Chemical Polishing

Chemical Polishing

(Y2O3)m(ZrO2)(1-m) (100) wafers - Chemical polishing
1.5Sn-0.15Fe-0.10Cr, and Hf alloys - Chemical etching - General macrostructure
111 etchant - Ge (111) and Si (111) wafers - Chemical polishing/etching
79Ni-17Fe-4Mo Permalloy single crystal specimens - Chemical polishing
ASTM etchant No. 179 - Ta alloys
Ag (001) wafers - Chemical polishing
Ag (111) and (100) wafers - Chemical polishing
Ag specimens - Chemical polishing
Ag-Al alloy - Alloy with < 20 wt.% Ag
Ag-Cd alloy - Alloys with 1-7% Cd
Ag-Ge eutectic - Chemical polishing
Ag-Sb alloys - Electrolytic polishing
Ag-Sn alloy - Alloys with 1-8 at.% Sn
Ag-Zn alloys - Chemical polishing
Ag2Al single crystal sphere - Chemical polishing
Ag2Hg (110) single crystal - Chemical polishing/etching
Ag2Se (100) wafers - Chemical polishing
Ag2Se (100) wafers and other orientations - Chemical polishing
Ag2Se (100) wafers and other orientations - Chemical polishing
Ag2Te (100) wafers - Chemical polishing
AgCl (100) wafers - Chemical polishing
AgFeTe2 single crystal specimens - Chemical polishing
AgSbTe2 single crystal specimens - Chemical polishing
AgTiSe single crystal material - Chemical polishing
Agua Regia - Mo specimens - Chemical polishing
Agua Regia - Te (10T0) cleaved wafers - Chemical polishing/etching
Agua Regia - Th specimen - Chemical polishing
Agua Regia - Ti0.3W0.7Si2 thin films - Chemical polishing
Agua Regia - TlBiTe2 single crystal n-type - Chemical polishing/etching
Agua Regia - a-Zr2Pd thin films - Chemical polishing/etching
Agua Regia - a-Zr3Rhorphous thin films - Chemical polishing/etching
Al (001) wafers - Al, (001) wafers used in a study of lithium precipitation along dislocations
Al and alloys - Chemical polishing
Al and aluminum alloy - Used as a general cleaning and polishing etch
Al-Ag alloys - Chemical polishing
Al-Be alloy - Alloys with < 0.1% Be
Al-Cu alloy - Al-Cu alloy specimens
Al-Cu alloys - Chemical polishing
Al-Cu alloys - Chemical polishing
Al-Fe alloy - Alloys with 5-10% Al - Electrolytic thinning
Al-Ge alloys - Chemical polishing
Al-In alloys - Chemical polishing
Al-Li alloy - Chemical polishing
Al-Mg alloy - Chemical polishing
Al-Mg, Al-Mg-Si, Al-Zn-Mg, Al-Cu-Mg alloys - Chemical polishing
Al-Mn alloy - Alloy with 1-4% Mn
Al-Si specimens - Chemical polishing and etching
Al-Zn alloys - For alloys with < 20% Zn
AlAs thin films - Chemical polishing
AlP single crystal wafer - Chemical polishing
AlSb wafers - Chemical polishing
AlSb wafers - Chemical polishing
AlSb wafers - Chemical polishing
All materials - EBSD sample preparation
All materials - EBSD sample preparation
Allen's etchant - InSb (111) wafers - Chemical polishing
Alminium gallium arsenide (Al(x) Ga(1-x) As) - Chemical polishing
Alpha brass - Chemical polishing
Alpha-HgI2 single crystal specimens - Chemical polishing
Alpha-HgI2 single crystal specimens - Chemical polishing
Alumina-Al2O3 - Chemical polishing
Alumina-Al2O3 - Chemical polishing
Alumina-Al2O3 with 0.04% Cr - Chemical polishing
Aluminia-lanthanum oxide dispersed Nichrome - Ni-20Cr-0.04Al2O3-0.04La2O3
Aluminium - Chemical etching
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing
Aluminium - Chemical polishing - Only suitable for very thin specimen
Aluminium - Electrolytic polishing
Aluminium - Electrolytic polishing, chemical polishing
Aluminium and alloys - Chemical polishing
Aluminium single crystal specimens - Chemical polishing
Aluminium single crystal specimens - Chemical polishing
Aluminum antimonide (AlSb) - Chemical polishing
Aluminum antimonide (AlSb) - Chemical polishing
Antimony specimens - Etch pits etching
Aqua Regia - Lead sulphide (PbS) - Chemical polishing
As (0001) cleaved specimens - Chemical polishing
As (111) specimens - Chemical polishing
Au-Cd alloy specimens - Chemical polishing
Au-In alloy specimens - Chemical polishing
AuHg alloy specimens - Chemical polishing
Austenitic stainless steel - Chemical polishing
Austenitic stainless steel - Chemical polishing
BHF etchant - Zr specimens used for electroplating
BJ etchant - Ge (111) wafers - Chemical polishing
BRM etchant - InP (100) n-type wafers - Chemical polishing
BRM etchant - WS2 single crystal specimens - Chemical polishing
BRM etchant - WSe2 single crystal specimens - Chemical polishing
Ba specimen - A general removal and polish etch for barium
Ba2TiO3 specimens - Chemical polishing
BaF2 (111) wafers - Chemical polishing
BaF2 (111) wafers - Chemical polishing
BaWO4 single crystal - Chemical polishing
Barium sulphate - Chemical polishing
