Etchants for Oxides

Al, and A12O3/A1N thin films-Gas etching
Al2NiO4 specimens-Chemical etching
Al2O3 substrate blanks-Gas cleaning
Al2O3 thin film deposition on InGaAsP/InP-Oxide, passivation
Al2O3 thin film-Chemical etching
Al2O3, CeO2 and Cr2O3-Physical etching
Al2O3, mixture of Al2O3 and MgO, or SnO2
Al2O3, native oxide films on Al:Au alloys-Chemical etching (cleaning)
Al2O3, thin film deposited on silicon-Photochemical, forming
Al2O3
Al2O3
Al2O3
Al2O3-Chemical etching
Al2O3-Chemical etching
Al2O3-TiC sintered cermets
Al2SiO5 specimens-Chemical etching
Al2TiO5, grain boundary etchant-Chemical etching
Al-Mo-O system-Al2O3-< 5% Mo
AlN-Al2O3-Chemical etching
AlN-La2O3-Chemical ecthing
Alumina (Al2O3) single crystal-Chemical etching
Alumina dispersed Nichrome-Ni-20% Cr-0.6/1.5% Al2O3
Alumina-silicon-phosphorous trioxide-Yttria glass-49.2 mol.% Al2O3-38.8% SiO2-9.0% P2O3-9.0% Y2O3
Aluminia-lanthanum oxide dispersed Nichrome-Ni-20Cr-0.04Al2O3-0.04La2O3
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Physical etching
Aluminium oxide (Al2O3)-Physical etching
Aluminium-Alumina (Al2O3) alloys-Low oxide alloys. Jet electro polishing
Aluminium-magnesium oxide (Al2O3 + MgO)-Chemical etching
Aluminium-magnesium oxide (Al2O3 + MgO)-Chemical etching
Am2O3-Chemical etching
AmO(2-x), AmO(2-x) with Am2O3-Chemical etching
Au specimens-Oxide removal
BaO in BaTi3O7, grain boundary etchant-Physical etching
Barium oxide (BaO)-Chemical etching
Barium oxide (BaO)-Chemical etching
Barium-lead-titanate-zirconate-(Pb0.7Ba0.3) x (Zr0.7TiO.3)3
BaTiO3 and BaTi3O7
BaTiO3 specimens-Chemical etching
BaTiO3-Chemical etching
BeO (0001) wafer-Chemical etching
BeO, BaO, MgO, ZrO2 and Zr2O3
BeO+UO2+Y2O3-Chemical etching
BeO
BeO-Chemical etching
BeO-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical polishing
Beryllium oxide (BeO)-single crystal-Chemical etching
Bi12-GeO20 specimens-Chemical polishing
Bi2O3 deposited as a thin film-Chemical etching
Bi-Sb-Te system-Bi0.5 x Sb1.5 x Te3+x
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
CaO and MgO
CaO, MgO-Chemical etching
CaO
CaO-Chemical etching
Carbon dioxide (CO2)-Gas oxidation
CaTiO3-Chemical etching
CdO as a surface oxide-Chemical cleaning
CdO native oxide-Chemical etching
CeO2, SrTiO3, Al2O3, and ZrO-ZrC
CeO2
CeO2
CeO2-Chemical etching
CeO2-Chemical etching
Ceramics, borides (Ta, La)-TaB2, LaB4
Ceramics, carbides (B)-B4C
Ceramics, carbides (Mo, Cr)-MoC2, CrC2
Ceramics, carbides (Pu)-PuC (toxic)
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Ti)-TiC
Ceramics, carbides (Ti, Ta)-TiC, TaC
Ceramics, carbides (W)-WC
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN-U2N3 mixtures (toxic)
Cerium oxide (CeO2)-Chemical etching
Cerium oxide-Chemical etching
Cerium oxide-silicon nitride system-(1Si3N4:1CeO2)
Cerium specimens-Chemical solution
Cermets (U)-UN-U, UN-W (toxic)
Cermets (Zr, Th, W, U)-ZrO2-W, ThO2-W (toxic), W2C-W, UC-Cr (toxic), UC-Fe (toxic), UC-Ni (toxic), UC-UFe2 (toxic)
Chromium oxide (Cr2O3)-Chemical etching
Co alloys-For cobalt oxides and sulphides
Co alloys-Revels oxide in sulphides
Co oxide (CoO) single crystal-Chemical etching
Co oxide (CoO)-Chemical etching
Co oxide (CoO)-Electro thinning
Co oxide (CoO)-Physical etching
Co oxide single crystal-Chemical etching and electro thinning
