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In2O3 (1010) oriented thin films - Chemical etching

Material Name: In2O3 (1010) oriented thin films
Recipe No.: 7036
Primary Chemical Element in Material: In
Sample Type: Thin film
Uses: Etching
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Wet (Chemical) etching
Etchant (Electrolyte) Composition: x...1 M oxalic acid. Note: The volume/quantity was not shown in the referenced article and is therefore designated as an "x".
Procedure (Condition): Temperature: 50 C.
Note: In2O3 (1010) oriented thin films or as an amorphous thin film with tin doping. Photolithographic techniques used to pattern surfaces using AZ-1350 photo resist. Solution used to selectively etch films after temperature annealing.
Reference: Thornton, J A & Hedgeoth, L V - J Vac Sci Technol, 13,117(1976).