Barium fluoride (BaF2) - Chemical polishing
Barium titanate - Chemical polishing
Beryllium - Chemical polishing
Beryllium - Chemical polishing, chemical thinning, electrochemical thinning
Beryllium - Electrolytic polishing
Beryllium oxide (BeO) - Chemical polishing
Beta alumina - 90.6% Al2O3, 8.7% Na2O, 0.7% Li2O
Beta brass (45% Zn) - Chemical and electrolytic polishing
Beta brass (Cu-Zn) - Chemical polishing and electrolytic thinning
Beta-III titanium alloy - Ti-11.5Mo-5-6Zr-4.5Sn
Beta-III titanium alloys - Chemical polishing
Bi (0001) wafers - Chemical polishing
Bi12-GeO20 specimens - Chemical polishing
Bi2Se3 (0001) wafers - Chemical polishing
Bi2Se3 single crystal ingot - Chemical polishing
BiSb alloys - Chemical polishing
Bismuth - Chemical polishing and etching
CP4 etchant - InSb (111) wafers - Chemical polishing
CP4 etchant - Silicon - Chemical polishing
CP4, variety CP4A etchant - InSb (111) wafers and other orientation - Chemical polishing
CP4A etchant - Si (111) wafers and other orientations - Chemical polishing
CP4A or CP8 etchants - Silicon - Final chemical polishing
CaCO3 (1011) cleaved substrates - Chemical polishing
CaCO3 - Chemical polishing
CaF2 natural fluorite crystals - Chemical polishing and cleaning
CaW04 single crystal specimens - Chemical polishing
CaWO4 single crystal specimens - Chemical polishing
Cadmium - Chemical polishing
Cadmium - Chemical polishing
Cadmium - Chemical polishing
Cadmium - Chemical polishing
Cadmium single crystal - Chemical polishing
Cadmium single crystal - Chemical polishing
Cadmium sulphide (CdS) - Chemical polishing
Cadmium sulphide (CdS) - Chemical polishing and etching
Cadmium sulphide (CdS) single crystals - Chemical polishing and etching
Cadmium sulphide (CdS) single crystals - Chemical polishing and etching
Cadmium telluride (CdTe) - Chemical polishing
Cadmium telluride (CdTe) - Chemical polishing
Cadmium telluride (CdTe) - Chemical polishing
Cadmium telluride (CdTe) - Chemical polishing and etching
Cadmium telluride (CdTe) - Chemical polishing and etching
Cadmium telluride (CdTe) single crystal - Chemical polishing
Cain's etchant - Hf, Zr and allloys - Chemical etching
Cain's etchant - Hf-W eutectoid alloys - Chemical etching
Calcium fluoride (CaF2) - Chemical etching
Calcium fluoride (CaF2) - Final chemical polishing
Calcium fluoride (CaF2) - This will produce etch pits
Camp No. 4 (CP4) etchant - Ge (100) wafers and other orientations - Chemical polishing/etching
Carbon steel - Chemical polishing
Carbon steels - Chemical polishing
Caro's etchant, modified - Si (111) wafers used in a study of ion bombardment cleaning - Chemical polishing
Cast iron, low-alloy steels - Chemical polishing
Cd (111) and (100) single crystal wafers - Chemical polishing
Cd specimens - Chemical polishing
Cd, Cd-Ag alloys (up to 3% Ag) - Chemical polishing
Cd-1.5% Zn alloy - Chemical polishing
Cd-Hg-Te system - Cd(0.15)Hg(0.85)Te
Cd-Hg-tellerude - Hg(1-x)Cd(x)Te
Cd-Mg alloy (low Mg) - Chemical polishing and etching
Cd-Zn eutectic alloys - Chemical polishing
Cd3As2 single crystal specimen - Chemical polishing
CdF2 specimen - Chemical polishing
CdF2 specimen - Chemical polishing-etching
CdI2 (0001) wafers - Chemical polishing
CdIn2Se4 single crystal specimens - Chemical polishing
CdIn2Te4 wafers - Chemical polishing
CdS (100) wafer - Chemical polishing
CdS (111) wafers - Chemical polishing
CdS (111) wafers - Chemical polishing
CdSb (100) wafer - Chemical polishing
CdSe polycrystalline thin film - Chemical polishing
CdTe (100) wafers - Chemical polishing
CdTe (111) n-type wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe (111) wafers - Chemical polishing
CdTe-HgTe specimens - Chemical polishing-etching
CeBr (100) specimens - Chemical polishing
Ceramic - EBSD sample preparation
Cerium - Chemical polishing
Cerium specimens - Chemical solution
Chase's etchant - Ag-30% Zn alloy - Chemical polishing
Chemical polishing of 6061 aluminum - EBSD sample preparation
Co-Fe single crystal - Co-8 wt.% Fe
Coates's etchant - Pb-Sn-Te alloys (Pb(1-x)Sn(x)Te, x <= 0.03) - Chemical polishing and etching
Cobalt - Chemical polishing
Cobalt - Chemical polishing
Cobalt - Electrolytic polishing
Cobalt - Electrolytic polishing
Cobalt single crystal - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing
Copper - Chemical polishing and etching
Copper - Electrolytic polishing
Copper britte dip etchant - Cu specimens and parts - Chemical polishing
Copper single crystal - Chemical polishing, electrolytic etching, etch pit etching