Co oxide single crystal-Chemical etching
Cobalt oxide (CoO)-Chemical etching
Co-Ce-Al alloy-Co5CeAl0.2
Co-Dy-Ag alloy-Co5DyAg0.2
Co-Dy-Al alloy-Co5DyAl0.2
Co-Dy-C alloy-Co5DyC0.7
Co-Dy-Cr alloy-Co5DyCr0.2
Co-Dy-Cu alloy-Co5DyCu0.2
Co-Dy-Fe alloy-Co5DyFe0.2
Co-Dy-Ga alloy-Co5DyGa0.2
Co-Dy-Ge alloy-Co5DyGe0.2
Co-Dy-Mn alloy-Co5DyMn0.2
Co-Dy-Ni alloy-Co5DyNi0.2
Co-Dy-Pb alloy-Co5DyPb0.2
Co-Dy-Pd alloy-Co5DyPd0.2
Co-Dy-Pt alloy-Co5DyPt0.2
Co-Dy-Si alloy-Co5DySi0.2
Co-Er-Al alloy-Co5ErAl0.2
Co-Er-Fe alloy-Co5ErFe0.2
Co-Gd-Al alloy-Co5GdAl0.2
Co-Gd-Fe alloy-Co5GdFe0.2
Co-Ho-Al alloy-Co5HoAl0.2
Co-Ho-Fe alloy-Co5HoFe0.2
Co-La-Al alloy-Co5LaAl0.2
Co-La-Fe alloy-Co5LaFe0.2
Co-Nd-Al alloy-Co5NdAl0.2
Co-Nd-Fe alloy-Co5NdFe0.2
Co-Ni-O system-Approx. (Co0.81Ni0.2)O
CoO
CoO-Chemical etching
Co-Pr-Al alloy-Co5PrAl0.2
Co-Pr-Fe alloy-Co5PrFe0.2
Co-Sm alloy-Co5Sm
Co-Sm-Al alloy-Co5SmAl0.2
Co-Sm-Fe alloy-Co5SmFe0.2
Co-Tb-Al alloy-Co5TbAl0.2
Co-Tb-Fe alloy-Co5TbFe0.2
Cr2O3 (0001) wafers-Chemical etching
Cr2O3 (111) single crystal-Material growth
Cr2O3 amorphous thin films-Chemical etching
Cr2O3 and Al2O3
Cu oxide (Cu2O)-Chemical polishing, thinning
Cu oxide-Chemical polishing, thinning
Cu oxides-Chemical ecthing
Cu oxides-Chemical etching
Cu oxides-single crystals-Chemical polishing
Cu20 thin films-Acid oxidation
Cu2O native oxide-Oxide removal
Cu2O as a native oxide on copper surfaces-Acid removal
Cu2O as a native oxide thin film on surfaces-Oxide removal
Cu2O as a native oxide-Chemical etching
Cu2O specimens-Chemical etching
Eu2O3 specimens-Chemical etching
Eu2O3-Chemical etching
Europium oxide (Eu2O3)-Chemical etching
Fe2O3 natural single crystals-Chemical etching
Fe3O4 specimens-Chemical etching
FeO x nH2O the natural mineral limonite-Chemical cleaning
Ga2O3 as a native oxide on gallium arsenide wafers-Chemical cleaning
Ga2O3 as native oxide on GaAs (100) wafers-Physical etching
Ga2O3 as native oxide on GaAs-Physical etching
Ga2O3 thin film growth of GaAs, (100), p-type wafers-Chemical oxidizing
Ge2O3, DC sputtered thin films-Chemical etching
Glass-soda-lime-Chemical lapping/etching
HfO2
HfO2
HgO as a native oxide on mercury-Chemical etching
Hydrated tricalcium silicate iron oxide system-Chemical etching
Hydrated tricalcium silicate-Chemical etching
In203 specimens-Chemical etching
In2O3 specimens-Chemical etching
In2O3 specimens-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Electrolytic etching
Iron-oxide layers on iron-Fe2O3-Chemical etching
Iron-oxide layers on iron-Fe3O4-Chemical etching
Iron-oxide layers on iron-Fe3O4-Chemical etching
Iron-oxide layers on iron-FeO-Chemical etching
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3-Chemical etching
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3-Chemical etching
Iron-oxide layers on iron-Physical etching
Iron-oxide layers on iron-Physical etching
Lead oxide-boric oxide glass-Chemical etching
Lead oxide-vanadium oxide-germanium oxide glass (Ge-O-Pb-V)-4/55 V2O5-1/36 PbO-65/9 GeO2
Li tantalate-silicon-alumina system-Chemical etching
Li(x)WO3 (blue) and Li(x)WO3-Oxide, growth
Lithia dispersed Nichrome (Cr-Li-Ni-O)-Ni-20Cr-1.3Li2O
Lithia-zinc oxide-silica system-Chemical etching
Lithium oxide-potash-zinc oxide-silicate glass-Chemical thinning
