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GaAs (100) wafers and other orientations - Chemical etching

Material Name: GaAs (100) wafers and other orientations
Recipe No.: 6497
Primary Chemical Element in Material: Ga
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Wet (chemical) etching
Etchant (Electrolyte) Composition: x...0.7 M H2O2, x...1 M NaOH. Note: The volume/quantity was not shown in the referenced article and is therefore designated as an "x".
Procedure (Condition): No data
Note: GaAs (100) wafers and other orientations, except (111)A, used in a study of etched pit facet development through a silica mask to define a hole.
Reference: Perrin Walker, William H Tarn: Handbook of Metal Etchants, CRC Press, Boca Raton, Florida, USA, 1990, p.472.