Coronze CDA 638 alloy - Electrolytic thinning
CsI (100) oriented single crystal wafers - Chemical polishing/etching
Cu (100) wafers - Chemical polishing
Cu and Cu alloys - Chemical polishing
Cu and Cu alloys - Chemical polishing
Cu oxide (Cu2O) - Chemical polishing, thinning
Cu oxide - Chemical polishing, thinning
Cu oxides-single crystals - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu specimens - Chemical polishing
Cu wire and OFHC copper parts - Chemical polishing/cleaning
Cu, alpha brass - Chemical polishing
Cu-4.85% Si alloy - Chemical polishing
Cu-8% Al alloy, Cu-0.5% Be alloy, Cu-5% Al-2% Si alloy - Chemical polishing
Cu-Al-Ni alloy - Chemical polishing
Cu-Co alloy - Cu-2/3% Co
Cu-Fe alloy - Alloy with < 5.5 at.% Fe
Cu-Fe-Ni alloy - 19Cu-61Fe-20Ni
Cu-Ga alloy - Alloys with < 14.5 at.% Cu - Chemical polishing
Cu-Ga alloys - Chemical polishing
Cu-Ge alloy - Alloys with < 9.5 at.% Ge - Chemical polishing
Cu-In-Se (CuInSe2) - Chemical polishing
Cu-In-Se (CuInSe2) - Chemical polishing
Cu-Ni-Fe alloy - Chemical and electrolytic polishing
Cu-Ni-Fe system - 32-64% Cu, 27-46% Ni, 9-23% Fe
Cu-W composite - Electrolytic polishing
Cu-Zn alloy - Alloys with low Zn content
Cu2O material - Chemical polishing
CuBr single crystals - Chemical polishing
CuCl single crystals - Chemical polishing
CuI single crystals - Chemical polishing
CuInS2 n-type wafers - Chemical polishing
CuInS2 wafer - Chemical polishing
CuInSe2 single crystal - Chemical polishing/staining
Er-Fe system - Chemical polishing
Fe specimens - Solution used as a polishing etch
Fe, Fe-Si alloys - Chemical polishing
Fe, low-carbon steels - Chemical polishing
Fe, low-carbon steels - Chemical polishing
Fe, low-carbon steels, Fe-20% Ni-5% Mn alloy - Chemical polishing
Fe, low-carbon steels, low-alloy steels - Chemical polishing
Fe-3% Si alloy - Chemical polishing
Fe-C (1.5%)-Ni (5%) alloy specimens - Chemical polishing
Fe-Cr alloy - Fe-10/50 at.% Cr - Electrolytic thinning
Fe-Cr-Al system - Fe-10/50 at.% Cr-5/40 at.% Fe
Fe-Mo solid solution alloys - Chemical polishing
Fe-Ni alloy - Fe-10-40% Ni - Chemical and electrolytic polishing
Fe-Ni alloy - Fe-12 at.% Ni - Chemical polishing and electrolytic thinning
Fe-Ni alloy - Fe-12Ni - Chemical and electrolytic polishing
Fe-Ni-C alloy - 10-40% Ni, 0.1% C
Fe-Ni-C alloy - Alloys with 20-30% Ni and < 0.6% C
Fe-Ni-C alloy - Fe-31Ni-0.3C
Fe-Ni-Mn alloy - Fe-19-24% Ni-3-5% Mn
Fe-Ni-Ti alloys - Chemical polishing and eletro thinning
Fe-Sn alloy (Alpha-Fe alloys) - Chemical polishing
Fe-Ti system (< 1.4% Ti) - Chemical polishing
Fe/Ni specimen - Chemical polishing
Fe3O4 specimen - Chemical polishing
FeS2 single crystal ingot - Chemical polishing
Fluorapatite-Cu5FP3O12 - Chemical polishing
Ga arsenide - Chemical polishing
Ga phosphide - Chemical polishing
Ga-As-P alloy (GaAsP) - Chemical polishing and etching
Ga-As-P system - Dislocation etching for (111)A -(111)B faces
Ga-In-As phosphide - Chemical polishing
Ga-In-As phosphide - Chemical polishing
Ga-In-As phosphide - Chemical polishing
Ga-In-Sb specimens - In(x)Ga(1-x)Sb
GaAs (100) n-type wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing
GaAs (100) wafers - Chemical polishing/cleaning
GaAs (100) wafers cut within 2-3? of plane - Chemical polishing
GaAs (100) wafers used for zinc diffusion at 85O?C - Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion - Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion at 850?C - Chemical polishing
GaAs (100) wafers used to fabricate Schottky barrier diodes - Chemical polishing
GaAs (110), (111), (100) wafers - Chemical polishing
GaAs (111) and (100) wafers - Chemical polishing
GaAs (111) and (100) wafers - Chemical polishing
GaAs (111) n-type and undoped material - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers - Chemical polishing
GaAs (111) wafers and spheres - Chemical polishing
GaAs (111) wafers fabricated as Esaki diodes - Chemical polishing
GaAs (111) wafers with (111) Ga surface polished - Chemical polishing
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers - Chemical polishing
GaAs (111)A and (TTT)B wafers - Chemical polishing
GaAs and GaP (100) and (111)B high n-type wafers - Chemical polishing
GaAs wafers - Chemical etching
GaAs wafers - Chemical polishing
GaAs wafers - Chemical polishing
GaAs wafers of various orientations - Chemical polishing
GaAsCR (100)(SI) wafers - Chemical polishing/cleaning
GaAsCr (100) (SI) wafers - Chemical polishing
GaAsCr (100) (SI) wafers - Chemical polishing
GaAsCr (100) (SI) wafers - Chemical polishing