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Manganese (II) oxide-Chemical thinning
Manganese zinc ferrite-Low calcium oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + CaO
MgO (100) wafers-Chemical etching
MgO and UO2
MgO, ThO2, Al3NiO4, and Y2O3 - ZrO2
MgO, UO2 (!!!)-Chemical etching
MgO
MnO2 natural crystal specimens-Chemical etching
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nb oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nb2O5
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nd2O3
Mn-Zn ferrite-low Cd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + CdO
Mn-Zn ferrite-low copper oxide body-Mn0.51 Zn0.43 Fe2.06O4 + CuO
Mn-Zn ferrite-low Ge oxide body-Mn0.5 x Zn0.43 xFe2.06 x O4 + GeO2
Mn-Zn ferrite-low Pb oxide body (Fe-Mn-O-Pb-Zn)-Mn0.5 x Zn0.43 x Fe2.03 x O4 + PbO
Mn-Zn ferrite-low Sb oxide body (Fe-Mn-O-Sb-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Sb2O3
Mn-Zn ferrite-low Si oxide body (Fe-Mn-O-Si-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SiO2
Mn-Zn ferrite-low Sn oxide body (Fe-Mn-O-Sn-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SnO2
Mn-Zn ferrite-low Sr oxide body (Fe-Mn-O-Sr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SrO
Mn-Zn ferrite-low Ti oxide body (Fe-Mn-O-Ti-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + TiO2
Mn-Zn ferrite-low V oxide body (Fe-Mn-O-V-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + V2O5
Mn-Zn ferrite-low Y oxide body (Fe-Mn-O-Y-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Y2O3
Mn-Zn ferrite-low Zr oxide body (Fe-Mn-O-Zr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + ZrO2
Mullite (Al2O3 x SiO2), BeO, MgO, Ca(2)Zr(1-1x)O(y)-Chemical etching
Na beta Al2O3-Chemical etching
Na beta Al2O3-Physical etching
Nb and Nb alloys, Ta and Ta-O alloys (industrial alloys), etch figures-Chemical etching
Nb oxide, NbO (blue), NbO2 (blue green), Nb2O5 (red brown)-Electrolytic etching
Nb/Nb2O3, E-Ni-Fe-Chemical-Mechanical polishing
Nd2O3, U3O8-Chemical etching
Neodymium oxide (Nd2O3)-Chemical etching
Neodymium oxide-Zirconia system-ZrO2-Nd2O3 eutectic
Ni-B-P glass-Ni80-P10-B10 splat cooled alloy
Nichrome-lanthanum oxide system-Ni-20Cr-1.2/1.6La2O3
Nickel oxide (NiO)-Chemical etchinhg
Nickel oxide (NiO)-Chemical thinning
Nickel oxide (NiO)-Etch pits reagent
Nickel phosphorus glass (Ni-P)-Ni80P20
Ni-Fe-Cr-P-B alloy-Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
NiO specimens-Chemical etching
NiO thin film platelets-Chemical etching
Niobium oxide (NbO, Nb2O3, Nb2O5)-Chemical etching
Niobium single crystal-Produces triangular etch pits on (111) planes
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
NiO-Chemical etching
NiO-Electrolytic etching
Ni-Si-B glass-Splat cooled alloys
NiZn ferrite and Ni ferrite
Non-oxide ceramics-Thermal etching
NxSiO2 thin films-Chemical etching
Oxide ceramics (Al, Si, Be)-Al2O3, SiO2, BeO-UO2-Y2O3 mixtures (toxic)
Oxide ceramics (Al, U, Th)-Al2O3, UO2 (toxic),ThO2 (toxic), Al2O3-MgO mixtures
Oxide Ceramics (Be, Zr, Mg, Ca)-BeO (toxic), Zr2O3, BaO, MgO, Ca8Zr1-xOy
Oxide ceramics (Ca, Mg)-CaO, MgO
Oxide ceramics (Ce, Sr, Al, Zr)-CeO, SrTiO3, Al2O3, ZrO-ZrC mixtures
Oxide ceramics (Mg, U)-MgO, UO2 (toxic)
Oxide ceramics (Th, Y)-ThO2-Y2O3 mixtures (toxic)
