrium-aluminium garnets - Chemical polishing
Yttrium-niobium (Y-Nb) alloy - Nb rich alloys
Yttrium-niobium (Y-Nb) alloys - Chemical etching - General microstructure
Yttrium-niobium (Y-Nb) alloys - Chemical etching - General microstructure
Yttrium-ortoaluminate (YAlO2) - Chemical etching - General microstructure
ZIP's etchant - Inconel 617 - Chemical etching
Zicronium carbide (ZrC) - Etch pits on (100) planes
Zinc (99.99%) - Dislocation etching
Zinc (dilute alloys) - Dislocation etching
Zinc - A cellular structure is shown in Zn single crystals by etching in this solution
Zinc - An extremely useful electrolyte for certain applications, but dangerous
Zinc - Chemical etching
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing and etching
Zinc - Dislocation etching
Zinc - Dislocation etching
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic polishing
Zinc - Electrolytic thinning
Zinc - Electrolytic thinning by window technique
Zinc - Electrolytic thinning by window technique
Zinc - Etch pits etching
Zinc - Fe, Pb, Mg, Cu, and Ni-Zn alloys - General microstructure
Zinc - Fiber structure in extruded Zn alloys - General microstructure
Zinc - For most types of Zn and Zn alloys, especially for rolled Zn containing Pb and Zn-Cu alloys
Zinc - Ion beam etching
Zinc - Physical etching - General microstructure
Zinc - Pure and low alloy Zn - General microstructure
Zinc - Technically pure Zn, Zn-Co and Zn-Cu alloys, generally for low alloy Zn
Zinc - Tint etching of Zn and low alloy Zn
Zinc - Zn alloys with metals of the iron group, Zn platings
Zinc - Zn alloys with much nobler constituents, for example, Cu, Ag, Au
Zinc - Zn and Zn rich alloys, Zn-Cu-Al alloys
Zinc - Zn-Cu alloys to distinguish between gamma and epsilon phase
Zinc - Zn-Fe layers of galvanized steel or ferrous materials
Zinc alloys - Electrolytic polishing
Zinc and zinc alloys - Chemical etching - General microstructure
Zinc and zinc alloys - Chemical etching - General microstructure
Zinc and zinc alloys - Chemical etching - General microstructure
Zinc and zinc alloys - Chemical etching - General microstructure
Zinc and zinc alloys - Chemical etching - General microstructure
Zinc and zinc alloys - For rolled Zn-Cu alloys
Zinc and zinc alloys - For zinc and zinc die-casting aloys; alloys AC41A or AG40A
Zinc and zinc alloys - To reveal the microstructure
Zinc and zinc alloys - To reveal the microstructure in alloys of zinc with metals of the iron group
Zinc oxide (ZnO) - Removal of surface damage with above solution
Zinc oxide single crystal (ZnO) - Chemical polishing and etching
Zinc oxide-bismuth oxide - Chemical etching
Zinc oxide-bismuth oxide - ZnO x Bi2O3
Zinc oxide-bismuth oxide-antimony oxide-tin oxide - 5% Sb2O3, 1% Bi2O3, 1% SnO2
Zinc oxide-lithium oxide system (ZnO-1 at.% Li2O) - Chemical etching - General microstructure
Zinc selenide (ZnSe) - Chemical etching - General microstructure
Zinc selenide (ZnSe) - Chemical polishing
Zinc selenide (ZnSe) - Chemical polishing
Zinc selenide (ZnSe) - Chemical polishing
Zinc selenide (ZnSe) - Etchant for zinc selenide single crystals
Zinc single crystal - Sample preparation procedure
Zinc specimens - Chemical etching - General microstructure
Zinc specimens - Chemical etching - General microstructure
Zinc sulphide (ZnS) - Chemical etching - General microstructure