GaAsCr (100) (SI) wafers - Chemical polishing/etching
GaAsCr (100) (SI) wafers used in a study of surface cleaning - Chemical polishing/cleaning
GaAs; Zn, (100) wafers cut 2-3?-off plane toward (110) - Chemical polishing
GaP (100) and (111) wafers - Chemical polishing
GaP (100) and (111)B, p-type, 0.2 Ohm cm resistivity wafers - Chemical polishing
GaP (100) n-type wafers - Chemical polishing
GaP (100), (111)A and (111)B wafers - Chemical polishing
GaP (110) undoped wafers - Chemical polishing
GaP (111) and (100) wafers - Chemical polishing
GaP (111) and GaAs (111) wafers - Chemical polishing
GaP (111) and GaAs (111) wafers - Chemical polishing
GaP (111) and GaAs (111)A wafers - Chemical polishing
GaP (111) wafer - Chemical polishing
GaP (111), (100), (110) wafers - Chemical polishing
GaS (100), n-type wafers - Chemical polishing
GaSb (100) undoped and Te-doped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) undoped wafers - Chemical polishing
GaSb (100) wafers - Chemical polishing
GaSb (111) and (100) wafers - Chemical polishing
Gadolinium - Chemical polishing and etching
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - Chemical polishing
Gallium arsenide (GaAs) - For (001) face
Gallium arsenide (GaAs) - For etch pits etching
Gallium arsenide (GaAs) - Selective etch for dislocations on (111) plane
Gallium arsenide (GaAs) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing
Gallium phosphide (GaP) - Chemical polishing and etching
Gallium phosphide (GaP) - Chemical polishing and etching
Gallium phosphide (GaP) - Chemical polishing, chemical etching
Gallium phosphide (GaP) - Etching (chemical polishing)
Gallium phosphide (GaP)-S doped n-type, Zn doped p-type
Gd-Ce alloys - Chemical polishing
Gd-Fe alloy - Laves phase GdFe2
Gd-Ga garnets - Chemical polishing
Ge (111) and (100) wafers used as substrates - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers - Chemical polishing
Ge (111) wafers p-type - Chemical polishing
Ge (111) wafers, p-type, 4 Ohm cm resistivity - Chemical polishing
Ge (111), (100), and (110) wafers - Chemical polishing
Ge and Si wafers - Chemical polishing
Ge as cut cubes oriented (001)/(001)(110)/(110) - Chemical polishing
Ge as single crystal - Chemical polishing/etching
Ge as single crystal spheres - Chemical polishing
Ge n-type wafers - Chemical polishing
Ge specimens - Chemical polishing
Ge spheres of single crystal germanium and silicon - Chemical polishing
Ge wafers - Chemical polishing
Ge wafers - Chemical polishing/etching
Ge wafers doped with copper - Chemical polishing
Ge wafers used as substrates - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing
Germanium - Chemical polishing and etching
Germanium - Final chemical polishing
Germanium - Jet polishing, chemical polishing
Germanium - Jet thinning by chemical polishing
Gilman's etchant - Zinc - Chemical polishing and etching
Hafnium - Chemical polishing
Hafnium - Chemical polishing
Hafnium and alloys - Chemical etching
Hafnium and its alloys - Zircalloy - 2
Hafnium carbide (HfC) - Chemical polishing
Hafnium single crystal - Chemical polishing
Hf and Zr alloys, Zr-Nb alloys - Chemical polishing
Hf-Nb alloys - Chemical polishing and electrolytic polishing
Hf-Ta alloys - Chemical polishing
Hg(1-x)Cd(x)Te single crystal - Chemical polishing
HgCdTe (111) wafers - Chemical polishing
HgCdTe (111) wafers and other orientations - Chemical polishing
HgCdTe single crystal material - Chemical polishing/etching
HgCdTe single crystal wafers - Chemical polishing
HgCdTe specimens - Chemical polishing
HgSe (111) wafers - Chemical polishing
HgSe single crystal specimens - Chemical polishing
HgTe single crystal wafers - Chemical polishing
Ho2Co14Fe3 specimens - Chemical polishing
Ho2O17 specimens - Chemical polishing
In2Te3 specimens - Chemical polishing
In2Tl3 single crystal ingots - Chemical polishing
In5Bi3 single crystal specimens - Chemical polishing
InAs (100) n-type wafers - Chemical polishing
InAs (110), n-type wafers - Chemical polishing
InAs(x)P(x-1) polycrystalline ingot - Chemical polishing
InP (100) n-type wafers - Chemical polishing
InP (100) wafer fabricated as Schottky diodes - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing
InP (100) wafers - Chemical polishing/etching
InP (100) wafers Cut 3?-off toward (110) - Chemical polishing
InP (100) wafers cut within 1? of plane - Chemical polishing
InP (110) wafer cleaved under UHV - Chemical polishing
InP (111) wafers - Chemical polishing
InP (111) wafers grown by LEC - Chemical polishing