Oxide ceramics (U, Th, Pu)-UO2 (toxic), ThxUyO2 (toxic), PuO2, cast (toxic), PuO2 (gamma, sintered)-toxic
Oxide ceramics (Zr, U, Nd)-ZrO2, U3O8 (toxic)
Oxide ceramics combinations-Thermal and chemical etching
Oxide ceramics combinations-Thermal and chemical etching
Oxide ceramics-Al2O3, Al2O3xMgO, SnO2
Oxide ceramics-Al2O3, Al2SiO5
Oxide ceramics-Al2O3, BeO (toxic), UO2 (toxic)
Oxide ceramics-Al2O3. Relief formation
Oxide ceramics-BaTiO3, BaTi3O7
Oxide ceramics-BeO (toxic)
Oxide ceramics-BeO (toxic)
Oxide ceramics-CaO
Oxide ceramics-Cr2O3, CeO2, Al2O3
Oxide ceramics-Eu2O3
Oxide ceramics-MgO, ThO2 (toxic), Al2NiO4, PuO3 (gamma, sintered)-toxic, Y2O3-ZrO2 and Sm2O3-ZrO2 mixtures
Oxide ceramics-MgO-Al2O3-SiO2-ZrO2 mixtures
Oxide ceramics-Nb oxides, NbO (blue), NbO2 (cyan), Nb3O3 (red-dish-brown)
Oxide ceramics-NiO
Oxide ceramics-U4O9 (toxic)
Oxide ceramics-UO2 (toxic). Grain size
Oxide ceramics-UO2 (toxic)
Oxide ceramics-UO2 (toxic)
Oxide ceramics-UO2 (toxic
Oxide Ceramics-UO2, UO2-PuP2, UO2-U4O9 and UO2-CeO2 mixtures (toxic)
Oxide ceramics-UO2-PuO2 mixtures (toxic)
Oxide ceramics-ZnO-Physical etching
Oxide dispersed Ni-Cr-Al-Fe alloy-Ni-16Cr-4.2Al-0.2Fe-0.8/1.0Y2O3-1.6/2.0Al2O3 +C,N
Oxide dispersion hardened MA6000L alloy-Ni-14Cr-4.6Al-4W-2.3Ti-2.1Ta-2Mo-0.75Y-0.6O2-0.2Fe-0.2N-0.07C-0.07Zr (+B)
PbO native oxide-Chemical etching
PbTe (100) p-type wafers-Oxide removal
Plutonium oxide (PuO)-Sample preparation
Plutonium oxide (PuO2)-Chemical etching
PLZT [(Pb,La)(Zr,Ti)O3]
PLZT [(Pb,La)(Zr,Ti)O3]
Porcelain
PtO crystalline thin films-Chemical etching
PuO2-Chemical etching
Pure Al2O3, Al2O3 with MgO, Al2O3 with additives: CaO, MgO, SiO2, Na2O-Physical etching
PZT (PbZrTiO)-Chemical etching
Removing rust (FeO[OH]) and scale from the steel surface-ascorbic acid (Vitamin C)
Removing rust (FeO[OH]) and scale from the steel surface-citric acid
Removing rust (FeO[OH]) and scale from the steel surface-Cyanide solution
Removing rust (FeO[OH]) and scale from the steel surface-ENDOX 114 (cyanide free)
Removing rust (FeO[OH]) and scale from the steel surface-ENDOX 214 (containing cyanide)
Removing rust (FeO[OH]) and scale from the steel surface-Hydrobromic acid
Removing rust (FeO[OH]) and scale from the steel surface-inhibited chloric acid
Removing rust (FeO[OH]) and scale from the steel surface-TICKOPUR RW 77
Reveals coring in foundry alloys, welds, colour etchant-Chemical etching
Rutile single crystal (TiO2)-Chemical polishing
Silicon oxide wafer etch process
SiO2 (0001), (1010), natural single crystal and artificial fused quartz wafers and blank-Chemical etching
SiO2 as thermal oxidation on silicon wafers-Chemical etching
SiO2 as thin film deposits-Chemical etching
SiO2 deposited as CVD thin films on (100) silicon substrates-Chemical etching
SiO2 deposited on silicon wafer substrates
SiO2 deposition on aluminum and quartz blanks or silicon wafers-Chemical etching
SiO2 grown as a hydrated oxide on silicon wafers-Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers-Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers-Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers-Electrolytic oxidizing
SiO2 grown on IC devices-Chemical etching
SiO2 native oxide-Chemical etching
SiO2 single crystal artificial specimens-Chemical cleaning
