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Ag thin films - Chemical etching

Material Name: Ag thin films
Recipe No.: 8192
Primary Chemical Element in Material: Ag
Sample Type: Thin film
Uses: Etching
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Chemical
Etchant (Electrolyte) Composition: 1.) 400 g KI, 100 g I2, 400 ml H2O. 2.) 1 part Tri-iodide, 4 parts H2O.
Procedure (Condition): No data
Note: Ag thin films. The solutions shown or other Tri-iodide composition etchants can be used to remove or pattern both silvered gold thin films.
Reference: Brochure - Application Data for Kodak Photosensitive Resists, Eastman Kodak Co., Rochester, NY, 1960, 91.