Etchants Alphabetical Index

'A' etchant
'B' etchant
'E' reagent
'G' etchant
'G' etchant
'H' etchant
'R' etchant
(Al, Ti)C carbide-Chemical etching
(Al, Ti)N specimens-Chemical etching
(Al,Ti)C, VC-Chemical etching
(Al,Ti)N, AlN-Y2O3, TiN-Chemical etching
(Fe, Al)S samples-Chemical etching
(Fe, Si)C carbide-Chemical etching
(Ga,Al)As-Be p-type thin films-Chemical etching
(RE)N12 specimens-Chemical etching
(Th, U)C2 carbide-Chemical etching
(Th, U)C2 carbide-Chemical etching
(Th,U)C with a U/Th ratio of less than 3ThC2-Chemical etching
(U,Pu)C-Chemical etching
(Y2O3)m(ZrO2)(1-m) (100) wafers-Chemical polishing
0.3P bearing stainless steel-Fe-18Cr-10Ni-0.3P
0.52C-15Cr steel-Chemical etching
100Cr6 steel-Carbide contrasting
1045 forged steel
1212 steels
14CrMOV6-3 steel-Sample preparation
14MoV6-3 steel-Electrolytic-potentiostatic isolation of residues
15% Shibuichi-Sterling silver BiMetalb (Au-Ag)-One layer Shibuichi, one layer Sterling silver
17-4-PM stainless steel-0.04C-16.5Cr-3.6Cu-4.25Ni-0.25Mn
18% Ni maraging steels
18-8 type 304 stainless steel-Chemical etching
18/8 Stainless steel specimens-Etching to reveal ingot structure
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 and 13-30% Cr steels-Revelas the grain boundaries of the matrix
18/8 stainless steel-To distinguish between austenite and ferrite
20-20 and 25-20 Cr-Ni steels-For distinguishing carbides and sigma phase
22K/Sterling silver BiMetal (Au-Ag)-Alloy composition in the weight % 12.5% 22K gold, 87.5% sterling silver
22k gold-Au
2XXX and 7XXX Al alloys
2XXX, 3XXX, 6XXX, 7XXX Al alloys - Graff and Sargent etch
3% Si-Fe specimen-Electrolytic polishing
3% Silicon iron-Electropolishing
310 stainless steel-Fe-25Cr-21Ni-1.3Mn-0.7Si-0.3Mo-0.25Cu-0.04C
316 stainless steel-Fe-16/18Cr-10/14Ni-2/3Mo-max.2Mn-max.1Si (+ < 0.08 C)
316 stainless steels
347 stainless steel
4 InO31 SnO2 specimens-Chemical etching
4340 annealed steel-Chemical etching
49% Co-49% Fe-V alloy, Stellites
4FeO.2Fe2O3.2Si02.4H2O, (001) cleaved wafers-Dislocation etching
4In2O3-1SnO2 as thin film surface coatings-Chemical etching
5% Al and 2.5% Sn and Ti, 6% Al, and 3% Sn and Ti alloys
5052 Al alloy-Chemical etching
6.6.1 etchant
6005, 6063 and 6061 Al-Mg-Si alloys-Chemical and electrolytic etching
6061 aluminum
60Pb-40Sn #62 solder-Chemical cleaning
68Ni-31.9Fe-0.1Mg and 63Ni-35Fe-2Mo single crystals-Chemical etching
6XXX Al alloys
718 alloy-Ni-0.03C-19Cr-3Mo-18Fe-0.6Al-1Ti-5Nb+Ta
72Fe-5.5Al-22Cr-0.5Co Kanthal-Chemical etching
73 J (Co-20Cr-6Mo) alloy-Chemical etching
79Ni-17Fe-44Mo (111) oriented Permalloy wafers-Electrolytic polishing
79Ni-17Fe-4Mo Permalloy single crystal specimens-Chemical polishing
7XXX Al alloys
92.5.3 etchant
99.999% pure iron-For etching of all grain boundaries
A non electrolytic etchant for Kovar-Chemical etching
A286 stainless steel - Standard and modified-Fe-20/30Ni-14/15Cr-0.02/0.06C-2/2.5Ti-0.2/1.0Al-0.1/1.5Mn-1/4Mo-0.1/0.6Si (+ B, V)
ABS, HIPS and PPO
AFC 77 martensitic stainless steel
AG-21's etch for superalloy
AHA etchant
AISI 304 steel
AISI 316 stainless steel-Fe-0.06C-<2Mn-<1Si-10/14Ni-16/18Cr
AISI 316 stainless steel-Fe-17.5Cr-10Ni-2.5Mo-2Mn-0.5Si-0.1C
AISI 321 stainless steel-Fe-18Cr-8Ni-0.4Ti
AISI 347 stainless steel-Fe-18Cr-8Ni-0.4Nb
AISI 4140N steel
ASTM Etch 31-Amonium persulphate
ASTM etchant #100-Ferric chloride
ASTM etchant #101-Chrome regia
ASTM etchant #102
ASTM etchant #103
ASTM etchant #104-Frank's reagent
ASTM etchant #105-92-5-3 reagent
ASTM etchant #106
ASTM etchant #107-E-etchant (EI-IR reagent)
ASTM etchant #108
ASTM etchant #109-HCl-HNO3-CuCl2 x H2O
ASTM etchant #110
ASTM etchant #111
ASTM etchant #112
ASTM etchant #113-Acetic/nitric
ASTM etchant #114-Acetic/nitric
ASTM etchant #115
ASTM etchant #116
ASTM etchant #117
ASTM etchant #118-Glycol
ASTM etchant #119-Acetic glycol
ASTM etchant #120
ASTM etchant #121-Phospho picral
ASTM etchant #122
ASTM etchant #123
ASTM etchant #124-Acetic-picral
ASTM etchant #125
ASTM etchant #126
ASTM etchant #127-Acetic-picral
ASTM etchant #128
ASTM etchant #129
ASTM etchant #130
ASTM etchant #131
ASTM etchant #132
ASTM etchant #133
ASTM etchant #134
ASTM etchant #135
ASTM etchant #136
ASTM etchant #137
ASTM etchant #138-Carapella's reagent
ASTM etchant #139
ASTM etchant #140
ASTM etchant #141-Contrast etchant
ASTM etchant #142
ASTM etchant #143
ASTM etchant #144
ASTM etchant #145
ASTM etchant #146
ASTM etchant #147
ASTM etchant #148
ASTM etchant #149
ASTM etchant #150
ASTM etchant #151
ASTM etchant #152
ASTM etchant #153
ASTM etchant #154
ASTM etchant #155-Beraha's E reagent
ASTM etchant #156
ASTM etchant #157
ASTM etchant #158
ASTM etchant #159
ASTM etchant #160
ASTM etchant #161
ASTM etchant #162
ASTM etchant #163
ASTM etchant #164
ASTM etchant #165
ASTM etchant #166
ASTM etchant #167
ASTM etchant #168
ASTM etchant #169
ASTM etchant #170
ASTM etchant #171-Hydrochloric acid
ASTM etchant #172
ASTM etchant #173
ASTM etchant #174
ASTM etchant #175-Chromic/sulphuric
ASTM etchant #176
ASTM etchant #177
ASTM etchant #178
ASTM etchant #179
ASTM etchant #180
ASTM etchant #181
ASTM etchant #182
ASTM etchant #183
ASTM etchant #184
ASTM etchant #185
ASTM etchant #186
ASTM etchant #187-Kroll's reagent
ASTM etchant #188
ASTM etchant #189
ASTM etchant #190
ASTM etchant #191
ASTM etchant #192 - Kroll's reagent
ASTM etchant #193
ASTM etchant #194
ASTM etchant #195
ASTM etchant #196
ASTM etchant #197
ASTM etchant #198
ASTM etchant #199
ASTM etchant #20
ASTM etchant #200 - Potassium reagent
ASTM etchant #201
ASTM etchant #202
ASTM etchant #203
ASTM etchant #204
ASTM etchant #205
ASTM etchant #206
ASTM etchant #207
ASTM etchant #208
ASTM etchant #209
ASTM etchant #21
ASTM etchant #22-HCl+H2O2
ASTM etchant #23-HCl-methanol
ASTM etchant #24-HCl-HNO3-FeCl3
ASTM etchant #25-Marble's reagent
ASTM etchant #26
ASTM etchant #27
ASTM etchant #28-Ferric nitrate
ASTM etchant #29-Potassium dichromate
ASTM etchant #30-NH4OH+H2O
ASTM etchant #32-Chromic acid
ASTM etchant #33-Chromic/hydrochloric
ASTM etchant #34
ASTM etchant #35-Grard's No.1 etch
ASTM etchant #36
ASTM etchant #37
ASTM etchant #38
ASTM etchant #39
ASTM etchant #40
ASTM etchant #41
ASTM etchant #42
ASTM etchant #43
ASTM etchant #44-Ammonium/peroxide
ASTM etchant #45
ASTM etchant #46
ASTM etchant #47 - Cyanide/persulphate
ASTM etchant #48
ASTM etchant #49
ASTM etchant #50-Nitric/acetic
ASTM etchant #51
ASTM etchant #52
ASTM etchant #53
ASTM etchant #54
ASTM etchant #55
ASTM etchant #56
ASTM etchant #57-Acetic acid/peroxide
ASTM etchant #58
ASTM etchant #59
ASTM etchant #60-CP4 etchant
ASTM etchant #61
ASTM etchant #62
ASTM etchant #63
ASTM etchant #64
ASTM etchant #65
ASTM etchant #66
ASTM etchant #67
ASTM etchant #68
ASTM etchant #69
ASTM etchant #69
ASTM etchant #70
ASTM etchant #71
ASTM etchant #72
ASTM etchant #73
ASTM etchant #74-Nital
ASTM etchant #75-Gorsuch's etchant
ASTM etchant #76-Picral
ASTM etchant #77-Super picral
ASTM etchant #78
ASTM etchant #79-Fry's reagent
ASTM etchant #80-Vilella
ASTM etchant #81
ASTM etchant #82-Acid ferric chloride
ASTM etchant #83
ASTM etchant #84-Howarth's reagent
ASTM etchant #85-Alkaline sodium picrate
ASTM etchant #86
ASTM etchant #87-Glyceregia
ASTM etchant #88
ASTM etchant #89
ASTM etchant #90-HNO3-HF in glycerol
ASTM etchant #91
ASTM etchant #92
ASTM etchant #93
ASTM etchant #94-Kalling's reagent No.2
ASTM etchant #95-Kalling's reagent No.1
ASTM etchant #96
ASTM etchant #97-Potassium hydroxide
ASTM etchant #98-Murakami's reagent
ASTM etchant #99-Beraha's reagent
ASTM etchant #1
ASTM etchant #10
ASTM etchant #11
ASTM etchant #12-Aqua regia
ASTM etchant #13-Oxalic acid
ASTM etchant #14
ASTM etchant #15
ASTM etchant #16-Hydrochloric acid
ASTM etchant #17
ASTM etchant #18-Chromic acid
ASTM etchant #19-Groesbeck's reagent
ASTM etchant #2-NaOH (Hatch's reagent)
ASTM etchant #3-Keller's reagent
ASTM etchant #4
ASTM etchant #5-Barker's reagent
ASTM etchant #6
ASTM etchant #7
ASTM etchant #8
ASTM etchant #9
AW-6061 aluminium matrix composite alloy
AZ21, AZ31 alloys
AZ31B, AZ61A, AZ80A alloys
AZ61A, AZ80A alloys
Abraham's 'AB' etchant
Acrylonitrile-butadiene-styrene-Chemical etching
Adler's etch
Adler's reagent
Adler's reagent
Adler's reagent
Adler's reagent
Ag (001) wafers-Chemical polishing
Ag (001) wafers-Dislocation etching
Ag (001) wafers-Electrolytic sawing
Ag (111) and (100) wafers-Chemical polishing
Ag (111) wafers, Ag natural crystals, Ag native single crystals
Ag 100 a thick thin film-Chemical etching
Ag alloys
Ag alloys
Ag alloys
Ag alloys
Ag alloys
Ag and Ag-Cu alloys - Silver chromate etch
Ag as high purity pre-forms and silver alloy pre-forms-Chemical cleaning
Ag high purity pre-forms and plated parts
Ag pellets in an expoxy matrix-Chemical etching
Ag pellets in an expoxy matrix-Chemical etching
Ag single crystal specimens-Electrolytic polishing
Ag single crystal sphere-Gas etching
Ag single crystal sphere-Thermal forming
Ag single crystals-Chemical etching
Ag solders
Ag specimen blanks-Chemical etching
Ag specimen blanks-Chemical etching
Ag specimens used in a thermal etching study-Electrolytic polishing
Ag specimens used in a thermal etching study-Gas etching
Ag specimens-Chemical polishing
Ag specimens-Electrolytic polishing
Ag specimens-Gas corrosion
Ag specimens-Gas oxidation
Ag thin film coatings on Si, Al2O3 and ZrO2 substrates-Chemical etching
Ag thin film deposits-Chemical cleaning/etching
Ag thin films electroplated on brass-Chemical etching
Ag thin films-Chemical etching
Ag thin films-Chemical etching
Ag thin films-Chemical etching
Ag, Ag solders and Pg-Pd alloys
Ag-30% Zn alloy - Chase etch
Ag-Al alloy-Alloy with 15% Ag
Ag-Al alloy-Alloy with 5% Ag. Electro thinning for electron microscopy
Ag-Al alloy-Chemical etching
Ag-Al alloys-Alloy with < 20 wt.% Ag
Ag-Al alloys-Alloy with 20 wt.% Ag
Ag-Al alloys-Alloys with < 27 at.% Al
Ag-Al alloys-Electro polishing
Ag-Al alloys-Electro thinning
Ag-Al alloys-Electro thinning
Ag-Al alloys-Electro thinning
Ag-Al-Cd alloy-4.8 at.% Ag, 0.15 at.% Cd
Ag-Al-Cu alloy-4.8 at.% Ag, 0.2 at.% Cu
Ag-Au evaporated thin films-Chemical etching
Ag-Au single crystal alloy ingots-Chemical etching
Ag-B system
Ag-Cd alloy-Alloy with 44% Cd
Ag-Cd alloy-Alloy with 45 at.% Cd
Ag-Cd alloy-Alloy with 45 at.% Cd
Ag-Cd alloy-Alloy with 45 at.% Cd
Ag-Cd alloy-Alloy with 70% Ag and 30% Cd
Ag-Cd alloy-Beta Ag Cd-50 at.% Cd
Ag-Cd alloys-Alloys with 1-7% Cd
Ag-Cd alloys-Electro thinning
Ag-Cd single crystal-0.8 at.% Cd
Ag-Cd-Zn alloys-Electro polishing
Ag-Cu alloys
Ag-Cu alloys-In heterogeneius alloys attacks Cu rich areas faster then Ag rich
Ag-Cu-Ge system-Chemical ecthing
Ag-Cu-Ge-Sb system-Chemical etching
Ag-Cu-Sb system-Chemical etching
Ag-Epoxy-Chemical etching
Ag-Epoxy-Gas cleaning
Ag-Ga-S allloy-Chemical etching
Ag-Ge alloy-Alloy with 21 at.% Ge
Ag-Ge eutectic-Chemical polishing
Ag-I alloys-Chemical etching
Ag-I alloys-Electro thinning
Ag-I system-Beta-AgI single crystal
Ag-In selenide-Chemical ecthing
Ag-In telluride-Chemical etching
Ag-Mg alloys-Ag-0.1% MgO
Ag-Mg alloys-Electro machinning
Ag-Mg single crystal-0.8 at.% Mg
Ag-Mo and Ag-W alloys, Ag-WC-Chemical etching
Ag-Nd system-Chemical etching
Ag-Ni and Ag-Mg-Ni alloys
Ag-Ni, Ag-Mg-Ni, Ag-Sn alloys-Chemical etching
Ag-Pb-Te system-No etching required
Ag-Pr system-Chemical etching
Ag-Sb alloys-Electro polishing
Ag-Sn (1%) single crystal alloys-Electrolytic polishing
Ag-Sn alloys
Ag-Sn alloys-Ag3Sn-Sn section
Ag-Sn alloys-Alloys with 1-8 at.% Sn
Ag-Sn alloys-Electro polishing
Ag-Sn and Ag-Pb-Sn alloys
Ag-Sn-Hg alloys
Ag-Sn-Hg alloys (hardened)-Chemical etching
Ag-Sn-Zn-Cu alloys-Chemical etching
Ag-Sn-Zn-Cu dental amalgam alloys - Crowell's etch
Ag-Th alloys
Ag-Th alloys-Chemical etching
Ag-Zn alloy specimens-Chemical etching
Ag-Zn alloy-Alloy with 38 at.% Zn
Ag-Zn alloy-Alloy with 38% Zn
Ag-Zn alloy-Alloy with 50 wt.% Ag and 50 wt.% Zn
Ag-Zn alloys-Chemical polishing
Ag-Zn alloys-Electro thinning
Ag-Zn alloys-Electro thinning
Ag2Al (0001) wafers-Dislocation etching
Ag2Al (0001) wafers-Dislocation etching
Ag2Al single crystal specimens-Electrolytic polishing
Ag2Al single crystal sphere-Chemical polishing
Ag2Hg (110) single crystal-Chemical polishing/etching
Ag2Se (100) wafers and other orientations-Chemical polishing
Ag2Se (100) wafers and other orientations-Chemical polishing
Ag2Se (100) wafers-Chemical polishing
Ag2Te (100) wafers-Chemical polishing
Ag3Ni specimens-Electrolytic polishing
Ag6Ge10P12 single crystal ingots-Chemical etching
AgB alloys-Chemical cleaning
AgBr (100) and (111) wafers-Dislocation etching
AgBr (110) wafers-Abrasive polishing
AgBr, AgCl
AgCd single crystal specimens-Chemical etching
AgCl (100) bars, AgCl single crystal specimens-Chemical etching
AgCl (100) oriented material-Chemical etching-Hypo etchant
AgCl (100) wafers-Chemical cleaning
AgCl (100) wafers-Chemical cleaning
AgCl (100) wafers-Chemical polishing
AgCl single crystal oriented bars-Chemical cleaning
AgCl specimens-Pressure, thinning
AgFeTe2 single crystal specimens-Chemical polishing
AgGaS2 thin films
AgGaSe3 single crystals-Chemical etching
AgGaTe2 single crystals-Chemical etching
AgI powder
AgI single crystals-Chemical cleaning
AgInSe2 single crystals-Chemical etching
AgInTe2 single crystals-Chemical etching
AgMg single crystal specimens-Chemical cleaning
AgS single crystal whiskers-Chemical etching
AgS single crystal whiskers-Electrolytic polishing
AgSbTe2 single crystal specimens-Chemical etching
AgSbTe2 single crystal specimens-Chemical polishing
AgSbTe2 single crystal specimens-Dislocation etching
AgTiSe single crystal material-Chemical polishing
AgZn specimens-Chemical cleaning
Age-hardenable stainless steels
Al (001) wafers-Al (001) wafers and other orientations
Al (001) wafers-Al, (001) wafers used in a study of lithium precipitation along dislocations
Al (001) wafers-Dislocation etching
Al (100) specimen-Al (100) and other orientations used in a study of thermal etching
Al (100) specimens-Electrolytic polishing
Al (100) wafer-Al, (100) wafer surfaces preferentially etched in this solution
Al (100) wafers used in an oxidation study-Electrolytic polishing
Al (100) wafers-Thermal etching
Al 5083 alloy-Al-4Mg-0.3Fe-0.75Mn-0.2Si
Al 5454 alloy-Al-2.6Mg-0.3Fe-0.8Mn-0.1Si
Al Foil with an Al2O3 Thin Film
Al alloy #6061-Tg sheet-Proton damage
Al alloy 1100-Al-0.5Fe-0.1Si
Al alloy 3003-Al-1Mn-0.6Fe-0.2Si
Al alloy 7004-Al-1.6Mg-4.5Zn-0.5Mn-0.2Fe-0.2Si
Al alloy forgings
Al alloys
Al alloys
Al alloys
Al alloys
Al alloys
Al alloys (except high Si-castings) - Dilute Tucker's etch
Al alloys - Anodizing solution of Cole and Brooks
Al alloys - Poulton's etch
Al alloys as sheet, plate and rod-Electrolytic etching
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys
Al and Al alloys - Barker's anodizing solution for grain structure
Al and Al alloys - Beraha's etch
Al and Al alloys - Beraha's tint etch
Al and Al alloys - Boss's etch
Al and Al alloys - Bossert's etch
Al and Al alloys - Caustic etch
Al and Al alloys - Concentrated Keller's etch
Al and Al alloys - Keller and Geisler's anodizing solution
Al and Al alloys - Keller's reagent
Al and Al alloys - Lacombe and Beaujard's anodizing solution
Al and Al alloys - Modified Keller's reagent
Al and Al alloys - Modified Keller's reagent
Al and Al alloys - Modified Keller's reagent
Al and Al alloys - Panseri's etch
Al and Al alloys - Tucker's etch
Al and Al alloys - Vilella's reagent
Al and Al alloys with less than 2% Si-Electrolytic polishing
Al and Al alloys, Al-Cu alloys, Al-Zn alloys
Al and Al alloys-Electrolytic polishing
Al and Al alloys-Electrolytic polishing
Al and Al-Si and Al-Cu alloys
Al and Ti nitride
Al and alloys-Al, specimens and alloys with low aluminum content
Al and alloys-Chemical polishing
Al and alloys-Polishing
Al and aluminum alloys-Used as a general cleaning and polishing etch
Al bronze
Al bronze
Al bronze
Al bronzes, Cu-Be alloys-Electrolytic etching
Al bronzes-Chemical etching
Al cast alloys
Al cold-rolled specimens-Electrolytic polishing
Al evaporated on KCl-Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al foil-Al, foil used in a study of change with AC etching
Al high purity slugs-Chemical cleaning
Al material in growing AlGaAsP single crystals-Chemical cleaning
Al polycrystalline sheet-Chemical cleaning
Al single crystal specimens-Electrolytic polihsing
Al single crystal specimens-Electrolytic polishing
Al single crystal specimens-Electrolytic polishing
Al single crystal specimens-Physical etching
Al single crystal sphere-Gas oxidation
Al single crystal wafers-Electrolytic thinning
Al specimens and alloys-Abrasive polishing
Al specimens as Al-Si (20%)-Electrolytic etching
Al specimens cutting-Acid, cutting
Al specimens-Chem/mech machinning
Al specimens-Chemical etching
Al specimens-Chemical etching
Al specimens-Mechanical, deformation
Al specimens-Oxidation
Al specimens-Solution used as a preferential etch on aluminum
Al specimens-Solution will develop etch figures
Al thin film on (100) silicon wafers-Chemical etching
Al thin film on quartz substrate-Gas, removal
Al thin film-Ketone, lift-off
Al thin films and crystalline aluminum sheet-Solution shown was used to etch channels in the aluminum
Al thin films deposited on GaAs-Physical etching
Al thin films deposited on silicon substrates-Physical etching
Al thin films evaporated on SiO2, Al2O3, and ZrO2 substrates-Alkali, removal
Al, Al-Cu alloys, Al-Si alloys
Al, Al-Si alloys-Electrolytic polishing
Al, and A12O3/A1N thin films-Gas etching
Al-3% Ag alloy, Al alloys - Modified Tucker's etch
Al-Ag alloys-Chemical polishing
Al-Ag alloys-Electro thining
Al-Ag alloys-Electropolishing
Al-Ag polycrystalline and single crystal ingots-Chemical etching
Al-Ag polycrystalline and single crystal ingots-Chemical etching
Al-Au (2%) specimens-Electrolytic etching
Al-Au alloy-Chemical etching
Al-Au alloys-Al-Al2Au eutectic
Al-Au alloys-Electro polishing
Al-Be (38%) alloy-Chemical cleaning
Al-Be (38%) polycrystaline wire-Chemical cleaning
Al-Be alloys-Alloys with < 0.1% Be
Al-Be alloys-Electro thinning by Mirand-Saulnier technique
Al-Ca alloy-Al-7.6Ca eutectic alloy
Al-Ca alloy-Al4Ca
Al-Cd alloys-Alloys with 0.5-1.0% Al
Al-Co alloys-Electrolytic polishing and etching
Al-Cr alloys-Electro thinning by Mirand-Saulnier technique
Al-Cr-Mo-Ni-Ti alloys-Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti-<6Mo (in at.%)
Al-Cr-Nb-Ni alloy-Ni-20Nb-6Cr-2.5Al
Al-Cu alloy (2% Cu)-Chemical etching
Al-Cu alloy (4% Cu)-Electro polishing and thinning
Al-Cu alloy-Al-Al2Cu eutectic
Al-Cu alloy-Al-Cu alloy specimens. Used as a polish etch on Al-Cu, Al-Si, and Al
Al-Cu alloy-Al-Cu eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Alloy with 0.34 wt.% Cu
Al-Cu alloy-Alloy with 11.8 wt.% Al
Al-Cu alloy-Alloy with 12% Al
Al-Cu alloy-Alloy with 2-5% Cu
Al-Cu alloy-Alloy with 3-5% Cu
Al-Cu alloy-Alloy with 36 wt.% Cu
Al-Cu alloy-Alloy with 4 wt.% Cu
Al-Cu alloy-Alloy with 4.5 wt.% Cu
Al-Cu alloy-Alloy with 7.5 at.% Al
Al-Cu alloy-Alloy with 9.5% Al
Al-Cu alloy-Electro thinning
Al-Cu alloys
Al-Cu alloys
Al-Cu alloys-Alloys with 1-5% Cu
Al-Cu alloys-Alloys with 10-45% Cu
Al-Cu alloys-Chemical etching
Al-Cu alloys-Chemical polishing
Al-Cu alloys-Chemical polishing
Al-Cu alloys-Electro polishing
Al-Cu alloys-Electro polishing and chemical etching
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning by PFTE holder technique
Al-Cu alloys-Eletro thinning
Al-Cu single crystal-Chemical etching
Al-Cu single crystal-Chemical etching
Al-Cu single crystal-Chemical etching
Al-Cu-Ag-Mg-Ti alloy-4.7% Cu, 0.6% Ag, 0.3% Mg, 0.3% Al, 0.2% Ti
Al-Cu-Mg alloys-Alloys with 1-5% Cu, 0.5-1.5% Mg
Al-Cu-Mg alloys-Electro polishing
Al-Cu-Mg alloys-Electro thinning
Al-Cu-Mg castings
Al-Cu-Mg eutectic alloy-Electro thinning and chemical etching
Al-Cu-Mg-Ag alloys-Foil preparation for TEM
Al-Cu-Mg-Mn alloys-3-4% Cu, 0.5-1% Mg, 0.5% Mn
Al-Cu-Mg-Mn-Fe-Si alloy-2124 T4, Al-3.8Cr-1.3Mg-0.5Mn-0.1Fe-0.05Si
Al-Cu-Mg-Ni alloys - Zeerleder's etch
Al-Cu-Mn alloys-Cu(2+x) Mn(1-x) Al, x=0.6-0.8
Al-Cu-Mn alloys-Cu2MnAl
Al-Cu-Mn system-Approx. Cu2MnAl
Al-Cu-Mn-Zn-Fe-Mg-Si alloy-2024-T4 Al-4.5Cu-1.4Mg-0.6Mn-0.3Fe-0.2Zn-0.15Si
Al-Cu-Si alloys - Conc. Keller's etch
Al-Cu-Ti alloy-Alloy with 4% Cu, and 0.1% Ti
Al-Dy alloys-Al rich alloys
Al-Fe alloys
Al-Fe alloys-Alloys with 65-90% Fe
Al-Fe-Cr alloys-Al-7Fe-0.5/1.5 Cr
Al-Fe-Cr-Ti-V-Zr alloy-Al-7Fe-1Cr-0.2Ti-0.2V-0.2Zr
Al-Fe-Ni system-Alloys with 32-53% Al, 8-14% Ni, 19-60% Fe
Al-Ge alloy-Alloy with 50 wt.% Ge
Al-Ge alloys-Chemical polishing
Al-Ge alloys-Eutectic composition
Al-Hf alloy-Alloy with 1.8 wt.% Hf
Al-Ho alloys-Anodising
Al-Ho alloys-For Al rich alloys
Al-In alloys-Chemical polishing
Al-In alloys-Selective etch for SEM
Al-Li alloy (0.4% Li)-Chemical etching
Al-Li alloy-Chemical polishing
Al-Li-Cu-Zr alloy-Al-3Li-2Cu-0.2Zr
Al-Li-Cu-Zr-Cd alloy-Al-3Li-2Cu-0.2Zr-0.2Cd
Al-Mg alloy-Alloy with 1-8 at.% Mg
Al-Mg alloy-Alloy with 7% Mg
Al-Mg alloy-Alloy with 86% Mg
Al-Mg alloy-Chemical polishing
Al-Mg alloys
Al-Mg alloys
Al-Mg alloys
Al-Mg alloys
Al-Mg alloys-Al-5/10Mg
Al-Mg alloys-Al-8Mg
Al-Mg alloys-Alloys with 1-4.5% Mg
Al-Mg alloys-Electro thinning
Al-Mg alloys-Electro thinning
Al-Mg alloys-Electro thinning by Mirand-Saulnier technique
Al-Mg alloys-Electrolytic polishing
Al-Mg, Al-Cu-Mg alloys
Al-Mg, Al-Mg-Si, Al-Zn-Mg, Al-Cu-Mg alloys
Al-Mg-Mo-O system-Chemical etching
Al-Mg-Si alloy-Al-1-2% Mg2Si
Al-Mg-Si alloy-Alloy 6063 Al-0.7Mg-0.4Si
Al-Mg-Si alloys-Electro thinning
Al-Mg-Zn alloy-Al-2.6Mg-6.3Zn
Al-Mg-Zn alloys-Electro thinning by PTFE holder technique
Al-Mn alloy-Al-1 wt.% Mn
Al-Mn alloy-Al45Mn55
Al-Mn alloy-Alloy with 1-4% Mn
Al-Mn alloys
Al-Mn alloys-Electro thinning by Mirand-Saulnier technique
Al-Mn-C alloy-Al43 x Mn55 x C2
Al-Mo-O system-Al2O3-< 5% Mo
Al-Ni alloy thin film-Chemical etching
Al-Ni alloy thin films-Flux etching and cleaning
Al-Ni alloy-Al-Al3Ni eutectic
Al-Ni alloy-Ni3Al
Al-Ni system-Al-Al3Ni eutectic
Al-Ni system-Beta 2 alloys 45-55% Ni
Al-Ni, alloy thin film coatings-Etching
Al-Pt alloy-Al-Al2Pt5 eutectic
Al-Pt alloys-Grain size can be determined by polarised light
Al-Sb alloys-Al-AlSb eutectic
Al-Sb alloys-Chemical etching
Al-Si (12%) alloy-Chemical etching
Al-Si (5%) foil-Chemical cleaning
Al-Si alloy-Chemical etching
Al-Si alloy-Chemical etching
Al-Si alloys
Al-Si alloys - Hume-Rothery etch
Al-Si alloys-Al, Al-Si alloys, Fe-Si alloys
Al-Si alloys-Electrolytic polishing
Al-Si alloys-For Al-Si alloys with Si bellow of 34 weight %
Al-Si alloys-Particullary good for Al-Si alloys
Al-Si aloys - Modified Murakami's etch (Klemm)
Al-Si and Al-Cu alloys, segregations, grain boundaries-Chemical etching
Al-Si specimens-Chemical polishing and etching
Al-Si-Cu foundary alloys, colour etchants-Chemical etching
Al-Si-Cu-Ni cast alloys - Franchini color etch
Al-Si-Ni eutectic-Al-11Si-4.9Ni
Al-Sm alloys-Al rich alloys
Al-Ti alloy specimen-Al-Al3Ti section
Al-Ti-N system-(Al, Ti)N
Al-Ti-Zr-Sn-Mo alloy-Ti-6Al-2Sn-4Zr-2Mo
Al-Ti-Zr-Sn-Mo alloy-Ti-6Al-2Sn-4Zr-2Mo
Al-Tm alloys-Electro polishing
Al-Tm alloys-Etchant for alloy with 0-40% Tm
Al-U alloys-Chemical etching
Al-U alloys-Electro thinning
Al-Zn (10%) alloy sheet-Electrolytic polishing
Al-Zn alloy-Alloy with 22% Al
Al-Zn alloy-Electro polishing
Al-Zn alloy-Electro polishing
Al-Zn alloy-Electro thinning
Al-Zn alloy-For alloy with 38 at.% Zn
Al-Zn alloy-For alloys with 20% Al
Al-Zn alloy-For alloys with 21.5% Zn
Al-Zn alloy-For alloys with 25 at.% Zn
Al-Zn alloy-For alloys with 29 at.% Zn
Al-Zn alloys-Alloys with more then 8% Zn
Al-Zn alloys-Chemical etching
Al-Zn alloys-Electro thinning
Al-Zn alloys-Electro thinning
Al-Zn alloys-For alloys with < 20% Zn
Al-Zn alloys-For alloys with 6.5 at.% Zn
Al-Zn, Cu alloy specimens-Physical etching
Al-Zn-Mg alloy-7039 alloy 4% Zn, 2.8-3% Mg
Al-Zn-Mg alloy-Al, 53% Zn, 1.7% Mg (+0.04% Ti)
Al-Zn-Mg alloy-Alloy with 5.3% Zn, 2.5% Mg
Al-Zn-Mg alloy-Alloy with 6% Zn and 2% Mg
Al-Zn-Mg alloy-Alloy with 6.86 wt.% Zn, 2.5 wt.% Mg
Al-Zn-Mg alloy-Alloy with 6.86% Zn, 2.30% Mg
Al-Zn-Mg alloy-Chemical etching
Al-Zn-Mg alloys-Alloys with 4-6% Zn, 1-4% Mg
Al-Zn-Mg alloys-Electro thinning
Al-Zn-Mg-Cu alloy-7075 alloy
Al-Zn-Mg-Cu alloy-7075 alloy 5.5-5.8% Zn, 2.1-2.6% Mg, 1.6-1.7% Cu
Al-Zn-Mg-Cu alloy-Al-5.5Zn-2.5Mg-1.5Cu
Al-Zn-Mg-Cu alloy-Al-5/7Zn-2/3Mg-1/3Cu
Al-Zn-Mg-Cu alloys
Al-Zn-Mg-Cu alloys (+Cr, Ti)-Chemical etching
Al-Zn-Mg-Cu alloys-7075 alloy 5-3% Zn, 2-7% Mg, 1.6 Cu + Fe, S, Cr, Ti, Mn
Al-Zn-Mn alloy-Alloy with 5% Zn, 2% Mg
Al-Zr alloy-For alloy with 0.8% Zr
Al-killed drawing steel-Fe-0.07C-0.3Mn-0.03/0.05Al
Al/Ni specimen surface coatings-Electrolytic removal
Al203 as (0001) or (01T2) sapphire blanks-Thermal cleaning
Al2NiO4 specimens-Chemical etching
Al2O3
Al2O3
Al2O3
Al2O3
Al2O3
Al2O3 (0001) wafers-Chemical cleaning
Al2O3 (0001) wafers-Chemical etching
Al2O3 (0001) wafers-Metal etching
Al2O3 (0O01) natural corundum-Etching
Al2O3 (ruby and sapphire)
Al2O3 and Al2PxOy thin films-Solvent, cleaning
Al2O3 anodized coating-Chemical cleaning
Al2O3 as fused sapphire parts in amorphous form-Chemical cleaning
Al2O3 as natural corundum-Molten flux removal
Al2O3 as natural single crystals-Chemical cleaning
Al2O3 as natural single crystals-Cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Chemical cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Chemical cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Solvent degreasing
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Surface treatment
Al2O3 pressed powder substrates-Chemical etching
Al2O3 pressed powder-Chemical cleaning
Al2O3 pressed powder-Gas cleaning
Al2O3 single crystal sapphire-Dislocation etching
Al2O3 single crystal spheres-Thin film coating
Al2O3 single crystal-Vacuum, cleaning
Al2O3 specimens-Chemical cleaning
Al2O3 substrate blanks-Cleaning
Al2O3 substrate blanks-Gas cleaning
Al2O3 substrate-Cleaning
Al2O3 thin film deposition on InGaAsP/InP-Oxide, passivation
Al2O3 thin film-Chemical etching
Al2O3 thin film-Electrolytic etching
Al2O3 thin films DC reactively sputtered on (111) silicon wafers-Chemical etching
Al2O3, CeO2 and Cr2O3-Physical etching
Al2O3, mixture of Al2O3 and MgO, or SnO2
Al2O3, native oxide films on AlAu alloys-Chemical etching (cleaning)
Al2O3, thin film deposited on silicon-Photochemical, forming
Al2O3-Chemical etching
Al2O3-Chemical etching
Al2O3-TiC sintered cermets
Al2O3-Zr (1%) doped single crystal-Physical etching
Al2SiO5 specimens-Chemical etching
Al2TiO5, grain boundary etchant-Chemical etching
AlAs (110) wafers-Gas, oxidation
AlAs thin films-Chemical polishing
AlFe alloy-Thermal etching
AlGaAs (100) wafer-Chemical cleaning
AlN on Si and GaAs substrates-Chemical etching
AlN specimens-Chemical etching
AlN thin film on (100) gallium arsenide-Chemical etching
AlN thin film on (111) silicon wafer-Chemical etching
AlN thin films (100) and (111)-Acid, float-off
AlN thin films deposited on GaAs-Zn doped-Chemical etching
AlN thin films-Thermal etching
AlN-Al2O3-Chemical etching
AlN-La2O3-Chemical ecthing
AlNi2 single crystal-Chemical etching
AlP single crystal wafer-Chemical polishing
AlPO4 single crystal-Chemical etching
AlSb
AlSb (111) wafers-Chemical etching
AlSb ingot material preparation-Chemical cleaning
AlSb wafers-Chemical etching
AlSb wafers-Chemical etching
AlSb wafers-Chemical polishing
AlSb wafers-Chemical polishing
AlSb wafers-Chemical polishing
AlSb/GaSb wafers-Chemical etching
AlSi (5%) spheres-Gas, cleaning
AlSi thin film layers-Physical etching
AlSi-671, S-816 alloys-Chemical etching
AlSi0671, S-816 alloys-Chemical etching
AlSiCuSn cast alloys-Color etchant
All Mg alloys
All Mg alloys in the as cast or heat treated condition, grain-boundary etchant-Chemical etching
All Zn alloys, for pressure die-casting, Zn coatings-Chemical etching
All unalloyed amd low alloy steels, microalloy steels, manganese steels, welds-Chemical etching
Alloy 800-0.04/0.05C-0.2/0.5Si-0.5/0.6Mn-33/34.5Ni-21.5/22.5Cr-0.2/0.55Ti-0.1/0.2Al-0/0.1Cu
Alloy Al69Nb20Ni11-Twin jet polishing mehod
Alloy C73
Alloy Co67Ta33-Twin jet micro mehod
Alloy Fe47Ni44Al9-Twin jet polishing mehod
Alloy Fe67Al24C6-Twin jet polishing mehod
Alloy K42B-Chemical etching
Alloy MA 6000-Twin jet polishing mehod
Alloy Ni33Al33Cr34-Twin jet polishing mehod
Alloy Ni50Al50-Twin jet polishing mehod
Alloy Ni50Co18Al32-Twin jet polishing mehod
Alloy Ni74Al25C1-Twin jet polishing mehod
Alloy Ni76Al17Ti6-Twin jet polishing mehod
Alloy Ni89Al11-Twin jet polishing mehod
Alloy NiAl-Electropolishing
Alloy No. 152-Chemical etching
Alloy No. 25-Chemical etching
Alloy Ravloy
Alloy Ravloy
Alloy Ravloy
Alloy Ravloy
Alloy Ravocast
Alloy SRR99-Twin jet polishing mehod
Alloy Ti42Si38-Twin jet polishing mehod
Alloy Ti52Al48-Twin jet polishing mehod
Alloy Ti52Al48-Twin jet polishing mehod
Alloy Ti52Al48V1-Twin jet polishing mehod
Alloy Ti83Co12Al5-Twin jet polishing mehod
Alloy and high speed steels-Universal electrolyte
Alloy steel specimens-Color etching. Colors pearlite and hardened structures of unlloyed steel specimens
Alloy steels - Dilute aqua regia
Alloy steels with Ni, Co-Chemical etching
Alloy steels with Ni, Co-Chemical etching
Alloy steels-Color etching. Colors ferrite grains. Reveals banded structures. Used in carbon and alloy steels
Alloy steels-Color etching. Colors the martensite in Fe-C alloys
Alloy steels-Color etching. For Mn, Mn-C, Mn-Cr steels
Alloy steels-Color etching. For carbon, alloy and Fe-Mn (5-18% Mn) steels
Alloy steels-Color etching. For carbon, alloy and manganese steels. Colors ferrite grains. carbides and phosphides remain white
Alloy steels-Color etching. For carbon, alloy and tool steels
Alloy steels-Colour etchant
Alloy steels-Electrolytic polishing
Alloy steels-Electrolytic polishing
Alloy steels-Electrolytic polishing
Alloy steels-Revealing prior austenite grain in alloy steels
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloys of WC and Co
Alloys with < 40 at.% Ni
Alloys with low Sn content. High Cu containing alloys-Chemical etching
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Chemical etching
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Chemical etching
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Chemical polishing
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Dislocation etching
Alnico V, iron alloy-Chemical etching
Alpha Ti-Chemical etching
Alpha and beta brass - Klemm's I reagent
Alpha brass
Alpha brass
Alpha brass (Cu-Zn) single crystal-Chemical etching, electro polishing, electro etching
Alpha brass (Cu-Zn)-Electro etching
Alpha brass (Cu-Zn)-Electro polishing
Alpha brass (Cu-Zn)-Physical etching
Alpha brass (Cu-Zn)-Physical etching
Alpha brass - Klemm's II reagent
Alpha or alpha plus beta brass-Electrolytic polishing
Alpha or beta brass-Electropolishing
Alpha phase in Pb-Bi and Pb-Sb alloys-Chemical etching
Alpha sulphur-Chemical etching
Alpha-Al2O3 (0001) wafers-Chemical etching
Alpha-Al2O3 powder material-Molten, flux, removal
Alpha-Beta brass
Alpha-Beta brass
Alpha-HgI2 single crystal specimens-Chemical polishing
Alpha-HgI2 single crystal specimens-Chemical polishing
Alpha-Np
Alpha-Pu
Alpha-Pu and alloys
Alpha-SiC (0001) wafers-Dislocation etching
Alpha-SiC (0001) wafers-Gas polishing
Alpha-U specimens-Electrolytic cleaning
Alpha-U specimens-Electrolytic polishing
Alpha-beta alloys
Alpha-brass [(Cu-Zn) with 29.38% Cu)]-Chemical cleaning
Alpha-brass single crystals-Cutting
Alum, KAl(SO4)2 x 12H2O (111) wafers-Chemical etching
Alum, KAl(SO4)2 x 12H2O single crystals-Dislocation etching
Alumel alloy-95Ni-1.6Al-1.5Si-1.3Mn-0.3Co
Alumina (Al2O3) single crystal-Chemical etching
Alumina (Al2O3) single crystal-Chemical etching
Alumina (Al2O3)-Aluminia with additives
Alumina (Al2O3)-Chemical etching
Alumina (Al2O3)-Chemical etching
Alumina (Al2O3)-Chemical etching
Alumina (Al2O3)-Chemical thinning
Alumina (Al2O3)-Dislocation etch pits
Alumina (Al2O3)-Irregular grain boundary attack
Alumina (Al2O3)-Physical etching
Alumina (Al2O3)-Physical etching
Alumina (Al2O3)-Physical etching
Alumina (Al2O3)-Physical etching and chemical etching
Alumina (Al2O3)-Pure aluminia
Alumina (Al2O3)-titania (TiO) system-89% Al2O3, 11% TiO
Alumina (Beta-Al2O3)-Chemical etching
Alumina (Beta-Al2O3)-Physical etching
Alumina Al2O3-Etching
Alumina dispersed Nichrome-Ni-20% Cr-0.6/1.5% Al2O3
Alumina rich spinel single crystal (MgAl2O4)-Chemical etching
Alumina-Al2O3
Alumina-Al2O3
Alumina-Al2O3 with 0.04% Cr
Alumina-silica system-60% Al2O3, 40% SiO2
Alumina-silicalLime-nitride glasses-20.2-25.3% Si, 8.3-14.3% Al, 3.4-4.3% Cu, 43.5-60.6% O, 2.2-16.8% N
Alumina-silicon-phosphorous trioxide-Yttria glass-49.2 mol.% Al2O3-38.8% SiO2-9.0% P2O3-9.0% Y2O3
Aluminia-lanthanum oxide dispersed Nichrome-Ni-20Cr-0.04Al2O3-0.04La2O3
Aluminium 5052 alloy-Al-2.3Mg-0.2Fe-0.2Cr-0.1Si
Aluminium 7075 alloy-Al-5.5Zn-2.5Mg-1.5Cu-0.3Cr
Aluminium 7075, 7475 alloys-Al - 5.1/5.7 Zn - 2.1/2.3 Mg - 1.5 Cu - 0.2 Cr
Aluminium alloy 6061-Al-1Mg-0.6Si-03Cu-03.Fe
Aluminium alloy and cast aluminum-Solution used as a general micro-etch in the study of surface structure
Aluminium alloys
Aluminium alloys-1xxx series alloys
Aluminium alloys-1xxx series alloys, all wrought alloys and casting alloys
Aluminium alloys-1xxx, 3xxx, 5xxx, 6xxx series alloys, most casting alloys
Aluminium alloys-2xxx series alloys, Al-Cu or Al-Zn casting alloys
Aluminium alloys-2xxx, 3xxx series; Al-Cu and Al-Mn casting alloys
Aluminium alloys-2xxx, 7xxx series; Al-Cu or Al-Zn alloys, hot worked and heat treated alloys
Aluminium alloys-3xxx, 5xxx series; Al-Mg casting alloys
Aluminium alloys-7xxx series alloys, Al-Zn casting alloys
Aluminium alloys-Al alloys as sheet material and as an evaporated thin film on other materials
Aluminium alloys-Al-Cu-Mg-Zn Alloys, 7xxx series and casting alloys
Aluminium alloys-Al-Si alloys
Aluminium alloys-Alloy 6061, 6xxx series alloys, hot worked and heat treated alloys
Aluminium alloys-Alloy 7075, recrystalliyed
Aluminium alloys-Alloys 2017, 2024 and artificially aged tempers
Aluminium alloys-Brazing sheet. Examination for cladding thickness
Aluminium alloys-Colours etching
Aluminium alloys-Commercial-purity alloys 1xxx series, Al-Mn alloys, Al-Si alloys, Al-Mg-Si alloys
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-For examination of grain size and shape, cold working incomplete recrystallization
Aluminium alloys-Grain boundary eutectic formations
Aluminium alloys-High purity Al, commercial purity Al, Al-Mn alloys, Al-Si alloys, Al-Mg alloys, Al-Mg-Si alloys
Aluminium alloys-High purity aluminium
Aluminium alloys-Hot worked and heat treated alloys
Aluminium alloys-One of the best electrolyte for universal use
Aluminium and Aluminium alloys-Grain size determination and determination orientation
Aluminium and alloys-Chemical etching
Aluminium and alloys-Chemical polishing
Aluminium and alloys-Cleaning etch
Aluminium and alloys-Electro polishing
Aluminium and alloys-Electro polishing
Aluminium and alloys-Electro thinning
Aluminium and alloys-Electro thinning
Aluminium and aluminium alloys-Al alloys of all types. Forgings and castings
Aluminium and aluminium alloys-Al alloys. Forgings and castings
Aluminium and aluminium alloys-Al-Cu-Mg alloys. Al Alloys of all types
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-General macro and for revealing shrinkage, cracks, oxides
Aluminium and aluminium alloys-Macro of pure aluminium
Aluminium and aluminium alloys-Pure aluminium and Al alloys. To reveal grain structure and slip lines
Aluminium and aluminium alloys-To reveal grain structure and flow lines in forgings
Aluminium and aluminium alloys-To reveal grain structure. For Al-Si Alloys, castings
Aluminium and its alloys-For 2xxx Al alloys, high Cu aloys
Aluminium and its alloys-For 3xxx, 4xxx, 5xxx, 6xxx Al alloys and high Si castings
Aluminium and its alloys-For Al alloys except high Si castings
Aluminium and its alloys-For high purity Al, 1xxx, 3xxx, 4xxx, 5xxx, 6 xxx Al alloys
Aluminium and its alloys-Good general purpose etchant
Aluminium bronze-Chemical etching
Aluminium nitride (AlN)-AlN with Al2O3
Aluminium nitride (AlN)-AlN with La2O3
Aluminium nitride (AlN)-AlN with Y2O3
Aluminium nitride (AlN)-Aluminium nitride (AlN)
Aluminium nitride (AlN)-Chemical etching
Aluminium nitride (AlN)-Chemical etching
Aluminium nitride (AlN)-Chemical etching
Aluminium nitride AlN-Etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Physical etching
Aluminium oxide (Al2O3)-Physical etching
Aluminium polycrystalline sheet-Chemical cleaning
Aluminium silicate (Al2SiO5)-Physical etching
Aluminium single crystal
Aluminium single crystal specimens-Chemical polishing
Aluminium single crystal specimens-Chemical polishing
Aluminium single crystal-Electrolytic polishing
Aluminium single crystal-Electrolytic polishing
Aluminium specimens and alloys-Brite dip etchant
Aluminium specimens-Al alloys containing Cu, Mn, Si and Ti. Al cast alloys with high Si content
Aluminium specimens-Al base matrials in general
Aluminium specimens-Chemical cleaning
Aluminium specimens-Chemical etching
Aluminium specimens-Chemical etching
Aluminium specimens-Electrolytic polishing
Aluminium specimens-Electrolytic polishing
Aluminium specimens-High purity Al, Mn-Al, Si-Al, Mg-Al and Mg-Si-Al alloys
Aluminium specimens-Pure Al, Cu-Al alloys
Aluminium specimens-Surface imperfections of pure Al
Aluminium thin film-Chemical etching
Aluminium thin film-Cleaning etch
Aluminium thin film-Cleaning etch
Aluminium thin film-Cleaning etch
Aluminium thin film-Reactive ion etching
Aluminium thin films deposited on GaAs and Si (100) wafers-Cleaning etch
Aluminium thin films evaporated on GaAs-Al thin films evaporated on GaAs, (100) substrates used in fabricating GaAs FETs
Aluminium thin films evaporated on silicon and Gallium arsenide-Chemical etching
Aluminium thin films on semiconductor wafers-Cleaning etch
Aluminium thin films-Chemical cleaning
Aluminium, low alloy content specimens-Chemical etching
Aluminium-A general electropolish for aluminum
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al
Aluminium-Al (99.945%)
Aluminium-Al (99.99%)
Aluminium-Al (CP or dilute alloy)
Aluminium-Al (CP, SP)
Aluminium-Al (CP, SP)
Aluminium-Al (CP, UP)
Aluminium-Al (HP)
Aluminium-Al (UP)
Aluminium-Al - Beck's solution
Aluminium-Alumina (Al2O3) alloys-Chemical etching
Aluminium-Alumina (Al2O3) alloys-Low oxide alloys. Jet electro polishing
Aluminium-Alumina (Al2O3) alloys-Electro thinning
Aluminium-Alumina (Al2O3) alloys-Electro thinning
Aluminium-Anodising
Aluminium-Cathodic etching
Aluminium-Chemical etching
Aluminium-Chemical etching
Aluminium-Chemical etching, electrolytic polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing-Only suitable for very thin specimen
Aluminium-Differentiantion of intermediate phases in Al with high contents of Cu, Mn, Mg, Fe, Be, Ti, Fe3Al
Aluminium-Distinct grain boundaries in corrosion sensitive alloys
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing, chemical polishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Especially for Cu-Al alloys (also useful in macroetching)
Aluminium-Etching for dislocations
Aluminium-Etching for etch pits
Aluminium-Etching for etch pits
Aluminium-Etching for etch pits
Aluminium-Etching for etch pits on glide dislocation
Aluminium-Etching for grain size
Aluminium-Etching for grain size
Aluminium-For most of AL and Al alloys, especially those containing Cu
Aluminium-For most types of Al and Al alloys
Aluminium-For most types of Al and Al alloys
Aluminium-Grain boundaries, slip lines in high purity Al
Aluminium-Ion etching
Aluminium-Physical etching
Aluminium-Precipitates of beta Al8Mg5 or Mg2
Aluminium-Precipitates, grain boundaries, Al-Si and Al-Cu alloys
Aluminium-Pure Al, Al-Cu, Al-Mn, Al-Mg, Al-Mg-Si alloys
Aluminium-Pure Al, Al-Mg and Al-Mg-Si alloys. Etch figures
Aluminium-Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg, Al-Mn-Mg alloys
Aluminium-Pure Al, Allloys of Cy-Al, Mg-Si-Al, Mg-Al, and Zn-Al
Aluminium-Universal electrolyte
Aluminium-magnesium oxide (Al2O3 + MgO)-Chemical etching
Aluminium-magnesium oxide (Al2O3 + MgO)-Chemical etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum antimonide (AlSb)-Chemical polishing
Aluminum antimonide (AlSb)-Chemical polishing
Aluminum bronze-Electrolytic etching
Aluminum sputtering target
Aluminum weldments-For macroetching
Am2O3-Chemical etching
AmO(2-x), AmO(2-x) with Am2O3-Chemical etching
Antimonium-Sb
Antimonium-Sb
Antimonium-Sb - CP-4 reagent
Antimonium-Sb - Superoxol etch
Antimony selenide-Arsenic selenide system
Antimony specimens-Crystal arrangement. Casting imperfection in Sb and Bi
Antimony specimens-Electro mechanical polishing
Antimony specimens-Electrolytic polishing
Antimony specimens-Electrolytic polishing
Antimony specimens-Etch pits etching
Antimony specimens-Etch pits etching
Antimony specimens-For pure and technically pure types of Sb. Low alloy Sb
Antimony specimens-Grain contrast etch
Antimony specimens-Sb and Sb alloys
Antimony specimens-Sb and Sb alloys. Pb-Sb, Bi-Sn and Bi-Cd alloys
Antimony specimens-Sb, Bi and their alloys
Antimony specimens-Sb-Pb alloys
Antimony specimens-Sb-Pb, Bi-Sn alloys
Antimony specimens-Technically pure Sb. Crystal arrangement. Sb-Bi alloys
Antimony-Sb
Antimony-Sb - Czochralski's etch
Aqua regia
Aqua regia
Armco Fe
Arsenic single crystal-Polishing and etching
As (0001) cleaved specimens-Chemical polishing
As (0001) wafers-Solution used as a general removal etch
As (111) specimens-Chemical polishing
As (111) specimens-Dislocation etching
As (111) specimens-Dislocation etching-Bromine etchant
As-Cd-Ge-Se system-For CdSe-Ge1.5-As0.5-Se3 section
As-Pb-Ge-Se system-PbSe-Ge1.5As0.5Se3 section
As-Sb system (single crystal)-Etching for pit etch
Astraloy-Ni-16/18Co-15/16Cr-4.5/5.5Mo-3.85/4.15Al-3.35/3.65Ti-0.03/0.09C (+B)
Au (100) single crystal thin films-Specimen preparation
Au (111) and (100) single crystal blanks-Chemical etching
Au (111) wafers and other orientations-Chemical etching
Au alloys
Au alloys
Au alloys
Au alloys
Au and Au alloys
Au and Au alloys-Electrolytic etching
Au and alloys
Au and alloys
Au and alloys
Au as hard gold coatings on copper substrates-Metal plating
Au as single crystal blanks-Abrasive polishing
Au diffused into silicon wafers-Chemical etching
Au diffused into silicon-Chemical etching
Au foil-Eletrolytic polishing
Au polycrystalline specimens-Acid, float-off
Au single crystal spheres-Thermal forming
Au slugs or wire-Chemical cleaning
Au specimens and thin films-Chemical etching
Au specimens and thin films-Chemical etching-Tri-iodide etchant
Au specimens-Chemical etching
Au specimens-Electrolytic polishing
Au specimens-Electrolytic polishing
Au specimens-Oxide removal
Au spherulitic particles-Chemical etching
Au thin film deposited by CVD-Metal diffusion
Au thin film deposited on glass-Chemical etching
Au thin film deposits as a multilayer Au/Ni/Au/TiW/Si(100) substrate-Chemical etching
Au thin film deposits on silicon wafers-Chemical etching
Au thin films and specimens-Chemical etching
Au thin films and specimens-Chemical etching
Au thin films deposited on (0001) muscovite mica substrates-Acid, float-off
Au thin films deposited on (100) NaCl substrates-Acid, float-off
Au thin films deposited on glass-Chemical etching
Au thin films deposited on soda-lime glass-Thermal, structure
Au thin films evaporated on alumina substrates-Gas, drying
Au thin films pulse plated on alumina blanks-Gold plating
Au thin films-Chemical ecthing
Au thin films-Electrolytic polishing
Au thin films-Gas, diffusion
Au thin films-Thermal etching
Au, Pt alloys, Pd alloys
Au-20Sn & Sn-36Pb-2Ag alloys-Chemical etching
Au-Ag-Cu alloys-Chemical etching
Au-Ag-Cu alloys-Chemical etching
Au-Al alloys-Chemical etching
Au-B alloys-Chemical etching
Au-Cd alloy specimens-Chemical polishing
Au-Cd alloy-Electro polishing
Au-Cd alloys-Also etches dislocation, grain boundaries
Au-Cd alloys-Chemical etching
Au-Co alloys-Electro thinning
Au-Co alloys-For alloys with bellow 22 at.% Co
Au-Cr alloys-Cast alloys with < 41.5 at % Cr and > 95 at.% Cr
Au-Cr alloys-Electro thinning
Au-Cr alloys-Jet electro polishing
Au-Cr thin films-Chemical etching
Au-Cu alloy-Cu3Au
Au-Cu alloy-Cu3Au
Au-Cu alloy-Cu3Au
Au-Cu alloy-Cu3Au
Au-Cu alloy-Electro polishing
Au-Cu alloy-Electro polishing and etching
Au-Cu alloy-For alloys with 25 at.% Au
Au-Cu alloys-For cast alloys
Au-Cu-Ag Alloys-For Au-Cu-Ag alloys
Au-Cu-Ag alloy-Au-36 at.% Cu-11 at.% Ag
Au-Cu-Ag alloys
Au-Cu-Co alloys-Chemical etching
Au-Fe alloys-For cast alloys with bellow 24 at.% Fe
Au-Ga alloys-For cast alloys with less then 12.7 at.% Ga
Au-Ga system-Chemical etching
Au-Ga thin films EB evaporated on NaCl (100) substrates-Gas, aging defects
Au-Ge alloys-For cast alloys with < 2.5 at.% Ge
Au-In alloy specimens-Chemical polishing
Au-In-Pb system-Alloys with 40-95 wt.% Pb, 30-5% AuIn2 may be examined unetched
Au-In-Te-Chemical etching
Au-Mn alloy-Electro thinning
Au-Mn alloys-Electrolytic polishing
Au-Ni alloys-Electro polishing
Au-Ni-Fe system-Fe-4Au-2Ni
Au-Ni-Fe system-Used on gold plated Ni-Fe alloys for intermediate layer diffusion
Au-Pb-Sn alloys
Au-Sn-Pb alloys-AuSn-Pb section of diagram Au-Sn-Pb
Au-Sn-Pb alloys-Chemical etching
Au-Ti alloys-For cast alloys <12.3 at.% Ti
Au-V alloy (Au4V)-Electro thinning
Au-V alloys-For cast alloys with < 60 at.% V and > 41.5 at.% V
Au-V system-Chemical etching
Au-Zn alloys-For cast alloys with < 30 at.% Zn
Au-Zn as an evaporated metal contact on InGaAsP/InP(100)-Chemical ecthing
Au/TiW thin Films on Al film deposited on (111) silicon wafers-xgas, blister forming
Au2Bi specimens as Bi-Au2Bi-Chemical etching
Au2Bi specimens-Chemical etching
Au2Cs specimens-Chemical etching-Aqua regia, dilute
Au2Ga thin films-Ionized gas thinning
AuAg(x) single crystal ingots-Chemical etching
AuGa2 (100) oriented thin films on NaCl-Chemical etching
AuGe (13%) alloy as Au/AuGe/Ni evaporated multilayered films-Chemical etching
AuGe (13%) alloy as pellets, sheets-Chemical etching
AuGe (13%) alloy ribbon-Chemical etching
AuHg alloy specimens-Chemical polishing
AuSn (20%) alloy as an evaporated thin film-Chemical etching
AuSn (20%) alloy as evaporated thin films-Chemical etching
AuSn (20%) alloy ribbon-Chemical etching
AuSn (20%) alloy ribbon-Chemical etching
AuTi thin films-Chemical thinning
Austenite grain boundaries in case-hardened steels and steels for hardening and tempering-Chemical etching
Austenite grain boundaries in case-hardened steels-Chemical etching
Austenite grain boundaries in cold-worked steels-Chemical etching
Austenite grain boundaries in cold-worked steels-Chemical etching
Austenite grain boundaries in valve steels. Hardening and tempering steels, case-hardening steels-Chemical etching
Austenitic 18/8 stainless steels
Austenitic CrNi steels-Chemical etching
Austenitic CrNi steels-Chemical etching
Austenitic Mn steels
Austenitic Mn steels
Austenitic and Ferritic-Austenitic stainless steels-Chemical etching
Austenitic heat resistant materials-Austenitic heat resistant materials, e.g. 80% Ni-20% Cr, 35% Ni-20%-45% Fe
Austenitic heat resistant materials-Austenitic heat resistant materials; 80% Ni-20% Cr, 35% Ni-20% Cr-45% Fe
Austenitic nickel steels-Chemical etching
Austenitic stainless steel
Austenitic stainless steel
Austenitic stainless steel-Fe-0.02/0.13 C-0.3/1.6Si-0.4/8.0Mn-16/27 Cr-5/21 Ni-0.1/5.0 Mo-0/0.4 Cu
Austenitic stainless steel-Fe-0.02/0.13C-0.2/1.6Si-0.4/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mn-0/01.9N
Austenitic stainless steel-Fe-0.02/0.13C-0.3/1.6Si-0.4/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mo-0/0.8Nb
Austenitic stainless steel-Fe-0.02/0.13C-0.3/1.6Si-0.7/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mo
Austenitic stainless steel-Fe-0.02/0.13C-0.3/1.6Si-0.7/8.0Mn-16/27Cr-5/21Ni-4.0/5.0Mo-0/0.6Ti
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels
Austenitic stainless steels - Aqua regia
Austenitic stainless steels - Dilute aqua regia
Austenitic stainless steels - Glyceregia
Austenitic stainless steels - Marbles reagent
Austenitic stainless steels - Methanolic aqua regia
Austenitic stainless steels and high alloy nickel steels-Electrolytic etching
Austenitic stainless steels and high alloy nickel steels-Electrolytic etching
Austenitic stainless steels, Ni-based alloys - Lepito's No. 1
Austenitic stainless steels, maraging steels, PH gredes - Beraha's tint etch
Austenitic stainless steels-Attacks carbides and sigma phase
Austenitic steels, CrNi steels , N-alloyed-Electropolishing
Austenitic steels, CrNi steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
B as boron nitride test blanks-Metal, removal/preferential
B grown as thin films-Growth
B single crystal ingot
B single crystal ingot-Chemical etching
B-C alloys-Chemical etching
B-C alloys-Electrolytic etching
B-Ge system-Sample preparation
B-Pt alloys-Chemical etching
B-Si alloys-Chemical etching
B-doped SiC
B1900 alloy-Ni-8Cr-6Mo-1Ti-6Al-10Co-4Ta-0.1C (+B, Zr)
B2 high temperature steel-Fe-9.3Cr-1.55Mo, high temperature ferritic-martensite steel
B2Te3 single crystal-Chemical etching
B4C
B4C ceramic with SiC-Electrolytical etching
B4C-Electrolytic etching
B4C-Electrolytic etching
B4Ge3Ol2 single crystal-Chemical cleaning
B4Si specimens-Chemical etching