InP p-type single crystal wafers - Chemical polishing
InP-Fe (100) (SI) wafers - Chemical polishing
InPFe (100) (SI) wafers - Chemical polishing
InS (100) and (110) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers - Chemical polishing
InSb (100) wafers and other orientations - Chemical polishing
InSb (110) n-type and (100) p-type wafers - Chemical polishing
InSb (111) p-type wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111) wafers - Chemical polishing
InSb (111), (112) and other bulk orientations - Chemical polishing
InSb (311) wafers - Chemical polishing
InSb thin films - Chemical polishing
Indium antimonide (InSb) - Chemical etching
Indium antimonide (InSb) - Chemical polishing
Indium antimonide (InSb) - Chemical polishing
Indium antimonide (InSb) - Chemical polishing and etching
Indium antimonide (InSb) - Chemical polishing and etching
Indium phosphide (InP) - Chemical polishing
Indium phosphide (InP) - Chemical polishing
Indium phosphide (InP) - Chemical polishing and etching
Indium phosphide (InP, (001) face) - Chemical polishing
Iodide Ti alloy - Chemical etching - General macrostructure
Iodide titanium - Chemical polishing
Iron specimen - Chemical polishing
Iron specimen - Chemical polishing
Iron specimen - Chemical polishing
Iron specimen - Chemical polishing and etching
Iron specimen - Chemical polishing in hot etchant
K specimens - Chemical polishing
KCl (100) cleaved wafers - Chemical polishing
Kalling's etchant - UCe2 specimen - Chemical polishing
Kalling's etchant - UCo2 specimen - Chemical polishing
Kalling's etchant - UNi2 specimen - Chemical polishing
Kalling's etchant - UPt3 specimen - Chemical polishing
Kalling's etchant - Y2(CoM)17 single crystal ingots - Chemical polishing
Kovar specimens - Chemical polishing
Kovar specimens - Chemical polishing
Kroll's etchant - Ti-Mo alloy - Ti-26Mo
La specimens - Chemical polishing
LaBr3 (100) wafers - Chemical polishing
Lanthanum - Chemical polishing and etching
Lead - Chemical polishing
Lead single crystal - Chemical polishing
Lead sulphide (PbS) - Chemical polishing
Lead sulphide (PbS) - Chemical polishing and etching
Lead telluride (Pb-Te) - Chemical polishing
Lead telluride (Pb-Te) - Chemical polishing and etching
Levenstein-Robinson's etchant - Silver single crystal - Chemical polishing and etching
Levinstein and Robinson's etchant - Silver - Chemical polishing
Li fluoride - Chemical polishing
Li specimens - Chemical polishing
Li3Bi single crystal ingots - Chemical polishing
Lithium ferrite (Li05 Fe25 O4) - Chemical polishing and etching
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium specimens - Chemical polishing and etching
Livingstone's etchant, Young's etchant - Copper single crystal - Etching for etch pits
Low Mn-V steel - Fe-0.14C-1.3Mn-0.35Si-0.1V (plus Al, N)
Low-carbon steels - Chemical polishing
Low-carbon steels - Chemical polishing
Low-carbon steels, Mg - Chemical polishing
Magnesia (MgO) - Chemical polishing
Magnesia (MgO) - Chemical polishing, chemical etching, jet thinning
Magnesia (MgO) single crystal - Chemical etching
Magnesia (MgO) single crystal - Chemical polishing
Magnesia (MgO) single crystal - Chemical polishing and etching
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Chemical polishing
Magnesium - Electrolytic polishing
Magnesium fluoride MgF2 - Chemical polishing
Maraging steel - Fe-0.02C-12/16Cr-8Ni-0.15Be
Marshall's solution - Fe specimens - Chemical polishing
Medium-carbon steels - Chemical polishing
Mercury selenide (HgSe) - Chemical polishing and etching
Mercury telluride (HgTe) - Chemical polishing and etching
Meruric iodidie (HgI2) - Chemical polishing and etching
Meruric iodidie (HgI2) - Chemical polishing and etching
Mg specimens - Chemical polishing
Mg, Mg-MgO alloys (0-5% MgO) - Chemical polishing
Mg-Al alloy (Magnox 12) - Alloy with 0.85% Al
Mg-Al alloy - Alloys with < 10% Mg
Mg-Li alloy - Alloy with 10.5 at.% Li
Mg-Zr alloy - Alloys with low Zr content
Mg-Zr-Mn alloy - Mg-0.5Zr-0.1Mn
Mg2G3 (111) wafers - Chemical polishing
Mg2Ge (111) wafers - Chemical polishing
MgAl2O4 (spinel) (100) and (111) wafers - Chemical polishing
MgF2 (100) wafers - Chemical polishing/etching
MgO (100) wafers - Chemical polishing
MgSe single crystal - Chemical polishing
Mild steel - Chemical polishing
Mn steel - Fe-0.16C-13Mn-0.24Si-0.22Cu-0.48Cr-0.03/0.13Nb
Mn thin films - Chemical polishing/etching
Mn-Sn system - Quoted for non-stoichometric Mn-Sn alloys
Mn-Ti alloys (up to 30 Ti) - Chemical polishing
MnTe2 single crystal specimens - Chemical polishing