Zinc sulphide (ZnS) - Chemical polishing and etching
Zinc telluride (ZnTe) - Chemical etching - General microstructure
Zinc telluride (ZnTe) - Chemical polishing and etching
Zinc-aluminium-copper alloys (Zn-Al-Cu) - Ion beam etching
Zinc-aluminium-copper alloys (Zn-Al-Cu) - Ion beam etching
Zinc-aluminium-copper alloys (Zn-Al-Cu) - Ion beam etching
Zinc-aluminium-copper alloys (Zn-Al-Cu) - Ion beam etching
Zircalloy-2, Hf - Attack polishing
Zircalloy-4 - Chemical etching
Zircaloy - EBSD sample preparation
Zircaloy 2 (Zr-Sn alloy) - Electrolytic etching - General microstructure
Zircaloy 4 (Zr-1.2/1.7% Sn) - Chemical polishing
Zircaloy 4 - Zr-1.2/1.7Sn-0.18/0.24Fe-0.07/0.13Cr - Chemical polishing
Zircaloy 4 - Zr-1.4Sn-0.2Fe-0.1C
Zircaloy 4-Zirconia system - Zr (1.2-1.7% Sn)-ZrO2 (O2 up to 2%)
Zircaloy with precipitates - Anodizing
Zircaloy-2 and Hf - Chemical etching
Zircaloy-2 and Hf - Chemical etching
Zircaloy-2, Hf - Chemical polishing
Zircaloy-4 - Chemical polishing
Zirconia (ZrO2) - Chemical etching - General microstructure
Zirconia ZrO3 (CaO stabilised) - Chemical etching - General microstructure
Zirconia-scandia system (ZrO2-Sc2O3) - Chemical etching - General microstructure
Zirconium - Alpha-Zr - General microstructure
Zirconium - Attack polishing
Zirconium - Attack polishing
Zirconium - Attack polishing
Zirconium - Attack polishing
Zirconium - Attack polishing
Zirconium - Attack polishing
Zirconium - Cathodic etching
Zirconium - Cathodic etching
Zirconium - Chemical etching
Zirconium - Chemical etching
Zirconium - Chemical etching
Zirconium - Chemical etching
Zirconium - Chemical machining
Zirconium - Chemical polishing
Zirconium - Chemical polishing
Zirconium - Chemical polishing
Zirconium - Dislocation etching
Zirconium - Dislocation etching
Zirconium - Electrolytic etching
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic polishing
Zirconium - Electrolytic thinning
Zirconium - Good general-purpose electrolyte
Zirconium - Heat tint etching
Zirconium - Jet electrolytic thinning
Zirconium - One of the best electrolyte for universal use
Zirconium - Polish and etch simultaneously - Electrolytic polishing
Zirconium - Pure and low alloy Hf and Zr for observation in polarized light, Zr-U, Zr-Al, Hf-Re alloys
Zirconium - Universal electrolyte
Zirconium - Zr and Hf base alloys, Zr-Nb alloys
Zirconium - Zr and its alloys - General microstructure
Zirconium - Zr, Zr-Be, Zr-H, and Zr-Nb alloys, Zircaloy - General microstructure
Zirconium - Zr-Mg, Zr-Mo, Zr-Sn, Zr-U, Zr-B, Zr-Fe, Zr-Ni alloys - General microstructure
Zirconium - Zr-Th, Zr-Sn, Zr-Nb, Zr-Cu, Zr-Si, Zr-Ni alloys - General microstructure
Zirconium and zirconium alloys - Suitable for zirconium and Zircalloy II
Zirconium and zirconium alloys - Suitable for zirocnium and Zircalloy II
Zirconium boride - Electrolytic etching
Zirconium boride ZrB2 - Chemical etching - General microstructure
Zirconium diboride - Chemical etching - General microstructure
Zirconium diboride - Chemical etching - General microstructure
Zirconium diboride single crystals - Electrolytic thinning
Zirconium dioxide ZrO2 - Etching
Zirconium hydride phases - Chemical etching
Zirconium nitride (ZrN) - ZrN-ZrN(0.55)
Zirconium oxide (ZrO2) - Chemical etching - General microstructure
Zirconium oxide (ZrO2) - Chemical etching - General microstructure
Zirconium oxide (ZrO2) - Chemical etching -General microstructure