BF (100) oriented thin film-Chemical etching
BN (100) cubic boron nitride-Metal, removal
BN amorphous thin films-Chemical etching
BN as pressed powder test blanks
BN as pressed powder test blanks-Chemical etching
BN as pressed powder test blanks-Chemical etching
BN as pressed powder test blanks-Chemical etching
BN single crystal films-Gas, crystallization
BP (100) and (111) single crystals-Molten flux
BP single crystal wafers-Electrolytic etching
BSG as borosilicate glass on silicon-Metal diffusion
Ba specimen-A general removal and polish etch for barium
Ba specimen-This and other single acids can be used as general etchants for barium
Ba-Zr-S system (BaZrS3)-Chemical etching
Ba2Si2TiO2 single crystal-Chemical etching
Ba2TiO3 (111) and (100) wafers, single crystals-Chemical etching-Iodine A etchant
Ba2TiO3 polycrystalline hemispheres-Cut, forming
Ba2TiO3 single crystal-Thermal processing
Ba2TiO3 specimens-Chemical polishing
BaF2 (111) specimen-Gas cleaning
BaF2 (111) wafers-Acid, float-off
BaF2 (111) wafers-Chemical polishing
BaF2 (111) wafers-Chemical polishing
BaF2 specimens-Chemical etching
BaF3 (111) wafers-Chemical etching
BaO in BaTi3O7, grain boundary etchant-Physical etching
BaSO4-Chemical etching
BaTiO3
BaTiO3 and BaSrTiO3-Chemical etching
BaTiO3 and BaTi3O7
BaTiO3 specimens-Chemical etching
BaTiO3-Chemical etching
BaWO4 single crystal-Chemical polishing
Barium chloride (fluoride)-Chemical etching
Barium sulphate-Chemical polishing
Barium Magnesium titanate-Bax-Ti(8-x)-Mgx-O16, 1.14>x>0.6
Barium Sodium Niobate (Ba2NaNb5O15)-This gives square etch pits with sides parallel to [110]T
Barium fluoride (BaF2)-Chemical etching
Barium fluoride (BaF2)-Chemical polishing
Barium fluoride (BaF2)-Physical etching
Barium fluoride single crystal (BaF2)-Chemical etching
Barium oxide (BaO)-Chemical etching
Barium oxide (BaO)-Chemical etching
Barium silicate (3BaO x 5SiO2)-Chemical etching
Barium titanate
Barium titanate (Samarium doped)-Chemical etching
Barium titanate-Also used for La, Ne and Sc doped material
Barium titanate-BaTiO3, BaTi3O7
Barium titanate-Chemical etching
Barium titanate-Chemical polishing
Barium-Electro polishing
Barium-lead-titanate-zirconate-(Pb0.7Ba0.3) x (Zr0.7TiO.3)3
Barker's reagent
Basic Rules for Obtaining Damage-Free Mechanically Polished Specimens
Baumann's print
Be (001), (100), and (110) wafers-Electrolytic polishing
Be alloys, precipitates-Chemical etching
Be dispersed Ni-Co-Mo alloys-Ni-4.5Mo-30Co-2 vol.% BeO
Be dispersed Ni-Ni-1 vol.% BeO
Be polycrystaline spheres-Thermal processing
Be single crystal-Electrolytic polishing
Be specimens-Chemical etching
Be specimens-Chemical etching
Be thin film-Acid, removal
Be thin film-Electrolytic thinning
Be thin film-Freeze etchant
Be-3% Fe alloy-Chemical etching
Be-Ag alloys
Be-Ag alloys-Alloys with < 10% Ag
Be-Al alloys-Alloys with < 1% Al
Be-B alloys-For alloys with up to 10% B
Be-Bi alloys-Alloy with 0.5% Bi
Be-Bi alloys-Alloy with 0.5% Bi
Be-C alloys-Chemical etching
Be-Ca alloys-For alloys with up to 1% Ca
Be-Ca alloys-For alloys with up to 1% Ca
Be-Ce alloy-Chemical cleaning
Be-Co alloys-Chemical etching
Be-Co alloys-For alloys with up to 10% Co
Be-Cr alloys-Chemical etching
Be-Cu alloys with high Cu content, Be-Ag and Be-Al-Ti alloys-Chemical etching
Be-Cu alloys-For alloys with up to 15% Cu
Be-Cu specimens-Chemical etching
Be-Fe alloys-Chemical etching
Be-Fe alloys-Electro polishing and chemical thinning
Be-Fe alloys-For alloys with up to 6% Fe
Be-Fe alloys-Jet etching
Be-Ge alloys-Chemical etching
Be-Mg alloys-Chemical etching
Be-Mn alloys-Chemical etching
Be-Mo alloys-For alloys with < 1% Mo
Be-N alloys-Chemical etching
Be-Nb alloys-For alloys with up to 10% Nb
Be-Ni alloys-For alloys with up to 10% Ni
Be-O alloys-Chemical etching
Be-Os alloys-For alloys with up to 10% Os
Be-Pd alloys-For alloys with up to 10% Pd
Be-Pt alloys-For alloys with up to 20% Pt
Be-Rh alloys-For alloys with up to 10% Rh
Be-Ru alloys-For alloys with up to 10% Ru
Be-S alloys-Chemical etching
Be-Se alloys-Chemical etching
Be-Si alloys-Chemical etching
Be-Sn alloys-Chemical etching
Be-Sn alloys-Chemical etching
Be-Ta alloys-For alloys with < 1% Ta
Be-Th alloys-For alloys with up to 10% Th
Be-Ti alloys-For alloys with < 10% Ti
Be-U alloys!!!, Be-Nb, Be-Y, and Be-Zr alloys-Chemical etching
Be-U alloys-For alloys with up to 5% U
Be-U-Y system-Chemical etching
Be-W alloys-For alloys with < 1% W
Be-Zn alloys-For alloys with < 0.6% Zn
Be-Zr alloys-For alloys with up to 5% Zr
BeO
BeO
BeO
BeO
BeO (0001) single crystal wafers-Chemical ecthing
BeO (0001) single crystals-Mechanical, defect
BeO (0001) wafer-Chemical etching
BeO (0001) wafer-Chemical etching
BeO (0001) wafer-Chemical etching
BeO (0001) wafer-Chemical etching
BeO (0001) wafers and pressed powder substrates-Chemical etching
BeO specimens-Chemical etching
BeO+UO2+Y2O3-Chemical etching
BeO, BaO, MgO, ZrO2 and Zr2O3
BeO-Chemical etching
BeO-Chemical etching
Beaujard and Tordeux`s tint etch for steels-Reveals grain boundaries and ferrite orientations
Beck's Solution
Beraha tint etch for ferrite
Beraha tint etch for pearlitic steels and and cast irons
Beraha's E reagent
Beraha's I reagent
Beraha's II reagent
Beraha's III I reagent
Beraha's III reagent
Beraha's cadmium sulfide tint etch for Fe, steel, and ferritic and martensitic stainless steel
Beraha's tint etch for Al alloys-Chemical etching
Beraha's tint etch for cast irons, steels, tool steels, Mn steels, and ferritic and martensitic stainless steels
Beraha's tint etch for irons, steels, tool steels
Beraha's tint etch for stainless steels
Beraha's tint etch for stainless steels
Beraha`s lead sulfide tint etch-Chemical etching
Beraha`s tint etch for Fe, Ni, or Co base heat resistant alloys
Beraha`s tint etch for cast iron and steels
Beraha`s tint etch for iron and steels
Beraha`s tint etch for stainless steels
Beraha`s tint etch for stainless steels
Beryllia (BeO)-Thermal and chemical etching
Beryllia single crystals (BeO)-Dislocation etching
Beryllia-Tellurium system-Chemical etching
Beryllium - Beryllia alloys (BeO)-Electro thinning by Mirand-Saulnier technique
Beryllium and its alloys-Alternative when etchant (10 ml HCl, 4 g NH4Cl, 90 ml H2O) not work
Beryllium and its alloys-Works best on coarse grained Be
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical polishing
Beryllium oxide (BeO)-single crystal-Chemical etching
Beryllium specimens-Be and Be alloys
Beryllium specimens-Be and Be alloys
Beryllium specimens-Be, grain boundary etch
Beryllium specimens-Be-Ag and Be-Al-Ti alloys
Beryllium specimens-Be-U, Be-Nb, Be-Y and Be-Zr alloys
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching for Be and Be alloys
Beryllium specimens-Chemical polishing, chemical thinning, electrochemical thinning
Beryllium specimens-Chemical thinning
Beryllium specimens-Chemical thinning
Beryllium specimens-Electro thinning
Beryllium specimens-Electro thinning by Mirand-Saulnier technique
Beryllium specimens-Electro thinning by window technique
Beryllium specimens-Electro thinning by window technique and electro polishing
Beryllium specimens-Electro thinning of large specimens
Beryllium specimens-Electrolytic polishing
Beryllium specimens-Electrolytic polishing
Beryllium specimens-Electrolytic polishing
Beryllium specimens-Electrolytic polishing and etching
Beryllium specimens-Electrolytical etching
Beryllium specimens-Electropolishing
Beryllium specimens-Electropolishing
Beryllium specimens-Electropolishing and etching
Beryllium specimens-For most types of Be and Be alloys
Beryllium specimens-Grain boundary etch
Beryllium specimens-Grinding and polishing
Beryllium specimens-Grinding and polishing
Beryllium specimens-Jet electro polishing
Beryllium specimens-Jet electro polishing
Beryllium specimens-One of the best electrolyte for universal use
Beryllium specimens-Polishing and chemical etching
Beryllium specimens-Precipitates
Beryllium specimens-Precipitates, grain boundary
Beryllium specimens-Technical types of Be
Beryllium specimens-Technical types of Be. Especially with large grain siz
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be
Beryllium-Be - Modified 'fluor regia'
Beryllium-Electrolytic lapping
Beryllium-Electrolytic polishing
Berzelius etchant
Beta SiC thin films grown on Si, (100) wafers-Chemical etching
Beta alumina-418 90.5% Al2O3, 9.25% Na2O, 0.25% Li2O. A 90.2% Al2O3, 9.0% Na2O, 0.8% Li2O
Beta alumina-90.4% Al2O3, 8.9% Na2O, 0.7% Li2O
Beta alumina-90.6% Al2O3, 8.7% Na2O, 0.7% Li2O
Beta alumina-Physical etching
Beta brass
Beta brass (45% Zn)-Chemical and electro polishing
Beta brass (Cu-Zn)-Alloys with 45-48% Zn
Beta brass (Cu-Zn)-Chemical polishing and electro thinning
Beta-Al2O3Na doped substrate-Chemical cleaning
Beta-Al2O3Na doped substrate-Cleaning
Beta-III titanium alloys-Chemical polishing
Beta-III titanium alloys-Ti-11.5Mo-5-6Zr-4.5Sn
Beta-III titanium alloys-Ti-11.5Mo-6Zr-4.5Sn
Beta-III titanium alloys-Ti-11.5Mo-6Zr-4.5Sn
Beta-Si3N4
Beta-SiC (0001) wafers-Molten flux etching
Beta-SiC (001) single crystal blanks-Ionized gas ecthing
Beta-SiC (001) single crystal blanks-Thermal cleaning
Beta-SiC thin films grown on (100) silicon-Chemical cleaning
Beta-alumina-silica system-Al2O3-up to 7.5% SiO2
Beta-phase Zircaloy
Beta-tin (Sn)-Chemical etching
Bi (0001) wafers-Chemical etching
Bi (0001) wafers-Chemical polishing
Bi alloy and 5% Sb - Coons electrolytic etchant
Bi and Sb alloys-Chemical etching
Bi sellenide
Bi single crystal-Chemical etching
Bi telluride
Bi(2-y)Sb(y)Te(x)Se(3-x)-BiSbTeSe alloys
Bi(2-y)Sb(y)Te(x)Se(3-x)-BiSbTeSe alloys
Bi-Cd alloy and single crystal specimens-Chemical etching
Bi-Cd alloys
Bi-In alloys
Bi-In alloys
Bi-In alloys-Chemical etching
Bi-Mn system-Bi-MnBi eutectic
Bi-Sb-Te system-Bi0.5 x Sb1.5 x Te3+x
Bi-Sb-Te-Se system-Bi0.52 x Sb1.48 x Se0.13 x Te3.09
Bi-Sb-Te-Se system-Chemical etching
Bi-Se system-Bi2Se3+x
Bi-Sn alloy (50 at.% Sn)-Chemical etching
Bi-Sn alloys (5-25% Sn)
Bi-Sn alloys, Sb-Pb alloys
Bi-Sn and Bi-Cd alloys
Bi-Sn, Bi-Cd and Bi-Pb eutectic alloys
Bi-Te system-Chemical etching
Bi-Te-Tl alloys-Chemical etching
Bi12-GeO20 specimens-Chemical polishing
Bi12GeO20 single crystal-Chemical etching
Bi12SiO20 single crystal-Chemical etching
Bi2O3 deposited as a thin film-Chemical etching
Bi2Se3 (0001) cleaved wafers-Electrolytic, oxidizing
Bi2Se3 (0001) wafers-Chemical cleaning
Bi2Se3 (0001) wafers-Chemical polishing
Bi2Se3 single crystal ingot-Chemical polishing
Bi2Te3 (0001) wafers-Chemical ecthing
Bi2Te3 (0001) wafers-Chemical etching
Bi2Te3 (0001) wafers-Chemical etching
Bi2Te3 (0001) wafers-Chemical etching
Bi2Te3 specimens-Etchant for revealing dislocations in Bi2Te3
Bi2Te3 specimens-Thermal etching for etch pits
BiSb alloys-Chemical polishing
BiSb single crystals Te doped-Dislocation etching
BiSe
BiSn alloy and single crystal specimens-Chemical etching
BiTe
BiTe and BiSe-Electrolytic etching
BiTe and GaP-Chemical etching
Billig's etchant
Bismuth selenide and bismuth telluride
Bismuth specimens telluride-Electro jet polishing
Bismuth specimens-Bi-Sn eutectic, Bi-Cd alloys
Bismuth specimens-Chemical etching
Bismuth specimens-Chemical etching
Bismuth specimens-Chemical etching
Bismuth specimens-Chemical polishing and etching
Bismuth specimens-Electro polishing
Bismuth specimens-Electro polishing
Bismuth specimens-Electro polishing and etching
Bismuth specimens-Electrolytic polishing
Bismuth specimens-Electrolytic polishing
Bismuth specimens-Electrolytic polishing
Bismuth specimens-Electropolishing
Bismuth specimens-Electropolishing
Bismuth specimens-Electropolishing
Bismuth specimens-Electropolishing
Bismuth specimens-For pure and technically pure types of Sb
Bismuth specimens-Physical etching
Bismuth specimens-Physical etching
Bismuth specimens-Sb and Sb alloys
Bismuth specimens-Sb, Bi and their alloys
Bismuth specimens-Sb-Bi alloys
Bismuth specimens-Sb-Pb, Bi-Sn alloys
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi
Bismuth-Bi and Antimony-Sb
Bismuth-Electrolytic polishing
Bismuth-Electrolytic polishing
Bismuth-single crystal-Electro polishing
Bismuth-single crystal-Etching for etch pits
Bitter-technique
Blackburn and Williams's solution
Borides of Hf, Nb, Ti, V or Zr
Boron carbide (B4C)-Chemical etching
Boron carbide (B4C)-Chemical etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Physical etching
Boron carbide (BC)-silicon carbide system (SiC)-Electrolytic etching
Boron carbide B4C-Etching
Boron nitride (BN)-Chemical etching
Boron nitride (BN)-Chemical etching
Boron specimens-Chemical etching
Brass
Brass
Brass
Brass (70Cu-30Zn) and bronze parts-Chemical etching
Brass (70Cu-30Zn), bronze, and copper alloys-Chemical etching
Brass (70Cu-30Zn), bronze, and copper parts-Chemical etching-Bichromate finish dip etchant
Brass (70Cu-30Zn)-Chemical etching
Brass (70Cu-30Zn)-Scale dip or fire-off dip
Brass and Cu-Be alloys - Beraha's tint etch
Brass containing beta phase
Brass specimens (70Cu-30Zn)-Chemical etching
Brass specimens (Cu-Zn)-Electrolytic etching
Brass specimens and parts (70Cu-30Zn)-Chemical etching
Brass specimens-Acid, cutting
Brass specimens-Electro polishing
Brass specimens-Electrolytic etching
Brass specimens-Electrolytic polishing
Brass specimens-Electrolytic polishing
Brass specimens-Electrolytic polishing
Brass, as single crystal alpha-brass-Electrolytic polishing
Brass, bronze, and copper alloy parts-Chemical etching
Brass, bronze, and copper alloys-Bright dip etchant
Brass, bronze, and copper alloys-Chemical cleaning-Pickling's etchant
Brasses (Cu-Zn) specimens-Electro polishing
Brasses, alpha bronze, Alpaca, Cu-Be, Cu-Cr, Cu-Mn, Cu-Ni, and Cu-Si alloys-Chemical etching
Bright-field etch for U
Brilliant etchant
Bronze (up to 6% Sn)-Electrolytic polishing
Bronze (up to 9% Sn)-Electrolytic polishing
Bronze alloys - Klemm's III reagent
Bronze and brass cryogenic trailer piping-Chemical cleaning
Bronze and brass cryogenic trailer piping-Chemical cleaning
Bronze artifact-Chemical etching
Bronze specimen-Chemical etching
Bronze specimens-Electropolishing
Bronze-Electropolishing
Bulk polypropylene
C (0001) cleaved pyrolytic graphite-Physical etching
C (0001) specimens-Molten flux etching
C (diamond)
C (diamond)
C (synthetic diamond)
C as both carbon and graphite parts-Chemical etching
C as bulk graphite or thin film deposit-Acid reduction
C as bulk graphite or thin film deposit-Chemical etching
C as graphite single crystal material-Stress, defect
C as natural graphite specimens-Chemical etching
C as natural graphite-Chemical etching
C as single crystal graphite specimens-Gas oxidation
C as single crystal graphite specimens-Metal decoration
C as single crystal graphite-Cleave
C as thin films-Cleaning
C doped Nb-Al alloy-Nb3Al + up to 0.4 at.% C
C specimens-Chemical cleaning
C4F8 (octofluorocyclobutane)
CMSX-6 alloy-Electro polishing
CO2 as solid "Dry Ice"-Alcohol, chilling
CO2 single crystal-Cryogenic gas, forming
CP4 Etch
Ca metal-Acid, reactive
Ca metal-Metal, reactive
Ca pure metal specimens-Oxidation
Ca specimens-Chemical removal
Ca(x)Zr(10-x)O(y)-Chemical etching
Ca-Co alloy-Approx. Cu5Ca
Ca-In alloys-Chemical etching
Ca-Yb system-Electrolytic polishing
Ca2B6O11 x 5H2O (010) cleaved wafers-Chemical etching
Ca2N3 thin films-Chemical etching
Ca3Al2Ge3O12 single crystal ingot-Chemical cleaning
Ca5(PO4)1F-Nd single crystals-Chemical etching
Ca5(PO4)3F-Physical polishing
CaCO3
CaCO3
CaCO3 (1011) cleaved substrates-Chemical polishing
CaCO3 (1011) cleaved wafers-Dislocation etching
CaCO3 (10l1) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Acid cleaning
CaCO3 r(1011) cleaved wafers-Acid cleaning-EDTA etchant
CaCO3 r(1011) cleaved wafers-Dislocatiin etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3-Chemical polishing
CaF2
CaF2
CaF2
CaF2 (100) cleaved wafers-Cleaning
CaF2 (100) thin films deposited on GaAs, (100) substrates-Chemical etching
CaF2 (111) cleaved wafers-Chemical etching
CaF2 (111) cleaved wafers-Dislocation etching
CaF2 (111) wafers-Chemical etching
CaF2 natural fluorite crystals-Chemical polishing and cleaning
CaF2 specimen-Chemical etching
CaF2 specimen-Chemical etching
CaF2 specimen-Chemical etching
CaF2 specimens-Cleaning
CaMoO4 single crystals
CaO
CaO and MgO
CaO, MgO-Chemical etching
CaO-Chemical etching
CaSiF2 single crystals-Chemical etching
CaSnF2 thin film-Chemical etching
CaTiO3-Chemical etching
CaW04 (100) wafers-Chemical etching
CaW04 single crystal specimens-Chemical polishing
CaW04 single crystal specimens-Dislocation etching
CaWO4 (001) wafers-Chemical etching
CaWO4 (001) wafers-Chemical etching
CaWO4 (001) wafers-Chemical etching
CaWO4 single crystal specimens-Chemical polishing
CaWO4 single crystals-Pressure processing
Cadmium selenide (CdSe) hexagonal single crystal-Chemical etching
Cadmium selenide (CdSe) single crystal-Etch for (0001) facet
Cadmium selenide (CdSe)-Chemical ecthing
Cadmium single crystal-Chemical etching
Cadmium single crystal-Chemical polishing
Cadmium single crystal-Chemical polishing
Cadmium single crystal-Chemical-mechanical polishing
Cadmium specimens-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cadmium specimens-Cathodic etching
Cadmium specimens-Cd and Cd alloys, Tl
Cadmium specimens-Cd and solder alloys containing Cd, Tl
Cadmium specimens-Cd, In, Tl, In-Sb and In-As alloys
Cadmium specimens-Cd-Sn and Cd-Zn eutectics
Cadmium specimens-Chemical etching
Cadmium specimens-Chemical thinning
Cadmium specimens-Electro polishing
Cadmium specimens-Electro-mechanical polishing
Cadmium specimens-Electrolytic etching
Cadmium specimens-Electrolytic polishing
Cadmium specimens-Electrolytic polishing
Cadmium specimens-Electropolishing
Cadmium sulphide (CdS) single crystal-Chemical etching
Cadmium sulphide (CdS) single crystals-Chemical polishing and etching
Cadmium sulphide (CdS) single crystals-Chemical polishing and etching
Cadmium sulphide (CdS)-Chemical etching
Cadmium sulphide (CdS)-Chemical etching
Cadmium sulphide (CdS)-Chemical polishing
Cadmium sulphide (CdS)-Chemical polishing and etching
Cadmium sulphide (CdS)-Electro-mechanical polishing and etching
Cadmium sulphide (CdS)-Removal of surface damage
Cadmium telluride (CdTe) single crystal-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing and etching
Cadmium telluride (CdTe)-Chemical polishing and etching
Cadmium telluride (CdTe)-Dislocation etching
Cadmium telluride (CdTe)-This will remove work hardened layer
Cadmium telluride (CdTe)-To distinguish from Cd(x)Hg(1-x)Te, CdTe may be stained with above etchant
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Cd
Cadmium-Chemical polishing
Cadmium-Chemical polishing
Cadmium-Copper (Cd-Cu)-Electric contact material
Cadmium-Electrolytic polishing
Cadmium-Electrolytic polishing
Cain's 'B' etchant
Calcium fluoride (CaF2)-Chemical etching
Calcium fluoride (CaF2)-Chemical etching
Calcium fluoride (CaF2)-Etch pit etch
Calcium fluoride (CaF2)-Etching for etch pits
Calcium fluoride (CaF2)-Final chemical polishing
Calcium fluoride (CaF2)-Jet chemical thinning
Calcium fluoride (CaF2)-Thermal etching
Calcium fluoride (CaF2)-This etchant produce etch pits parallel to <111> cleavage planes
Calcium fluoride (CaF2)-This will produce etch pits
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium phosphate-Ca3(PO4)2
Calcium specimen-Electro polishing
Calcium tartrate crystals-CaC4H4O6 x 3H2O
Calcium zirconate (Ca0.16 xZr0.34 x O1.84)-Chemical etching
Californium-Chemical etching
Can be used for all compositions-Chemical etching
Canfield's etch
Carapella's reagent
Carbides in steels-Chemical ecthing
Carbon (diamond)-Chemical etching
Carbon (graphite carbon fibre composite)-Chemical etching
Carbon alloys-Electropolishing
Carbon and alloy steel specimens- For sulfide and oxide inclusions
Carbon and alloy steel specimens-Carbon segregation
Carbon and alloy steel specimens-Carburization and decarburization
Carbon and alloy steel specimens-Dendritic structure of cast steel specimens
Carbon and alloy steel specimens-Dendritic structure of cast steel specimens
Carbon and alloy steel specimens-Grain size, weld examination
Carbon and alloy steel specimens-Phosphorus rich areas, banding
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks, inclusions, dendrites
Carbon and alloy steels with medium carbon content-Detection of overheating and burning
Carbon and alloy steels with medium carbon content-Examination of inclusions
Carbon and alloy steels with medium carbon content-For austenite grain boundaries
Carbon and alloy steels with medium carbon content-For resolution of hardened structures
Carbon and alloy steels with medium carbon content-General structure
Carbon and alloy steels with medium carbon content-General structure
Carbon and alloy steels with medium carbon content-General structure (most used etchant for routine work)
Carbon and alloy steels with medium carbon content-Reveals intergranular oxidation
Carbon and alloy steels with medium carbon content-Reveals lead inclusions
Carbon and alloy steels-Develops ferrite grain boundaries in Low carbon steels
Carbon and alloy steels-Etches some alloy steels
Carbon and alloy steels-For contrast etching
Carbon and alloy steels-For detection of overheating and burning
Carbon and alloy steels-For general structure
Carbon and alloy steels-For grading inclusions
Carbon and alloy steels-For resolution of hardened structures
Carbon and alloy steels-Good general-purpose electrolyte
Carbon and alloy steels-Produces good contrast in as-quenched martensitic structures
Carbon and alloy steels-Reveals integranular oxidation
Carbon and alloy steels-Reveals lead inclusions
Carbon and alloy steels-Reveals lead inclusions by coloring them red
Carbon and alloy steels-Reveals maximum detail in pearlite, untempered and tempered martensite
Carbon and alloy steels-Reveals pearlite colonies
Carbon dioxide (CO2)-Gas oxidation
Carbon specimens-Cemical cleaning
Carbon specimens-Chemical etching
Carbon specimens-Gas cleaning
Carbon specimens-Thermal, forming
Carbon steel
Carbon steels
Carbon steels, alloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Electro polishing
Carbon steels-Electro polishing
Carbon steels-Electro polishing
Carbon steels-Electrolytic polishing
Carbon steels-Electrolytic polishing
Carbon-Carbon composites-Chemical etching
Carbon-Chemical etching
Carburized steels - Alkaline sodium picrate
Cartridge brass
Cast Iron specimens-Electrolytic polishing
Cast Iron specimens-One of the best electrolyte for universal use
Cast Ti alloys - Beraha's tint etch
Cast alloy steels
Cast alloy steels
Cast alloy steels
Cast and carburized NiCr 8020 steel-Chemical etching
Cast iron
Cast iron, low-alloy steels
Cast iron-Chemical etching
Cast irons
Cast irons (gray, white, or nodular)
Cast irons--Color etching
Cast irons-30% chromium irons
Cast irons-Austenite cast irons
Cast irons-Blackens cementite
Cast irons-Blacknens cementite
Cast irons-Chemical etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Electropolishing-For TEM sample preparation
Cast irons-General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons-General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons-General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons-Good general-purpose electrolyte
Cast irons-High chromium irons
Cast irons-High chromium irons
Cast irons-High phosphorus irons
Cast irons-High-silicon irons (14 to 16% Si)
Cast irons-Observation of ferrite grains boundaries at higher magnification
Cast irons-Reveals carbide and phosphide distribution
Cast irons-Used to reveal macrostructure in white irons
Cast irons-Used to reveal macrostructure in white irons
Cast steel CrMo130L
Cast steel CrMo130L
Cast steel CrMo130L
Cast steel PK12SPL
Cast steel PK3M-L
Cast steel PK3M-L
Cd (111) and (100) single crystal wafers-Chemical polishing
Cd as single crystals and alloy specimens-Chemical etching
Cd dislocation free single crystals-Mechnical, defect
Cd powder used for epitaxy growth of CdSe and (Cd,Se)(1-x)Zn(x)-Chemical cleaning
Cd pre-forms and alloy wire-Chemical cleaning
Cd single crystal specimens-Chemical thinning
Cd single crystal specimens-Physical etching
Cd single crystal wafer-Mechanical, orientation
Cd single crystals-Dislocation etching
Cd specimens and alloys-Chemical cleaning
Cd specimens-Chemical polishing
Cd spheres-Plastic, forming
Cd tellerude-CdTe2O5
Cd, Cd-Ag alloys (up to 3% Ag)
Cd-1.5% Zn alloy
Cd-Ag alloys-Chemical etching
Cd-Cu alloy-Cd-CuCd3 eutectic
Cd-Ga alloys-Selective etchant for Cd to allow SEM examination
Cd-Ga-S-Se system-CdGa2S(1-x)Se(4x)
Cd-Ge alloy-Alloy with eutectic composition
Cd-Hg-Te system-Cd(0.15)Hg(0.85)Te
Cd-Hg-Te system-Chemical etching
Cd-Hg-tellerude-Dislocation etching
Cd-Hg-tellerude-Etching for etch pits
Cd-Hg-tellerude-Hg(1-x)Cd(x)Te
Cd-Mg alloy (low Mg)-Chemical polishing and etching
Cd-Mg alloy-Mg3Cd. Thinning for TEM
Cd-Pb eutectic-Chemical etching
Cd-Pb eutectic-Physical etching
Cd-Sc alloy-Alloy with 3% Sc
Cd-Zn eutectic alloys-Chemical polishing
Cd-Zn eutectic alloys-Electrolytic polishing
Cd-Zn alloys-Chemical etching
Cd-Zn eutectic alloy-Chemical etching
Cd-Zn eutectic alloy-Electro polishing
Cd-Zn eutectic alloy-Electro polishing
Cd3As2 single crystal specimen-Chemical polishing
CdF2 single crystal ingots-Thermal, annealing
CdF2 specimen-Chemical polishing
CdF2 specimen-Chemical polishing-etching
CdI2 (0001) wafers-Chemical polishing
CdIn2Se4 single crystal specimens-Chemical etching
CdIn2Se4 single crystal specimens-Chemical polishing
CdIn2Te4 wafers-Chemical polishing
CdO as a surface oxide-Chemical cleaning
CdO native oxide-Chemical etching
CdP2 deposited as a thin film on InP-Chemical etching
CdS
CdS
CdS (0001) and (1010) wafers-Chemical etching
CdS (0001) and (1013) wafers-Chemical etching
CdS (0001) wafer-Chemical etching
CdS (0001) wafer-Chemical etching
CdS (0001) wafer-Chemical ething
CdS (0001) wafer-Chemical/mechanical polishing
CdS (0001) wafers and CdSe (1010) cleaved wafer-Light, reactive
CdS (0001) wafers-Chemical cleaning
CdS (0001) wafers-Chemical cleaning
CdS (0001) wafers-Chemical etching
CdS (0001) wafers-Chemical etching
CdS (0001) wafers-Chemical etching
CdS (100) wafer-Chemical polishing
CdS (100) wafers-Chemical etching
CdS (1010) wafers-Chemical etching
CdS (1010) wafers-Chemical etching
CdS (111) wafer-Chemical etching
CdS (111) wafers-Chemical polishing
CdS (111) wafers-Chemical polishing
CdS Speciman-Chemical etching
CdS single crystal specimen-Chemical and thermal etching
CdS wafers copper plated-Chemical etching
CdS-Chemical etching
CdSb (100) wafer-Chemical polishing
CdSe
CdSe
CdSe (0001) or (1120) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001), (1010) and (1120) wafers-Chemical etching
CdSe (0001), (lOlO) and (1120)-Chemical etching
CdSe (0001)-Chemical cleaning
CdSe (0001)-Chemical cleaning
CdSe (0001)-Chemical cleaning
CdSe (0001)-Chemical etching
CdSe (1010) cleaved wafers-Light, reactive
CdSe and (Cd,Se)xZn(1-x) single crystal thin films-Chemical etching
CdSe as a deposited polycrystalline thin film-Chemical etching
CdSe polycrystalline thin film-Chemical polishing
CdSe thin film-Chemical etching
CdSe thin film-Chemical etching
CdSe(120) n-type wafers-Chemical etching
CdSiAs2 (001) and (111) wafers-Chemical etching
CdTe (100) wafers-Chemical polishing
CdTe (100), (111) and (110) wafers-Chemical etching-EAg1 etchant
CdTe (100), (111), and (110) wafers-Chemical etching
CdTe (100), (111), and (110) wafers-Chemical etching-EAg2 etchant
CdTe (111) n-type wafers-Chemical polishing
CdTe (111) wafers and ingots-Chemical etching
CdTe (111) wafers-Acid, burn
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Dislocation etching
CdTe (111), (100) and (110) wafers-Chemical etching
CdTe (111), (100), and (110) wafers-Chemical etching-PBr etchant
CdTe (111), (100), and (110) wafers-Thermal etching
CdTe (111)-Electrolytic oxidation
CdTe single cystal ingot-Chemical cleaning
CdTe thin film-Chemical float-off
CdTe-HgTe specimens-Chemical polishing/etching
Ce and alloys
Ce-Ag alloys-Chemical etching
Ce-Ag alloys-Chemical etching
Ce-Al alloy-Anodising
Ce-Au alloys-Chemical etching
Ce-Bi system-Chemical etching
Ce-Co alloys (CeCo5)-Electro polishing
Ce-Co alloys-Chemical etching
Ce-Mg alloys-Alloys with 0-10 wt.% Mg
Ce-Mn alloys-Alloys with 0-20 at.% Mn
Ce-Ni alloy (Laves phase CeNi2)-Chemical etching
Ce-Zn alloys-Chemical etching
CeAl3 single crystal-Chemical etching
CeB6 ingots-Thermal annealing
CeBr (001) specimens-Metal decoration
CeBr (100) specimens-Chemical polishing
CeC2-Chemical etching
CeCu6 single crystal-Chemical etching
CeO2
CeO2
CeO2 or Ce2O3 specimens-Chemical etching
CeO2, SrTiO3, Al2O3, and ZrO-ZrC
CeO2-Chemical etching
CeO2-Chemical etching
CePt specimens-Chemical etching
CeSi2 specimens-Chemical etching
Cellulose nitrate-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Electrolytic etching
Cemented carbides, Kovar (Fe)-Chemical etching
Ceramic Cr-SiO (30%)-Chemical etching
Ceramic Cr-SiO (30%)-Chemical etching
Ceramic specimens-Metal, contacts
Ceramic-EBSD sample preparation
Ceramics, borides (Cr, Mo)-CrB2, MoB2
Ceramics, borides (Hf, Nb)-HfB2-NbB2 mixtures
Ceramics, borides (Ta, La)-TaB2, LaB4
Ceramics, borides (Ti)-TiB2
Ceramics, borides (Ti)-TiB2
Ceramics, borides (Zr)-ZrB2
Ceramics, borides (Zr, Ti)-ZrB2, TiB2
Ceramics, carbides (B)-B4C
Ceramics, carbides (Cr, Hf, V, Al)-CrC, HfC, VC, (Al, Ti)C
Ceramics, carbides (Fe, Si)-(Fe, Si) C
Ceramics, carbides (Mo, Cr)-MoC2, CrC2
Ceramics, carbides (Nb)-NbC, NbC2
Ceramics, carbides (Pu)-PuC (dendritic), toxic
Ceramics, carbides (Pu)-PuC (toxic)
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Ta)-Ta(C, N, O)
Ceramics, carbides (Ta)-Tac
Ceramics, carbides (Th)-(Th, U)C (toxic) with U/Th ratio. ThC2 (toxic)
Ceramics, carbides (Th)-(Th, U)C2 (toxic)
Ceramics, carbides (Th)-ThC (toxic)
Ceramics, carbides (Th)-ThC2 (toxic)
Ceramics, carbides (Ti)-TiC
Ceramics, carbides (Ti, Ta)-TiC, TaC
Ceramics, carbides (U)-(U, Pu)C high in U. UC-PuN mixtures (toxic)
Ceramics, carbides (U)-(U, Pu)C. Toxic
Ceramics, carbides (U)-UC, U(C, O), UC-UC2, UC2-U2C3 mixtures, (U, Pu)C high in C. U(C, N) UC-ZrC
Ceramics, carbides (U)-UC-Cr23C6 mixtures (toxic)
Ceramics, carbides (U)-UC-Pu mixtures (toxic)
Ceramics, carbides (U, Pu)-(U, Ou)C high in Pu. Toxic
Ceramics, carbides (W)-WC
Ceramics, carbides-KC
Ceramics, carbides-ThC (toxic)
Ceramics, carbides-ThO2 (toxic)
Ceramics, nitrides (Al)-(Al, Ti)N
Ceramics, nitrides (Nb)-NbN (yelow), Nb2N (light red)
Ceramics, nitrides (Si)-Si3N4
Ceramics, nitrides (Si)-Si3N4
Ceramics, nitrides (Si)-Si3N4
Ceramics, nitrides (Si)-Si3N4, UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN, UN-U2N mixtures (toxic)
Ceramics, nitrides (U)-UN-U(N2O)-U2N3 mixtures (toxic)
Ceramics, nitrides (U)-UN-U2N3 mixtures (toxic)
Cerium dicarbide
Cerium oxide (CeO2)-Chemical etching
Cerium oxide-Chemical etching
Cerium oxide-silicon nitride system-(1Si3N41CeO2)
Cerium specimens-Chemical etching
Cerium specimens-Chemical etching
Cerium specimens-Chemical etching
Cerium specimens-Chemical solution
Cerium specimens-Electro polishing
Cerium specimens-Electro polishing
Cerium-Ce
Cerium-Ce
Cermets (Cr, U)-Cr23C6-UF2 (toxic), US-U (toxic), UC2-UNi5 (toxic)
Cermets (Nb)-NbCz-NbFe-Nb
Cermets (Ti)- TiCN-Co, TiN-Fe, TiN-Mo, TiN-W
Cermets (Ti)-TiC-Ni
Cermets (U)-PuC-Pu (toxic)
Cermets (U)-UN-U, UN-W (toxic)
Cermets (U)-UO2-Al (toxic)
Cermets (U)-UO2-Cr (toxic)
Cermets (U)-UO2-Mo (toxic)
Cermets (U)-UO2-Nb (toxic)
Cermets (U)-US-Co, UC22-Fe, (UZr)C-Nb, (UZr)C-Ta, (UZr)C-W (toxic)
Cermets (Y)-(Y3Al)C-Y3C-Y
Cermets (Zr, Th, W, U)-ZrO2-W, ThO2-W (toxic), W2C-W, UC-Cr (toxic), UC-Fe (toxic), UC-Ni (toxic), UC-UFe2 (toxic)
Cermets, sintered carbides
Chemical and electrolytic polishing of Cobalt and cobalt alloys
Chemical polishing of 6061 aluminum
Chen-Hendrickson's etchant
Chi phase (M18C or Fe36Cr12Mo10) in steels-Chemical etching
Chlorine water-Acid, disinfectant
Chlorine-Electrolytic, gas jet
Chlorine-Gas etching
Chrome etchant
Chrome-regia etchant
Chromium and chromium alloys-Electropolishing
Chromium and chromium alloys-Electropolishing
Chromium and chromium alloys-Electropolishing
Chromium and its alloys-Electropolishing
Chromium boride (CrB2)-Chemical etching
Chromium films-Chemical etching
Chromium films-Physical etching
Chromium oxide (Cr2O3)-Chemical etching
Chromium plating-Electropolishing
Chromium silicide
Chromium specimens-Chemical etching
Chromium specimens-Chemical etching
Chromium specimens-Chemical etching
Chromium specimens-Cr and Cr alloys
Chromium specimens-Cr and Cr base alloys
Chromium specimens-Cr and Cr base alloys. Fe-Cr alloys and V
Chromium specimens-Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Chromium specimens-Cr, Nb, and alloys
Chromium specimens-Electro mechanical polishing
Chromium specimens-Electro polishing
Chromium specimens-Electro polishing
Chromium specimens-Electro polishing
Chromium specimens-Electro thinning for electron microscopy
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic and chemical etching
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic etching and electro thinning
Chromium specimens-Electrolytic polishing
Chromium specimens-Electrolytic polishing
Chromium specimens-Electropolishing
Chromium specimens-Electropolishing
Chromium specimens-Good general-purpose elctrolyte
Chromium specimens-Physical etching
Chromium specimens-Physical etching
Chromium specimens-Produces etch pits on surface near to (111)
Chromium specimens-Ta, Nb, and their alloys. Cr and Cr silicide. Re silicide. W-Th alloys
Chromium-Chemical-Mechanical polishing
Chromium-Cr
Chromium-Cr
Chromium-Cr
Chromium-Cr
Chromium-Cr
Chromium-Cr
Chromium-Cr
Chromium-Electrolytic polishing
Chromium-copper (Cr-Cu)-Electric contact material
Chromosulfuric acid
Cl2 single crystal-Pressure
Co (0001) wafers-Co (0001) wafers and other orientations used in a structure study
Co (0001) wafers-Electrolytic polishing
Co (0001) wafers-Electrolytic polishing
Co alloys
Co alloys
Co alloys-Chemical etching
Co alloys-For cobalt oxides and sulphides
Co alloys-For grain boundaries. Co-97.2 Cu alloy
Co alloys-Revels oxide in sulphides
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co alloys
Co and Co high-temperature alloys
Co and Co-Al alloys
Co and Co-Al alloys
Co and Co-Al alloys-Chemical etching
Co and Co-Fe alloys
Co binder phase
Co boride
Co borides-Chemical etching
Co hard-facing alloys
Co hard-facing alloys
Co hard-facing alloys and Co high-temperature alloys
Co high-temeprature alloys
Co high-temeprature alloys - Marbles reagent
Co high-temperature alloys
Co high-temperature alloys
Co oxide (CoO) single crystal-Chemical etching
Co oxide (CoO)-Chemical etching
Co oxide (CoO)-Electro thinning
Co oxide (CoO)-Physical etching
Co oxide single crystal-Chemical etching
Co oxide single crystal-Chemical etching and electro thinning
Co silicide
Co silicides-Chemical etching
Co sintered carbides
Co specimens-Physical etching
Co spheres-Electrolytic polishing
Co superalloys-Chemical etching
Co superalloys-Chemical etching
Co-Al alloys-Chemical etching
Co-Al alloys-Electrolytic etching
Co-B alloys-Chemical etching
Co-B compounds-Chemical etching
Co-C-Si-W-Fe-Cr alloy-64Co-1.2C-1.1Si-4.8W-0.25Fe-28.6Cr, Stellite 6
Co-Ce alloys (Co5Ce)-Chemical etching
Co-Ce-Al alloy-Ce(1-x) Al (x) Co5, 0< x < 0.6
Co-Ce-Al alloy-Co5CeAl0.2
Co-Ce-Cu-Fe alloys-Approx. Co(3.5)Fe(0.5)CuCe
Co-Ce-Fe alloy-Co5CeFe02
Co-Ce-Ni alloy-Laves phase, Ce(Co(1-x)Ni(x))2 0<=x<=0.17
Co-Cr (40%)-Ni-Fe alloys-Electrolytic etching
Co-Cr alloys-Electrolytic etching
Co-Cr-C alloys-Chemical etching
Co-Cr-C alloys-Co-25.3Cr-0.25C
Co-Cr-C alloys-Co-25/33 Cr-0.2/0.3 C
Co-Cr-C alloys-Co-41Cr-2.4C
Co-Cr-C alloys-Preferential etch for non-carbides
Co-Cr-Mo alloys-Chemical etching
Co-Cr-Mo alloys-Chemical etching
Co-Cr-Mo alloys-Electro thinning by Bollmann technique
Co-Cr-Mo-(Nb) dental alloys-Electrolytic etching
Co-Cr-Mo-C alloy-Co-2>Cr-5.5Mo-0.15C
Co-Cr-Mo-C alloy-Hynes Stellite 21
Co-Cr-Mo-C alloy-Vitallium or H.S.21, Co-27/30Cr-5.5Mo-0.15/0.3C
Co-Cr-Mo-C-Mn-Fe-Ni alloy-Co-28.3Cr-5.4Mo-0.26C-0.66Mn-0.39Fe-0.12Ni
Co-Cr-Mo-Ni alloys-Chemical etching
Co-Cr-Mo-Ni alloys-Chemical etching
Co-Cr-Mo-Ni-C-Fe-Si-Mn alloy-Co-28.5Cr-6Mo-2.2Ni-0.3C-0.4Fe-0.4Si-0.5Mn, HS21 alloy
Co-Cr-Mo-Ni-Fe-Si-C-Mn-Al-Ti alloy-Co-29Cr-6No-1.8Ni-0.6Fe-0.6Si-0.24C-0.2Mn-0.1Al-0.1Ti
Co-Cr-Mo-Si alloys-Tribaloy 400 62-Co-28Mo-2Si-8Cr, Tribaloy 800 52Co-28Mo-3Si-17Cr
Co-Cr-Ni alloys-For identification of sigma phase. Co-Cr-Ni alloys. For replica electron microscopy use Murakami reagent
Co-Cr-Ni-Ta alloy-35% Cr, 15% Ni, 6% Ta
Co-Cr-Ni-Ta carbide alloy-Co-15Cr-25Ni-13Ta
Co-Cr-Ni-W-Si-C alloy-Stellugine 778, Co-25/29Cr-1.3/22.5Ni-1.6/1.7C-8.5/11.5W-0.9/2.7Si
Co-Cr-Ta carbide alloy-Co-15Cr-13Ta
Co-Cr-W alloys-Chemical etching
Co-Cu-Ce alloys ((Co, Cu)5Ce)-Chemical etching
Co-Cu-Ce alloys ((Co, Cu)5Ce)-Electro micro and chemical etching
Co-Cu-Fe-Sm alloy-Modified Co5Sm. Etch for sintered alloy
Co-Cu-Pr alloy-(Co, Cu)5Pr
Co-Dy alloy-DyCo5
Co-Dy-Ag alloy-Co5DyAg0.2
Co-Dy-Al alloy-Co5DyAl0.2
Co-Dy-Au alloy-Chemical etching
Co-Dy-C alloy-Co5DyC0.7
Co-Dy-Cr alloy-Co5DyCr0.2
Co-Dy-Cu alloy-Co5DyCu0.2
Co-Dy-Fe alloy-Co5DyFe0.2
Co-Dy-Ga alloy-Co5DyGa0.2
Co-Dy-Ge alloy-Co5DyGe0.2
Co-Dy-Mn alloy-Co5DyMn0.2
Co-Dy-Ni alloy-Co5DyNi0.2
Co-Dy-Pb alloy-Co5DyPb0.2
Co-Dy-Pd alloy-Co5DyPd0.2
Co-Dy-Pt alloy-Co5DyPt0.2
Co-Dy-Si alloy-Co5DySi0.2
Co-Er alloys-Chemical etching
Co-Er-Al alloy-Co5ErAl0.2
Co-Er-Fe alloy-Co5ErFe0.2
Co-Fe alloys-Alloys with up to 11.2 at.% Fe
Co-Fe alloys-Chemical ecthing
Co-Fe alloys-Chemical etching
Co-Fe alloys-Fe-24-28% C
Co-Fe single crystal-Co-8 wt.% Fe
Co-Fe-Au alloys-Chemical etching
Co-Fe-C system-FeCo-0.5/2C
Co-Fe-Nb alloy-85Co-12Fe-3Nb
Co-Fe-Nb alloy-85Co-12Fe-3Nb
Co-Fe-Ni-V alloys-((Fe,Co,Ni)3) - 30 at.% Fe, 37.5 at.% Co, 7.5 at.% Ni
Co-Fe-V alloys-((Fe,Co)3V - 11/25% Fe - 64/50% Co - 25% V
Co-Fe-V alloys-49 Co - 47 Fe - 3 V
Co-Fe-V alloys-FeCo-V
Co-Fe-V, Co-Ni-V, Co-Fe-Zn alloys-Chemical etching
Co-Fe-Y alloy-Y-Co(1-x)-Fe(x)
Co-Fe-Zn alloys-Chemical etching
Co-Ga alloys--48.5 at.% Ga
Co-Ga, Co-Fe-V, and Co-Ni-V alloys-Chemical etching
Co-Gd alloys (Approx. GdCo)-Chemical etching
Co-Gd alloys-Chemical etching
Co-Gd alloys-Laves phase GdCo2
Co-Gd-Al alloy-Co5GdAl0.2
Co-Gd-Fe alloy-Co5GdFe0.2
Co-Ge-Si system-Chemical etching
Co-Hf alloys (HfCo2)-Chemical etching
Co-Ho system-Approx. HoCo5
Co-Ho-Al alloy-Co5HoAl0.2
Co-Ho-Fe alloy-Co5HoFe0.2
Co-La-Al alloy-Co5LaAl0.2
Co-La-Fe alloy-Co5LaFe0.2
Co-Lu alloys-Approx. LuCo5
Co-Mo alloys-Chemical etching
Co-Mo alloys-Electrolytic etching
Co-Mo-Si alloys-55Co-35Mo-10Si
Co-Nd-Al alloy-Co5NdAl0.2
Co-Nd-Fe alloy-Co5NdFe0.2
Co-Ni-Al-Fe alloys-Chemical etching
Co-Ni-Cr alloy-Cu-29Ni-3Cr
Co-Ni-Cr carbide system-Co2Ni-Cr23C6
Co-Ni-Cr-Mo-C alloy (Vitallium)->20%Co-26% Cr-6% Mo-0.4 or 1.0% C-Ni
Co-Ni-Cr-Nb-Al superalloy-40Co-38Ni-17Cr-2.0Nb-1.5Al by weight
Co-Ni-Cr-Nb-Fe alloys-Electro polishing
Co-Ni-Cr-Ta alloys-29-31 wt.% Ni, 28-32% Co, 31-34% Cr, 3-11% Ta
Co-Ni-Cr-W-Fe alloy-Haynes No.25 Co-10Ni-20Cr-14W-3Fe (+C)
Co-Ni-Cr-W-Fe alloy-Stellite X40, Haynes 31 55Co-25Cr-10Ni-8W-1Fe (+C,Mn,Si)
Co-Ni-O system-Approx. (Co0.81Ni0.2)O
Co-Ni-V alloy-((Co,Ni)3V - 32 at.% Co - 43Ni-25V)
Co-Pr alloy-Co5Pr
Co-Pr alloys-Chemical etching
Co-Pr-Al alloy-Co5Pr(x)Al(1-x)
Co-Pr-Al alloy-Co5PrAl0.2
Co-Pr-Fe alloy-Co5PrFe0.2
Co-Pt alloys
Co-Sb-Zr alloy-ZrSbCo
Co-Si alloy-Alloy with 11.8 at.% Si
Co-Si alloys-Chemical etching
Co-Si-Al alloys-Chemical etching
Co-Si-Ta alloy-Co-25at.% Si-5 at.% Ta
Co-Si-W alloy-Co - 25at.% Si - 5 at.% W
Co-Sm alloy-Co5Sm
Co-Sm alloys
Co-Sm alloys, grain boundary etchant-Chemical etching
Co-Sm alloys-Chemical etching
Co-Sm alloys-Chemical etching
Co-Sm alloys-Chemical etching
Co-Sm alloys-Sintered Co5Sm
Co-Sm-Al alloy-Co5SmAl0.2
Co-Sm-Fe alloy-Co5SmFe0.2
Co-Sn alloys-Chemical etching
Co-Sn0Sb alloys-For carbides
Co-Ta alloys-Co-Co2Ta eutectic
Co-Tb alloys-Approx. TbCo5
Co-Tb-Al alloy-Co5TbAl0.2
Co-Tb-Fe alloy-Co5TbFe0.2
Co-Ti alloys
Co-Ti in carbide system-Co-2.3/5 mol.% TiC
Co-Tm alloys-Approx. Co5Tm
Co-V alloy-Co3V
Co-W alloys-Electrolytic etching
Co-Yb alloys-Aprox. YbCo5
Co-Zr alloys-ZrCo
Co-Zr alloys-ZrCo2
Co-base casting material and rolling stock, stellite, color etchant-Chemical etching
Co-base superalloys, color etchant-Chemical etching
Co-based alloys - Beraha's tint etch
Co3S4 single crystal sphere-Chemical etching
CoFe alloys-Electro thinning
CoFeO (100) wafers-Chemical etching
CoO
CoO (100) wafers-Chemical etching
CoO (100) wafers-Gas oxidation
CoO (100) wafers-Thermal processing
CoO-Chemical etching
CoSi2 (100) wafers-Dislocation etching
CoSi2 thin film grown on substrates of Si, (111) and (100)-Chemical etching
CoSi2 thin films grown on Si substrates-Ionized gas, removal
Coated Hastelloy-X-Chemical etching
Coated cutting insert-Chemical etching
Coated steel sheet-Steel sheeet coated with Zn for automotive industry
Coates's etchant
Cobalt Stellite-Chemical etching
Cobalt Stellite-Chemical etching
Cobalt Stellite-Electrolytic etching
Cobalt Stellite-Show grain size, general structure
Cobalt alloys-Chemical etching
Cobalt alloys-Co + dispersed oxides, TiO2, etc
Cobalt alloys-Co silicide
Cobalt alloys-Co silicide
Cobalt alloys-Co-Cr + dispersoids alloys
Cobalt alloys-Co-In + other alloys
Cobalt alloys-Co-In rich alloys
Cobalt alloys-Electrolyticpolishing
Cobalt aluminate (CoAl2O4)-Chemical etching
Cobalt and alloys-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cobalt and alloys-Cemented carbides and other Co base alloys
Cobalt and alloys-Chemical ecthing
Cobalt and alloys-Chemical etching
Cobalt and alloys-Co base wear resistant alloys and materials used for cutting tools
Cobalt and alloys-Co-Fe alloys
Cobalt and alloys-Co-Ga alloys
Cobalt and alloys-Co-Sm alloys
Cobalt and alloys-Electro polishing
Cobalt and alloys-Electro thinning by window technique
Cobalt and alloys-Electrolytic polishing
Cobalt and alloys-Electrolytic polishing
Cobalt and alloys-Electrolytic polishing
Cobalt and alloys-Grain boundary etch
Cobalt and alloys-Hexagonal Co. For optical and electron microscopy
Cobalt and alloys-Physical etching
Cobalt and alloys-Pure Co, Co base superalloys
Cobalt and alloys-Pure Co, Co-Al alloys
Cobalt and alloys-Pure Co, Co-Fe alloys, WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys-Stellite up to 70% Co, Co base superalloys, Co silicides
Cobalt and alloys-WC-TiC-(Ta, Nb)C-Co tye cemented carbides
Cobalt and alloys-WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys-WC-TiC-TaC-Co and WC-NbC-Co type cemented carbides
Cobalt and alloys-Worked + recrystallized Co
Cobalt and alloys-Worked + recrystallized Co
Cobalt and cobalt alloys-2V-Permendur, some Stellites. Shows general structure and porosity
Cobalt and cobalt alloys-Chemical etching
Cobalt and cobalt alloys-Chemical etching
Cobalt and cobalt alloys-Co, Ni and Fe base high temperature alloys
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-HA 36 alloy. Shows grain size and general structure
Cobalt and cobalt alloys-HS-31, HA-151 and N-155 alloys. Shows grain size and general structure
Cobalt and cobalt alloys-High temperature alloys
Cobalt and cobalt alloys-High temperature alloys
Cobalt and cobalt alloys-Kovar (17Co-29Ni, balance Fe) cemented carbides matrix
Cobalt and cobalt alloys-NASA SP alloy (38Ni-37.4Co-14W)
Cobalt and cobalt alloys-Nimonic 90 and 100, Ni-Cr-Co, Ni-Cr-Co-Mo
Cobalt and cobalt alloys-Refractaloy, K-42-B, some Stellites
Cobalt and cobalt alloys-Refractaloys (20-30 Co-Fe base alloys)
Cobalt and cobalt alloys-Wrought Cr-Co-X alloys
Cobalt and its alloys-Co alloys, stellites. General structure, porosity
Cobalt and its alloys-Stellite 31, 151, Inco 713 C, GMR 235, Ni 155
Cobalt and its alloys-Stellite 36 (Co)
Cobalt base alloys-Cobalt wrought alloys
Cobalt base alloys-Cobalt wrought alloys
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type), Hayness No, 1, 2, 3,4, 6 alloys
Cobalt base superalloy L605-Chemical etching
Cobalt hard facings alloys-Chemical etching
Cobalt oxide (CoO)-Chemical etching
Cobalt single crystal-Chemical polishing
Cobalt specimens-Cemented carbides with Co binder phase
Cobalt specimens-Co-25Cr-10Ni-8W, Co-21Cr-20Ni, and Co-3Cr-3Mo-1Nb alloys, other stellites
Cobalt specimens-Co-Cr alloys, also Stellite
Cobalt specimens-Co-Ni-Fe base alloys
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Electrolytic etching
Cobalt wrought alloys-Electrolytic etching
Cobalt-Co
Cobalt-Co
Cobalt-Co
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electropolishing
Cold-worked brass
Color etch for U3Si
Color etching Ni-Cr alloys-Chemical etching
Color etching for ADI iron-Beraha-Martensite etchant
Color tint etch for Mo
Commercial Zn alloys
Complex Mg alloys containing Al, Bi, Cd, Zn-Electrolytic etching
Comstock's etch
Contrast etchant
Cooper-Chemical polishing
Cooper-Chemical polishing
Cooper-Chemical polishing
Cooper-Chemical polishing
Copper alloys-Color etching
Copper alloys-Color etching
Copper alloys-Color etching
Copper alloys-Electrolytic polishing
Copper alloys-Electropolishing
Copper and copper alloys except Tin-bronze-Electro polishing
Copper and copper alloys-All Copper and copper alloy
Copper and copper alloys-All brasses. produce brilliant, deep etch
Copper and copper alloys-Alpha anbd alpha + beta alloys
Copper and copper alloys-Aluminium bronze, free-cutting brass
Copper and copper alloys-Aluminium bronze, free-cutting brass
Copper and copper alloys-Attack polishing of brasses and bronzes
Copper and copper alloys-Attack polishing of coppers and some copper alloys
Copper and copper alloys-Beryllium copper and aluminium bronze
Copper and copper alloys-Brass. General macro
Copper and copper alloys-Cartridge brass, free-cutting brass, admirality, gilding metal
Copper and copper alloys-Chemical etching
Copper and copper alloys-Chemical etching
Copper and copper alloys-Cold worked brasses
Copper and copper alloys-Copper alloys of Be, Mn, and Si; nickel silver; bronzes, chromium copper
Copper and copper alloys-Copper-nickel alloys
Copper and copper alloys-Coppers and all brasses. Grains; cracks and other defects
Copper and copper alloys-Coppers and all brasses. Grains; cracks and other defects, reveal grain contrast
Copper and copper alloys-Coppers, all brasses, aluminium bronze
Copper and copper alloys-Coppers, brasses, bronzes, aluminium bronzes
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver, Al bronze
Copper and copper alloys-Coppers, brasses, nickel silver; darkening large areas of beta in alpha-beta brass
Copper and copper alloys-Coppers, high Cu alloys, phosphor bronze. Grain boundaries, oxide inclusions
Copper and copper alloys-Electrolytic etching
Copper and copper alloys-Electrolytic etching
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Especially for copper and brass. For revealing the microstructure
Copper and copper alloys-Etching and attack polishing of coppers and Cu alloys
Copper and copper alloys-For Ci-Sn Alloys
Copper and copper alloys-For copper an alpha brass
Copper and copper alloys-For copper and alpha brass
Copper and copper alloys-For nickel silver and bronzes
Copper and copper alloys-For revealing the general macro-structure
Copper and copper alloys-Good contrast between tha alpha phase and beta phase in brass
Copper and copper alloys-Jet electro polishing (0.1 cm jet)
Copper and copper alloys-Jet electro polishing (0.15 cm jet) of discs
Copper and copper alloys-Jet machinning
Copper and copper alloys-Silicon brass, silicon bronze. General macrostructure
Copper and copper alloys-Suitable for revealing differences in alloy concentration
Copper and copper alloys-To reveal susceptibility to stress corrosion
Copper and copper alloys-To reveal the (100) texture in copper
Copper and copper alloys-To reveal the (100) texture in copper
Copper and copper base alloys-Electropolishing
Copper and its alloys-Brass. Strain lines
Copper and its alloys-Brilliant deep etch
Copper and its alloys-Cu and all brasses
Copper and its alloys-Cu and all brasses. Emphasizes grains and cracks
Copper and its alloys-Cu and all brasses. Good grain contrast
Copper and its alloys-Cu, high Cu alloys, P-Sn bronzes. Emphasizes grain boundaries and oxide inclusions
Copper and its alloys-Silicon brass or bronze
Copper base alloys-Colour etchant
Copper chloride (CuCl)-Chemical etching
Copper plating
Copper polyerystalline parts-Chemical cleaning
Copper samples-Brasses containing Si. Si bronzes
Copper samples-Cu and all types of brasses. Grain contrast
Copper samples-Cu and all types of brasses. Grains and cracks
Copper samples-Cu and brasses. Grain contrast
Copper samples-Verification of stresses in brass
Copper single crystal-Chemical etching
Copper single crystal-Chemical polishing, electrolytic etching, etch pit etching
Copper single crystal-Electro etching for etch pits
Copper single crystal-Electro polishing
Copper single crystal-Etching for etch pits
Copper single crystal-Etching for etch pits
Copper single crystals-Electro polishing
Copper specimens- All types of Cu. Cartridge brass. Tombac. Muntz metal, Easily machinable brasses
Copper specimens-Al bronzes which are difficult to etch otherwise