Mo (100) specimens - Chemical polishing
Mo specimens - Chemical polishing
Mo specimens - Chemical polishing
Mo specimens - Chemical polishing
Mo specimens used for electroplating - Chemical polishing
MoS2 single crystal specimens - Chemical polishing
MoSe2 single crystal specimens - Chemical polishing
MoTe2 single crystal specimens - Chemical polishing
Molybdenum - Chemical polishing
Molybdenum - Electrolytic and chemical polishing
Murakami's etchant - Vanadium-nitrogen system (V-N) - Electrolytic and chemical polishing
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) wafers - Chemical polishing
NaCl (100) wafers - Chemical polishing
NaCl (100) wafers and single crystals - Chemical polishing
Nb (100) oriented single crystal rods - Chemical polishing
Nb and alloys - Chemical etching
Nb polycrystalline samples - Chemical polishing
Nb specimens - Chemical polishing
Nb specimens - Chemical polishing
Nb, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb, V, Ta - Chemical polishing
Nb-H allooys - Chemical polishing and etching
Nb-Mo alloy - Single crystal alloys
Nb-Rh alloys single crystal - Chemical polishing
Nb-Ta alloys - Chemical polishing
Nb-Ti alloy (20 at.% Nb) - Chemical polishing
Nb-Ti alloy (54.3 at.% Ti) - Chemical etching
Nb-Zr alloys (Omega phase) - Chemical polishing
Nb-Zr alloys - Chemical polishing and etching
Nb-low carbon alloys - Chemical polishing
Nb3Sn as single crystals - Chemical polishing
Ni specimens - Chemical polishing
Ni specimens - Chemical polishing
Ni-Al alloy - Alloy with 0.1-0.5 at.% Al
Ni-Fe-Ti alloy - Fe-12Ni-0.25Ti
Ni-Nb alloys - Chemical etching
Ni-Ta alloys (low Ta) - Chemical polishing and etching, electrolytic thinning
Ni-Ti alloy (NiTi) - Chemical polishing
Nickel - Chemical polishing
Nickel - Chemical polishing
Nickel and Ni-Co alloys - Electrolytic polishing
Nickel phosphorus alloys (Ni-P) - Electrolytic and chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Chemical polishing
Niobium - Electrolytic thinning
Niobium single crystal - Chemical polishing
Nital (10%) - Magnesium - Chemical polishing
Np specimens - Chemical polishing/etching
OFHC copper, Cu-Zn alloys (10-15% Zn), Cu-7.5% Al alloy - Chemical polishing
OsS2 single crystal specimens - Chemical polishing
OsTe2 single crystal specimens - Chemical polishing
Pb (100) wafers - Chemical polishing
Pb single crystal specimens - Chemical polishing
Pb specimens - Chemical polishing
Pb(NO3)2 grown as single crystals - Chemical polishing
Pb-Cd telleride-Pb(1-x) Cd(x) Te, x <= 0.03
Pb-Sn-Te system - Chemical polishing
PbS (100) wafers - Chemical polishing
PbS (100) wafers - Chemical polishing/etching
PbSe (100) wafers and other orientations - Chemical polishing
PbSnTe (100) wafers - Chemical polishing
PbSnTe (100) wafers - Chemical polishing/etching
PbTe (100) wafers - Chemical polishing
PbTe (100) wafers - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
Pd-Eu alloy - Approx. PdEu
Platinum - Chemical polishing
Poly-Si material - Chemical polishing
Poly-Si rectangular blocks of silicon - Chemical polishing
Potassium - Chemical polishing
Potassium - Chemical polishing
Potassium - Chemical polishing
Potassium chloride (KCl) - Chemical polishing
Pr (0001) wafers - Chemical polishing
PtAs2 single crystal specimens - Chemical polishing
PtP2 single crystal specimens - Chemical polishing
PtSb2 single crystal specimens - Chemical polishing
Pure Al, Al-1% Si-1% Fe-0.1% Cu alloy - Chemical polishing
Pure Fe - Chemical polishing
Pure Ni - Chemical polishing
Pure Ni, Ni-Co alloys - Chemical polishing
Pure Pb - Chemical polishing
Pure Pb, Pb alloys - Chemical polishing
Pure tantalum - Polishing
RE metals, Gd, Er, Ho and Dy - Chemical etching
RbBr (001) wafers - Chemical polishing
RbI (001) wafers - Chemical polishing
Richard-Crocker's RC etchant - Gallium phosphide (GaP) - Chemical polishing
Roman's etchant - Er, Dy, Gd, Ho, La - Chemical polishing
RuS2 single crystal specimens - Chemical polishing
RuSe2 single crystal specimens - Chemical polishing
RuTe2 single crystal specimens - Chemical polishing
Rutile single crystal (TiO2) - Chemical polishing
SR4 etchant - Ge (111) wafers - Chemical polishing/etching
SR4 etchant - Si (111) wafers used in a study of the variations in surface conductivity of silicon and Germanium
Samarium-terbium orthoferrite (Sm0.35 x Tb0.43 x FeO3) - Chemical polishing
Sb (0001) wafers cleaved under LN2 - Chemical polishing
Sb (0001) wafers cleaved under LN2 - Chemical polishing
Sb single crystal wafers - Chemical polishing
Sc (0001) wafers - Chemical polishing