Zirconium oxide (ZrO2) - Etching for microstructure
Zirconium oxide (ZrO2) - Physical etching - General microstructure
Zirconium oxide (ZrO2) - Physical etching - General microstructure
Zirconium specimens - Chemical etching - General microstructure
Zirconium specimens - Chemical etching - General microstructure
Zirconium-thorium-oxygen system (Zr-ThO2, Zr-Th x ThO2) - Chemical polishing
Zirconium-yttrium-oxygen system (Zr-Y2O3) - Chemical polishing
Zn (0001) cleaved wafers
Zn (0001) freshly cleaved surface - Acid, defect
Zn (0001) platelets - Chemical cleaning
Zn (0001) single crystal wafers - Metal decoration
Zn (0001) specimens - Electrolytic polishing
Zn (0001) wafers - Chemical etching - General microstructure
Zn (0001) wafers - Chemical etching - General microstructure
Zn (0001) wafers - Chemical polishing/etching
Zn (0001) wafers - Acid cutting
Zn (0001) wafers - Zn (0001) wafers used in an etch pit study
Zn (0001) wafers and ingots - Chemical polishing
Zn alloy single crystal platelets - Chemical polishing
Zn alloys - Chemical etching
Zn and Cu specimens - Ionized gas etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and Zn alloys - Electrolytic polishing - Dislocation etching
Zn and alloys - Chemical etching
Zn and lean alloys - Chemical etching
Zn cylinder with (10T0) prism orientation - Chemical etching - General microstructure
Zn diffused into GaAs wafers - Chemical etching - General microstructure
Zn diffused into InSb, (100), n-type wafers - Chemical etching - General microstructure
Zn pellets - Chemical cleaning
Zn phosphors - Solution used as a general removal etch
Zn phosphors - Solution used as a general removal etch
Zn single crystal - Chemical etching - General microstructure
Zn single crystal specimens - Acid, cutting
Zn single crystal specimens - Dislocation etching
Zn single crystal wafers - Zn single crystal wafers acid-saw cut using a braided SST wire and nitric acid
Zn single crystals - Chemical polishing
Zn specimens - Chemical etching - General microstructure
Zn specimens - Chemical polishing
Zn specimens - Electrolytic etching - General microstructure
Zn specimens - Electrolytic polishing
Zn specimens - Electrolytic polishing
Zn specimens - Electrolytic polishing
Zn specimens 3/8" thick - Acid, cutting
Zn wafers and single crystals - Zn (0001) cleaved wafers
Zn, Zn-Sn-Fe, Zn-Al-Cu - Electrolytic polishing
Zn-Al alloys - For alloy with 22% Al - General microstructure
Zn-Al alloys - For alloy with 22% Al - General microstructure
Zn-Al and Zn-Cr alloys, Zn-Fe layers in galvanized steel or ferrous materials - Chemical etching
Zn-Cu alloys - Electrolytic etching
Zn-Cu alloys - Electrolytic etching - General microstructure
Zn-Fe, Zn-Al, and Zn-Cr alloys and Zn coated steels - Chemical etching
Zn-Ge alloys (5/25 at.% Ge) - Electrolytic thinning for amorphous alloys
Zn-Sn-As system - Investigation of polishing behaviours of chemical mixtures on ZnSnAs material
Zn-Ti alloys - Chemical etching - General microstructure
Zn3As2 single crystal sphere - Thermal etching
Zn3P2 single crystal and thin film - Chemical etching - General microstructure
ZnCd - Chemical polishing
ZnHg specimen - Chemical etching - General microstructure
ZnHg specimens - Acid, cutting
ZnO (0001) and (10T0) wafers - Chemical etching - General microstructure