Copper specimens-Al bronzes, Cu-Be alloys
Copper specimens-All types of Cu. Cu-Be alloys
Copper specimens-Alpha-beta brass. Special brass. Al brass. Red cast bronze. German silver. Cu-Sn alloys
Copper specimens-An extremely useful electrolyte for certain applications, but dangerous
Copper specimens-Beta brasses.German silver. Monel and Cu-Ni alloys
Copper specimens-Brasses. Alpha bronze
Copper specimens-Brasses. Especially brasses containing Co
Copper specimens-Cathodic etching
Copper specimens-Cathodic etching
Copper specimens-Chemical etching
Copper specimens-Chemical etching
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing and etching
Copper specimens-Chemical thinning
Copper specimens-Color etchnat and grain size contrast of bronzes
Copper specimens-Cu, brasses, bronzes, Al bronzes, Cu-Ni and Cu-Ag alloys, German silver
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing and thinning
Copper specimens-Electro thinning
Copper specimens-Electro thinning
Copper specimens-Electro thinning
Copper specimens-Electro thinning in P.T.F.E. holder
Copper specimens-Electro thinning by window technique
Copper specimens-Electro thinning by Bollman technique
Copper specimens-Electro thinning by Mirand-Saulnier technique
Copper specimens-Electro thinning by modified voltage technique
Copper specimens-Electro thinning by window (W) or Bollman (B) technique
Copper specimens-Electro thinning by window technique
Copper specimens-Electro thinning by window technique
Copper specimens-Electro thinning by window technique
Copper specimens-Electrolytic etching
Copper specimens-Electrolytic polishing
Copper specimens-Electrolytic polishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Fast, good polish and etch for Cu and Cu with oxide and sulfide inclusions
Copper specimens-For revealing the grain boundaries
Copper specimens-Grain surface etching
Copper specimens-Ion etching
Copper specimens-Most types of Cu and Cu Alloys. Cu-Ag solder layers. Mn, P, Be, Al-Si bronzes
Copper specimens-Most types of Cu and Cu Alloys. Flow lines in brass
Copper specimens-Multiple constituent Sn bronzes. Delta phase
Copper specimens-Physical etching
Copper specimens-Physical etching
Copper specimens-Physical etching
Copper specimens-Pondos reagent
Copper specimens-Thinning of Cu wire for electron microscopy
Copper specimens-This etchant reveals segregation structure and grain boundaries in 99.999% Cu
Copper thin films-Chemical etching
Copper, brasss, bronzes-Electropolishing
Copper, brasss, bronzes-Electropolishing
Copper-Color and grain contrast etchant for Cu
Copper-Cu
Copper-Cu
Copper-Cu
Copper-Cu
Copper-Cu
Copper-Cu
Copper-Cu
Copper-Cu (impure)
Copper-Cu (pure)
Copper-Eelctrolytic polishing
Copper-Electrolytic lapping
Copper-Electrolytic polishing
Copper-Electrolytic polishing
Copper-cobalt-beryllium (Cu-Co-Be)-Electric contact material
Copper-cobalt-beryllium (Cu-Co-Be)-Electric contact material
Copper-cobalt-silicon (Cu-Co-Si)-Electric contact material
Copper-cobalt-silicon (Cu-Co-Si)-Electric contact material
Copper-graphite (Cu-C)-Electric contact material
Copper-tungsten (Cu-W)-Electric contact material
Copper-tungsten (Cu-W)-Electric contact material
Corning glass #7059 used as substrates for a-ZnGeAs2 epitaxy-Solvent cleaning
Corning glass #7059-Acid, float-off
Corning glass 7720-Chemical cleaning
Corning glass 7720-Chemical cleaning
Corning glass 7740 (borosilicate)-Chemical cleaning
Coronze CDA 638 alloy
Corrosion resistant cast steel HU-The composition is 37-41% Ni, 17-21% Cr, 2.5% max. Si, 0.35-0.75% C
Cr and Cr alloys
Cr and Cr alloys
Cr and Cr alloys
Cr and Cr alloys
Cr and Cr alloys
Cr and Cr alloys
Cr and Cr alloys
Cr and Cr alloys - Agua regia
Cr and Cr alloys - Glyceregia
Cr and Cr alloys - Murakami's reagent
Cr and Cr alloys, C-Fe alloys, Mo (grain-contrast etchant), Re and Re-base alloys, V and V-base alloys-Electrolytic etching
Cr and Cr alloys- 'Fluor regia'
Cr and CrNi steels. Carbide etch. Cast iron and alloy cast iron-Electrolytic etching
Cr and Hf carbides-Chemical etching
Cr and Mo carbides-Chemical etching
Cr as evaporated deposits in vacuum systems-Chemical cleaning
Cr as evaporated deposits in vacuum systems-Chemical cleaning
Cr carbide-Ni alloy-83% carbide-15% Ni
Cr evaporated thin films-Chemical etching
Cr evaporation deposits-Chemical etching
Cr plating
Cr specimens-Chemical etching
Cr stainless steels-Chemical etching
Cr steel specimens-0.4.1.0 C-3.6 Cr-Fe
Cr steel-Fe-0.9/1.5C-1/8Cr
Cr steels specimens-Fe-4Cr-0.25/0.35C
Cr steels specimens-Fe-4Cr-0.3C
Cr steels-Electrolytic etching
Cr thin film deposits on glass substrates-Chrome etchant, modified
Cr thin films deposits-Chemical etching
Cr thin films-Chemical etching
Cr thin films-Chemical etching
Cr thin films-Chemical etching-Kodak EB-5 etchant
Cr thin films-Gas oxidation
Cr thin films-Physical etching
Cr, Mo, Nb, Ta, V, W and their alloys-Chemical-Mechanical polishing
Cr-Alumina alloy (Al2O3)-70% Cr-30% Al2O3
Cr-Fe alloys-Electro thinning
Cr-Fe alloys-Fe-24/25Cr
Cr-Hf carbide-0.5 mol % HfC
Cr-Ir alloys-Chemical etching
Cr-Mo alloys (Mo-rich)-Chemical etching
Cr-Mo steel-Electrolytic etching
Cr-Mo steel-Fe-0.05C-10Cr-2Mo-0.5Mo-0.5Mn-0.4/0.6Si
Cr-Mo steel-Fe-0.1C-2.2Cr-0/1.5Mo
Cr-Mo steel-Fe-0.1C-2.3Cr-1Mo
Cr-Mo-Nb-V steel-Fe-0.05C-10Cr-2Mo-0.2V-up.to 0.1Nb-0.5Mn-0.4/0.6Si
Cr-N system (Cr-rich)-Chemical etching
Cr-Nb alloys-Chemical etching
Cr-Nb carbide-0.5 mol % NbC
Cr-Nb-Zr-C alloy-0.7% Zr, 1.0% Nb, 0.04% C
Cr-Ni stainless steels-Chemical etching
Cr-Ni steels - WII etch
Cr-Ni-Fe alloys-Etching of weld structures
Cr-Ni-Si steel-Fe-0.3C-1.7Cr-3.5Ni-0.6Si
Cr-Re alloys-Thinning for electron microscopy
Cr-Rh system-Electrolytic etching
Cr-Ru alloys-Electrolytic etching
Cr-Sc alloys-May be examined unetched
Cr-Si alloys (2-76 wt.% Si)
Cr-Si system-For alloys with up to 40 at.% S and over
Cr-Ta boride-Chemical etching
Cr-Ta carbide-0.5 mol % TaC
Cr-Ti carbide-0.5 mol % TiC
Cr-Ti carbide-Chemical etching
Cr-Ti steels-Fe-4Cr-0.25/0.35C-0/0.2Ti
Cr-W
Cr-W alloys-Alloys with 29-40 at.% W
Cr-Y alloys-May be examined unetched
Cr-Zr carbide-0.5 mol % ZrC
Cr-Zr carbide-Chemical etching
Cr-Zr-C alloys-Electrolytic etching
Cr2O3 (0001) and (1011) wafers-Chemical etching
Cr2O3 (0001) wafers-Chemical etching
Cr2O3 (111) single crystal-Material growth
Cr2O3 amorphous thin films-Chemical etching
Cr2O3 and Al2O3
Cr2O3 thin film-Chemical etching
Cr3B2 specimens-Chemical etching
Cr3B2 specimens-Chemical etching
Cr3B2 specimens-Chemical etching
CrB2 specimens-Chemical etching
CrB2, MoB2-Chemical etching
CrC and HfC
CrSi2 thin films deposited on silicon substrates-Gas oxidation
Crowell's etchant
Cs metal specimens-Chemical etching
Cs2O (111) wafers-Chemical cleaning
CsBr (001) wafers-Alcohol polishing
CsCl single crystal-Chemical etching
CsI (100) oriented single crystal wafers-Chemical polishing/etching
Cu (100) wafers-Chemical polishing
Cu (111) single crystal wafers-Dislocation etching
Cu (111) single crystal-Chemical cleaning
Cu (111) wafers-Chemical etching
Cu (111) wafers-Electrolytic polishing
Cu (111) wafers-Gas cleaning
Cu (111) within 2-3 orientation-Dislocation etching
Cu (1O0) single crystal wafers-Gas removal
Cu (OFHC), Cu-30% Zn alloy
Cu OFHC copper specimens-Chemical etching
Cu alloys, Cu-Si alloys-Chemical etching
Cu alloys, brasses, Cu-Be alloys, Al bronzes without eutectoid, Alpaca-Chemical etching
Cu and Cu alloy parts-Chemical etching
Cu and Cu alloy specimens-Chemical etching-General etchant
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys
Cu and Cu alloys - Beraha's tint etch
Cu and Cu alloys - Pondo's reagent
Cu and Cu alloys as sheet or foil-Chemical cleaning
Cu and Cu alloys except Sn bronze-Electrolytic polishing
Cu and Cu alloys with soft solders-Chemical etching
Cu and Cu alloys, Be bronzes-Chemical etching
Cu and Cu alloys-Chemical cleaning
Cu and Cu alloys-Chemical cleaning-Scale dip etchant
Cu and Cu alloys-Chemical etching
Cu and Cu alloys-Chemical etching
Cu and Cu alloys-Chemical etching
Cu and Cu alloys-Chemical polishing
Cu and Cu alloys-Chemical polishing
Cu and Cu-Zn and Cu-Sn alloys
Cu and Cu-base alloys-Electrolytic polishing
Cu and alloy parts-Chemical etching
Cu and alloys
Cu and alloys
Cu and alloys
Cu and alloys
Cu and alloys
Cu and alloys
Cu and alloys
Cu and alloys-For copper, brass and nickel silver
Cu and brass
Cu bicrystals-Chemical etching
Cu brases, bronzes-Chemical etching
Cu brass
Cu cryogenic trailer piping-Chemical cleaning
Cu ferrite-CuO 0.33/2.5 Fe2O3
Cu oxide (Cu2O)-Chemical polishing, thinning
Cu oxide-Chemical polishing, thinning
Cu oxides-Chemical ecthing
Cu oxides-Chemical etching
Cu oxides-single crystals-Chemical polishing
Cu parts as sheet, pans and piping-Mineral cleaning
Cu piping on cryogenic transport tailers-Chemical cleaning
Cu piping-Chemical cleaning
Cu single crystal ingots-Chemical etching
Cu single crystal specimens-Acid cleaning
Cu single crystal specimens-Chemical etching
Cu single crystal specimens-Chemical etching
Cu single crystal specimens-Chemical polishing
Cu single crystal specimens-Chemical polishing
Cu single crystal specimens-Chemical polishing
Cu single crystal specimens-Electrolytic polishing
Cu single crystal specimens-Electrolytic polishing
Cu single crystal specimens-Electrolytic polishing
Cu single crystal specimens-Physical etching
Cu single crystal sphere-Acid oxidation
Cu single crystal sphere-Chemical etching
Cu single crystal sphere-Gas, preferential
Cu single crystal spheres-Acid oxidation
Cu single crystal spheres-Electrolytic oxide removal
Cu single crystal spheres-Electrolytic polishing
Cu single crystal spheres-Electrolytic polishing
Cu single crystal spheres-Electrolytic polishing
Cu single crystal spheres-Gas, preferential
Cu single crystal spheres-Salt, removal/preferential
Cu single crystal spheres-Thermal forming
Cu single crystal spheres-Thermal forming
Cu single crystal wafers of various orientations-Dislocation etching
Cu single crystal wafers-Chemical etching
Cu single crystal wafers-Chemical etching
Cu single crystal wafers-Dislocation etching
Cu single crystals-Chemical cleaning
Cu single crystals-Deformation
Cu specimens and copper alloys-Chemical etching
Cu specimens and copper alloys-Chemical etching
Cu specimens and parts-Chemical polishing-Copper britte dip etchant
Cu specimens-Acid cutting
Cu specimens-Chemical etching
Cu specimens-Chemical etching
Cu specimens-Chemical etching
Cu specimens-Chemical polishing
Cu specimens-Electrolytic polishing
Cu specimens-Electrolytic polishing
Cu specimens-Gas corrosion
Cu thin films evaporated on NaCl-Acid, float-off
Cu wire and OFHC copper parts-Chemical polishing/cleaning
Cu wire and coupons-Chemical cleaning
Cu, 25% Pb, 0.75% Ag alloy
Cu, Cu-Al alloys, brass
Cu, alpha brass
Cu, brass
Cu, brass (high Zn content)
Cu, brass, bronze alloys - Beraha's tint etch
Cu, high Cu alloys, phosphor bronze
Cu-30% Zn alloy
Cu-30% Zn alloy
Cu-30% Zn alloy
Cu-35% Zn alloy
Cu-4.85% Si alloy
Cu-48.9% alloy (atomic %)
Cu-8% Al alloy, Cu-0.5% Be alloy, Cu-5% Al-2% Si alloy
Cu-Ag alloy-Alloy with 20 wt % Ag
Cu-Ag alloys-Electro thinning
Cu-Ag alloys-Grain boundary etching (primary and deformed)
Cu-Ag-Al alloy-Electro polishing
Cu-Ag-Ni alloy-23Cu-75Ag-2Ni
Cu-Al alloy single crystal-Alloy with 0.3-0.7 at.% Al
Cu-Al alloys (to 50%)
Cu-Al alloys-Alloys with 5.5-7.5% Al
Cu-Al and Cu-Be alloys
Cu-Al system-Electro thinning by Bollmann technique
Cu-Al-Fe alloy-Alloy with 9% Al and up to 4% Fe
Cu-Al-Fe alloy-Ampco 8 6.3% Al, 2-5% Fe
Cu-Al-Mn alloys-Alloys with 3-4% Cu, 0.5 Mn
Cu-Al-Mn system-Electro thinning
Cu-Al-Ni alloy-82-83% Cu, 14-15% Al, 3% Ni
Cu-Al-Ni alloy-Chemical polishing
Cu-Al-Ni alloys-Chemical etching
Cu-Al-Ni-Fe alloy-Cu-10Al-5Ni-5Fe
Cu-Al-Si-Co alloy-Coronze CDA 638 95Cu-2.8Al-1.8Si-0.4Co
Cu-Al-Ti alloys-Cu-2% Ti-2.3-5% Al
Cu-Al-Ti alloys-Cu-9.5Al-0.75/2.5Ti
Cu-As alloys-Chemical etching
Cu-Au alloys
Cu-Au alloys-Electro polishing
Cu-Au alloys-Electro thinning
Cu-Au alloys-Electro thinning
Cu-Au alloys-Electro thinning
Cu-Au alloys-Electropolishing and micro
Cu-Au alloys-Electropolishing and micro
Cu-Au alloys-Primary etching (cast structures, segregation)
Cu-Au alloys-Secondary etching
Cu-Au and Cu-Au-Zn alloys-Electropolishing
Cu-Au single crystal (Cu3Au)-Electro polishing
Cu-B alloys-Chemical etching
Cu-Be alloys
Cu-Be alloys
Cu-Be alloys-Electro thinning
Cu-Be alloys-Electro thinning
Cu-Be alloys-Electro thinning
Cu-Be alloys-Electro thinning by Bolmann technique
Cu-Be alloys-Electro thinning by Mirand-Saulnier technique
Cu-Be spring shim stock-Chemical cleaning
Cu-Be-Co alloys-Cu-2% Be-0.3% Co
Cu-Be-Ni alloy specimens-Chemical etching
Cu-Bi alloys
Cu-Ce alloys-Electrolytic and chemical etching
Cu-Co alloy-Alloy with 2 at.% Co
Cu-Co alloys-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cu-Co alloys-Cast alloys <= 7 at.% Co
Cu-Co alloys-Cu-2/3% Co
Cu-Co alloys-Electro thinning
Cu-Cr alloys-Alloys with < at.% Cr
Cu-Cr eutectic alloy-Chemical etching
Cu-Cr-Zr alloy-Chemical etching
Cu-Fe alloy-Alloy with 2.5% Fe
Cu-Fe alloy-Alloy with 50% Cu
Cu-Fe alloys-Alloy with < 5.5 at.% Fe
Cu-Fe alloys-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cu-Fe single crystal-Up to 1.58 wt.% Fe
Cu-Fe, Cu-Co alloys-Electrolytic polishing
Cu-Fe-Ni alloy-19Cu-61Fe-20Ni
Cu-Fe-Ni alloys-Electro thinning by window technique
Cu-Ga alloy specimens-Chemical etching
Cu-Ga alloy specimens-Chemical etching
Cu-Ga alloys-Alloys with < 14.5 at.% Cu
Cu-Ga alloys-Beta phase quenched alloys
Cu-Ga alloys-Chemical polishing
Cu-Ga sulphide (CuGeS2 single crystal)-Chemical etching
Cu-Ga-In selenide-CuGa(x)In(1-x)Se2
Cu-Ga-Zn alloys-Cu - 20.4 at.% Zn - 12.5 at.% Ga
Cu-Ge alloy-Alloy with 6 at.% Ge
Cu-Ge alloy-Alloy with 8.5 at.% Ge
Cu-Ge alloy-Electrolytic polishing
Cu-Ge alloys-Alloys with < 9.5 at.% Ge
Cu-Ge alloys-Electro polishing
Cu-Ge alloys-Electro polishing
Cu-Ge alloys-Electro thinning
Cu-Ge alloys-Electro thinning by window technique
Cu-Ge alloys-Electrolytic polishing
Cu-Ge oxide system-Cu-GeO2
Cu-Ge-Sn alloys-Chemical etching
Cu-In alloy-Alloy with 9% In
Cu-In alloys-Electro thinning by window technique
Cu-In eutectoid-31.4% In
Cu-In-Se (CuInSe2)-Chemical polishing
Cu-In-Se (CuInSe2)-Chemical polishing
Cu-In-Se single crystals (CuInSe2)-Chemical etching
Cu-In-Te-Chemical etching
Cu-Mg alloys-Electro thinning
Cu-Mg-Ca alloys-Chemical etching
Cu-Mn alloys-Alloys with < 50 at.% Mn
Cu-Nb alloys-Cu-15-20Nb
Cu-Nb-Sn system-Cu-0.3/1.0Nb-0.2/0.5Sn
Cu-Ni alloys
Cu-Ni alloys-Electro thinning
Cu-Ni alloys-Electro thinning by window technique
Cu-Ni alloys-Physical etching
Cu-Ni-Al alloys
Cu-Ni-Co alloys-Chemical thinning
Cu-Ni-Cr alloy-Cu-32Ni-2Cr
Cu-Ni-Fe alloy-Cathodic etching
Cu-Ni-Fe alloy-Chemical and electro polishing
Cu-Ni-Fe system-32-64% Cu, 27-46% Ni, 9-23% Fe
Cu-Ni-Fe system-50/70 at.% Cu - 33/19 at.% Ni - 15/11 at.% Fe
Cu-Ni-Mn alloy-Cu-20Ni-20Mn
Cu-Ni-Nb alloy-Cu-30Ni-1Nb
Cu-Ni-Sn alloy-Cu-15Ni-8Sn
Cu-Ni-Sn alloy-Cu-15Ni-8Sn
Cu-Ni-Ti alloy-Cu-5Ni-2.5Ti
Cu-Ni-Ti alloys-27/47Ni-7/29Cu-44/46Ti, TiNixCu(1-x)
Cu-Ni-Ti alloys-Jet electro thinning, Cu-5-16Ni-4-4.5Ti
Cu-Ni-Zn alloys
Cu-Ni-Zr alloy-Ni-30Cu+0.2Zr, alloy Monel
Cu-P alloys-Cu-5-10% P
Cu-Pb alloys
Cu-Pb alloys - Vilella's reagent
Cu-Pb alloys-Good up to 30% Pb
Cu-Pb alloys-Selective etchant to allow SEM examination
Cu-Pd thin film-Chemical etching
Cu-Pt alloy-Chemical etching
Cu-Pt alloy-Electro thinning as Corke
Cu-Pt alloy-Electro thinning by window technique
Cu-Pt alloys-Electro etch in Corke and Amelincky's electropolish solution
Cu-Si alloy-Cu-0.24% SiO2
Cu-Si alloys
Cu-Si alloys-Electro polishing
Cu-Si alloys-Electro thinning
Cu-Si system-Electro thinning by Bollman technique
Cu-Si system-For alloys with 1% Si
Cu-Si system-For alloys with 17-25 at.% Si
Cu-Si-Zn alloys
Cu-Si-Zn alloys-Copper rich alloys
Cu-Sn (30%) standard bronze-Chemical etching
Cu-Sn alloys-Chemical etching
Cu-Sn alloys-Electro thinning by modified Mirand-Saulnier technique
Cu-Sn alloys-Electro thinning by window technique
Cu-Sn alloys-For alloys with 5 at.% Sn
Cu-Sn-Ag dental alloys - Crowell's reagent
Cu-Sn-Ag dental alloys-Chemical etching
Cu-Sn-As alloys-Chemical etching
Cu-Sn-Zn alloy-Cu-34 wt.% Zn-4% Si
Cu-Te alloys-Electro thinning
Cu-Ti alloys-Cu-1% Ti
Cu-Ti alloys-Electro polishing
Cu-Ti alloys-For alloys with < 5 wt.% Ti
Cu-Ti alloys-For alloys with < 9.5 at.% Ti
Cu-Ti alloys-For alloys with 1-4% Ti
Cu-V alloy-For alloys with < 14.7 at.% V and > 94 at.% V
Cu-W composite-Chemical polishing, electro polishing
Cu-Zn alloy specimens-Chemical etching
Cu-Zn alloy-Electrolytic polishing
Cu-Zn alloys (90-10 brass)-Chemical etching
Cu-Zn alloys (alpha-brass)-Chemical etching
Cu-Zn alloys (alpha-brass)-Electrolytic polishing
Cu-Zn alloys (gamma brass)-Electro thinning
Cu-Zn alloys-52.55 at.% Cu - 48.45 at.% Zn
Cu-Zn alloys-58 at % Cu - 42 at.% Zn
Cu-Zn alloys-Alloys with low Zn content
Cu-Zn alloys-Alloys with up to 35% Zn
Cu-Zn alloys-Copper and Cu-Zn alloys
Cu-Zn alloys-Electro polishing
Cu-Zn alloys-Electro thinning
Cu-Zn alloys-Electro thinning by Bollmann technique
Cu-Zn alloys-Electro thinning by window technique
Cu-Zn alloys-Electro thinning by window technique
Cu-Zn alloys-Electrolytic etching
Cu-Zn alloys-For alloys with < 30 at.% Zn
Cu-Zn alloys-For alloys with 38% Zn
Cu-Zn alloys-Zn rich alloys
Cu-Zn-Al alloy-47Cu-21Zn-2Al
Cu-Zn-Al alloy-Chemical etching
Cu-Zn-Al alloy-Cu68Zn15Al17
Cu-Zn-Al alloys-Electro thinning and polishing
Cu-Zn-Be alloys-Cu-20/30% Zn-0.11% Be
Cu-Zn-Ga alloys-Electro polishing
Cu-Zn-Mn alloys-44-48% Zn, 1-4% Mn
Cu-Zn-Ni alloy-IN 836 48Cu-37Zn-15Ni
Cu-Zn-Ni alloys-45-48% Zn, 2-5% Ni
Cu-Zn-Ni-Mn alloy-Alloy IN 629 Cu-28Ni-15Ni-13Mn. alloy IN 836 Cu-38Zn-16Ni-0.1Mn
Cu-Zn-Ni-Mn alloy-Alloy IN 829 44Cu-28Zn-15Ni-13Mn
Cu-Zn-Sn alloy-64 at.% Cu - 33.5 at.% Zn - 2.5 at.% Sn
Cu-Zn-Sn alloy-No etching
Cu-Zr alloy (CuZr)-Chemical etching
Cu-Zr alloys-Chemical etching
Cu-Zr alloys-For alloys with 40 wt.% Zr
Cu20 thin films-Acid oxidation
Cu2O native oxide-Oxide removal
Cu2O as a native oxide on copper surfaces-Acid removal
Cu2O as a native oxide thin film on surfaces-Oxide removal
Cu2O as a native oxide-Chemical etching
Cu2O material-Chemical polishing
Cu2O specimens-Chemical etching
Cu2O thin films-Chemical cleaning
Cu2Sb and SbAu2Sb specimens-Chemical etching
Cu3Au single crystal specimens-Electrolytic polishing
Cu3Au single crystal specimens-Electrolytic polishing
Cu4Te3 specimens-Chemical etching
Cu6PS3-halogens-Chemical etching
Cu6PS5-I single crystal-Chemical etching
CuBr single crystals-Chemical polishing
CuCl single crystals-Chemical polishing
CuGaS2 single crystals-Chemical cleaning
CuGaSe3 single crystal-Chemical etching
CuGaTe2 single crystals-Chemical etching
CuGe2P3 single crystal ingots-Chemical etching
CuI single crystals-Chemical polishing
CuInS2 (112) wafers-Dislocation etching
CuInS2 (112) wafers-Dislocation etching
CuInS2 (112) wafers-Dislocation etching
CuInS2 n-type wafers-Chemical polishing
CuInS2 n-type wafers-Photo etch-polishing
CuInS2 wafer-Chemical polishing
CuInS2 wafers-Chemical etching
CuInSe2 p-type wafers-Chemical cleaning
CuInSe2 single crystal-Chemical polishing/staining
CuInSe2 wafers-Chemical etching
CuInTe2 single crystals-Chemical etching
CuInTe2 thin films-Acid, float-off
CuInTe2 thin films-Chemical thinning
CuNi single crystal specimens-Chemical etching
CuS specimens-Chemical etching
CuZn (30%) specimens-Chemical etching
CuZn (30%) specimens-Chemical etching
Czochralski's etchant
D (100), (111), and (110) oriented wafers-Physical etching
D (111) oriented small parts-Detergent cleaning
D (111) platelets-Physical etching
D (111) single crystal specimens-Thermal processing
D (111) specimens-Sample preparation
D (111) wafers-Chemical cleaning
D (111) wafers-Ionized gas
D (111) wafers-Metal, implatantion
D, fabricated as artificial diamond
D43 alloy-Nb-10W-12V-0.1C
DeSy's etch
Deep-etching of Al-Si-For most aluminum and aluminum alloys
Delta ferrite phase in 316LS austenite stainless steel-Electrolytic etching
Delta-Pu and alloys
Determining grain structure in A356 aluminum
Determining grain structure in A356 aluminum
Deutron-Particle, transmutation
Diamond
Dickensens's reagent
Dickenson's etch
Different steels-Chemical etching
Disapol A2 electrolyte
Disapol D2 electrolyte
Disapol D2 solution
Dispersion strengthened ceramics-Thermal etching
Dix-Keller's etchant
Dix-Keller's reagent
Doped ZnO-ZnO-0.5 mole % each of Bi2O3, CaO, MnO, SnO2-1 mol.% Sb2O3, ie. ZnO-2.7% Bi2O3-0.4% CaO-0.4% MnO-0.9% SnO2-3.4% Sb2O3
Dow's etchant
Dual phase steel etchants-Chemical etching
Duaraluminium and Al cast alloys-Chemical etching
Dunn's method for revealing crystal orientation in Ta
Duplex stainless steel-Selective etching
Duplex stainless steel-Selective etching
Duplex stainless steel-With this etch, you can easily see your sigma phase
Duraluminium-Cathodic etching
Duraluminium-Chemical etching
Dy as single crystal spheres-Chemical etching
Dy-, Er-, Ho-, La-base alloys, RE-Co alloys-Chemical etching
Dy-Ag alloys-Chemical etching
Dy-Al alloys-Anodising
Dy-Au alloys-Chemical etching
Dy-Bi system-Chemical etching
Dy-Er alloys-Electolytic polishing and etching
Dy-Ho alloys-Electro polishing and etching
Dy-Pb system-Electro polishing
Dy-Pd alloys-Chemical etching
Dysprosium oxide-zirconia system (Dy2O3 x ZrO2)-Chemical etching
Dysprosium-Chemical etching
Dysprosium-Dy, Er, Gd, Ho base allyos. Rare earths-Co alloys
Dysprosium-Electro polishing
Dysprosium-Polishing and chemical etching
EBSD sample preparation
EBSD sample preparation
EBSD sample preparation
EBSD sample preparation
EBSD sample preparation
EBSD sample preparation
EI-IR etchant
Electroless Ni-For revealing the grain structure
Electroless copper plating 1
Electroless nickel 1 plating
Electroless nickel 2 plating
Electroless silver plating
Electrolyte A2
Electrolyte V2A 'Micro'
Electrolytes for TEM preparation od intermetallics
Electrolytic cobalt plating
Electrolytic iron plating 1
Electrolytic iron plating 2
Electrolytic nickel plating
Electropolishing NiTi alloys
Electropolishing pure titanium
Epsilon phase in Pb-Sb-Sn alloys-Chemical etching
Er as an evaporated thin film-Chemical etching
Er single crystal specimens-Thermal processing
Er, Dy, Gd, Ho, La
Er-Ag alloys-Chemical etching
Er-Al alloys
Er-Au alloys-Chemical etching
Er-Bi system-Chemical etching
Er-Fe system-Chemical polishing
Er-Ho alloys-Electro polishing and chemical etching
Er-Tb alloys-Electro polishing and chemical etching
Er-Y alloys-Electro polishing and chemical etching
ErH2 and ErH3-Acid, float-off
ErSi2 thin films grown on Si (100)-Thermal forming
Erbium alloys-Dy, Er, Gd, Ho base allyos. Rare earths-Co alloys
Erbium alloys-Electro polishing
Erbium alloys-Polishing, chemical etching
Erbium hydride (ErH2)-Chemical etching
Etch-polish of 304 stainless steel
Etchant for 316 SS Coreloy-This etchant should reveal the general microstructure
Etchant for ZnO varistor materials-For etching commercial ZnO varistors
Etchant for copper wire-Chemical etching
Etchant for neodymium-Chemical etching
Etchant for titanium aluminide-Chemical etching
Etchant of M-type ferrites-Chemical etching
Etchant/procedure to examine for overheated titanium-Chemical etching
Etchants for ZK60 Mg alloy-Chemical etching
Etchants for revealing prior austenite grain in alloy steels
Etches segregations in unalloyed and low alloy steels-Chemical etching
Etches the (100) texture of Cu-Chemical etching
Etching 14k Gold-For alloy with 70% Cu, 20% Ag, 10% Zn and also some amount of Si
Etching Rene 80 alloy-Electrolytic etching
Etching agent for 80Ni-20Fe-Chemical etching
Etching for grain boundaries in microalloyed steel
Etching of Zr-10% Ag-Chemical etching
Etching of gold-Chemical and electrolytic etching
Etching on a 90% Pb-Sn-Grain bondaries etching
Eu-Ag alloys-Chemical etching
Eu-Pb system-Electro polishing
Eu-Zr system-Chemical etching
Eu2O3 specimens-Chemical etching
Eu2O3-Chemical etching
Eu3Sc2Fe3OI2 single crystal
Europium
Europium oxide (Eu2O3)-Chemical etching
Europium-Electro polishing
Europium-The method of Roman can be used for polishing and etching
Eutectoid steel-Fe-0.8C-0.5Mn-0.2Si
Evidence of susceptibility for intercrystalline corrosion in Al-Mg alloys-Chemical etching
Exhaust valve steel-Fe-19Cr-8Ni-0.4C
Fe (100) wafers and other orientations-Chemical etching
Fe (100) wafers used in a magnetics study-Chemical etching
Fe (100) wafers-Chemical etching
Fe (100) wafers-Dislocation etching
Fe 3% Si steel-Electropolishing
Fe and Fe-C alloys
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels
Fe and most steels - Watertoen Arsenal etch
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe and steel
Fe as SST 305-Gas cleaning
Fe as SST 401 wire 0.020 diameter-Electrolytic forming
Fe as flat soft iron lap platens-Chemical cleaning
Fe as flat soft iron lap platens-Chemical cleaning
Fe as grey iron flame hardened-Chemical etching
Fe as grey iron specimens-Chemical etching
Fe as grey iron specimens-Chemical etching
Fe as iron alloy specimens-Ionized gas cutting
Fe as residual metal in vacuum systems-Chemical cleaning
Fe as stainless steel tubing-Chemical cleaning
Fe cast alloys-Will develop concentrations of Steatite
Fe colloidal spheres-Electrolytic forming
Fe polycrystalline discs-Electrolytic polishing
Fe polycrystalline specimens-Chemical cleaning
Fe polycrystalline specimens-Chemical etching
Fe polycrystalline specimens-Electrolytic polishing
Fe polycrystalline whiskers-Electrolytic polishing
Fe pure metal samples-Chemical etching
Fe pure metal samples-Chemical etching
Fe single crystal and polycrystalline spheres-Thermal forming
Fe single crystal spheres-Chemical etching
Fe single crystal whiskers-Chemical etching
Fe single crystal whiskers-Fe single crystal whiskers etched in this solution to observe dislocations
Fe single crystal whiskers-Thermal etching
Fe single crystals
Fe specimen-Cleaning and removal solution with some preferential attack
Fe specimens of alpha-iron-Electrolytic thinning
Fe specimens-Chemical etching
Fe specimens-Chemical etching
Fe specimens-Chemical etching
Fe specimens-Chemical etching
Fe specimens-Chemical polishing-Marshall's solution
Fe specimens-Heat cleaning
Fe specimens-Solution used as a general removal and surface cleaning etch
Fe specimens-Solution used as a polishing etch
Fe thin films deposited by MBE on GaAs, (110) wafer substrates-Chemical etching
Fe thin films deposited by MBE on GaAs, (110) wafer-Polishing
Fe(3-x)Ti(x)O4 single crystal-Chemical etching
Fe, Fe-C alloys, low-iron alloys
Fe, Fe-Si alloys
Fe, low-alloy steels
Fe, low-alloy steels
Fe, low-carbon steels
Fe, low-carbon steels
Fe, low-carbon steels, Fe-20% Ni-5% Mn alloy
Fe, low-carbon steels, low-alloy steels
Fe, mild steel - Modified Fry's reagent
Fe, most steels, stainless steels - Vilella reagent
Fe, single crystal iron spheres-Chemical etching
Fe, single crystal iron whiskers-Dislocation etching
Fe-26Cr-1Mn alloy (oxidised)-Electro polishing and electrolytic etching
Fe-3% Si alloy
Fe-3% Si alloy
Fe-3% Si alloy - Morris's electropolishing solution
Fe-3.25% Si alloy
Fe-Ag alloys-Chemical etching
Fe-Al alloy-Al-Al9Fe eutectic
Fe-Al alloy-Alloy with 35.5 at.% Al
Fe-Al alloy-Alloy with 8 wt.% Fe
Fe-Al alloys
Fe-Al alloys
Fe-Al alloys-Alloys with 2-6% Fe
Fe-Al alloys-Alloys with 49-54% Fe
Fe-Al alloys-Chemical etching
Fe-Al alloys-Electro polishing
Fe-Al alloys-Electro polishing with double jet
Fe-Al alloys-Electro thinning
Fe-Al-C alloys-Alloys with 7% Al and 1-2% C
Fe-Al-C alloys-Fe-0.3C-0.5-10Al
Fe-As alloys-For alloys with 0.2 - 1.4% As
Fe-As alloys-For alloys with 0.6 - 4.6 at.% As
Fe-Au alloys-Electro polishing
Fe-Au alloys-For alloys with 4% Au
Fe-B alloy-Fe80 - B20
Fe-B alloy-Fe80 - B20
Fe-B alloy-Fe80-B20
Fe-B alloy-Fe83-B17
Fe-B-Si alloy-Electro thinning for TEM
Fe-Be (20%) polycrystalline wire-Electrolytic cleaning
Fe-C (1.5%)-Ni (5%) alloy specimens-Chemical polishing
Fe-C-Cr alloy-Fe-0.1C-3Cr
Fe-C-Mn alloy-Fe-0.1C-3.1Mn
Fe-C-Ni alloy-Fe-0.6C-20Ni
Fe-C-Ni alloys-Fe-0.1/0.4C-3.3/7.5Ni
Fe-C-Si alloy-Fe-0.4C-1.7Si
Fe-Co alloys-Electropolishing
Fe-Co magnetic alloys
Fe-Co-Al alloy-Alloy with 15% Co and 11% Al
Fe-Co-Ni alloys-Chemical etching
Fe-Co-Ni-C-Cr-Mo alloy-HY-180M steel, Fe-0.16C-14Co-10Ni-2Cr-1Mo
Fe-Co-Si alloys-Electropolishing
Fe-Co-Ti alloys-10-20% Co, 2-6% Ti
Fe-Co-Ti alloys-82% Co-12% Fe-6% Ti
Fe-Co-V alloy-Chemical etching
Fe-Cr alloy-14-18% Chromium ferrite stainless steel
Fe-Cr alloy-Electro polishing, electro etching, chemical etching
Fe-Cr alloy-Fe-10Cr
Fe-Cr alloy-Fe-26Cr
Fe-Cr alloy-Thinning for electron microscopy
Fe-Cr alloys-Alloys with 15-20% Cr
Fe-Cr alloys-Chemical etching
Fe-Cr alloys-Electro thinning
Fe-Cr alloys-Fe-10/50 at.% Cr
Fe-Cr, Fe-Cr-Ni and Fe-Cr-Mn alloys-Chemical etching
Fe-Cr, Fe-Cr-Ni and Fe-Cr-Mn steels-Chemical etching
Fe-Cr-Al system-Chemical etching and thinning
Fe-Cr-Al system-Fe-10/50 at.% Cr-5/40 at.% Fe
Fe-Cr-C alloy-Chemical etching
Fe-Cr-C alloy-Chemical etching
Fe-Cr-C alloy-Electro thinning
Fe-Cr-C alloys-Fe-0.2C-5/10Cr
Fe-Cr-C alloys-Fe-0.8/1.2C-5/6Cr
Fe-Cr-C alloys-Fe-4.9% Cr-1.1% C
Fe-Cr-Co alloy-Fe-28Cr-10.5Co
Fe-Cr-Mn-C alloys-Chemical etching
Fe-Cr-Mn-Mo-C alloy-Chemical etching
Fe-Cr-Mn-Ti alloys-10Cr-4/5Si-12/16Mn-0.5/2Ti
Fe-Cr-Mo alloys-14-18 Cr - 2 Mo (+ 0.05% Ti), ferritic stainless steel
Fe-Cr-Mo alloys-Fe-24Cr-3Mo
Fe-Cr-Mo-C alloy-Chemical etching
Fe-Cr-Mo-Ni alloy-Fe-29Cr-4Mo-2Ni, stainless steel
Fe-Cr-Mo-Ti alloy-Fe-13Cr-1.5Mo-2.5Ti
Fe-Cr-Nb alloy-Pseudo-binary eutectic at 13.3% Nb and 23% Cr
Fe-Cr-Ni alloy-Fe-28Cr-5Ni
Fe-Cr-Ni alloys-Alloy 800, Fe-30/35Ni-19/23Cr
Fe-Cr-Ni alloys-Fe-16/18Cr-10/14Ni
Fe-Cr-Ni-C alloy-Chemical etching
Fe-Cr-Ni-C-Mo-Mn-Si alloy-Fe-9Cr-8Ni-3Mn-3Si-4Mo-026C
Fe-Cr-Ni-Mn-C alloy-Chemical etching
Fe-Cr-Ni-Mn-Mo-Si alloy-Fe-24.5Cr-5.5Ni-3.1Mo-0.6Mo-0.4Si
Fe-Cr-Ni-Mo alloy-Fe-24Cr-3Mo-5Ni
Fe-Cr-Ni-Mo-Cu-Mn-Si alloys-U50 alloy Fe-21Cr-7.4Ni-2.4Mo-1.8Cu-0.6Mn-0.5Si
Fe-Cr-Ni-Nb stainless steel-Fe-20Cr-25Ni-0.5Nb (+ C)
Fe-Cr-Si-Ti alloys-Fe-10/16Cr-4.5/6Si-2Ti
Fe-Cr-Ta alloy-Fe-1 at.% Ta-7 at.% Cr
Fe-Cr-Ti-Mo alloy-Fe-12Cr-2Mo-2.5Ti
Fe-Cr-Ti-Mo-Nb alloy-Fe-13Cr-2Mo-2.5Ti-1Nb
Fe-Cu-Ni alloy-Fe-2Cu-2Ni
Fe-Mn (1%) single crystal specimens-Chemical etching
Fe-Mn alloys-Alloys with 5-20% Mn
Fe-Mn alloys-Chemical etching
Fe-Mn alloys-Chemical thinning
Fe-Mn alloys-Chemical thinning
Fe-Mn alloys-Electro thinning
Fe-Mn alloys-Electro thinning
Fe-Mn alloys-Electro thinning by Bollman technique
Fe-Mn alloys-Fe-1 at.% Mn
Fe-Mn alloys-Fe-12% Mn
Fe-Mn system-Electro polishing
Fe-Mn system-Electro thinning
Fe-Mn-Al-C alloys-Electro thinning
Fe-Mn-Al-C-Co alloys-Electro thinning
Fe-Mn-Al-C-Cr alloys-Electro thinning
Fe-Mn-Al-C-Cu alloys-Electro thinning
Fe-Mn-Al-C-Mo alloys-Electro thinning
Fe-Mn-Al-C-Nb alloys-Electro thinning
Fe-Mn-Al-C-Si alloys-Electro thinning
Fe-Mn-Al-C-Ti alloys-Electro thinning
Fe-Mn-Al-C-V alloys-Electro thinning
Fe-Mn-C alloys-Fe-14% Mn-0.4% C, plus Cr, V, Mo
Fe-Mn-Si-Ti alloy-Fe-9Mn-4.7Si-2.5Ti
Fe-Mn-Zn pressed powder blanks-Chemical cleaning
Fe-Mo alloys-Alloys with 1.94% Mo
Fe-Mo alloys-Alloys with 11 at.% Mo
Fe-Mo alloys-Alloys with 12-20 at.% Mo
Fe-Mo alloys-Alloys with 8% Mo
Fe-Mo alloys-Electro polishing
Fe-Mo solid solution alloys-Chemical polishing
Fe-Mo-Al alloys-Electropolishing
Fe-Mo-C alloys-Fe-0.5/5Mo-1C with impurities
Fe-Mo-Co alloy-Chemical etching
Fe-Mo-Mn-C alloys-Chemical etching
Fe-Mo-N alloys-Alloys with 3 at.% Mo, 2-3 at.% N
Fe-Mo-Ni-C alloys-Chemical etching
Fe-N alloy-Alloys with 1.5% N2
Fe-Ni (5%)-O (15%) specimens-Chemical etching
Fe-Ni (65%) alloy specimens-Chemical etching
Fe-Ni alloys
Fe-Ni alloys
Fe-Ni alloys
Fe-Ni alloys-Alloys with 3-9% Ni
Fe-Ni alloys-Chemical and electro thinning
Fe-Ni alloys-Chemical thinning
Fe-Ni alloys-Electro thinning
Fe-Ni alloys-Electro thinning by Bollman technique
Fe-Ni alloys-Electro thinning by Bollmann technique
Fe-Ni alloys-Electro thinning by Bollmann technique
Fe-Ni alloys-Electropolishing
Fe-Ni alloys-Electropolishing
Fe-Ni alloys-Fe-10-40% Ni
Fe-Ni alloys-Fe-12 at.% Ni
Fe-Ni alloys-Fe-12Ni
Fe-Ni alloys-Fe-40/80Ni
Fe-Ni alloys-Jet electro polishing
Fe-Ni alloys-Low voltage electro thinning
Fe-Ni and Fe-Co magnetic alloys-Chemical etching
Fe-Ni and Fe-Co magnetic alloys-Grain size
Fe-Ni and Fe-Co magnetic alloys-Grain size
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Recommended for electron microscopy. Grain size, structure
Fe-Ni and Ni-Al alloys-Chemical etching
Fe-Ni or Fe-Co alloys-Electropolishing
Fe-Ni oxide couple-Chemical etching
Fe-Ni thin film-Chemical cleaning
Fe-Ni-Al alloys-Alloys with 10-60% Fe, 30-80% Ni, 4-30% Al
Fe-Ni-Al-C alloys-Electro thinning
Fe-Ni-Al-C-Co alloys-Electro thinning
Fe-Ni-Al-C-Cr alloys-Electro thinning
Fe-Ni-Al-C-Cu alloys-Electro thinning
Fe-Ni-Al-C-Mo alloys-Electro thinning
Fe-Ni-Al-C-Nb alloys-Electro thinning
Fe-Ni-Al-C-Si alloys-Electro thinning
Fe-Ni-Al-C-Ti alloys-Electro thinning
Fe-Ni-Al-C-V alloys-Electro thinning
Fe-Ni-Al-Ti alloys-Fe-3.4Ni-1.9/2.3Al-0.7/2.1Ti
Fe-Ni-As system-Chemical etching
Fe-Ni-B alloy-Fe40-Ni40-B20
Fe-Ni-B alloy-Fe50-Ni30-B20
Fe-Ni-C alloy-Alloy with 31% Ni and 0.3% C
Fe-Ni-C alloy-Electro polishing
Fe-Ni-C alloy-Fe-24Ni-0.5C
Fe-Ni-C alloy-Fe-31Ni-0.3C
Fe-Ni-C alloys-10-40% Ni, 0.1% C
Fe-Ni-C alloys-21-33 wt.% Ni, < 0.6 wt.% C
Fe-Ni-C alloys-Alloys with 20-30% Ni and < 0.6% C
Fe-Ni-C system-Fe-27Ni-0.03C
Fe-Ni-Co alloys-Fe, 29 wt.% Ni, 18 wt.% Co
Fe-Ni-Co alloys-Iron rich alloys
Fe-Ni-Co alloys-Ni, 68% Fe, up to 15% Co
Fe-Ni-Co-Ta alloys-Fe, 18/29 Ni, 8/20 Co, 2/3 Ta
Fe-Ni-Co-W system-Fe-17/18.5 Ni-8/9 Co-5/10 W
Fe-Ni-Cr alloy-Fe-15Ni-15Cr-single crystal
Fe-Ni-Cr alloys-Very low C stainless steel
Fe-Ni-Cr heat resistant casting alloys- Used after glyceregia; outlines carbides particles, stains sigma phase
Fe-Ni-Cr heat resistant casting alloys-Attacks sigma phase with little or no effect on carbide particles
Fe-Ni-Cr heat resistant casting alloys-Blackens sigma phase without oylining other phases
Fe-Ni-Cr heat resistant casting alloys-Electrolytic etching
Fe-Ni-Cr heat resistant casting alloys-Electrolytic etching
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Intermediate etch between Vilella's and ammonium hydroxide (electrolytic)
Fe-Ni-Cr heat resistant casting alloys-Outlines carbide and sigma
Fe-Ni-Cr heat resistant casting alloys-Stains austenite, then sigma phase, then carbide particles
Fe-Ni-Cr-Al-Y alloy-Austenite alloy, FeNi45Cr20Al5Y0.02
Fe-Ni-Cr-Mo-Nb-Ti-Al alloy-Inconel 718, Fe-22Ni-19Cr-5Mo-5Nb-1Ti-0.5Al
Fe-Ni-Cr-Nb-Ti-Al alloy-Fe-40% Ni-15.8% Cr-2.5% Nb-1.6% Ti-0.20% Al+C, Mn, B, superalloy 706
Fe-Ni-Cr-Ti-Al alloys-Fe-35Ni-15Cr-3(Ti+Al), Fe-35Ni-20Cr-3(Ti+Al)
Fe-Ni-Mn alloy-Fe-19-24% Ni-3-5% Mn
Fe-Ni-Mn alloys-Fe-6-8% Ni- 2-4% Mn
Fe-Ni-O alloys-Chemical etching
Fe-Ni-P alloys-Chemical and electrolytic thinning
Fe-Ni-Pt alloys-Etch for Pt rich, high Fe alloys
Fe-Ni-Ta alloy-Fe-32 at.% Ni-3 at.% Ta
Fe-Ni-Ti alloys-Chemical polishing and eletro thinning
Fe-Ni-Ti alloys-Fe-30Ni-6Ti
Fe-Ni-Ti alloys-Fe-33Ni-3Ti
Fe-Ni-Ti-Al alloy-Fe-34Ni-3Ti-0.5Al
Fe-Pd alloys-For Pd rich alloys
Fe-Pt alloys (approx. Fe3Pt)-Electro polishing
Fe-Pt alloys-Alloys with 20.5% Pt
Fe-Pt system-Chemical etching
Fe-Rh alloys-Alloy with approx. 50 at.% Rh
Fe-Sb alloys-For alloys with < 5% Sb
Fe-Si (3%) single crystal specimens-Electrolytic polishing
Fe-Si (4%) polycrystalline rods-Chemical etching
Fe-Si alloy sheet steel
Fe-Si alloys
Fe-Si alloys (1.75% Si)-Electro polishing and etching
Fe-Si alloys (3% Si)-Dislocation etch pit etch
Fe-Si alloys (3% Si)-Electro polishing
Fe-Si alloys (approx. FeSi2)-Chemical etching
Fe-Si alloys-Al, Al-Si alloys, Fe-Si alloys
Fe-Si alloys-Electro thinning
Fe-Si alloys-Electro thinning
Fe-Si alloys-Electro thinning
Fe-Si alloys-Electro thinning by Bollman technique
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Particullary good for Al-Si alloys
Fe-Si alloys-Universal electrolyte
Fe-Si single crystals-Chemical and elctrolytic etching
Fe-Si specimens and other iron alloys-Chemical etching
Fe-Si specimens-Electrolytic etching
Fe-Sn alloy (1.3% Sn)-Electro thinning
Fe-Sn alloy (Alpha-Fe alloys)-Chemical etching
Fe-Sn alloy (Alpha-Fe alloys)-Chemical polishing
Fe-Ta alloys-Alloys with low Ta
Fe-Ta alloys-Alloys with low Ta
Fe-Ti alloy (FeTi)-Chemical etching
Fe-Ti alloys-Electro thinning
Fe-Ti system (< 1.4% Ti)-Chemical polishing
Fe-Ti-Al alloys-Fe-0/24 at.% Al
Fe-TiC sintered carbides
Fe-V alloys (0.1 wt.% V)-Electro polishing
Fe-V alloys (0.49% V)-Electro thinning
Fe-V alloys-Chemical etching
Fe-W alloys (0.31% W)-Electro thinning
Fe-W alloys-Electro polishing
Fe-W-C alloy-Fe-0.21/0.75C-6.3/23W
Fe-W-Cr-V alloy-Fe-0.75C-18W-1.1V-4Cr
Fe-W-Mo-Cr-V-C alloy-M2 alloy, Fe-3.5W-3Mo-3.5Cr-1V-0.5C
Fe-W-Mo-Cr-V-Cr alloys-Etchants for carbides
Fe-Zn system-Actually used for distunguishing layer in galvanised plate
Fe/Ni specimen-Chemical polishing
Fe/Ni specimen-Electrolytic polishing
Fe2Al3Si3O12 as natural single crystal almandite-Chemical cleaning
Fe2Mo3O8 single crystals-Chemical etching
Fe2O3 natural single crystals-Chemical etching
Fe2O3 specimens and powder-Molten flux, removal
Fe2O3 thin film-Chemical etching
Fe3C in cast iron
Fe3C steel specimens and iron specimens-Chemical etching
Fe3C-Fe specimens-Chemical etching
Fe3Ge2 as a crystalline deposit-Chemical etching
Fe3Ge3 thin films-Chemical etching
Fe3O4 artificial single crystal magnetite-Cutting
Fe3O4 as fine natural single crystal-Chemical cleaning
Fe3O4 grown as a single crystal ingot-Chemical cleaning
Fe3O4 single crystal-Chemical etching
Fe3O4 single crystals-Chemical etching
Fe3O4 specimen-Chemical polishing
Fe3O4 specimens-Chemical etching
FeAl intermetalics-Chemical etching
FeAl single crystal specimens-Chemical etching
FeC single crystal alloys-Chemical thinning
FeGe2 (100) and (110) wafers-Chemical etching
FeGe2 (100) and (110) wafers-Chemical etching
FeO x nH2O the natural mineral limonite-Chemical cleaning
FeO(x) as thin film-Chemical cleaning
FeO(x) thin films-Chemical etching
FeP2 as precipitate-Chemical etching
FePd (100) and crystalline thin films-Gas corrosion
FeS2 as artificial and natural single crystals-Pressure
FeS2 single crystal ingot-Chemical polishing
FeSi (7.7%) single crystal (100)-Thermal de-stress
FeSi specimens-Gas etching
FeWSi thin films deposited on silicon, (100) wafers-Chemical etching
Ferrite specimens-Thermal etching
Ferritic Cr steels-Chemical etching
Ferritic and austenitic stainless steels
Ferritic and martensitic stainless steels, Mn steels, tool steels - Beraha's tint etch
Ferritic chromium steels-Ferritic chromium steels, min. 12% Cr
Ferritic stainless steel with 17% Cr-Electropolishing
Ferritic stainless steels
Ferritic stainless steels
Ferritic stainless steels - Aqua regia plus acetic acid
Ferromanganese, manganese silicate and Mn-Si-Cr alloys
Fine-grained, heavily deformed steels
Finlay's 'A' etchant (Remington's 'A' etchant)
Finlays 'B' etchant
Fisher-Marcinkowski's electropolish solution
Flat's reagent
Flick's Etch
Flick's etchant
Flinn's etch
Flint glass-Etching for revealing recrystallization effects
Flow lines in low carbon N2 steels, convertor steels-Chemical etching
Fluorapatite-Cu5FP3O12-Chemical polishing
Fluorine specimen
For Co and Co alloys
For most Al materials and Al alloys-Chemical etching
For most Al type alloys, Al-Be alloys-Chemical etching
For most Al types an alloys, especially Cu-containing alloys-Chemical etching
For most Al types and alloys except for Al alloys with high Si content, Al foils-Chemical etching
For most Ti materials and Ti alloys, Ti-Mn and Ti-V-Cr-Al alloys-Chemical etching
For most Ti materials, especially for Ti-Al-V-(Sn) alloys-Chemical etching
For most alloys of RE metals, CeMM alloys-Chemical etching
Frank's reagent
Fry's No. 1 etch
Fry's No. 2 etch
Fry's No. 4 etch
Fry's reagent (1)
Fry's reagent (2)
GTD-111 alloy etching-Be careful of overetching
GX6CrNi13-4 steel-Electrolytic-potentiostatic isolation of residues
GX6CrNi13-4 steel-Sample preparation
Ga (100) wafers-Chemical cleaning
Ga arsenide
Ga as a constituent in single crystal GaAs p-type wafers-Chemical etching
Ga as solid material-Chemical cleaning
Ga as solid material-Chemical cleaning
Ga as solid material-Chemical etching
Ga phosphide
Ga-As-P alloy (GaAsP)-Chemical polishing and etching
Ga-As-P specimens-(111) faces etched as cleaved. Dislocation etch in Abraham's AB etch
Ga-As-P specimens-GaAs(1-y)P(x), 0.6 >x<1
Ga-As-P system-Dislocation etching for (111)A -(111)B faces
Ga-As-P-Sb specimens-GaAs(x)Sb(y)P(1-x-y)
Ga-Au alloys-Chemical etching
Ga-Gd garnet-Gd3Ge4O12
Ga-In-As phosphide-Chemical etching
Ga-In-As phosphide-Chemical polishing
Ga-In-As phosphide-Chemical polishing
Ga-In-As phosphide-Chemical polishing
Ga-In-As phosphide-Etching for pit etch
Ga-In-As phosphide-In a study of etching characteristics of InGaAsP/InP wafers
Ga-In-As phosphide-Selective etching for GaInAsP against InP
Ga-In-Sb specimens-In(x)Ga(1-x)Sb
Ga-Nd garnet-Nd3Ga5O12
Ga2O3 and Ga(OH)3 on GaAs, (100), p-type wafers-Chemical etching
Ga2O3 as a native oxide on gallium arsenide wafers-Chemical cleaning
Ga2O3 as native oxide on GaAs (100) wafers-Physical etching
Ga2O3 as native oxide on GaAs-Physical etching
Ga2O3 doped with iron and grown as single crystal ferrites-Chemical etching
Ga2O3 thin film growth of GaAs, (100), p-type wafers-Chemical oxidizing
GaAs
GaAs (100) Si-doped wafers-Chemical cleaning
GaAs (100) Si-doped wafers-Chemical etching
GaAs (100) Te-doped wafer-Chemical cleaning
GaAs (100) Te-doped wafers-Chemical etching
GaAs (100) Zn-doped, p-type wafers-Chemical etching
GaAs (100) Zn-doped-Chemical cleaning
GaAs (100) and (111) wafers doped with Se, Te, Zn, and Pd-Dislocation etching
GaAs (100) and (111) wafers-Acid oxide removal
GaAs (100) and (111) wafers-Chemical cleaning
GaAs (100) and (111) wafers-Chemical cleaning
GaAs (100) and (111) wafers-Chemical etching
GaAs (100) and GaAs (111) wafers-Electrolytic oxidation
GaAs (100) and InSb (100) wafers-Etch cleaning
GaAs (100) ingot and wafers-Dislocation etching
GaAs (100) n+ wafers-Chemical etching
GaAs (100) n-type wafers grown by LEC as ingots-Chemical etching-Caro's etchant
GaAs (100) n-type wafers-Chemical cleaning
GaAs (100) n-type wafers-Chemical etching
GaAs (100) n-type wafers-Chemical etching
GaAs (100) n-type wafers-Chemical etching
GaAs (100) n-type wafers-Chemical etching/polishing/cleaning
GaAs (100) n-type wafers-Chemical polishing
GaAs (100) n-type, 0.001-0.04 Ohm cm resistivity wafers-Chemical thinning
GaAs (100) n/n +, Si-doped wafers-Chemical cleaning
GaAs (100) p-type wafers-Chemical cleaning
GaAs (100) p-type wafers-Chemical etching
GaAs (100) substrates-Chemical etching
GaAs (100) undoped wafers-GaAs (100) undoped wafers
GaAs (100) wafer Zn-doped-Chemical etching
GaAs (100) wafer substrates-Chemical thinning
GaAs (100) wafers Be diffused-Chemical etching
GaAs (100) wafers Cut 2-off plane toward (110)-Chemical cleaning
GaAs (100) wafers Used as substrates for Gunn diode-Chemical etching
GaAs (100) wafers and other low index planes-Chemical thinning
GaAs (100) wafers and other orientations-Chemical etching
GaAs (100) wafers and other orientations-Chemical etching
GaAs (100) wafers and other orientations-Dislocation etching
GaAs (100) wafers as substrates-Chemical etching
GaAs (100) wafers cut within 2-3 of plane-Chemical polishing
GaAs (100) wafers cut within /2 of plane, Te-doped-Chemical etching
GaAs (100) wafers doped with germanium-Chemical etching
GaAs (100) wafers fabricated as Schottky barrier diodes-Chemical thinning
GaAs (100) wafers fabricated as diodes-Electrolytic polishing
GaAs (100) wafers ion implanted with Si, Zn, and Be-Chemical thinning
GaAs (100) wafers ion implanted with zinc-Chemical etching
GaAs (100) wafers used as substrates for LPE growth of GaAlAs-Chemical etching
GaAs (100) wafers used as substrates for MBE deposition of AlGaAs-Chemical cleaning
GaAs (100) wafers used as substrates for OMVPE growth of GaInAs and GaInP layers-Dislocation etching
GaAs (100) wafers used as substrates for deposition of AlN-Chemical cleaning
GaAs (100) wafers used for epitaxy growth of InGaAs-Chemical cleaning
GaAs (100) wafers used for zinc diffusion at 85OC-Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion at 850C-Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion-Chemical polishing
GaAs (100) wafers used to fabricate Schottky barrier diodes-Chemical polishing
GaAs (100) wafers with epitaxy grown heterostructure-Chemical etching
GaAs (100) wafers zinc diffused-Chemical etching
GaAs (100) wafers zinc diffused-Chemical etching
GaAs (100) wafers, Zn diffused-Chemical etching
GaAs (100) wafers-Cemical thinning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing/cleaning
GaAs (100) wafers-Chemical thinning
GaAs (100) wafers-Dislocation etching
GaAs (100) wafers-Dislocation etching
GaAs (100) wafers-Electrolytic, oxidation
GaAs (100) wafers-Ionized gas
GaAs (100) wafers-Lift-off
GaAs (100) wafers-Metal, replication
GaAs (100) wafers-Physical thinning
GaAs (100), (111) and (110) wafers-Chemical etching
GaAs (100), (111) and (110) wafers-Chemical etching
GaAs (100), (111) and (110) wafers-Chemical etching
GaAs (100), (111), (110), (211) wafers-Chemical etching
GaAs (100), Te-doped, n-type wafers-Chemical cleaning
GaAs (100), and InP, (100) wafers-Chemical thinning
GaAs (100), n-type wafers-Chemical cleaning
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), wafers, Si or Be doped wafers-Chemical cleaning
GaAs (110) wafers were cleaved under UHV-Vacuum cleaning
GaAs (110), (111), (100) wafers-Chemical polishing
GaAs (110), (111), and (211) wafers-Chemical etching
GaAs (111) and (100) wafers-Chemical etching
GaAs (111) and (100) wafers-Chemical etching
GaAs (111) and (100) wafers-Chemical polishing
GaAs (111) and (100) wafers-Chemical polishing
GaAs (111) as single crystal wafers and spheres-Chemical etching
GaAs (111) n-type and undoped material-Chemical polishing
GaAs (111) wafer-Chemical etching-51 etchant
GaAs (111) wafers Cr, Te, and Zn doped-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical polishing
GaAs (111) wafers fabricated as Esaki diodes-Chemical polishing
GaAs (111) wafers used as substrates for epitaxy growth of Ge and ZnSe-Chemical etching
GaAs (111) wafers used in a polarity etching study-Chemical etching
GaAs (111) wafers used in a polarity study of III-V compound semiconductors-Chemical etching
GaAs (111) wafers used in a polarity study-Chemical etching
GaAs (111) wafers used in a polarity study-Chemical etching
GaAs (111) wafers used in a polarity study-Chemical etching
GaAs (111) wafers used in an etch development study-Chemical etching
GaAs (111) wafers used in an etch development study-Chemical etching
GaAs (111) wafers used in an etch development study-Chemical etching
GaAs (111) wafers with (111 )Ga surface polished-Chemical polishing
GaAs (111) wafers with zinc diffusion-Chemical etching-A/B etchant
GaAs (111) wafers-Chemical cleaning
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching-Schell's reagent
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Dislocation etching-RC-1 etchant
GaAs (111), (100) and (110) wafers-Dislocation etching
GaAs (111), (100), and (110) wafers-Chemical etching
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers-Chemical etching
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers-Chemical polishing
GaAs (111)A and (TTT)B wafers-Chemical polishing
GaAs (111)A wafer surfaces-Chemical etching
GaAs (111)A wafer-Chemical etching
GaAs (111)As, (100) and (110) oriented wafers-Chemical cleaning
GaAs (111)B and (100) both n-type and undoped wafers-Chemical etching
GaAs (1OO), n-type wafers-Chemical etching
GaAs Grown as a (111) ingot-Chemical etching
GaAs and GaP (100) and (111)B high n-type wafers-Chemical polishing
GaAs and GaP, etches A and B planes in GaAs-Chemical etching
GaAs and Si (100) wafers-Chemical etching
GaAs as thin film epitaxy grown on germanium substrate-Chemical etching
GaAs single crystal sphere-Chemical etching
GaAs single crystal spheres-Chemical etching
GaAs single crystal spheres-Chemical etching
GaAs specimens cut as cylinders and hemispheres-Chemical etching
GaAs wafers grown by orizontal Bridgman (HB) technique-Chemical etching
GaAs wafers of various orientations-Chemical polishing
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical polishing
GaAs wafers-Chemical polishing
GaAs wafers-Electrolytic etching-SSA etchant
GaAs, (100) wafers-Chemical cleaning
GaAs-Etchant for revealing twin lamellae by staining (211) and etching the (211)
GaAs-Etchant for revealing twin planes
GaAs-Etchant for revealing twin planes
GaAsB (111) n-type wafers and (100) undoped wafers-Chemical etching
GaAsBe (100) p-type wafers-Metal passivation
GaAsBe (110) p-type wafers-Chemical cleaning
GaAsCR (100)(SI) wafers-Chemical polishing/cleaning
GaAsCr (100) (SI) or n+ diffused wafers-Chemical etching
GaAsCr (100) (SI) wafers used as substrates for GaAs growth by MBE-Chemical cleaning
GaAsCr (100) (SI) wafers used as substrates-Oxide removal