Sc (0001) wafers - Chemical polishing
Scandium - Chemical polishing
Si (100) wafers used in developing the Secco's etchant - Chemical polishing
Si (100) wafers, n-type - Chemical polishing/etching
Si (111) n-type wafers - Chemical polishing
Si (111) n-type wafers, 130 Ohm cm resistivity - Chemical polishing
Si (111) n-type wafers, 50-500 Ohm cm resistivity - Chemical polishing
Si (111) pre-cut bars of material - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing
Si (111) wafers - Chemical polishing/thinning
Si (111) wafers and other orientations - Chemical polishing
Si (111) wafers and other orientations - Chemical polishing
Si (111) wafers and other orientations - Chemical polishing/etching
Si (111) wafers and other orientations - Chemical polishing/thinning
Si (111) wafers and other orientations with n- and p-type resistivity - Chemical polishing
Si (111) wafers used as substrates for epitaxy growth of silicon - Chemical polishing
Si (111) wafers used in a study of Ag and Fe ion contamination - Chemical polishing
Si (111) wafers, 5-50 Ohm cm resistivity, n-type - Chemical polishing
Si (111) wafers, n-type, 5-10 Ohm cm resistivity - Chemical polishing
Si (111) wafers, n-type, used to fabricate diffused p-n-p transistors - Chemical polishing
Si (111), (100) and (110) wafers - Chemical polishing
Si (111), (100) wafers - Chemical polishing/thinning
Si (111), (100), (112) and (110) oriented wafers - Chemical polishing
Si (111), (100), n- and p-type wafers - Chemical polishing
Si (111), n-type, 10-15 Ohm cm resistivity wafers - Chemical polishing
Si (111), p-type wafers, 0.1-200 Ohm cm resistivity - Chemical polishing
Si and Ge (111) wafers and other orientations - Chemical polishing
Si and Ge wafers - Chemical polishing
Si single crystal spheres - Chemical polishing
Si single crystal spheres 1/2" diameter - Chemical polishing
Si specimens - Chemical polishing
Si wafers - Chemical polishing
Si wafers and other orientations - Chemical polishing
SiO2 - Chemical polishing
Silicon - Chemical polishing
Silicon - Chemical polishing
Silicon - Chemical polishing and etching
Silicon - Chemical polishing and etching
Silicon - Chemical polishing and etching
Silicon - Chemical polishing and etching
Silicon - Etch for structure due to micro-segregation
Silicon carbide (SiC) - Etching of SiC for Transmission Electron Microscopy (TEM)
Silicon carbide (SiC-(beta-form) - Chemical polishing
Silicon carbide (SiC-(beta-form) - Chemical polishing
Silver - Cemical polishing and etching
Silver - Chemical polishing
Silver - Chemical polishing
Silver - Chemical polishing
Silver - Chemical polishing
Silver single crystal - Chemical polishing
Silver single crystal - Chemical polishing
Silver single crystal - Chemical polishing and etching
Sirtl's etchant - SiC (0001) wafers - Chemical polishing
Sn white-tin single crystal - Chemical polishing
Sn-Pb-As system - Chemical polishing
Sn-Sb-Cu alloys, Al-Sn materials, high Sn-containing alloys - Chemical polishing
Sn-Te system - Chemical polishing
SnTe (100) wafers - Chemical polishing
SnTe - Chemical polishing
Sodium - Chemical polishing
Sodium chloride (NaCl) - Chemical polishing and etching
Sodium chloride (NaCl) - Chemical polishing and etching
Sodium chloride (NaCl) - Chemical polishing of single crystal
Sodium chloride (NaCl) - For final polishing (110) and (111) faces
Sodium specimens - Chemical polishing
Sr (100) wafers and other orientations - Chemical polishing/etching
SrWO4 single crystal specimens - Chemical polishing
Stainless steel - Chemical polishing
Steels (0.1-0.8% C, up to 3% alloys) - Chemical polishing
Steels - Chemical polishing
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Steels specimen - Electrolytic polishing
Superoxol - InP (100) Zn doped p-type wafers - Chemical polishing
Ta material - Chemical polishing
Ta specimens - Chemical polishing
Ta specimens - Chemical polishing
Ta specimens - Chemical polishing
Ta-C system - < 1.5 at.% C - Chemical polishing
TaN thin film deposits - Chemical polishing
Tantalum - Attack polishing
Tantalum - Attack polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing
Tantalum - Chemical polishing and etching
Te (0001) and (1010) wafers - Chemical polishing
Te (0001) wafers - Chemical polishing
Te (0001) wafers - Chemical polishing
Te (1010) wafers - Chemical polishing
TeO2 as natural single crystals - Chemical polishing/etching
Thulium orthoferrite (TmFeO3) - Chemical polishing
Ti specimens - Chemical polishing
Ti specimens - Chemical polishing/etching