ZnO (0001) wafers from natural zincite - Chemical etching - General microstructure
ZnO (0O01) wafers - Chemical polishing
ZnO (1O1O) prism cut wafers - Chemical etching - General microstructure
ZnO (OOO1) as platelets and grains - Chemical etching - General microstructure
ZnO - Chemical etching
ZnO - Chemical etching - General microstructure
ZnO grain boundaries - Chemical etching - General microstructure
ZnO single crystal material - Thermal treatment
ZnO single crystal specimens - ZnO single crystal specimens used in a study of deformation
ZnO single crystal wafers - Chemical etching - General microstructure
ZnO specimens - Chemical etching - General microstructure
ZnO-Bi2O3-Co3O4-MnO2-Sb2O3-SiO2 - Chemical etching - General microstructure
ZnS (0001) hexagonal wafers - Chemical cleaning
ZnS (001) wafers - Chemical etching - General microstructure
ZnS (100) wafers - Chemical polishing
ZnS (111) cleaved wafers - Chemical etching - General microstructure
ZnS (111) wafers - Chemical etching - General microstructure
ZnS (111) wafers - Chemical etching - General microstructure
ZnS (111) wafers - Dislocation etching
ZnS (synthetic) - Dislocation etching
ZnS single crystal wafers - Chemical etching - General microstructure
ZnSe (100) wafers - Chemical etching - General microstructure
ZnSe (100) wafers - Chemical etching - General microstructure
ZnSe (100) wafers - Chemical polishing
ZnSe (110) wafers - Dislocation etching
ZnSe (111) (SI) wafers - Chemical cleaning
ZnSe (111) wafers - Chemical etching - General microstructure
084236 ZnSe single crystal platelets - Chemical etching - General microstructure
ZnSe single crystal wafers - Chemical etching - General microstructure
ZnSe single crystal wafers - Chemical polishing
ZnSe thin films - Chemical cleaning/polishing
ZnSe-S (111) (SI) wafers and ZnSe single crystals - Chemical cleaning
ZnSiF2 single crystals - Chemical etching - General microstructure
ZnSiP2 (100) single crystal wafers - Chemical polishing
ZnSnAs2 single crystals - Chemical etching - General microstructure
ZnSnP2 thin films grown on GaAs - Chemical etching - General microstructure
ZnTe (110) wafers and ingots - Dislocation etching
ZnTe (111) wafers - Chemical etching - General microstructure
ZnTe (111) wafers - Chemical etching - General microstructure
ZnTe (111) wafers - Chemical etching - General microstructure
ZnTe (111) wafers - Chemical polishing
ZnTe (111) wafers - Chemical polishing/etching
ZnTe (111) wafers - Dislocation etching
ZnTe (111) wafers - Thermal etching
ZnTe specimens - Chemical cleaning
ZnTe thin films - Acid, float-off
ZnTe thin films - Chemical etching - General microstructure
ZnW (001) cleaved wafers - Chemical etching - General microstructure
ZnW (001) cleaved wafers - Chemical polishing
Zr (0001) and (1010) wafers - Electrolytic polishing
Zr alloys - Chemical etching
Zr alloys - Chemical etching
Zr alloys - Electrolytic etching
Zr alloys - Electrolytic etching
Zr alloys - Electrolytic etching
Zr alloys containing Al, Be, Fe, Ni and Si - Chemical etching
Zr alloys containing Al, Be, Fe, Ni, Si and up to 10% Pt - Chemical etching
Zr alloys with intermetallic phases, oxides, nitrides and hydrides - Anodizing
Zr and Zr alloy - Electrolytic thinning by modified Bollman technique
Zr and Zr alloys - Chemical etching - General microstructure