GaAsCr (100) (SI) wafers used in a study of surface cleaning-Chemical polishing/cleaning
GaAsCr (100) (SI) wafers-Chemical cleaning
GaAsCr (100) (SI) wafers-Chemical cleaning
GaAsCr (100) (SI) wafers-Chemical cleaning
GaAsCr (100) (SI) wafers-Chemical cleaning
GaAsCr (100) (SI) wafers-Chemical cleaning/etching
GaAsCr (100) (SI) wafers-Chemical etching
GaAsCr (100) (SI) wafers-Chemical etching
GaAsCr (100) (SI) wafers-Chemical etching
GaAsCr (100) (SI) wafers-Chemical etching
GaAsCr (100) (SI) wafers-Chemical etching/polishing
GaAsCr (100) (SI) wafers-Chemical polishing
GaAsCr (100) (SI) wafers-Chemical polishing
GaAsCr (100) (SI) wafers-Chemical polishing
GaAsCr (100) (SI) wafers-Chemical polishing/etching
GaAsCr (100) (SI) wafers-Etch cleaning
GaAsCr (100) (SI) wafers-Oxidation/cleaning
GaAsCr (100) wafers within 1/2 degrees of plane-Chemical etching
GaAsCr (100) wafers-Chemical cleaning
GaAsCr (100), (111) (SI) and n-type Si doped wafers-Molten flux
GaAsCr, (100) (SI) and InPFe (100) (SI) wafers-Molten flux
GaAsCr, (100) (SI) wafers-Halogen, polish
GaAsTe (100) n-type wafer substrates-Chemical cleaning
GaAs; Zn, (100) wafers cut 2-3-off plane toward (110)-Chemical polishing
GaAsP wafers as highly p-type doped with Mn-Dislocation etching
GaFeO3 single crystal ingot-Acid, removal
GaN (0001) single crystal thin films-Chemical etching
GaN (0001) single crystal thin films-Electrolytic etching
GaN thin films grown by MBE on (0001), and (01.12) single crystals sapphire substrates to 1000 A thickness-Thermal cleaning
GaN thin films-Chemical etching
GaOxNy surface contamination of Gallium arsenide wafers-Chemical etching
GaP
GaP (100) and (111) wafers-Chemical polishing
GaP (100) and (111) wafers-Gas polishing
GaP (100) and (111)B, p-type, 0.2 Ohm cm resistivity wafers-Chemical polishing
GaP (100) n-type wafers-Chemical polishing
GaP (100) wafers-Chemical etching
GaP (100), (111)A and (111)B wafers-Chemical polishing
GaP (110) undoped wafers-Chemical polishing
GaP (111) and (100) wafers-Chemical polishing
GaP (111) and GaAs (111) wafers-Chemical polishing
GaP (111) and GaAs (111) wafers-Chemical polishing
GaP (111) and GaAs (111)A wafers-Chemical polishing
GaP (111) wafer-Chemical polishing
GaP (111) wafers zinc diffused-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching-Aqua regia, modified
GaP (111) wafers-Metal decoration
GaP (111), (100), (110) wafers-Chemical polishing
GaP (111)B wafers-Chemical etching
GaP (doped with S)
GaP material used for growth-of AlGaAsP single crystal ingots-Chemical cleaning
GaP polycrystalline material-Chemical cleaning
GaPO4 single crystals-Chemical ecthing
GaS
GaS (100), n-type wafers-Chemical polishing
GaSb (100) both undoped and Te-doped wafers-Acid passivating
GaSb (100) both undoped and Te-doped wafers-Acid passivation
GaSb (100) undoped and Te-doped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) wafers Te-doped-Chemical etching--A-B etchant
GaSb (100) wafers-Chemical etching
GaSb (100) wafers-Chemical polishing
GaSb (100) wafers-Chemical, oxide removal
GaSb (100), p-type wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical polishing
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (211) wafer-Chemical etching
GaSe
GaSe (0001) wafers-Mechanical, dislocation
GaTe specimens-Thermal etching for etch pits
Gadolinium molybdate (Beta-Gd2(MoO4)3)-Chemical etching
Gadolinium molybdate (Gd-Mo-O)-Etch pits etching
Gadolinium molybdate (Gd2(MoO4)3)-For revealing the antiphase boundaries
Gadolinium telluride (GdTe)-Chemical etching
Gadolinium-Chemical etching
Gadolinium-Chemical polishing and etching
Gadolinium-Electrolytic polishing
Gadolinium-Pure Gd, Rare earths-Co alloys. Grain boundary etch
Gallium antimonide (GaSb)-Chemical etching
Gallium antimonide (GaSb)-Chemical etching
Gallium antimonide (GaSb)-Chemical etching
Gallium antimonide (GaSb)-Growth striations are revealed by this etchant
Gallium arsenide (GaAs polycrystalline)-Chemical etching
Gallium arsenide (GaAs)- Germanium junction-Chemical etching
Gallium arsenide (GaAs)-A study of the etching characteristics
Gallium arsenide (GaAs)-Chemical and electro polishing
Gallium arsenide (GaAs)-Chemical etching
Gallium arsenide (GaAs)-Chemical etching
Gallium arsenide (GaAs)-Chemical etching
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical thinning
Gallium arsenide (GaAs)-Electrolytic etching
Gallium arsenide (GaAs)-Etch for selective removal
Gallium arsenide (GaAs)-Etch pits on (111) face
Gallium arsenide (GaAs)-Etching for etch pitch
Gallium arsenide (GaAs)-Etching for etch pitch
Gallium arsenide (GaAs)-For (001) face
Gallium arsenide (GaAs)-For (001) face. Anodic etch for dislocations
Gallium arsenide (GaAs)-For differentiation from InAs stain in sodium hypochloridesoln
Gallium arsenide (GaAs)-For etch pits etching
Gallium arsenide (GaAs)-For pitch etching
Gallium arsenide (GaAs)-Polishing and chemical etching
Gallium arsenide (GaAs)-Removing the surface damage
Gallium arsenide (GaAs)-Selective etch for dislocations on (111) plane
Gallium arsenide (GaAs)-The p-n junction
Gallium arsenide (GaAs)-To distingish p-n junction
Gallium arsenide (GaAs)-To distinguish between (111)Ga - (111)
Gallium nitride (GaN)-Electro etching
Gallium phosphide (GaP) single crystals-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing and etching
Gallium phosphide (GaP)-Chemical polishing and etching
Gallium phosphide (GaP)-Chemical polishing, chemical etching
Gallium phosphide (GaP)-Chemical thinning
Gallium phosphide (GaP)-Chemical thinning
Gallium phosphide (GaP)-Etch pits on (111)A, (111)B(100)
Gallium phosphide (GaP)-Etching (chemical polishing)
Gallium phosphide (GaP)-S doped n-type, Zn doped p-type
Gallium specimens-Chemical etching
Gallium specimens-Electro polishing
Gallium sulphide (GaS)-Dislocation etching
Gallium-selenium system (Ga-Se)-Chemical etching
Gallium-selenium system (Ga-Se)-Etch pits etching
Gallium-selenium system (Ga-Se)-Etch pits etching
Galvanized steel or Cd coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For tight and extra tight galvanized coatings
Galvannealed sample - Marshall's etch
Galvannel and hot-diped galvanized coatings on steels
Gamma phases in U-Mo alloys
Gamma-TiAl and alpha 2-Ti3Al-Chemical etching
Gamma-prime-age hardening, Ni-base alloys, grain-boundaries etch-Chemical etching
Garnets as natural single crystals-Chemical etching
Gd single crystal specimens-Thermal etching
Gd-Ag alloys-Chemical etching
Gd-Al alloys-GdAl, Gd3Al, Gd2Al
Gd-Bi system-Chemical etching
Gd-Cd alloys-Chemical etching
Gd-Ce alloys-Chemical polishing
Gd-Fe alloy-Laves phase GdFe2
Gd-Ga garnet-Gd3Ga5O12
Gd-Ga garnet-Gd3Ga5O12
Gd-Ga garnets-Chemical polishing
Gd-Yb alloys-Electrolytic polishing
Gd3Ga5O12 (0001) wafers 3" in diameter-Ketone cleaning
Gd3Ga5O12 (110) wafers-Abrasive polishing
Gd3Ga5O12 (111) cut wafers-Chemical cleaning
Gd3Ga5O12 (111) wafers-Abrasive polishing
Gd3Ga5O12 garnet-Chemical etching
Gd3Ga5O12 garnets-Chemical etching
Gd3Se1.8Ga3.2O12 (0001) wafers-Chemical cleaning
GdN12 specimens-Chemical etching
GdTbFe thin films-Chemical etching
Ge (100) and (110) wafers-Chemical etching
Ge (100) and (111) wafers-Metal etching
Ge (100) specimens-Electrolytic machinning
Ge (100) very thin films grown by PECVD on NaCl, Ge wafers-Thermal cleaning
Ge (100) wafers and other orientations-Chemical polishing/etching-Camp #4 (CP4) etchant
Ge (100) wafers cut within 1 of plane-Physical cleaning
Ge (100) wafers-Chemical etching-100 etchant
Ge (100) wafers-Chemical etching-Peroxide etchant (on germanium)
Ge (100) wafers-Vacuum cleaning
Ge (111) 5-10 Ohm cm resistivity n-type wafers-Chemical etching
Ge (111) and (100) wafers used as substrates-Chemical polishing
Ge (111) and (100) wafers-Chemical etching
Ge (111) and (100) wafers-Solution used as a preferential etch
Ge (111) and Si (111) wafers-Chemical polishing/etching-111 etchant
Ge (111) dendritic ribbon crystals-Dislocation etching
Ge (111) grown ingot with grown-in p-n junction-Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction-Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction-Electrolytic etching
Ge (111) ingots with grown-in p-n junction-Electrolytic etching
Ge (111) n-type wafers-Chemical etching
Ge (111) n-type wafers-Electrolytic etching
Ge (111) n-type, 0.004-40 Ohm cm resistivity wafers-Electrolytic polishing
Ge (111) rectangular bars with grown p-n junctions-Chemical etching
Ge (111) wafer and spherical shot-Chemical etching
Ge (111) wafer with p-n junctions-Electrolytic etching
Ge (111) wafers and cylinders-Metal diffusion
Ge (111) wafers and ingots-Chemical etching
Ge (111) wafers and other orientations-Chemical etching
Ge (111) wafers and other orientations-Chemical etching
Ge (111) wafers and other orientations-Chemical etching
Ge (111) wafers and other orientations-Electrolytic etching
Ge (111) wafers and other orientations-Gas oxidation
Ge (111) wafers angle lapped at 543'-Chemical etching
Ge (111) wafers fabricated as p-n junction diodes-Chemical etching
Ge (111) wafers fabricated with indium p-n junctions-Junction testing
Ge (111) wafers lithium diffused-Chemical etching
Ge (111) wafers p-type-Chemical polishing
Ge (111) wafers used as substrates for Ge epitaxy growth-Chemical etching
Ge (111) wafers with epitaxy grown Ge layers-Gas ecthing
Ge (111) wafers with indium-Metal decoration
Ge (111) wafers with lithium diffused p-n junctions-Chemical etching
Ge (111) wafers, p-type, 4 Ohm cm resistivity-Chemical polishing
Ge (111) wafers-Abrasive, damage
Ge (111) wafers-Acid, stress
Ge (111) wafers-Chemical cleaning
Ge (111) wafers-Chemical cleaning
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching-Camp #2 (Superoxol, CP2) etchant
Ge (111) wafers-Chemical etching-Camp #3 (CP3) etchant
Ge (111) wafers-Chemical etching-WAg etchant
Ge (111) wafers-Chemical etching-White etchant
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing-BJ etchant
Ge (111) wafers-Chemical polishing-X-l114 etchant
Ge (111) wafers-Chemical polishing/etching-SR4 etchant
Ge (111) wafers-Cleave
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic plating
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Junction testing
Ge (111) wafers-Metal, structure
Ge (111), (100), (110) and (211) wafers-Chemical etching
Ge (111), (100), (110) and (211) wafers-Chemical etching
Ge (111), (100), (110) and (211) wafers-Chemical etching
Ge (111), (100), (110), and (211) wafers-Chemical etching
Ge (111), (100), (110), and (211) wafers-Chemical etching
Ge (111), (100), (110), and (211) wafers-Chemical etching-CP4, dilute CP4, modified
Ge (111), (100), and (110) wafers-Chemical polishing
Ge (111), (110) and (100) wafers-Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres-Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres-Chemical etching
Ge (111), (110), and (211) wafers-Chemical etching
Ge (111), p- and n-type wafers-Electrolytic polishing
Ge and Ge alloys
Ge and Ge alloys
Ge and Ge alloys
Ge and Ge alloys
Ge and Ge alloys
Ge and Ge alloys - Westinghouse W Ag etch
Ge and Ge alloys, GaAs, InAs, and AlAs, dislocations on the (111) planes, grain boundary etchant-Chemical etching
Ge and Ge alloys, grain-contrast etchant-Chemical etching
Ge and InP (100) and (111) wafers-Chemical thinning
Ge and Si discs
Ge and Si specimens-Halogen, laser
Ge and Si specimens-Metal, laser
Ge and Si wafers-Chemical etching
Ge and Si wafers-Chemical polishing
Ge and Si wafers-Electrolytic oxidation
Ge and Si wafers-Ionized gas cleaning
Ge as alloy junction transistors-Molten flux polishing
Ge as alloyed p-n junctions devices-Chemical etching
Ge as cut cubes oriented (001)/(001)(110)/(110)-Chemical polishing
Ge as devices with evaporated metal contacts-Contact etching
Ge as polyerystalline spheres-Thermal forming
Ge as single crystal spheres-Chemical polishing
Ge as single crystal spheres-Molten flux etching
Ge as single crystal-Chemical polishing/etching
Ge as surface barrier diodes-Chemical etching
Ge both p- and n-type specimens-Electrolytic etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching-Ferric cyanide etchant
Ge hemispheres-Chemical etching-Superoxol #2
Ge hemispheres-Chemical etching-Superoxol, dilute
Ge hemispheres-Chemical etching-Superoxol, varity
Ge hemispheres-Ge hemispheres used in a preferential etching study
Ge ingot-Alkali, cutting
Ge n-p-n transistors-Electrolytic etching
Ge n-type wafers-Chemical polishing
Ge p-n diffused diode-Electrolytic etching
Ge p-n-p transistors-Acid passivation
Ge p-n-p transistors-Electrolytic passivation
Ge polycrystalline spheres-Gas cleaning
Ge samples-Irradiation
Ge single crystal hemispheres-Chemical etching
Ge single crystal specimens
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal wire filaments-Electrolytic shaping
Ge single crystal-Acid, cover
Ge single cyrstal spheres-Chemical etching
Ge specimens
Ge specimens-Acid oxidation
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical etching
Ge specimens-Chemical polishing
Ge specimens-Electrolytic etching
Ge specimens-Electrolytic etching
Ge specimens-Electrolytic removing
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Ge specimens
Ge specimens-Metal, optics
Ge specimens-Power, plasticity
Ge sphere-Chemical etching
Ge spheres and hemispheres-Chemical etching-Ellis's #1 etchant
Ge spheres and hemispheres-Chemical etching-Ellis's #5 etchant
Ge spheres and hemispheres-Ge spheres and hemispheres-Ellis's #7 etchant
Ge spheres of single crystal germanium and silicon-Chemical polishing
Ge thin films evaporated on GaAsCr (SI) substrates-Chemical cleaning
Ge thin films evaporated on GaAsCr (SI) substrates-Chemical etching
Ge thin films evaporated on Si, Al, Al2O3, GaAs, C substrate-Physical etching
Ge thin films-Dislocation etching
Ge wafers doped with copper-Chemical polishing
Ge wafers of different orientations-Chemical cleaning
Ge wafers of different orientations-Dislocation etching
Ge wafers studied for neutron irradiation effects
Ge wafers used as substrates-Chemical polishing
Ge wafers-Chemical etching
Ge wafers-Chemical etching
Ge wafers-Chemical etching
Ge wafers-Chemical etching
Ge wafers-Chemical polishing
Ge wafers-Chemical polishing/etching
Ge wafers-Chemical thinning
Ge wafers-Metal, contamination
Ge(x)Se(1-x) thin films-Chemical etching
Ge(x)Se(x-1) thin films-Chemical etching
Ge, Si-B-P alloys-Chemical etching
Ge-In alloys
Ge-In alloys with Ag, Au, Bi, and Cu additions, grain boundary etchant-Chemical etchant
Ge-Si alloys-Chemical etching
Ge-Zn eutectic-Chemical etching
Ge2O3, DC sputtered thin films-Chemical etching
Ge3N4 and Ge3O(1-x)N(x)-Chemical etching
Ge3N4 and Ge3OxNy thin films-Chemical etching
Ge3N4 thin films-Gas densification
GeAs (111) wafer-Chemical etching
GeAs (111) wafers-Chemical etching
GeAs (111) wafers-Chemical etching
GeAs (111) wafers-Chemical etching
GeAs (111) wafers-Chemical etching
GeO glass-Alcohol cleaning
GeO2 as glass blanks-Chemical cleaning
GeO2 thin films-Gas forming
GeS single crystal platelets-Chemical cleaning
GeTe single crystal specimens-Chemical etching
General-purpose solution
General-purpose solution
General-purpose solution
General-purpose solution
General-purpose solution
Germanium telluride (GeTe)-Chemical etching
Germanium-Chemical etching
Germanium-Chemical etching
Germanium-Chemical etching
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing and etching
Germanium-Electrolytic etching
Germanium-Electrolytic polishing
Germanium-Electrolytic polishing
Germanium-Electrolytic polishing
Germanium-Electrolytic polishing
Germanium-Electropolishing
Germanium-Electropolishing
Germanium-Electropolishing
Germanium-Etch pits etching
Germanium-Etch pits etching
Germanium-Etch pits etching
Germanium-Etch pits on (111) face
Germanium-Etch pits on n-type (111) face
Germanium-Etchant for revealing twin planes
Germanium-Final chemical polishing
Germanium-For removal of surface damage
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge
Germanium-Ge - Superoxol etch
Germanium-Ge - Westinghouse silver etch
Germanium-Ge and its alloys. GaAs, InAs, Al As. Grain boundaries. Dislocations on (111) planes
Germanium-Ge and its alloys. Grain boundaries
Germanium-Ge and its alloys. Grain contrast
Germanium-Ge, Te, Se, telurides, selenides and Zr silicide
Germanium-Ge-In alloys with Ag, Au, Bi, Cu additions
Germanium-Jet polishing, chemical polishing
Germanium-Jet thinning by chemical polishing
Germanium-Removal of work damage by ethching
Germanium-Se, Ge, and their alloys. InAs, InSb, GaSb, GaAs, AlSb, ZnTe, CdTe, InP
Germanium-Si, Ge, and their alloys
Germanium-Si, Ge, and their alloys. GaSb, InSb
Germanium-Si, Ge, and their alloys. InSb. Etch pitch on (111) planes , p-n junctions
Gilman's solution (1)
Gilman's solution (2)
Glass - Microscope slides-Chemical etching
Glass as microscope slides-Chemical cleaning
Glass fiber reinforced epoxy resins-Chemical etching
Glass fiber reinforced epoxy resins-Chemical etching
Glass fiber reinforced polyester resins-Chemical etching
Glass reinforced polymeric materials-Chemical etching
Glass, soda-lime blanks-Chemical cleaning
Glass-borosilicate and soda-lime-Chemical cleaning
Glass-lead, soda-lime, borosilicate-Thermal processing
Glass-soda-lime-Chemical cleaning
Glass-soda-lime-Chemical lapping/etching
Glass-thin film deposition and growth-Chemical cleaning-AB etchant (RCA)
Glass-various types, as both sheet and rods-Chemical cleaning
Glass-various types-Chemical cleaning
Glass-various types-Chemical cleaning
Glass-various types-Chemical cleaning
Glass-various types-Chemical cleaning
Glass-various types-Chemical etching
Glass-various types-Chemical etching
Glyceregia (1)
Glyceregia (2)
Gold alloy-Electrolytic etching
Gold alloys-Chemical etching
Gold and gold alloys-Electropolishing
Gold and precious metals-Chemical etching
Gold single crystal-Electro polishing
Gold specimens-Au alloys with less thn 90% content of precious metals
Gold specimens-Au, Pt alloys and Pd alloys
Gold specimens-Electro polishing
Gold specimens-Electro polishing
Gold specimens-Electro polishing
Gold specimens-Electro thinning
Gold specimens-Electrolytic polishing
Gold specimens-Electropolishing
Gold specimens-Electropolishing
Gold specimens-Electropolishing
Gold specimens-Electropolishing
Gold specimens-Etching for etch pits
Gold specimens-For Au alloys with high content of precious metals. White gold. Pd and Pt alloys
Gold specimens-Grain contrast
Gold specimens-Pt and Pt alloys, Au and Au alloys
Gold specimens-Pure Au and Au-rich alloys. Pd and Pd alloys
Gold specimens-Pure Pt and Pd. Au alloys
Gold-Au
Gold-Au
Gold-Au
Gold-Au
Gold-Au
Gold-Au
Gold-Au and high-noble metal alloys
Gold-Chemical etching
Gold-Chemical etching
Gold-Electrolytic lapping
Gold-Plated nickel-iron (Au-Ni-Fe)-Electric contact material
Gold-Pure Au and Pd
Gold-Silver clad palladium (Au-Ag, Pd)-Electric contact material
Gold-silver-platinum (Au-Ag-Pt)-Electric contact material
Gorsuch's etchant
Grain boundaries in Zinc layer of electrogalvanized steel sheet
Grain boundaries in heat treated Cr alloy steels-Chemical etching
Grain boundaries in martensitic microstructures-Chemical etching
Graphite porous-Physical etching
Grard's No.1 reagent
Gray cast irons-Colour etchant
Green's contrast etchant
Griffis and Spretnak's etch
Groesbeck and titanium nitride etchant-Alloys with Cr and or Co
Groesbeck's etchant
Gypsum single crystal-CaSo4 x 2H2O
H13 tool steel
HA-36 (Co alloy)
HAFNIC 10 alloy-Ni-10Cr-5Al-5Co-8.3Hf-1.1Zr-0.7C
HS-31, HA-151, N-155 (Co alloys)
HSLA steels
HT 12 steel-Fe-0.08C-1.5Mn-0.3Si-0.05Nb. Etch to differentiate old and recently formed ferrite by annealing
Hadfield Mn steel-Fe-1.13C-11
Hafnia-Chemical etching
Hafnia-scandia system-Chemical etching
Hafnium and alloys-Chemical etching
Hafnium and its alloys-Zircalloy-2
Hafnium carbide (HfC)-Chemical polishing
Hafnium diboride (HfB2)-Chemical etching
Hafnium diboride (HfB2)-Chemical etching
Hafnium single crystal-Chemical polishing
Hafnium specimens-Zicaloy-2 and Hf
Hafnium specimens-Zr and Hf and their alloys with small additional constituents
Hafnium specimens-Zr anf Hf and their alloys
Hafnium-Chemical polishing
Hafnium-Chemical polishing
Hafnium-Electrolytic polishing
Hafnium-Electropolishing
Hafnium-Electropolishing
Hafnium-Hf
Hafnium-Hf
Hafnium-Hf
Hafnium-Hf
Hafnium-Hf
Hafnium-Hf base alloys
Hafnium-Thinning for transmission electron microscopy (TEM)
Hafnium-Used to polish Hf wires
Hafnium-Zr and Hf base alloys. Zr-Nb alloys
Hafnium-pure and low alloy Hf and Zr for observation in polarized light
Hard Au-Soft Au electroplate
Hard facing alloys-Chemical etching
Hard facing alloys-Phsyical etching
Hard metals-Chemical etching
Hardmetals-Electrolytic polishing
Hasson's etchant
Hasson's tint etch for Mo
Hastelloy W
Hastelloy X
Hastelloy X
Hastelloy X etching-Electrolytic etching
Hastelloy X-Chemical etching
Hastelloy X-Ni-22Cr-18.5Fe-9Mo-0.6W
Hasteloy B-Ni-28Mo-1Fe-0.7Cr+C
Hatch's reagent
Hayness No. 21 alloy-Electrolytic etching
Hayness No. 21 alloy-Electrolytical etching
Hayness No. 25 alloy-Shows magnetic domain
Hayness No. 30, X40 alloys-Electrolytic etching
Hayness No. 36 alloy-Electrolytic etching
He-Au alloys-Chemical etching
Heat resistant steels
Heat resistant steels-Chemical etching
Heat resisting alloys-Electrolytic polishing
Heat resisting alloys-One of the best electrolyte for universal use
Heat treated 18/8 steels-Chemical etching
Heat treated Ti alloys
Heat treated steels
Heat-resisting steels and alloys-Color etching
Heat-resisting steels and alloys-Color etching
Heat-resisting steels and alloys-Color etching
Heat-resisting steels and alloys-Color etching
Heyn's etch
Heyn's etchant
Hf and Zr alloys, Zr-Nb alloys-Chemical polishing
Hf single crystal wafers and HfN thin films-Chemical cleaning
Hf specimens-Chemical etching
Hf thin films deposited on silicon wafers-Chemical etching
Hf, Zr and allloys - Cain's chemical polish and etch
Hf, Zr, and alloys
Hf, Zr, and alloys
Hf, Zr, and alloys
Hf-Al-Pa system-HfAl1.67Pd0.23
Hf-C alloys
Hf-C alloys-Etch for detecting free hafnium
Hf-Cr alloys-Chemical etching
Hf-Cr alloys-Electro etching
Hf-Cr and Hf-V alloys
Hf-Er system-Chemical etching
Hf-Er-Sc system-Chemical etching
Hf-Ir system-Chemical and electrolytic etchant
Hf-Nb alloys (Hf rich)-Electrolytic polishing and jet electro thinning
Hf-Nb alloys-Chemical etching
Hf-Nb alloys-Chemical polishing and electrolytic polishing
Hf-Nb-B system-Chemical etching
Hf-Nb-Si system-Hf(85-x)Nb(x)Si(15); x< 45
Hf-O system-Chemical etching
Hf-O system-Hf-HfO2 section
Hf-Si system (Hf85Si15)-Electro thinning
Hf-Ta alloys-Chemical polishing
Hf-V alloys-Electrolytic etching
Hf-V, Hf-Cr alloys
Hf-V-Si system-Hf(85-x)V(x)Si(15); x < 37
Hf-W alloys
Hf-W alloys-Chemical etching
Hf-W eutectoid alloys - Cain's chemical polishing and etching reagent
Hf-Y-O system (HfO2-Y2O3)-Physical etching
Hf3Sn2 single crystal specimens-Chemical etching
HfB-TaB2-Chemical etching
HfB2 and ZrB2
HfB2 with TaB2, ZrB2-Chemical etching
HfB2-NbB2-Chemical etching
HfB2-TaB2-Chemical etching
HfC carbide-Chemical etching
HfN thin film-Chemical cleaning
HfO2
HfO2
Hg applied as a thin film-Chemical etching
Hg as a smeared surface contact-Ketone, freezing
Hg liquid frozen by submersion in LN2-Gas etching
Hg liquid frozen into solid form-Gas etching
Hg liquid frozen-Air etching
Hg(1-x)Cd(x)Te (111) wafers-Chemical etching
Hg(1-x)Cd(x)Te single crystal-Chemical polishing
HgAg natural single crystal-Acid, removal
HgCdTe (111) thin films-Chemical etching
HgCdTe (111) wafers and other orientations-Chemical polishing
HgCdTe (111) wafers-Chemical polishing
HgCdTe single crystal ingots and wafers-Chemical etching
HgCdTe single crystal material-Chemical polishing/etching
HgCdTe single crystal wafers-Chemical polishing
HgCdTe specimens-Chemical polishing
HgCdTe thin films-Chemical etching
HgCdTe wafers-Chemical etching
HgI2 single crystals-Ketone, growth
HgO as a native oxide on mercury-Chemical etching
HgSe
HgSe (111) wafers-Chemical etching
HgSe (111) wafers-Chemical etching
HgSe (111) wafers-Chemical polishing
HgSe single crystal specimens-Chemical polishing
HgTe
HgTe (111) wafers-Chemical etching
HgTe (111) wafers-Dislocation etching
HgTe single crystal wafers-Chemical polishing
High Cr containing alloys, Cr silicide, galvanic Cr layers, Mo-Cr-Fe alloys, U-Nb alloys, V and V-base alloys, ferrovanadium-Electrolytic etching
High Ni-alloys
High alloy content steels-Revelas different structural constituents in high alloy steels
High alloy steel specimens-Etching to reveal segregations
High alloy steels - Schrader's modification of Vilella's etch
High alloy steels and castings-Chemical etching
High alloy steels, austenitic Mn steels, stainless steels - Glyceregia
High alloy steels-Electropolishing
High carbon silicon steel-Fe-0.75/1C-2/2.4Si, 0.4/0.8Cr-0.5Mn
High carbon steel-Steel with 1.2% C
High carbon steels-Colour etchant
High purity Al, most Al alloys, grain boundaries are preferentially attacked-Chemical etching
High purity alloy of Cu and 10% Zn
High speed steels
High speed steels
High speed steels
High speed steels
High speed steels
High speed steels, martensitic and stainless steels
High speed steels-Chemical etching
High speed steels-Chemical etching
High speed steels-Electrolytic polishing
High speed steels-Electropolishing
High speed steels-To reveal grain size in quenched and tempered high speed steels
High stregth steels-Extraction of the precipitates
High temperature CrMoN steels-Electropolishing
High temperature CrMoN steels-Electropolishing
High temperature nickel alloys-Chemical and electrolytic etching
High temperature supercondictors (YBa2Cu3O7)-For revealing grain boundaries, twin boundaries and cracks
High-Cr cast irons
High-Si irons
High-Si irons and steels
High-alloy steels
High-alloy steels
High-alloy steels
High-alloy steels, stainless steels
High-alloy steels-Electrolytic etching
High-alloy, corrosion-reistant steels-Chemical etching
High-purity Al
High-purity Al, Al-Mg alloys
High-purity U
High-purity martensitic Fe-C alloys
High-temperature alloys-Electrolytic polishing
Ho single crystal specimens-Thermal etching
Ho-Ag alloys-Chemical etching
Ho-Bi system-Chemical etching
Ho-Co alloy sputter deposited on Glass and NaCl, (100) substrates-Ionized gas cleaning
Ho-Fe alloys-Chemical etching
Ho-Fe alloys-Chemical etching
Ho-Tb alloys-Electrolytic polishing
Ho2Co14Fe3 specimens-Chemical polishing
Ho2Fe17 and Ho2Co14Fe3 specimens-Chemical etching
Ho2O17 specimens-Chemical polishing
HoCu2Ge2 single crystal specimens-Chemical etching
Holmium specimens-Chemical etching
Holmium specimens-Electrolytic polishing
Holmium specimens-Sample preparation procedure
Hot-dipped galvanized steels
Howarth's reagent
Huber and Linh's 'H' solution
Hydal's etchant
Hydrated rricalcium silicate-Chemical etching
Hydrated tricalcium silicate iron oxide system-Chemical etching
Hydrated tricalcium silicate-Chemical etching
Hydride in Zr-Nb alloys-Chemical etching
Hydrides in Ti, alpha-beta alloys-Chemical etching
Hydrochloric acid (HCl)-Gas cleaning
Hydroxyapatite-Ca5(PO4)3 x OH
Hypoeutectoid and hypereutectoid alloy steels
I.M.I. 685 alloy-Ti-6Al-6Zr-0.5Mo-0.25Si
IF steel
IN 100 alloy-56.1Ni-5.0Al-4.5Ti-12Cr-3.2Mo-18.4Co-0.8V-0.09C (+B) by weight
IN 738 alloy-Electrolytic-potentiostatic isolation of residues
IN 738 alloy-Sample preparation
INCO 625 alloy-Chemical etching
Identification of intermetallic phases in Al alloys-Chemical etching
In (100) wafers-Chemical etching
In and lean alloys
In and lean alloys - Vilella's reagent
In as pellets-Chemical cleaning
In preform sheet alloyed on germanium (111) wafer-Chemical etching
In rich alloys
In single crystal ingot-Chemical etching
In single crystal wires-Electrolytic etching
In specimens-Chemical etching
In, In-Sb and In-As alloys
In-738 superalloy-Ni-0.2C-3.5Al-3.6Ti-8.4Co-15.75Cr-1.7Mo-0.9Nb-1.8Ta-2.8W
In-Bi alloys
In-Bi alloys-Chemical etching
In-Bi eutectic alloy specimen-Chemical etching
In-Bi-Sn alloys-InBi-BiSn subsystem
In-Cd alloys-Chemical ecthing
In-Fe alloys-Chemical etching
In-Ga-As system-Preferential etch to delineate from Gallium arsenide
In-Ga-As system-Preferential etch to delineate from indium phosphide
In-La system-Electrolytic polishing
In-Ni eutectoid (30% Ni)-Chemical ecthing
In-Sb alloys
In-Sb alloys
In-Sb alloys-Chemical etching
In-Sb system-For revealing the segregation
In-Sb-Pb alloys-Chemical etching
In-Sn-Te alloys-In2Te3-SnTe section
In-Te-Bi alloys-In2Te3-Bi2Te3 section
In-Te-Bi alloys-InTe-InBi system
In-Ti alloys
In-Zn alloys
In-Zn alloys-Chemical etching
In203 specimens-Chemical etching
In2O3 (1010) deposited oriented thin film-Chemical etching
In2O3 (1010) grown as an oriented thin film-Chemical etching
In2O3 (1010) oriented thin films-Chemical etching
In2O3 as thin film-Chemical etching
In2O3 specimens-Chemical etching
In2O3 specimens-Chemical etching
In2Te3 specimens-Chemical polishing
In2Tl3 single crystal ingots-Chemical polishing
In5Bi3 single crystal specimens-Chemical polishing
InAs (100) n-type wafers-Chemical polishing
InAs (100), n-type wafers-Chemical etching
InAs (110), n-type wafers-Chemical polishing
InAs (111) wafers and other orientations-Thermal processing
InAs (111) wafers used in X-ray studies-Chemical etching
InAs (111) wafers used in a polarity study-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Dislocation etching
InAs (111), (110) and (100) wafers-Chemical etching
InAs specimens-Chemical cleaning
InAs specimens-Chemical etching
InAs(x)P(x-1) polycrystalline ingot-Chemical polishing
InGaAs (001) thin film-Chemical etching
InGaAs (100) wafer-Chemical cleaning
InGaAsP as thin film layers-Chemical etching
InGaAsP epitaxy thin films-Chemical etching
InGaAsP thin film layer grown by LPE-Chemical etching
InGaSb deposited as a thin film on BaF2 substrate (111)-Chemical thinning
InGe used as a deposited Au/InGe alloy contact on (100) InP and GaAs wafers-Chemical etching
InP
InP (100) Sn doped wafers-Chemical etching
InP (100) Zn doped p-type wafers-Chemical etching
InP (100) Zn doped p-type wafers-Chemical polishing
InP (100) cleaved wafers-Chemical etching
InP (100) n-type wafers-Chemical cleaning
InP (100) n-type wafers-Chemical etching
InP (100) n-type wafers-Chemical etching
InP (100) n-type wafers-Chemical etching
InP (100) n-type wafers-Chemical native oxide removal
InP (100) n-type wafers-Chemical polishing
InP (100) n-type wafers-Chemical polishing
InP (100) p-type wafers-Chemical etching
InP (100) tin-doped, n-type wafer-Chemical etching
InP (100) wafer fabricated as Schottky diodes-Chemical polishing
InP (100) wafer substrates-Halogen, grooving
InP (100) wafer used as a substrate-Acid oxidation
InP (100) wafer-Chemical etching
InP (100) wafer-Chemical etching
InP (100) wafers Cut 3-off toward (110)-Chemical polishing
InP (100) wafers cut within 1 of plane-Chemical polishing
InP (100) wafers fabricated as Schottky diodes-Junction stain
InP (100) wafers used as substrates for InP epitaxy-Chemical etching
InP (100) wafers used as substrates for LPE deposition of InGaAsP-Chemical etching
InP (100) wafers used as substrates for LPE of InGaAsP-Chemical etching
InP (100) wafers used as substrates-Chemical etching
InP (100) wafers used for epitaxy growth of InGaAs/InGaAsP-Metal, etch-back
InP (100) wafers used for zinc deposition and anneal-Chemical thinning
InP (100) wafers used in a dislocation study-Dislocation etching
InP (100) wafers with channels in (011) and (011) directions-Chemical etching
InP (100) wafers with or without thin film InGaAsP epitaxy-Chemical etching
InP (100) wafers, S doped n-type-Ionized gas cleaning
InP (100) wafers, Zn doped p-type-Chemical etching
InP (100) wafers-Acid, stain
InP (100) wafers-Chemical cleaning
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching-BCK-111 etchant
InP (100) wafers-Chemical etching-BPK-221 etchant
InP (100) wafers-Chemical polishing
InP (100) wafers-Chemical polishing
InP (100) wafers-Chemical polishing
InP (100) wafers-Chemical polishing/etching
InP (100) wafers-Chemical thinning
InP (100) wafers-Electrolytic etching
InP (100) wafers-Electrolytic etching
InP (100) wafers-Electrolytic oxidizing
InP (100) wafers-Ionized gas
InP (100) wafers-Ionized gas, removal
InP (100) wafers-Physical etrching
InP (100) wafers-Thermal cleaning
InP (100), n-type, 0.3-0.4 Ohm cm resistivity, and p-type, 7-8 Ohm cm wafers-Chemical cleaning
InP (110) wafer cleaved under UHV-Chemical polishing
InP (111) wafers grown by LEC-Chemical etching
InP (111) wafers grown by LEC-Chemical polishing
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical polishing
InP (111)A and (100) wafers-Chemical etching
InP (TTT)B wafers-Chemical etching
InP ingot cut longitudinally on the (112) axis-Dislocation etching
InP ingot grown by LEC doped with both Ga and Sb-Dislocation etching
InP p-type single crystal wafers-Chemical polishing
InP-Fe (100) (SI) wafers-Chemical polishing
InP-Fe (100) wafers-Chemical cleaning
InPFe (100) (SI) wafers-Chemical etching
InPFe (100) (SI) wafers-Chemical etching
InPFe (100) (SI) wafers-Chemical etching
InPFe (100) (SI) wafers-Chemical polishing
InPFe (100) n-type wafers-InPFe (100) n-type wafers
InPFe (100) wafers used as substrates for MISFETT and EMISFET device fabrication-Chemical etching
InPFe (100) wafers within 5 of plane-Chemical etching
InPFe (100) wafers-Chemical cleaning
InPZn epitaxy film grown by LPE-Chemical etching
InS (100) and (110) wafers-Chemical polishing
InSb
InSb
InSb (001) wafers-Alcohol cleaning
InSb (100) and (110) wafers-Chemical etching-Etchant #1
InSb (100) and (110) wafers-Chemical etching-Etchant #2
InSb (100) n-type wafers used in a study of adsorption coefficients
InSb (100) n-type wafers zinc diffused-Chemical cleaning
InSb (100) n-type wafers-Chemical etching
InSb (100) wafers and other orientations-Chemical polishing
InSb (100) wafers-Chemical etching
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Ionized gas cleaning
InSb (100) wafers-Oxide removal
InSb (100), (111)A and (111)B oriented wafers-Chemical etching
InSb (110) n-type and (100) p-type wafers-Chemical polishing
InSb (111) p-type wafers-Chemical polishing
InSb (111) specimens-Chemical etching
InSb (111) wafers and other orientation-Chemical polishing-CP4, variety CP4A etchant
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching-H100 etchant
InSb (111) wafers-Chemical etching/polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing-Allen's etchant
InSb (111) wafers-Electrolytic anodization
InSb (111) wafers-Electrolytic anodizing
InSb (111) wafers-Ketone cleaning
InSb (111) wafers-Thermal etching
InSb (111), (112) and other bulk orientations-Chemical polishing
InSb (111)A, (TTT)B and (100) wafers-Chemical cleaning
InSb (311) and (110) wafers-Electrolytic polishing
InSb (311) wafers-Chemical etching
InSb (311) wafers-Chemical polishing
InSb cylinder-Chemical etching
InSb specimen-Chemical etching
InSb specimens-Etchant for revealing twin lamellae by staining (211) and etching the (211)
InSb thin films-Chemical polishing
InSb-Etchant for revealing twin planes
InSb-Te (111) n-type wafers-Chemical cleaning
InSe (0001) as hand cleaved wafers-Chemical etching
InSn alloy specimen-Electrolytic etching
InSnO2 single crystal-Acid, flux, removal
Incaloy 800-19Cr-30Ni-45Fe+ C,Mn,P,S,Cu,Si,Al,Ti
Incaloy 800-44Fe-31Ni-21.6Cr-1Mn-0.5Cu-0.4Ti-0.4Al-0.3Si
Inco 713LC superalloy-Electro etching
Inconel 600
Inconel 617 - Evans' reagent
Inconel 617 - ZIP's reagent
Inconel 617-54Ni-22Cr-12.5Co-9Mo-1Al-0.07C
Inconel 625
Inconel 625
Inconel 686-Chemical etching
Inconel 690
Inconel 718 alloy (Ni)-Chemical etching
Inconel 718 etchant-For SEM examination to view gamma double prime in alloy 718 (no gamma prime)
Inconel 718-Ni-0.5Al-0.05C-5Nb-0.2/0.4Co-18Cr-18/20Fe-3Mo
Inconel 718-Ni-17Cr-22Fe-1Co-5Nb-0.8Ti-0.6Al-0.05C
Inconel X550, Inco 700, Waspaloy, M252-Chemical etching
Inconel X550, Inco 700, Waspaloy, and M252
Inconel-Electrolytic polishing
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical polishing
Indium antimonide (InSb)-Chemical polishing
Indium antimonide (InSb)-Chemical polishing and etching
Indium antimonide (InSb)-Chemical polishing and etching
Indium antimonide (InSb)-Electro polishing
Indium antimonide (InSb)-Etch pit etching
Indium antimonide (InSb)-For etch pits
Indium antimonide (InSb)-Shallow etch pits are produced on (111) face
Indium arsenide (InAs)-Chemical etching
Indium arsenide (InAs)-For etch pits
Indium arsenide (InAs)-For revealing the defect density
Indium oxide (In2O3)-Etch pits etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical polishing
Indium phosphide (InP)-Chemical polishing
Indium phosphide (InP)-Chemical polishing and etching
Indium phosphide (InP)-Chemical thinning
Indium phosphide (InP)-Dislocation etching
Indium phosphide (InP)-Dislocation etching
Indium phosphide (InP)-Etch for dislocations on (111)P, (100) and (110) faces
Indium phosphide (InP)-Etch pit etch for (111) face
Indium phosphide (InP)-Etch pits etch for (111) faces
Indium phosphide (InP, (001) face)-Chemical polishing
Indium phosphide arsenide (InP(x)As(1-x))-Etching for etch pits
Indium single crystal-Chemical etching and polishing
Indium specimens-Chemical etching
Indium specimens-Chemical etching
Indium specimens-Electro mechanical polishing
Indium specimens-Electro thinning
Indium specimens-Electrolytic polishing
Indium specimens-Electropolishing
Indium specimens-For etch pits etching
Indium specimens-In and In rich alloys
Indium-In
Indium-In
Indium-In
Insb (111) wafers-Chemical etching
Intergranular oxidation in AISI 4150 steel-Chemical etching
Intermetallic compounds-Chemical ecthing
Invar-Tin alloy (Fe-Ni-Sn)-62Fe-35Ni-3 at.% Sn
Iodide Ti
Iodide Ti
Iodide titanium
Iodine-doped bismuth telluride
Ir alloys
Ir crystalline specimens as wire, rod, sheet-Chemical etching
Ir thin films deposited on silicon (100), n-type-Chemical etching
Ir, Rh-Electrolytic etching
Ir-Mo system-Chemical etching
Ir-W alloy-Ir-0.3% W
IrPt as alloy mixtures-Chemical etching
IrV and Ir80V20 thin films-Chemical etching
Iridium specimen-Electro thinning
Iridium specimen-Electro thinning
Iridium specimen-Electro thinning by window technique
Iridium specimen-Electrolytic etching
Iridium specimen-Electrolytic etching
Iridium specimen-Electrolytic etching
Iridium specimen-Pt alloys, Rh, Ir
Iridium specimen-Rh base alloys, Pt-10% Rh alloys, Ir alloys, pure Pt and Pt alloys, Ru base alloys
Iridium-Ir
Iridium-Ir
Iridium-Ir
Iridium-Ir
Iridium-Ir
Iron and Iron alloys-Electropolishing
Iron and steel specimens-Austenitic stainless steel specimens
Iron and steel specimens-High alloy steel specimens
Iron and steel specimens-High alloy steel specimens
Iron and steel specimens-High alloy steel specimens
Iron and steel specimens-Mild steel specimens, Bessemer and high N2 steel specimens
Iron and steel specimens-Plain and alloy steel specimens
Iron and steel specimens-Plain and alloy steel specimens
Iron and steel specimens-Plain and low alloy steel specimens. For grain size and weldments
Iron and steel specimens-Stainless and high Cr steel specimens
Iron and steel specimens-Stainless steel specimens, high alloy steel specimens
Iron and steel specimens-Works well on 12% Cr steel specimens
Iron and steel specimens-lain and alloy steel specimens, high speed steel specimens
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels
Iron and steels - Alkaline sodium picrate
Iron and steels - Beraha's lead sulfide tint etch
Iron and steels - Groesbeck's reagent
Iron and steels - Malette's reagent
Iron and steels - Modified Murakami's reagent
Iron and steels - Murakami's reagent
Iron and steels - Sulfide etch of Kunkele
Iron and steels - Whiteley's method for coloring sulfides
Iron and steels-Electropolishing
Iron and steels-Electropolishing
Iron and steels-Etchant for determination of chemical and physical hetrogenity
Iron disilicide (FeSi2)-Chemical thinning
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Electrolytic etching
Iron oxide scale
Iron oxide scale
Iron oxide scale - Fe2O3
Iron oxide scale - Fe2O3
Iron oxide scale - Fe3O4
Iron oxide scale - Fe3O4
Iron oxide scale - Fe3O4
Iron oxide scale - Fe3O4
Iron oxide scale - Fe3O4
Iron oxide scale - Fe3O4
Iron oxide scale - Fe3O4
Iron oxide scale - FeO
Iron oxide scale - FeO
Iron specimen-Chemical polishing
Iron specimen-Chemical polishing
Iron specimen-Chemical polishing
Iron specimen-Chemical polishing and etching
Iron specimen-Chemical polishing in hot reagent
Iron specimen-Chemical thinning
Iron specimen-Chemical thinning
Iron specimen-Chemical thinning
Iron specimen-Chemical thinning
Iron specimen-Dislocations in alpha-Fe whiskers
Iron specimen-Electro polishing
Iron specimen-Electro polishing
Iron specimen-Electro polishing
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning by Bollman technique
Iron specimen-Electro thinning by Mirand-Saulnier technique
Iron specimen-Electro thinning by low voltage technique
Iron specimen-Electro thinning by modified Mirand-Saulnier technique
Iron specimen-Electro thinning by modified voltage technique
Iron specimen-Electro thinning by window technique
Iron specimen-Electro thinning in PTFE holder
Iron specimen-Electro thinning using A.C.
Iron specimen-Electrolytic polishing
Iron specimen-Electrolytic polishing
Iron specimen-Electrolytic polishing
Iron specimen-Electrolytic polishing
Iron specimen-Good general-purpose electrolyte
Iron specimen-Physical etching
Iron specimen-Universal electrolyte
Iron, steel specimens, cast irons-Austenite and high temperature steel specimens
Iron, steel specimens, cast irons-Blowhole segregation. Primary structure. Fiber orientation
Iron, steel specimens, cast irons-Flow lines in low carbon N2 steel specimens
Iron, steel specimens, cast irons-Phosphorus distribution in cat steel specimens and cast iron
Iron, steel specimens, cast irons-Phosphorus segregation in Low carbon steel specimens
Iron, steel specimens, cast irons-Verification, arrangemnet, and distribution of Fe and Mn sulfide inclusions
Iron, steel specimens, cast irons-Versatile etchant for alloyed and unalloyed steel specimen
Iron, steel specimens, cast irons-Versatile, useful for Fe and steel specimens
Iron, steels, cast irons- Most common etchant
Iron, steels, cast irons-Austenite grain baoundaries in cold work steel
Iron, steels, cast irons-Austenite grain boundaries
Iron, steels, cast irons-Austenite grain boundaries in case hardened steels
Iron, steels, cast irons-Austenite grain size boundaries in cold work steels
Iron, steels, cast irons-Austenite grain size boundaries in tempered steels and case hardened steels
Iron, steels, cast irons-Carbides and phosphides in low alloy steels
Iron, steels, cast irons-Carbides, nitrides, phosphides, and sulfides are not attacked
Iron, steels, cast irons-Cementite (Fe3C) with up to 10% Cr is stained dark
Iron, steels, cast irons-Cr and Cr-Ni steels
Iron, steels, cast irons-Differntiation of cubic and tetragonal martensite
Iron, steels, cast irons-Fe-Cr-Ni cast alloy
Iron, steels, cast irons-Fe3C with more thn 10% Cr is stained more rapidly than Fe3C with less than Cr
Iron, steels, cast irons-Generally used for iron and heat treated steels
Iron, steels, cast irons-Grain boundaries in heat treated tool steel
Iron, steels, cast irons-Grain boundaries in martensitic microstructures
Iron, steels, cast irons-Grain contrast of ferrite in Low carbon steels
Iron, steels, cast irons-High alloy Cr-Ni steels
Iron, steels, cast irons-Increases attack of Fe in alloyed steels
Iron, steels, cast irons-Mn alloyed Cr-Ni steels. Sigma phase and ferrite
Iron, steels, cast irons-Most common etchant
Iron, steels, cast irons-Normalized steels
Iron, steels, cast irons-Sgma phase etching
Iron, steels, cast irons-Stainless steels with high Cr content. Cr-Ni cast steels
Iron, steels, cast irons-Steels with high Si content
Iron, steels, cast irons-Tint etchant for pure iron and carbon steels, cast iron, and alloyed steels
Iron, steels, cast irons-Verification of sigma phase
Iron-Fe
Iron-Fe
Iron-Fe
Iron-Fe
Iron-Fe
Iron-Fe
Iron-Fe
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels
Iron-Fe and steels - Amyl nital
Iron-Fe and steels - Fry's reagent
Iron-Fe and steels - Goerens amyl picral
Iron-Fe and steels - Klemm's I etch
Iron-Fe and steels - Klemm's I reagent
Iron-Fe and steels - Marshall's reagent
Iron-Fe and steels - Nital
Iron-Fe and steels - Picral
Iron-Fe and steels - Superpicral
Iron-Fe and steels - Vilella's etch
Iron-Fe and steels - Vilella's reagent
Iron-Fe and steels -Nitrosulfuric (Wesley Austin) etch
Iron-Fe-Fry's reagent
Iron-manganese alloys-Electro polishing
Iron-oxide layers on iron-Fe2O3-Chemical etching
Iron-oxide layers on iron-Fe3O4-Chemical etching
Iron-oxide layers on iron-Fe3O4-Chemical etching
Iron-oxide layers on iron-FeO-Chemical etching
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3-Chemical etching
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3-Chemical etching
Iron-oxide layers on iron-Physical etching
Iron-oxide layers on iron-Physical etching
Iron-technetium system (Fe-Tc)-Fe-0.1 wt.% Tc
Iron-thorium (Fe-Th)-Th-2% Fe
Jacquet's etchant
Jacquet's solution
Jin's etch
Jodid (high-purity, iodide-process) Ti-Chemical etching
K specimens-Alcohol polishing
K specimens-Alcohol polishing
K specimens-Chemical polishing
K specimens-Ketone polishing
K42B alloy-Chemical etching
KBr
KBr (001) wafers-Chemical etching
KBr (100) cleaved wafers-Chemical etching
KBr (100) wafers and single crystals-Water polishing
KBr and KI single crystal specimens-Solvent polishing
KBr specimens-Chemical etching
KBr, KCl
KCl
KCl
KCl (001) cleaved wafers-Chemical etching
KCl (100) cleaved wafers-Chemical etching
KCl (100) cleaved wafers-Chemical polishing
KCl (100) cleaved wafers-Gas etching
KCl (100) specimens-Chemical cleaning
KCl (100) wafers-Alcohol cleaning
KCl (100) wafers-Chemical etching
KCl (111) and (100) cleaved wafers-Chemical cleaning
KCl formed as dendritic structure-Acid, defect
KCl single crystal specimens-Acid forming
KCl single crystal specimens-Acid forming
KI
KI (100) cleaved wafers-Chemical etching
KI (100) cleaved wafers-Chemical etching
KI (100) wafers-Alcohol polishing
KI (100) wafers-Chemical etching
KI and KBr single crystal specimens-Polishing
KMnFe3 single crystal sphere
KTaO3 iron doped single crystal wafer-Abrasive polishing
Kalling's reagent
Kalling's reagent 1
Kalling's reagent 2
Keller's etchant
Keller's etchant (2)
Keller's reagent
Kellers etch
Klemm's I tint etch
Klemm's II tint etch
Klemm's etchant
Klemm's etchant I
Klemm's etchant II
Klemm's etchant III
Klemms III tint etch-Chemical etching
Kovar alloy-Electrolytic etching
Kovar specimens-Chemical etching
Kovar specimens-Chemical polishing
Kovar specimens-Chemical polishing
Kovar, cemented carbides-Chemical etching
Kr (100) solid single crystal ingots-Pressure
Kr used as a gas ambient component in the RF magnetron sputter deposition of NbN thin films
Kroll's etchant (1)
Kroll's etchant (2)
Kroll's reagent
Krumm's etchant
La and Ce
La specimens-Arc forming
La specimens-Chemical polishing
La, U and Th used as pressed powders-Pressure
La-Ag alloys-Chemical etching
La-Au alloys-Chemical etching
La-Bi system-Chemical etching
La-Cd alloys-Chemical etching
La-Co alloys (Approx. LaCo5)-Chemical etching
La-Co system-Chemical etching
La-Co-Cu alloy-(Co,Cu)5La
La-Ni alloys-Chemical etching
La-Pd alloys-Approx. La3Pd4
La-Rh system-Chemical ecthing
LaB single crystal filaments-Electrolytic polishing
LaB6 single crystal specimens-Acid, forming
LaB6 specimen-Ceramic compunds
LaB6, TaB2-Electrolytic etching
LaBr3 (100) wafers-Chemical polishing
LaCu6 single crystal-Chemical etching
LaSrCoO3 single crystals cleaved (001)-Salt polishing
LaSrCoO3 single crystals-Chemical etching
LaSrFeO3 single crystals-Chemical etching
Lanthanides (Rare earths)-For most Rare earths metals and their alloys
Lanthanides (Rare earths)-For most Rare earths metals and their alloys
Lanthanum boride (LaB4)-Electrolytic etching
Lanthanum doped barium titanate-Thermal etching
Lanthanum-Chemical polishing and etching
Lanthanum-Electro polishing
Lanthanum-Electro polishing
Lanthanum-Electro thinning
Le Pera's reagent
LeChatelier's No. 1 etch
LeChatelier's No. 2 etch
Lead (Pb)
Lead (Pb)
Lead alloys-Electropolishing
Lead and its alloys-Antimonial lead
Lead and its alloys-Antimonial lead. Bright etch, grain structure
Lead and its alloys-Antimonial lead. Chemical polish-etch
Lead and its alloys-Antimonial lead. For grain structure
Lead and its alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Development of microstructures and grain boundaries in lead
Lead and lead alloys-Electrolytic etching
Lead and lead alloys-Electrolytic etching
Lead and lead alloys-Electropolishing
Lead and lead alloys-Pb-Sb alloys
Lead arsenic alloys (Pb-As)-For lead rich alloys
Lead free solder
Lead glass (PbO-SiO2)-25/35 mol.% PbO-75/65 mol.% SiO2
Lead niobate (modified)-Grain boundary etching
Lead oxide-boric oxide glass-Chemical etching
Lead oxide-vanadium oxide-germanium oxide glass (Ge-O-Pb-V)-4/55 V2O5-1/36 PbO-65/9 GeO2
Lead samples-Grain contrast. Pb containing Sb
Lead samples-Grain contrast. Welded seams. Layers
