SiO2 - Dislocation etching

Material Name: SiO2
Recipe No.: 10247
Primary Chemical Element in Material: Si
Sample Type: Bulk
Uses: Etching
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Dislocation etching
Etchant (Electrolyte) Composition: Distilled water sat. with NH4HF2.
Note: All
Procedure (Condition):  Produces some etch. Augustine and Hale.
Reference: Vander Voort, Metallography Principles and Practice, McGraw-Hill, Inc., 1984, p. 727.

















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