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr alloys - Electrolytic polishing - Dislocation etching
Zr and Zr base alloy - Anodic etching
Zr and Zr base alloys - Chemical and electrolytic etching - General microstructure
Zr and Zr-Al and Zr-U alloys - Chemical etching
Zr and Zr-Th alloys - Chemical etching
Zr and Zr-U alloys - Chemical etching
Zr and alloys - Chemical etching
Zr and alloys - Chemical etching
Zr and alloys of Zr and 5% Ta - Chemical etching
Zr poly sheet - Chemical thinning
Zr poly sheet - Chemical thinning
Zr polycrystalline rod - Chemical cleaning
Zr polycrystalline rod - Electrolytic polishing
Zr polycrystalline sheet - Chemical cleaning/etching
Zr single crystal
Zr specimens - Chemical etching - General microstructure
Zr specimens - Chemical etching - General microstructure
Zr specimens - Chemical polishing
Zr specimens - Chemical polishing
Zr specimens - Chemical slurry polishing
Zr thin film - Chemical etching - General microstructure
Zr, 4% Sn, and 1.6% Mo alloy - Chemical etching
Zr, Hf and alloys - Chemical etching
Zr, Hf, Zircaloys - Chemical polishing
Zr, Zr-2.5% Nb alloy, Zircaloy-2, Zircaloy-4, Hf - Chemical polishing
Zr, Zr-Ni, Zr-Cr, Zr-Si, Zr-Ag, and Zr-Al alloys - Chemical etching
Zr, Zr-Si, Zr-B, Zr-Nb, and Zr-Fe alloys - Chemical etching
Zr-2.5Nb alloy - Electrolytic polishing - Dislocation etching
Zr-Al alloy - For alloy with 1% Al - General microstructure
Zr-Be, and Zr-H alloys, pure Zr, Zircaloy - Chemical polishing
Zr-C system - Chemical etching - General microstructure
Zr-Ce-O system - Zr-Ce2O3 x 2ZrO2
Zr-Co-Si system - Zr(85-x) Co(x) Si(15)
Zr-Cr alloy - Zr-2Cr - Electrolytic thinning
Zr-Cr alloys - Chemical polishing
Zr-Cr-Fe alloy - Zr-2 at.% Cr-0.16 at.% Fe
Zr-Cr-O alloys (Zr-rich) - Chemical polishing
Zr-Cr-O alloys, Zr alloys other than Zircaloys - Chemical polishing
Zr-Cr-Si alloy - Zr(85-x) Cr(x) Si(15) - Electrolytic thinning
Zr-Cu alloys - Chemical etching
Zr-Cu alloys - For alloys with 0.1-0.8 wt.% Cu
Zr-Cu eutectoid - Zr-1.6% Cu - Chemical polishing
Zr-Cu-Si alloy - Zr(85-x)Cu(x)Si15 - Electrolytic thinning
Zr-Fe-Si alloy - Electrolytic thinning for amorphous alloys
Zr-Hf system - Chemical etching - General microstructure
Zr-Hf-Si alloy - Zr(85-x)Hf(x)Si(15) - Electrolytic thinning for amorphous alloys
Zr-Hf-Ti alloys - Chemical etching
Zr-Mg and Zr-Ni alloys - Chemical etching
Zr-Mg, Zr-Sn, and Zr-U alloys - Chemical etching
Zr-Mn alloy - Alloys with 0.5-2.0 at. % Mn
Zr-Mo alloy - Beta Zr-Mo, alloys with 2-6% Mo
Zr-Mo-Si alloy - Zr(85-x) Mo(x) Si(15)
Zr-Nb alloy - Cathodic etching
Zr-Nb alloys - Chemical etching
Zr-Nb alloys - Chemical etching
Zr-Nb-Cr alloy - 0.5 wt.% Nb, 1% Cr - General microstructure
Zr-Nb-Si alloy - Zr(85-x) Nb(x) Si(15)
Zr-Ni eutectics and Zr-Si alloys - Chemical etching
Zr-Ni-Co system - Chemical etching - General microstructure
Zr-Ni-Co system - Twin jet electrolytic thinning
Zr-Ni-Si alloy - Zr(85-x) Ni(x) Si(15)
Zr-Si alloys - Chemical etching
Zr-Si system - Zr(100-x)Si(x) - Electrolytic thinning for amorphous alloys
Zr-Sn alloy (Zircaloy 2 1-3% Sn) - Electrolytic thinning
Zr-Sn alloy (Zircaloy 2 1-3% Sn) - Electrolytic thinning
Zr-Sn, Zr-Mo, Zr-Cu, Zr-Si, Zr-N, Zr-O, and Zr-Al alloys - Chemical etching
Zr-Ta-Si alloy - Zr(85-x)Ta(x)Si(15) - Electrolytic thinning for amorphous alloys
Zr-Th alloys - Chemical polishing
Zr-Th alloys - Electrolytic polishing