Lead samples-Removal of deformed layers. Pure and low alloy Pb
Lead single crystal-Chemical polishing
Lead specimen-All Pb alloys. Hard lead. High Pb white metals and type metals
Lead specimen-Chemical and electrolytic etching
Lead specimen-Chemical etching
Lead specimen-Chemical etching
Lead specimen-Chemical polishing
Lead specimen-Electro polishing
Lead specimen-Electro polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electropolishing
Lead specimen-Grain contrast
Lead specimen-Lead solder. Pb-Sb alloys and high Pb white metals and type metals
Lead specimen-Lead solders. Pb-Sn alloys
Lead specimen-Pb and Pb alloys. Hard lead and high Pb white metals and type metals
Lead specimen-Pb, Pb-Sb and Pb-Sn alloys
Lead specimen-Pb, Pb-Sn, Pb-Cd, Pb-Ca alloys. Pb containing Cu and bronzes
Lead specimen-Pure Pb, Pb-Sb, Pb-Ca alloys. Grain boundaries
Lead specimen-Universal electrolyte
Lead sulphide (PbS)-Chemical polishing
Lead sulphide (PbS)-Chemical polishing
Lead sulphide (PbS)-Chemical polishing and etching
Lead sulphide (PbS)-Sample preparation
Lead sulphide (PbS)-To delineate p-n junction
Lead sulphide-selenide (PbS(0.6)Se(0.4))-To delineate p-n junction
Lead sulphide-selenide (PbS(1-x) x Se(x))-Chemical polishing
Lead telluride (Pb-Te) system-Electrolytic polishing
Lead telluride (Pb-Te)-Chemical polishing
Lead telluride (Pb-Te)-Chemical polishing and etching
Lead telluride (Pb-Te)-Electrolytic polishing
Lead telluride (Pb-Te)-Etching for etch pits
Lead telluride (Pb-Te)-Ething for etch pits
Lead telluride (Pb-Te)-Polishing procedure
Lead-Electro polishing
Lead-Electrolytic polishing
Lead-Pb
Lead-Pb
Lead-Pb
Lead-lanthanum zirconate titanate-(Pb-La) (Zr-Ti)O3
Lead-strontium-Titanate zirconate
Lead-strontium-titanate zirconate-(Pb0.94Sr0.06) x (Zr0.53Ti0.43)O3
Lenoir's solution
Lenoirs reagent
Lepito's etchant
Lepito's reagent
Lepito's reagent
Levenstein-Robinson's etchants (and (Hen-Hen) Rickson's modification)
Li applied as molten LiOH on rutile-Salt removal
Li fluoride
Li powder in oil-Diffision
Li samples-Chemical etching
Li single crystal spheres-Thermal forming
Li specimens-Chemical etching
Li specimens-Chemical polishing
Li tantalate-silicon-alumina system-Chemical etching
Li(x)WO3 (blue) and Li(x)WO3-Oxide, growth
Li-Al orthosilicate-Li2O x Al2O3 x 3,4 as 8 SiO2
Li-Ba-Ti-Zr glass-73% SiO2, 14% Al2O3, 8.7% Li2O, 1.75% BaO, 1.5% TiO2, 1% ZrO2 (+ NdO2)
Li-Se alloys
Li-Se-Rb-Br system-Li2Se-Se-(LiBr/RbBr eutectic)
Li-Zn ferrite-Li0.44 x Zn6.09 x Fe2.47 x O4
Li-alumina-silica glass-Li2O x Al2O3 x SiO2
Li3Bi single crystal ingots-Chemical polishing
LiBr (100) cleaved wafers-Chemical etching
LiCl cleaved wafers-Chemical etching
LiCl wafers-Dislocation etching
LiF
LiF
LiF
LiF (100) and (111) wafers-Chemical etching
LiF (100) cleaved wafers-Dislocation etching
LiF (100) single crystal specimens-Chemical etching
LiF (100) wafers-Chemical etching
LiF (100) wafers-Chemical etching
LiF (100) wafers-Chemical etching
LiF (100) wafers-Chemical etching-W" etchant
LiF (10O) cleaved wafers-Dislocation etching
LiF (111) cleaved wafers-Ulrasonic vibration
LiF - 'F' etch
LiF - CP-4 reagent
LiF specimen-Chemical etching
LiF-MgF2 system-LiF-MgF2 eutectic
LiInS2 (001) oriented thin films-Chemical etching
LiInS2 thin films on (111) silicon wafer substrates-Chemical etching
LiN thin films-Chemical etching
LiNbO3
LiNbO3 single crystal specimens-Chemical etching
LiNbO3 single crystal specimens-Metal decoration
LiTaO3 single crystal specimens-Chemical etching
LiTaO3 single crystal wafers-Metal decoration
Lichtenegger and Bloech's etchant
Lime-silica system-Chemical etching
Lithia dispersed Nichrome (Cr-Li-Ni-O)-Ni-20Cr-1.3Li2O
Lithia-zinc oxide-silica system-Chemical etching
Lithium carbonate single crystal-Chemical etching
Lithium ferrite (Li05 Fe25 O4)-Chemical polishing and etching
Lithium ferrite (Li05 Fe25 O4)-Thermal etching
Lithium fluoride (LiF) single crysta-Chemical etching
Lithium fluoride (LiF) single crystal-Chemical etching
Lithium fluoride (LiF) single crystal-Chemical etching
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-For etch pits
Lithium fluoride (LiF)-For etch pits
Lithium glass-30.5 mol.% LiO2, 1.5 mol.% K2O, 1 mol.% Al2O3, 1 mol.% P2O5, 5 mol.% B2O5, 61 mol.% SiO2
Lithium glass-70% SiO2, 6/12% Li2O, 5/9% Al2O3, 5/8% K2O, 3/5% B2O5
Lithium glass-70% SiO2, 6/12% Li2O, 5/9% Al2O3, 5/8% K2O, 3/5% B2O5, bellow 2.5% P2O5
Lithium niobate (LiNbO3)-For etching patterns on (0001) and (10T0)
Lithium nitride-Li3N-Chemical thinning
Lithium oxide-potash-zinc oxide-silicate glass-Chemical thinning
Lithium silicate glass (Li2O2SiO2)-Chemical thinning
Lithium specimens-Chemical etching
Lithium specimens-Chemical polishing and etching
Lithium tantalate (LiTa03)-For domain structure in single crystals
Livingstone's etchant
Livingstone's reagent-Chemical etching
Livingstone's solution
Low Mn steel-Fe-0.6/1.5C-1.1Mn
Low Mn-V steel-Fe-0.14C-1.3Mn-0.35Si-0.1V (plus Al, N)
Low Mn-V steel-Fe-0.1C-1.4Mn-0.5Si-0.1V
Low Mn-V steel-Fe-0.1C-1.5Mn-0.5Si-0.1V
Low Nb steel-Fe-0.1/0.2C-1.2/1.4Nb-0/0.2Nb
Low Ni alloys
Low V alloy steel-Steel with 0.2% C and 1% V
Low V alloy steel-Steel with 0.2% C and 1% V
Low alloy dual-phase and TRIP steels-Chemical etching-LaPera's solution
Low alloy steel-Chemical thinning
Low alloy steel-Chemical thinning
Low alloy steels-Chemical thinning, electro polishing
Low and high alloy steels-Carbon steels, low and high alloy steels, stainless steels
Low and high alloy steels-Electro polishing
Low and high alloy steels-Electro polishing
Low carbon and pearlitic steels-Physical etching
Low carbon steel-Chemical etching
Low carbon steel-Physical etching
Low carbon steels
Low carbon steels-Chemical etching
Low carbon steels-Colour etchant
Low-carbon steels
Low-carbon steels, Mg
Low-crabon steels
Low-density polyethylene
Lu-Ag alloys-Chemical etching
Lu-Au alloys-Chemical etching
Lu-Pd alloys-Approx. Lu3Pd4
Lu-Yb alloys-Electro polishing and chemical etching
Lucite sheet and parts-Alcohol, dissolve
Lucite sheet and parts-Chemical cleaning
Lucite sheet and parts-Chemical cleaning
Lutetium-Electro polishing
MA 956E alloy-Fe-19Cr-4.4Al-0.5Ti-0.4Ni-0.5Y2O3
MAR-M 509 alloy-Chemical etching
MCrAlY-coatings (NiCoCrAlY coating)-Chemical Etching
MERL 76 alloy-55Ni-5.1Al-4.2Ti-12Cr-3.3Mo-0.02C-18.4Co-1.3Nb-0.7Hf (+B)
MFeM2 material-Chemical cleaning
MP35N alloy
Magnesia (MgO) single crystal-Chemical etching
Magnesia (MgO) single crystal-Chemical etching
Magnesia (MgO) single crystal-Chemical etching
Magnesia (MgO) single crystal-Chemical etrching
Magnesia (MgO) single crystal-Chemical polishing
Magnesia (MgO) single crystal-Chemical polishing and etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical polishing
Magnesia (MgO)-Chemical polishing, chemical etching, jet thinning
Magnesia (MgO)-Chemical thinning
Magnesia (MgO)-Chemical thinning
Magnesia (MgO)-This etch produces pits on single crystal MgO on (100) and (110) faces
Magnesia (MgO)-Well defined square pyramidal pits form on (100) faces in after few minutes
Magnesia (MgO)-alumina (Al2O3) mixtures-Chemical etching
Magnesia (MgO)-alumina (Al2O3) system-MgO-MgAl2O4 section
Magnesium alloys-A universal etchant
Magnesium alloys-AZ31 (Mg + 3 wt.% Al + 1 wt.% Zn)
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Darkens Mg17Al12 phase and leaves Mg32(Al, Zn)40 phase unetched and white
Magnesium alloys-Electropolishing
Magnesium alloys-For estimating the amount of massive phase
Magnesium alloys-Grain structure and coring in Mg-Zn-Zr alloys
Magnesium alloys-Reveals grain boundaries more readily
Magnesium alloys-Sample preparation
Magnesium alloys-Shows general structure
Magnesium and magnesium alloys-AZ21 and AZ31 alloys. Grain size
Magnesium and magnesium alloys-AZ31B alloy. Flow pattern in forgings. Internal defects in cast slabs and ingots
Magnesium and magnesium alloys-AZ31B alloy. General etch for defects in sand and die castings
Magnesium and magnesium alloys-AZ31B alloy. Germination on sand cast surfaces
Magnesium and magnesium alloys-AZ31B, AZ61A , AZ80A alloys. Flow pattern in forgings
Magnesium and magnesium alloys-AZ61A and AZ80A alloys. Grain size and flow pattern
Magnesium and magnesium alloys-AZ61A and AZ80A alloys. Grain size, surface castings defects
Magnesium and magnesium alloys-Electropolishing
Magnesium and magnesium alloys-Segregation of intermetallic compounds and associated cracks
Magnesium and magnesium alloys-ZK60A alloy. Flow lines in forgings
Magnesium and magnesium alloys-ZK60A alloys. Flow pattern and grain size
Magnesium bronze-Chemical etching
Magnesium fluoride MgF2-Chemical polishing
Magnesium fluoride MgF2-For etching grains in hot pressed magnesium fluoride
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium single crystal-Chemical etching
Magnesium specimens-Grain sizes and flow lines in cast and forged parts
Magnesium specimens-Internal defects in cast ingots
Magnesium specimens-Internal defects in cast ingots. Segregations, flow lines in forged parts
Magnesium-All types of Mg alloys in cast or heat treated state. Grain boundaries etch
Magnesium-Cathodic etching
Magnesium-Chemical etching
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical thinning
Magnesium-Complex Mg alloys containing Al, Zn, Cd, Bi
Magnesium-Electro polishing
Magnesium-Electro polishing
Magnesium-Electro polishing
Magnesium-Electro thinning
Magnesium-Electro thinning by window technique
Magnesium-Electro thinning by window technique
Magnesium-Electrolytic polishing
Magnesium-Electrolytic polishing
Magnesium-Electrolytic polishing
Magnesium-Electropolishing
Magnesium-Electropolishing
Magnesium-Electropolishing
Magnesium-Electropolishing
Magnesium-Flow lines. Grain sizes in cast material
Magnesium-Mg
Magnesium-Mg
Magnesium-Mg
Magnesium-Mg
Magnesium-Mg and Mg base alloys
Magnesium-Mg and Mg-Cu alloys. Mg die-casting alloys
Magnesium-Mg-Al alloys. Grain contrast in heat treated castings. Flow lines in forgings
Magnesium-Most types of Mg and its alloys. Also casting and forgings
Magnesium-Pure Mg and most Mg alloys, also in cast and forged state
Magnesium-Pure Mg, Mg-Mn, Mg-Al, Mg-Al-Zr, Mg-Th-Zr, Mg-Zn-Zr alloys. Also extruded types
Magnetite (Fe3O4)-Chemical etching
Magnetite (Fe3O4)-Chemical etching
Manganese (II) oxide-Chemical thinning
Manganese zinc ferrite-Low calcium oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + CaO
Manganese-Electro polishing
Manganese-Electropolishing
Manganese-Electropolishing
Manganese-Electropolishing
Manganese-Mn-Fe, Mn-Ni, Mn-Cu, Mn-Co alloys
Manganese-Mn-Ge, Mn-Si, Mn-Sn-Ge, Mn-Sn-Si alloys
Manganese-Mn-Si-Ca alloys. Ferromanganese
Manganese-Pure Mn. Low alloy Mn containing Ni, Co, Fe, Ge, and Cu
Mar M 247-Electro polishing
Maraging steel
Maraging steel
Maraging steel-Fe-0.02C-12/16Cr-8Ni-0.15Be
Marble's reagent
Marble's reagent
Martensite etching
Martensite etching
Martensitic and bainitic steels - Bechet and Beaujard's etch
Martensitic and ferritic stainless steels
Martensitic stainless steel and high-alloy steels - GE Turbo-chrome etch
Martensitic stainless steels
Martensitic stainless steels
Martensitic stainless steels
Martensitic, stainless steels-Chemical etching
Marts and Capes's etch
Matte dip etchant
Medium and high carbon steel-Chemical etching
Medium and high carbon steels-Chemical etching
Medium carbon steel-Physical etching
Medium carbon steels
Medium-carbon steels
Mercury Alloys-Ag-Sn-Hg alloys
Mercury Alloys-For most amalgamates
Mercury Alloys-Hg-Sn and Hg-Sn-Cu alloys
Mercury selenide (HgSe)-Chemical polishing and etching
Mercury telluride (HgTe)-Chemical polishing and etching
Mercury telluride (HgTe)-Dislocation etch
Mercury-Elelctrolytic polishing
Meruric iodidie (HgI2)-Chemical polishing and etching
Meruric iodidie (HgI2)-Chemical polishing and etching
Meruric iodidie (HgI2)-Etch pits etching
Metal Samples
Metallic glass-Electro thinning
Meyer and Eichholz's No. 1 etch
Meyer and Eichholz's No. 2 etch
Meyer and Eichholz's No. 2 etchant-For etching nitrided layer in steel
Mg (0001) wafers-Electrolytic polishing/etching
Mg alloys
Mg alloys
Mg alloys
Mg alloys
Mg alloys
Mg alloys
Mg alloys
Mg alloys, 1% Zn, 0.6% Zr
Mg alloys-Chemical etching
Mg and Mg alloys
Mg and Mg alloys
Mg and Mg alloys-Chemical etching
Mg and Mg alloys-Chemical etching
Mg and Mg alloys-Chemical etching
Mg and Mg alloys-For differentiation of Mg4Al3 and Mg3Al2Zn3
Mg and Mg alloys-Mg alloys with low Al content, sheet metal
Mg and Mg alloys-Mg-Al alloys, castings and forgings
Mg and Mg alloys-Mg-Al alloys, catings, Mg-Zr alloys, castings and forgings
Mg and Mg alloys-Mg-Al alloys, homogenised castings and forgings
Mg and Mg alloys-Mg-Al alloys, in the homogenised state
Mg and Mg alloys-Mg-Mn alloys, forgings, Mg-Zr alloys, castings
Mg and Mg alloys-Mg-Zr alloys, forgings
Mg and Mg alloys-Reveals grain structure and flow lines in forgings
Mg and Mg alloys-Reveals grain structure in heat treated castings and flow lines in forgings
Mg and Mg alloys-Reveals grain structure in heat treated castings and flow lines in forgings
Mg and alloys
Mg and alloys
Mg and alloys
Mg and alloys
Mg and alloys
Mg and alloys
Mg and alloys
Mg and alloys - Acetic-glycol etch
Mg and alloys - Glycol etch
Mg and alloys - Nital
Mg and alloys - Phospho-picral etch
Mg and high Mg alloys-Electrolytic polishing
Mg and many alloys
Mg and wrought alloys
Mg doped beta-Alumina-90Al2O3 - 8Na2O - 2MgO
Mg pieces-Chemical cleaning
Mg sialon-Mg3 Si2.455 Al0.545 O6.245 N1.455
Mg single crystal specimens-Physical etching
Mg single crystal wafers-Chemical etching
Mg single crystal wafers-Electrolytic polishing
Mg soldered joints AZ31, AZ91, Zm50/ZnMg3Al, Mg48Zn43Al9-Chemical etching
Mg specimens and alloys-Acid cutting
Mg specimens-Chemical etching
Mg specimens-Chemical etching
Mg specimens-Chemical polishing
Mg specimens-Electrolytic polishing
Mg specimens-Electrolytic polishing
Mg specimens-Electrolytic polishing
Mg specimens-Electrolytic polishing
Mg, Mg-Cu and Mg die-casting alloys
Mg, Mg-MgO alloys (0-5% MgO)
Mg-7.5% Al-2.5% Zn alloy-Chemical etching
Mg-Al (to 6% Al), Mg-Mn and Mg-Mn-Al-Zn alloys
Mg-Al alloy (Magnox 12)-Alloy with 0.85% Al
Mg-Al alloy-Alloy with 0.9% Mg
Mg-Al alloy-Alloy with 3% Mg
Mg-Al alloy-Mg-gama MgAl eutectic
Mg-Al alloys
Mg-Al alloys up to 6% Al
Mg-Al alloys-Alloys with < 10% Mg
Mg-Al alloys-Chemical thinning
Mg-Al alloys-Electro thinning by window technique
Mg-Al and Mg-Al-Zn alloys
Mg-Al, Mg-Al-Zn and Mg-Zn-Zr alloys
Mg-Al-Zn alloy-Al, 3-5% Mg, 4-5% Zn (+ Cu, Fe, Si, Ni, Cr)
Mg-Al-Zn alloys-Chemical etching
Mg-Al-Zn-Mn alloy-Mg-9Al-1Zn-0.3Mn
Mg-Al-Zn-Mn alloys
Mg-Al-Zn-Mn alloys (C-Alloy)
Mg-Al-Zn-Mn alloys (C-Alloy) - Glycol etch
Mg-Ca alloys-Mg rich alloys
Mg-Ce alloy-Electrolytic etching
Mg-Cu alloys-Mg-Mg2Cu section
Mg-H system-Electrolytic polishing
Mg-Li alloy-Alloy with 10.5 at.% Li
Mg-Li alloys-Chemical etching
Mg-Li-Al alloys-Mg rich alloys
Mg-Mn ferrite (Fe-Mg-Mn-O)-Chemical etching
Mg-Mn ferrite (Fe-Mg-Mn-O)-Rapid attack on grain boundaries
Mg-Mn wrought alloys
Mg-Nd system-Alloys with low Nd (0.5 at.%)
Mg-Nd-Y-Zn-Zr alloys-Mg-1.5Y-2/4Nd-2/4Zn-0.6Zr
Mg-Ni alloy-Mg-Mg2Ni
Mg-Ni alloy-Mg-Mg2Ni eutectic
Mg-Pb alloys-Dendritic structure of cast alloys for SEM examination will be revealed by deep ecthing
Mg-Sb alloys-Mg-Mg3Sb2 section
Mg-Si alloys
Mg-Si alloys-Chemical etching
Mg-Si alloys-Mg-Mg2Si section
Mg-Sn alloys-Mg-Mg2Sn section
Mg-Th alloys-Electro polishing
Mg-Th-Zr alloy-Alloy with 3.9% Th and 0.4% Zr
Mg-U alloys
Mg-Y alloy-Alloy with 10.8 wt.% Y
Mg-Y alloy-Alloy with 8.7% Y
Mg-Y-Zn-Zr alloys-Mg-1.5Y-2/4Zn-0.6Zr
Mg-Y-Zr alloys-Mg-1.5Y-0.6Zr
Mg-Zn alloy-Electrolytic polishing
Mg-Zn alloys
Mg-Zn alloys
Mg-Zn alloys-Cathodic etching
Mg-Zn alloys-Chemical etching
Mg-Zn alloys-Electro polishing and chemical thinning
Mg-Zn alloys-Electro thinning by window technique
Mg-Zn alloys-Electropolishing
Mg-Zn alloys-Initial chemical thinning
Mg-Zn-Zr alloy-Mg-6Zn-0.5Zr
Mg-Zr alloy-Electro polishing and electro thinning
Mg-Zr alloys-Alloys with 0.5 wt.% Zr
Mg-Zr alloys-Alloys with low Zr content
Mg-Zr alloys-Electro thinning
Mg-Zr alloys-Initial chemical thinning
Mg-Zr system-ZrO2-9/14 mol.% MgO
Mg-Zr-Mn alloy-Mg-0.5Zr-0.1Mn
Mg2G3 (111) wafers-Chemical polishing
Mg2Ge (111) cleaved wafers-Chemical etching
Mg2Ge (111) cleaved wafers-Cleave, cleaning
Mg2Ge (111) wafers-Chemical cleaning
Mg2Ge (111) wafers-Chemical cleaning
Mg2Ge (111) wafers-Chemical polishing
Mg2Si (111) cleaved wafers-Chemical etching
Mg2Si single crystals-Chemical etching
Mg2Sn (100) cleaved wafers
Mg2Sn single crystal specimens
Mg3N4 thin films deposited on Mg specimen blanks-Chemical etching
MgAl2O4 (spinel) (100) and (111) wafers-Chemical polishing
MgAl2O4 (spinel) (111) wafers-Chemical cleaning
MgAl2O4 (spinel) natural crystals-Molten flux decomposition
MgAl2O4 (spinel) natural crystals-Molten flux etching
MgF2
MgF2 (100) specimens-Chemical etching
MgF2 (100) wafers-Chemical polishing/etching
MgO
MgO
MgO
MgO
MgO
MgO
MgO
MgO (100) cleaved wafers-Chemical etching
MgO (100) cleaved wafers-Chemical etching
MgO (100) specimens cleaved as rectangles-Chemical etching/thinning
MgO (100) substrates-Acid, float-off
MgO (100) wafers-Chemical cleaning
MgO (100) wafers-Chemical cleaning
MgO (100) wafers-Chemical etching
MgO (100) wafers-Chemical polishing
MgO (100) wafers-Chemical thinning
MgO (100) wafers-Dislocation etching
MgO (100) wafers-Dislocation etching-Stoke's etchant
MgO (100) wafers-Metal decoration
MgO (111) cleaved substrates-Ionized gas, cleaning
MgO and UO2
MgO prepration
MgO single crystal specimens-Electron damage
MgO specimens-Chemical etching
MgO x Al2O3 (111) blanks-Gas etching
MgO, ThO2, Al3NiO4, and Y2O3 - ZrO2
MgO, UO2 (!!!)-Chemical etching
MgS single crystals-Chemical etching
MgSe single crystal-Chemical polishing
MgTe single crystals-Chemical etching
Mica and natural rock salt-Gas cleaning
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microstructure of Zr alloys-Chemical etching
Microstructures of Cr and CrNi steels-Electrolytic etching
Mild steel (0.2% C)-Electro thinning
Mild steel-Chemical polishing
Mild steel-Electro thinning by window technique
Mild steel-Electro thinning in PTFE holder
Mild steel-Fe-0.15% C
Miller and Day's etch for low-carbon steels
Minerals
Mixed sintered carbides
Mixtures of acrylonitrile-butadiene-styrene-Chemical etching
Mn dual phase steel-0.07C-1.26Mn-0.30Si-0.08V-0.08Mo-0.07Cr
Mn dual phase steel-0.11C-1.47Mn-0.34Si-0.05Nb
Mn steel-Fe-0.16C-13Mn-0.24Si-0.22Cu-0.48Cr-0.03/0.13Nb
Mn steel-Fe-0.6/2.1C-0/0.5Mn
Mn steels-14% Mn steel (Hadfield steel)
Mn thin film deposits on ruthenium substrates-Chemical cleaning
Mn thin films-Chemical polishing/etching
Mn(x)Zn(1-x)Y(z)O12 single crystal specimens-Abrasive polishing
Mn, Mn-Cu alloys-Electrolytic polishing
Mn-C alloys-Chemical etching
Mn-Cr dual phase steel-Fe-0.07C-1.4Mn-0.6Si-0.2Ce
Mn-Cr steel-Fe-20Mn-4Cr-0.5C
Mn-Cr-V-W steel-0.9C-1.1Mn-0.5Cr-0.5W-0.2V
Mn-Cu alloys
Mn-Cu alloys-Manganese and Mn-Cu alloys
Mn-Fe, Mn-Ni, Mn-Cu and Mn-Co alloys
Mn-Ge system-Chemical etching
Mn-Ge, Mn-Si, Mn-Sn-Ge and Mn-Sn-Si alloys
Mn-Sb alloy-Mn2Sb
Mn-Sb system-MnSb-Sb eutectic
Mn-Sb-V alloy-Mn1.8V0.2Sb
Mn-Se system (MnSe)-Chemical etching
Mn-Se-S system-MnSe-MnS solid solution. To remove disurbed layers
Mn-Se-Te system-MnSe-MnTe section
Mn-Si alloys-Alloys with 2-24 at.% Si
Mn-Sn system-Mn rich alloys
Mn-Sn system-Quoted for non-stoichometric Mn-Sn alloys
Mn-Te system (MnTe)-Chemical etching
Mn-Ti alloys (0-30% at.% Ti)
Mn-Ti alloys (up to 30 Ti)-Chemical polishing
Mn-Ti-Co system-Chemical etching
Mn-Ti-Fe system-Chemical etching
Mn-Ti-Fe system-Fe-19-27% Mn - up to 1.45% Ti
Mn-Ti-Fe system-FeTi-0.25-1% Mn section
Mn-V alloys-Chemical etching
Mn-Zn ferrite (Fe-Mn-O-Zn)-Chemical etching
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nb oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nb2O5
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nd2O3
Mn-Zn ferrite (Fe-Mn-O-Zn)-Mn0.564 x Zn0.374 x Fe2.06 x 04
Mn-Zn ferrite (Fe-Mn-O-Zn)-Mn8.51 x Zn0.43 x Fe2.06 x O4
Mn-Zn ferrite-low Cd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + CdO
Mn-Zn ferrite-low Ge oxide body-Mn0.5 x Zn0.43 xFe2.06 x O4 + GeO2
Mn-Zn ferrite-low Pb oxide body (Fe-Mn-O-Pb-Zn)-Mn0.5 x Zn0.43 x Fe2.03 x O4 + PbO
Mn-Zn ferrite-low Sb oxide body (Fe-Mn-O-Sb-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Sb2O3
Mn-Zn ferrite-low Si oxide body (Fe-Mn-O-Si-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SiO2
Mn-Zn ferrite-low Sn oxide body (Fe-Mn-O-Sn-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SnO2
Mn-Zn ferrite-low Sr oxide body (Fe-Mn-O-Sr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SrO
Mn-Zn ferrite-low Ti oxide body (Fe-Mn-O-Ti-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + TiO2
Mn-Zn ferrite-low V oxide body (Fe-Mn-O-V-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + V2O5
Mn-Zn ferrite-low Y oxide body (Fe-Mn-O-Y-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Y2O3
Mn-Zn ferrite-low Zr oxide body (Fe-Mn-O-Zr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + ZrO2
Mn-Zn ferrite-low alumina body-Mn0.51 Zn0.43 Fe2.00 O4 - Al2O3
Mn-Zn ferrite-low copper oxide body-Mn0.51 Zn0.43 Fe2.06O4 + CuO
MnFe2 single crystal sphere-Abrasive, forming
MnO single crystals doped with iron as ferrites-Chemical etching
MnO2 natural crystal specimens-Chemical etching
MnO2 single crystal specimens-Physical etching
MnTe2 single crystal specimens-Chemical polishing
Mo (100) specimens-Chemical polishing
Mo (111) wafers-Chemical cleaning
Mo (111) wafers-Chemical cleaning
Mo (111) wafers-Electrolytic polishing/thinning
Mo alloys
Mo alloys
Mo alloys
Mo and Mo alloys
Mo and Mo alloys
Mo and Mo alloys
Mo and Mo alloys
Mo and Mo alloys
Mo and Mo alloys
Mo and Mo alloys
Mo and Mo alloys-Electrolytic polishing
Mo and Mo-Ni alloys
Mo and Mo-Ti alloys
Mo and alloys
Mo and alloys
Mo and alloys
Mo and alloys
Mo and alloys
Mo and alloys
Mo and alloys - Murakami's reagent
Mo and its alloys, Ta and its alloys, W and W-base alloys-Electrolytic etching
Mo and some alloys
Mo and some alloys
Mo crystalline specimens-Chemical etching/thinning
Mo discs-Chemical cleaning-Moly's etchant
Mo foil-Chemical cleaning/polishing
Mo poly sheet-Chemical cleaning
Mo pressed powder discs-Chemical etching
Mo sheet-Electrolytic polishing
Mo single crystal specimens-Electrolytic thinning
Mo specimens subjected to Kr+ ion bombardment-Chemical etching
Mo specimens used for electroplating-Chemical polishing
Mo specimens-Chemical cleaning
Mo specimens-Chemical cleaning
Mo specimens-Chemical cleaning
Mo specimens-Chemical cleaning
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching/polishing
Mo specimens-Chemical polishing
Mo specimens-Chemical polishing
Mo specimens-Chemical polishing
Mo specimens-Chemical polishing
Mo specimens-Electrolytic etching
Mo specimens-Electrolytic etching
Mo specimens-Electrolytic polishing
Mo thin films and crystalline specimens-Chemical etching
Mo thin films and crystalline specimens-Chemical etching
Mo thin films and crystalline specimens-Metal alloying
Mo thin films-Chemical etching
Mo, Nb, Ta, W
Mo, Nb-Chemical-Mechanical polishing
Mo, W, V
Mo, W, V, Nb and Ta
Mo, W-Chemical-Mechanical polishing
Mo, W-Electrolytic etching
Mo-Al and Mo-Co alloys-Chemical etching
Mo-C alloys
Mo-C alloys-Chemical etching
Mo-C alloys-Chemical etching
Mo-Co alloys-Pre etch for alpha Co alloys in 50% nitric acid
Mo-Fe alloys-Chemical etching
Mo-Ga alloy-Chemical etching
Mo-Hf alloy (1 at.% Hf)-Electro thinning
Mo-Hf alloys-Electrolytic etching
Mo-Mn-Co system-Chemical etching, electrolytic etching
Mo-Nb alloy single crystal-Alloy with 5 at.% Nb
Mo-Ni alloy-Alloy with 33 at.% Mo
Mo-Ni alloys-Chemical etching
Mo-Ni alloys-Electro thinning
Mo-Ni-C system-Chemical etching
Mo-Os alloys-Chemical and electrolytic etching
Mo-Pt alloys-Alloys with up to 55 at.% Pt
Mo-Re alloy (34% Re)-Alloy with 34 at.% Re
Mo-Re alloy (35% Re)-Electrolytic polishing
Mo-Re alloy-Alloy with 5 at.% Re
Mo-Re alloys
Mo-Re alloys-Electro thinning
Mo-Re alloys-Electrolytic polishing and etching
Mo-Re-C alloy-Mo-3.5Re-0.2C
Mo-Re-Hf-C system-Mo-1.6/2.3Re-0.2/1.0Hf-0.1/1.9C
Mo-Sc alloys-Chemical etching
Mo-Y alloys-Chemical etching
Mo-Zr alloys-Electro thinning
Mo2B3 specimens-Chemical etching
Mo2B3 specimens-Chemical etching
Mo2B5 specimens-Chemical etching
Mo2C specimens-Chemical etching
Mo3Ge specimens and Mo3Ge2-Chemical etching
Mo3Ge specimens-Chemical etching
MoB surface penetration film-Chemical etching
MoB2 specimen-Chemical etching
MoN and Mo2N thin films grown on (100) silicon wafers-Chemical etching
MoO2 as amorphous platelets on steel-Chemical etching
MoO3 thin film-Chemical etching
MoS2 as powdered lubricant-Chemical cleaning
MoS2 natural single crystal specimens-Ester, removal
MoS2 single crystal platelets-Tape, cleaning
MoS2 single crystal specimens-Chemical polishing
MoSe2 single crystal specimens-Chemical polishing
MoSeS2 single crystal platelets-Tape, cleaning
MoSi2 the films deposited on silicon substrates-Ionized gas etching
MoSi2 thin films deposited on silicon substrates-Ionized gas etching
MoSi2 thin films-Gas forming
MoTe2 single crystal specimens-Chemical polishing
Modified 'AB' etchant
Modified Marble's reagent
Molybdenium-Mo
Molybdenium-Mo
Molybdenium-Nb, Ta, Mo and their alloys
Molybdenum boride (MoB2)-Chemical etching
Molybdenum disilicide (MoSi2)-Chemical etching
Molybdenum samples-Mo, W and V
Molybdenum samples-Mo, W, V, Nb, Ta and their alloys
Molybdenum selenide (MoSe2)-MoSe2 single crystal
Molybdenum silicide (MoSi2 and Mo5Si3)-Electrolytic etching
Molybdenum single crystal-Electro polishing
Molybdenum sulphide (MoS2)-Produces hexagonal etch pits on (0001) face
Molybdenum, Re alloys, Re-Mo alloys-Electrolytic polishing
Molybdenum, color etchant-Chemical etching
Molybdenum, etch figures-Chemical etching
Molybdenum, sintered and cast-Electrolytic polishing
Molybdenum, sintered and cast-Electropolishing
Molybdenum, tantalum, niobium-Electrolytic polishing
Molybdenum-Cathodic etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical polishing
Molybdenum-Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Molybdenum-Electric contact material
Molybdenum-Electro and chemical polishing
Molybdenum-Electro etching
Molybdenum-Electro polishing
Molybdenum-Electro polishing
Molybdenum-Electro polishing
Molybdenum-Electro polishing
Molybdenum-Electro polishing and thinning
Molybdenum-Electro polishing for sheets
Molybdenum-Electro polishing, thinning and chemical etching
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning by window technique
Molybdenum-Electrolytic etching
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing and etching
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing-Mo thin foil preparation
Molybdenum-Jet thinning
Molybdenum-Mo
Molybdenum-Mo
Molybdenum-Mo
Molybdenum-Mo
Molybdenum-Mo
Molybdenum-Mo
Molybdenum-Mo (grain contrast)
Molybdenum-Mo and Mo alloys
Molybdenum-Mo and Mo alloys
Molybdenum-Mo and Mo base alloys
Molybdenum-Mo and Mo-Ni alloys
Molybdenum-Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys
Molybdenum-Mo, Tungsten-W
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Particulary good for sintered Mo-32 to 80 F
Molybdenum-Pure Mo
Molybdenum-Pure Nb, Mo
Molybdenum-Ta and Ta base alloys. Nb and Nb base alloys. Nb-Cr alloys. Mo and Mo alloys
Molybdenum-W and W base alloys. Mo and Mo base alloys
Molybdenum-silver (Mo-Ag)-Electric contact material
Molybenum-Mo
Monel 400-For the grain boundaries
Monel, Ni-Al and Ni-Fe alloys
Monel-Electro polishing
Monel-Electrolytic polishing
Morris's solution
Mullite (Al2O3 x SiO2), BeO, MgO, Ca(2)Zr(1-1x)O(y)-Chemical etching
Mullite (Al4OSi2 x Al2O12)-Chemical etching
Murakami reagent
Murakami's etchant
Muscovite mica (0H)2KAl2(AlSi3O10)-Acid, float-off
Muscovite mica (0H)2KAl2(AlSi3O10)-Chemical cleaning
N-155 alloy-Chemical etching
N-155 alloy-Chemical etching
N2, grown as a single crystal-Pressure, defect
NASA 11B7 alloy-56.6Ni-3.4Al-0.7Ti-8.9Cr-2.0Mo-0.1C-9.1Co-7.5W-0.5V-10.2Ta-1.1Hf (+ 0.02 B) by weight
Na beta Al2O3-Chemical etching
Na beta Al2O3-Physical etching
NaBr single crystal specimens-Alcohol, cutting
NaBr specimens-Chemical etching
NaCl
NaCl
NaCl
NaCl
NaCl (100) blanks-Gas cleaning
NaCl (100) cleaved wafers-Chemical etching
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) cleaved wafers-Dislocation etching
NaCl (100) cleaved wafers-Dislocation etching
NaCl (100) cleaved wafers-Dislocation etching
NaCl (100) cleaved wafers-Thermal etching
NaCl (100) cleaved wafers-Thermal, float-off
NaCl (100) crystals
NaCl (100) wafers
NaCl (100) wafers and single crystals-Chemical polishing
NaCl (100) wafers, NaCl single crystal whiskers-Chemical etching-Moran's etchant
NaCl (100) wafers-Acid, float-off
NaCl (100) wafers-Chemical cleaning
NaCl (100) wafers-Chemical cleaning
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching-Barber's etchant
NaCl (100) wafers-Chemical etching-Cook's etchant
NaCl (100) wafers-Chemical polishing
NaCl (100) wafers-Chemical polishing
NaCl (100) wafers-Dislocation etching
NaCl (100) wafers-Gas cleaning
NaCl (100) wafers-Metal decoration
NaCl dendritic sample
NaCl single crystal specimens-Chemical etching
NaCl, NaF
NaKC4H4O6 x 4H2O (0001) wafers-Chemical cleaning
NaKC4H4O6 x 4H2O (0001) wafers-Chemical etching
NaNO3 single crystals-Base, removal
Nb (100) oriented single crystal cylinders-Thermal etching
Nb (100) oriented single crystal rods-Chemical polishing
Nb and 1% Zr alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys
Nb and Nb alloys, Ta and Ta-O alloys (industrial alloys), etch figures-Chemical etching
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys
Nb and alloys - 'Fluor regia'
Nb and alloys - Picklesimer's anodizing solution
Nb oxide, NbO (blue), NbO2 (blue green), Nb2O5 (red brown)-Electrolytic etching
Nb oxides
Nb polycrystalline samples-Chemical polishing
Nb specimens used for electroplating-Electrolytic polishing
Nb specimens-Chemical cleaning
Nb specimens-Chemical cleaning
Nb specimens-Chemical etching
Nb specimens-Chemical etching
Nb specimens-Chemical etching
Nb specimens-Chemical polishing
Nb specimens-Chemical polishing
Nb specimens-Electrolytic oxidation
Nb specimens-Electrolytic polishing
Nb specimens-Hydrocarbon cleaning
Nb thin films evaporated on glass-Gas oxidation
Nb, Mo, W-Electrolytic lapping
Nb, NbGa, Nb3Si-Anodizing
Nb, Ta-Chemical polishing
Nb, V, Ta
Nb, V, Ta
Nb, V, Ta-Chemical polishing
Nb, V, Ta-Chemical polishing
Nb-Al alloy-Nb3Al
Nb-Al alloy-Nb3Al
Nb-Al alloys-Chemical etching
Nb-Al-Ga system-Nb3Al-Nb3Ga section
Nb-Al-Ga-Ge system-Nb3Al.Nb3Ga-Nb3Ge section
Nb-Al-Ge system-Nb3Al-Nb3Ge section
Nb-Al-Si system-Chemical etching
Nb-C alloys-Chemical ecthing
Nb-Co system-Chemical etching
Nb-Co-Si alloys-Chemical etching
Nb-Cr alloys-Chemical etching
Nb-Ga system-Electro etching
Nb-Ga system-Nb3Ga
Nb-Ga-Ge system-Nb3Ga-Nb3Ge section
Nb-Gd alloys-Chemical etching
Nb-Ge alloy (Nb3Ge)-Chemical etching
Nb-Ge alloy (Nb3Ge)-Chemical etching
Nb-Ge alloys-Anodic etching
Nb-H allooys-Chemical polishing and etching
Nb-Hf alloys
Nb-Hf alloys
Nb-Hf and Nb alloys - DuPont Nb reagent
Nb-Hf-C alloys-Nb rich alloys
Nb-Ir alloys-Chemical and electrolytic etching
Nb-Mo alloys-Alloys with 1-8 at.% Mo
Nb-Mo alloys-Single crystal alloys
Nb-Mo-C alloys
Nb-Mo-C alloys-Chemical etching
Nb-N alloys
Nb-N system-Chemical etching
Nb-N system-Chemical etching
Nb-N system-Electro polishing
Nb-N system-Electrolytic etching
Nb-Ni alloy (Ni60Nb40)-Electro thinning
Nb-Ni alloy-Ni-Ni3Nb eutectic
Nb-O alloys
Nb-Re alloys
Nb-Rh alloys (<25 at.% Rh) alloys
Nb-Rh alloys single crystal-Chemical polishing
Nb-Rh alloys-Chemical and electrolytic etching
Nb-Ru alloys-Electrolytic etching
Nb-Sc alloys-Chemical etching
Nb-Si alloys-Anodising
Nb-Sn alloy (Nb3Sn)-Chemical etching
Nb-Sn alloy (Nb3Sn)-Chemical etching
Nb-Sn alloy (Nb3Sn)-Electro thinning and polishing
Nb-Sn alloy-Chemical etching
Nb-Sn alloy-Chemical etching
Nb-Sn alloys
Nb-Sn alloys
Nb-Sn alloys
Nb-Sn alloys (single crystal Nb3Sn)-Chemical etching
Nb-Sn alloys-Anodic etching, chemical etching
Nb-Sn alloys-Chemical ecthing
Nb-Ta alloys-Chemical polishing
Nb-Tb and Nb noble metal alloys
Nb-Ti alloy (20 at.% Nb)-Chemical polishing
Nb-Ti alloy (54.3 at.% Ti)-Chemical etching
Nb-Ti alloys
Nb-Ti alloys (18-40 at.% Nb)-Chemical thinning
Nb-Ti alloys-Anodising
Nb-Ti alloys-Electro thinning
Nb-V alloys-Chemical etching
Nb-V and Nb alloys
Nb-W-Mo-Hf alloy-SU16 alloy 11% W, 3% Mo, 3% Hf, 0.08% C
Nb-W-Zr alloy (NB7-19% W, 2% Zr)-Chemical etching
Nb-Zn alloys-Chemical etching
Nb-Zr alloy (1% Zr)-Chemical etching
Nb-Zr alloy (15% Nb)-Electro thinning
Nb-Zr alloy (16-40% Zr)-Electrolytic polishing
Nb-Zr alloy (2.5% Nb)-Chemical thinning for electron microscopy
Nb-Zr alloy (2.7% Nb)-Chemical etching
Nb-Zr alloy (25 at.% Zr)-Electro polishing
Nb-Zr alloy (25% Zr)-Chemical etching
Nb-Zr alloy (up to 20% Nb)-Chemical etching
Nb-Zr alloys
Nb-Zr alloys
Nb-Zr alloys (Omega phase)-Chemical polishing
Nb-Zr alloys-Chemical etching
Nb-Zr alloys-Chemical etching
Nb-Zr alloys-Chemical etching
Nb-Zr alloys-Chemical polishing and etching
Nb-Zr alloys-Electrolytic etching
Nb-Zr alloys-Micro jet machinning
Nb-Zr alloys-Sample prepation
Nb-Zr and Nb-Zr-Re alloys
Nb-Zr-O system (Nb rich)-Electrolytic etching
Nb-low carbon alloys-Chemical polishing
Nb/Nb2O3, E-Ni-Fe-Chemical-Mechanical polishing
Nb2O5
Nb2O5 as the natural mineral iron niobate FeNb2O6-Chemical etching
Nb3B3 specimens-Chemical etching
Nb3B3 specimens-Chemical etching
Nb3B3 specimens-Chemical etching
Nb3Ge single crystal compound-Physical etching
Nb3Ge thin films on (100) Ge substrates-Chemical etching
Nb3Ge thin films-Chemical etching
Nb3Se (100) hexagonal platelets-Chemical cleaning
Nb3Si
Nb3Sn
Nb3Sn amorphous thin films-Heat, removal
Nb3Sn as single crystals-Chemical polishing
Nb3Sn-Anodizing
Nb3Te4 single crystal-Chemical cleaning
NbAl(y) as alloy specimens-Chemnical etching
NbC and NbC2
NbC specimens-Chemical etching
NbC specimens-Chemical etching
NbC thin films-Chemical etching
NbC/NbC2-Electrolytic etching
NbH as powder-Chemical etching
NbH deposited on silicon wafers-Chemical etching
NbN (100) thin films deposited on NaCl-Ionized gas cleaning
NbN (yellow), Nb2N (pink)-Electrolytic etching
Nd specimens-Arc, forming
Nd-Ag alloys-Chemical etching
Nd-Al alloy
Nd-Co alloys-Chemical etching
Nd-Co alloys-Chemical etching
Nd-Co-Cu alloy-(Co,Cu)5Nd
Nd-Fe-B alloys, phase identification-Chemical etching
Nd-H system-Chemical etching
Nd2O3, U3O8-Chemical etching
NdFeB alloy-Rare-earth magnetic alloy
Ne grown as a single crystal-Pressure
Ne-Au alloys-Chemical etching
Ne-Bi system-Chemical etching
Neodymium doped barium titanate-Thermal and chemical etching
Neodymium oxide (Nd2O3)-Chemical etching
Neodymium oxide-Zirconia system-ZrO2-Nd2O3 eutectic
Neodymium specimens-Electrolytic polishing
Neodymium specimens-Electrolytic polishing
Neodymium-palladium alloys (Nd-Pd)-Approx. Nd3Pd4
Neodymium-zinc alloys (Nd-Zn)-Chemical etching
Neptunium-Electrolytic polishing
Neptunium-Np
New etching procedure for Ni alloy 690
Ni (100) wafers-Chemical etching
Ni (100) wafers-Ionized gas cleaning
Ni alloys
Ni alloys - Adler's etch
Ni alloys - Agua regia
Ni alloys - Klemm's III reagent
Ni alloys - Lepito's No. I etch
Ni alloys - Modified Marble's reagent
Ni alloys - Precision No. 1
Ni alloys - Precision No. 2
Ni alloys, some alloy steels
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni alloys
Ni and Ni-Cu (Monel) alloys - Carapella's etch
Ni and Ni-Cu alloys
Ni and alloys
Ni and its alloys-Alloys containing Cr, Fe and other elements
Ni and its alloys-Alloys containing Cr, Fe and other elements
Ni and its alloys-Alloys containing Cr, Fe and other elements. Etchant for nickel welds
Ni and its alloys-Alloys containing Cr, Fe and other elements. Grain structure
Ni and its alloys-High Ni alloys. Porosity and flowlines
Ni and its alloys-Low Ni alloys. Grain structure
Ni and its alloys-Nickel. For grain structure
Ni base casting alloys-Chemical etching
Ni brazing alloys when brazed to steels. Galvanic Ni coatings-Chemical etching
Ni crystalline electrode rod-Alcohol cleaning
Ni evaporated as an AuNi coating on resistors-Chemical etching
Ni evaporated thin films-Chemical etching
Ni passive superalloys
Ni polycrystalline specimens-Electrolytic etching
Ni silicide-Chemical etching
Ni single crystal sphere-Thermal forming
Ni single crystals-Electrolytic thinning
Ni specimens-Chemical cleaning
Ni specimens-Chemical cleaning
Ni specimens-Chemical etching
Ni specimens-Chemical etching
Ni specimens-Chemical etching
Ni specimens-Chemical etching
Ni specimens-Chemical etching-Jewitt-Wise's etchant
Ni specimens-Chemical polishing
Ni specimens-Chemical polishing
Ni specimens-Electrolytic etching
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni steel-Fe-0.4/1.3C-8/25Ni
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys
Ni superalloys - Beraha's tint etch
Ni superalloys and Ni-Cr alloys - Glyceregia
Ni superalloys, Hastelloy-Chemical etching
Ni superalloys, Ni-Cr alloys - Agua regia
Ni superalloys-Chemical etching
Ni superalloys-Electrolytic etching
Ni thin film evaporation on glass-Chemical etching
Ni thin films-Chemical etching
Ni, 20% Cr and 2% ThO2 alloy
Ni, Ni-Cr and Ni-Fe alloys
Ni, Ni-Cu and Ni-Fe alloys and superalloys - Marble's reagent
Ni, Ni-Cu, Ni-Ti alloys
Ni-20Cr and Ni-20Cr-45Fe-Chemical etching
Ni-Ag alloys
Ni-Ag alloys and superalloys
Ni-Ag, Ni-Al, Ni-Cr, Ni-Cu, Ni-Fe and Ni-Ti alloys
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-NiAl3 eutectic
Ni-Al alloy-Alloy with 0.1-0.5 at.% Al
Ni-Al alloy-Alloy with 4-8% Al
Ni-Al alloy-Electro thinning
Ni-Al alloy-Electro thinning
Ni-Al alloy-Ni rich NiAl
Ni-Al alloys
Ni-Al alloys (3-25% Al)
Ni-Al alloys-70Ni-30Al
Ni-Al alloys-Beta type alloys
Ni-Al alloys-Chemical etching
Ni-Al alloys-Chemical etching
Ni-Al alloys-Electro polishing
Ni-Al alloys-Electro thinning
Ni-Al alloys-Electro thinning
Ni-Al alloys-Electro thinning
Ni-Al alloys-Ni-6/8Al
Ni-Al alloys-Ni3Al
Ni-Al system-Al-Al3Ni eutectic
Ni-Al system-Chemical etching
Ni-Al, Ni-Cr-Al and Ni-Cr-Ti alloys
Ni-Al-Cu steel-Fe-0.3C-4Ni-1Al-1Cu
Ni-Al-Hf alloys-Ni-20/23Al-5/7.5Hf
Ni-Al-Mo alloy-Ternary eutectic of gama prime-Ni3Al, gamma-nickel rich f.c.c and alpha-Mo
Ni-Al-Mo alloys-65Ni-8Al-27Mo
Ni-Al-Mo alloys-Ni-8Al-26.4Mo, Ni-6.3Al-31.2Mo
Ni-Al-Mo alloys-NiAl/Mo eutectic
Ni-Al-Nb alloy-Ni3Al-Ni3Nb eutectic
Ni-Al-Nb alloys-Ni rich alloys
Ni-Al-Ta alloys-Ni-20/29Al-2.5/7.5Ta
Ni-Al-Ti alloy-Ni3(Al,Ti)
Ni-Al-Ti alloy-Ni3AlTi
Ni-Al-Ti alloy-Ni3AlTi, etch pits
Ni-Al-Ti alloys
Ni-B alloys-Chemical etching
Ni-B-P glass-Ni80-P10-B10 splat cooled alloy
Ni-B-Si-C alloy-Electro polishing
Ni-Be-Cr alloys-Electro thinning
Ni-C alloys-Chemical etching
Ni-Chrome-Electro polishing
Ni-Chrome-Electrolytic polishing
Ni-Co (15%) specimens-Electrolytic thinning
Ni-Co alloy-Alloy with 32 at.% Ni
Ni-Co alloys-Electro thinning
Ni-Co alloys-Electro thinning by window technique
Ni-Co-Al alloys-Electro polishing and etching
Ni-Co-Cr alloys-29-34 wt.% Ni, 30-34 wt.% Co, 32-41 wt.% Cr
Ni-Co-Cr alloys-29-34 wt.% Ni, 30-34 wt.% Co, 32-41 wt.% Cr
Ni-Co-Cr alloys-Electro thinning
Ni-Co-Cr-Mo alloys-30-32 wt.% Ni, 30-32 wt.% Co, 34 wt.% Cr, 2-7 wt.% Mo
Ni-Co-Cr-Mo alloys-30/32 wt.% Ni-30/32 wt.% Co-34/30 wt.% Cr-1/7 wt.% Mo
Ni-Co-Cr-W alloys-28-32 wt.% Ni, 28-32 wt.% Co, 32-34 wt.% Cr, 2-11 wt.% W
Ni-Co-Cr-W alloys-28-32 wt.% Ni-28-32 wt.% Co-32-34 wt.% Cr-2-11 wt.% W
Ni-Co-Ti alloy-Ti4Co3Ni
Ni-Cr specimens-Electrolytic polishing
Ni-Cr alloys
Ni-Cr alloys
Ni-Cr alloys
Ni-Cr alloys
Ni-Cr alloys
Ni-Cr alloys-Alloys with < 20% Cr
Ni-Cr alloys-Alloys with 10-12% Cr
Ni-Cr alloys-Chemical etching
Ni-Cr alloys-Electro polish and etching
Ni-Cr alloys-Electro thinning by window technique
Ni-Cr alloys-Electrolytic etching
Ni-Cr alloys-Electrolytic etching
Ni-Cr alloys-Electrolytic etching
Ni-Cr alloys-Etching for carbides
Ni-Cr alloys-Ni2Cr
Ni-Cr alloys-Preferential electro polishing for chromium rich phases
Ni-Cr as an evaporated thin film on (100) oriented Si wafers-Chemical etching
Ni-Cr evaporated thin films on (100) Si wafers-Chemical etching
Ni-Cr matrix - TaC wire composite-Shows up fibre shape and facets (111) planes in FCC matrix
Ni-Cr residual metals-Chemical cleaning
Ni-Cr specimens-Chemical etching
Ni-Cr specimens-Electrolytic cutting
Ni-Cr specimens-Electrolytic thinning
Ni-Cr stainless steel-Fe-20Cr-25Ni-0.4Mn-0.5Nb-0.01C
Ni-Cr steel-Fe-3.5Ni-1.4Cr-0.3C
Ni-Cr steel-Fe-3.5Ni-1.7Cr-0.3C
Ni-Cr thin film deposition as a bimetallic layer of Au/Ni-Cr-Chemical etching
Ni-Cr thin films evaporated on (111) and (100) oriented Si-Chemical etching
Ni-Cr-Al alloys-82Ni-12Cr-6Al
Ni-Cr-Al alloys-Chemical etching
Ni-Cr-Al alloys-Electro thinning by window technique
Ni-Cr-Al alloys-Ni-Al/Cr eutectic
Ni-Cr-Al alloys-NiAl/Cr eutectic
Ni-Cr-Al alloys-NiAl0Cr eytectic 33 at.% Ni, 33 at.% Al, 34 at.% Cr
Ni-Cr-Al-C alloys-Ni-15Cr-3/10Al-0.05/0.3C
Ni-Cr-Al-Mo alloys-(NiAl-Cr(Mo)) eutectic
Ni-Cr-Al-Mo-Nb-Ti-Zr alloy-Inco 713LC Ni-12Cr-6Al-0.8Ti-4.6Mo-1.5/2.5Nb-0.1Zr-(+C,B)
Ni-Cr-Al-Ta alloys-Ni-16Cr-5Al-4Ta
Ni-Cr-Al-Ti alloy-In 853 or Inconel MA 753, Ni-19Cr-1.2Al-2.4Ti (+Zr, B, Y2O3)
Ni-Cr-Al-Ti alloys-10-12 Cr, 5-6 Ni, 1 Ti
Ni-Cr-Al-Ti alloys-Ni-15Cr-3(Ti+Al), Ni-20Cr-3(Ti+Al), Ni-20Cr-4(Ti+Al)
Ni-Cr-Al-Ti alloys-Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti (at.%)
Ni-Cr-Al-Ti-C alloy-Ni-15Cr-1/4.5Al-2.5/6Ti-0.15/0.25C
Ni-Cr-Al-Ti-C alloys-10-12% Cr, 5-6% Al, 1% Ti, 0.1% C
Ni-Cr-Al-Ti-Ta alloys-10-12 Cr, 5-6 Al, 1 Ti, 0.15 Ta
Ni-Cr-Al-Ti-Ta-C alloy-10/12Cr-5/6Al-1Ti-0/15Ta-0/1C
Ni-Cr-Al-Ti-W alloys-Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti-<4W (at.%)
Ni-Cr-Al-Ti-Y alloy-Inconel MA753 Ni-22Cr-1.6Al-2.7Ti-1.3Y2O3
Ni-Cr-Al-yttria alloy-48Ni-16Cr-5Al-1Y2O3
Ni-Cr-C alloy-Fe-25Cr-0.25C
Ni-Cr-C alloys-Electrolytic etching
Ni-Cr-Co-C alloys-25Cr-30Co-0.15C-Ni, Co-25Cr-10Ni-0.15/0.25 C
Ni-Cr-Co-Mo-Ti-Al-Fe-C alloy-Waspaloy Ni-0.06C-19Cr-4Mo-14Co-0.5Fe-1.4Al-3Ti
Ni-Cr-Fe alloys (Inconel)-Chemical etching
Ni-Cr-Fe alloys (Inconel)-Electro thinning
Ni-Cr-Fe alloys - Lepito's No. II etch
Ni-Cr-Fe alloys-Alloys with up to 40% Fe
Ni-Cr-Fe alloys-Electro thinning by Bollmann technique
Ni-Cr-Fe aloys-Chemical etching
Ni-Cr-Fe aloys-Chemical etching
Ni-Cr-Fe-Al alloys-Up to 40% Fe and 2% Al
Ni-Cr-Fe-Mo alloys-Hastelloy X Ni-21Cr-18Fe-9Mo (+C)
Ni-Cr-Fe-Mo-Co-Mn-W-C alloy-Ni-21Cr-19Fe-8.6Mo-2Co-0.6Mn-0.5W-0.1C, Hastelloy X
Ni-Cr-Fe-Mo-Nb alloys-Inconel 718, Ni-19Cr-19Fe-3Mo-5Nb+Al,Ti,C
Ni-Cr-Fe-Nb alloys-Up to 40% Fe and 1% Nb
Ni-Cr-Fe-Si alloys-Alloys with up to 40% Fe, 1% Si
Ni-Cr-Mn steel-Fe-0.3C-8/21Ni-9Cr-2Mn
Ni-Cr-Mo-Al-C alloys-Ni-15Cr-3/5Mo-7Al-0.2C
Ni-Cr-Mo-C alloys-Ni-15Cr-5Mo-0.2C
Ni-Cr-Mo-Ti-Al-C alloys-Ni-15Cr-0.1/5Mo-2.5/3.5Al-4.5/5.5Ti
Ni-Cr-Mo-W-Al-Ta-C alloy-Ni-6Cr-3Mo-5W-6Al-8Ta-0.1C
Ni-Cr-Ta alloys-10-12% Cr, 0-15% Ta
Ni-Cr-Ta alloys-25 wt.% Ta, 10 wt.% Cr
Ni-Cr-Ta-C alloys-10-12 Cr, 0-15 Ta, 0-1 C
Ni-Cr-Th alloy-20% Cr, 2% ThO2
Ni-Cr-Th alloys-Electrolytic and chemical etching
Ni-Cr-Th alloys-Etch for TD Ni-Cr
Ni-Cr-Th alloys-Ni-20Cr-1.35/2.50 ThO2
Ni-Cr-Th alloys-Ni-20Cr-2ThO2
Ni-Cr-Ti alloys-Electro thinning by window technique
Ni-Cu alloy (Monel)-Chemical etching
Ni-Cu alloys (Monel)-Electro polishing, chemical etching
Ni-Cu alloys and Ni-base superalloys-Chemical etching
Ni-Cu alloys and superalloys - Kallings No. 2 etch
Ni-Cu alloys and superalloys - Murakami's etch
Ni-Cu alloys-Electro thinning by window technique
Ni-Cu alloys-For revealing grain structure
Ni-Fe alloys
Ni-Fe alloys
Ni-Fe alloys
Ni-Fe alloys (Ni3Fe)-Chemical etching
Ni-Fe alloys, reveals grain boundaries-Chemical ecthing
Ni-Fe alloys-33Ni-67Fe
Ni-Fe alloys-50Ni-50Fe, 75Ni-25Fe. Shows secondary twins in drawn and rolled material
Ni-Fe alloys-Chemical etching
Ni-Fe alloys-Differences of orientation of martensite plates within prior austenite grains
Ni-Fe, Ni-Mn and Ni-Mo alloys
Ni-Fe-Cr-Mo alloys-Electro thinning by Bollmann technique
Ni-Fe-Cr-Mo alloys-Hastelloy X.280 Ni-20Fe-22Cr-9Mo-low C
Ni-Fe-Cr-Mo-Ti-Al-C alloy-901 alloy Ni-0.05C-13Cr-5.6Mo-36.5Fe-0.25Al-2.9Ti
Ni-Fe-Cr-P-B alloy-Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
Ni-Fe-Cr-P-B alloy-Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
Ni-Fe-Cr-Ti alloy-IN 744X, Fe-26.5Cr-6.6Ni, 0.20Ti (+ 0.06 C)
Ni-Fe-Cr-Ti alloys-Chemical etching
Ni-Fe-Cr-Ti alloys-For alloys with Ni-26Fe-35Cr-0.6Ti
Ni-Fe-Mo-Zr alloy-Ni-12.7Fe-6.7Mo-0.4Zr
Ni-Fe-P-B alloy-Ni40-Fe40-B14-B6
Ni-Fe-Ti alloys-Fe-12Ni-0.25Ti
Ni-Fe-Ti alloys-Fe-12Ni-0.25Ti
Ni-Fe-Ti alloys-Fe-6Ti-10-25Ni
Ni-Fe-Ti alloys-Ti4Ni3Fe
Ni-Ga alloy-Ni3Ga
Ni-Ga alloys-Alloy with approx. 50 at.% Ga
Ni-Ge alloys (Ni3Ge single crystal)-Electrolytic polishing
Ni-Ge alloys-Chemical etching
Ni-Mn alloy-Approx. Ni3Mn
Ni-Mn alloys
Ni-Mn alloys-Electro polishing
Ni-Mn alloys-Electro thinning
Ni-Mn steel-0.3% C-28% Ni-0.5% Mn
Ni-Mo alloy-Alloy with 16.7 at.% Mo
Ni-Mo alloy-Ni4Mo
Ni-Mo alloy-Ni4Mo
Ni-Mo alloy-Ni4Mo
Ni-Mo alloys-Chemical etching
Ni-Mo alloys-Ni-12/33Mo
Ni-Mo alloys-Ni4Mo and Ni3Mo
Ni-Mo steel-Fe-24Ni-4Mo-0.25C
Ni-Mo-Cr-Si alloy-50Ni-31Mo-15Cr-3Si
Ni-Mo-Cr-Ti-C alloy-Ti-Hastelloy-N, Ni-13Mo-4Cr-2Ti-0.06C
Ni-Mo-Fe alloy-Hastelloy B 65Ni-27Mo-5Fe (+0.3Co, 0.3Si, 0.5Mn, 0.4Cr, 0.3V)
Ni-Nb alloys (Ni-Ni3Nb eutectic)-Electro thinning
Ni-Nb alloys (Ni-Ni3Nb eutectic)-Sample preparation
Ni-Nb alloys-Chemical etching
Ni-Nb alloys-Electro thinning for foils
Ni-Nb-Al alloys-Electro polishing and chemical ecthing
Ni-Pd-Ga alloys-Chemical etching
Ni-Pt-Ga alloys-Chemical etching
Ni-Si-B glass-Splat cooled alloys
Ni-Si-B system-Chemical etching
Ni-Ta alloy (25 wt.% Ta)-Electrolytic and chemical etching, electro thinning
Ni-Ta alloy (Ni3Ta)-Chemical etching
Ni-Ta alloys (low Ta)-Chemical polishing and etching, electro thinning
Ni-Ta alloys-Chemical etching
Ni-Ta alloys-Electro thinning for films
Ni-Ta-Cr-Al-C eutectic alloy-69Ni-10Cr-5Al-15Ta-1C
Ni-Ta-Cr-Mn alloy-57Ni-21Ta-15Cr-7Mn
Ni-Th system-Alloys with 50-70% Ni
Ni-Ti alloy (10 at.% Ti)-Chemical etching
Ni-Ti alloy (NiTi)-Chemical etching
Ni-Ti alloy (NiTi)-Chemical polishing
Ni-Ti alloy (NiTi)-Electro polish and thinning
Ni-Ti alloy (NiTi)-Electro thinning
Ni-Ti alloys
Ni-Ti alloys, superalloys-Chemical etching
Ni-Ti-Al alloys-TiNi + 0.05/3.4 at.% Al
Ni-Ti-Al-Si alloys-Chemical etching
Ni-Ti-C alloy-Alloys with 2 wt.% Ti and 0.4 wt.% C
Ni-Ti-Cr-Al alloys-NiTi-2.5 at.% Al-1.5/5 at.% Cr
Ni-V alloy (Ni3V)-Electro thinning and polishing
Ni-V system (Ni3V)-Electro thinning
Ni-W alloy (45% W)-Electrolytic polishing
Ni-W alloys (Ni-26/38% W)-Electrolytic polishing
Ni-W alloys-Electrolytic etching
Ni-Zn alloys
Ni-Zn alloys (56 wt.% Zn)-Chemical etching
Ni-Zn alloys-Chemical etching
Ni-Zn ferrite (Fe-Ni-O-Zn)-Chemical etching
Ni-Zn ferrite (Fe-Ni-O-Zn)-Ni0.36 x Zn0.64 x Fe2O3
Ni-Zr alloys-Electrolytic etching
Ni-alloys
Ni-base alloys - Beraha's tint etch
Ni-base alloys with more than 9Mo, Hastelloy X, Hastelloy C-Chemical etching
Ni-base foundary alloys-Chemical etching
Ni-base superalloy-Electrolytic polishing
Ni-base superalloys-Electrolytic polishing
Ni-based superalloys
Ni-based superalloys - 'Heppenstall' etch
Ni-based superalloys, Mar-M200, Udimet-700
Ni22Cr9Mo steel
Ni2B thin film-Metal forming
Ni3Al based alloys with 21-29 at. per cent Al - Lucas's reagent
Ni50Al46Nb4 or Ni40Al39Nb21 alloys-Twin jet polishing mehod
NiAl single crystal specimens-Electrolytic polishing
NiAl specimens and alloys-Electrolytic polishing
NiB thin films-Ketone, cleaning
NiChrome 80-20 etchant
NiChrome 80-20 etchant
NiChrome 80-20 etchant
NiChrome 80-20-Grain structure and matrix phases-Lucas's reagent
NiCu (30%) single crystal-Thermal forming
NiCu (5%) to NiCu (80%) single crystal wafers-Chemical etching
NiI single crystal-Alcohol removal
NiMn single crystal specimens-Electrolytic etching
NiO
NiO (100) cleaved wafers-Thermal etching
NiO single crystal specimens-Physical thinning
NiO specimens-Chemical etching
NiO thin film platelets-Chemical etching
NiO-Chemical etching
NiO-Electrolytic etching
NiS as the natural mineral Millerite-Chemical etching
NiSi thin films deposited on silicon substrates-Ionized gas etching
NiSi2 thin films deposited on silicon wafers-Chemical cleaning
NiSi2 thin films grown on silicon substrates-Chemical etching
NiTi shape memory alloys-General etchant
NiTi shape memory and superelastic alloy-Chemical etching
NiTi single crystal specimens-Chemical etching
NiZn ferrite and Ni ferrite
Nichrome (20% Cr)-Chemical etching
Nichrome-lanthanum oxide system-Ni-20Cr-1.2/1.6La2O3
Nickel aluminate spinel-Chemical etching
Nickel (Ni) - Marble's reagent
Nickel alloys-Electro polishing
Nickel alloys-Electropolishing
Nickel alloys-Jet machinning
Nickel and Ni-Co alloys-Electropolishing
Nickel and Ni-Cu alloys-Chemical etching
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-For revealing cracks, porosity m dendritic patterns in cast alloys
Nickel and nickel alloys-Ni-Cr and Ni-Cr-Fe alloys
Nickel and nickel alloys-Reveals cracks, porosity, etc.