SiO2 thermally oxidized thin films on p-type (100) silicon wafers-Metal decoration
SiO2 thin film coatings-Oxide, growth
SiO2 thin film deposited on InP (100) wafer substrates-Chemical etching
SiO2 thin film deposits on silicon wafer-Chemical etching
SiO2 thin film layers grown on silicon-Chemical etching
SiO2 thin film oxidation of silicon, (111) n-type wafers at 1050C as wet oxide, 2000-2500 A thick-Chemical etching
SiO2 thin film RF sputtered
SiO2 thin films 160 nm thick-Chemical etching
SiO2 thin films and native oxides-Chemical etching
SiO2 thin films deposited by Silox system method on (100) silicon and GaAs-Cr (SI) wafers-Ionized gas etching-DE-100 etchant
SiO2 thin films deposited on (100) silicon substrates-Dislocation etching
SiO2 thin films deposited on (100) silicon wafers-Chemical etching-P etchant
SiO2 thin films deposited on (100) silicon wafers-Metal decoration
SiO2 thin films deposited on (111), p-type, 1-3 Ohm cm resistivity wafers-Chemical ecthing
SiO2 thin films deposited on (1OO) silicon wafers-Chemical etching
SiO2 thin films deposited on a variety of substrates/surfaces-Oxide, adhesive coat
SiO2 thin films deposited on silicon (100)-Chemical etching
SiO2 thin films deposited on silicon wafers-Chemical etching
SiO2 thin films deposited on silicon wafers-Chemical etching
SiO2 thin films deposition on (100) silicon wafers-Oxide, growth
SiO2 thin films grown on silicon, (100), n-type substrates-Chemical etching
SiO2 thin films on Si (100) wafers-Chemical etching
SiO2 thin films on Si (100) wafers-Chemical etching
SiO2 thin films on silicon wafers as doped BPSG
SiO2 thin films thermally evaporated-Chemical etching
Sm2O3 + ZrO2-Chemical etching
SnO2 specimens-Chemical etching
Soda-boric oxide-niobium oxide-Chemical etching
Spinel phase-Chemical etching
SrTiO3 specimens-Chemical etching
SrTiO3, MgTiO3-Chemical etching
Tellurium oxide (TeO2)-phosphoric pentoxide system (P2O5)-Chemical etching
Tellurium oxide-boric oxide system-Chemical etching
Tellurium oxide-boric oxide-cadmium oxide glass-TeO2 - B2O3 - CdO system
Tellurium oxide-boric oxide-cobalt oxide glass-TeO2 - B2O3 - CaO glass
Tellurium oxide-boric oxide-germanium oxide glass-TeO2-B2O3-GeO2 system
Tellurium oxide-boric oxide-iron oxide glass-TeO2-B2O3-Fe2O3-system
Tellurium oxide-boric oxide-manganese oxide glass
Tellurium oxide-boric oxide-nickel oxide glass-TeO2-B2O3-NiO system
TeO2 as natural single crystals-Chemical polishing/etching
TeO2 crystalline native oxide or TeO, amorphous native oxide-Salt, removal
TeO2 grown as a stable native oxide on CdTe (110) wafers-Chemical etching
ThO2 + Y2O3 specimens-Chemical etching
ThO2-Y2O3 mixtures-Chemical ecthing
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-yttrium oxide (Y2O3)-10 mol.% ThO2-Chemical etching
Thorium oxide (ThO2)-yttrium oxide (Y2O3)-Chemical etching
Tin oxide (SnO2)-Chemical etching
Tin oxide (SnO2)-Physical etching
TiO2 (001) basal oriented wafers-Chemical cleaning
TiO2 as a native oxide on titanium substrates-Chemical ecthing
TiO2 thin film deposited on GaAs (100) substrates-Chemical etching
TiO2-Chemical etching
TiO2-Physical etching
Titanium dioxide (TiO2)-Chemical etching
Titanium oxide (Rutile-TiO2)-Chemical etching
Topaz-Al2(SiO4)(OH,F)2-Etching for defects (etch pits, etc.)
