Etchants for Re and Alloys

Chromium specimens-Ta, Nb, and their alloys. Cr and Cr silicide. Re silicide. W-Th alloys
Cr and Cr alloys, C-Fe alloys, Mo (grain-contrast etchant), Re and Re-base alloys, V and V-base alloys-Electrolytic etching
Molybdenum, Re alloys, Re-Mo alloys-Electrolytic polishing
Mo-Re alloy (34% Re)-Alloy with 34 at.% Re
Mo-Re alloy-Alloy with 5 at.% Re
Murakami's etchant
Niobium specimens-Ta, Nb, and their alloys. Cr and Cr silicide. Re silicide. W-Th alloys
Re (0001) wafers-Chemical etching
Re (0001) wafers-Electrolytic polishing
Re (0001) wafers-Electrolytic thinning
Re silicides
Re specimens
Re specimens-Acid oxidation
Re specimens-Chemical etching
Re specimens-Gas oxidation
Re specimens-Molten flux etching
Rehenium-Re
Re-Hf (<10% Hf) alloys
Re-Hf alloys
Re-Hf alloys-Sample preparation procedure
Re-Si system-Chemical etching
Re-W alloys
Rhenium-Chemical etching
Rhenium-Chemical etching
Rhenium-Chemical etching
Rhenium-Cr, Mo, Mo-Cr alloys (up to 80% Cr). Mo-Fe alloys
Rhenium-Cr, Mo, Mo-Cr alloys (up to 80% Cr). Mo-Fe alloys
Rhenium-Electro polishing
Rhenium-Electro thinning by jet etch
Rhenium-Electrolytic etching
Rhenium-Electrolytic etching
Rhenium-Electrolytic polishing
Rhenium-Electrolytic polishing
Rhenium-Re - Marakami's reagent
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
U-Re alloys-Chemical and electrolytic etching
W-Hf-Re alloys-Chemical etching
W-Hf-Re-N alloys alloys-< 2% Hf, < 25% Re, nitrided
W-Mo-Hf-Re alloys-<% Mo, < 2% Hf, < 30% Re
W-Mo-Hf-Re-N alloys-<% Mo, < 2% Hf, < 30% Re, nitrided
W-Re alloy (23.4% Re + 0.3% HfC)-Electro thinning
W-Re-Hf-C alloys-4 at.% Re, 0.2-0.8 at.% Hf, up to 1.35 at.% C

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