Nickel and nickel-copper alloys (Ni-Cu)-For Monel K-500 alloy
Nickel and nickel-copper alloys (Ni-Cu)-For revealing grain boundaries
Nickel and nickel-copper alloys (Ni-Cu)-Microscopic examination of grain boundaries and general structure
Nickel base superalloy GMR 235-Chemical etching
Nickel base superalloy GTD111-Chemical etching
Nickel base superalloys-Selective phase contrasting
Nickel deposits on steel
Nickel ferrite (Ni-Fe-O)-Chemical etching
Nickel oxide (NiO)-Chemical etchinhg
Nickel oxide (NiO)-Chemical thinning
Nickel oxide (NiO)-Etch pits reagent
Nickel phosphorus alloys (Ni-P)-Electrolytic and chemical polishing
Nickel phosphorus glass (Ni-P)-Ni80P20
Nickel plating-Electropolishing
Nickel single crystal-Electro polishing
Nickel specimens T.D. grade-Chemical etching
Nickel specimens TD-Thorium deposited nickel. Etch for grain boundary
Nickel specimens and nickel alloys-Electro polishing
Nickel specimens base alloys-Electro thinning by PTFE holder
Nickel specimens-80Ni-20Cr and 35Ni-20Cr-45Fe alloys
Nickel specimens-Carbides in Ni-Cr alloys
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching, electrolytic polishing
Nickel specimens-Chemical polishing
Nickel specimens-Chemical polishing
Nickel specimens-Contrast etching
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning by Bollmann technique
Nickel specimens-Electro thinning by window technique
Nickel specimens-Electro thinning by window technique
Nickel specimens-Electrolytic etching
Nickel specimens-Electrolytic etching
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing and etching
Nickel specimens-Electrolytic polishing and etching
Nickel specimens-Electrolytic polishing, chemical etching
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Grain boundaries. Pure types of Ni and alloys with high Ni content. Ni-Ti and Ni-Cu alloys
Nickel specimens-Grain contrast in Ni. Ni-Ag, Ni-Al, Ni-Cr, Ni-Cu, Ni-Fe, and Ni-Ti alloys
Nickel specimens-High alloy Ni. Ni-Cu alloy (Monel), Ni-Al, Ni-Fe alloys. Porosity. Flow lines
Nickel specimens-Inconel type alloys on Ni-Cr and Ni-Fe-Cr basis
Nickel specimens-Low alloy Ni. Cracks. Porosity
Nickel specimens-Ni alloys containing Cr and Fe. Welding joints
Nickel specimens-Ni and Ni base alloys, Ni-Cr and Ni-Fe alloys. Cast alloys
Nickel specimens-Ni and Ni base alloys. Bi-Cu alloys. Ni-Cr-Fe alloys
Nickel specimens-Ni and Ni base alloys. Ni-Cr alloys
Nickel specimens-Ni and Ni base alloys. Ni-Cr and Ni-Cr alloys
Nickel specimens-Ni and Ni base alloys. Ni-Cr, Ni-Fe alloys. Superalloys of the Nimonic type
Nickel specimens-Ni base superalloys
Nickel specimens-Ni base superalloys. Gamma precipitates. Ti and Nb microsegregations
Nickel specimens-Ni silicides
Nickel specimens-Ni-Al alloys
Nickel specimens-Ni-Al, Mo-Ni, Ni-Ti alloys
Nickel specimens-Ni-Au, Ni-Mo, and Ni-Cr alloys. Micro inhomogenities in superalloys
Nickel specimens-Ni-Cu alloys. Ni base superalloys
Nickel specimens-Ni-Fe and Ni-Al alloys
Nickel specimens-Ni-Fe, Ni-Cu, and Ni-Ag alloys. Ni base superalloys
Nickel specimens-Ni-Zn alloys
Nickel specimens-Ni-Zn-Ag, Ni-Ag-Ni-Cu, and Ni-Al-Mo alloys
Nickel specimens-One of the best electrolyte for universal use
Nickel specimens-Pysical etching
Nickel specimens-Superalloys
Nickel specimens-WC-Mo2C-TiC-Ni cemented carbides
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloys-Chemical etching
Nickel superalloys-Chemical etching
Nickel superalloys-Etching for gamma prime in superalloys
Nickel superalloys-Grain size and texture are well revealed. Freckles are less easily seen
Nickel superalloys-Macrostructure clearly revealed
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel-Electrolytic polishing
Nickel-Ni
Nickel-Ni
Nickel-Ni
Nickel-Ni
Nickel-Ni - Marble's reagent
Nickel-Ni base superalloys. Especially suitable for Hastelloy types
Nickel-Ni(CP, HP)
Nicrofer alloy-Electro polishing
Nimonic 105-Ni-0.14C-0.3Fe-14.4Cr-1.3Ti-4.7Al-20Co-5Mo
Nimonic 115 alloy-Ni-15Cr-15Co-4Ti-3.5Mo-5Al
Nimonic 80 alloy-Ni-21Cr-2.7Ti-1.6Al-1.5Fe-2Co-0.8Si-0.4Mn-0.2Cu-0.1C
Nimonic 80A-Electro thinning, electro polishing
Nimonic 80A-Ni-20Cr-1.3Al-2.3Ti
Nimonic PE 16-Fe-43.5Ni-16.5Cr-1.2Ti-3.2Mo-1.2Al
Nimonic PE16 alloy-Fe-0.05C-0.25Si-16.6Cr-3.2Mo-43.6Ni-1.15Al-0.2Co-1.2Ti (+B,Zr)
Nimonic alloys-Macro defects in the Nimonic alloys
Nimonic alloys-Macro defects in the Nimonic alloys
Nimonic alloys-Nimonic 901
Nimonic alloys-Nimonic 108, 109, 115, 120, EPK 55. Nimonic PK 33 and PK 50
Nimonic alloys-Nimonic 263
Nimonic alloys-Nimonic 75, 80A, 90, 93, 105, 108, 109, 115, 120, EPK 55, and EPK 57. Nimocast alloys
Nimonic alloys-Nimonic PE 7, PE 11, PE 16. Nimonic 901
Nimonic alloys-Nimonic PK 31
Nimonic alloys-Nimonic PK 31, Nimonic EPK 57
Nimonic alloys-Nimonic PK 31, Nimonic EPK 57
Nimonic alloys-Nimonic PK 33, PK 50, Nimonic 901
Nimonic alloys-Nimonic alloys 75, 80A, 90, 93, 105
Nimonic alloys-Nimonic alloys PE7, PE11, and PE16. Nimonic Pk 31
Nimonic, Ni-Cr-Co alloys, Ni-Cr-Co-Mo alloys
Nimonic, Ni-Cr-Co alloys, Ni-Cr-Co-Mo alloys
Niobium (high purity)-Etch pit etching
Niobium carbide (NbC)-Dislocation etching
Niobium carbide (NbC)-Thermal etching
Niobium oxide (NbO, Nb2O3, Nb2O5)-Chemical etching
Niobium single crystal-Chemical polishing
Niobium single crystal-Electrolytic polishing
Niobium single crystal-Electrolytic polishing
Niobium single crystal-Produces triangular etch pits on (111) planes
Niobium specimens-Cathodic etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Cr, Nb, and alloys
Niobium specimens-Dislocation etching
Niobium specimens-Electro polishing
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning (wire)
Niobium specimens-Electro thinning by window technique
Niobium specimens-Electro thinning by window technique
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electropolishing
Niobium specimens-Etch pits etching
Niobium specimens-Final electro polishing
Niobium specimens-For dislocation etch pits
Niobium specimens-Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys
Niobium specimens-Mo, W, V, Nb, Ta and their alloys
Niobium specimens-Nb, Ta, Mo and their alloys
Niobium specimens-Ta and Ta base alloys. Nb and Nb base alloys. Nb-Cr alloys. Mo and Mo alloys
Niobium specimens-Ta base alloys, Nb base alloys
Niobium specimens-Ta base and Nb base alloys
Niobium specimens-Ta, Nb, and their alloys. Cr and Cr silicide. Re silicide. W-Th alloys
Niobium specimens-Twin jet electro polishing
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb
Niobium-Nb - Pelleg's electropolishing solution
Niobium-Nb, Tantalum-Ta
Niobium-Nb, Tantalum-Ta
Niobium-Tin (Nb-Sn)-Nb3Sn
Niobium-tin (Nb-Sn)-Chemical thinning
Nital
Nital
Nitinol
Nitrided DIN 1.8550(34CrAlNi7) steel specimens-Macro for segregation
Nitrided steels
Nitriding steels
Nitroalloy
Nitronic 50 (XM-19) stainless steel wire-Chemical etching
Nivco alloy-Chemical etching
No. 25 alloy-shows twinned structure
No.176 alloy-Electrolytic etching
No.36 alloy-Chemical etching
Non-oxide ceramics-Thermal etching
Np specimens-Chemical polishing/etching
NxSiO2 thin films-Chemical etching
O.R.F. formulation
OFHC copper - Jong's color etch
OFHC copper, Cu-Zn alloys (10-15% Zn), Cu-7.5% Al alloy
OSD alloy MA956-Fe-20Cr-4.5Al-0.5Ti-0.5Y2O3
OSD alloy MA956-Fe-20Cr-4.5Al-0.5Ti-0.5Y2O3
Oberhoffer's etch
Oberhoffer's macroetch reagent-For macro etching of steel specimens
Oberhoffer's reagent
Os alloys
Os and Os-W alloys
Os specimens-Chemical etching
Os-Electrolytic etching
Os-Ir alloys
OsS2 single crystal specimens-Chemical polishing
OsTe2 single crystal specimens-Chemical polishing
Osmium and alloys-Grain contrast
Osmium and alloys-Grain contrast
Osmium samples-Ru and Ru alloys, Os and Os alloys, Rh and Rh alloys
Osmium-Electrolytic polishing
Osmium-Os and Os-W alloys
Osmium-Os base alloys, pure Pd and Pd alloys, Pt-Au alloys, Ir
Oxide Ceramics (Be, Zr, Mg, Ca)-BeO (toxic), Zr2O3, BaO, MgO, Ca8Zr1-xOy
Oxide Ceramics-UO2, UO2-PuP2, UO2-U4O9 and UO2-CeO2 mixtures (toxic)
Oxide ceramics (Al, Si, Be)-Al2O3, SiO2, BeO-UO2-Y2O3 mixtures (toxic)
Oxide ceramics (Al, U, Th)-Al2O3, UO2 (toxic),ThO2 (toxic), Al2O3-MgO mixtures
Oxide ceramics (Ca, Mg)-CaO, MgO
Oxide ceramics (Ce, Sr, Al, Zr)-CeO, SrTiO3, Al2O3, ZrO-ZrC mixtures
Oxide ceramics (Mg, U)-MgO, UO2 (toxic)
Oxide ceramics (Th, Y)-ThO2-Y2O3 mixtures (toxic)
Oxide ceramics (U, Th, Pu)-UO2 (toxic), ThxUyO2 (toxic), PuO2, cast (toxic), PuO2 (gamma, sintered)-toxic
Oxide ceramics (Zr, U, Nd)-ZrO2, U3O8 (toxic)
Oxide ceramics combinations-Thermal and chemical etching
Oxide ceramics combinations-Thermal and chemical etching
Oxide ceramics-Al2O3, Al2O3xMgO, SnO2
Oxide ceramics-Al2O3, Al2SiO5
Oxide ceramics-Al2O3, BeO (toxic), UO2 (toxic)
Oxide ceramics-Al2O3. Relief formation
Oxide ceramics-BaTiO3, BaTi3O7
Oxide ceramics-BeO (toxic)
Oxide ceramics-BeO (toxic)
Oxide ceramics-CaO
Oxide ceramics-Cr2O3, CeO2, Al2O3
Oxide ceramics-Eu2O3
Oxide ceramics-MgO, ThO2 (toxic), Al2NiO4, PuO3 (gamma, sintered)-toxic, Y2O3-ZrO2 and Sm2O3-ZrO2 mixtures
Oxide ceramics-MgO-Al2O3-SiO2-ZrO2 mixtures
Oxide ceramics-Nb oxides, NbO (blue), NbO2 (cyan), Nb3O3 (red-dish-brown)
Oxide ceramics-NiO
Oxide ceramics-U4O9 (toxic)
Oxide ceramics-UO2 (toxic
Oxide ceramics-UO2 (toxic)
Oxide ceramics-UO2 (toxic)
Oxide ceramics-UO2 (toxic). Grain size
Oxide ceramics-UO2-PuO2 mixtures (toxic)
Oxide ceramics-ZnO-Physical etching
Oxide dispersed Ni-Cr-Al-Fe alloy-Ni-16Cr-4.2Al-0.2Fe-0.8/1.0Y2O3-1.6/2.0Al2O3 +C,N
Oxide dispersion hardened MA6000L alloy-Ni-14Cr-4.6Al-4W-2.3Ti-2.1Ta-2Mo-0.75Y-0.6O2-0.2Fe-0.2N-0.07C-0.07Zr (+B)
Oxide scale - NiO
Oxygen enriched Zircaloy 2-Zr-1.2/1.3Sn-< 0.12O2 - 0.13Cr
Oxygen sensing etchant for steels-This reagents is claimed as good for detection of oxygen penetration into steels
Oxyhychroxyapatite-Ca10(PO4)6 x (OH2)2
P2Cr5 thin film-Chemical etching
P2O5 and other phosphorus compounds-Chemical etching
P2O5 powder-Chemical etching
P91 (X10CrMoV91) steel - GE Turbo-chrome etch
PH13-8 Mo steel
PLZT [(Pb,La)(Zr,Ti)O3]
PLZT [(Pb,La)(Zr,Ti)O3]
PZT (PbZrTiO)-Chemical etching
PZT materials (O-Pb-Ti-Zr)-Chemical ecthing
PZT materials (O-Pb-Ti-Zr)-Chemical etching
PZT materials (O-Pb-Ti-Zr)-Chemical etching
PZT materials (O-Pb-Ti-Zr)-Chemical etching
Palladium alloys-Chemical etching
Palladium alloys-Grain contrast
Palladium and palladium alloys-Electrolytic etching
Palladium specimen-Au, Pt alloys and Pd alloys
Palladium welded to nickel-silver (Pd, Ni-Ag)-Electric contact material
Palladium-Au alloys with less thn 90% content of precious metals
Palladium-Cathodic etching
Palladium-Chemical etching
Palladium-Electrolytic polishing
Palladium-Electropolishing
Palladium-For Au alloys with high content of precious metals
Palladium-Os base alloys, pure Pd and Pd alloys, Pt-Au alloys, Ir
Palladium-Pd
Palladium-Pure Au and Au-rich alloys. Pd and Pd alloys
Palladium-Pure Au and Pd. Au-Pd, Pd alloys with more than 90% concentration of precious metals. Rh alloys
Palladium-copper (Pd-Cu)-Electric contact material
Palladium-platinum-gold-silver-copper-zinc (Pd-Pt-Au-Ag-Cu-Zn)-Electric contact material
Palladium-pure Pt and Pd, Au alloys
Palladium-ruthenium (Pd-Ru)-Electric contact material
Palladium-silver (Pd-Ag)-Electric contact material
Palmerton's etchant 1
Palmerton's etchant 2
Parameters for the ion beam etching of different layer composites on steel
Pb (100) wafers-Chemical cleaning
Pb (100) wafers-Chemical etching
Pb (100) wafers-Chemical polishing
Pb (100) wafers-Electrolytic polishing
Pb alloys and solders
Pb alloys-Chemical etching
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys
Pb and Pb alloys-Chemical etching
Pb and Pb alloys-For etching high Pb content alloys a 5% solution is recommended
Pb and Pb alloys-Pb, Pb-Sb, Pb-Ca and Pb-Sn alloys
Pb and Pb alloys-Pb, Pb-Sb, Pb-Ca and Pb-Sn alloys with low tin content
Pb and Pb-Sn alloys
Pb and Pb-Sn alloys (up to 2% Sb)
Pb and alloys
Pb and alloys
Pb and alloys
Pb and alloys
Pb and alloys
Pb and alloys
Pb and alloys
Pb and alloys
Pb and alloys
Pb and most Pb alloys
Pb and most alloys
Pb containing less than 2 Sb-Chemical etching
Pb samples-Chemical etching
Pb single crystal ingots-Chemical etching
Pb single crystal specimens-Chemical polishing
Pb solders and Pb-type alloys
Pb specimens and lead alloys-Chemical etching
Pb specimens and single crystal ingots-Chemical etching
Pb specimens-Chemical cleaning
Pb specimens-Chemical etching
Pb specimens-Chemical polishing
Pb specimens-Oxide removal
Pb telluride
Pb telluride
Pb(NO3)2 grown as single crystals-Chemical polishing
Pb, Pb-Sn alloys (up to 25% Sn)
Pb, Pb-Sn alloys (up to 3% Sn), and Pb solders
Pb, Pb-Sn, Pb-Sn-Cd, Pb-Sn-Sb-Electrolytic polishing
Pb-Ag alloys (Pb-rich)-Chemical etching
Pb-Ag eutectic alloy specimens-Chemical etching
Pb-Ag specimen alloys-Electrolytic polishing/etching
Pb-Ag-Sb alloys (Pb-rich)-Chemical etching
Pb-As-Sb alloys-For lead rich alloys
Pb-As-Sn-Bi alloys
Pb-As-Sn-Bi alloys, grain-contrast etchant-Chemical etching
Pb-Au alloys-For Pb rich alloys
Pb-Bi alloys
Pb-Bi alloys-Chemical and physical etching
Pb-Ca alloys (Pb rich)-Chemical etching
Pb-Ca alloys, inclusions, grain-boundary etchant-Chemical etching
Pb-Ca alloys-Chemical etching
Pb-Cd alloys (Pb rich)-Chemical etching
Pb-Cd and Pb-Sn alloys-Chemical etching
Pb-Cd telleride-Pb(1-x) Cd(x) Te, x <= 0.03
Pb-Cd, Pb-Sn, and Pb-Sb alloys-Chemical etching
Pb-Cd-Sb alloys (Pb rich)-Chemical etching
Pb-Li alloys (Pb rich)-Chemical etching
Pb-Sb alloys
Pb-Sb alloys - Russell's reagent
Pb-Sb alloys - Voce's reagent
Pb-Sb alloys - Worner and Worner's reagent
Pb-Sb alloys, grain boundary etchant-Chemical etching
Pb-Sb alloys, grain-contrast etchant-Chemical etching
Pb-Sb alloys, grain-contrast etchant-Chemical etching
Pb-Sb alloys, hard lead. White metal and type metal with high Pb content-Chemical etching
Pb-Sb alloys-Chemical etching
Pb-Sb alloys-Chemical-etching
Pb-Sb alloys-Electro polishing
Pb-Sb-Cu alloys
Pb-Sb-Cu alloys, grain-contrast etchant-Chemical etching
Pb-Se-Te system (PbSe(1-x)Te(x))-Polishing-etching
Pb-Sn + 2% Ag, solder-Chemical etching
Pb-Sn + Ag as various other alloys with or without silver-Chemical etching
Pb-Sn alloy contacts on silicon diodes-Chemical cleaning
Pb-Sn alloy-Chemical cleaning
Pb-Sn alloys
Pb-Sn alloys
Pb-Sn alloys (Pb rich)-Sample preparation
Pb-Sn alloys (low Pb)-Chemical etching
Pb-Sn alloys-Chemical etching
Pb-Sn alloys-Electrolytic polishing
Pb-Sn eutectic alloy specimens-Chemical etching
Pb-Sn eutectic-Chemical etching
Pb-Sn eutectic-Electrolytic polishing
Pb-Sn eutectics, solders
Pb-Sn selenide (Pb(1-x)Sn(x)Se)-Electrolytic polishing and etching
Pb-Sn-Ag (2%), alloy #63-Chemical cleaning
Pb-Sn-Te alloys (Pb(1-x)Sn(x)Te, x <= 0.03)-Chemical polishing and etching
Pb-Sn-Te system (Pb(1-x)Sn(x))(1-y) Te(y)-Electrolytic polishing and etching
Pb-Sn-Te system-Chemical polishing
Pb-Sn-Te system-Electrolytic etching
Pb-Te-Au system-PbTe-Au section of the diagram
Pb-Te-Co system-Lead telluride-Cobalt section
Pb-Te-Fe system-Lead telluride-Iron section
Pb-Ti eutectic alloy specimens-Chemical etching
Pb-rich alloys
PbAg specimens of alloys-Electrolytic etching
PbGeTe single crystal ingots-Chemical etching
PbI2 as thin crystal platelets-Chemical etching
PbMoO4 single crystals-Pressure
PbO native oxide-Chemical etching
PbO single crystal plates-Cutting
PbS (100) cleaved wafers-Chemical cleaning
PbS (100) wafers-Chemical polishing
PbS (100) wafers-Chemical polishing/etching
PbS (100) wafers-Dislocation etching
PbS (100) wafers-Electrolytic polishing
PbS specimen-Chemical etching
PbS, PbSe
PbS-Chemical etching
PbSe
PbSe (100) cleaved wafers-Chemical cleaning
PbSe (100) wafers and other orientations-Chemical etching
PbSe (100) wafers and other orientations-Chemical polishing
PbSe (100) wafers and other orientations-Electrolytic polishing
PbSe (100) wafers-Eelectrolytic polishing/thinning
PbSnSe (100) wafers-Electrolytic polishing
PbSnTe (100) wafers-Chemical etching
PbSnTe (100) wafers-Chemical polishing
PbSnTe (100) wafers-Chemical polishing/etching
PbSnTe (100) wafers-Electrolytic polishing
PbTe
PbTe
PbTe (100) and PbSnTe (100) wafers-Electrolytic polishing
PbTe (100) cleaved wafers-Chemical etching
PbTe (100) p-type wafers-Oxide removal
PbTe (100) wafers-Chemical etching
PbTe (100) wafers-Chemical etching
PbTe (100) wafers-Chemical etching-Iodate etchant
PbTe (100) wafers-Chemical polishing
PbTe (100) wafers-Chemical polishing
PbTe (100) wafers-Dislocation etching
PbTe (100) wafers-Electrolytic polishing/etching
PbTe specimen-Thermal etching for etch pits
PbTe thin film-Acid float-off
PbZrO3 single crystal specimens-Chemical polishing
PbZrO3 single crystal specimens-Chemical polishing
PbZrO3 single crystal specimens-Chemical polishing
Pd 99.95% pure single crystal specimens-Electrolytic polishing
Pd and alloys
Pd and alloys
Pd and alloys
Pd and alloys
Pd dental alloys, Pd alloys with Al, Os, In, Sn, Fe, and Cu-Chemical etching
Pd single crystals and thin films-Chemical etching
Pd thin film-Chemical cleaning
Pd thin films-Chemical cleaning
Pd-Ag-Cu alloy-35 at.% Ag-25 at.% Cu
Pd-Ce alloy-Pd3Ce
Pd-Ce alloys-Alloys with 0-50% Ce
Pd-Ce alloys-Approx. Ce3Pd4
Pd-Ce alloys-Pd rich alloys
Pd-Dy alloys-Electrolytic etching, chemical etching
Pd-Er alloys-Electrolytic and chemical etching
Pd-Er alloys-Er3Pd4
Pd-Eu alloys-Approx. PdEu
Pd-Ga alloy (Pd5Ga2)-Chemical etching
Pd-Ga alloys-Sample preparation with different etching techniques
Pd-Gd alloys (Approx. Gd3Pd4)-Chemical etching
Pd-Gd alloys-Chemical and electrolytic etching
Pd-Ge system-Pd(x)Ge(1-x), 0.75 <= x =<0.85
Pd-H as powdered "Palladium Black" with absorbed hydrogen-Chemical cleaning
Pd-Hf alloys (Approx. 55 at.% Pd)-Chemical etching
Pd-Ho alloys (Approx. Ho3Pd4)-Chemical etching
Pd-Ho alloys-Chemical and electrolytic etching
Pd-Ni alloys-Chemical etching
Pd-Sm alloys-Chemical and electrolytic etching
Pd-U alloys (Up to 25 at.% U)-Chemical etching
Pd-Y alloys-Chemical and electrolytic etching
Pd-Zn system (Pd-45 at.% Zn)-Phsical thinning
Pd-Zn-Ga alloys-PdZn-PdGa pseudo-binary alloys
PdAg alloy-Chemical etching
PdAu deposited as a 11 mixture on glass, quartz, and aapphire substrates-Chemical etching
PdNiP, PtNiP, and PtCuP metallic glasses-Chemical etching
PdSi and PdSi2 thin films grown on silicon substrates-Chemical etching
Permanent magnet materials-82Co-6Au-12Fe
Permanent magnet materials-CuNiFe, grain size and structure of the solid-solution alloy
Permanent magnet materials-Rare earth (Co3Cu1.6Fe0.5Ce)
Permanent magnet materials-Vicalloy, general structure
Phenol formaldehyde
Phlogophite mica H2KMg3Al(SiO4)3-Gas drying
Phoschromic solution
Phosphides, sulfides (Cd)-CdS
Phosphides, sulfides (Pb)-PbS
Phosphides, sulfides (Pu)-PuP (toxic), PuS (toxic)
Phosphides, sulfides (U)-UO (toxic)
Phosphides, sulfides (U)-US (toxic)
Phosphor bronze alloys-Chemical etching
Phosphorus-Chemical etching
Picklesimer's solution
Picklesimer's solution
Picral
Picral
Plain carbon steel-Chemical etching
Plain carbon steel-Electro polishing
Platinium alloys-Grain contrast
Platinum (Pt)-Pure Pt and Pd. Au alloys
Platinum alloys-Electrolytic etching
Platinum and platinum alloys-Electrolytic etching
Platinum and related materials-Electrolytic etching
Platinum specimens-Au, Pt alloys and Pd alloys
Platinum specimens-Pt and Pt alloys
Platinum-Au alloys with less thn 90% content of precious metals
Platinum-Electro thinning
Platinum-Electro thinning by window technique
Platinum-Electrolytic lapping
Platinum-Electropolishing
Platinum-For Au alloys with high content of precious metals. White gold. Pd and Pt alloys
Platinum-Physical etching
Platinum-Pt
Platinum-Pt
Platinum-Pt
Platinum-Pt
Platinum-Pt alloys, Rh, Ir
Platinum-Pt and Pt alloys, Au and Au alloys
Platinum-Pt, Palladium-Pd
Platinum-Pure Au and Au-rich alloys. Pd and Pd alloys
Platinum-Rh base alloys, Pt-10% Rh alloys, Ir alloys, pure Pt and Pt alloys, Ru base alloys
Platinum-iridium (Pt-Ir)-Electric contact material
Platinum-ruthenium (Pt-Ru)-Electric contact material
Plutonium carbide (PuC)-Electrolytical etching
Plutonium oxide (PuO)-Sample preparation
Plutonium oxide (PuO2)-Chemical etching
Plutonium phosphide
Plutonium specimens-Electrolytic etching
Plutonium specimens-Electrolytic polishing
Plutonium specimens-Electrolytic polishing
Plutonium specimens-Electropolishing
Plutonium specimens-Electropolishing
Plutonium specimens-Electropolishing
Plutonium specimens-Pu nad Pu base alloys
Plutonium-Electrolytic polishing
Plutonium-Electrolytic polishing
Plutonium-Electrolytic polishing
Plutonium-Pu
Plutonium-Pu
Polisar's etchant
Polishing aluminum sputtering target
Poly-Si deposited as silicon-on-insulator structure-Chemical etching
Poly-Si grown on (100) silicon substrates-Chemical etching
Poly-Si material-Chemical etching
Poly-Si material-Chemical polishing
Poly-Si rectangular blocks of silicon-Chemical polishing
Poly-Si wafers-Defects
Poly-Ta rod, sheet, wire-Chemical cleaning
Polyamid (PA) and polyethylene (PE)
Polycarbonate of styrene, acrylonitrate copolymer-Chemical ecthing
Polycarbonate-Chemical etching
Polycrystalline silicon-Chemical etching
Polyethylene. Reveals lamellar structure-Chemical etching
Polyoxymethylene (POM)
Polyoxymethylene, reveals spherolite cores and growth direction, ploypropylene-Chemical etching
Polyoxymethylene-Chemical etching
Polypropylene (PP)
Polypropylene (PP)
Polypropylene-Chemical etching
Polypropylene-Chemical etching
Polypropylene. Spherolites in polyethylene-Chemical etching
Polytetramethylene terephthalate PTMI, Polybutylene terephthalate PBT-Chemical etching
Pondos reagent
Porcelain
Potash-silica system-Chemical etching
Potash-strontia-niobium oxide system-K2O-SrO-Nb2O5 single crystal
Potassium bromide (KBr)-Dislocation etching
Potassium bromide (KBr)-Potassium chloride mixed crystals-Dislocation etching
Potassium chloride (KCl)-Chemical polishing
Potassium chloride (KCl)-Dislocation etching
Potassium chloride (KCl)-Dislocation etching
Potassium chloride (KCl)-Etch pit etching
Potassium doped lithium carbonate single crystal-Li2O3-1% K2CO3
Potassium-Chemical polishing
Potassium-Chemical polishing
Potassium-Chemical polishing
Poulton's reagent
Pr (0001) wafers-Chemical polishing
Pr specimens-Arc, forming
Pr-Ag alloys-Chemical etching
Pr-Au alloy-Chemical etching
Pr-Au alloy-Chemical etching
Pr-Ba alloys-Chemical etching
Pr-Bi alloys-Chemical etching
Pr-Cs alloys-Chemical etching
Pr-Hf alloys-Chemical etching
Pr-Hg alloys-Chemical etching
Pr-Ir alloy-Chemical etching
Pr-Pd alloys (Approx. Pr3Pd4)-Chemical etching
Pr-Pt alloys-Chemical etching
Pr-Re alloys-Chemical etching
Pr-Ta alloys-Chemical etching
Pr-Tl alloys-Chemical etching
Pr-W alloys-Chemical etching
Pr-Zn alloys-Chemical etching
PrCo2Si2 single crystals-Chemical etching
Praseodymium-Electrolytic polishing
Praseodymium-Electrolytic polishing
Praseodymium-lead alloys (Pr-Pb)-Chemical etching
Praseodymium-osmium alloys (Pr-Os)-Chemical etching
Precipitation hardenable stainless steels
Preparation for EBSD
Presence of Fe3P in steels-Chemical etching
Presence of SiO2 in Si-Chemical etching
Presence of sigma phase in steel-Electrolytic etching
Primary austenite grain boundaries in low and medium-alloy steels, martensitic and bainitic microstructures-Chemical etching
Pt and Au evaporated on silicon (111)-Chemical etching
Pt and Pt alloys
Pt and Pt alloys with noble metal content bellow 90-Chemical etching
Pt and Pt alloys, Rh and Rh alloys, Pd-Ag alloys, Ir-Electrolytic etching
Pt and Pt alloys-Electrolytic etching
Pt and alloys
Pt and alloys
Pt and alloys
Pt and alloys
Pt and alloys
Pt and alloys
Pt and alloys
Pt and alloys - Aqua regia
Pt and alloys-Grain contrast
Pt as thermocouple wires-paired-Pt and PtRh-Metal, removal
Pt single crystal ingot-Halogen, pasivation
Pt thin film-Acid, float-off
Pt thin films-Chemical etching
Pt-Co alloys-Electro thinning
Pt-Cr alloys-Electrolytic etching
Pt-Pd thin films-Chemical etching
Pt-Sb alloy (PtSb2)-Chemical etching
Pt-Tb alloys (20-35 at.% Tb)-Etch for TbPt3
Pt-Te alloys-No need to etch
Pt-Yb alloys-Chemical etching
Pt2Si thin films formed on silicon, (111) and (100) n-type wafers-Metal deposition
PtAs2 single crystal specimens-Chemical polishing
PtH powder-Chemical cleaning
PtO crystalline thin films-Chemical etching
PtP2 single crystal specimens-Chemical polishing
PtRh (2-15%) as thermocouple wires-Chemical cleaning
PtSb2
PtSb2 (100) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (111) and (110) wafers-Chemical etching
PtSb2 single crystal specimens-Chemical polishing
PtSi specimens-Chemical etching
PtSi thin films deposited on silicon-Ionized gas etching
PtSi thin films grown on silicon substrates-Chemical etching
Pu alloys
Pu specimens-Electrolytic polishing
Pu-Al alloys-Electro polishing
Pu-Al and Pu-Ga alloys
Pu-C alloys-Chemical etching
Pu-Cd alloys-May be examined in the polished unetched state
Pu-Ce alloys-Chemical and electrolytical etching
Pu-Ce-Co alloys
Pu-Ce-Co system-Electrolytic etching
Pu-Fe-C alloys-Final electrolytic polishing
Pu-Ga alloy (1 wt.% Ga)-Chemical etching
Pu-Ga alloy (1 wt.% Ga)-Electrolytic etching
Pu-Ga alloys-Electrolytic etching
Pu-In alloys-Electrolytic etching
Pu-La system-Chemical etching
Pu-Pd alloys (Approx. Pu3Pd4)-Chemical etching
Pu-Zn alloys (Zn rich)-Chemical etching
Pu-Zn alloys-Electrolytic and chemical etching
PuC-Electrolytic etching
PuC-Electrolytic etching
PuO2
PuO2
PuO2-Chemical etching
PuP, PuS-Chemical etching
Pure Ag and Ag alloys
Pure Ag and Ag alloys
Pure Ag and some alloys
Pure Ag, Ag-Cu and Ag alloys-Electrolytic etching
Pure Ag, Ag-Ni alloys, Ag-Pd alloys
Pure Ag-Electrolytic etching
Pure Al
Pure Al
Pure Al - Anodizing solution of Hone and Pearson
Pure Al - Improved anodizing solution of Hone and Pearson
Pure Al and Al-Mg alloys - Phillip's anodizing solution
Pure Al, Al-1% Si-1% Fe-0.1% Cu alloy
Pure Al, Al-Cu, Al-Mg amd Al-Mg-Si alloys-Chemical etching
Pure Al, Al-Cu, Al-Mg, and Al-Mg-Si alloys-Electrolytic etching
Pure Al, Al-Mg and Al-Mg-Si alloys-Chemical etching
Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg and Al-Mn-Mg alloys-Electrolytic etching
Pure Al, Cu-Al, Mg-Al, Mg-Si-Al, and Zn-Al alloys-Chemical etching
Pure Al2O3, Al2O3 with MgO, Al2O3 with additives CaO, MgO, SiO2, Na2O-Physical etching
Pure Au and Au-rich alloys-Chemical etching
Pure Au and alloys
Pure Au and alloys
Pure Au, Au-Pt and Au-Ag alloys with more than 80% Au-Chemical etching
Pure Au-Electrolytic etching
Pure Be, etch pits-Chemical etching
Pure Be, fine grained Be, single crystals-Chemical etching
Pure Be, grain boundaries, impurities, single crystals-Chemical etching
Pure Bi
Pure Co, color etchant-Chemical etching
Pure Cu
Pure Cu and Cu-5% Be, Cu-1% Zr, Cu-0.3% Be-2% Ni alloys
Pure Cu with/without oxide and sulfide inclusions-Chemical etching
Pure Cu, Cu-0.5% Be, Cu-1% Zr, Cu-0.3% Be-2% Ni alloys
Pure Cu, brasses, Al bronzes, Cu-Ni and Cu-Ag alloys, Alpaca-Chemical etching
Pure Cu, brasses, Alpaca, bronzes, grain boundary etchant-Chemical etching
Pure Cu, leaded bronze, bronzes, alpha/beta brasses, Al bronze, Be bronze-Chemical etching
Pure Fe
Pure Gd, RE-Co alloys, grain bounday etchant-Chemical ecthing
Pure Gd, for most RE metals and their alloys, Sm-Co alloys-Chemical ecthing
Pure Ge and Ge alloys-Chemical etching
Pure Ge and Ge alloys-Electrolytic etching
Pure Ge, Te, and Se, tellurides, selenides, and Zr silicides-Chemical etching
Pure In
Pure Mg and Mg-rich alloys-Electrolytic etching
Pure Mg and alloys
Pure Mg and alloys
Pure Mn and lean alloys
Pure Molybdenum-Mo
Pure Nb
Pure Ni
Pure Ni
Pure Ni, Ni-Co alloys
Pure Ni, Ni-Zn-Ag, Ni-Ag, Ni-Cu and Ni-Al-Mo alloys-Chemical etching
Pure Ni, superalloys, Ni-Cr and Ni-Fe alloys-Chemical etching
Pure Pb
Pure Pb, Pb alloys
Pure Pb, Pb-Ca alloys, Pb with less than 2% Sb-Chemical etching
Pure Pb, Pb-Ca and Pb-Cu alloys-Chemical etching
Pure Pb, Pb-Na alloys-Chemical etching
Pure Pb, Pb-Sn and Pb-Ca alloys
Pure Pb-Chemical etching
Pure Pd
Pure Pt
Pure Pt
Pure Pt and Pt alloys, Rh-base alloys, Pt-10Rh alloys, Pt-Ir alloys, Ru-base alloys-Electrolytic etching
Pure Pt and Pt with alloy content Rh, Ru, Ir, and Os-Chemical etching
Pure Pu and Pu alloys-Electrolytic etching
Pure Ru-Electrolytic etching
Pure Sb alloys, Sb-Bi alloys
Pure Si and Ge and their alloys, InSb, etch figures of the (111) plane, etches p-n transitions-Chemical etching
Pure Si in Ge and their alloys-Chemical etching
Pure Si, pure Te, pure Se-Chemical etching
Pure Sn
Pure Sn and Sn-Bi alloys - Taff's reagent
Pure Sn and alloys
Pure Sn and alloys
Pure Sn and alloys of Sn and 1% Pb
Pure Sn, Sn with 1 Pb-Chemical etching
Pure Sn, Sn-Bi alloys-Chemical etching
Pure Sn-Chemical etching
Pure Sn-Chemical etching
Pure Te
Pure Te
Pure Th and Th alloys-Chemical etching
Pure Ti
Pure Ti and Ti alloys, grain-boundary etchant-Chemical etching
Pure Ti and Ti alloys-Chemical etching
Pure Ti and Ti alloys-Physical etching
Pure Ti and alloys
Pure Ti and alloys
Pure Ti and alloys
Pure Ti, Ti-base alloys, Ti-Al-Mo alloys-Chemical etching
Pure Ti, Ti-base alloys-Electrolytic etching
Pure Ti, alpha Ti, Ti-Al-V-Sn alloys, ferro titanium-Chemical etching
Pure Ti-Electrolytic etching
Pure U and U alloys-Chemical etching
Pure U and U alloys-Chemical etching
Pure U and most U alloys-Electrolytic etching
Pure U, pure Th-Electrolytic etching
Pure V, V-Al, V-Ga, V-In, V-Si alloys-Anodizing
Pure W (tungsten)-Chemical etching
Pure Zinc specimens-Electrolytic polishing
Pure Zn and Zn-Co and Zn-Cu alloys
Pure Zn and alloys - Palmerton reagent
Pure Zn and lean alloys
Pure Zn and low-alloy Zn-Chemical etching
Pure Zn, Zn-Cu alloys-Chemical etching
Pure Zr, Zr-U alloys-Chemical etching
Pure Zr, pure Hf, grain constrast-Anodizing
Pure Zr-Electrolytic polishing
Pure Zr-Electrolytic polishing
Pure alumina (Al2O3)-Chemical etching
Pure alumina (Al2O3)-Physical etching
Pure cobalt-Electrolytic etching
Pure cobalt-For electron microscopy
Pure copper specimens-Electrolytic polishing
Pure copper specimens-Electropolishing
Pure gold-Au - Aqua regia
Pure iron, nitrided with less than 0.015% C-Electropolishing
Pure iron, nitrided with less than 0.015% C-Electropolishing
Pure iron, nitrided with less than 0.015% C-Electropolishing
Pure iron-Electropolishing
Pure platinum-Electrolytic etching
Pure tantalum-Polishing
Pure vanadium-V
Pure vanadium-V
Pure vanadium-V
Pure vanadium-V
Pure zinc specimens-Electropolishing
Pyrex blanks-Acid float-off
Pyrex glass beaker-Chemical etching
Pyrolytic SiC
Pyrolytic graphite
Pyrolytic graphite
Pyromet 860 alloy-Fe-43Ni-12.6Cr-6Mo-4Co-3Ti-1.25Al (+B)
Pyrophyllite (Al2Si4O10 x (OH)2)
Quenched and tempered steels
R.C. etchant
R.R.E. etchant
R5In2 grown as single crystals-Chemical etching
RE metals
RE metals
RE metals
RE metals
RE metals and alloys
RE metals, Gd, Er, Ho and Dy
RE-Al alloys-Chemical etching
RE-Co alloys
RE-Mg alloys-Chemical etching
RJFe2 as Rare earth ferrites-Chemical etching
RNi6B2 specimens-Chemical etching
Rare earth (RHE) metals and alloys
Rare earth (RHE) metals and alloys
Rare earth nickelides-Chemical etching
Rare earth-Chemical-mechanical polishing
Rare earth-Chemical-mechanical polishing
Rare earth-Chemical-mechanical polishing
Rare earth-Electrolytic polishing and anodozing
Rare earth-Electrolytic polishing and anodozing
Rare earths (Ce, Dy, Er, Eu, Gd, Ho, La, Lu, Nd, Pr, Sm, Sc, Tb, Tm, Yb, Y)-Sample preparation procedure
Rare earths-Electrolytic polishing and etching
Rb metal-Chemical etching
Rb-Fe-F system (RbFeF3 single crystals)-Chemical etching
RbBr (001) wafers-Chemical polishing
RbFeF3
RbI (001) wafers-Chemical polishing
Re (0001) wafers-Chemical etching
Re (0001) wafers-Electrolytic polishing
Re (0001) wafers-Electrolytic thinning
Re silicides
Re specimens
Re specimens-Acid oxidation
Re specimens-Chemical etching
Re specimens-Gas oxidation
Re specimens-Molten flux etching
Re, Mo, W alloys-Electrolytic lapping
Re-Electrolytic lapping
Re-Hf (<10% Hf) alloys
Re-Hf alloys
Re-Hf alloys-Sample preparation procedure
Re-Si system-Chemical etching
Re-W alloys
Recipe for Au on C and Al/W dendrites
Red brass specimens-Chemical etching
Red brass specimens-Electrolytic etching
Refactaly 26-Chemical etching
Refactaly steel-Chemical etching
Refractaloy steel 80, 90, 100-Chemical etching
Refractaloy steel-Chemical etching
Refractaloy steel-Chemical etching
Refractaly-Chemical etching
Refractory metals (Mo, W, V)-Chemical etching
Refractory metals (Mo, W, V, Nb, Ta)-Chemical etching
Refractory metals (W, V, Nb, Ta)-Chemical etching
Rehenium-Re
Remington's 'A' etchant (Finlay's 'A' etchant)
Removing rust (FeO[OH]) and scale from the steel surface-BLASIL-PS
Removing rust (FeO[OH]) and scale from the steel surface-Cyanide solution
Removing rust (FeO[OH]) and scale from the steel surface-ENDOX 114 (cyanide free)
Removing rust (FeO[OH]) and scale from the steel surface-ENDOX 214 (containing cyanide)
Removing rust (FeO[OH]) and scale from the steel surface-Hydrobromic acid
Removing rust (FeO[OH]) and scale from the steel surface-Molten NaOH
Removing rust (FeO[OH]) and scale from the steel surface-TICKOPUR J80 U
Removing rust (FeO[OH]) and scale from the steel surface-TICKOPUR R27
Removing rust (FeO[OH]) and scale from the steel surface-TICKOPUR R30
Removing rust (FeO[OH]) and scale from the steel surface-TICKOPUR RW 77
Removing rust (FeO[OH]) and scale from the steel surface-TRINOFORM FE 645
Removing rust (FeO[OH]) and scale from the steel surface-ascorbic acid (Vitamin C)
Removing rust (FeO[OH]) and scale from the steel surface-citric acid
Removing rust (FeO[OH]) and scale from the steel surface-inhibited chloric acid
Rene 125 alloy-Ni-10Co-8.9Cr-7.0W-4.75AL-3.8Ta-2.5Ti-2.0Mo-1.5Hf-0.11C (+ 0.05Zr, 0.01B)
Rene 80 alloy-Chemical etching
Rene 80 alloy-Ni-14Cr-4Mo-5Ti-3Al-9Co-4W-0.2C (+ Zr, B)
Rene 95 alloy powder-Chemical etching
Rene 95 alloy-62.2Ni-12.8Cr-8.0Co-3.6Al-3.7Mo-3.5Nb-3.5W-2.6Ti-0.8C by weight
Rene 95 alloy-Chemical ecthing
Rene 95 alloy-Chemical ecthing
Rene 95 alloy-Ni-01.6C-14Cr-8Co-3.5Mo-2.5W-2.5Ti-3.4Al-3.6Nb
Rene 95 alloy-Walker's reagent
Rene 95 nickel alloy
Retained austenite in the steels
Revealing the grain size in T-410 martensitic stainless steel
Reveals coring in foundry alloys, welds, colour etchant-Chemical etching
Rh alloys
Rh alloys - Aqua regia
Rh and alloys
Rh specimens as wire, rods, sheets, and plated coatings-Chemical etching
Rh-Electrolytic etching
Rh-W alloys
Rhenium-Chemical etching
Rhenium-Chemical etching
Rhenium-Cr, Mo, Mo-Cr alloys (up to 80% Cr). Mo-Fe alloys
Rhenium-Electro polishing
Rhenium-Electro thinning by jet etch
Rhenium-Electrolytic etching
Rhenium-Electrolytic polishing
Rhenium-Electrolytic polishing
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re
Rhenium-Re - Marakami's reagent
Rhodium and alloys-Grain contrast
Rhodium and alloys-Grain contrast
Rhodium and gold plated nickel-iron (Rh, Au, Ni-Fe)-Electric contact material
Rhodium and gold plated nickel-iron (Rh, Au, Ni-Fe)-Electric contact material
Rhodium specimens-Electrolytic etching
Rhodium specimens-Electrolytic polishing
Rhodium specimens-Pt alloys, Rh, Ir
Rhodium specimens-Pure Au and Pd. Au-Pd, Pd alloys with more than 90% concentration of precious metals. Rh alloys
Rhodium specimens-Rh base alloys, Pt-10% Rh alloys
Rhodium specimens-Ru and Ru alloys, Os and Os alloys, Rh and Rh alloys
Rhodium-Rh
Richards-Crocker's etchant
Roman's etchant
Roman's reagent
Rosenhain and Haighton's etch
Rowland's etchant-Etchants for galvannealed samples
Ru (100) wafers-Ionized gas cleaning
Ru alloys
Ru specimens-Chemical etching
Ru, Os, Rh and alloys
Ru, Os, Rh, Os and Rh alloys
Ru, Rh, Ir, Os
Ru-Mo alloys
RuS2 single crystal specimens-Chemical polishing
RuSe2 single crystal specimens-Chemical polishing
RuTe2 single crystal specimens-Chemical polishing
Rubber-reinforced plastics
Ruthenium and alloys-Grain contrast
Ruthenium and alloys-Grain contrast
Ruthenium samples-Ru and Ru alloys, Os and Os alloys, Rh and Rh alloys
Ruthenium specimens-Electro thinning
Ruthenium specimens-Electrolytic polishing
Ruthenium specimens-Sample preparation procedure
Ruthenium-Ru
Ruthenium-Ru
Ruthenium-Ru rich alloys and Ru-Mo alloys
Rutile single crystal (TiO2)-Chemical polishing
S (001) wafers-Chemical etching
S (100) wafers-Chemical etching
S specimens-Sovent etching
S-816 Modified with B-Chemical etching
SAE 4340 steel-Fe-0.4C-0.7Mn-0.26Si-0.75Cr-0.25Mo-1.8Ni
SM-200 nickel alloy
SST 300 series-Electrolytic etching
SST 304 steel-Electrolytic etching
SST 316 steel-Chemical etching
SST 400 series-Chemical etching
SST substrates used for deposition of WC-Chemical cleaning
SST tubing-Chemical cleaning
SSiC Beta/Beta-Chemical etching
SSiC doped with Al-Chemical etching
SSiC doped with B-Chemical etching
SSiC-Chemical etching
Samarium doped barium titanate-Chemical etching
Samarium oxide-zirconia system (Sm2O3-ZrO2 eutectic)-Chemical etching
Samarium specimens-Electrolytic polishing
Samarium specimens-Electrolytic polishing
Samarium-terbium orthoferrite (Sm0.35 x Tb0.43 x FeO3)-Chemical polishing
Samarium-zinc system (Sm-Zn)-Electrolytic polishing and chemical etching
Sandwich-type composite steel-foamed aluminium-steel
Sb (0001) specimen cleaved in LN2-Dash etch
Sb (0001) specimen cleaved in LN2-Dash etch
Sb (0001) specimen cleaved in LN2-Dash etch modified
Sb (0001) specimen cleaved in LN2-Dash etch modified
Sb (0001) specimen-Dash etch
Sb (0001) wafers cleaved under LN2-Chemical polishing
Sb (0001) wafers cleaved under LN2-Chemical polishing
Sb (0001) wafers cleaved under LN2-Cleave
Sb (0001) wafers-Chemical etching
Sb (OOO1) specimen-Dash etch
Sb and Bi alloys
Sb and Sb alloys
Sb and Sb alloys
Sb and Sb alloys, Pb-Sb, Bi-Sn and Bi-Cd alloys-Chemical etching
Sb single crystal wafers-Chemical polishing
Sb telluride - Murakami's reagent
Sb, Bi and alloys
Sb-Ge eutectic-Chemical etching
Sb-Pb alloys
Sb-Pb, Bi-Sn and Bi-Cd alloys
Sb-Pb-Te alloys (PbTe-Sb2Te3 section)-Chemical etching
Sb-Pb-Te alloys (Sb and Pb rich)-Chemical etching
Sb-Te system (Sb2Te(3-x))-Chemical etching
Sb-Tl-Te alloys (Te rich section)-Chemical etching
SbTe and BiTe, detection of Te, InP-Chemical etching
Sc (0001) wafers-Chemical polishing
Sc (0001) wafers-Chemical polishing
Sc polycrystallinc rod-Chemical etching
Sc powder-Chemical etching
Sc-Ag alloys
Sc-Ag alloys-Chemical etching
Sc-Mg system-Alloys with 0-60 at.% Sc
Sc-Ti alloys
Sc-Ti alloys-Chemical etching
ScD as thin films-Chemical etching
Scandium doped barium titanate-Thermal and chemical etching
Scandium-Chemical polishing
Scandium-Electrolytic polishing
Scandium-Sc
Scandium-Sc
Schell's reagent
Schimmel's etch
Schimmel's etch
Schimmel's etch technique-Chemical etching
Schrader's etch
Schramm's etchant
Schumann's reagent
Se - Aqua regia
Se and Te
Se and ZnTe
Se deposits remaining on the (TTT)B surface of HgSe wafers-Chemical etching
Se residual film left on CdSe polycrystalline thin films-Chemical etching
Se single crystal specimens-Chemical etching
Se single crystal specimens-Chemical etching
Se single crystal specimens-Chemical etching
Se single crystal wafers-Chemical etching
Se single crystal wafers-Chemical etching
Se thin films-Acid, float-off
Se, Ge and their alloys, GaSb and InSb, dislocations on the (100) and (111) crystal planes of Si, InAs-Chemical etching
Se, Ge, and their alloys, InAs, InSb, InP, AlSb, GaAs, GaSb, ZnTe, and CdTe-Chemical etching
Se, Te, selenides, tellurides
Se-bismuth selenide
Secco's etch
Segregation in speralloys-Chemical and elctrolytic etching
Selective etching of delta-ferrite in 18-8 austenitic stainless steels
Selenium-Electro polishing
Selenium-Etch pits reagent
Selenium-Ge, Te, Se, telurides, selenides and Zr silicide
Selenium-Si, Te, Se
Self-bonded SiC
Shakudo-Sterling silver bimetal-10% Shakudo (4% gold, 96% copper), 90% Sterling silver
Shape memory alloys-Chemical etching
Si (100) and (110) wafers-Chemical etching
Si (100) and (110) wafers-Dislocation etching-Chrome dislocation etchant
Si (100) and (111) wafers both n- and p-type-Chemical thinning
Si (100) and (111) wafers used in a study of carbon and oxygen contamination-Chemical etching
Si (100) and (111) wafers, n-type, 10-30 Ohm cm resistivity-Chemical etching
Si (100) and (111) wafers-Acid passivation
Si (100) and (111) wafers-Acid, float-off
Si (100) and GaAs (100) wafers-Chemical cleaning
Si (100) as-doped, 10 Ohm cm resistivity wafers-Chemical cleaning
Si (100) cleaved wafers-Chemical polishing
Si (100) n-type 3-6 Ohm cm resistivity wafers-Ionized gas etching
Si (100) n-type wafer used as substrate-Chemical etching
Si (100) n-type wafer-Chemical etching
Si (100) n-type wafers with a p+ Si epitaxy buffer layer-Chemical conditioning
Si (100) n-type wafers, 10 Ohm cm resistivity-Chemical etching
Si (100) n-type wafers-Colloid replication
Si (100) n-type, 2-5 Ohm cm resistivity wafers-Chemical etching
Si (100) p- and n-type substrates-Chemical etching
Si (100) p-type wafers with SiO2 films-Ionized gas etching
Si (100) p-type wafers, 1.2-1.8 Ohm cm resistivity-Chemical cleaning
Si (100) p-type wafers-Dislocation etching-Secco's etchant, modified
Si (100) p-type, 4-6 Ohm cm resistivity wafers-Chemical etching
Si (100) wafers 100 mm thick-Chemical etching
Si (100) wafers and other orientations-Abrasive polishing
Si (100) wafers and other orientations-Abrasive polishing
Si (100) wafers unpassivated surfaces or with SiO2 or TaSi2 thin films-Chemical cleaning
Si (100) wafers used as substrates for RF sputter of SeGe thin films-Chemical etching
Si (100) wafers used as substrates for epitaxy growth-Chemical etching
Si (100) wafers used as substrates for epitaxy growth-Gas cleaning
Si (100) wafers used as substrates in a study of oxide and nitride-Chemical etching
Si (100) wafers used as substrates with an SiO2 thin film-Physical etching
Si (100) wafers used as substrates with p-doped and undoped poly-Si and SiO2 thin films-Ionized gas etching
Si (100) wafers used as substrates-Chemical etching
Si (100) wafers used for MOCVD growth of SiO2 thin films-Chemical cleaning
Si (100) wafers used in an anisotropic etch study-Chemical etching
Si (100) wafers used in developing the Secco etch-Chemical polishing
Si (100) wafers with SiO2 thin films-Ionized gas etching
Si (100) wafers with thermal SiO2 thin films-Ionized gas etching
Si (100) wafers within +/-1 of the plane-Chemical etching-P-ED (EPW) etchant
Si (100) wafers, n-type, 10-30 Ohm cm resistivity-Chemical etching
Si (100) wafers, n-type-Chemical polishing/etching
Si (100) wafers, p-type, 2 Ohm cm resistivity-Chemical thinning
Si (100) wafers-Chemical cleaning
Si (100) wafers-Chemical cleaning
Si (100) wafers-Chemical cleaning
Si (100) wafers-Chemical etching
Si (100) wafers-Chemical etching
Si (100) wafers-Chemical etching
Si (100) wafers-Chemical jet thinning
Si (100) wafers-Chemical thinning
Si (100) wafers-Chemical thinning
Si (100) wafers-Ionized gas etching
Si (100) wafers-Ionized gas etching
Si (100) wafers-Physical etching
Si (100) wafers-Thermal oxidation
Si (100), (111), (110) and (112) wafers-Dash etchant, modified
Si (100), (111), p- and n-type, 0.2-20 Ohm cm resistivity wafers-Dislocation etching-Wright's etchant
Si (100), n- and p-type wafers, 20 and 25 Ohm cm resistivity-Chemical cleaning
Si (100), n-type, 3-6 Ohm cm resistivity wafers-Chemical etching
Si (100), n-type, 4-7 Ohm cm resistivity wafers-Chemical cleaning
Si (100), n-type, 5-9 Ohm cm resistivity wafers-Chemical cleaning
Si (100), n-type, 5-9 Ohm cm resistivity wafers-Chemical cleaning
Si (100), p- and n-type wafers, 1-10 Ohm cm resistivity-Chemical etching
Si (100), p-type, 2 Ohm cm resistivity wafers-Chemical cleaning
Si (100), p-type, 2 Ohm cm resistivity wafers-Chemical etching-BHF etchant
Si (110) wafers with a thermally grown SiO2 thin film-Chemical etching
Si (110), (112), and (113) wafers for p-p+ epitaxy-Chemical cleaning
Si (111) 10-20 Ohm cm resistivity, n-type wafers-Chemical etching
Si (111) and (100) n- and p-type wafers-Chemical jet polishing
Si (111) and (100) wafers and ingots-Alkali, orientation
Si (111) and (100) wafers and spheres-Chemical etching
Si (111) and (100) wafers used as substrates for silicon MBE thin film epitaxy growth-Chemical etching
Si (111) and (100) wafers used as substrates for silicon epitaxy growth-Chemical etching-Schimmel's etchant
Si (111) and (100) wafers used in a study of defects-Powder, defect ehnancement
Si (111) and (100) wafers, both n- and p-type-Electrolytic etching
Si (111) and (100) wafers, n-type 10-30 Ohm cm resistivity-Chemical etching
Si (111) and (100) wafers, n-type, 10-30 Ohm cm resistivity-Chemical etching
Si (111) and (100) wafers, p- and n-type of varied resistivity-Electrolytic oxidation
Si (111) and (100) wafers, p- and n-type, 0.2-20 Ohm cm resistivity-Chemical cleaning
Si (111) and (100) wafers-Chemical cleaning
Si (111) and (100) wafers-Chemical cleaning
Si (111) and (100) wafers-Chemical etching
Si (111) and (100) wafers-Electrolytic oxidation
Si (111) and (100), p-type 1 - 10 Ohm cm and n-type wafers-Chemical etching
Si (111) and (100), p-type, 1-10,000 Ohm cm resistivity wafers-Chemical etching-Secco's etchant
Si (111) and (110) wafers cut from CZ grown ingots-Chemical etching
Si (111) and (110) wafers-Chemical etching
Si (111) and other oriented wafers-Dislocation etching-Vogel's etchant
Si (111) dendritic-web ribbon crystal-Chemical thinning
Si (111) n- and p-type wafers-Chemical cleaning
Si (111) n- and p-type-Chemical etching
Si (111) n-type 3-5 Ohm cm resistivily wafers-Chemical etching
Si (111) n-type wafers 5 Ohm cm resistivity-Thermal cleaning
Si (111) n-type wafers and p-doped with 60Co-Chemical etching
Si (111) n-type wafers with boron diffused p-n junctions-Chemical etching
Si (111) n-type wafers with diffused p-type layers-Chemical etching
Si (111) n-type wafers with p-n junctions-Chemical junction etching
Si (111) n-type wafers, 1.63 Ohm cm resistivity-Chemical cleaning
Si (111) n-type wafers, 130 Ohm cm resistivity-Chemical polishing
Si (111) n-type wafers, 15-20 Ohm cm resistivity-Chemical etching
Si (111) n-type wafers, 5-120 Ohm cm resistivity-Acid forming
Si (111) n-type wafers, 5-120 Ohm cm resistivity-Dislocation etching
Si (111) n-type wafers, 5-50 Ohm cm resistivity-Acid forming
Si (111) n-type wafers, 50-500 Ohm cm resistivity-Chemical polishing
Si (111) n-type wafers-Acid, junction etcthing-Healy's junction etchant
Si (111) n-type wafers-Chemical polishing
Si (111) n-type wafers-Electrolytic jet polishing
Si (111) n-type wafers-Electrolytic jet polishing
Si (111) n-type wafers-Electrolytic jet polishing
Si (111) n-type, 1.5-2.5 Ohm cm resistivity wafers-Chemical etching
Si (111) p- and n-type wafers, 8 Ohm cm resistivity-Chemical etching
Si (111) p- and n-type, 20 and 25 Ohm cm resistivity wafers-Chemical cleaning
Si (111) p-type 2-10 Ohm cm resistivity wafers-Gas oxidation
Si (111) p-type wafers used for diffusion of antimony from glass-Chemical cleaning
Si (111) p-type wafers, 7-21 Ohm cm resistivity-Chemical cleaning
Si (111) p-type wafers-Chemical cleaning
Si (111) pre-cut bars of material-Chemical polishing
Si (111) wafer and other orientations-Chemical etching
Si (111) wafer substrates used for epitaxy growth of GaP-Chemical cleaning
Si (111) wafers
Si (111) wafers and other orientation-Chemical etching-Silver glycol etchant
Si (111) wafers and other orientations with n- and p-type resistivity-Chemical polishing
Si (111) wafers and other orientations, both n- and p-type of different resistivity levels-Dash etchant
Si (111) wafers and other orientations-Abrasive polishing
Si (111) wafers and other orientations-Chemical cleaning
Si (111) wafers and other orientations-Chemical ecthing
Si (111) wafers and other orientations-Chemical etching
Si (111) wafers and other orientations-Chemical etching
Si (111) wafers and other orientations-Chemical etching
Si (111) wafers and other orientations-Chemical etching-Copper etchant
Si (111) wafers and other orientations-Chemical etching-Landyren's etchant
Si (111) wafers and other orientations-Chemical etching-Sirtl's etchant
Si (111) wafers and other orientations-Chemical etching-Sopori's etchant
Si (111) wafers and other orientations-Chemical polishing
Si (111) wafers and other orientations-Chemical polishing
Si (111) wafers and other orientations-Chemical polishing-CP4A etchant
Si (111) wafers and other orientations-Chemical polishing/etching
Si (111) wafers and other orientations-Chemical polishing/thinning
Si (111) wafers and other orientations-Si (111) wafers and other orientations
Si (111) wafers and whiskers-Gas etching
Si (111) wafers both p- and n-type-Electrolytic polishing
Si (111) wafers fabricated as barrier diodes-Chemical etching
Si (111) wafers used as substrate for deposition of a-C-Chemical cleaning
Si (111) wafers used as substrates for epitaxy growth of silicon-Chemical polishing
Si (111) wafers used as substrates for epitaxy growth of silicon-Chemical thinning
Si (111) wafers used in a defect study-Chemical etching
Si (111) wafers used in a defect study-Chemical etching
Si (111) wafers used in a defect study-Electrolytic etching/polishing
Si (111) wafers used in a study of Ag and Fe ion contamination-Chemical polishing
Si (111) wafers used in a study of electro polishing with HF-Electrolytic polishing
Si (111) wafers used in a study of ion bombardment cleaning-Chemical polishing-Caro's etchant, modified
Si (111) wafers used in a study of light induced plasticity-Chemical etching
Si (111) wafers used in a study of selenium adsorption-Chemical cleaning
Si (111) wafers used in a study of stacking fault energy-Chemical thinning
Si (111) wafers used in a study of the variations in surface conductivity of silicon and germanium-Chemical polishing
Si (111) wafers with diffused n-p-n junctions-Electrolytic junction etching
Si (111) wafers with high boron doping-Chemical cleaning
Si (111) wafers with n+/n diffusion-Chemical etching
Si (111) wafers with p-n junctions-Chemical junction etching
Si (111) wafers, 5-50 Ohm cm resistivity, n-type-Chemical polishing
Si (111) wafers, boron diffused p-type-Chemical ecthing
Si (111) wafers, boron doped-Chemical etching-Iodine etchant
Si (111) wafers, n- and p-type-Chemical thinning
Si (111) wafers, n-type, 130 Ohm cm resistivity-Chemical sphere polishing
Si (111) wafers, n-type, 5-10 Ohm cm resistivity-Chemical polishing
Si (111) wafers, n-type, used to fabricate diffused p-n-p transistors-Chemical polishing
Si (111) wafers, p- and n-type-Chemical etching
Si (111) wafers, p-type, 7-21 Ohm cm resistivity-Chemical jet thinning
Si (111) wafers, p-type-Chemical etching
Si (111) wafers-Abrasive polishing
Si (111) wafers-Acid, pinhole, jet
Si (111) wafers-Chemical cleaning
Si (111) wafers-Chemical cleaning
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching
Si (111) wafers-Chemical etching-Camp #8 (CP8) etchant
Si (111) wafers-Chemical polishing
Si (111) wafers-Chemical polishing
Si (111) wafers-Chemical polishing
Si (111) wafers-Chemical polishing
Si (111) wafers-Chemical polishing
Si (111) wafers-Chemical polishing/thinning
Si (111) wafers-Dislocation etching
Si (111) wafers-Dislocation etching-Erhard's etchant
Si (111) wafers-Dislocation etching-Silver etchant (for silicon)
Si (111) wafers-Gas etching
Si (111) wafers-Metal decoration
Si (111) wafers-Metal difusion-Dash copper decoration etchant
Si (111) wafers-Metal, dislocation
Si (111) wafers-Physical etching
Si (111) web-dendritic ribbon crystal silicon specimens-Chemical thinning
Si (111), (100) and (110) wafers and a 1 cm diameter sphere-Chemical etching
Si (111), (100) and (110) wafers, n-type 0.1-0.7 Ohm cm and p-type 0.4-3 Ohm cm resistivity-Ionized gas thinning
Si (111), (100) and (110) wafers-Chemical polishing
Si (111), (100) and (110) wafers-Thermal etching
Si (111), (100) wafers as substrates for deposition of Si3N4-Chemical etching
Si (111), (100) wafers n-type 10-30 Ohm cm resistivity-Chemical etching
Si (111), (100) wafers-Chemical polishing/thinning
Si (111), (100), (112) and (110) oriented wafers-Chemical polishing
Si (111), (100), and (110) wafers and ingots-Chemical etching
Si (111), (100), n- and p-type wafers-Chemical polishing
Si (111), (110) and (211) wafers, ingots-Chemical etching-Sirtl's etchant, modified
Si (111), n-type and (110), p-type wafers-Chemical etching
Si (111), n-type, 1-10 Ohm cm resistivity wafers-Chemical etching
Si (111), n-type, 10-15 Ohm cm resistivity wafers-Chemical polishing
Si (111), n-type, 3-5 Ohm cm resistivity wafers-Chemical cleaning
Si (111), p- and n-type wafers-Chemical etching
Si (111), p-type (intrinsic) and doped (extrinsic) wafers-Chemical cleaning
Si (111), p-type wafers used as substrates for tungsten deposition-Chemical cleaning
Si (111), p-type wafers, 0.1-200 Ohm cm resistivity-Chemical polishing
Si and Ge (111) wafers and other orientations-Chemical polishing
Si and Ge wafers-Chemical polishing
Si and Ge wafers-Electrolytic cleaning
Si and SiO(x)N(y) DC sputtered thin films on (111) silicon wafers-Chemical etching
Si and alloys
Si and alloys
Si as 15 mm square cut and oriented cubes (100)-Neutron damage
Si as a pre-cut single cystal octahedron, (111) form-Chemical etching
Si as p+-n solar cells-Chemical cleaning
Si as poly-Si films on Si (100) substrates-Electrolytic decoration
Si as poly-Si specimens-Ionized gas etching
Si as poly-Si thin film on silicon wafers-Ionizde gas structuring
Si as poly-Si thin films-Chemical etching
Si as various cut shaped specimens-Chemical etching
Si brass, bronze
Si ingot FZ grown, n-type, 200 Ohm cm resistivity-Dislocation etching
Si ingot etched for defects-Chemical etching
Si n- and p-type wafers-Electrolytic polishing
Si p-n junction wafers-Chemical etching
Si p-n-p transistors-Acid junction cleaning
Si p-n-p transistors-Acid junction cleaning
Si p-type wafers-Chemical etching
Si p-type wafers-Electrolytic polishing
Si poly-Si epitaxy deposited thin films-Chemical cleaning
Si polycrystalline material-Chemical etching
Si polycrystalline spheres-Drop forming
Si single crystal hemispheres-Chemical etching
Si single crystal spheres 1/2" diameter-Chemical polishing
Si single crystal spheres From 1/8 to 1/2" in diameter-Sample preparation
Si single crystal spheres, p- and n-type-Sample preparation
Si single crystal spheres-Chemical ecthing
Si single crystal spheres-Chemical ecthing
Si single crystal spheres-Chemical etching
Si single crystal spheres-Chemical etching
Si single crystal spheres-Chemical etching
Si single crystal spheres-Chemical polishing
Si single crystal spheres-Sample preparation
Si single crystal spheres-Si single crystal spheres
Si single crystal wafers of different orientations-Chemical etching-Copper dislocation etchant
Si single crystal wafers-Chemical etching
Si single-crystal or poly-crystalline wafer-Chemical etching
Si specimens-Chemical polishing
Si steel-Fe-0.6C-2.0Si
Si steel-Jet electro polishing
Si steels-Silicon steel with high silicon content
Si substrates used for deposition of a-SiH-Chemical etching
Si thin film deposition on germanium substrates-Chemical etching
Si thin film epitaxy grown on (100) silicon wafer substrates-Chemical cleaning
Si wafers and other orientations-Chemical polishing
Si wafers both float zone ingot material and epitaxy thin film deposit-Chemical cleaning-Chrome regia etchant
Si wafers containing alloyed or diffused junctions-Chemical etching-Gold etchant for silicon
Si wafers of all major plane orientations-Chemical cleaning
Si wafers of different orientations-Chemical etching
Si wafers of different orientations-Electrolytic polishing
Si wafers of various orientations-Chemical etching
Si wafers of various orientations-Ionized gas etching
Si wafers used as substrates for growth of silicides-Ionized gas etching
Si wafers used as substrates for silicon epitaxy as Si/Si-Gas contamination
Si wafers with p-n junctions-Chemical etching
Si wafers with p-n junctions-Chemical junction etching
Si wafers-Chemical cleaning
Si wafers-Chemical cleaning
Si wafers-Chemical etching
Si wafers-Chemical etching
Si wafers-Chemical etching
Si wafers-Chemical etching
Si wafers-Chemical polishing
Si wafers-Electrolytic polishing
Si wafers-Electrolytic polishing
Si wafers-Gas etching
Si wafers-Ionized gas, structure
Si wafers-Surface treatment
Si wafers-Surface treatment
Si wafers-Surface treatment
Si(100) wafers-Ionized gas etching
Si-Al-Mg-Ti glass-65SiO2-19Al2O3-9MgO-6.5TiO2
Si-B-P alloys
Si-B-P alloys
Si-Ge single crystal ingots-Chemical etching
Si-as system (SiAs)-Etching for defects
Si3N4
Si3N4
Si3N4
Si3N4
Si3N4 amorphous thin films-Chemical ecthing
Si3N4 and Si3NxOy thin films-Chemical etching
Si3N4 and oxynitride thin films on silicon-Chemical etching
Si3N4 and oxynitride thin films on silicon-Chemical etching
Si3N4 and oxynitride thin films-Chemical cleaning
Si3N4 and oxynitrides as DC sputtered thin film deposits on (111) silicon, n-type, 5-10 Ohm cm resistivity wafers-Chemical etching
Si3N4 and oxynitrides deposits on (111) silicon-Chemical etching
Si3N4 and oxynitrides grown as thin films by DC sputtering on (111) silicon wafers-Chemical etching
Si3N4 ceramic with TiN-Plasma etching
Si3N4 deposited as pyrolytic thin films-Chemical etching
Si3N4 oxynitrides and SiO2 DC/RF sputtered thin films-Chemical cleaning
Si3N4 oxynitrides and SiO2 thin films-Chemical cleaning
Si3N4 pressed powder blanks-Polishing
Si3N4 thin film amorphous deposits on silicon wafer substrates-Chemical etching
Si3N4 thin film amorphous deposits-Chemical etching
Si3N4 thin films RF plasma grown on silicon-Chemical etching
Si3N4 thin films deposited by CVD on (100) silicon substrates-Chemical etching
Si3N4 thin films deposited by PECVD-Chemical etching
Si3N4 thin films deposited on (100) silicon wafers-Chemical cleaning
Si3N4 thin films deposited on silicon substrates-Chemical etching
Si3N4 thin films-Chemical cleaning
Si3N4 thin films-Chemical etching
Si3N4 thin films-Chemical etching-BHF, modified etchant
Si3N4, SiO2 and glass-Chemical cleaning-Glass cleaner etchant
Si3N4, UN-Physical etching
Si3N4, oxynitrides and SiO2 thin films-Chemical cleaning
Si3N4, oxynitrides, SiO2 as thin films or glass and quartzware-Chemical cleaning
Si3N4-Chemical etching
Si3N4-Chemical etching
Si3N4-Chemical etching
Si3N4-Chemical etching
Si3N4-Chemical etching
Si3N4-Physical etching
SiB6 specimens-Cleaning
SiC
SiC
SiC
SiC
SiC
SiC
SiC (0001) blanks-Metal decoration
SiC (0001) grown as alpha-II SiC-Abrasive polishing
SiC (0001) thin films grown on (100) silicon substrates-Chemical cleaning
SiC (0001) wafers-Chemical polishing
SiC (0001) wafers-Dislocation etching
SiC (0001) wafers-Gas polishing
SiC (0001) wafers-Molten flux etching
SiC (111) wafers-Molten flux etching
SiC alloy with 1% B4C
SiC blanks-Chemical cleaning
SiC carbide-Chemical etching
SiC ceramic with ZrB2-Chemical and plasma etching
SiC epitaxy thin films-Molten flux, dislocation
SiC n-type wafers doped with aluminum-Metal doping
SiC platelets-Molten flux polishing
SiC reaction bonded-Electrolytic etching
SiC single crystal specimens-Electrolytic polishing
SiC thin films grown on Si (100) wafers-Gas doping
SiC thin films vapor deposited on silicon wafers-Moletn flux etching
SiC thin films-Electrolytic etching
SiC with 1% B4C, B doped SiC-Chemical etching
SiC with 5-10% oxide additions-Physical etching
SiC-AlN specimens-SiC-10/80% AlN
SiC-Electrolytic etching
SiC-Physical etching
SiC-Physical etching
SiN(x) and SiO2 thin films-Chemical ecthing
SiN(x) and SiO2 thin films-Ionized gas etching
SiO(x)N-H and Si-H thin films-Solvent cleaning
SiO2
SiO2
SiO2 (0001), (1010), natural single crystal and artificial fused quartz wafers and blank-Chemical etching
SiO2 (10T0) artificial alpha-quartz blanks-Chemical etching
SiO2 AT-cut quartz blanks-Acid tuning
SiO2 alpha-quartz frequency crystals-Chemical cleaning-RCA etchant (AB)
SiO2 and Si3N4 thin films deposited on silicon-Chemical etching
SiO2 as a residual PSG surface film-Chemical etching
SiO2 as alpha-cristobalite-Thermal conversion
SiO2 as fused quartz ampoules-Chemical cleaning
SiO2 as natural single crystal-Chemical etching
SiO2 as quartzware-Chemical cleaning
SiO2 as single crystal natural quartz, artificial quartz, and vitreous silica (fused glass)-Chemical cleaning
SiO2 as single crystal quartz blanks-Chemical cleaning
SiO2 as the natural mineral coesite-Chemical etching
SiO2 as the natural mineral tridymite-Chemical etching
SiO2 as thermal oxidation on silicon wafers-Chemical etching
SiO2 as thin film deposits-Chemical etching
SiO2 deposited as CVD thin films on (100) silicon substrates-Chemical etching
SiO2 deposited on silicon wafer substrates
SiO2 deposition on aluminum and quartz blanks or silicon wafers-Chemical etching
SiO2 drawn for fiber optics and laser applications-Organic coating
SiO2 fused quartz epitaxy tubes-Chemical cleaning
SiO2 fused quartz tubes-Chemical cleaning
SiO2 fused quartz tubes-Chemical cleaning
SiO2 fused quartz tubes-Solvent cleaning
SiO2 glass specimens
SiO2 grown as a hydrated oxide on silicon wafers-Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers-Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers-Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers-Electrolytic oxidizing
SiO2 grown on IC devices-Chemical etching
SiO2 native oxide-Chemical etching
SiO2 single crystal artificial alpha-quartz blanks-Chemical thinning
SiO2 single crystal artificial specimens-Chemical cleaning
SiO2 single crystal blanks-Chemical cleaning
SiO2 single crystal blanks-Chemical cleaning
SiO2 single crystal blanks-Chemical etching
SiO2 thermally oxidized thin films on p-type (100) silicon wafers-Metal decoration
SiO2 thin film RF sputtered
SiO2 thin film coatings-Oxide, growth
SiO2 thin film deposited on InP (100) wafer substrates-Chemical etching
SiO2 thin film deposits on silicon wafer-Chemical etching
SiO2 thin film deposits-Chemical etching
SiO2 thin film deposits-Chemical etching
SiO2 thin film deposits-Ionized gas etching
SiO2 thin film layers grown on silicon-Chemical etching
SiO2 thin film oxidation of silicon at 1200C-Chemical etching
SiO2 thin film oxidation of silicon, (111) n-type wafers at 1050C as wet oxide, 2000-2500 A thick-Chemical etching
SiO2 thin film-Chemical etching
SiO2 thin films 160 nm thick-Chemical etching
SiO2 thin films RF sputter deposited in argon on (100) oriented silicon wafers-Chemical etching
SiO2 thin films RF sputtered 200-700 nm thick on (100) silicon wafers-Chemical etching
SiO2 thin films and native oxides-Chemical etching
SiO2 thin films deposited by Silox system method on (100) silicon and GaAs-Cr (SI) wafers-Ionized gas etching-DE-100 etchant
SiO2 thin films deposited by a special technique-Chemical etching
SiO2 thin films deposited in etched grooves of (100) silicon wafers-Chemical etching
SiO2 thin films deposited on (100) silicon substrates-Dislocation etching
SiO2 thin films deposited on (100) silicon wafers-Chemical ecthing-Pliskin's etchant
SiO2 thin films deposited on (100) silicon wafers-Chemical etching