Ti specimens - Chemical polishing/etching
Ti-Al alloy (Ti-4Al) - Chemical polishing
Ti-Al system - Alloys with up to 5 at.% Al
Ti-Al-V alloy (6Al-4V) - Chemical polishing
Ti-Al-V alloy (6Al-4V) - Chemical polishing
Ti-Cr-V-Al alloy - 13V-11Cr-3Al - Chemical polishing
Ti-Mo alloy (15.2 at.% Mo) - Chemical polishing
Ti-V alloys (Beta alloys, 20-40 wt.% V) - Chemical polishing and elecytrolytic etching
Ti-V alloys - Chemical polishing
TiO2 - Chemical polishing
TiSi2 arc melted - Chemical polishing
Tin - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Chemical polishing
Titanium - Sample preparation procedure
Titanium alpha-Ti single crystal - Chemical polishing
Titanium and its alloys - Chemical etching - General macrostructure
Tl2Se3 and TlSe single crystal - Chemical polishing
Tungsten single crystal - Electrolytic polishing, chemical polishing
Type 304 stainless heat resisting steel - Fe-0.1C-18Cr-8.5Ni-1.4Mn-0.5Si
U specimens - Chemical polishing
U specimens - Chemical polishing
U specimens - Chemical polishing
Uranium - Chemical thinning and electrolytic polishing
V specimens - Chemical polishing/etching
V-H system - Chemical polishing
V-O system - Electrolytic and chemical polishing, chemical etching
V3Si (111) and (100) wafers - Chemical polishing
V3Si and V3Ge - Chemical polishing
VBr2 single crystals - Chemical polishing/etching
Vanadium - Chemical polishing
Vanadium - Chemical polishing
Vanadium - Chemical polishing
Vanadium oxide-lanthanum oxide system - V2O3-La2O3 system
W specimens - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
W specimens used for electroplating - Chemical polishing
White's etchant - Si (100) cleaved wafers - Chemical polishing
Worner and Worner's etchant - Thallium specimens - Chemical polishing
X-l114 etchant - Ge (111) wafers - Chemical polishing
Yttrium oxide (Y2O3) - Dislocation etching
Yttrium-aluminium garnets (Nd doped) - Chemical polishing
Yttrium-aluminium garnets - Chemical polishing
Yttrium-ortoaluminate (YAlO2) - Chemical etching
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing
Zinc - Chemical polishing and etching
Zinc oxide single crystal (ZnO) - Chemical polishing and etching
Zinc oxide-bismuth oxide - ZnO x Bi2O3
Zinc selenide (ZnSe) - Chemical polishing
Zinc selenide (ZnSe) - Chemical polishing
Zinc selenide (ZnSe) - Chemical polishing
Zinc sulphide (ZnS) - Chemical polishing and etching
Zinc telluride (ZnTe) - Chemical polishing and etching
Zircaloy 4 (Zr-1.2/1.7% Sn) - Chemical polishing
Zircaloy 4 - Zr-1.2/1.7Sn-0.18/0.24Fe-0.07/0.13Cr - Chemical polishing
Zircaloy 4-Zirconia system - Zr (1.2-1.7% Sn)-ZrO2 (O2 up to 2%)
Zircaloy-2 and Hf - Chemical etching
Zircaloy-2, Hf - Chemical polishing
Zircaloy-4 - Chemical polishing
Zirconium - Alpha-Zr
Zirconium - Chemical etching
Zirconium - Chemical polishing
Zirconium - Chemical polishing
Zirconium - Chemical polishing
Zirconium and alloys - Chemical etching
Zirconium-thorium-oxygen system (Zr-ThO2, Zr-Th x ThO2) - Chemical polishing
Zirconium-yttrium-oxygen system (Zr-Y2O3) - Chemical polishing
Zn (0001) wafers - Chemical polishing/etching
Zn (0001) wafers and ingots - Chemical polishing
Zn alloy single crystal platelets - Chemical polishing
Zn single crystals - Chemical polishing
Zn specimens - Chemical polishing
Zn-Sn-As system - Investigation of polishing behaviours of chemical mixtures on ZnSnAs material
ZnCd - Chemical polishing
ZnO (0O01) wafers - Chemical polishing
ZnO single crystal specimens - ZnO single crystal specimens used in a study of deformation
ZnS (100) wafers - Chemical polishing
ZnSe (100) wafers - Chemical polishing
ZnSe single crystal wafers - Chemical polishing
ZnSiP2 (100) single crystal wafers - Chemical polishing
ZnTe (111) wafers - Chemical polishing
ZnTe (111) wafers - Chemical polishing/etching
ZnW (001) cleaved wafers - Chemical polishing
Zr specimens - Chemical polishing
Zr specimens - Chemical polishing
Zr, Hf, Zircaloys - Chemical polishing
Zr, Hf, and low alloys - Chemical etching - General macrostructure
Zr, Hf, and low alloys - Chemical etching - General macrostructure
Zr, Zr-2.5% Nb alloy, Zircaloy-2, Zircaloy-4, Hf - Chemical polishing
Zr-Be, and Zr-H alloys, pure Zr, Zircaloy - Chemical polishing
Zr-Ce-O system - Zr-Ce2O3 x 2ZrO2
Zr-Cr alloys - Chemical polishing
Zr-Cr-O alloys (Zr-rich) - Chemical polishing
Zr-Cr-O alloys, Zr alloys other than Zircaloys - Chemical polishing
Zr-Cu eutectoid - Zr-1.6% Cu - Chemical polishing
Zr-Mn alloy - Alloys with 0.5-2.0 at. % Mn
Zr-Th alloys - Chemical polishing