Etchants for W and Alloys

a-WO3 thin films 499-8500 A thick-Chemical etching
Be-W alloys-For alloys with < 1% W
Cermets (Zr, Th, W, U)-ZrO2-W, ThO2-W (toxic), W2C-W, UC-Cr (toxic), UC-Fe (toxic), UC-Ni (toxic), UC-UFe2 (toxic)
Copper-tungsten (Cu-W)-Electric contact material
Copper-tungsten (Cu-W)-Electric contact material
Co-Si-W alloy-Co - 25at.% Si - 5 at.% W
Cr, Mo, Nb, Ta, V, W and their alloys-Chemical-Mechanical polishing
Cr-W alloys-Alloys with 29-40 at.% W
Fe-Ni-Co-W system-Fe-17/18.5 Ni-8/9 Co-5/10 W
Ir-W alloy-Ir-0.3% W
Mo and its alloys, Ta and its alloys, W and W-base alloys-Electrolytic etching
Mo, W-Electrolytic etching
Molybdenum samples-Mo, W and V
Molybdenum samples-Mo, W, V, Nb, Ta and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-W and W base alloys. Mo and Mo base alloys
Murakami's etchant
Nb-W-Mo-Hf alloy-SU16 alloy: 11% W, 3% Mo, 3% Hf, 0.08% C
Nb-W-Zr alloy (NB7-19% W, 2% Zr)-Chemical etching
Ni-Co-Cr-W alloys-28-32 wt.% Ni, 28-32 wt.% Co, 32-34 wt.% Cr, 2-11 wt.% W
Ni-Co-Cr-W alloys-28-32 wt.% Ni-28-32 wt.% Co-32-34 wt.% Cr-2-11 wt.% W
Pure W (tungsten)-Chemical etching
Re, Mo, W alloys-Electrolytic lapping
Recipe for Au on C and Al/W dendrites
Refractory metals (Mo, W, V)-Chemical etching
Refractory metals (Mo, W, V, Nb, Ta)-Chemical etching
Refractory metals (W, V, Nb, Ta)-Chemical etching
Silver-tungsten (Ag-W)-Electric contact material
Silver-tungsten (Ag-W)-Electric contact material
Silver-tungsten carbide (Ag-WC)-Electric contact material
Tantalum specimens-Mo, W, V, Nb, Ta and their alloys
Tantalum specimens-W and W base alloys. Ta na Ta base alloys
Ta-W-Hf alloy T-111-8% W, 2% Hf. Electro polishing by twin jet
Ta-W-Hf alloy T-111-8% W, 2% Hf
Ti0.3W0.7Si2 thin films-Chemical polishing
Ti3W7Si2 thin films on silicon wafers, (111), (110) and (100)-Chemical etching
TiW (1% Ti) thin films-Chemical etching
TiW thin films-Chemical etching
Tungsten alloys-Electropolishing
Tungsten alloys-Electropolishing
Tungsten and tungsten alloys-Chemical etching
Tungsten and tungsten alloys-Chemical etching
Tungsten and tungsten alloys-Chemical etching
Tungsten and tungsten alloys-W-Co alloys with 10-70% W
Tungsten and tungsten alloys-W-Co alloys with 10-70% W
Tungsten and tungsten alloys-W-Co alloys with eutectic compostion (cca 46% W)
Tungsten samples-Mo, W and V
Tungsten samples-Mo, W, V, Nb, Ta and their alloys
Tungsten single crystal-Electrolytic polishing, chemical polishing
Tungsten single crystal-Electrolytic polishing
Tungsten specimens-Cathodic etching
Tungsten specimens-Chemical etching
Tungsten specimens-Chemical etching
Tungsten specimens-Chemical etching
Tungsten specimens-Chemo-mechanical polishing
Tungsten specimens-Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Tungsten specimens-Electric contact material
Tungsten specimens-Electro thinning by window technique
Tungsten specimens-Electro thinning
Tungsten specimens-Electro thinning
Tungsten specimens-Electrolytic polishing and etching
Tungsten specimens-Electrolytic polishing
Tungsten specimens-Electrolytic polishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Eutectic W-Co alloys
Tungsten specimens-For removing slip lines and twins
Tungsten specimens-For sub grain boundaries and slip lines
Tungsten specimens-Mo and Mo-Ni alloys. W and W alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-W and W base alloys. Mo and Mo base alloys
Tungsten specimens-W and W base alloys. Ta na Ta base alloys
Tungsten specimens-W and W base alloys
Tungsten specimens-W and W base alloys
Tungsten specimens-W-Co alloys containing 10-70% W
Tungsten, color etchant-Chemical etching
Tungsten-2.8 vol.% ThO2 alloy-Electro thinning
Tungsten-copper (W-Cu)-Electric contact material
Tungsten-Electrolytic polishing
Tungsten-Electropolishing
Tungsten-nickel (W-Ni)-Electric contact material
Tungsten-rhenium-thoria system (O-Re-Th-W)-W-3% Re-2% ThO2
Tungsten-Silicon alloys (WSi2)-Chemical etching
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-Wire-Electrolytic polishing
W (001) wafers and other orientations-Acid thinning
W (001) wafers and single crystals-Electrolytic polishing
W (001) wafers-Chemical etching
W (111) wafers as deposited thin film-Ionized gas etching
W and alloys
W and alloys
W and alloys
W and alloys
W and alloys
W and alloys
W and alloys
W and lean alloys - Modified Murakami's reagent
W and W alloys - Murakami's reagent
W and W alloys
W and W alloys
W and W alloys
W and W alloys
W discs of pressed powder-Chemical cleaning
W single crystal wafers-Chemical etching
W specimens and parts-Chemical cleaning
W specimens and W thin film deposits-Chemical etching
W specimens as wire, W single crystal wafers-Gas, forming
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens-Alcohol cleaning
W specimens-Chemical cleaning
W specimens-Chemical cleaning
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical polishing
W specimens-Chmical cleaning or electro polishing
W specimens-Electrolytic polishing
W specimens-Keytone cleaning
W thin film evaporated on silicon (100) substrates-Ionized gas etching
W thin film evaporation in vacuum systems-Chemical etching
W thin films deposited by sputtering-Ionized gas entrapment
W thin films-Chemical etching
W thin films-Chemical etching
W thin films-Chemical etching
W thin films-Ionized gas etching
W wire 0.015-0.025 diameter-Chemical cleaning
W wires and whiskers-Electrolytic polishing
W, V, Nb, Ta
W-3% Re alloy
WB2 and other tungsten borides-Chemical etching
WB2 and other tungsten borides-Chemical etching
WC specimens-Chemical cleaning
WC, Mo2C, TiC, or Ni in sintered carbides
WC, TiC, TaC, and Co in sintered carbides
WC-Co and complex sintered carbides
WC-Co sintered carbides
W-Co alloys
W-Co eutectic alloys - Alkaline sodium picrate
W-Hf alloys
WSi2 thin films
WSi2 thin films-Chemical etching
W-Th alloys
W-Th alloys
Zr-W-Ta alloys-Chemical etching

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