SiO2 thin films deposited on (100) silicon wafers-Chemical etching-P etchant
SiO2 thin films deposited on (100) silicon wafers-Ionized gas etching
SiO2 thin films deposited on (100) silicon wafers-Metal decoration
SiO2 thin films deposited on (111), p-type, 1-3 Ohm cm resistivity wafers-Chemical ecthing
SiO2 thin films deposited on (1OO) silicon wafers-Chemical etching
SiO2 thin films deposited on a variety of substrates/surfaces-Oxide, adhesive coat
SiO2 thin films deposited on silicon (100)-Chemical etching
SiO2 thin films deposited on silicon substrates-Chemical etching
SiO2 thin films deposited on silicon substrates-Chemical etching
SiO2 thin films deposited on silicon wafers
SiO2 thin films deposited on silicon wafers-Chemical etching
SiO2 thin films deposited on silicon wafers-Chemical etching
SiO2 thin films deposition on (100) silicon wafers-Oxide, growth
SiO2 thin films grown on (100) silicon wafers-Ionized gas etching
SiO2 thin films grown on silicon, (100), n-type substrates-Chemical etching
SiO2 thin films on Si (100) wafers-Chemical etching
SiO2 thin films on Si (100) wafers-Chemical etching
SiO2 thin films on silicon wafers as doped BPSG
SiO2 thin films on various substrates-Chemical cleaning
SiO2 thin films thermally evaporated-Chemical etching
SiO2 x nH2O as the natural mineral opal-Acid coloring
SiO2-Al2O3-MgO-TiO2-CeO2 glass-63SiO2-19Al2O3-9MgO-6TiO2-4.5CeO2
SiO2-Al2O3-MgO-ZrO2-CaF2 glass-65SiO2-19Al2O3-9MgO-6.5ZrO2-1CaF2
SiO2-Al2O3-MgO-ZrO2-CeO2 glass-65SiO2-19Al2O3-9MgO-6ZrO2-4.5CeO2
SiO2-MgO-Al2O3-TiO2-CaF2 glass-65SiO2-19Al2O3-9MgO-6.5TiO2-1CaF2
SiO2/SiO4 as the natural mineral stisovite-Chemical etching
SiO22 as a BSG glassy layer on silicon-Chemical etching-BSG etchant
SiOi2 AT-cut quartz crystal blanks-Polishing
SiSiC-Chemical etching
SiSiC-Electrolytic etching
SiSn thin films deposited on (100) silicon wafers-Chemical etching
SiV2 thin films-Chemical etching/polishing
Sigma Phase in Austenitic Stainless Steel Weld
Sigma phase in duplex steels
Sigma phase in duplex steels (Fe)-Electrolytic etching
Silica (SiO2)-Chemical thinning
Silica-alumina-magnesia-zirconia glass-65SiO2 x 10Al2O3 x 9MgO x 6.5 ZrO2
Silica-alumina-magnesia-zirconia mixtures-Chemical etching
Silicon (Si) p-n junction-To stain p-n junctions in polycrystalline silicon
Silicon carbide (SiC) single crystal-For revealing the growth spirals
Silicon carbide (SiC) single crystal-Shows differences between Si (smooth etch) and C (rough etch) faces on opposing (001) surfaces
Silicon carbide (SiC)-Beta SiC with B4C
Silicon carbide (SiC)-Chemical etching
Silicon carbide (SiC)-Chemical etching
Silicon carbide (SiC)-Electrolytic etching
Silicon carbide (SiC)-Electrolytic etching
Silicon carbide (SiC)-Electrolytic etching
Silicon carbide (SiC)-Etching of SiC for Transmission Electron Microscopy (TEM)
Silicon carbide (SiC)-For RSiC. Reveals alpha/beta grain boundaries
Silicon carbide (SiC)-For SiSiC
Silicon carbide (SiC)-For alpha SiC dosed with B
Silicon carbide (SiC)-For alpha-SiC. Reveals alpha/alpha and alpha/beta grain boundaries
Silicon carbide (SiC)-For beta SiC
Silicon carbide (SiC)-For beta-SiC. Reveals beta/beta grain boundaries
Silicon carbide (SiC)-For pyrolytically manufactured beta SiC
Silicon carbide (SiC)-HPSiC
Silicon carbide (SiC)-Polycrystalline-Chemical and elctrolytic etching
Silicon carbide (SiC)-Pressureless sintered SiC (alpha and alpha + beta)
Silicon carbide (SiC)-Pressureless sintered SiC dosed with B and Al (alpha and alpha + beta)
Silicon carbide (SiC)-Pyrolytic-Electrolytic etching
Silicon carbide (SiC)-Si-SiC, infiltrated. All phases are etched equally
Silicon carbide (SiC)-Si-SiC, infiltrated. Si, alpha and beta are differentiated
Silicon carbide (SiC)-SiC with B
Silicon carbide (SiC-(beta-form)-Chemical polishing
Silicon carbide (SiC-(beta-form)-Chemical polishing
Silicon carbide SiC-Etching
Silicon nitride (Si3N4)-Chemical etching
Silicon nitride (Si3N4)-Chemical etching
Silicon nitride (Si3N4)-Chemical etching
Silicon nitride (Si3N4)-Chemical etching
Silicon nitride (Si3N4)-Chemical etching
Silicon nitride (Si3N4)-Physical etching
Silicon nitride (Si3N4)-Physical etching
Silicon nitride (SiN)-Chemical and physical etching
Silicon nitride (SiN)-Chemical etching
Silicon nitride (SiN)-Chemical etching
Silicon nitride (SiN)-Chemical etching
Silicon nitride (SiN)-Ion beam machinning
Silicon nitride Si3N4-Etching
Silicon nitride-alumina-silica system-(Si12Al18N8(2Si3N4 x 9Al2O3 x 6SiO2))
Silicon oxide wafer etch process
Silicon single crystals-Etching of the p-n transition
Silicon single crystals-For TEM sample preparation
Silicon single crystals-For TEM sample preparation
Silicon single crystals-For revealing dislocations
Silicon specimens-Cathodic etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical etching
Silicon specimens-Chemical polishing
Silicon specimens-Chemical polishing and etching
Silicon specimens-Chemical polishing and etching
Silicon specimens-Chemical polishing and etching
Silicon specimens-Chemical polishing and etching
Silicon specimens-Chemical thinning
Silicon specimens-Chemical thinning
Silicon specimens-Chemical thinning
Silicon specimens-Chemical thinning
Silicon specimens-Cooper depostion on dislocations
Silicon specimens-Defects in epi layers on <100> silicon
Silicon specimens-Electro polishing
Silicon specimens-Electrolytic etching
Silicon specimens-Electrolytic etching
Silicon specimens-Electrolytic polishing
Silicon specimens-Etch for stacking faults and dislocations
Silicon specimens-Etch for structure due to micro segregation
Silicon specimens-Etch pits etching
Silicon specimens-Etchant for revealing twin planes
Silicon specimens-Final chemical polishing
Silicon specimens-For etch pits etching
Silicon specimens-For stainning. Distinguishes between n and p type silicon
Silicon specimens-Sample preparation procedure
Silicon specimens-Se, Ge, and their alloys
Silicon specimens-Si, Ge, and their alloys
Silicon specimens-Si, Ge, and their alloys. GaSb, InSb. Dislocations on (100) and (111) planes of Si
Silicon specimens-Si, Ge, and their alloys. InSb. Etch pitch on (111) planes , p-n junctions
Silicon specimens-Si, Te, Se
Silicon steels-Determination of grain orientaion
Silicon steels-Determination of grain orientaion
Silicon steels-Determination of grain orientaion
Silicon steels-Determination of grain orientaion
Silicon steels-Determination of grain orientaion
Silicon steels-Determination of grain orientaion
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si
Silicon-Si - CP-4 Reagent
Silicon-Si - Fluor regia
Silicon-Si carbide
Silver alloys-Chemical etching
Silver and alloys-Chemical thinning
Silver single crystal-Chemical polishing
Silver single crystal-Chemical polishing
Silver single crystal-Chemical polishing and etching
Silver single crystal-Chemical polishing and etching
Silver solders (Ag-Cu-Cd-Zn)-Chemical etching
Silver specimens-Ag rich Ag-Cd alloys, Ag solders, Ag-Cu alloys
Silver specimens-Ag solders
Silver specimens-Ag-Mo alloys, Ag-W alloys, Ag-W carbides
Silver specimens-Cemical polishing and etching
Silver specimens-Chemical etching
Silver specimens-Chemical etching
Silver specimens-Chemical etching
Silver specimens-Chemical etching
Silver specimens-Chemical etching
Silver specimens-Chemical etching
Silver specimens-Chemical etching
Silver specimens-Chemical polishing
Silver specimens-Chemical polishing
Silver specimens-Chemical polishing
Silver specimens-Chemical thinning
Silver specimens-Electric contact material. Silver (99.9% Ag)
Silver specimens-Electric contact material. Silver (99.9% Ag)
Silver specimens-Electric contact material. Silver (99.9% Ag)
Silver specimens-Electro mechanical polishing
Silver specimens-Electro polishing
Silver specimens-Electro polishing
Silver specimens-Electro polishing
Silver specimens-Electro polishing
Silver specimens-Electro polishing
Silver specimens-Electro polishing
Silver specimens-Electro thinning
Silver specimens-Electro thinning
Silver specimens-Electro thinning
Silver specimens-Electrolytic polishing
Silver specimens-Electrolytic polishing
Silver specimens-Electrolytic polishing
Silver specimens-Electrolytic polishing
Silver specimens-Electrolytic polishing
Silver specimens-Electropolishing
Silver specimens-Electropolishing
Silver specimens-Electropolishing
Silver specimens-Electropolishing
Silver specimens-Electropolishing
Silver specimens-Electropolishing
Silver specimens-Electropolishing
Silver specimens-Etch pit etching
Silver specimens-For silver and silver rich alloys
Silver specimens-Grain contrast
Silver specimens-Grain contrast etching
Silver specimens-One of the best electrolyte for universal use
Silver specimens-Pure Ag and Ag alloys, Ag solders
Silver specimens-Pure Ag and Ag composites with other metals
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag
Silver-Ag alloys
Silver-Ag-Cd, Ag-Cu, silver solders (Ag-Cu-Cd-Zn)
Silver-Chemical etching
Silver-Electrolytic lapping
Silver-Magnesium-Nickel (Ag-Mg-Ni)-Electric contact material
Silver-cadmium (Ag-Cd) brazed to brass-Electric contact material
Silver-cadmium (Ag-Cd)-Electric contact material
Silver-copper (Ag-Cu)-Electric contact material
Silver-copper (Ag-Cu)-Electric contact material
Silver-graphite (Ag-C)-Electric contact material
Silver-molybdenum (Ag-Mo)-Electric contact material
Silver-nickel (Ag-Ni)-Electric contact material
Silver-nickel (Ag-Ni)-Electric contact materials
Silver-pure Ag, Ag-Ni and Ag-Pd alloys
Silver-pure Ag, grain-contrast etching
Silver-tungsten (Ag-W)-Electric contact material
Silver-tungsten (Ag-W)-Electric contact material
Silver-tungsten carbide (Ag-WC)-Electric contact material
Sintered Al materials, grain boundaries, removes smeared layers-Chemical etching
Sintered carbides
Sintered carbides-Electropolishing
Sintered carbides-General etching of sintered carbides
Sintered carbides-Particularly for sintered carbides which-apart from WC-also contain TiC, TaC and NbC
Sintered carbides-Sintered carbides containing Ni-phase
Sintered carbides-Sintered carbides with high content of Ti and Ta carbides
Sintered carbides-To reveal boundaries of the carbide grains against the cobalt phase
Sirtl's etch
Sirtl's etch
Sleeve bearing materials (Al, Sn, Pb, Cu)-Al alloy clad to steel, Al-Si alloy clad to steel
Sleeve bearing materials (Cu, Pb, Ni, Ag)-Commercial bronze liner, Cu-Pb alloy liner, Cu-Pb-Sn alloy liner
Sleeve bearing materials (Pb, Al)-Pb-Sn-Cu overlay on Al-Cd alloy
Sleeve bearing materials (Sn, Cu, Pb)-Sn base babbitt overlay on Cu-Pb-Sn alloy liner
Sleeve bearing materials (Sn, Pb, Sn)-High Sn-Al alloy clad to nickel plated steel
Sleeve bearing materials-Cd alloy liner
Sm specimens-Thermal forming
Sm-Ag alloys-Chemical etching
Sm-Au alloys-Chemical etching
Sm-B system-Chemical etching
Sm-Bi system-Chemical etching
Sm-Co alloys, grain boundary etchant-Chemical etching
Sm-Co alloys-Approx. SmCo5
Sm-Co alloys-Chemical etching
Sm-Co alloys-Chemical etching
Sm-Co alloys-Chemical etching
Sm-Co alloys-Domain structure
Sm-Co alloys-SmCo5
Sm-Co and Sm-Fe-Co-Cu alloys-Chemical etching
Sm-Co and Sm-Fe-Co-Cu alloys-Chemical etching
Sm-Co-Cu alloys-Sm(Co0.65 x Cu0.35)5.6 x Sm(Co0.84 x Cu0.16)6.4
Sm-Co-Cu alloys-SmCo(5-x)Cu(x)
Sm-Pd alloys (Approx. single Sm3Pd4)-Chemical etching
Sm2O3 + ZrO2-Chemical etching
SmBr3 (0001) wafers-Alcohol polishing
SmCo3 specimens-Chemical cleaning
SmCo5 permanent magnetic alloys-Grain boundary and phase etching of SmCo5
SmCo5 permanent magnetic alloys-Phase etching of SmCo5
SmCo5 permanent magnetic alloys-Phase etching of SmCo5 (blue Sm2Co7, brown SmCo5)
Sn (001) and (111) wafers-Electrolytic polishing
Sn (001) and (111)-tetragonal alpha-tin single crystals-Electrolytic polishing
Sn (010) wafers-Chemical etching
Sn (100) single crystal-Chemical etching
Sn alloys
Sn alloys
Sn alloys
Sn and Sn alloys
Sn and Sn alloys
Sn and Sn alloys
Sn and Sn alloys
Sn and Sn alloys
Sn and Sn alloys
Sn and Sn alloys
Sn and alloys
Sn coatings on steel and Sn-bearing alloys
Sn electroplated thin film-Chemical etching
Sn electroplated thin film-Chemical etching
Sn plated steel
Sn shot-Chemical cleaning
Sn single crystal ingots-Electrolytic sawing
Sn single crystal specimens-Physical etching
Sn single crystal sphere-Chemical etching
Sn single crystal wires-Electrolytic polishing
Sn specimen, 1/4" wafer in diameter-Acid, cutting
Sn specimens-Electrolytic polishing
Sn white-tin single crystal-Chemical polishing
Sn, Sn-Sb amd Sn-Sb-Pb alloys
Sn-As system-Chemical etching
Sn-Bi alloy (12% Bi)-Chemical etching
Sn-Bi alloy (5% Bi)-Chemical etching
Sn-Bi alloys-Chemical etching
Sn-Bi system-Electro polishing
Sn-Bi-As alloys-For Sn and Bi rich alloys
Sn-Bi-As system-Sn4As3-Bi-SnAs section
Sn-Bi-Te alloys-Chemical etching
Sn-Cd alloys
Sn-Cd alloys
Sn-Cd-Sb alloys - Murakami's reagent
Sn-Co-Hf system (HfCo2Sn)-Chemical etching
Sn-Co-Nb system-Chemical etching
Sn-Co-Ti system-TiCo2Sn
Sn-Co-Zr system-ZrCo2Sn
Sn-Fe-Ti system (TiFe2Sn)-Chemical eching
Sn-Ni-Hf system-HfNiSn and HfNi2Sn
Sn-Ni-Nb system (NbNi2Sn)-Chemical etching
Sn-Ni-Ti system-TiNiSn and TiNi2Sn
Sn-Ni-Ti system-VNi2Sn
Sn-Ni-Ti system-ZrNiSn and ZrNi2Sn
Sn-Pa-Zr alloys (ZrPdSn)-Chemical etching
Sn-Pb alloys
Sn-Pb alloys
Sn-Pb alloys (0.5% Pb)-Chemical etching
Sn-Pb alloys (Sn rich)-Electrolytic polishing
Sn-Pb alloys and Sn coatings on steel
Sn-Pb alloys, Sn solders-Chemical etching
Sn-Pb alloys, Sn-Containing bearing materials, Sn coatings-Chemical etching
Sn-Pb alloys-Chemical etching
Sn-Pb alloys-Electrolytic polishing and chemical etching
Sn-Pb, Sn-Sb and Sn-Cd alloys
Sn-Pb-As system-Chemical etching
Sn-Pb-As system-Chemical polishing
Sn-Pb-As system-SnPb-Sn4As3 region
Sn-Pb-Cd alloy-Eutectic alloy
Sn-Pb-Cd-Zn alloy-28.6 wt.% Pb, 52.45 wt.% Sn, 16.7 wt.% Cd, 2.25 wt.% Zn
Sn-Rh-Nb system (NbRhSn)-Chemical etching
Sn-Sb alloys-Chemical etching
Sn-Sb-Cd alloys-Chemical etching
Sn-Sb-Cu alloys
Sn-Sb-Cu alloys, Al-Sn materials, high Sn-containing alloys-Chemical polishing
Sn-Sb-Cu alloys, Sn-Sb-Cu-Pb-Ni alloys
Sn-Sb-Pb alloys
Sn-Sb-Se system (SnSe-Sb2Se3 section)-Chemical etching
Sn-Se system (SnSe-SnSe3 eutectic)-Pysical etching
Sn-Te system-Chemical polishing
Sn-Te-As system-Chemical etching
Sn-Te-As system-Chemical etching
Sn-Te-As system-Chemical etching
Sn-Te-As system-Chemical etching
Sn-Y alloys-Electrolytic polishing and etching
Sn-Zn system-Electro thinning
Sn-based babbitt metal
Sn-based babbitt metal
Sn-coated steels
Sn-containing Ti alloys-Chemical etching
Sn-plated steels
Sn-rich alloys
Sn-rich bearing and thin plate-Chemical etching
SnAgCu lead-free solder
SnAgCu solder joints
SnGe (1%) thin films-Chemical etching
SnO2 specimens-Chemical etching
SnO2 thin films deposited by CVD
SnO2 thin films deposited on 1 mm glass slides-Chemical etching
SnO2 thin films deposited on SiO2 coated silicon wafer-Electrolytic etching
SnO2 thin films-Chemical etching
SnTe
SnTe (100) wafers-Chemical polishing
SnTe (111) ingot-Electrolytic polishing
SnTe amorphous thin films-Chemical etching
SnTe specimens-Thermal etching for etch pits
SnTe thin films grown on muscovite mica (0001) substrates-Acid, float-off
Soda glass-Etch for recrystallization effects
Soda-boric oxide-niobium oxide-Chemical etching
Sodium chloride (NaCl) rock salt-Chemical etching
Sodium chloride (NaCl) rock salt-Chemical etching
Sodium chloride (NaCl) rock salt-Etch pits on single crystals
Sodium chloride (NaCl)-Chemical polishing and etching
Sodium chloride (NaCl)-Chemical polishing and etching
Sodium chloride (NaCl)-Chemical polishing of single crystal
Sodium chloride (NaCl)-Chemical thinning
Sodium chloride (NaCl)-Etch pits etching
Sodium chloride (NaCl)-Etch pits etching
Sodium chloride (NaCl)-Etch pits on (001) surfaces
Sodium chloride (NaCl)-For final polishing (110) and (111) faces
Sodium chloride-Barium chloride-NaCl-1% BaCl2
Sodium chloride-Calcium chloride-Up to 0.1% CaCl2
Sodium fluoride (NaF)-Chemical etching
Sodium fluoride (NaF)-Chemical etching
Sodium specimens-Alcohol polishing
Sodium specimens-Chemical etching
Sodium specimens-Chemical etching
Sodium specimens-Chemical polishing
Sodium-Na
Soft magnetic glasses-Chemical etching
Solder paste alloys-NiTi alloys
Specimen preparation for EBSD-Ceramics
Spinel (MgAl2O4)-Chemical etching
Spinel (MgAl2O4)-Chemical etching
Spinel (MgAl2O4)-Chemical thinning
Spinel phase-Chemical etching
Spinel single crystal (MgAl2O4)-For etching (100) face
Sr (100) wafers and other orientations-Chemical polishing/etching
Sr material as the carbonate strontianite, SrCO3 and sulfate celestite, SrSO4-Chemical etching
Sr-Hg system-Mechanical polishing
SrCl2 (100) wafers-Vacuum cleaning
SrF2 (100) thin film deposited on GaAs substrates-Chemical etching
SrF2 and Ba(x)Sr(1-x)F2 thin films and SrF2 (100) wafers-Chemical etching
SrF2 specimens-Chemical etching
SrGa12O19 (0001) cleaved wafers-Chemical etching
SrGa12O19 single crystals-Chemical etching
SrTiO3 single crystal specimens-Abrasive polishing
SrTiO3 single crystal specimens-Abrasive polishing
SrTiO3 specimens-Chemical etching
SrTiO3, MgTiO3-Chemical etching
SrWO4 single crystal specimens-Chemical polishing
Stainless and alloy steels-Electropolishing
Stainless and alloy steels-Electropolishing
Stainless and heat resistant steel specimens-General macro
Stainless and high temperature steel specimens-Austenitic stainless steel specimens and Ni base alloys
Stainless and high temperature steel specimens-Austenitic stainless steel specimens and high temperature alloys
Stainless and high temperature steel specimens-Austenitic stainless steel specimens and high temperature alloys
Stainless and high temperature steel specimens-Iron, Co and Ni base high temperature alloys
Stainless and high temperature steel specimens-Stainless steel specimens and high temperature alloys
Stainless and high temperature steel specimens-Stainless steel specimens and iron base high temperature alloys
Stainless steel
Stainless steel - Ralphs reagent
Stainless steel - Rolls Royce's etch
Stainless steel and alloy steel-Electrolytic polishing
Stainless steel and alloy steel-Electrolytic polishing
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel castings-General structure
Stainless steel specimens-Etching to reveal segregations, porosity, cracks
Stainless steel types 301, 307-Fe-0.1C-6/8Mn-16/17Cr-4/6Ni-0.1N
Stainless steel-Chemical thinning
Stainless steel-Chemical thinning
Stainless steel-Electro polishing
Stainless steel-Electro polishing
Stainless steel-Electro polishing
Stainless steel-Electro thinning
Stainless steel-Electro thinning
Stainless steel-Electro thinning
Stainless steel-Electro thinning by Bollmann technique
Stainless steel-Electro thinning by Bollmann technique
Stainless steel-Electro thinning by Mirand-Saulnier technique
Stainless steel-Electro thinning by modified Mirand-Saulnier technique
Stainless steel-Electro thinning in PTFE holders
Stainless steel-Electro thinning-Bollmann technique
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electrolytic polishing
Stainless steel-Electropolishing
Stainless steel-Fe-0.1C-1.5Mn-0.5Si-17/17.5Cr-12.5Ni-0.73Nb
Stainless steel-Fe-0.1C-1.5Mn-0.5Si-17Cr-12.5Ni-0.5Ti
Stainless steel-Fe-20Cr-25Ni-0.05C
Stainless steel-Good for all austenitic heat resistant alloys, 100 F plus
Stainless steel-Jet electro polishing
Stainless steel-Physical etching
Stainless steel-Type 304 or 316 stainless steel
Stainless steel-Type 304 Fe-18Cr-8.5Ni-0.06C-0.7Si-1.75Mn-0.36Mo. Type 309 Fe-23.6Cr-14Ni-0.04C-0.6Si-2Mn-0.3Mo. Etchants for welded structure
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels
Stainless steels - Chrome Regia
Stainless steels - Curan's etch
Stainless steels - Fry's reagent
Stainless steels - GE Turbo-chrome etch
Stainless steels - Groesbeck's reagent
Stainless steels - Kalling's No. 1 etch
Stainless steels - Kalling's No. 2 etch
Stainless steels - Marble's reagent
Stainless steels - Modified Marble's reagent
Stainless steels - Modified Murakami's reagent
Stainless steels - Modified Murakami's reagent
Stainless steels - Modified Murakami's reagent
Stainless steels - Modified Murakami's reagent
Stainless steels - Murakami's reagent
Stainless steels - Vilella's reagent
Stainless steels and high speed steels
Stainless steels with sigma - Modified ortho-nitrophenol contrast etch
Stainless steels-All types of stainless steels
Stainless steels-Carbon steels, low and high alloy steels, stainless steels
Stainless steels-Chemical etching
Stainless steels-Color etchant
Stainless steels-Color etchant
Stainless steels-Color etchant
Stainless steels-Color etchant
Stainless steels-Color etching
Stainless steels-Color etching
Stainless steels-Color etching
Stainless steels-Color etching
Stainless steels-Color etching
Stainless steels-Color etching
Stainless steels-Color etching
Stainless steels-Electro polishing
Stainless steels-Electro polishing
Stainless steels-Electro polishing
Stainless steels-Electro polishing
Stainless steels-Electro polishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-Electropolishing
Stainless steels-General etchant
Stainless steels-General etchant
Stainless steels-General etchant
Stainless steels-General etchant. Heavy attack on austenite, sigma phase and carbides
Stainless steels-Good general-purpose electrolyte
Stainless steels-Stainless steels different types
Stainless steels-Stainless steels with 0.08-0.20% C
Stainless steels-To reveal surface carburisation in stainless steels
Stainlesss steels-Electrolytic polishing
Stead No. 1 etch
Stead's No. 2 etch
Stead's reagent (1)
Stead's reagent (2)
Steatite (Mg3 Si4 O10 x (OH)2))-Sample preparation
Steatite porcelain-Chemical etching
Steel 1.5C-12Cr
Steel 1.5C-12Cr-1Mo
Steel 1.5C-12Cr-1Mo-1V
Steel 1.5C-12Cr-1V
Steel 145V33 (Mat.No. 1.2838, DIN 145V33)
Steel 145V33 (Mat.No. 1.2838, DIN 145V33)
Steel 145V33 (Mat.No. 1.2838, DIN 145V33)
Steel 145V33 (Mat.No. 1.2838, DIN 145V33)
Steel 145V33 (Mat.No. 1.2838, DIN 145V33)
Steel 29Ni-18Cr
Steel 2C-12Cr
Steel 2C-12Cr
Steel 304 type blanks-Chemical cleaning
Steel 304 type-Solvent cleaning
Steel 35NCD16 (Mat.No. 1.6773, DIN 36NiCrMo16)
Steel 35NCD16 (Mat.No. 1.6773, DIN 36NiCrMo16)
Steel 35NCD16 (Mat.No. 1.6773, DIN 36NiCrMo16)
Steel 35NCD16 (Mat.No. 1.6773, DIN 36NiCrMo16)
Steel 35NCD16 (Mat.No. 1.6773, DIN 36NiCrMo16)
Steel BR885 (Mat.No. 1.3348, DIN S2-9-2, AISI M7)
Steel BR885 (Mat.No. 1.3348, DIN S2-9-2, AISI M7)
Steel BR885 (Mat.No. 1.3348, DIN S2-9-2, AISI M7)
Steel BRCMO (Mat.No. 1.3243, DIN S6-5-2-5, AISI M35)
Steel BRCMO (Mat.No. 1.3243, DIN S6-5-2-5, AISI M35)
Steel BRM2 (Mat.No. 11.3343, DIN S5-5-2, AISI M2)
Steel BRM2 (Mat.No. 11.3343, DIN S5-5-2, AISI M2)
Steel BRU (Mat.No. 11.3207, DIN S10-4-3-10, AISI T42)
Steel BRU (Mat.No. 11.3207, DIN S10-4-3-10, AISI T42)
Steel BRU (Mat.No. 11.3207, DIN S10-4-3-10, AISI T42)
Steel BRU (Mat.No. 11.3207, DIN S10-4-3-10, AISI T42)
Steel C35 (Mat.No. 1.0501, DIN C35, AISI 1035)
Steel CRV
Steel CRV1 (Mat.No. 1.2376, DIN X96CrMoV12)
Steel CRV1 (Mat.No. 1.2376, DIN X96CrMoV12)
Steel CRV2 (Mat.No. 1.2631, DIN X50CrMoW9-1-1)
Steel CRV2 (Mat.No. 1.2631, DIN X50CrMoW9-1-1)
Steel CRV3
Steel CRV3
Steel CRV3 (Mat.No. 1.2690)
Steel CRV3 (Mat.No. 1.2690)
Steel KATO
Steel KATO
Steel KATO
Steel KATO
Steel MERILO (Mat.No. 1.2842, DIN 90MnCrV8, AISI O2)
Steel MERILO (Mat.No. 1.2842, DIN 90MnCrV8, AISI O2)
Steel OA2 (Mat.No. 1.2363, DIN X100CrMoV5-1, AISI A2)
Steel OA2 (Mat.No. 1.2363, DIN X100CrMoV5-1, AISI A2)
Steel OCR12 (Mat.No. 1.2080, DIN X210Cr12, AISI D3)
Steel OCR12EX (Mat.No. 1.2601, DIN X165CrMoV12)
Steel OCR12EX (Mat.No. 1.2601, DIN X165CrMoV12)
Steel OCR12SP (Mat.No. 1.2436, DIN X210CrW12)
Steel OCR12V2 (Mat.No. 1.2378, DIN X220CrVMo12-2)
Steel OCR12VM (Mat.No. 1.2379, DIN X155CrVMo12-1, AISI D2)
Steel OCR12VM (Mat.No. 1.2379, DIN X155CrVMo12-1, AISI D2)
Steel OCR12VM (Mat.No. 1.2379, DIN X155CrVMo12-1, AISI D2)
Steel OCR12VMS (Mat.No. 1.2379*, DIN X155CrVMo12-1, AISI D2)
Steel OCR12VMS (Mat.No. 1.2379*, DIN X155CrVMo12-1, AISI D2)
Steel OCR4EXSP (Mat.No. 1.2067, DIN 100Cr6, AISI L1/L3)
Steel OH49
Steel OH49
Steel OHV4 (Mat.No. 1.2327, DIN 86CrMoV7)
Steel OSIKRO4 (Mat.No. 1.2550, DIN 60WCrV7, AISI S1)
Steel OSIKRO4 (Mat.No. 1.2550, DIN 60WCrV7, AISI S1)
Steel OSIKROSP (Mat.No. 1.2552, DIN 80WCrV8)
Steel OSIKROSP (Mat.No. 1.2552, DIN 80WCrV8)
Steel OSV1
Steel OSV1
Steel OSV1
Steel OW3 (Mat.No. 1.2519, DIN 110WCrV5, AISI Approx. O7)
Steel OW3 (Mat.No. 1.2519, DIN 110WCrV5, AISI Approx. O7)
Steel Osikro 4 (Mat.No. 1.2550, DIN 60WCrV7, AISI S1)
Steel Osikro 4 (Mat.No. 1.2550, DIN 60WCrV7, AISI S1)
Steel PK10 (Mat.No. 1.4762, DIN X10CrAl24, AISI 446)
Steel PK12SP (Mat.No. 1.4571, DIN X6CrNiMoTi17-12-2, AISI 316 Ti)
Steel PK12SP (Mat.No. 1.4571, DIN X6CrNiMoTi17-12-2, AISI 316 Ti)
Steel PK2SP (Mat.No. 1.4057, DIN X17CrNi16-2, AISI 431)
Steel PK2SP (Mat.No. 1.4057, DIN X17CrNi16-2, AISI 431)
Steel PK2SP (Mat.No. 1.4057, DIN X17CrNi16-2, AISI 431)
Steel PK2SP (Mat.No. 1.4057, DIN X17CrNi16-2, AISI 431)
Steel PK2SP (Mat.No. 1.4057, DIN X17CrNi16-2, AISI 431)
Steel PK335 (Mat.No. 1.4122, DIN X39CrMo17-1)
Steel PK335 (Mat.No. 1.4122, DIN X39CrMo17-1)
Steel PK9 (Mat.No. 1.4747, DIN X80CrNiSi20)
Steel PK9 (Mat.No. 1.4747, DIN X80CrNiSi20)
Steel PK9 (Mat.No. 1.4747, DIN X80CrNiSi20)
Steel Ravnal
Steel Ravnal2 (Mat.No. 1.4767, DIN CrAl 20 5)
Steel Ravnal2 (Mat.No. 1.4767, DIN CrAl 20 5)
Steel Ravnal2 (Mat.No. 1.4767, DIN CrAl 20 5)
Steel TMCN1 (Mat.No. 1.2747, DIN X210Cr12, AISI D3)
Steel TMCN1 (Mat.No. 1.2747, DIN X210Cr12, AISI D3)
Steel TMCN2 (Mat.No. 1.2726, DIN 26NiCrMoV5)
Steel TMCN2 (Mat.No. 1.2726, DIN 26NiCrMoV5)
Steel TV4 (Mat.No. 1.2827, DIN 44MnSiV4)
Steel TV4 (Mat.No. 1.2827, DIN 44MnSiV4)
Steel UTOP2 (Mat.No. 1.2581, DIN X30WCrV93, AISI H21)
Steel UTOP2 (Mat.No. 1.2581, DIN X30WCrV93, AISI H21)
Steel UTOP3 (Mat.No. 1.2606, DIN X37CrMoW5-1, AISI H12)
Steel UTOP3 (Mat.No. 1.2606, DIN X37CrMoW5-1, AISI H12)
Steel UTOPCO2 (Mat.No. 1.2885, DIN X32CrMoCoV3-3-3, AISI H10A)
Steel UTOPCO2 (Mat.No. 1.2885, DIN X32CrMoCoV3-3-3, AISI H10A)
Steel UTOPEX1 (Mat.No. 1.2713, DIN 55NiCrMoV6, AISI L6)
Steel UTOPEX2 (Mat.No. 1.2714, DIN 56NiCrMoV7)
Steel UTOPEX2 (Mat.No. 1.2714, DIN 56NiCrMoV7)
Steel UTOPEX2 (Mat.No. 1.2714, DIN 56NiCrMoV7)
Steel UTOPMO2 (Mat.No. 1.2344, DIN X40CrMoV51, AISI H13)
Steel UTOPMO2 (Mat.No. 1.2344, DIN X40CrMoV51, AISI H13)
Steel UTOPMO2 (Mat.No. 1.2344, DIN X40CrMoV51, AISI H13)
Steel UTOPMO5
Steel UTOPMO5
Steel UTOPMO5
Steel UTOPMO5
Steel UTOPMO6
Steel UTOPMO6
Steel UTOPN (Mat.No. 1.2312, DIN 40CrMnMoS8-6)
Steel UTOPN (Mat.No. 1.2312, DIN 40CrMnMoS8-6)
Steel UTOPSP (Mat.No. 1.2581, DIN X30WCrV93, AISI H21)
Steel UTOPSP (Mat.No. 1.2581, DIN X30WCrV93, AISI H21)
Steel UtopMo1 (Mat.No. 1.2343, DIN X38CrMoV5-1, AISI H11)
Steel UtopMo1 (Mat.No. 1.2343, DIN X38CrMoV5-1, AISI H11)
Steel UtopMo2 (Mat.No. 1.2344, DIN X40CrMoV51, AISI H13)
Steel UtopMo2 (Mat.No. 1.2344, DIN X40CrMoV51, AISI H13)
Steel UtopMo4 (Mat.No. 1.2345, DIN X50CrVMo51, AISI Approx. H11)
Steel UtopMo4 (Mat.No. 1.2345, DIN X50CrVMo51, AISI Approx. H11)
Steel all type-Chemical etching
Steel alloys containing carbides-Contrast etching
Steel and SST vacuum system parts-Chemical cleaning
Steel blanks-Chemical etching
Steel blanks-Chemical thinning
Steel blanks-Electrolytic etching
Steel blanks-Electrolytic jet thinning
Steel carbon and alloy-Electrolytic polishing
Steel carbon and alloy-Electrolytic polishing
Steel castings-Particularly suitable for castings
Steel for turbine blades - Adler's etch
Steel specimens and cast iron-To reveal phosphorus segregations in carbon steel specimens with up to 0.7% C
Steel specimens and cast irons-Chemical etching
Steel specimens and cast irons-Etching to reveal sgregations (especially phosphorus segregations)
Steel specimens and cast irons-General mcroecthing of steel specimens and cast irons
Steel specimens and cast irons-General mcroecthing of steel specimens and cast irons
Steel specimens and cast irons-General mcroecthing steel specimens and cast irons
Steel specimens and cast irons-The etching solutions reveals phosphorus segregations
Steel specimens and cast irons-To reveal phosphorus segregations and cell structures in cast iron
Steel specimens and cast irons-To reveal strain lines (stretcher's, Luder's lines)
Steel specimens-Carbide etching
Steel specimens-Carbide etching
Steel specimens-Carbide etching
Steel specimens-Carbon steel and Cr-Mo steel
Steel specimens-Cast materials. Grain surfaces, background dendrites
Steel specimens-Cast materials. Primary structure
Steel specimens-Cast materials. Primary structure (grain surfaces clearly visible). X20Cr13 steel specimens
Steel specimens-Cast materials. Primary structure. 15Cr3 steel specimens
Steel specimens-Cast materials. Primary structure. 5Si13 steel specimens
Steel specimens-Cast materials. Primary structure. St38 steel specimens
Steel specimens-Chemical etching
Steel specimens-Determination of sulpur distribution
Steel specimens-Electro polishing
Steel specimens-Electrolytic polishing
Steel specimens-Electrolytic polishing
Steel specimens-Electrolytic polishing
Steel specimens-Electrolytic polishing
Steel specimens-Electropolishing
Steel specimens-Fe-Cr Alloys, Ni-Cr Alloys, high speed steels and austenitic manganese steels
Steel specimens-For untempered martensite in low alloy Cr-Ni steels
Steel specimens-General etching of carbon steel, cast iron, and also of certain alloyed steels
Steel specimens-Roolled materials. Structure visible, defects partly visible. 9S20 steel specimens
Steel specimens-TEM sample preparation
Steel specimens-To reveal ferrite grains in annealed carbon steel
Steel specimens-To reveal ferrite structure in low carbon content steels
Steel specimens-To reveal flow lines
Steel specimens-To reveal lead inclusions
Steel specimens-To reveal sigma phase
Steel specimens-To reveal the prexisting austenite grain boundaries and tempered steels
Steel weld - Noren's reagent
Steel, (100) single crystal specimens-Chemical cleaning for plating
Steel, 300 series-Electrolytic etching
Steel, alloys with untempered martensite-Chemical etching
Steel, carbon type-Chemical etching
Steel, carbon-Chemical cleaning/etching
Steel, hard-Chemical cleaning/etching
Steel, high-speed blanks-Chemical etching
Steel, low carbon blanks-Chemical etching
Steel-Carbon and alloy-Electrolytic polishing
Steel-Carbon, alloy, stainless-Electrolytic polishing
Steels
Steels
Steels (0.1-0.8% C, up to 3% alloys)
Steels (all types)-Chemical etching
Steels specimens-Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimens-Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimens-Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimens-Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimens-Cast irons, steels, tool steels, manganese steels, ferritic and martensitic stainless steels
Steels specimens-Electro polishing
Steels specimens-Electro polishing
Steels specimens-Electropolishing
Steels specimens-Electropolishing
Steels specimens-Electropolishing
Steels specimens-Electropolishing
Steels specimens-General etching of carbon steel and cast irons, and of certain alloyed steels
Steels specimens-Sulfides are colored yelow and matrix dark
Steels treated by oxidation method
Steels with high Si content-Chemical etching
Steels, carbon and alloy types-Chemical etching
Steels, high carbon and alloys types-Chemical etching
Steels, high carbon and high alloy types-Chemical etching
Steels-Chemical etching
Steels-Electrolytic polishing
Steels-Electrolytic polishing
Steels-Electrolytic polishing
Steels-Electrolytic polishing
Steels-Electrolytic polishing
Steels Iron, Steels, Cast Irons
Stellite 8, Haynes 21-62Co, Co-27Cr-5.5Mo-3Ni-1Fe+C, Mn, Si
Stellite specimens-Solution will selectively attack iron and cobalt in steel alloys
Stellite-6 alloy-Electrolytic etching
Stellites up to 70% Co, Co-base superalloys-Electrolytic etching
Strontium fluoride single crystal (SrF2)-Etch pits on (111) faces are revealed by etching
Strontium oxide-boric oxide silicon system-Chemical etching
Strontium specimens-Electrolytic polishing
Strontium tetrahydrate-SrC4H4O6 x 4H2O single crystal
Strontium tetrahydrate-SrC4H4O6 x 4H2O single crystal
Strontium titanate (O-Sr-Ti)-Dislocation etch in single crystals
Struers electrolyte A2 - MIXTURE
Struers electrolyte A2-I
Struers electrolyte A2-II
Struers electrolyte A3-I
Struers electrolyte A3-II
Struers electrolyte A8-I
Struers electrolyte A8-II
Struers electrolyte AC2-I
Struers electrolyte AC2-II
Struers electrolyte AC2-III
Struers electrolyte D2
Struers electrolyte E5-I
Struers electrolyte E5-II
Struers electrolyte E5-III
Suited especially for Al-Cu alloys-Chemical etching
Sulfides in stainless steels
Super picral
Superalloy 713LC-Ni-11.7Cr-4.5Mo-6Al-0.75Ti-2Nb(+Ta) (+0.06C)
Superalloy B-1900-65Ni-10Co-8Cr-6Mo-6Al-4Ta-1Ti-0.1C-0.1Zr-0.015B
Superalloy In 100-60Ni-15Co-10Cr-3Mo-5.5Al-5Ti-1V-0.18C-0.06Zr-0.014B
Superalloy MAR200-60Ni-10Co-9Cr-12.5W-5Al-2Ti-1Nb-0.15C-0.05Zr-0.015C
Superalloy MAR200-Chemical ecthing
Superalloy MAR200-Plastic deformation can be revealed by polish-etch-electro polish technique
Superalloy Udimet 700-56Ni-17Co-15Cr-5Mo-4Al-3Ti-0.07C
Superalloys, Hastelloy A type-Chemical etching
Superalloys, etches gamma phase, carbides, and grain boundaries-Chemical etching
Superalloys-Electro polishing
Superalloys-Electro polishing
Superalloys. Etches gamma phase, carbides, grain-contrast etchant-Chemical etching
Superoxol
Surface layers on Ni-base alloys, plasma coatings-Chemical etching
T.D. Ni-Cr alloys-20% Cr-2% ThO2
T.Z.M. molybdenum-Mo-0.5 wt.% Ti-0.08 wt.% Zr-0.02 wt.% C
TD-Ni, DS-NiCr, Inconel MA-754, TD-NiCrAl and DST-NiCrAl
TD-NiCr alloy
TD-Nickel
TD-nickel, TD-NiCrAl, Inconel, MA-754
TRIP steel - LaPera's etch
TRW-NASA VIA alloy-Ni-6Cr-2Mo-1Ti-5.5Al-9Ta-6W-7.5Co-0.5Hf-0.4Re-0.15C (+B, Zr)
Ta (100) wafers-Chemical etching
Ta (111) and (100) wafers-Chemical etching
Ta (111) specimen-Chemical etching
Ta alloy specimens containing a Ta silicide surface coating-Chemical etching
Ta alloys
Ta alloys
Ta alloys
Ta alloys
Ta alloys
Ta alloys
Ta alloys
Ta and Ta alloys
Ta and Ta alloys
Ta and Ta alloys
Ta and Ta alloys
Ta and Ta alloys
Ta and Ta alloys, color etchant-Anodizing
Ta and Ta alloys-Anodizing
Ta and Ta-base alloys, Nb-Re alloys-Chemical etching
Ta and alloys
Ta and alloys
Ta and alloys
Ta and alloys - Picklesimer's anodizing solution
Ta and high-Ta alloys
Ta as high purity slugs-Chemical cleaning
Ta material-Chemical etching
Ta material-Chemical polishing
Ta material-Electrolytic polishing
Ta or TaN etchant-For Ta and Ta alloys
Ta oxides, nitrides and carbides
Ta poly sheet blanks-Chemical etching
Ta poly sheet blanks-Chemical etching
Ta poly sheet blanks-Chemical etching
Ta specimens-Chemical cleaning
Ta specimens-Chemical cleaning
Ta specimens-Chemical etching
Ta specimens-Chemical polishing
Ta specimens-Chemical polishing
Ta specimens-Chemical polishing
Ta specimens-Electrolytic polishing
Ta specimens-Electrolytic polishing
Ta specimens-Electrolytic polishing
Ta thin films converted to Ta2O5 and TaN-Chemical etching
Ta thin films-Chemical etching
Ta(C, N, O) specimen-Chemical etching
Ta(C,N,O)-Chemical etching
Ta, Ta-Ir and Ta-Rh alloys
Ta, W-Anodizing
Ta-C alloys
Ta-C alloys-Chemical etching
Ta-C alloys-Chemical etching
Ta-C system-< 1.5 at.% C
Ta-Chemical-Mechanical polishing
Ta-Mo alloys - Murakami's reagent
Ta-Mo and Ta noble metal alloys
Ta-Mo-C alloys-Chemical etching
Ta-Pd system-Chemical etching
Ta-Pt alloys (50-100 at.% Pt)-Electrolytic etching
Ta-Re alloys
Ta-Ru alloys (Approx. TaRu)-Eletrolytic polishing and etching
Ta-Sc alloys-Chemical etching
Ta-Ti alloys
Ta-W-Hf alloy T-111-8% W, 2% Hf
Ta-W-Hf alloy T-111-8% W, 2% Hf. Electro polishing by twin jet
Ta-W-Re alloys
Ta-Zr alloys
Ta-Zr alloys-Electrolytic polishing and etching
Ta2O3 thin films-Chemical etching
Ta2O5 specimen-Chemical etching
Ta2O5 specimens-Thermal ecthing
Ta2O5 thin films-Gas, stabilizing
TaB2 and other specimens-Chemical etching
TaB2 and other specimens-Chemical etching
TaB2, TaB, and Ta3B4 specimens-Chemical etching
TaC
TaC
TaC specimens-Chemical cleaning
TaC specimens-Chemical etching
TaC, (Fe,Si)C-Chemical etching
TaC, TiC, SiC-Electrolytic etching
TaC, electrolytic alloy deposited thin films on different substrates-Chemical etching
TaC, electrolytic alloy deposited thin films on different substrates-Chemical etching
TaC-Chemical etching
TaH powder-Chemical etching
TaH thin films grown on (100)-Electrolytic etching
TaMo single crystal alloy-Electrolytic polishing
TaN thin film deposits-Chemical polishing
TaN thin films-Chemical etching
TaN thin films-Chemical etching
TaN thin films-Chemical etching
TaN thin films-Chemical etching
TaN-Chemical etching
TaS2 single crystals-Chemical etching
TaSe2 single crystal specimens-Chemical etching
TaSi2 as thin films-Ionized gas etching
TaSi2 thin films 2500-2800 A-Chemical etching
TaSi2 thin films deposited on silicon (100)-Chemical cleaning
TaSi2 thin films deposited on silicon substrates-Ionized gas etching
TaSi2 thin films deposited on silicon-Ionized gas etching
TaSi2 thin films-Chemical etching
TaSi2 thin films-Chemical etching
TaW thin films-Solvent removal
Taff's reagent
Talc, H2O x 3MgO x 4SiO2
Tantalum Nitrides (Ta8N, Ta38N5)-Electro thinning
Tantalum boride (TaB2)-Electrolytic etching
Tantalum carbide (TaC)-Thermal etching
Tantalum specimens-Attack-polishing
Tantalum specimens-Chemical etching
Tantalum specimens-Chemical polishing
Tantalum specimens-Chemical polishing
Tantalum specimens-Chemical polishing
Tantalum specimens-Chemical polishing
Tantalum specimens-Chemical polishing and etching
Tantalum specimens-Electro thinning
Tantalum specimens-Electro thinning and polishing
Tantalum specimens-Electro thinning by window technique
Tantalum specimens-Electro thinning by window technique
Tantalum specimens-Electrolytic polishing
Tantalum specimens-Electrolytic polishing
Tantalum specimens-Electrolytic polishing
Tantalum specimens-Electrolytic polishing
Tantalum specimens-Electrolytic polishing and chemical etching
Tantalum specimens-Electrolytic polishing and etch pits etching
Tantalum specimens-Electropolishing
Tantalum specimens-Electropolishing
Tantalum specimens-Jet etching
Tantalum specimens-Mo, W, V, Nb, Ta and their alloys
Tantalum specimens-Nb, Ta, Mo and their alloys
Tantalum specimens-Physical etching
Tantalum specimens-Pure Ta
Tantalum specimens-Ta and Ta alloys
Tantalum specimens-Ta and Ta alloys
Tantalum specimens-Ta and Ta alloys
Tantalum specimens-Ta and Ta base alloys
Tantalum specimens-Ta and Ta base alloys
Tantalum specimens-Ta and Ta base alloys. Nb and Nb base alloys. Nb-Cr alloys. Mo and Mo alloys
Tantalum specimens-Ta base alloys, Nb base alloys
Tantalum specimens-Ta base and Nb base alloys
Tantalum specimens-Ta, Nb, and their alloys
Tantalum specimens-W and W base alloys. Ta na Ta base alloys
Tantalum-Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-Ta
Tantalum-nitrogen system-0.6-6.5 at.% N
Tantalum-nitrogen system-10.6 at.% N2
Taub's etch
Tb single crystal specimens-Thermal etching
Tb-Ag alloys-Chemical etching
Tb-Au alloys-Chemical etching
Tb-Bi system-Chemical etching
Tb-Pd alloys (Approx. Tb3Pd4)-Chemical etching
TbCo2Si specimens-Chemical etching
TbCu2Ge2 specimens-Chemical etching
Te (0001) and (1010) wafers-Chemical polishing
Te (0001) and (1010) wafers-Oxide removal
Te (0001) and (1010) wafers-Te (0001) and (1010) wafers
Te (0001) and (12T0) wafers-Chemical cleaning
Te (0001) and other wafer orientations-Chemical etching
Te (0001) cleaved wafers-Chemical etching
Te (0001) specimens-Abrasive polishing
Te (0001) wafers-Chemical polishing
Te (0001) wafers-Chemical polishing
Te (0001) wafers-Sawing
Te (1010) wafers-Chemical polishing
Te (1010) wafers-Dislocation etching
Te (10T0) cleaved wafers-Chemical polishing/etching
Te (10T0) wafers-Chemical etching
Te material used for epitaxy growth-Salt, removal
Te-As alloys-Chemical etching
Te-bismuth telluride
TeO2 as natural single crystals-Chemical polishing/etching
TeO2 crystalline native oxide or TeO, amorphous native oxide-Salt, removal
TeO2 grown as a stable native oxide on CdTe (110) wafers-Chemical etching
Tellurium oxide (TeO2)-phosphoric pentoxide system (P2O5)-Chemical etching
Tellurium oxide-boric oxide system-Chemical etching
Tellurium oxide-boric oxide-cadmium oxide glass-TeO2 - B2O3 - CdO system
Tellurium oxide-boric oxide-cobalt oxide glass-TeO2 - B2O3 - CaO glass
Tellurium oxide-boric oxide-germanium oxide glass-TeO2-B2O3-GeO2 system
Tellurium oxide-boric oxide-iron oxide glass-TeO2-B2O3-Fe2O3-system
Tellurium oxide-boric oxide-manganese oxide glass
Tellurium oxide-boric oxide-nickel oxide glass-TeO2-B2O3-NiO system
Tellurium single crystal-Chemical etching
Tellurium specimens-Chemical etching
Tellurium specimens-Electro polishing
Tellurium specimens-Electromechanical polishing
Tellurium specimens-Ge, Te, Se, telurides, selenides and Zr silicide
Tellurium specimens-Si, Te, Se
Tellurium-Te
Temper embrittlement in steel-Chemical etching
Temper embrittlement in steel-Chemical etching
Temper embrittlement in steels
Temper embrittlement in steels - Etch of del Corral and de Castro y Mosquera
Temper embrittlement in steels - Klemm's etch
Terbium specimens-Electrolytic polishing
Textured Alpha-Alumina
Th and Th alloys
Th and Th alloys
Th and Th alloys
Th and Th alloys
Th and aloys
Th specimen-Chemical polishing
Th specimens-Chemical cleaning
Th specimens-Chemical etching
Th specimens-Electrolytic polishing/etching
Th(x)U(y)U2 specimens-Chemical etching
Th(x)U(y)U2 specimens-Chemical etching
Th, U, and alloys
Th-C alloys-Chemical and electrolytical etching
Th-Cu alloys-Electro polishing, air etching
Th-Ge alloys-Chemical etching
Th-Mo alloys-Sample preparation
Th-Pd alloys (Approx. Th3Pd4)-Chemical etching
Th-Zr alloys-Physical ething
ThC carbide-Chemical etching
ThC carbide-Chemical etching
ThC carbide-Chemical etching
ThC-Chemical etching
ThC2 and (Th,U)C2
ThC2 carbide-Chemical etching
ThC2 carbide-Chemical etching
ThO2 (111) wafers-Chemical etching
ThO2 + Y2O3 specimens-Chemical etching
ThO2 specimens-Chemical etching
ThO2-W
ThO2-Y2O3 mixtures-Chemical ecthing
Thallium specimens-Chemical etching
Thallium specimens-Chemical etching
Thallium specimens-Chemical etching
Thallium specimens-Chemical polishing
Thallium specimens-Electro polishing
Thallium specimens-Electro-mechanical polishing
Thallium specimens-Electrolytic etching
Thallium-Tl
Thallium-Tl
Thallium-Tl
Thallium-Tl
Thallium-Tl
Thallium-Tl
Thin section for EBSD
Thorium carbide (ThC)-Cathodic etching
Thorium carbide (ThC)-Chemical and electrolytic etching
Thorium carbide (ThC)-Chemical ecthing
Thorium carbide (ThC)-Electrolytic polishing
Thorium dicarbide (ThC2)-uranium dicarbide (UC2)-Electrolytic polishing
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-Chemical etching
Thorium oxide (ThO2)-yttrium oxide (Y2O3)-10 mol.% ThO2-Chemical etching
Thorium oxide (ThO2)-yttrium oxide (Y2O3)-Chemical etching
Thorium specimens-Electro polishing
Thorium specimens-Electro polishing
Thorium specimens-Electro polishing
Thorium specimens-Electrolytic and chemical etching
Thorium specimens-Electrolytic etching
Thorium specimens-Electrolytic polishing
Thorium specimens-Electrolytic polishing
Thorium specimens-Electropolishing
Thorium specimens-Physical etching
Thorium specimens-Th and Th alloys
Thorium-Th
Thorium-Th
Thorium-Th
Thulium orthoferrite (TmFeO3)-Chemical polishing
Thulium specimens-Electrolytic polishing
Ti alloyed steels-To reveal Ti containing grain boundary phases in Ti alloyed steels
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys
Ti alloys - Ence and Margolin's cumulative etch andodizing solution (H-etch)
Ti alloys - Keller's reagent
Ti alloys - Kroll's reagent
Ti alloys - Remington A etch
Ti alloys and Ti-Pd alloys (up to 42% Pd)
Ti alloys, Ti-7% Mn alloy
Ti alloys, Ti-Al-Mn alloys, flow lines, banded structure-Chemical etching
Ti alloys, etches segregation-Chemical ecthing
Ti alloys, idendification of alpha and beta Ti-Chemical etching
Ti alloys, removal of Cu deposits on the surface-Chemical etching
Ti alloys, removal of Sn deposits on the surface-Chemical etching
Ti alloys-Chemical etching
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys
Ti and Ti alloys (single crystals)-Dislocation etching
Ti and Ti alloys-Electrolytic polishing and chemical etching
Ti and Ti alloys-Modified window technique
Ti and Ti-base alloys, segregations, color etchant-Electrolytic etching
Ti and alloys
Ti and alloys
Ti and alloys
Ti and alloys
Ti and alloys
Ti and alloys
Ti and alloys
Ti and alloys (Battelle)
Ti and alloys - Weck's tint etch
Ti and alloys - Weck's tint etch
Ti and alloys-Sample preparation procedure
Ti and alloys-Ti-6Al-2Sn-1.5Zr-1Mo-0.35Bi-0.1Si
Ti borides
Ti evaporated as thin films-Chemical etching
Ti rod (electrode)-Chemical cleaning
Ti sheet and alloys-Chemical cleaning
Ti sheet and alloys-Chemical etching
Ti sheet and alloys-Chemical etching
Ti sheet and alloys-Chemical etching
Ti sheet and alloys-Chemical etching
Ti sheet and alloys-Chemical etching
Ti sheet specimens-Chemical etching
Ti specimens and thin films-Chemical etching
Ti specimens and thin films-Chemical etching
Ti specimens and thin films-Chemical etching
Ti specimens used for electroplating-Electrolytic polishing
Ti specimens-Chemical etching
Ti specimens-Chemical etching
Ti specimens-Chemical etching
Ti specimens-Chemical etching
Ti specimens-Chemical etching
Ti specimens-Chemical polishing
Ti specimens-Chemical polishing/etching
Ti specimens-Chemical polishing/etching
Ti specimens-Electrolytic polishing
Ti specimens-Electrolytic polishing
Ti specimens-Electrolytic polishing
Ti specimens-Electrolytic polishing
Ti specimens-Electrolytic polishing
Ti specimens-Electrolytic polishing
Ti specimens-Salt polishing
Ti specimens-Thermal etching
Ti thin film deposit-Chemical etching
Ti thin film deposit-Chemical etching
Ti thin film evaporation in vacuum systems-Chemical etching
Ti thin films-Chemical etching
Ti thin films-Chemical etching
Ti thin films-Electrolytic oxidation
Ti, 5% Al and 2.5% Sn alloy
Ti, Ti-Al alloys - Keller's reagent
Ti-12.6% V specimen-Chemical thinning
Ti-3% Al alloy, Ti-13% V-11% Cr-3% Al alloy, Ti-6% Al-4% V alloy
Ti-4% Al-4% Mn alloy
Ti-4% Al-4% Mn alloy
Ti-5% Al-2.5% Sn alloy
Ti-6% Al-4% V alloy, Ti-5% Al-2.75% Cr-1.25% Fe alloy, Ti-2.55% Al-3.75% Mn alloy
Ti-6Al-4V alloy
Ti-7% Al-4% Mo alloy
Ti-Ag alloys-Alloys with 10-26 at.% Ag
Ti-Al alloy ( <25% Al)-Chemical etching
Ti-Al alloy (< 25% Al)-Precipitate etching
Ti-Al alloy (30% Al)-Electropolishing
Ti-Al alloy (Ti-4Al)-Chemical polishing
Ti-Al alloy (Ti-8.6-10Al)-Electro polishing
Ti-Al alloy-Alloy with 5% Al
Ti-Al alloys (3-46% Al)-Electropolishing
Ti-Al alloys (5% Al)-Electro thinning
Ti-Al alloys (Ti rich)-Electropolishing and Micro
Ti-Al alloys-Alloys with up to 40% Al
Ti-Al alloys-Chemical etching
Ti-Al alloys-Chemical etching
Ti-Al alloys-Chemical etching
Ti-Al alloys-Electro thinning
Ti-Al alloys-Ti rich alloys
Ti-Al and Ti-Al-Zr alloys - R-etch
Ti-Al system-Alloys with up to 5 at.% Al
Ti-Al-B alloy-Alloy with 5% Ti and 1% B
Ti-Al-B alloys-Chemical etching
Ti-Al-Mn alloys, flow lines-Chemical etching
Ti-Al-Mn alloys-Electro thinning
Ti-Al-Mn alloys-Electro thinning in PTFE holder
Ti-Al-Mn, Ti-Al-V, and Ti-Al-Cr-Fe alloys, flow lines-Chemical etching
Ti-Al-Mo alloy-8Al-1Mo-1V
Ti-Al-Mo alloy-Alloy with 6% Al and 2% Mo
Ti-Al-Mo alloys-5.8-9.7% Al, 0.5-8.2% Mo
Ti-Al-Mo-V alloy-4-8% Al, 1-3% Mo, 1% V
Ti-Al-Mo-V alloy-8Al-1Mo-1V
Ti-Al-Mo-V alloy-Chemical etching
Ti-Al-Mo-V alloy-Ti-811 (Ti-8Al-1Mo-1V)
Ti-Al-Mo-V alloy-Ti-8Al-1Mo-1V
Ti-Al-Nb alloys-Ti3Al-Nb
Ti-Al-Nb-Ta alloy-Electro thinning
Ti-Al-Nb-Ta-Mo alloy-Ti-6Al-2Nb-1Ta-0.8Mo
Ti-Al-Ni, Ti-Al-Sn, and Ti-Si alloys, hydrides-Chemical etching
Ti-Al-O alloys-Ti-6-10% Al-0.04-0.12% O
Ti-Al-Si alloy (< 10% Al, 1% Si)-Chemical etching
Ti-Al-Sn alloy-Alloy with 2.5-5% Sn, 7-14.5% Al
Ti-Al-Sn alloy-Alloy with 5% Al and 2.5% Sn
Ti-Al-Sn alloy-Alloy with 5% Al and 2.5% Sn
Ti-Al-Sn alloy-Alloys with 5% Al and 2.5% Sn
Ti-Al-Sn alloy-Chemical etching
Ti-Al-Sn-Zr-Mo alloy-Ti-6Al-2Sn-4Zr-2Mo
Ti-Al-V alloy (5.9-9.7% Al, 2-6% V)-Chemical etching
Ti-Al-V alloy (6% Al, 4% V)-Chemical etching
Ti-Al-V alloy (6% Al, 4% V)-Electro thinning
Ti-Al-V alloy (6Al-4V)-Chemical etching
Ti-Al-V alloy (6Al-4V)-Chemical etching
Ti-Al-V alloy (6Al-4V)-Chemical etching
Ti-Al-V alloy (6Al-4V)-Chemical etching
Ti-Al-V alloy (6Al-4V)-Chemical polishing
Ti-Al-V alloy (6Al-4V)-Chemical polishing
Ti-Al-V alloy (6Al-4V)-Electro polishing
Ti-Al-V alloy (6Al-4V)-Electro thinning
Ti-Al-V alloy (6Al-4V)-Sample preparation
Ti-Al-V alloy-Alloy with 6% Al and 4% V
Ti-Al-V alloy-Electro thinning
Ti-Al-V alloys-Chemical etching
Ti-Al-V-Sn alloy-Alloy with 6% Al, 6% V and 2% Sn
Ti-Al-V-Sn alloy-Alloy with 6% Al, 6% V and 2% Sn
Ti-Al-V-Sn alloy-Ti-6Al-6V-2Sn alloy
Ti-Al-V-Sn alloy-Ti-6Al-6V-2Sn alloy
Ti-Al-Zr alloys-Alloys with 4.6-4.9% Al and 2-4% Zr
Ti-Al-Zr-Mo-Si alloy-Ti-6Al-6Zr-0.5Mo-0.25Si
Ti-Al-Zr-W-Si alloys-Electropolishing and chemical etching
Ti-Au alloys-For alloys with 4 - 20 at.% Au
Ti-B system-Ti-TiB eutectic
Ti-Be alloys-For alloys with < 10% Be
Ti-Bi alloy (Ti-3.1 at.% Bi)-Chemical etching
Ti-C alloys-Potentiometric etching
Ti-C system-Ti-TiC section
Ti-C system-TiC(x), 0.5 < x < 1.0, single crystal
Ti-Co alloy-Alloy with 5% Co
Ti-Co alloys-F.c.c low Ti alloys
Ti-Co alloys-Ti - 3/8 at.% Co
Ti-Cr alloys-Chemical etching
Ti-Cr alloys-Ti - 10-20 at.% Cr
Ti-Cr alloys-Ti-6% Cr
Ti-Cr-V-Al alloy-13% Cr, 11% V, 8% Al
Ti-Cr-V-Al alloy-13Cr-11V-3Al
Ti-Cr-V-Al alloy-13V-11Cr-3Al
Ti-Cu alloy-For alloys with 5% Cu
Ti-Cu alloys
Ti-Cu alloys (approx. Ti2Cu)-Chemical etching
Ti-Cu alloys-Chemical etching
Ti-Cu alloys-Chemical etching
Ti-Cu alloys-Electro thinning by Mirand-Saulnier technique
Ti-Fe alloys-Ti-4.5-13 at.% Fe
Ti-Mn alloy (10% Mn)-Electro polishing
Ti-Mn alloy (8% Mn)-Electro polishing and chemical etching
Ti-Mn alloy-Ti-8.6 at.% Mn
Ti-Mn alloys-Alpha-Beta alloys
Ti-Mn alloys-Chemical etching
Ti-Mo alloy (11% Mo)-Chemical etching
Ti-Mo alloy (11-17 at.% Mo)-Electro thinning
Ti-Mo alloy (15% Mo)-Electro polishing
Ti-Mo alloy (15.2 at.% Mo)-Chemical polishing
Ti-Mo alloy (7 at.% Mo)-Chemical etching
Ti-Mo alloy-Alloy with 11.6% Mo
Ti-Mo alloy-Ti-26Mo
Ti-Mo alloys (2-10% Mo)-Chemical etching
Ti-Mo alloys-Electro thinning
Ti-Mo-Al-Cr alloy-Ti-4.5Al-5Mo-1.5Cr
Ti-Mo-Al-Sn-Zr alloy-Titanium 6246-6Al-2Sn-4Zr-6 Mo
Ti-Mo-V-Al-Fe alloy-Ti-8Mn-8V-3Al-2Fe
Ti-Mo-Zr-Sn alloy-Ti-11Mo-6.6Zr-4.6Sn
Ti-Mo-Zr-V-Al alloy-Electro thinning
Ti-Nb diffusion couple
Ti-Ni alloys (8-14 at.% Ti)-Jet electro polishing
Ti-Ni alloys (Ni-12% Ti)-Electro polishing
Ti-Ni alloys (Ti-3/5 at.% Ni)-Chemical etching
Ti-Ni alloys-Chemical etching
Ti-Ni-Cr alloys-TiNi - 2/8% Cr
Ti-Ni-Si alloys-TiNi-1.3/5% Si
Ti-O-H alloys-Attack polishing
Ti-O-H alloys-Chemical etching
Ti-P alloys
Ti-Pb alloy (Ti-5.3 at.% Pb)-Chemical etching
Ti-Pd alloys (Ti rich)-Chemical etching
Ti-Pd alloys (Ti-8 at.% Pd)-Chemical etching
Ti-Si alloys
Ti-Si alloys-Ti-0.5/1.5 at.% Si
Ti-Si system (Ti-Ti5Si3 eutectic)-Chemical etching
Ti-Sn alloys (10-40% Sn)-Electro thinning
Ti-Sn alloys (up to 25% Sn)
Ti-Ta alloy-Chemical etching and thinning
Ti-TiAg-Ag thin films-Chemical etching
Ti-V alloy (20% V)-Electro thinning
Ti-V alloys (>20% V)
Ti-V alloys (15.5% V)-Chemical etching
Ti-V alloys (5-20% V)-Chemical etching and electro thinning
Ti-V alloys (Beta alloys, 20-40 wt.% V)-Chemical polishing and elecytrolytic etching
Ti-V alloys-Chemical polishing
Ti-V alloys-Electro thinning
Ti-V alloys-Electro thinning
Ti-V alloys-Electro thinning and jet etching
Ti-V-Cr-Al-Mo-Zr alloy-Beta C Ti-3Al-8V-6Cr-4Mo-4Zr
Ti-V-Cr-Al-Mo-Zr alloy-RMI (38-6-44) alloy Ti-3.5Al-8V-6Cr-4Mo-4Zr
Ti-V-Cr-Zr-Mo-Al alloy-Ti-3Al-8V-6Cr-4Zr-4Mo
Ti-V-Cr-Zr-Mo-Al alloy-Ti-8V-6Cr-4Zr-4Mo-3Al
Ti-V-Fe-Al alloy-Electro polishing, chemical etching, electro thinning
Ti-V-Mo alloys - Modified Murakami's etch
Ti-V-Si alloy-Ti-40V-1Si
Ti-Zr alloy (2% Ti)-Electro thinning
Ti-Zr alloy (25 at.% Ti)-Chemical thinning and polishing
Ti-Zr alloys-Chemical etching
Ti0.3W0.7Si2 thin films-Chemical polishing
Ti2O3 specimens and thin films-Chemical etching
Ti3SiC2 (titanium silicon carbide)-Chemical etching
Ti3W7Si2 thin films on silicon wafers, (111), (110) and (100)-Chemical etching
Ti6Al4V alloy-Chemical etching
TiB2
TiB2
TiB2
TiB2 and TiC single crystal wafers-Cleaning
TiB2, ZrB2-Chemical etching
TiB2-Chemical etching
TiB2-Chemical etching
TiB2-Chemical etching
TiB2-Chemical etching
TiB2-Electrolytic etching
TiC (001) cleaved wafers-Electrolytic etching
TiC (001) cleaved wafers-Polishing
TiC (100) thin films-Electrolytic polishing
TiC (100) wafers-Gas cleaning
TiC and TaC
TiC coated steel - Murakami's reagent
TiC coated steel-Structure of titanium carbide layer
TiC coated steel-This solution revealed a good grain boundry pattern in titanium carbide layer
TiC single crystal ingot-Electrolytic polishing
TiC specimens-Chemical cleaning
TiC-C alloys
TiD2 as thin films-Chemical etching
TiN thin films deposited on (100) silicon wafers-Chemical etching
TiN thin films deposited on Ti (0001) substrates-Chemical etching
TiN thin films deposited on poly-Si epitaxy layers-Chemical etching
TiN thin films deposited on poly-Si-Chemical etching
TiN thin films deposited on poly-Si-Ionized gas etching
TiN thin films deposited on silicon wafers-Chemical etching
TiN thin films-Chemical etching
TiO2
TiO2
TiO2 (001) basal oriented wafers-Chemical cleaning
TiO2 (110) natural single crystal rutile specimens-Salt flux decoration
TiO2 as a native oxide on titanium substrates-Chemical ecthing
TiO2 as natural minerals-Chemical etching
TiO2 as natural single crystal rutile-Chemical cleaning
TiO2 as natural single crystal rutile-Gas cleaning
TiO2 natural rutile specimens-Chemical cleaning
TiO2 single crystal natural rutile crystals-Chemical cleaning
TiO2 thin film deposited on GaAs (100) substrates-Chemical etching
TiO2 thin film deposits-Chemical etching
TiO2 thin films deposited on (111), n-type silicon substrates-Chemical etching
TiO2 thin films deposited on GaAs (100) substrates-Ionized gas cleaning
TiO2-Chemical etching
TiO2-Physical etching
TiSi thin films grown on (100) silicon wafers-Chemical etching
TiSi2 arc melted-Chemical polishing
TiSi2 thin film formed on silicon (100) substrates-Chemical etching
TiSi2 thin film grown on Si substrates-Chemical etching
TiSi2 thin films deposited on silicon wafers-Ionized gas etching
TiSi2 thin films grown on silicon substrates-Acid oxidation
TiW (1% Ti) thin films-Chemical etching
TiW thin films-Chemical etching
TiW thin films-Ionized gas etching
Tin (Sn) single crystal-Electrolytic polishing, chemical etching
Tin and its alloys-Grain structure
Tin and tin alloys-Chemical etching
Tin and tin alloys-Chemical etching
Tin and tin alloys-Darkens primary and eutectic lead in lead rich Pb-Sn alloys
Tin and tin alloys-For etching tin-coated copper and copper alloys
Tin and tin alloys-For etching tin-coated steel
Tin and tin alloys-For etching tin-coated steel and tin-coated cast iron
Tin and tin alloys-General macroetching
Tin and tin alloys-General use for Sn and Sn alloys
Tin and tin alloys-Grain boundary etch for pure Sn
Tin and tin alloys-High tin bearing metals
Tin and tin alloys-Pure Sn, Sn-Pb, Sn-Cd and Sn-Fe alloys
Tin and tin alloys-Pure tin and Sn-Pb alloys
Tin and tin alloys-Recommended for etching Sn-Sb alloys
Tin and tin alloys-Soldered joints
Tin oxide (SnO2)-Chemical etching
Tin oxide (SnO2)-Physical etching
Tin specimens-Chemical etching
Tin specimens-Chemical etching
Tin specimens-Electro polishing
Tin specimens-Electrolytic etching
Tin specimens-Electrolytic polishing
Tin specimens-Electrolytic polishing
Tin specimens-Electrolytic polishing
Tin specimens-Electrolytic polishing
Tin specimens-Electrolytic polishing and etching
Tin specimens-Electromechanical polishing
Tin specimens-Electropolishing
Tin specimens-Electropolishing
Tin specimens-Electropolishing
Tin specimens-For all types of Sn and Sn base alloys. Grain distribution
Tin specimens-Grain contrast (color) in pure Sn and most Sn alloys
Tin specimens-One of the best electrolyte for universal use
Tin specimens-Pure Sn
Tin specimens-Pure Sn, Sn-Cd, Sn-Fe, Sn-Pb, and Sn-Pb-Cu alloys
Tin specimens-Pure Sn. Sn rich slloys with Cd, Fe, Sb, Cu
Tin specimens-Sn layers on steel and cast irons
Tin specimens-Sn layers on steel. Sn-Pb alloys
Tin specimens-Sn layers. Sn bearing metals
Tin specimens-Sn rich bearing metals and white metals
Tin specimens-Sn rich bearing metals and white metals. Sn-Cu alloys and Bi-Sn eutectic
Tin-Chemical polishing
Tin-Electrolytic polishing
Tin-Sn
Tin-Sn
Tin-Sn
Tin-Sn
Tin-Sn
Tin-Sn - Klemm's II reagent
Tint etch for Fe-Ni massive martensite
Tint etch for Mo alloys (Oak Ridge National Laboratory)-Chemical etching
Tint etch for W-Pre-etch with grain boundary etch
Tint etch for lath or plate martensite
Tint etch for lath or plate martensite-Chemical etching
Tint etch for steels
Tint etch for steels
Tint etch for steels
Tint etch of Lienard and Pacque's
Tint etchant for steels - Beaujard and Tordeux's tint etch
Tint etchant for steels - Beaujard's tint etch
Tint etchant for steels - Beaujard's tint etch
Tint etchant for steels - Klemm's I reagent
Tint etchant for steels - Klemm's II reagent
Titanium 500 alloy-Chemical etching
Titanium 600 alloy-Chemical etching
Titanium alloys, welds-Chemical etching
Titanium alloys-Color etching
Titanium alloys-Color etching
Titanium alloys-Color etching
Titanium alloys-Color etching
Titanium alloys-Electropolishing
Titanium alloys-Electropolishing
Titanium alpha-Ti single crystal-Chemical polishing
Titanium and its alloys-Al-4Mo alloys
Titanium and its alloys-Chemical etching
Titanium and its alloys-Ti alloys. De-smut Ti, -13 V, -11Cr, -3Al alloys
Titanium and titanium alloys-Chemical etching
Titanium and titanium alloys-Chemical etching
Titanium and titanium alloys-Chemical etching
Titanium and titanium alloys-Chemical polish and etch. For most titanium alloys
Titanium and titanium alloys-Electropolishing
Titanium and titanium alloys-Electropolishing
Titanium and titanium alloys-For Ti-Si alloys
Titanium and titanium alloys-General purpose etch
Titanium and titanium alloys-General purpose etch. For Ti-3Al-8V-6Cr-4Mo-4Zr alloy
Titanium and titanium alloys-General purpose etch. For Ti-8Mn; aged Ti-13V-11Cr-3Al
Titanium and titanium alloys-General purpose etch. For Ti-Al-Zr and Ti-Si alloys
Titanium and titanium alloys-General purpose etch. For most titanium alloys
Titanium and titanium alloys-General purpose etch. For most titanium alloys
Titanium and titanium alloys-Nonstaining etch. For most titanium alloys
Titanium and titanium alloys-Removes stain. For most titanium alloys
Titanium and titanium alloys-Reveals alpha case. For most titanium alloys
Titanium and titanium alloys-Reveals hydrides. For unalloyed titanium
Titanium and titanium alloys-Reveals hydrides. For unalloyed titanium
Titanium and titanium alloys-Stains alpha, transformed beta. For alpha-beta Titanium alloys
Titanium boride (TiB2)-For revealing structure of TiB2
Titanium boride TiB2-Chemical etching
Titanium carbide (TiC) single crystal-Electrolytic polishing
Titanium carbide (TiC)-Electro thinning
Titanium carbide (TiC)-Electrolytic polishing and chemical etching
Titanium carbide (TiC)-Single crystal-Chemical and electrolytic etching
Titanium carbide (TiC)-TiC(0.97)
Titanium diboride (B-Ti(2))
Titanium diboride (B-Ti(2))-Chemical etching
Titanium diboride (B-Ti(2))-Chemical etching
Titanium diboride single crystals (B-Ti(2))-Chemical etching
Titanium dioxide (TiO2)-Chemical etching
Titanium nitride (TiN)-Molybdenum cermets (MoO3)-Chemical etching
Titanium oxide (Rutile-TiO2)-Chemical etching
Titanium silicide (TiSi2)-Chemical etching
Titanium specimens-Cathodic etching
Titanium specimens-Chemical etching
Titanium specimens-Chemical etching
Titanium specimens-Chemical etching
Titanium specimens-Chemical etching
Titanium specimens-Chemical etching
Titanium specimens-Chemical polishing
Titanium specimens-Chemical polishing
Titanium specimens-Chemical polishing
Titanium specimens-Chemical thinning
Titanium specimens-Differentiation of alpha and beta Ti
Titanium specimens-Electro polishing
Titanium specimens-Electro polishing
Titanium specimens-Electro thinning
Titanium specimens-Electro thinning
Titanium specimens-Electro thinning by Mirand-Saulnier technique
Titanium specimens-Electro thinning by window technique
Titanium specimens-Electro thinning in RTFE holder
Titanium specimens-Electrolytic etching
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing
Titanium specimens-Electrolytic polishing and chemical etching
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-For many Ti raw materials. Especially for Ti-Al-V alloys
Titanium specimens-Good general-purpose electrolyte
Titanium specimens-Iodide Ti
Titanium specimens-Most types of Ti and Ti alloys. Ti-Mn, Ti-V-Cr-Al alloys
Titanium specimens-One of the best electrolyte for universal use
Titanium specimens-Physical etching
Titanium specimens-Physical etching
Titanium specimens-Pure Ti and Ti base alloys
Titanium specimens-Sample preparation procedure
Titanium specimens-Thermal etching
Titanium specimens-Ti alloys
Titanium specimens-Ti and Ti alloys. Grain boundary etchant
Titanium specimens-Ti and Ti base alloys. Ti-Al-Mo alloys
Titanium specimens-Ti and Ti base alloys. Tint etching. Precipitates
Titanium specimens-Ti-Al-Sn and Ti-Al-Ni alloys
Titanium specimens-Ti. Ferro Ti. Ti-Al-V-Sn alloys
Titanium specimens-Welded seams
Titanium specimens-Zr, Ti, U, steels, superalloys
Titanium-Chemical polishing
Titanium-Electrolytic polishing
Titanium-Electrolytic polishing
Titanium-Electrolytic polishing
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti
Titanium-Ti - Remington B etch
Titanium-gallium alloys (Ti-Ti3Ga)-Chemical etching
Tl (0001) wafers-Chemical cleaning
Tl poly crystalline specimens-Chemical etching
Tl specimens-Chemical etching
Tl specimens-Chemical etching
Tl2Se3 and TlSe single crystal-Chemical polishing
TlBiTe2 single crystal n-type-Chemical polishing/etching
Tm single crystal specimens-Thermal etching
Tm-Ag alloys-Chemical etching
Tm-Au alloy-Chemical etching
Tm-Bi system-Chemical etching
Tm-Pd alloys (Approx. Tm3Pd4)-Chemical etching
To detect oxidation in steel
To detect oxidation in steel
Tool steels
Tool steels-Color etching. Colors ferrite grains. Reveals banded structures. Used in carbon and alloy steels
Tool steels-Color etching. Colors pearlite and hardened structures of unlloyed steels
Tool steels-Color etching. Colors the martensite in Fe-C alloys
Tool steels-Color etching. For Mn, Mn-C, Mn-Cr steels
Tool steels-Color etching. For carbon, alloy and Fe-Mn (5-18% Mn) steels
Tool steels-Color etching. For carbon, alloy and manganese steels
Tool steels-Color etching. For carbon, alloy and tool steels
Topaz-Al2(SiO4)(OH,F)2-Etching for defects (etch pits, etc.)