UO2 + ZrO2-Chemical etching
UO2 x Th(x)U(y)O2, PuO2 cast, PuO2 (gamma, sintered)-Chemical ecthing
UO2, UO2-CeO2, UO2-U4O9, and UO2-PuO2 mixtures-Chemical ecthing
UO2
UO2-Electrolytic etching
UO2-PuO2 mixtures-Chemical ecthing
Uranium dioxide (UO2) and higher oxides-Chemical etching
Uranium dioxide (UO2) single crystals-Used mainly for (111) faces but can be used for (100) faces
Uranium dioxide (UO2)-A suitable etching method for determining grain size
Uranium dioxide (UO2)-Cathodic etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical thinning
Uranium dioxide (UO2)-Electro thinning
Uranium dioxide (UO2, irradiated)-Chemical etching
Uranium dioxide (UO2, irradiated)-Chemical etching
Uranium dioxide (UO2, irradiated)-Chemical etching
Uranium dioxide-carbon-nitrogen system-Chemical etching
Uranium dioxide-thoria system (10% UO4)-Chemical etching
Uranium oxide (U3O8)-Chemical etching
Uranium oxide (U4O9)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Electrolytic etching
Uranium oxide (UO2)-Electropolishing
Vanadium oxide-lanthanum oxide system-V2O3-La2O3 system
Vanadium oxide-phosphoric oxide glass (VO2-V2O5-P2O5)-Chemical etching
Vanadium oxide-phosphoric oxide-boric oxide glass-VO2 10-14 mol.%/V2O5 69-73%, P2O5 12-16%, B2O3 up to 9%
WO2 oxide specimens-Chemical etching
WO3 oxide specimens-Chemical etching
Y2O3 + ZrO2 specimens-Chemical etching
Y2O3 x ThO2
Y3Fe5O12 and Y3Fe4AlO12
Yittria dispersed Nichrome (Cr-Ni-O-Y)-Ni-20Cr-0.2/1.1Y2O3
Yttrium iron garnet (Y3Fe5O12)-Chemical etching
Yttrium oxide (Y2O3)-Chemical etching
Yttrium oxide (Y2O3)-Dislocation etching
Yttrium-aluminium garnets-Chemical polishing
Yttrium-ortoaluminate (YAlO2)-Chemical etching
Zinc oxide (ZnO)-Removal of surface damage with above solution
Zinc oxide single crystal (ZnO)-Chemical polishing and etching
Zinc oxide-bismuth oxide=Chemical etching
Zinc oxide-bismuth oxide-antimony oxide-tin oxide-5% Sb2O3, 1% Bi2O3, 1% SnO2
Zinc oxide-bismuth oxide-ZnO x Bi2O3
Zinc oxide-lithium oxide system (ZnO-1 at.% Li2O)-Chemical etching
Zirconium dioxide ZrO2-Etching
Zirconium oxide (ZrO2)-Chemical etching
Zirconium oxide (ZrO2)-Chemical etching
Zirconium oxide (ZrO2)-Chemical etching
Zirconium oxide (ZrO2)-Etching for microstructure
Zirconium oxide (ZrO2)-Physical etching
Zirconium oxide (ZrO2)-Physical etching
ZnO grain boundaries-Chemical etching
ZnO
ZnO-Chemical etching
ZrO2 with MgO, CaO-Physical etching
ZrO2, Zr2O3-Chemical etching
ZrO2
ZrO2-Chemical ecthing
ZrO2-TZP (Y2O3, RE oxide, TiO2), ZrO2-PSZ (Y2O3, MgO, CaO), ZrO2-CSZ (ZrO2, MgO, CaO), ZrO-ZTC (Possible matrices: Al2O3, mullite)-Chemical ecthing
ZrO2-TZP, ZrO2-PSZ, ZrO2-CSZ, ZrO2-ZTC-Chemical etching

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