Zr-Th, Zr-Sn and Zr-Nb alloys - Chemical etching
Zr-Ti-Si alloy - Electrolytic thinning for amorphous alloys
Zr-V-Si alloy - Zr(85-x)V(x)Si(15) - Electrolytic thinning for amorphous alloys
Zr-W-Si alloy - Zr(85-x)W(x)Si(15) - Electrolytic thinning for amorphous alloys
Zr-W-Ta alloys - Chemical etching - General microstructure
Zr2Ni single crystal specimen - Chemical etching - General microstructure
Zr2Ni single crystals - Chemical etching
Zr3Al based alloys - Chemical etching
Zr3Al-based alloys - Attack polishing
Zr3Al-based alloys - Chemical etching
ZrB and other zirconium borides - Chemical etching - General microstructure
ZrB, ZrB2, Zr3B4, and ZrB12 specimens - Chemical etching - General microstructure
ZrB2 - Chemical etching - General microstructure
ZrC - Chemical etching - General microstructure
ZrC - Chemical etching - General microstructure
ZrN (100) wafers - Thermal cleaning
ZrN - Chemical etching - General microstructure
ZrN thin films - Chemical cleaning
ZrO2 - Chemical ecthing
ZrO2 - Chemical etching
ZrO2 single crystal specimen and ZrO2 thin film - Chemical etching - General microstructure
ZrO2 single crystal specimens - General etching
ZrO2 specimens with low Hafnium content - Chemical cleaning/polishing
ZrO2 thin film deposits - Electrolytic polishing
ZrO2 with MgO, CaO - Physical etching - General microstructure
ZrO2, Zr2O3 - Chemical etching - General microstructure
ZrO2-TZP (Y2O3, RE oxide, TiO2), ZrO2-PSZ (Y2O3, MgO, CaO), ZrO2-CSZ (ZrO2, MgO, CaO), ZrO-ZTC
ZrO2-TZP, ZrO2-PSZ, ZrO2-CSZ, ZrO2-ZTC - Chemical etching - General microstructure
ZrS2 single crystal specimens - Sample etching
ZrV single crystal metallic alloy - Chemical etching - General microstructure
a-Ge as thin film material deposited on NaCl (100) substrates - Float-off
a-Ge evaporated on fused quartz blanks
a-Ge thin film grown on NaCl-Acid, float-off
a-Ge thin films deposited on NaCl - Acid, float-off
a-Ge-H and a-Si-H hydrogenated thin films - Chemical cleaning/etching
a-Nb3Ge compound - Physical etching - General microstructure
a-Si thin film, 300 A thick - Film removal
a-Si-H thin film deposited on an a-SiO(x)N(y)H thin film - Chemical etching - General microstructure
a-Si-H thin films - Electrical defect
a-Si-H thin films grown on SiO2, Al2O3, and ZrO2 substrates - Chemical etching - General microstructure
a-Si3N4-H thin films - Ionized gas etching
a-SiC-H amorphous thin films - Ionized gas etching
a-SiC-H amorphous thin films 500-3500 A thick - Chemical etching - General microstructure
a-SiC-H thin films - Chemical etching - General microstructure
a-SiC-H thin films - Metal pinhole decoration
a-SiC-H thin films deposited on Si (100) substrates - Chemical etching - General microstructure
a-SiC-H thin films deposited on Si (100) substrates - Chemical etching - General microstructure
a-SiN-H thin films deposited on (100) silicon and germanium wafers - Chemical etching
a-SiO2 thin films used as a diffusion mask on silicon wafers - Thermal conversion
a-WO3 thin films 499-8500 A thick - Chemical etching - General microstructure
i-C-Gas, growth
n-Bi2Te3 (0001) wafers - Chemical etching - General microstructure
n-GaP (111) and p-GaP (111) wafers - Chemical etching
p-Bi2Te3 (0001) cleaved wafers - Oxidation
p-GaP (100) wafers - Chemical etching

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