Tucker's etchant 1
Tucker's etchant 2
Tungsetn-W boride
Tungsten alloys-Electropolishing
Tungsten alloys-Electropolishing
Tungsten and tungsten alloys-Chemical etching
Tungsten and tungsten alloys-Chemical etching
Tungsten and tungsten alloys-Chemical etching
Tungsten and tungsten alloys-W-Co alloys with 10-70% W
Tungsten and tungsten alloys-W-Co alloys with 10-70% W
Tungsten and tungsten alloys-W-Co alloys with eutectic compostion (cca 46% W)
Tungsten samples-Mo, W and V
Tungsten samples-Mo, W, V, Nb, Ta and their alloys
Tungsten single crystal-Electrolytic polishing
Tungsten single crystal-Electrolytic polishing, chemical polishing
Tungsten specimens-Cathodic etching
Tungsten specimens-Chemical etching
Tungsten specimens-Chemical etching
Tungsten specimens-Chemical etching
Tungsten specimens-Chemo-mechanical polishing
Tungsten specimens-Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Tungsten specimens-Electric contact material
Tungsten specimens-Electro thinning
Tungsten specimens-Electro thinning
Tungsten specimens-Electro thinning by window technique
Tungsten specimens-Electrolytic polishing
Tungsten specimens-Electrolytic polishing
Tungsten specimens-Electrolytic polishing and etching
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Electropolishing
Tungsten specimens-Eutectic W-Co alloys
Tungsten specimens-For removing slip lines and twins
Tungsten specimens-For sub grain boundaries and slip lines
Tungsten specimens-Mo and Mo-Ni alloys. W and W alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-Mo, W and their alloys
Tungsten specimens-W and W base alloys
Tungsten specimens-W and W base alloys
Tungsten specimens-W and W base alloys. Mo and Mo base alloys
Tungsten specimens-W and W base alloys. Ta na Ta base alloys
Tungsten specimens-W-Co alloys containing 10-70% W
Tungsten, color etchant-Chemical etching
Tungsten-2.8 vol.% ThO2 alloy-Electro thinning
Tungsten-Electrolytic polishing
Tungsten-Electropolishing
Tungsten-Silicon alloys (WSi2)-Chemical etching
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-W
Tungsten-Wire-Electrolytic polishing
Tungsten-copper (W-Cu)-Electric contact material
Tungsten-nickel (W-Ni)-Electric contact material
Tungsten-rhenium-thoria system (O-Re-Th-W)-W-3% Re-2% ThO2
Type 300 maraging steel-Fe, 18.5% Ni, 8.75% Co, 4.9% Mo, 0.65% Ti, max. 0.03% C, 0.1% Al
Type 304 L stainless steel-Fe-0.03C-19Cr-10Ni-0/2Mn-0/1Si
Type 304 and 304L stainless steel-Fe-0.03/0.06C-18Cr-9/10Ni-1/1.2Mn
Type 304 stainless heat resisting steel-Fe-0.1C-18Cr-8.5Ni-1.4Mn-0.5Si
Type 304 stainless steel-Chemical etching
Type 304 stainless steel-Electro thinning
Type 304 stainless steel-Electrolytic etching
Type 304 stainless steel-Fe-0.07C-18.8Cr-9.4Ni-0.8Mn-0.65Si
Type 304 stainless steel-Fe-18.6Cr-9.5Ni-1.3Mn-0.35Mo-0.44Si-0.25Cu-0.04C
Type 304 stainless steel-Fe-18Cr-8.6Ni-1.2Mn-0.2Co-0.1Cu-0.1Mo-0.1W0-0.04C
Type 304 stainless steel-Jet electro polishing
Type 304 stainless steel-Jet thinning
Type 304 stainless steel-Twin jet electro thinning
Type 310 stainless steel-Fe-25.5Cr-20Ni-0.04C-0.7Si-0.4Mn
Type 316 stainless steel-Chemical etching
Type 316 stainless steel-Chemical etching
Type 316 stainless steel-Fe-0.02/0.04C-1.8/2.5Mn-17/18Cr-12/12.5Ni-2.25Mo-0.4/0.8Si
Type 316 stainless steel-Fe-16/17Cr-10/12Ni-2.2/2.5Mo-0.45/1.7Mn-0.2/0.4Si-0.04/0.07C
Type 4140 steel-0.4C-0.8Mn-1Cr-0.3Mo
Type 430 stainless steel-Fe-16Cr-0.06C-0.4Si-0.4Mn
Type 800 stainless steel-Fe-21.4Cr-33.2Ni-0.5Ti-0.5Si-0.6Mn-0.3Al-0.015C
Type AISI 316 stainless steel-Fe-18Cr-8Ni-2.5Mo
Type AISI 316 stainless steel-Twin jet electro polishing
Type I glass-70% SiO2 - 23% B2O3 - 7% Na2O
Type II glass-81% SiO2, 12.6% B2O3, 3.9% Na2O, 2.4% Al2O3
U alloy and 2% Zr
U alloys
U alloys
U alloys (U-N-Mo alloys)-Physical etching
U alloys - Picklesimer's color and anodizing solution
U alloys amd 10% Nb alloys
U alloys and 5% fission products
U alloys-Chemical etching
U and 5% fission products
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys
U and U alloys-Anodising etching solution
U and U alloys-Electrolytic etching
U and alloys
U and alloys
U and alloys
U and alloys
U beryllides and U-Zr and U-Nb alloys
U carbide
U silicides, U-Zr, U-Ti, U-Zr-Mo alloys
U specimens-Chemical cleaning
U specimens-Chemical cleaning
U specimens-Chemical polishing
U specimens-Chemical polishing
U specimens-Chemical polishing
U specimens-Electrolytic polishing
U specimens-Electrolytic polishing
U(C, N) specimens-Ceramic compunds
U(C, O) specimens-Ceramic compunds
U, Pu, Am-Chemical etching
U, Pu-Chemical etching
U-10Nb alloys-Chemical etching
U-2% Zr alloy-Sample preparation procedure
U-Al alloys
U-Al alloys-Chemical etching
U-Al alloys-Chemical etching and electrolytic etching
U-Al alloys-For alloys with very low uranium content
U-Al-Ni system-UAl2-NiAl section
U-Be alloys, U-Zr and U-Nb alloys-Chemical etching
U-C alloys
U-C alloys-Electrolytic etching
U-Co alloys-Physical etching
U-Co-Al alloys-UCo2-UAl3 section
U-Cu system-Electrolytic polishing
U-Fe alloys-Chemical and electrolytic etching
U-Fe-C alloys-Electrolytic polishing
U-Mn system-Electro polishing
U-Mo alloy (16 wt.% Mo)-Electrolytic etching
U-Mo alloy (5 at.% Mo)-Sample preparation
U-Mo alloys-Electro thinning by Mirand-Saulnier technique
U-Mo alloys-Electrolytic etching and polishing
U-Mo alloys-Physical etching
U-Mo and U-Zr alloys
U-Mo and U-Zr alloys with stabilized gamma phase-Chemical etching
U-Mo-Ti alloys
U-N-P alloys-UN-UP pseudobinary
U-Nb alloys
U-Nb alloys-Cathodic etching
U-Nb alloys-Sample preparation
U-Nb-H alloys-Chemical etching
U-Nb-Mo alloys-Cathodic etching
U-Nb-Zr alloy-Alloy with 7.5 Nb-2.5Zr
U-Ni-Zr alloy (7.5% U, 2.5% Zr)-Electrolytic polishing and etching
U-Pd alloys (Approx. 55 at.% Pd)-Chemical etching
U-Pu alloys-Electrolytic polishing
U-Re alloys-Chemical and electrolytic etching
U-Si alloys
U-Si alloys-Cathodic etching
U-Ti alloys
U-Zr alloy-Electrolytic polishing
U-Zr alloys
U-Zr alloys (Zr rich)-Electrolytic polishing
U-Zr alloys - Murakami's reagent
U-Zr alloys, U-Fe-Co alloys, U-Al2-U3Si3 alloys-Chemical etching
U-Zr alloys-Chemical etching
U-Zr alloys-Electro polishing
U2C3+UC2 specimens-Ceramic compunds
U3N4 specimens-Chemical etching
U3Si alloys-Chemical etching
U4O9-Chemical etching
UB4, UB2 and UB12 specimens-Chemical etching
UB4, UB2, and UB specimens-Chemical etching
UC
UC (001) wafers-Electrolytic jet thinning
UC single crystal wafers-Chemical etching
UC specimens-Chemical etching
UC+PuN specimens-Ceramic compunds
UC+PuN specimens-Ceramic compunds
UC+ZrC-Ceramic compunds
UC+ZrC-Ceramic compunds
UC, U(C,O) x U(C,N), UC-ZrC mixtures, UC-UC2, UC2-U2C3 mixtures,(U,Pu)C C-rich-Chemical etching
UC2+UC-Ceramic compunds
UCe2 specimen-Chemical polishing
UCo2 specimen-Chemical polishing
UN (001) wafers-Electrolytic jet thinning
UN+U(N, O)+U2N3-Ceramic compunds
UN+U2N3-Ceramic compunds
UN-PuN, UO2-PuO2 and irradiated UO2-PuO2 alloys
UNi2 specimen-Chemical polishing
UO2
UO2
UO2
UO2 + ZrO2-Chemical etching
UO2 and UO2CeO2
UO2 specimens-Chemical etching
UO2 specimens-Chemical etching
UO2 specimens-Electrolytic polishing
UO2 x Th(x)U(y)O2, PuO2 cast, PuO2 (gamma, sintered)-Chemical ecthing
UO2, U3Si
UO2, UO2-CeO2, UO2-U4O9, and UO2-PuO2 mixtures-Chemical ecthing
UO2, UO2CeO2
UO2, carbide-coated graphite, pyrolitic graphite
UO2-Electrolytic etching
UO2-PuO2 mixtures-Chemical ecthing
UP-Chemical etching
UPt3 specimen-Chemical polishing
US (001) wafers-Electrolytic jet thinning
US specimens-Chemical etching
US-Chemical etching
UTi single crystal specimens-Electrolytic polishing
Udimet 500 alloy-Ni-15/20Cr-13/20Co-3/5Mo-2.5/3.25Al-0/4Fe
Udimet 700 alloy-Ni-18.5Co-13Cr-3.5Ti-4.3Al-5.3Mo-0.08C-0.03B
Udimet 700 and Rene 41
Udimet 700-Chemical etching
Udimet 700-Chemical etching
Udimet 700-Electro polishing, chemical etching
Udimet 700-Stain etch for inclusions
Unalloyed and low-alloy steels, martensitic and bainitic microstructures, ferritic Cr steels, manganese steels, soldered joints with brass solder-Chemical etching
Unalloyed steels-Electropolishing
Unalloyed steels-Electropolishing
Unalloyed steels-Electropolishing
Unalloyed steels-Electropolishing
Untempered high-Si steels
Uranium alloys-Color etching
Uranium alloys-Color etching
Uranium alloys-Color etching
Uranium and uranium alloys-Electrolytic etching
Uranium carbide (UC)-Chemical etching
Uranium carbide (UC)-Electro polishing
Uranium carbide (UC)-Electro thinning
Uranium carbide (UC)-Electrolytic polishing and etching
Uranium carbide (UC)-Physical etching
Uranium carbide (UC)-zirconium carbide (ZrC) system-Chemical etching
Uranium carbide (UC)-zirconium carbide (ZrC) system-Chemical etching
Uranium carbide-lanthanum alloys
Uranium carbide-neodymium alloys (C-Nd-U)
Uranium carbides (UC, U2C3, UC2)-Chemical etching
Uranium dioxide (UO2) and higher oxides-Chemical etching
Uranium dioxide (UO2) single crystals-Used mainly for (111) faces but can be used for (100) faces
Uranium dioxide (UO2)-A suitable etching method for determining grain size
Uranium dioxide (UO2)-Cathodic etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical etching
Uranium dioxide (UO2)-Chemical thinning
Uranium dioxide (UO2)-Electro thinning
Uranium dioxide (UO2, irradiated)-Chemical etching
Uranium dioxide (UO2, irradiated)-Chemical etching
Uranium dioxide (UO2, irradiated)-Chemical etching
Uranium dioxide-carbon-nitrogen system-Chemical etching
Uranium dioxide-thoria system (10% UO4)-Chemical etching
Uranium nitride (UN)-Chemical etching
Uranium nitride (UN)-Chemnical etching
Uranium nitride (UN)-Electrolytic polishing
Uranium oxide (U3O8)-Chemical etching
Uranium oxide (U4O9)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Chemical etching
Uranium oxide (UO2)-Electrolytic etching
Uranium oxide (UO2)-Electropolishing
Uranium phosphide-Chemical etching
Uranium phosphide-Chemical etching
Uranium silicon alloys-Chemical etching
Uranium silicon alloys-Distinguishes U3Si2, U3Si , alpha U and UC
Uranium silicon alloys-Distinguishes U3Si2, U3Si , alpha U and UC
Uranium silicon alloys-For U2Si2, U3Si, alpha U and UC
Uranium specimens-Cathodic etching
Uranium specimens-Cathodic etching
Uranium specimens-Cathodic etching
Uranium specimens-Chemical thinning and electrolytic polishing
Uranium specimens-Electro polishing
Uranium specimens-Electro polishing
Uranium specimens-Electro polishing
Uranium specimens-Electro thinning
Uranium specimens-Electro thinning
Uranium specimens-Electro thinning
Uranium specimens-Electro thinning
Uranium specimens-Electro thinning
Uranium specimens-Electro thinning by Bollmann technique
Uranium specimens-Electro thinning by Mirand-Saulnier technique
Uranium specimens-Electro thinning in PTFE holder
Uranium specimens-Electrolytic etching
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing
Uranium specimens-Electrolytic polishing and etching
Uranium specimens-Electropolishing
Uranium specimens-Electropolishing
Uranium specimens-Electropolishing
Uranium specimens-Electropolishing
Uranium specimens-Electropolishing
Uranium specimens-Electropolishing
Uranium specimens-Gamma phase stablized U-Mo and U-Zr alloys
Uranium specimens-Good general-purpose electrolyte
Uranium specimens-One of the best electrolyte for universal use
Uranium specimens-Pure U and Th
Uranium specimens-U alloys
Uranium specimens-U and U alloys
Uranium specimens-U and most U alloys
Uranium specimens-U and most U alloys
Uranium specimens-U silicides
Uranium specimens-U-Al alloys
Uranium specimens-U-Be alloys. U-beryllides, U-Zr, and U-Nb alloys
Uranium specimens-Zr, Ti, U, steels, superalloys
Uranium sulphide (US)-Chemical etching
Uranium-U
Uranium-U
Uranium-U
Uranium-U
Uranium-U
Uranium-U
Uranium-U
Uranium-gallium alloys (U-Ga)-Chemical etching
Uranium-molybdenum alloys-Chemical etching
Uranium-osmium alloys (U-Os)-Chemical and electrolytic etching
Used to reveal the eutectic cell number in gray cast irons
Used to reveal the eutectic cell number in gray cast irons
V alloys
V alloys
V and V alloys
V and V alloys
V and V alloys
V and V alloys
V and V-O alloys - Murakami's reagent
V and alloys
V and alloys
V modified AISI 4330 steel-Fe-0.32C-0.28Si-0.61Mn-2.24Ni-0.43Cr-0.6Mn-0.1V
V poly-wire-Chemical etching
V single crystal and polycrystalline spheres-Thermal forming
V specimens-Chemical etching
V specimens-Chemical etching
V specimens-Chemical ething
V specimens-Chemical polishing/etching
V specimens-Electrolytic polishing
V specimens-Electrolytic polishing/thinning
V thin films evaporated on silicon substrates-Chemical etching
V-C alloys-Electrolytic polishing and etching
V-C system-Electro thinning
V-C system-Etching for etch pits
V-C system-VC(0.76) single crystals
V-Ga, V-Si, V-Al alloys
V-H system-Chemical polishing
V-H system-Chemical thinning
V-Ni alloys-Chemical etching
V-O alloys
V-O alloys (< 10 at.% O)-Electrolytic polishing
V-O system (V to VO section)-Chemical etching
V-O system-Electrolytic and chemical polishing, chemical etching
V-Pt alloys-Electrolytic etching
V-Zr alloys-Chemical etching
V2A etchant
V3Ge and V3Si-Chemical etching
V3Si (111) and (100) wafers-Chemical polishing
V3Si (111) wafers-Electrolytic polishing
V3Si (111), (100) wafers-Dislocation etching
V3Si and V3Ge-Chemical polishing
V3Si specimens-Chemical cleaning
VAl3 deposited on silicon, (001) substrates-Chemical cleaning/etching
VB2 and VB specimens-Chemical etching
VB2 and VB specimens-Chemical etching
VB2 and VB specimens-Chemical etching
VBr2 single crystals-Chemical polishing/etching
VC
VC (1OO) single crystal and polyerystalline specimens-Chemical etching
VC (1OO) single crystal ingots-Electrolytic etching
VC specimens-Molten flux etching
VC-Co system-Chemical etching
VGa single crystal filaments-Chemical etching
VSi2 thin films
Vanadium alloys-For etching V-Ti3, V-Ti15, V-Ti 20--Nb10 alloys
Vanadium carbide (VC)-Dislocation etching
Vanadium carbide (VC0.84)-Chemical etching
Vanadium oxide-lanthanum oxide system-V2O3-La2O3 system
Vanadium oxide-phosphoric oxide glass (VO2-V2O5-P2O5)-Chemical etching
Vanadium oxide-phosphoric oxide-boric oxide glass-VO2 10-14 mol.%/V2O5 69-73%, P2O5 12-16%, B2O3 up to 9%
Vanadium samples-Chemical etching
Vanadium samples-Mo, W and V
Vanadium silicide (V3Si)-Electrolytic polishing
Vanadium single crystal-Electrolytic polishing and etching
Vanadium specimens-Chemical etching
Vanadium specimens-Chemical etching
Vanadium specimens-Chemical polishing
Vanadium specimens-Chemical polishing
Vanadium specimens-Chemical polishing
Vanadium specimens-Cr and Cr base alloys. Fe-Cr alloys and V
Vanadium specimens-Electro polishing
Vanadium specimens-Electro thinning
Vanadium specimens-Electro thinning and jet etching
Vanadium specimens-Electro-mechanical polishing
Vanadium specimens-Electrolytic etching
Vanadium specimens-Electrolytic polishing
Vanadium specimens-Electrolytic polishing
Vanadium specimens-Electrolytic polishing
Vanadium specimens-Electrolytic polishing
Vanadium specimens-Electrolytic polishing
Vanadium specimens-Electrolytic polishing
Vanadium specimens-Electropolishing
Vanadium specimens-Electropolishing
Vanadium specimens-Electropolishing
Vanadium specimens-Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys
Vanadium specimens-V and V base alloys
Vanadium specimens-V and V base alloys
Vanadium-V
Vanadium-V
Vanadium-V
Vanadium-gallium alloys (Approx.V3Ga)
Vanadium-gallium alloys (Approx.V3Ga)-Etches V6Ga5 and V solid solution, but leaves V3Ga
Vanadium-gallium alloys (V3Ga)-Electrolytic thinning
Vanadium-nitrogen system (V-N)-Chemical etching
Vanadium-nitrogen system (V-N)-Electrolytic and chemical polishing
Vanadium-nitrogen system (V-N)-Electrolytic polishing
Vanadium-technetium alloys (V-Tc)-Electrolytic polishing and etching
Vapour deposited silicon carbide (SiC)-Thermal etching
Vermilyea's anodizing solution for Ta
Very pure Al
Vilella
Vilella's reagent
Villela and Beregekoff's etchant
Vitallium alloy-Vitallium is a pure cobalt chromium alloy free of nickel and beryllium
Vitallium alloys-Electrolytic etching
Vycor 7913 glass-Chemical etching
Vycor 7913 glass-Chemical etching
Vycor 7913 glass-Chemical etching
W (001) wafers and other orientations-Acid thinning
W (001) wafers and single crystals-Electrolytic polishing
W (001) wafers-Chemical etching
W (111) wafers as deposited thin film-Ionized gas etching
W and W alloys
W and W alloys
W and W alloys
W and W alloys
W and W alloys - Murakami's reagent
W and alloys
W and alloys
W and alloys
W and alloys
W and alloys
W and alloys
W and alloys
W and lean alloys - Modified Murakami's reagent
W discs of pressed powder-Chemical cleaning
W single crystal wafers-Chemical etching
W specimens and W thin film deposits-Chemical etching
W specimens and parts-Chemical cleaning
W specimens as wire, W single crystal wafers-Gas, forming
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens used for electroplating-Chemical polishing
W specimens-Alcohol cleaning
W specimens-Chemical cleaning
W specimens-Chemical cleaning
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical etching
W specimens-Chemical polishing
W specimens-Chmical cleaning or electro polishing
W specimens-Electrolytic polishing
W specimens-Keytone cleaning
W thin film evaporated on silicon (100) substrates-Ionized gas etching
W thin film evaporation in vacuum systems-Chemical etching
W thin films deposited by sputtering-Ionized gas entrapment
W thin films-Chemical etching
W thin films-Chemical etching
W thin films-Chemical etching
W thin films-Ionized gas etching
W wire 0.015-0.025 diameter-Chemical cleaning
W wires and whiskers-Electrolytic polishing
W, V, Nb, Ta
W-10% Co specimen-For electron and optical microscopy
W-3% Re alloy
W-C system-Chemical etching
W-Chemical-Mechanical polishing
W-Co alloys
W-Co alloys ith 10-70% W-Chemical etching
W-Co eutectic alloys - Alkaline sodium picrate
W-Electrolytic lapping
W-Hf alloys
W-Hf alloys (< 3% Hf)-Chemical etching
W-Hf-N alloys alloys-< 3% Hf, nitrided
W-Hf-Re alloys-Chemical etching
W-Hf-Re-N alloys alloys-< 2% Hf, < 25% Re, nitrided
W-Mo-Hf-Re alloys-< 20% Mo, < 2% Hf, < 30% Re
W-Mo-Hf-Re-N alloys-< 20% Mo, < 2% Hf, < 30% Re, nitrided
W-Mo-Os alloys-Chemical etching
W-Ni-Fe alloys-Electro polishing
W-Re alloy (23.4% Re + 0.3% HfC)-Electro thinning
W-Re alloy (25% Re)-Electrolytic polishing and chemical etching
W-Re alloy (3% Re)-Chemical etching
W-Re alloys (5, 25% Re)-Electrolytic polishing
W-Re alloys (9, 24% Re)-Electro thinning
W-Re-Hf-C alloys-4 at.% Re, 0.2-0.8 at.% Hf, up to 1.35 at.% C
W-Sc alloys-Chemical etching
W-Ta alloy (3% Ta)-Electro thinning
W-Th alloys
W-Th alloys
W-Ti-B alloys-Chemical etching
W-Y alloys-Chemical etching
W2O3(PO4)2 as an amorphous glassy thin film-Chemical etching
WB2 and other tungsten borides-Chemical etching
WB2 and other tungsten borides-Chemical etching
WB2, W2B2, W2B5-Chemical etching
WC single crystal specimens-Thermal etching
WC specimens-Chemical cleaning
WC, Mo2C, TiC, or Ni in sintered carbides
WC, TiC, TaC, and Co in sintered carbides
WC-6% Co alloy-For revealing the microstructure of the WC-Co material
WC-Chemical etching
WC-Chemical etching
WC-Chemical etching
WC-Co and complex sintered carbides
WC-Co or Ni matrix with Mo2C, TiC, WC2, TaC-Chemical etching
WC-Co sintered carbides
WC-Co system-Electro thinning
WC-Co, Eta phase appears multicolored; Co is white, WC-TiC-TaC-Co, WC-NbC-Co-Chemical etching
WC-Co, WC-TiC-TaC-Co-Chemical etching
WC-Co, reveals Co-Electrolytic etching
WC-Co-Chemical etching
WC-Co-Chemical etching
WC-Co-Chemical etching
WC-Co. Good etchant for WC crystals-Electrolytic etching
WC-Co. Suited for SEM examination-Electrolytic etching
WC-Mo2C-TiC-Ni-Chemical etching
WC-Ti-Ta, NbC-Co-Physical etching
WC-TiC-NbC-Co-Chemical etching
WO(x) (x=3) thin film
WO2 oxide specimens-Chemical etching
WO3 oxide specimens-Chemical etching
WO3 thin film deposited on 2100 A SnO2 on a glass substrate-Chemical etching
WRh (2%) and (6%), (100) wafers-Electrolytic polishing
WS2 single crystal specimens-Chemical polishing
WSe2 single crystal specimens-Chemical polishing
WSe2 single crystal specimens-Solvent cleaning
WSi2 thin films
WSi2 thin films grown on silicon substrates-Ionized gas etching
WSi2 thin films-Chemical etching
Walker's etchant
Walker's reagent
Wallner's etchant
Warke amd McCall's etch
Waspaloy-59.2Ni-13.2Co-18.8Cr-4.1Mo-1.2Al-3.0Ti-0.04C by weight
Waspaloy-Twin jet polishing mehod
Wassermann's reagent
Wassermann's reagent
Waterbury's reagent
Wazau's etch
Weck's etchant
Weck's tint etch for alpha Ti alloys-Chemical etching
Weck's tint etch for alpha Ti-Chemical etching
Weld etch inspection of 4130 steel-Chemical etching
Westinghouse's silver etchant WAG
White cast irons-Colour etchant
Whiteley's etch
Williams's solution
Worner and Worner's etchant
Wright's etchant
Wrought Fe-Ni-Cr heat resisting alloys-AISI 660, general structure
Wrought Fe-Ni-Cr heat resisting alloys-AISI 660, general structure
Wrought Fe-Ni-Cr heat resisting alloys-AISI 660, general structure; may stain or pit
Wrought Fe-Ni-Cr heat resisting alloys-Hastelloy C, general structure
Wrought Fe-Ni-Cr heat resisting alloys-Hastelloy W, general structure
Wrought Fe-Ni-Cr heat resisting alloys-Hastelloy X (AISI 680), general structure
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 800, carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 800, general structure; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 800, general structure; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 800, grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 800, preferential attack at grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 825, general structure
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 825, general structure; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 825, grain boundaries; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Incoloy 825, grain boundaries; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 600 and 601, excellent for revealing carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 600 and 601. General structure
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 600 and 601. General structure; carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 600 and 601. General structure; grain boundaries; carbide
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 600 and 601. Grain boundary contrast
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 625
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 625, general structure
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 625, general structure; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 625. Grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 625. Grain boundary films
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 706 and alloy 718
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 706 and alloy 718. Carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 706 and alloy 718. General structure; microsegregation
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 706 and alloy 718. General structure; precipitate phases
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 706 and alloy 718. Good for general structure and phase outline; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-Inconel 706 and alloy 718. Grain boundary films
Wrought Fe-Ni-Cr heat resisting alloys-Inconel X-750 (AISI 688), general structure
Wrought Fe-Ni-Cr heat resisting alloys-Inconel X-750 (AISI 688). Excellent for showing details of overaged gamma prime
Wrought Fe-Ni-Cr heat resisting alloys-Inconel X-750 (AISI 688). General structure; microsegregation
Wrought Fe-Ni-Cr heat resisting alloys-Inconel X-750 (AISI 688). Good for revealing grain boundaries and carbide particles
Wrought Fe-Ni-Cr heat resisting alloys-Inconel X-750 (AISI 688). Grain boundaries; carbide
Wrought Fe-Ni-Cr heat resisting alloys-RA 330, for etch pitting
Wrought Fe-Ni-Cr heat resisting alloys-RA 330, general structure; precipitates
Wrought Fe-Ni-Cr heat resisting alloys-U-700 (AISI 687). General structure
Wrought Fe-Ni-Cr heat resisting alloys-U-700 (AISI 687). General structure; grain boundaries
Wrought Fe-Ni-Cr heat resisting alloys-U-700 (AISI 687). Good for contrast
Wrought Fe-Ni-Cr heat resisting alloys-Waspaloy (AISI 685). General structure
Wrought Fe-Ni-Cr heat resisting alloys-Waspaloy (AISI 685). General structure
Wrought Fe-Ni-Cr heat resisting alloys-Waspaloy (AISI 685). General structure
Wrought Mg alloys
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure
Wrought stainless steels-General structure, carbides
Wrought stainless steels-General structure, sigma phase
Wrought stainless steels-General structure, sigma phase
Wrought stainless steels-General structure, sigma phase
X22CrMoV12.1 steel
X40 or No. 31 alloys-Chemical etching
X40 or No. 31 alloys-Chemical etching
X41CrMoV5-1 steel-Chemical etching
X41CrMoV5-1 steel-Chemical etching
X5CrNiTi26.6 steel-Chemical and electrolytic etching
Y single crystal specimens-Chemical etching
Y specimens-Chemical etching
Y-Ag alloys-Chemical etching
Y-Al alloys-Electro polishing
Y-Al-C alloys
Y-Bi system-Chemical etching
Y-C system-Electrolytic polishing
Y-Cd system-Chemical etching
Y-Cd-Zn alloys-Chemcial etching
Y-Fe-Al garnet (Y4Fe4AlO12)-Chemical etching
Y-Gd-Tm-Ga-Fe garnet-Chemical etching for etch pits
Y-Ge system-Chemical ecthing
Y-Hf alloy-Chemical etching
Y-Mn alloys-Chemical etching
Y-N system-Up to 5 at.% N
Y-O system (up to 15. at.% O2)-Chemical ecthing
Y-Pb system-Chemical etching
Y-Pd alloys (approx. Y3Pd4)-Chemical etching
Y-Sb alloys-Pysical etching
Y-Ta alloys-Chemical etching
Y-Ta alloys-Chemical etching
Y-Ti alloy-Chemical etching
Y-Ti, Y-Zr and Y-Hf alloys - M-etch
Y-V alloys-Chemical etching
Y-Zr alloy-Chemical etching
Y2(CoM)17 single crystal ingots-Chemical polishing
Y2Ga7O12 single crystals-Chemical cleaning
Y2O3 + ZrO2 specimens-Chemical etching
Y2O3 x ThO2
Y2O5
Y3Al5O12 (YAG) (110) wafers-Chemical etching
Y3Fe5O12
Y3Fe5O12 (0001) (YIG) wafers-Chemical etching
Y3Fe5O12 (110) wafers-Chemical etching
Y3Fe5O12 (111) wafers-Chemical etching
Y3Fe5O12 (YIG) single crystal spheres-Abrasive polishing
Y3Fe5O12 (YIG) single crystal-Chemical cleaning
Y3Fe5O12 and Y3Fe4AlO12
Y5Fe5O12 (YIG) (0001) wafer
YBCO superconducting material-Sample preparation
YBa2Cu3O7-For observation of grain boundaries, twain boundaries and cracks
Yb single crystal specimens-Chemical etching
Yb-Ag alloys-Chemical etching
Yb-Ag alloys-Chemical etching
Yb-Al alloys-Polishing
Yb-Au alloys-Chemical etching
Yb-Bi system-Chemical etching
Yb-In alloys-Chemical and eltrolytical etching
Yb-Mg system-Chemical etching
Yb-Ni system-Chemical etching
Yb-Pb system-Chemical etching
Yb-Pd alloys (Approx. Yb3Pd4)-Chemical etching
Yb-Zn system-Chemical etching
Yittria dispersed Nichrome (Cr-Ni-O-Y)-Ni-20Cr-0.2/1.1Y2O3
Young's etchant
Ytterbium-Electro thinning
Ytterbium-Electrolytic polishing
Yttrium iron garnet (Y3Fe5O12)-Chemical ecthing
Yttrium iron garnet (Y3Fe5O12)-Chemical etching
Yttrium oxide (Y2O3)-Chemical etching
Yttrium oxide (Y2O3)-Dislocation etching
Yttrium silicate (Y5Si3Ox)-Chemical etching
Yttrium-Electrolytic polishing
Yttrium-Electrolytic polishing
Yttrium-Y
Yttrium-aluminium garnets (Nd doped)-Chemical polishing
Yttrium-aluminium garnets-Chemical etching
Yttrium-aluminium garnets-Chemical polishing
Yttrium-niobium (Y-Nb) alloys-Chemical etching
Yttrium-niobium (Y-Nb) alloys-Chemical etching
Yttrium-niobium (Y-Nb) alloys-Nb rich alloys
Yttrium-ortoaluminate (YAlO2)-Chemical etching
ZK60A alloy
ZK60A alloy
Zicronium carbide (ZrC)-Etch pits on (100) planes
Zinc alloys-Electropolishing
Zinc and its alloys-Cu free zinc alloys. Grain contrast
Zinc and its alloys-Zn alloys containing Cu. Grain structure
Zinc and zinc alloys-Chemical etching
Zinc and zinc alloys-Chemical etching
Zinc and zinc alloys-Chemical etching
Zinc and zinc alloys-Chemical etching
Zinc and zinc alloys-Chemical etching
Zinc and zinc alloys-For general macroetching
Zinc and zinc alloys-For rolled Zn-Cu alloys
Zinc and zinc alloys-For zinc and zinc die-casting aloys; alloys AC41A or AG40A
Zinc and zinc alloys-To reveal the microstructure
Zinc and zinc alloys-To reveal the microstructure in alloys of zinc with metals of the iron group
Zinc oxide (ZnO)-Removal of surface damage with above solution
Zinc oxide single crystal (ZnO)-Chemical polishing and etching
Zinc oxide-bismuth oxide-ZnO x Bi2O3
Zinc oxide-bismuth oxide-antimony oxide-tin oxide-5% Sb2O3, 1% Bi2O3, 1% SnO2
Zinc oxide-bismuth oxide=Chemical etching
Zinc oxide-lithium oxide system (ZnO-1 at.% Li2O)-Chemical etching
Zinc selenide (ZnSe)-Chemical etching
Zinc selenide (ZnSe)-Chemical polishing
Zinc selenide (ZnSe)-Chemical polishing
Zinc selenide (ZnSe)-Chemical polishing
Zinc selenide (ZnSe)-Etchant for zinc selenide single crystals
Zinc single crystal-Sample preparation procedure
Zinc specimens-A cellular structure is shown in Zn single crystals by etching in this solution
Zinc specimens-An extremely useful electrolyte for certain applications, but dangerous
Zinc specimens-Chemical etching
Zinc specimens-Chemical etching
Zinc specimens-Chemical etching
Zinc specimens-Chemical polishing
Zinc specimens-Chemical polishing
Zinc specimens-Chemical polishing
Zinc specimens-Chemical polishing and etching
Zinc specimens-Chemical polishing and etching
Zinc specimens-Electro polishing
Zinc specimens-Electro thinning
Zinc specimens-Electro thinning by window technique
Zinc specimens-Electro thinning by window technique
Zinc specimens-Electrolytic polishing
Zinc specimens-Electrolytic polishing
Zinc specimens-Electrolytic polishing
Zinc specimens-Electrolytic polishing
Zinc specimens-Electrolytic polishing
Zinc specimens-Electrolytic polishing
Zinc specimens-Electropolishing
Zinc specimens-Electropolishing
Zinc specimens-Electropolishing
Zinc specimens-Electropolishing
Zinc specimens-Electropolishing
Zinc specimens-Electropolishing
Zinc specimens-Electropolishing
Zinc specimens-Etch pits etching
Zinc specimens-Fe, Pb, Mg, Cu, and Ni-Zn alloys
Zinc specimens-Fiber structure in extruded Zn alloys
Zinc specimens-For most types of Zn and Zn alloys. Especially for rolled Zn containing Pb and Zn-Cu alloys
Zinc specimens-Ion etching
Zinc specimens-Physical etching
Zinc specimens-Pure Zn. Zn alloys with Cu. Cast materials
Zinc specimens-Pure and low alloy Zn
Zinc specimens-Technically pure Zn. Zn-Co and Zn-Cu alloys. Generally for low alloy Zn
Zinc specimens-Tint etching of Zn and low alloy Zn
Zinc specimens-Zn alloys containing Cu
Zinc specimens-Zn alloys with metals of the iron group. Zn platings
Zinc specimens-Zn alloys with much nobler constituents, for example, Cu, Ag, Au
Zinc specimens-Zn and Zn rich alloys. Zn-Cu-Al alloys
Zinc specimens-Zn-Cu alloys to distinguish between gamma and epsilon phase
Zinc specimens-Zn-Fe layers of galvanized steel or ferrous materials
Zinc sulphide (ZnS)-Chemical etching
Zinc sulphide (ZnS)-Chemical polishing and etching
Zinc telluride (ZnTe)-Chemical etching
Zinc telluride (ZnTe)-Chemical polishing and etching
Zinc-Chemical polishing
Zinc-Chemical polishing
Zinc-Electrolytic polishing
Zinc-Electrolytic polishing
Zinc-Zn
Zinc-Zn
Zinc-Zn
Zinc-Zn
Zinc-Zn
Zinc-Zn
Zinc-Zn
Zinc-Zn
Zinc-Zn (99.99%)
Zinc-Zn (dilute alloys)
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zinc-aluminium-copper alloys (Zn-Al-Cu)-Ion etching
Zircalloy-2, Hf
Zircalloy-2, Hf
Zircalloy-4
Zircaloy
Zircaloy 2 (Zr-Sn alloy)-Electrolytic etching
Zircaloy 4 (Zr-1.2/1.7% Sn)-Chemical polishing
Zircaloy 4-Zirconia system-Zr (1.2-1.7% Sn)-ZrO2 (O2 up to 2%)
Zircaloy 4-Zr-1.2/1.7Sn-0.18/0.24Fe-0.07/0.13Cr
Zircaloy 4-Zr-1.4Sn-0.2Fe-0.1C
Zircaloy with precipitates-Anodizing
Zircaloy-2 and Hf
Zircaloy-2 and Hf
Zircaloy-2, Hf
Zircaloy-4
Zirconia (ZrO2)-Chemical etching
Zirconia ZrO3 (CaO stabilised)-Chemical etching
Zirconia-scandia system (ZrO2-Sc2O3)-Chemical etching
Zirconium and alloys-Chemical etching
Zirconium and zirconium alloys-Suitable for zirconium and Zircalloy II
Zirconium and zirconium alloys-Suitable for zirocnium and Zircalloy II
Zirconium boride
Zirconium boride ZrB2-Chemical etching
Zirconium diboride single crystals-Electro thinning
Zirconium diboride-Chemical etching
Zirconium diboride-Chemical etching
Zirconium dioxide ZrO2-Etching
Zirconium hydride phases
Zirconium nitride (ZrN)-ZrN-ZrN(0.55)
Zirconium oxide (ZrO2)-Chemical etching
Zirconium oxide (ZrO2)-Chemical etching
Zirconium oxide (ZrO2)-Chemical etching
Zirconium oxide (ZrO2)-Etching for microstructure
Zirconium oxide (ZrO2)-Physical etching
Zirconium oxide (ZrO2)-Physical etching
Zirconium specimens-Alpha-Zr
Zirconium specimens-Cathodic etching
Zirconium specimens-Cathodic etching
Zirconium specimens-Chemical etching
Zirconium specimens-Chemical etching
Zirconium specimens-Chemical etching
Zirconium specimens-Chemical machining
Zirconium specimens-Chemical polishing
Zirconium specimens-Chemical polishing
Zirconium specimens-Electro polishing
Zirconium specimens-Electro polishing
Zirconium specimens-Electro polishing
Zirconium specimens-Electro thinning
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electrolytic polishing
Zirconium specimens-Electropolishing
Zirconium specimens-Electropolishing
Zirconium specimens-Electropolishing
Zirconium specimens-Electropolishing
Zirconium specimens-Electropolishing
Zirconium specimens-Good general-purpose electrolyte
Zirconium specimens-Jet electro thinning
Zirconium specimens-One of the best electrolyte for universal use
Zirconium specimens-Pure and low alloy Hf and Zr for observation in polarized light. Zr-U, Zr-Al, Hf-Re alloys
Zirconium specimens-Universal electrolyte
Zirconium specimens-Zicaloy-2 and Hf
Zirconium specimens-Zr and Hf and their alloys with small additional constituents
Zirconium specimens-Zr and Hf base alloys. Zr-Nb alloys
Zirconium specimens-Zr and its alloys
Zirconium specimens-Zr anf Hf and their alloys with high additional alloying constituents
Zirconium specimens-Zr, Zr-Be, Zr-H, and Zr-Nb alloys, Zircaloy
Zirconium specimens-Zr-Mg, Zr-Mo, Zr-Sn, Zr-U, Zr-B, Zr-Fe, Zr-Ni alloys
Zirconium specimens-Zr-Th, Zr-Sn, Zr-Nb, Zr-Cu, Zr-Si, Zr-Ni alloys
Zirconium, polish and etch simultaneously-Electrolytic polishing
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-Zr
Zirconium-thorium-oxygen system (Zr-ThO2, Zr-Th x ThO2)-Chemical polishing
Zirconium-yttrium-oxygen system (Zr-Y2O3)-Chemical polishing
Zn (0001) Cleaved wafers
Zn (0001) freshly cleaved surface-Acid, defect
Zn (0001) platelets-Chemical cleaning
Zn (0001) single crystal wafers-Metal decoration
Zn (0001) specimens-Electrolytic polishing
Zn (0001) wafers and cylinders-Chemical etching-P-2 etchant
Zn (0001) wafers and cylinders-Chemical etching-P-3 etchant
Zn (0001) wafers and ingots-Chemical polishing
Zn (0001) wafers-Acid cutting
Zn (0001) wafers-Chemical etching
Zn (0001) wafers-Chemical etching
Zn (0001) wafers-Chemical etching-E etchant
Zn (0001) wafers-Chemical etching-P-l etchant
Zn (0001) wafers-Chemical polishing/etching
Zn (0001) wafers-Zn (0001) wafers used in an etch pit study
Zn alloy single crystal platelets-Chemical polishing
Zn alloys
Zn alloys (Cu-free)
Zn alloys (with Cu) - Palmerton etch
Zn and Cu specimens-Ionized gas etching
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and Zn alloys
Zn and alloys
Zn and lean alloys
Zn and lean alloys - Klemm's I reagent
Zn cylinder with (10T0) prism orientation-Chemical etching
Zn die-casting alloys - Modified Palmerton reagent
Zn diffused into GaAs wafers-Chemical etching
Zn diffused into InSb, (100), n-type wafers-Chemical etching
Zn pellets-Chemical cleaning
Zn phosphors-Solution used as a general removal etch
Zn phosphors-Solution used as a general removal etch
Zn single crystal specimens-Acid, cutting
Zn single crystal specimens-Dislocation etching
Zn single crystal wafers-Zn single crystal wafers acid-saw cut using a braided SST wire and nitric acid
Zn single crystal-Chemical etching
Zn single crystals-Chemical polishing
Zn specimens 3/8" thick-Acid, cutting
Zn specimens-Chemical etching
Zn specimens-Chemical polishing
Zn specimens-Electrolytic etching
Zn specimens-Electrolytic polishing
Zn specimens-Electrolytic polishing
Zn specimens-Electrolytic polishing
Zn wafers and single crystals-Zn (0001) cleaved wafers
Zn, Zn-Sn-Fe, Zn-Al-Cu-Electrolytic polishing
Zn-Al alloys-For alloy with 22% Al
Zn-Al alloys-For alloy with 22% Al
Zn-Al and Zn-Cr alloys, Zn-Fe layers in galvanized steel or ferrous materials-Chemical etching
Zn-Cd alloys-Chemical etching
Zn-Cu alloys
Zn-Cu alloys - Modified Palmerton reagent
Zn-Cu alloys-Electrolytic etching
Zn-Fe, Zn-Al, and Zn-Cr alloys and Zn coated steels
Zn-Ge alloys (5/25 at.% Ge)-Electro thinning for amorphous alloys
Zn-Sn alloys-Zn-Sn alloys processed in a study of solidification in lamellar eutectic systems
Zn-Sn-As system-Investigation of polishing behaviours of chemical mixtures on ZnSnAs material
Zn-Ti alloys-Chemical etching
Zn-base alloys-Chemical etching
Zn-rich alloys
Zn3As2 single crystal sphere-Thermal etching
Zn3P2 single crystal and thin film-Chemical etching
ZnCd
ZnHg specimen-Chemical etching
ZnHg specimens-Acid, cutting
ZnO
ZnO (0001) and (10T0) wafers-Chemical etching
ZnO (0001) wafers from natural zincite-Chemical etching
ZnO (0O01) wafers-Chemical polishing
ZnO (1O1O) prism cut wafers-Chemical etching
ZnO (OOO1) as platelets and grains-Chemical etching
ZnO grain boundaries-Chemical etching
ZnO single crystal material-Thermal treatment
ZnO single crystal specimens-ZnO single crystal specimens used in a study of deformation
ZnO single crystal wafers-Chemical etching
ZnO specimens-Chemical etching
ZnO thin film deposit-ZnO thin film deposit formed by oxidation of ZnSe
ZnO-Bi2O3-Co3O4-MnO2-Sb2O3-SiO2-Chemical etching
ZnO-Chemical etching
ZnS (0001) hexagonal wafers-Chemical cleaning
ZnS (001) wafers-Chemical etching
ZnS (100) wafers-Chemical polishing
ZnS (111) cleaved wafers-Chemical etching
ZnS (111) wafers-Chemical etching
ZnS (111) wafers-Chemical etching
ZnS (111) wafers-Dislocation etching
ZnS (synthetic)
ZnS single crystal wafers-Chemical etching
ZnSe (100) wafers-Chemical etching
ZnSe (100) wafers-Chemical etching
ZnSe (100) wafers-Chemical polishing
ZnSe (110) wafers-Dislocation etching
ZnSe (111) (SI) wafers-Chemical cleaning
ZnSe (111) wafers-Chemical etching
ZnSe single crystal platelets-Chemical etching
ZnSe single crystal wafers-Chemical etching
ZnSe single crystal wafers-Chemical polishing
ZnSe thin films-Chemical cleaning/polishing
ZnSe-S (111) (SI) wafers and ZnSe single crystals-Chemical cleaning
ZnSiF2 single crystals-Chemical etching
ZnSiP2 (100) single crystal wafers-Chemical polishing
ZnSnAs2 single crystals-Chemical etching
ZnSnP2 thin films grown on GaAs-Chemical etching
ZnTe (110) wafers and ingots-Dislocation etching
ZnTe (111) wafers-Chemical etching
ZnTe (111) wafers-Chemical etching
ZnTe (111) wafers-Chemical etching
ZnTe (111) wafers-Chemical etching-Warekois's reagent
ZnTe (111) wafers-Chemical polishing
ZnTe (111) wafers-Chemical polishing/etching
ZnTe (111) wafers-Dislocation etching
ZnTe (111) wafers-Thermal etching
ZnTe specimens-Chemical cleaning
ZnTe thin film deposits-Chemical etching
ZnTe thin films-Acid, float-off
ZnTe thin films-Chemical etching
ZnW (001) cleaved wafers-Chemical etching
ZnW (001) cleaved wafers-Chemical polishing
Zr (0001) and (1010) wafers-electrolytic polishing
Zr alloys
Zr alloys
Zr alloys
Zr alloys
Zr alloys
Zr alloys containing Al, Be, Fe, Ni and Si
Zr alloys containing Al, Be, Fe, Ni, Si and up to 10% Pt
Zr alloys with intermetallic phases, oxides, nitrides and hydrides-Anodizing
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys
Zr and Zr alloys-Chemical etching
Zr and Zr alloys-Electro thinning by modified Bollman technique
Zr and Zr base alloys-Anodic etching
Zr and Zr base alloys-Chemical and electrolytic etching
Zr and Zr-Al and Zr-U alloys
Zr and Zr-Th alloys
Zr and Zr-U alloys
Zr and alloys
Zr and alloys
Zr and alloys - Picklesimer's anodizing solution
Zr and alloys of Zr and 5% Ta
Zr chemical etching
Zr poly sheet-Chemical thinning
Zr poly sheet-Chemical thinning
Zr polycrystalline blanks-Chemical etching
Zr polycrystalline rod-Chemical cleaning
Zr polycrystalline rod-Electrolytic polishing
Zr polycrystalline sheet-Chemical cleaning/etching
Zr single crystal
Zr specimens used for electroplating
Zr specimens-Chemical Polishing
Zr specimens-Chemical etching
Zr specimens-Chemical etching
Zr specimens-Chemical etching
Zr specimens-Chemical polishing
Zr specimens-Chemical slurry polishing
Zr thin film-Chemical etching
Zr, 4% Sn, and 1.6% Mo alloy
Zr, Hf and alloys
Zr, Hf, Zircaloys
Zr, Hf, high Zr alloys, high-Hf alloys
Zr, Hf, low-Zr alloys, low-Hf alloys
Zr, Zr-2.5% Nb alloy, Zircaloy-2, Zircaloy-4, Hf
Zr, Zr-Ni, Zr-Cr, Zr-Si, Zr-Ag, and Zr-Al alloys
Zr, Zr-Si, Zr-B, Zr-Nb, and Zr-Fe alloys
Zr-2.5Nb alloy
Zr-Al alloy-For alloy with 1% Al
Zr-Be, and Ze-H alloys, pure Zr, Zircaloy-Chemical polishing
Zr-C system-Chemical etching
Zr-Ce-O system-Zr-Ce2O3 x 2ZrO2
Zr-Co-Si system-Zr(85-x) Co(x) Si(15)
Zr-Cr alloy-Zr-2Cr
Zr-Cr alloys-Chemical polishing
Zr-Cr-Fe alloys-Zr - 2 at.% Cr - 0.16 at.% Fe
Zr-Cr-O alloys (Zr-rich)-Chemical polishing
Zr-Cr-O alloys, Zr alloys other than Zircaloys
Zr-Cr-Si alloys-Zr(85-x) Cr(x) Si(15)
Zr-Cu alloys
Zr-Cu alloys-For alloys with 0.1-0.8 wt.% Cu
Zr-Cu eutectoid-Zr-1.6% Cu
Zr-Cu-Si alloys-Zr(85-x)Cu(x)Si15
Zr-Fe-Si alloys-Electro thinning for amorphous alloys
Zr-Hf system-Chemical etching
Zr-Hf-Si alloys-Zr(85-x)Hf(x)Si(15). Electro thinning for amorphous alloys
Zr-Hf-Ti alloys
Zr-Mg and Zr-Ni alloys
Zr-Mg, Zr-Sn, and Zr-U alloys
Zr-Mn alloys-Alloys with 0.5-2.0 at. % Mn
Zr-Mo alloys-Beta Zr-Mo, alloys with 2-6% Mo
Zr-Mo-Si alloys-Zr(85-x) Mo(x) Si(15)
Zr-Nb alloys
Zr-Nb alloys
Zr-Nb alloys-Cathodic etching
Zr-Nb-Cr alloy-0.5 wt.% Nb, 1% Cr
Zr-Nb-Si alloys-Zr(85-x) Nb(x) Si(15)
Zr-Ni eutectics and Zr-Si alloys
Zr-Ni-Co system-Chemical etching
Zr-Ni-Co system-Twin jet electro thinning
Zr-Ni-Si alloys-Zr(85-x) Ni(x) Si(15)
Zr-Si alloys
Zr-Si system-Zr(100-x)Si(x). Electro thinning for amorphous alloys
Zr-Sn alloy (Zircaloy 2 1-3% Sn)-Electro thinning
Zr-Sn alloy (Zircaloy 2 1-3% Sn)-Electro thinning
Zr-Sn alloys-Zr based alloys
Zr-Sn, Zr-Mo, Zr-Cu, Zr-Si, Zr-N, Zr-O, and Zr-Al alloys
Zr-Ta-Si alloys-Zr(85-x)Ta(x)Si(15). Electro thinning for amorphous alloys
Zr-Th alloys-Chemical polishing
Zr-Th alloys-Electrolytic polishing
Zr-Th, Zr-Sn and Zr-Nb alloys
Zr-Ti-Si alloys-Electro thinning for amorphous alloys
Zr-V-Si alloys-Zr(85-x)V(x)Si(15). Electro thinning for amorphous alloys
Zr-W-Si alloys-Zr(85-x)W(x)Si(15). Electro thinning for amorphous alloys
Zr-W-Ta alloys-Chemical etching
Zr2Ni single crystal specimen-Chemical etching
Zr2Ni single crystals-Chemical etching
Zr3Al based alloys
Zr3Al-based alloys
Zr3Al-based alloys
ZrB and other zirconium borides-Chemical etching
ZrB, ZrB2, Zr3B4, and ZrB12 specimens-Chemical etching
ZrB2-Chemical etching
ZrC-Chemical etching
ZrC-Chemical etching
ZrN (100) wafers--Thermal cleaning
ZrN thin films-Chemical cleaning
ZrN-Chemical etching
ZrO2
ZrO2 single crystal specimen and ZrO2 thin film-Chemical etching
ZrO2 single crystal specimens-General etching
ZrO2 specimens with low Hafnium content-Chemical cleaning/polishing
ZrO2 thin film deposits-Electrolytic polishing
ZrO2 with MgO, CaO-Physical etching
ZrO2, Zr2O3-Chemical etching
ZrO2-Chemical ecthing
ZrO2-TZP (Y2O3, RE oxide, TiO2), ZrO2-PSZ (Y2O3, MgO, CaO), ZrO2-CSZ (ZrO2, MgO, CaO), ZrO-ZTC (Possible matrices Al2O3, mullite)-Chemical ecthing
ZrO2-TZP, ZrO2-PSZ, ZrO2-CSZ, ZrO2-ZTC-Chemical etching
ZrS2 single crystal specimens-Sample etching
ZrV single crystal metallic alloy-Chemical etching
a-Ge as thin film material deposited on NaCl (100) substrates-Float-off
a-Ge evaporated on fused quartz blanks
a-Ge thin film grown on NaCl-Acid, float-off
a-Ge thin films deposited on NaCl-Acid, float-off
a-Ge-H and a-Si-H hydrogenated thin films-Chemical cleaning/etching
a-Nb3Ge compound-Physical etching
a-Si thin film, 300 A thick-Film removal
a-Si-H thin film deposited on an a-SiO(x)N(y)H thin film-Chemical etching
a-Si-H thin films grown on SiO2, Al2O3, and ZrO2 substrates-Chemical etching
a-Si-H thin films-Electrical defect
a-Si3N4-H thin films-Ionized gas ecthing
a-SiC-H amorphous thin films 500-3500 A thick-Chemical etching
a-SiC-H amorphous thin films-Ionized gas etching
a-SiC-H thin films deposited on Si (100) substrates-Chemical etching
a-SiC-H thin films deposited on Si (100) substrates-Chemical etching
a-SiC-H thin films-Chemical etching
a-SiC-H thin films-Metal pinhole decoration
a-SiN-H thin films deposited on (100) silicon and germanium wafers-Chemical etching
a-SiO2 thin films used as a diffusion mask on silicon wafers-Thermal conversion
a-WO3 thin films 499-8500 A thick-Chemical etching
a-Zr2Pd thin films-Chemical polishing/etching
a-Zr3Rh amorphous thin films-Chemical polishing/etching
i-C-Gas, growth
n-Bi2Te3 (0001) wafers-Chemical etching
n-GaP (111) and p-GaP (111) wafers-Chemical etching
p-Bi2Te3 (0001) cleaved wafers-Oxidation
p-GaP (100) wafers-Chemical etching
p-GaSb (111) wafers-Chemical etching-BRM etchant

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